U.S. patent application number 11/625097 was filed with the patent office on 2007-06-14 for roll-off reducing agent.
Invention is credited to Shigeo Fujii, Toshiya Hagihara, Yoshiaki Oshima.
Application Number | 20070130839 11/625097 |
Document ID | / |
Family ID | 27481266 |
Filed Date | 2007-06-14 |
United States Patent
Application |
20070130839 |
Kind Code |
A1 |
Hagihara; Toshiya ; et
al. |
June 14, 2007 |
ROLL-OFF REDUCING AGENT
Abstract
A roll-off reducing agent comprising one or more compounds
selected from the group consisting of carboxylic acids having 2 to
20 carbon atoms having either OH group or groups or SH group or
groups, monocarboxylic acids having 1 to 20 carbon atoms, and
dicarboxylic acids having 2 to 3 carbon atoms, and salts thereof;
and a roll-off reducing agent composition comprising a roll
off-reducing agent comprising one or more compounds selected from
the group consisting of carboxylic acids having 2 to 20 carbon
atoms having either OH group or groups or SH group or groups,
monocarboxylic acids having 1 to 20 carbon atoms, and dicarboxylic
acids having 2 to 3 carbon atoms, and salts thereof; an abrasive;
and water.
Inventors: |
Hagihara; Toshiya;
(Wakayama-shi, JP) ; Fujii; Shigeo; (Wakayama-shi,
JP) ; Oshima; Yoshiaki; (Wakayama-shi, JP) |
Correspondence
Address: |
BIRCH STEWART KOLASCH & BIRCH
PO BOX 747
FALLS CHURCH
VA
22040-0747
US
|
Family ID: |
27481266 |
Appl. No.: |
11/625097 |
Filed: |
January 19, 2007 |
Related U.S. Patent Documents
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Application
Number |
Filing Date |
Patent Number |
|
|
09842769 |
Apr 27, 2001 |
|
|
|
11625097 |
Jan 19, 2007 |
|
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Current U.S.
Class: |
51/307 ;
51/309 |
Current CPC
Class: |
C09G 1/02 20130101 |
Class at
Publication: |
051/307 ;
051/309 |
International
Class: |
B24D 3/02 20060101
B24D003/02 |
Foreign Application Data
Date |
Code |
Application Number |
Apr 28, 2000 |
JP |
2000-131697 |
Apr 28, 2000 |
JP |
2000-131698 |
May 12, 2000 |
JP |
2000-141020 |
May 12, 2000 |
JP |
2000-141022 |
Claims
1. A polishing composition comprising: water; an abrasive; a
roll-off reducing agent comprising one or more compounds selected
from the group consisting of carboxylic acids having 2 to 20 carbon
atoms having either OH group or groups or SH group or groups,
monocarboxylic acids having 1 to 20 carbon atoms, and dicarboxylic
acids having 2 to 3 carbon atoms, and salts thereof; and an
intermediate alumina.
2. A polishing composition comprising: (A) one or more compounds
selected from carboxylic acids having 2 to 20 carbon atoms having
either OH group or groups or SH group or groups, monocarboxylic
acids having 1 to 20 carbon atoms, and dicarboxylic acids having 2
to 3 carbon atoms, and salts thereof; (B) one or more compounds
selected from polycarboxylic acids having 4 or more carbon atoms
and having neither OH group or groups nor SH group or groups,
aminopolycarboxylic acids, amino acids and salts thereof; and (C)
one or more compounds selected from an intermediate alumina and an
alumina sol; an abrasive; and water.
3. The polishing composition according claim 2, wherein the
intermediate alumina and the alumina sol in Compounds (C) have a
specific surface area of from 30 to 300 m.sup.2/g and an average
particle size of 0.01 to 5 .mu.m.
4. The polishing composition according to claim 2, wherein the
intermediate alumina is prepared from aluminum hydroxide and/or an
alumina sol, each having a specific surface area of 10 m.sup.2/g or
more and a content of an alkali metal and a content of an alkaline
earth metal of 0.1% by weight or less.
5. A polishing composition comprising: (A) one or more compounds
selected from carboxylic acids having 2 to 20 carbon atoms having
either OH group or groups of SH group or groups, monocarboxylic
acids having 1 to 20 carbon atoms, and dicarboxylic acids having 2
to 3 carbon atoms, and thereof; and (B) one or more compounds
selected from polycarboxylic acids having 4 or more carbon atoms
and having neither OH group or groups nor SH group or groups,
aminopolycarboxylic acids, amino acids and salts thereof; an
abrasive; and water.
6. The polishing composition according to claim 5, wherein one or
more compounds of Compounds (A) are selected from carboxylic acids
having 2 to 20 carbon atoms having either OH group or groups or SH
group or groups, and dicarboxylic acids having 2 to 3 carbon atoms,
and salts thereof, and wherein one or more compounds of Compounds
(B) are selected from polycarboxylic acids having 4 or more carbon
atoms and having neither OH group or groups nor SH group or groups,
aminopolycarboxylic acids, and salts thereof.
7. The polishing composition according to claim 5, wherein one or
more compounds of Compounds (A) are selected from oxalic acid,
malonic acid, glycolic acid, lactic acid, malic acid, glyoxylic
acid, tartaric acid, citric acid, gluconic acid, and salts thereof,
and wherein one ore more compounds of Compounds (B) are selected
from succinic acid, maleic acid, fumaric acid, citraconic acid,
itaconic acid, tricarballylic acid, diglycolic acid,
ethylenediaminetetraacetic acid, diethylenetriaminepentaacetic
acid, and salts thereof.
8. A polishing process of a substrate to be polished comprising a
step of polishing the substrate to be polished with the polishing
composition of any one of claims 1 to 7.
Description
BACKGROUND OF THE INVENTION
[0001] 1. Field of the Invention
[0002] The present invention relates to a roll-off reducing agent.
More specifically, the present invention relates to a roll-off
reducing agent composition comprising the roll-off reducing agent,
a process of reducing roll-off of a polished substrate by applying
the roll-off reducing agent to the substrate, a process for
producing a polished substrate by applying the roll-off reducing
agent to the substrate, a polishing composition, a polishing
process of a substrate to be polished by applying the polishing
composition to the substrate, and a process for producing a
substrate by applying the polishing composition to a substrate to
be polished.
[0003] 2. Discussion of the Related Art
[0004] Over the years, a demand for a technique for further
increasing the capacity of the hard discs has become greater. As a
leading means for increasing the capacity of the hard discs, there
has been considered a means of producing a substrate capable of
recording data even to its outer periphery by reducing roll-off
(edge rounding of end side of a substrate) caused in the polishing
process. For instance, various mechanical polishing conditions
which can reduce roll-off, such as making a polishing pad more
rigid, and making a polishing load smaller, have been studied.
However, although a certain extent of an effect is obtained for
reducing roll-off by these mechanical polishing conditions, the
effect has not yet been satisfactory.
[0005] In addition, as a polishing composition capable of reducing
roll-off, a composition comprising water, .alpha.-alumina particles
and aluminum nitrate has been known (Japanese Patent Laid-Open No.
Hei 9-286975). However, this composition does not have a
satisfactory effect of reducing roll-off, and studies of the
polishing components having an excellent effect for reducing
roll-off have not yet been sufficiently made at present.
[0006] On the other hand, the hard discs have been greatly
developed over the years in the trends of miniaturization and high
capacity, so that the trend of high density has been progressed,
that the minimum recording area has become smaller, and that the
floating amount of a magnetic head has been made increasingly
smaller. Therefore, there have been desired to increase the
polishing rate and reduce the surface roughness, and to reduce
surface defects such as scratches and pits in the polishing process
of a hard disc substrate. In view of this, there have been studied
on a polishing composition by using water, alumina, boehmite and a
chelating compound (Japanese Patent Laid-Open No. Hei 11-92749, and
the like); a polishing composition comprising water,
.alpha.-alumina, and an alumina sol stabilized with acetic acid
(Japanese Patent Laid-Open No. 2000-63805); a polishing composition
for an aluminum magnetic disc, comprising water, an alumina
abrasive powder, a polishing accelerator such as gluconic acid or
lactic acid, and a surface-modifying agent such as a colloidal
alumina (Japanese Patent Laid-Open No. Hei 2-84485); a polishing
composition comprising water, an alumina abrasive, and a polishing
accelerator comprising molybdic acid and an organic acid (Japanese
Patent Laid-Open No. Hei 7-216345); and a polishing process.
[0007] However, none of these polishing compositions sufficiently
satisfy all of an effect of reducing roll-off, an effect of
increasing the polishing rate, an effect of reducing the surface
roughness of a polished object, and an effect of reducing surface
defects such as scratches and pits. Therefore, a polishing
composition having further enhanced effects is in demand.
[0008] An object of the present invention is to provide a roll-off
reducing agent capable of reducing roll-off of a polished substrate
caused by polishing, and increasing a polishing rate; a roll-off
reducing agent composition comprising the roll-off reducing agent;
a process of reducing roll-off of a polished substrate by using the
roll-off reducing agent; and a process for producing a polished
substrate by using the roll-off reducing agent.
[0009] Also, another object of the present invention is to provide
a polishing composition having an increased polishing rate, and a
reduced surface roughness without causing a surface defect on the
surface of the polished substrate, and being capable of reducing
roll-off; a polishing process of a polished substrate by using the
polishing composition; and a process for producing a polished
substrate.
[0010] These and other objects of the present invention will be
apparent from the following description.
[0011] In the present specification, the term "roll-off" refers to
a state so-called edge rounding of an end surface, in which a part
of an end surface of a substrate to be polished is more largely
grinded as compared to that of the central part, thereby rounding
off the end part.
SUMMARY OF THE INVENTION
[0012] According to the present invention, there are provided:
[0013] [1] a roll-off reducing agent comprising one or more
compounds selected from the group consisting of carboxylic acids
having 2 to 20 carbon atoms having either OH group or groups or SH
group or groups, monocarboxylic acids having 1 to 20 carbon atoms,
and dicarboxylic acids having 2 to 3 carbon atoms, and salts
thereof; [0014] [2] a roll-off reducing agent composition
comprising: [0015] a roll-off reducing agent comprising one or more
compounds selected from the group consisting of carboxylic acids
having 2 to 20 carbon atoms having either OH group or groups or SH
group or groups, monocarboxylic acids having 1 to 20 carbon atoms,
and dicarboxylic acids having 2 to 3 carbon atoms, and salts
thereof; [0016] an abrasive; and [0017] water; [0018] [3] a
polishing composition comprising: [0019] water; [0020] an abrasive;
[0021] a roll-off reducing agent comprising one or more compounds
selected from the group consisting of carboxylic acids having 2 to
20 carbon atoms having either OH group or groups or SH group or
groups, monocarboxylic acids having 1 to 20 carbon atoms, and
dicarboxylic acids having 2 to 3 carbon atoms, and salts thereof;
and [0022] an intermediate alumina; [0023] [4] a polishing
composition comprising: [0024] (A) one or more compounds selected
from carboxylic acids having 2 to 20 carbon atoms having either OH
group or groups or SH group or groups, monocarboxylic acids having
1 to 20 carbon atoms, and dicarboxylic acids having 2 to 3 carbon
atoms, and salts thereof; [0025] (B) one or more compounds selected
from polycarboxylic acids having 4 or more carbon atoms and having
neither OH group or groups nor SH group or groups,
aminopolycarboxylic acids, amino acids and salts thereof; and
[0026] (C) one or more compounds selected from an intermediate
alumina and an alumina sol; [0027] an abrasive; and [0028] water;
[0029] [5] a polishing composition comprising: [0030] (A) one or
more compounds selected from carboxylic acids having 2 to 20 carbon
atoms having either OH group or groups or SH group or groups,
monocarboxylic acids having 1 to 20 carbon atoms, and dicarboxylic
acids having 2 to 3 carbon atoms, and salts thereof; and
[0031] (B) one or more compounds selected from polycarboxylic acids
having 4 or more carbon atoms and having neither OH group or groups
nor SH group or groups, aminopolyearboxylic acids, amino acids and
salts thereof; [0032] an abrasive; and [0033] water; [0034] [6] a
process of reducing roll-off of a polished substrate, comprising
applying to a substrate to be polished a roll-off reducing agent
comprising one or more compounds selected from the group consisting
of carboxylic acids having 2 to 20 carbon atoms having either OH
group or groups or SH group or groups, monocarboxylic acids having
1 to 20 carbon atoms, and dicarboxylic acids having 2 to 3 carbon
atoms, and salts thereof; [0035] [7] a process for producing a
polished substrate, comprising a step of applying to a substrate to
be polished a roll-off reducing agent comprising one or more
compounds selected from the group consisting of carboxylic acids
having 2 to 20 carbon atoms having either OH group or groups or SH
group or groups, monocarboxylic acids having 1 to 20 carbon atoms,
and dicarboxylic acids having 2 to 3 carbon atoms, and salts
thereof; [0036] [8] a polishing process of a substrate to be
polished comprising a step of polishing the substrate to be
polished with the polishing composition of any one of items [3] to
[5] above; and [0037] [9] a process for producing a substrate
comprising a step of polishing a substrate to be polished with the
polishing composition of any one of items [3] to [5] above.
BRIEF DESCRIPTION OF THE DRAWINGS
[0038] FIG. 1 is a graph showing a roll-off in connection with the
detection curve.
DETAILED DESCRIPTION OF THE INVENTION
1. Roll-off Reducing Agent
[0039] The roll-off reducing agent used in the present invention is
one or more compounds selected from the group consisting of
carboxylic acids having 2 to 20 carbon atoms having either OH group
or groups or SH group or groups, monocarboxylic acids having 1 to
20 carbon atoms, and dicarboxylic acids having 2 to 3 carbon atoms,
and salts thereof. Among them, the carboxylic acids having 2 to 20
carbon atoms having either OH group or groups or SH group or
groups, the dicarboxylic acids having 2 to 3 carbon atoms, and
salts thereof are preferable, from the viewpoint of an effect of
improving roll-off.
[0040] The carboxylic acid having 2 to 20 carbon atoms having
either OH group or groups or SH group or groups includes
oxycarboxylic acids, and compounds in which an oxygen atom of the
OH group of the oxycarboxylic acid is substituted by a sulfur atom.
It is desired that the number of carbon atoms of these carboxylic
acids is from 2 to 20, preferably from 2 to 12, more preferably
from 2 to 8, still more preferably from 2 to 6, from the viewpoint
of the solubility to water. In addition, as oxycarboxylic acids,
those having a hydroxyl group at .alpha.-position of a carboxyl
group are preferable, from the viewpoint of reducing roll-off.
[0041] It is desired that the number of carbon atoms of the
monocarboxylic acid is from 1 to 20, preferably from I to 12, more
preferably from 1 to 8, still more preferably from 1 to 6, from the
viewpoint of the solubility to water.
[0042] The dicarboxylic acid is those having 2 to 3 carbon atoms,
namely oxalic acid and malonic acid, from the viewpoint of reducing
roll-off. Among these roll-off reducing agents, the oxycarboxylic
acids are preferable, from the viewpoint of increasing the
polishing rate. In addition, the dicarboxylic acids are preferable,
from the viewpoint of reducing roll-off.
[0043] Concrete examples of the carboxylic acid having 2 to 20
carbon atoms having either OH group or groups or SH group or groups
include glycolic acid, mercaptosuccinic acid, thioglycolic acid,
lactic acid, .beta.-hydroxypropionic acid, malic acid, tartaric
acid, citric acid, isocitric acid, allocitric acid, gluconic acid,
glyoxylic acid, glyceric acid, mandelic acid, tropic acid, benzilic
acid, salicylic acid, and the like. Concrete examples of the
monocarboxylic acid include formic acid, acetic acid, propionic
acid, butyric acid, isobutyric acid, valeric acid, isovaleric acid,
hexanoic acid, heptanoic acid, 2-methylhexanoic acid, octanoic
acid, 2-ethylhexanoic acid, nonanoic acid, decanoic acid, lauric
acid, and the like. Among them, acetic acid, oxalic acid, malonic
acid, glycolic acid, lactic acid, malic acid, tartaric acid,
glyoxylic acid, citric acid and gluconic acid are preferable;
oxalic acid, malonic acid, glycolic acid, lactic acid, malic acid,
tartaric acid, glyoxylic acid, citric acid and gluconic acid are
more preferable; and oxalic acid, malonic acid, glycolic acid,
tartaric acid and glyoxylic acid are especially preferable.
[0044] In addition, when oxalic acid, malic acid, tartaric acid,
citric acid or gluconic acid is used alone or in combination with
other roll-off reducing agent, it is preferable because clogging of
the abrasive grains and polishing grounds in the polishing pad can
be reduced, so that the deterioration of the polishing properties
such as polishing rate and surface qualities by using the polishing
pad for a long period of time can be prevented. Also, a frequent
pad washing would not be necessary, namely the distance between the
pad dressings can be remarkably extended, so that the productivity
is increased, thereby making it preferable also from the viewpoint
of economic advantages. Among them, oxalic acid, tartaric acid and
citric acid are preferable, and especially citric acid is
preferable. Each of the monocarboxylic acid and the dicarboxylic
acid used in the present invention is selected from carboxylic
acids having neither OH group or groups nor SH group or groups.
[0045] The salts of these acids (namely, carboxylic acids having 2
to 20 carbon atoms having either OH group or groups or SH group or
groups, monocarboxylic acids having 1 to 20 carbon atoms, and
dicarboxylic acids having 2 to 3 carbon atoms) are not particularly
limited. Concretely, there are included salts with a metal,
ammonium, an alkylammonium, an organic amine, and the like.
Concrete examples of the metal include metals belonging to Group
1A, 1B, 2A, 2B, 3A, 3B, 4A, 6A, 7A or 8 of the Periodic Table (long
period form). Among these metals, from the viewpoint of reducing
roll-off, those metals belonging to Group 1A, 3A, 3B, 7A or 8 of
the Periodic Table are preferable, and those metals belonging to
Group 1A, 3A or 3B of the Periodic Table are more preferable.
Sodium and potassium belonging to Group 1A are most preferable.
[0046] Concrete examples of the alkylammonium include
tetramethylammonium, tetraethylammonium, tetrabutylammonium, and
the like.
[0047] Concrete examples of the organic amine include
dimethylamine, trimethylamine, alkanolamines, and the like.
[0048] Among these salts, ammonium salts, sodium salts and
potassium salts are especially preferable.
2. Roll-off Reducing Agent Composition
[0049] The roll-off reducing agent of the present invention can be
used by formulating the agent in a polishing liquid comprising an
abrasive and water. The polishing composition obtained above is
especially referred to "roll-off reducing agent composition" in the
present specification. Specifically, the roll-off reducing agent
composition of the present invention comprises the above-mentioned
roll-off reducing agent, an abrasive and water.
[0050] The content of the roll-off reducing agent in the roll-off
reducing agent composition is preferably 0.01% by weight or more,
from the viewpoints of reducing roll-off and increasing the
polishing rate, and the content of the roll-off reducing agent is
preferably 5% by weight or less, from the viewpoints of economic
advantages and improving surface qualities. The content of the
roll-off reducing agent is more preferably from 0.01 to 3% by
weight, still more preferably from 0.01 to 2% by weight, most
preferably from 0.02 to 1% by weight. Here, the roll-off reducing
agent can be used alone or in admixture of two or more kinds.
[0051] As the abrasive used in the present invention, any abrasives
generally employed for polishing can be used. The abrasive
includes, for instance, metals; carbides of metals or metalloids,
nitrides of metals or metalloids, oxides of metals or metalloids,
borides of metals or metalloids, diamond, and the like. The metals
or metalloids include those elements belonging to the Groups 2A,
2B, 3A, 3B, 4A, 4B, 5A, 6A, 7A or 8 of the Periodic Table (long
period form). Concrete examples of the abrasive include
.alpha.-alumina particles, silicon carbide particles, diamond
particles, magnesium oxide particles, zinc oxide particles, cerium
oxide particles, zirconium oxide particles, colloidal silica
particles, filmed silica particles, and the like. It is preferable
to use these abrasives in admixture of two or more kinds, from the
viewpoint of increasing the polishing rate. Among them,
.alpha.-alumina particles, cerium oxide particles, zirconium oxide
particles, colloidal silica particles, fumed silica particles, and
the like are more preferable, and .alpha.-alumina particles are
especially preferable.
[0052] The average primary particle size of the abrasive is
preferably from 0.01 to 3 .mu.m, more preferably from 0.02 to 0.8
.mu.m, especially preferably from 0.05 to 0.5 .mu.m, from the
viewpoint of increasing the polishing rate. Further, when the
primary particles are aggregated to form a secondary particle, the
average secondary particle size is preferably from 0.05 to 3 .mu.m,
more preferably from 0.1 to 1.5 .mu.m, especially preferably from
0.2 to 1.2 .mu.m, from the viewpoint of increasing the polishing
rate in the same manner as above, and from the viewpoint of
reducing the surface roughness of a polished object. The average
primary particle size of the abrasive is obtained by subjecting the
abrasive to an image analysis by observing with a scanning electron
microscope (favorably from 3000 to 30000 times), and determining
the particle size as a number-average particle size. In addition,
the average secondary particle size can be determined as
volume-average particle size by using a laser diffraction
method.
[0053] The specific gravity of the abrasive is preferably from 2 to
6, more preferably from 2 to 5, from the viewpoints of the
dispersibility, the feed ability to the polishing device and
recovery and reuse.
[0054] The content of the abrasive is preferably from 1 to 40% by
weight, more preferably from 2 to 30% by weight, still more
preferably from 3 to 15% by weight, of the roll-off reducing agent
composition, from the viewpoints of having economic advantages and
making the surface roughness of a polished object small, thereby
efficiently polishing the substrate.
[0055] Water in the roll-off reducing agent composition of the
present invention is used as a medium, and the content of water is
preferably from 50 to 98.99% by weight, more preferably 60 to 98%
by weight, still more preferably from 70 to 95% by weight, from the
viewpoint of efficiently polishing the object to be polished.
[0056] In addition, the roll-off reducing agent composition of the
present invention can contain other components as occasion
demands.
[0057] As other components, there are included organic acids and
salts other than those listed as the roll-off reducing agent. The
other components include, for instance, organic acids such as
polycarboxylic acids, aminopolycarboxylic acids and amino acids,
and salts thereof, inorganic acids and salts thereof, oxidizing
agents, thickeners, dispersants, anticorrosive agents, basic
substances, surfactants, and the like. Concrete examples of the
organic acids and salts thereof, inorganic acids and salts thereof,
and the oxidizing agents are those listed in Japanese Patent
Laid-Open No. Sho 62-25187, page 2, upper right column, lines 3 to
11; Japanese Patent Laid-Open No. Sho 63-251163, page 2, lower left
column, lines 7 to 14; Japanese Patent Laid-Open No. Hei 1-205973,
page 3, upper left column, line 11 to upper right column, line 2;
Japanese Patent Laid-Open No. Hei 3-115383, page 2, lower right
column, line 16 to page 3, upper left column, line 11; Japanese
Patent Laid-Open No. Hei 4-108887, page 2, lower left column, lines
1 to 9; Japanese Patent Laid-Open No. Hei 4-275387, page 2, right
column, line 27 to page 3, left column, line 12; Japanese Patent
Laid-Open No. Hei 4-363385, page 2, right column, lines 21 to 30,
the entire contents of which are incorporated herein by reference,
and the like.
[0058] These other components may be used alone or in admixture of
two or more kinds. In addition, the content of the other components
is preferably from 0.05 to 20% by weight, more preferably from 0.05
to 10% by weight, still more preferably from 0.05 to 5% by weight,
of the roll-off reducing agent composition, from the viewpoint of
exhibiting the respective functions and from the viewpoint of
economic advantages.
[0059] The concentration of each component of the above-mentioned
roll-off reducing agent composition is a preferable concentration
during polishing, and it may be a concentration during the
preparation of the composition. The composition is usually prepared
as a concentrate, and the concentrate is diluted upon use in many
cases.
[0060] The roll-off reducing agent composition of the present
invention can be prepared by adding one or more compounds selected
from the group consisting of the carboxylic acids having 2 to 20
carbon atoms having either OH group or groups or SH group or
groups, the monocarboxylic acids having 1 to 20 carbon atoms, and
the dicarboxylic acids having 2 to 3 carbon atoms, and salts
thereof, and various additives, as occasion demands in proper
amounts to water and an abrasive, and mixing the components by a
known process.
[0061] It is preferable that the pH of the roll-off reducing agent
composition is appropriately adjusted depending upon the kinds and
the required qualities and the like of the substrate to be
polished. For instance, the pH of the roll-off reducing agent
composition is preferably from 2 to 12, from the viewpoints of the
cleanability of the substrate and the anti-corrosiveness of the
working machine, and from the viewpoint of the safety of the
operator. In addition, in a case where a substrate to be polished
is a substrate for precision parts which is mainly made of a metal
such as an Ni--P plated aluminum alloy substrate, the pH is
preferably from 2 to 9, especially preferably from 3 to 8, from the
viewpoints of increasing the polishing rate and improving the
surface qualities. When the roll-off reducing agent composition is
used for polishing a semiconductor wafer, a semiconductor element,
or the like, especially for polishing a silicon substrate, a
poly-silicon film, an SiO.sub.2 film, or the like, the pH is
preferably from 7 to 12, more preferably from 8 to 12, especially
preferably from 9 to 11, from the viewpoints of increasing the
polishing rate and improving the surface qualities. The pH can be
adjusted by adding properly an inorganic acid such as nitric acid
or sulfuric acid, an organic acid such as a polycarboxylic acid, an
aminopolycarboxylic acid, or an amino acid, a metal salt or an
ammonium salt thereof, or a basic substance such as aqueous
ammonia, sodium hydroxide, potassium hydroxide or amine in a
desired amount as occasion demands.
3. Process of Reducing Roll-off of Polished Substrate by Using
Roll-off Reducing Agent and Process for Producing Polished
Substrate
[0062] The material for an object to be polished as
representatively exemplified by the substrate to be polished used
in the present invention includes, for instance, metals or
metalloids such as silicon, aluminum, nickel, tungsten, copper,
tantalum and titanium; alloys made of these metals as main
components; glassy substances such as glass, glassy carbon and
amorphous carbons; ceramic materials such as alumina, silicon
dioxide, silicon nitride, tantalum nitride and titanium nitride;
resins such as polyimide resins; and the like. Among them, it is
preferable that an object to be polished is made of a metal such as
aluminum, nickel, tungsten or copper, or made of an alloy
containing these metals as the main components; or an object to be
polished is a semiconductor substrate made of semiconductor
elements containing these metals. Especially, in a case where the
roll-off reducing agent of the present invention is used when
polishing an aluminum alloy substrate plated with Ni--P, it is
preferable because the extent of roll-off can be made small.
[0063] The shape for the object to be polished is not particularly
limited. For instance, those having shapes containing planar
portions such as discs, plates, slabs and prisms, or shapes
containing curved portions such as lenses can be subjects for
polishing with the roll-off reducing agent composition of the
present invention. Among them, those having the disc-shaped objects
are especially preferable in polishing.
[0064] The roll-off reducing agent of the present invention can be
favorably used in polishing the substrate for precision parts. For
instance, the roll-off reducing agent is suitable for polishing
substrates for precision parts such as substrates for magnetic
recording media for magnetic discs, optical discs, opto-magnetic
discs, and the like; photomask substrates, optical lenses, optical
mirrors, optical prisms and semiconductor substrates. The polishing
of a semiconductor substrate comprises the steps of polishing a
silicon wafer (bare wafer), forming separation membrane for an
embedding element, flattening an interlayer insulating film,
forming an embedded metal line, and forming embedded capacitor, and
the like. The roll-off reducing agent composition of the present
invention is especially suitable for polishing a magnetic disc
substrate.
[0065] In the process of reducing roll-off of the polished
substrate using the roll-off reducing agent of the present
invention, the extent of roll-off of the polished substrate can be
remarkably reduced by polishing the substrate to be polished listed
above with a polishing liquid comprising the roll-off reducing
agent of the present invention, or the roll-off reducing agent
composition of the present invention per se as a polishing
liquid.
[0066] For instance, a substrate with reduced roll-off can be
produced by clamping a substrate with polishing discs to which a
polishing cloth made of nonwoven organic polymer fabric, is pasted;
feeding a polishing liquid comprising the roll-off reducing agent
of the present invention, or the roll-off reducing agent
composition of the present invention to a polishing surface; and
moving the polishing discs or the substrate, with applying a given
pressure.
[0067] The roll-off generated in the polished substrate in the
present invention can be evaluated by determining the shape of the
end surface part by using, for instance, a tracer or optical
profilometer, and numerically expressing the extent of how much
more the end surface is grounded as compared to the central portion
of the disc in accordance with the profile.
[0068] The method of numerically expressing roll-off is determined
as follows. As shown in FIG. 1, three points, i.e. point A, point B
and point C, are taken on the detection curve which are given
distances away from the center of the disc, the detection curve
meaning the shape of the end surface part of the polished
substrate). Roll-off refers to a distance (D) between point B and a
base line, wherein the base line is defined as a straight line
connecting point A and point C. The term "having good roll-off"
refers to a value of D more approximating 0. The roll-off value
refers to a value obtained by dividing D by 1/2 of the amount of
variation in the thickness of the disc before and after polishing.
The roll-off value is preferably 0.2 .mu.m/.mu.m or less, more
preferably 0.15 .mu.m/.mu.m or less, still more preferably 0.10
.mu.m/.mu.m or less.
[0069] Here, the positions of point A, point B and point C may vary
depending upon the size of the object to be determined. In general,
it is preferable that point B is positioned at 0.5 mm away from the
end of the disc on the line connecting the end part and the center
of the disc, that the point C is positioned at 2.5 mm away from the
end, and that that the point A is positioned at 4.5 mm away from
the end. For instance, in the case of 3.5 inch disc, it is
preferable that point A, point B and point C are respectively
positioned at 43 mm, 47 mm and 45 mm away from the center of the
disc.
[0070] In addition, in the polishing process of a substrate for
precision parts or the like, by using the roll-off reducing agent
of the present invention, there are advantages that not only the
roll-off of the substrate can be remarkably reduced, but also that
the polishing rate can be increased. Also, in a case where one or
more kinds selected from oxalic acid, malic acid, tartaric acid,
citric acid, gluconic acid, and salts thereof are used as the
roll-off reducing agent, it is preferable because the clogging of
the abrasive grains and polishing grounds in the polishing pad can
be reduced, so that the deterioration of the polishing properties
such as polishing rate and surface qualities by using the polishing
pad for a long period of time can be prevented.
[0071] In this case, among the above-mentioned compounds, oxalic
acid, tartaric acid, citric acid and salts thereof are preferable,
and especially citric acid and salts thereof are preferable. In
addition, in a case where the above-mentioned compounds are used in
combination of two or more kinds, especially preferable
combinations are combinations of two or more kinds selected from
oxalic acid, tartaric acid, citric acid and salts thereof, or
combinations of one or more kinds selected from oxalic acid,
tartaric acid, citric acid and salts thereof, with one or more
kinds selected from malonic acid, glycolic acid, lactic acid, malic
acid, gluconic acid and salts thereof. More preferable are
combinations of citric acid or a salt thereof with one or more
kinds selected from oxalic acid, glycolic acid, lactic acid, malic
acid, tartaric acid and salts thereof. Particularly preferable
combinations are citric acid or a salt thereof with glycolic acid
or a salt thereof.
[0072] The roll-off reducing agent composition of the present
invention especially has an effect in the polishing process, and
the roll-off reducing agent composition can be similarly applied to
a process other than the polishing process, for instance, a lapping
process, and the like.
4. Polishing Composition
[0073] The polishing composition of the present invention can be
roughly classified into the following three embodiments: [0074]
[Embodiment 1] A polishing composition comprising: [0075] water;
[0076] an abrasive; [0077] a roll-off reducing agent comprising one
or more compounds selected from the group consisting of carboxylic
acids having 2 to 20 carbon atoms having either OH group or groups
or SH group or groups, monocarboxylic acids having 1 to 20 carbon
atoms, and dicarboxylic acids having 2 to 3 carbon atoms, and salts
thereof, and [0078] an intermediate alumina. [0079] [Embodiment 2]
A polishing composition comprising: [0080] (A) one or more
compounds selected from carboxylic acids having 2 to 20 carbon
atoms having either OH group or groups or SH group or groups,
monocarboxylic acids having 1 to 20 carbon atoms, and dicarboxylic
acids having 2 to 3 carbon atoms, and salts thereof; [0081] (B) one
or more compounds selected from polycarboxylic acids having 4 or
more carbon atoms and having neither OH group or groups nor SH
group or groups, aminopolycarboxylic acids, amino acids and salts
thereof; and [0082] (C) one or more compounds selected from an
intermediate alumina and an alumina sol; [0083] an abrasive; and
[0084] water. [0085] [Embodiment 3] A polishing composition
comprising: [0086] (A) one or more compounds selected from
carboxylic acids having 2 to 20 carbon atoms having either OH group
or groups or SH group or groups, monocarboxylic acids having 1 to
20 carbon atoms, and dicarboxylic acids having 2 to 3 carbon atoms,
and salts thereof; and [0087] (B) one or more compounds selected
from polycarboxylic acids having 4 or more carbon atoms and having
neither OH group or groups nor SH group or groups,
aminopolycarboxylic acids, amino acids and salts thereof; [0088] an
abrasive; and [0089] water.
EMBODIMENT 1
[0090] The polishing composition of Embodiment 1, as described
above, comprises water, an abrasive, a roll-off reducing agent, and
an intermediate alumina.
[0091] As the abrasive usable in Embodiment 1, those abrasives
which are generally used for polishing can be used. Examples of the
abrasives are not particularly limited, as long as they are the
same ones as those used in the above-mentioned roll-off reducing
agent composition.
[0092] The content of the abrasive is preferably from 1 to 40% by
weight, more preferably from 2 to 30% by weight, still more
preferably from 3 to 15% by weight, of the polishing composition of
Embodiment 1, from the viewpoints of having economic advantages and
making the surface roughness of a polished object small, thereby
making it possible to efficiently polish the substrate.
[0093] The roll-off reducing agent usable in Embodiment 1 may be
the same ones as those mentioned above.
[0094] The content of the roll-off reducing agent is preferably
from 0.01 to 5% by weight, more preferably from 0.015 to 4% by
weight, still more preferably from 0.03 to 2% by weight, of the
polishing composition of Embodiment 1, from the viewpoints of
reducing roll-off and having economic advantages.
[0095] In addition, the intermediate alumina used in Embodiment 1
is a generic term referring to alumina particles other than
.alpha.-alumnina particles. Concrete examples thereof include
.gamma.-alumina particles, .delta.-alumina particles,
.theta.-alumina particles, .eta.-alumina particles, .kappa.-alumina
particles, and mixtures thereof. Among them, the following
intermediate aluminas are preferable, from the viewpoints of
increase in the polishing rate and the effect of reducing the
surface roughness of a polished object. The crystal forms of the
intermediate alumina preferably include .gamma.-alumina,
.delta.-alumina, .theta.-alumina, and mixtures thereof, more
preferably .gamma.-alumina and .theta.-alumina. In addition, the
intermediate alumina has a specific surface area (BET method) of
preferably from 30 to 300 m.sup.2/g, more preferably from 50 to 200
m.sup.2/g, and an average particle size of preferably from 0.01 to
5 .mu.m, more preferably from 0.05 to 5 .mu.m, still more
preferably from 0.1 to 3 .mu.m, especially preferably from 0.1 to
1.5 .mu.m. The average particle size can be determined as a
volume-average particle size by using a laser diffraction method
(for instance, one commercially available form Horiba, LTD. under
the trade name of LA-920). In addition, the content of each of the
alkali metal and the alkaline earth metal in the intermediate
alumina particles is preferably 0.1% by weight or less, more
preferably 0.05% by weight or less, especially preferably 0.01% by
weight or less.
[0096] For instance, in a case where aluminum hydroxide, an alumina
sol or the like which has a relatively large specific surface area
and a low content of the alkali metal and the alkaline earth metal
is used as a raw material, since there is little fusion of the
intermediate alumina produced and the particle strength is small,
no surface defects are caused on a polished substrate, thereby
making it especially effective in reducing the surface roughness of
a polished object.
[0097] As the raw material which can be used in the preparation of
the intermediate alumina, there can be used, for instance, aluminum
hydroxide, alumina sols, and the like, which can be represented by
the formulas Al(OH).sub.3, Al.sub.2O.sub.3.3H.sub.2O, AlOOH,
Al.sub.2O.sub.3.H.sub.2O, and Al.sub.2O.sub.3.nH.sub.2O, wherein n
is a number of 1 to 3. The specific surface area of the raw
material is preferably 10 m.sup.2/g or more, more preferably 30
m.sup.2/g or more, especially preferably 50 m.sup.2/g or more. In
addition, the content of each of the alkali metal and the alkaline
earth metal in the raw material is preferably 0.1% by weight or
less, more preferably 0.05% by weight or less, especially
preferably 0.03% by weight or less. Further, in a case where an
intermediate alumina is prepared by thermally dehydrating aluminum
hydroxide, a forcible introduction of a dry air or nitrogen gas
during baking is further effective in the reduction of surface
defects and surface roughness of the polished substrate. Here, the
above-mentioned thermal dehydration treatment can be carried out by
a conventional method.
[0098] These intermediate aluminas are adjusted to a given particle
size by wet pulverization or dry pulverization by using a
pulverizer such as a ball-mill, a beads-mill, a high-pressure
homogenizer or a jet mill as occasion demands.
[0099] Since the intermediate alumina is used together with the
abrasive and the roll-off reducing agent mentioned above, the
polishing rate is increased and surface defects such as pits are
prevented, and the reduction in the surface roughness of the
polished substrate can be further accelerated.
[0100] It is desired that the content of the intermediate alumina
in the polishing composition of Embodiment 1 is from 1 to 100 parts
by weight, preferably from 2 to 70 parts by weight, more preferably
from 4 to 40 parts by weight, based on 100 parts by weight of the
abrasive, from the viewpoints of economic advantages, an
accelerated effect of polishing, and an effect of reducing the
surface roughness of the polished substrate, and from the viewpoint
of obtaining capability of preventing surface defects such as
pits.
[0101] Water in the polishing composition of Embodiment 1 is used
as a medium, and the content of water is preferably from 40 to 98%
by weight, more preferably from 50 to 97% by weight, especially
preferably from 60 to 95% by weight, from the viewpoint of being
capable of efficiently polishing the object to be polished.
EMBODIMENT 2
[0102] The polishing composition of Embodiment 2, as described
above, comprises one or more compounds selected from Compounds (A),
one or more compounds selected from Compounds (B), one or more
compounds selected from Compounds (C), an abrasive, and water.
[0103] Compounds (A) usable in Embodiment 2 are the same as the
roll-off reducing agent usable in Embodiment 1 mentioned above.
[0104] The content of Compounds (A) is preferably from 0.01 to 5%
by weight, more preferably from 0.015 to 3% by weight, still more
preferably from 0.03 to 2% by weight, of the polishing composition
of Embodiment 2, from the viewpoint of improving roll-off and from
the viewpoint of having economic advantages.
[0105] Compounds (B) usable in Embodiment 2 have an action of
increasing the polishing rate. Compounds (B) include polycarboxylic
acids having 4 or more carbon atoms and having neither OH group or
groups nor SH group or groups, aminopolycarboxylic acids, amino
acids and salts thereof.
[0106] Among the polycarboxylic acids having 4 or more carbon atoms
and having neither OH group nor groups or SH group or groups, those
having 4 to 20 carbon atoms are preferable, more preferably 4 to 10
carbon atoms, from the viewpoint of increasing the polishing rate.
Also, for the same viewpoint as above, the aminopolycarboxylic
acids preferably have a number of amino groups in one molecule of
from 1 to 6, more preferably from 1 to 4, a number of carboxyl
groups in one molecule of preferably from 1 to 12, more preferably
2 to 8, and a number of carbon atoms of preferably from 1 to 30,
preferably from 1 to 20. For the same viewpoint as above, the amino
acids preferably have a number of carbon atoms of preferably from 2
to 20, preferably from 2 to 10. Among them, polycarboxylic acids
having 4 or more carbon atoms and having neither OH group or groups
nor SH group or groups, aminopolycarboxylic acids, and salts
thereof are preferable, from the viewpoint of increasing the
polishing rate.
[0107] Concrete examples thereof include succinic acid, maleic
acid, fumaric acid, glutaric acid, citraconic acid, itaconic acid,
tricarballylic acid, adipic acid, propane-1,1,2,3-tetracarboxylic
acid, butane-1,2,3,4-tetracarboxylic acid, diglycolic acid,
nitrilotriacetic acid, ethylenediaminetetraacetic acid (EDTA),
diethylenetriaminepentaacetic acid (DTPA),
hydroxyethylethylenediaminetetraacetic acid (HEDTA),
triethylenetetraminehexaacetic acid (TTHA), dicarboxymethylglutamic
acid (GLDA), glycine, alanine, and the like.
[0108] Among them, succinic acid, maleic acid, fumaric acid,
glutaric acid, citraconic acid, itaconic acid, tricarballylic acid,
adipic acid, diglycolic acid, nitrilotriacetic acid,
ethylenediaminetetraacetic acid and diethylenetriaminepentaacetic
acid are preferable, and succinic acid, maleic acid, fumaric acid,
citraconic acid, itaconic acid, tricarballylic acid, diglycolic
acid, ethylenediaminetetraacetic acid and
diethylenetriaminepentaacetic acid are more preferable.
[0109] In addition, the salts of these acids, i.e. salts of
polycarboxylic acids having 4 or more carbon atoms and having
neither OH group or groups nor SH group or groups, salts of
aminopolycarboxylic acids and salts of amino acids, are not
particularly limited. Concretely, there are included salts with a
metal, ammonium, an alkylammonium, an organic amine, and the like.
Concrete examples of the metal include metals belonging to Group
1A, 1B, 2A, 2B, 3A, 3B, 4A, 6A, 7A or 8 of the Periodic Table (long
period form). Among these metals, from the viewpoint of increasing
the polishing rate, the metals belonging to Group 1A, 3A, 3B, 7A or
8 of the Periodic Table are preferable, and the metals belonging to
Group 1A, 3A, 3B or 8 of the Periodic Table are more preferable.
Sodium and potassium belonging to Group 1A, cerium belonging to
Group 3A, aluminum belonging to Group 3B and iron belonging to
Group 8 are most preferable.
[0110] Concrete examples of the alkylammonium include
tetramethylammonium, tetraethylammonium, tetrabutylammonium, and
the like.
[0111] Concrete examples of the organic amine include
dimethylamine, trimethylamine, alkanolamines, and the like.
[0112] Among these salts, ammonium salts, sodium salts, potassium
salts and aluminum salts are especially preferable.
[0113] These compounds of Compounds (B) can be used alone or in
admixture of two or more kinds.
[0114] A total content of Compounds (B) is preferably from 0.01 to
10% by weight, more preferably from 0.02 to 7% by weight, still
more preferably from 0.03 to 5% by weight, of the polishing
composition of Embodiment 2, from the viewpoint of the effect of
accelerating polishing, the viewpoint of economic advantages, and
the viewpoint of improvement in the surface qualities.
[0115] Also, in Embodiment 2, more preferable combinations of
Compounds (A) with Compounds (B) are combinations of one or more
compounds selected from Compounds (A), acetic acid, oxalic acid,
malonic acid, glycolic acid, lactic acid, malic acid, glyoxylic
acid, tartaric acid, citric acid, gluconic acid, and salts thereof,
with one or more compounds selected from Compounds (B), succinic
acid, maleic acid, fumaric acid, glutaric acid, citraconic acid,
itaconic acid, adipic acid, tricarballylic acid, diglycolic acid,
nitrilotriacetic acid, ethylenediaminetetraacetic acid,
diethylenetriaminepentaacetic acid and salts thereof, from the
viewpoints of increasing the polishing rate and reducing roll-off.
Still more preferable are combinations of one or more compounds
selected from Compounds (A), oxalic acid, malonic acid, glycolic
acid, lactic acid, malic acid, glyoxylic acid, tartaric acid,
citric acid, gluconic acid, and salts thereof, with one or more
compounds selected from Compounds (B), succinic acid, maleic acid,
fumaric acid, citraconic acid, itaconic acid, tricarballylic acid,
diglycolic acid, ethylenediaminetetraacetic acid,
diethylenetriaminepentaacetic acid and salts thereof Especially
preferable are combinations of one or more compounds selected from
Compounds (A), glycolic acid, oxalic acid, tartaric acid, citric
acid, malonic acid, and salts thereof, with one or more compounds
selected from Compounds (B), succinic acid, maleic acid, itaconic
acid, fumaric acid, ethylenediaminetetraacetic acid,
diethylenetriaminepentaacetic acid and salts thereof In addition,
in a case where one or more compounds selected from oxalic acid,
malic acid, tartaric acid, citric acid, gluconic acid and salts
thereof are used as Compounds (A), it is preferable, because
clogging of the abrasive grains and polishing grounds in the
polishing pad can be reduced, so that the deterioration of the
polishing properties such as polishing rate and surface qualities
by using the polishing pad for a long period of time can be
prevented.
[0116] In this case, among Compounds (A), oxalic acid, tartaric
acid, citric acid, and salts thereof are preferable, and citric
acid and salts thereof are especially preferable. In addition, in a
case where two or more kinds of Compounds (A) are used in
combination, especially preferable combinations are combinations of
two or more kinds selected from oxalic acid, tartaric acid, citric
acid and salts thereof; or combinations of one or more kinds
selected from oxalic acid, tartaric acid, citric acid and salts
thereof with one or more kinds selected from malonic acid, glycolic
acid, lactic acid, malic acid, gluconic acid and salts thereof.
More preferable combinations are combinations of citric acid or a
salt thereof with one or more kinds selected from oxalic acid,
glycolic acid, lactic acid, malic acid, tartaric acid and salts
thereof. Especially preferable combinations are combinations of
citric acid or a salt thereof with glycolic acid or a salt
thereof.
[0117] Compounds (C) used in Embodiment 2 comprise an intermediate
alumina and alumina sol. The intermediate alumina is a generic term
referring to alumina particles other than .alpha.-alumina
particles. The intermediate alumina may be the same ones as those
usable in Embodiment 1 mentioned above.
[0118] In addition, the alumina sol refers to those which can be
represented by the formulas AlOOH, AlOOH.nH.sub.2O, wherein n is a
number of 1 to 3, for instance, Al.sub.2O.sub.3.H.sub.2O and the
like. The crystal forms of the alumina sol include boehmite,
pseudo-boehmite and amorphous. The alumina sol can be prepared by
subjecting aluminum hydroxide, for instance, gibbsite, to a
hydrothermal treatment at 250.degree. C. or so, or hydrolyzing an
aluminum alcoholate. The alumina sol has an average particle size
of preferably from 0.01 to 5 .mu.m, more preferably from 0.05 to 5
.mu.m, still more preferably from 0.1 to 3 .mu.m, especially
preferably from 0.1 to 1.5 .mu.m. The average particle size can be
determined as a volume-average particle size by using a laser
diffraction method. The alumina sol has a specific surface area
(BET method) of preferably from 30 to 300 m.sup.2/g, more
preferably from 50 to 200 m.sup.2/g.
[0119] Since the intermediate alumina and the alumina sol in
Compounds (C) are used together with Compounds (A) and Compounds
(B), the effects that the polishing rate is increased and surface
defects such as pits are prevented, and the reduction in the
surface roughness of the polished object can be further
accelerated. In this case, the intermediate alumina and the alumina
sol in Compounds (C) can be used alone or in admixture. Especially,
the intermediate alumina is more preferable, from the viewpoints of
an increase in the polishing rate, an extent of the effect of
preventing surface defects and the like, and an effect of reducing
the surface roughness of a polished object.
[0120] A total content of Compounds (C) in the polishing
composition of Embodiment 2 is preferably from 1 to 100 parts by
weight, more preferably from 2 to 70 parts by weight, still more
preferably from 4 to 40 parts by weight, based on 100 parts by
weight of the abrasive, from the viewpoints of economic advantages,
the effect of accelerating polishing, the effect of reducing the
surface roughness of a polished object, and from the viewpoint of
obtaining the capability of preventing surface defects such as
pits.
[0121] As the abrasive usable in Embodiment 2, those abrasives
which are generally used for polishing can be used. The abrasives
may be the same ones as those used in the above-mentioned roll-off
reducing agent composition.
[0122] The content of the abrasive is preferably from 1 to 40% by
weight, more preferably from 2 to 30% by weight, still more
preferably from 3 to 15% by weight, of the polishing composition of
Embodiment 2, from the viewpoints of having economic advantages and
making the surface roughness of a polished object small, thereby
making it possible to efficiently polish the object to be
polished.
[0123] Water in the polishing composition of Embodiment 2 is used
as a medium, and the content of water is preferably from 40 to 98%
by weight, more preferably 50 to 97% by weight, especially
preferably from 60 to 95% by weight, from the viewpoint of being
capable of efficiently polishing the object to be polished.
EMBODIMENT 3
[0124] The polishing composition of Embodiment 3, as described
above, comprises one or more compounds selected from Compounds (A),
one or more compounds selected from Compounds (B), an abrasive, and
water.
[0125] Compounds (A) usable in Embodiment 3 have an action of
improving roll-off caused in the polished substrate, and are the
same ones as those exemplified as Compounds (A) in Embodiment 2
mentioned above can be used.
[0126] The content of Compounds (A) is preferably from 0.01 to 5%
by weight, more preferably from 0.015 to 3% by weight, still more
preferably from 0.03 to 2% by weight, of the polishing composition
of Embodiment 3, from the viewpoints of improving roll-off and
having economic advantages.
[0127] Compounds (B) usable in Embodiment 3 have an action of
increasing the polishing rate, and the same ones as those Compounds
(B) which are used in Embodiment 2 mentioned above can be used.
[0128] The content of Compounds (B) is preferably from 0.01 to 10%
by weight, more preferably from 0.02 to 7% by weight, still more
preferably from 0.03 to 5% by weight, of the polishing composition
of Embodiment 3, from the viewpoint of the effect of accelerating
polishing, the viewpoint of economic advantages, and the viewpoint
of improvement in the surface qualities.
[0129] As to the combinations of Compounds (A) and Compounds (B),
the same ones as those combinations which are mentioned in
Embodiment 2 can be used.
[0130] As the abrasive usable in Embodiment 3, those abrasives
which are generally used for polishing can be used. Examples of the
abrasives may be the same ones as those used in the above-mentioned
roll-off reducing agent composition.
[0131] The content of the abrasive is preferably from 1 to 40% by
weight, more preferably from 2 to 30% by weight, still more
preferably from 3 to 15% by weight, of the polishing composition of
Embodiment 3, from the viewpoints of having economic advantages and
making the surface roughness of a polished object small, thereby
making it possible to efficiently polish the substrate.
[0132] Water in the polishing composition of Embodiment 3 is used
as a medium, and the content of water is preferably from 40 to 98%
by weight, more preferably from 50 to 97% by weight, especially
preferably from 60 to 95% by weight, from the viewpoint of being
capable of efficiently polishing the object to be polished.
[0133] The polishing composition of the present invention, as
representatively exemplified by Embodiments 1 to 3 described above,
can contain other components as occasion demands. As other
components, there are included organic acids and salts other than
the above-mentioned roll-off reducing agent. The other components
include, for instance, organic acids such as polycarboxylic acids,
aminopolycarboxylic acids and amino acids, and salts thereof,
inorganic acids and salts thereof, oxidizing agents, thickeners,
dispersants, anticorrosive agents, basic substances, surfactants,
and the like. Concrete examples of the organic acids and salts
thereof, inorganic acids and salts thereof, and the oxidizing
agents may be the same ones used in the above-mentioned roll-off
reducing agent composition.
[0134] These other components may be used alone or in admixture of
two or more kinds. In addition, the content of the other components
is preferably from 0.05 to 20% by weight, more preferably from 0.05
to 10% by weight, still more preferably from 0.05 to 5% by weight,
of the polishing composition, from the viewpoint of increasing the
polishing rate, from the viewpoint of exhibiting the respective
functions and from the viewpoint of economic advantages.
[0135] The concentration of each component of the above-mentioned
polishing composition is a preferable concentration during
polishing, and it may be a concentration during the preparation of
the composition. The composition is usually prepared as a
concentrate, and the concentrate is diluted upon use in many
cases.
[0136] The process for preparing the polishing composition of the
present invention includes the following:
[0137] The polishing composition of Embodiment 1 can be prepared by
adding together in proper amounts an abrasive, a roll-off reducing
agent, an intermediate alumina, and water, and various additives,
as occasion demands, each of which is exemplified above, and mixing
the components by a known process.
[0138] Also, the polishing composition of Embodiment 2 can be
prepared by adding together in proper amounts Compounds (A),
Compounds (B), Compounds (C), an abrasive, water, and various
additives as occasion demands, each of which is exemplified above,
and mixing the components by a known process.
[0139] In addition, the polishing composition of Embodiment 3 can
be prepared by adding together in proper amounts Compounds (A),
Compounds (B), an abrasive, water, and various additives as
occasion demands, each of which is exemplified above, and mixing
the components by a known process.
[0140] It is preferable that the pH of the polishing composition of
the present invention is appropriately adjusted depending upon the
kinds and the required qualities and the like of the object to be
polished. For instance, the pH of the polishing composition is
preferably from 2 to 12, from the viewpoints of the cleanability of
the substrate and anti-corrosiveness of the working machine, and
from the viewpoint of the safety of the operator. In addition, in a
case where an object to be polished is a substrate for precision
parts which is mainly made of a metal such as an Ni--P plated
aluminum alloy substrate, the pH is more preferably from 2 to 9,
especially preferably from 3 to 8, from the viewpoints of
increasing the polishing rate and improving the surface qualities.
When the polishing composition is used for polishing a
semiconductor wafer, a semiconductor element, or the like,
especially polishing a silicon substrate, a poly-silicon film, an
SiO.sub.2 film, or the like, the pH is preferably from 7 to 12,
more preferably from 8 to 12, especially preferably from 9 to 11,
from the viewpoints of increasing the polishing rate and improving
the surface qualities. The pH can be adjusted by adding properly an
inorganic acid such as nitric acid or sulfuric acid, an organic
acid, or a basic substance such as aqueous ammonia, sodium
hydroxide, potassium hydroxide in a desired amount as occasion
demands.
5. Polishing Process of Substrate to be Polished by Using Polishing
Composition
[0141] The polishing process of a substrate to be polished of the
present invention comprises polishing a substrate to be polished by
using the polishing composition of the present invention, or
preparing a polishing liquid by mixing each component so as to give
the composition of the polishing composition of the present
invention. Especially, the substrate for precision parts can be
suitably produced.
[0142] The material for the object to be polished as
representatively exemplified by the substrate to be polished used
in the present invention may be the same ones as those to which the
above-mentioned roll-off reducing agent composition is used.
Especially, in a case where the polishing composition of the
present invention is used when polishing an aluminum alloy
substrate plated with Ni--P, it is preferable because the roll-off
can be reduced, the polishing rate can be increased, and the
surface roughness of a polished object can be reduced without
causing surface defects.
[0143] The shape for the object to be polished is not particularly
limited, and may be the same ones as those for the above-mentioned
roll-off reducing agent composition.
[0144] The polishing composition of the present invention can be
favorably used in polishing the substrate for precision parts. For
instance, the polishing composition is suitable for polishing
substrates for magnetic recording media for magnetic discs, optical
discs, opto-magnetic discs, and the like; photomask substrates,
optical lenses, optical mirrors, optical prisms and semiconductor
substrates. The polishing of the semiconductor substrates comprises
the steps of polishing a silicon wafer (bare wafer), forming
separation membrane for an embedding element, flattening an
interlayer insulating film, forming an embedded metal line, and
forming embedded capacitor, and the like. The polishing composition
of the present invention is especially suitable for polishing a
magnetic disc substrate. Among the magnetic disc substrates,
aluminum magnetic disc substrates plated with Ni--P can be
especially suitably used.
6. Process for Producing Polished Substrate by Using Polishing
Composition
[0145] In addition, a process for producing a polished substrate by
using the polishing composition of the present invention includes,
for instance, a process comprising clamping a substrate to be
polished with polishing discs to which a polishing cloth made of
nonwoven organic polymer fabric, is pasted; feeding a polishing
composition of the present invention to a polishing surface; and
moving the polishing discs or the substrate, with applying a given
pressure, thereby reducing roll-off and surface roughness of the
polished object, to give a substrate without surface defects. Here,
the roll-off generated in the polished substrate in the present
invention can be evaluated in the same manner as described
above.
[0146] As described above, by using the polishing composition of
the present invention, a high-quality substrate with reduced
surface roughness and reduced roll-off as well as increased
polishing rate can be produced with high production efficiency
without generating surface defects on the polished substrate. In
addition, when a polishing composition comprising one or more
compounds selected from oxalic acid, malic acid, tartaric acid,
citric acid, gluconic acid and salts thereof is used, it is
preferable because clogging of the abrasive grains and polishing
grounds in the polishing pad can be reduced, so that the
deterioration of the polishing properties such as polishing rate
and surface qualities by using the polishing pad for a long period
of time can be prevented.
[0147] In this case, among the above-mentioned compounds, oxalic
acid, tartaric acid, citric acid and salts thereof are preferable,
and especially citric acid and salts thereof are preferable. When
these compounds are used in combination of two or more kinds,
especially preferable combinations are combinations of two or more
kinds selected from oxalic acid, tartaric acid, citric acid and
salts thereof, or combinations of one or more kinds selected from
oxalic acid, tartaric acid, citric acid and salts thereof with one
or more kinds selected from malonic acid, glycolic acid, lactic
acid, malic acid, gluconic acid and salts thereof. More preferable
are combinations of citric acid or a salt thereof with one or more
kinds selected from oxalic acid, glycolic acid, lactic acid, malic
acid, tartaric acid and salts thereof. Especially preferable
combinations are combinations of citric acid or a salt thereof with
glycolic acid or a salt thereof.
[0148] The polishing composition of the present invention
especially has an effect in the polishing process, and the
polishing composition can be similarly applied to a process other
than the polishing process, for instance, a lapping process, and
the like.
EXAMPLES
Examples I-1 to I-10 and Comparative Examples I-1 to I-5
[0149] There were mixed together 7 parts by weight of an abrasive
[.alpha.-alumina (purity: about 99.9%) having primary average
particle size: 0.23 .mu.m, and secondary average particle size: 0.5
.mu.m], a given amount of a roll-off reducing agent used in
Examples or a compound used in Comparative Examples as listed in
Table 1, and balance ion-exchanged water, with stirring. Here, the
pH of each composition in Examples I-1 to I-10 and Comparative
Examples I-2 to I-4 was adjusted to 4 with an aqueous ammonia, and
the pH of each composition in Comparative Examples I-1 and I-5 was
adjusted to 4 with nitric acid, to give 100 parts by weight of each
roll-off reducing agent composition of Examples I-1 to I-10 and
Comparative Examples I-1 to I-5.
[0150] Using each of the resulting roll-off reducing agent
compositions, a substrate surface made of an Ni--P plated aluminum
alloy, the substrate surface having an average deviation, of all
points from plane fit to test part surface Ra of 0.2 .mu.m, as
determined by Talystep commercially available from Rank
Taylor-Hobson Limited (size of tip end of profilometer: 25
.mu.m.times.25 .mu.m, by-pass filter: 80 .mu.m, measurement length:
0.64 mm), a thickness of 0.8 mm and a diameter of 95 mm was
polished with a double-sided processing machine under Set
Conditions I for Double-Sided Processing Machine given below, to
give a polished Ni--P plated, aluminum alloy substrate usable for
magnetic recording media.
[0151] Set Conditions I for Double-Sided Processing Machine are as
follows.
Set Conditions I for Double-Sided Processing Machine
[0152] Double-sided processing machine: double-sided processing
machine, Model 9B, manufactured by SPEEDFAM CO., LTD. [0153]
Processing pressure: 9.8 kPa [0154] Polishing Pad: "POLYTEX DG-H"
(manufactured by Rodel Nitta K.K.). [0155] Disc rotational speed:
50 r/min [0156] Feeding flow rate for a polishing composition: 100
ml/min [0157] Polishing time period: 5 minutes [0158] Number of
substrate introduced; 10
[0159] After polishing, the value of roll-off generated in the
polished substrate was determined by the method described below,
and expressed as a relative value on the basis of the value of
Comparative Example I-2. Also, the thickness of an Ni--P plated
aluminum alloy substrate of Examples was determined by using a
thickness tester (a laser thickness tester, commercially available
from Mitsutoyo Corporation, Model LGH-110/LHC-11IN). A rate of
decrease in the thickness was obtained from the changes in the
thickness of the aluminum alloy substrate before and after
polishing, and expressed as a relative value (relative polishing
rate) on the basis of the polishing rate of Comparative Example
I-1.
[0160] The results are shown in Table 1. [0161] Method for
Determination of Roll-off [0162] Determination device: Mitsutoyo
form tracer SV-C624 [0163] Tip end radius of profilometer: 2 .mu.m
(Code No. 178-381) [0164] Pressure at profilometer: 0.7 mN or less
[0165] 5 Speed: 0.2 mm/s [0166] Analyzing software: SV-600 Fine
Profile Analysis System, Version 1.01 [0167] Filter: LPF (Gaussian)
0.800 mm
[0168] Using the device as specified above, the shape of the end
part of the disc at 42.5 mm to 47.5 mm away from the center of the
disc was determined, and D was obtained by using an analyzing
software in accordance with the above determination method by
taking points A, B and C at 43 mm away from the center of the disc,
at 47 mm away from the center, and at 45 mm away from the center,
respectively. The value obtained by dividing D by 1/2 the amount of
change of thickness of the disc before and after polishing is
defined as the roll-off value. TABLE-US-00001 TABLE 1 Polishing
Amount Roll-Off Rate (Parts by (Relative (Relative Added Compound
Weight) Value) Value) Ex. No. I-1 Lactic Acid 0.81 0.54 1.6 I-2
Glycolic Acid 0.69 0.23 1.4 I-3 Tartaric Acid 0.68 0.24 1.3 I-4
Citric Acid 0.58 0.41 1.5 I-5 Malic Acid 0.61 0.43 1.3 I-6
Glyoxylic Acid 0.83 0.34 1.3 I-7 Oxalic Acid 0.29 0.14 1.1 I-8
Malonic Acid 0.47 0.15 1.1 I-9 Acetic Acid 0.54 0.61 1.2 I-10
Glycolic Acid 0.69 0.21 1.4 Citric Acid 0.10 Comp. Ex. No. I-1 None
-- Undeter- 1.0 minable #1 I-2 Aluminum Nitrate 0.60 1.0 #2 -- I-3
Succinic Acid 0.53 0.83 -- I-4 Aluminumammonium 0.83 1.54 --
Ethylenediamine- tetraacetate I-5 Glycine 0.68 0.93 -- #1: Ski jump
was caused, so that the roll-off was undeterminable. #2: The
roll-off value was 0.31 .mu.m/.mu.m.
[0169] It is clear from the results in Table 1 that all of the
roll-off reducing agent compositions obtained in Examples I-1 to
I-10 have remarkably reduced roll-off, as compared to the roll-off
reducing agent composition obtained in Comparative Examples I-1 to
1-5. Also, it is also found that the roll-off reducing agent
compositions of Examples I-1 to I-10 each of which comprises the
roll-off reducing agent of the present invention have increased
polishing rates, as compared with that of Comparative Example
I-1.
[0170] Further, the roll-off reducing agent composition prepared in
each of Example I-4, Example I-10 and Comparative Example I-3 was
subjected to polishing evaluation mentioned above for 20 repeated
times, and a ratio of a twentieth relative polishing rate to the
first relative polishing rate was determined as a measure for an
ability of preventing pad clogging. As a result, the ratio of a
twentieth relative polishing rate to the first relative polishing
rate in the roll-off reducing agent composition of Example I-4 was
0.97, the ratio in the roll-off reducing agent composition of
Example I-10 was 0.95, and the ratio in the composition of
Comparative Example I-3 was 0.62.
[0171] It is clear from the evaluation results of ability of
preventing pad clogging for Examples I-4 and I-10 and Comparative
Example I-3 that Examples I-4 and I-10 exhibit little deterioration
in the polishing rate as compared to that in Comparative Example
I-3, thereby exhibiting an excellent ability for preventing pad
clogging.
Preparation Example II-1 for Intermediate Alumina
[0172] An alumina vessel (200 mm in length.times.100 mm in
width.times.100 mm in height) was charged with 100 g of
pseudo-boehmite particles having an average particle size of 25
.mu.m, a specific surface area of 250 m.sup.2/g, an alkali metal
content of 0.003% by weight, and an alkaline earth metal content of
0.01% by weight. The pseudo-boehmite particles were heated in a
muffle furnace at a heating rate of 50.degree. C./minute, and baked
at a baking temperature of 930.degree. C. for 4 hours with nitrogen
gas stream at a flow rate of 5 L/minute, to give an intermediate
alumina. The intermediate alumina was transferred to a 2-L alumina
ball-mill, and ion-exchanged water was added thereto to prepare a
30% by weight slurry. Thereafter, alumina balls of 3 mm in
diameters were introduced into the ball-mill to disrupt the slurry,
to prepare intermediate alumina particles. The prepared
intermediate alumina particles were found to have the crystal form
of .gamma.-alumina by analysis of X-ray diffraction peaks, and had
an average particle size of 0.3 .mu.m, a specific surface area of
150 m.sup.2/g, an alkali metal content of 0.005% by weight, and an
alkaline earth metal content of 0.01% by weight.
Examples II-1 to II-6 and Comparative Examples II-1 to II-5
[0173] There were mixed together an abrasive [.alpha.-alumina
(purity: about 99.9%) having primary average particle size: 0.25
.mu.m and secondary average particle size: 0.8 .mu.m], a roll-off
reducing agent, an intermediate alumina (.gamma.-alumina) obtained
in Preparation Examples II-1, and balance ion-exchanged water, to
give a composition as shown in Table 2 with stirring. Here, the pH
of each composition in Examples II-1 to II-5 and Comparative
Examples II-2, II-3 and II-5 was adjusted to 4.0 with an aqueous
ammonia, and the pH of each composition in Comparative Examples
II-1 and II-4 was adjusted to 4.0 with nitric acid, to give 100
parts by weight of each polishing composition of Examples II-1 to
II-6 and Comparative Examples II-1 to II-5. TABLE-US-00002 TABLE 2
.alpha.-Alumina Roll-Off Amount Intermediate Amount (Parts by
Reducing (Parts by Alumina or (Parts by Weight) Agent Weight)
Alumina Sol.sup.1) Weight Example No. II-1 7 Glycolic Acid 0.15
Intermediate 1 Alumina II-2 7 Malic Acid 0.15 Intermediate 1
Alumina II-3 7 Tartaric Acid 0.15 Intermediate 1 Alumina II-4 7
Malonic Acid 0.15 Intermediate 1 Alumina II-5 7 Citric Acid 0.15
Intermediate 1 Alumina II-6 7 Glycolic Acid 0.15 Intermediate 1
Alumina Citric Acid 0.05 Comparative Example No. II-1 7 None --
None -- II-2 7 Diammonium 0.15 Intermediate 1 Ethylenediamine-
Alumina tetraacetate II-3 7 Succinic Acid 0.15 Alumina Sol 1 II-4 7
Gluconic Acid 0.15 Alumina Sol 1 II-5 7 Glycolic Acid 0.15 Alumina
Sol 1 .sup.1)Commercially available from Nissan Chemical
Industries, Ltd, under the trade name of Alumina Sol-200
[0174] Using each of the resulting polishing compositions, a
substrate surface made of an Ni--P plated aluminum alloy, the
substrate surface having an average deviation, of all points from
plane fit to test part surface Ra of 0.2 .mu.m, as determined by
the following method, a thickness of 0.8 mm and a diameter of 95 mm
was polished with a double-sided processing machine under Set
Conditions II for Double-Sided Processing Machine given below, to
give a polished Ni--P plated, aluminum alloy substrate usable for
magnetic recording media.
[0175] Set Conditions II for Double-Sided Processing Machine are as
follows.
Set Conditions II for Double-Sided Processing Machine
[0176] Double-sided processing machine: double-sided processing
machine, Model 9B, manufactured by SPEEDFAM CO., LTD. [0177]
Processing pressure: 9.8 kPa [0178] Polishing Pad: "POLYTEX DG-H"
(manufactured by Rodel Nitta K.K.). [0179] Disc rotational speed:
55 r/min [0180] Feeding flow rate for a polishing composition: 100
mL/min [0181] Polishing time period: 4 minutes [0182] Number of
substrate introduced: 10
[0183] After polishing, the thickness of an Ni--P plated aluminum
alloy substrate of Examples was determined by using a thickness
tester (a laser thickness tester, commercially available from
Mitsutoyo Corporation, Model LGH-110/LHC-11N). A rate of decrease
in the thickness was obtained from the changes in the thickness of
the aluminum alloy substrate before and after polishing, and
expressed as a relative value (relative polishing rate) on the
basis of the polishing rate of Comparative Example II-1.
[0184] In addition, the surface roughness (average deviation, of
all points from plane fit to test part surface Ra) and pits
(surface defects) of each substrate after polishing were determined
in accordance with the following methods, and roll-off was
determined in the same manner as above. Here, the average
deviation, of all points from plane fit to test part surface Ra was
obtained as a relative value (relative roughness) on the basis of
the surface roughness of Comparative Example II-1. In addition, the
roll-off was obtained as a relative value (relative roll-off) on
the basis of the roll-off value of Comparative Example II-2. The
results are shown in Table 3.
[Average Deviation, of All Points from Plane Fit to Test Part
Surface Ra]
[0185] Determined under the following conditions by using Talystep
commercially available from Rank Taylor-Hobson Limited [0186] Size
of tip end of profilometer: 25 .mu.m.times.25 .mu.m [0187] By-pass
filter: 80 .mu.m [0188] Measurement length: 0.64 mm [Surface
Defects (Pits)]
[0189] The surface of each substrate was observed with an optical
microscope (differential interference microscope) at a
magnification of 200 times at an interval of 30.degree. for 12
locations, and the number of pits was counted and evaluated as
follows: [0190] S: 0 [0191] A: 1 to 3 [0192] B: 4 to 10
[0193] C: 10 or more TABLE-US-00003 TABLE 3 Evaluation of
Properties Polishing Surface Surface Rate Roughness Defects
Roll-Off (-) (-) (Pits) (-) Example No. II-1 1.6 0.68 S 0.21 II-2
1.7 0.65 S 0.23 II-3 1.6 0.70 S 0.24 II-4 1.4 0.65 S 0.25 II-5 1.7
0.72 S 0.25 II-6 1.6 0.70 S 0.20 Comparative Example No. II-1 1 1 C
Undeter- minable*.sup.1 II-2 1.6 0.70 S 1*.sup.2 II-3 1.5 1.2 A
0.83 II-4 1.4 1.1 A 0.40 II-5 1.1 1.1 A 0.25 *.sup.1Ski jump was
caused, so that the roll-off was undeterminable. *.sup.2The
roll-off value was 0.36 .mu.m/.mu.m.
[0194] It is clear from the results in Table 3 that all of the
polishing compositions obtained in Examples II-1 to II-6 have high
polishing rates, and especially as compared with the polishing
compositions obtained in Comparative Examples II-1 to II-5, the
polishing compositions obtained in Examples II-1 to II-6 have
reduced surface roughness, no surface defects, and markedly reduced
roll-off in the polished substrate.
[0195] Further, the polishing composition prepared in each of
Example II-5, Example II-6 and Comparative Example II-3 was
subjected to polishing evaluation mentioned above for 20 repeated
times, and a ratio of a twentieth relative polishing rate to the
first relative polishing rate was determined as a measure for an
ability of preventing pad clogging. As a result, the ratio of a
twentieth relative polishing rate to the first relative polishing
rate in the polishing composition of Example II-5 was 0.91, the
ratio in the polishing composition of Example II-6 was 0.90, and
the ratio in t he polishing composition of Comparative Example II-3
was 0.50.
[0196] It is clear from the evaluation results of ability of
preventing pad clogging for the polishing compositions of Examples
II-5 and II-6 exhibit excellent ability for preventing pad
clogging, as compared with that of Comparative Example II-3.
Preparation Example II-1 for Intermediate Alumina
[0197] An alumina vessel (200 mm in length.times.100 mm in
width.times.100 mm in height) was charged with 100 g of
pseudo-boehmite particles having an average particle size of 15
.mu.m, a specific surface area of 240 m.sup.2/g, an alkali metal
content of 0.002% by weight, and an alkaline earth metal content of
0.01% by weight. The pseudo-boehmite particles were heated in a
muffle furnace at a heating rate of 50.degree. C./minute, and baked
at a baking temperature of 900.degree. C. for 4 hours with nitrogen
gas stream at a flow rate of 5 L/minute, to give an intermediate
alumina. The intermediate alumina was transferred to a 2-L alumina
ball-mill, and ion-exchanged water was added thereto to prepare a
30% by weight slurry. Thereafter, alumina balls of 3 mm in
diameters were introduced into the ball-mill to disrupt the slurry,
to prepare intermediate alumina particles. The prepared
intermediate alumina particles were found to have the crystal form
of .gamma.-alumina by analysis of X-ray diffraction peaks, and had
an average particle size of 0.3 .mu.m, a specific surface area of
120 m.sup.2/g, an alkali metal content of 0.003% by weight, and an
alkaline earth metal content of 0.01% by weight.
Examples III-1 to III-8 and Comparative Examples III-1 to III-5
[0198] There were mixed together an abrasive [.alpha.-alumina
(purity: about 99.9%) having primary average particle size: 0.25
.mu.m, and secondary average particle size: 0.65 .mu.m], Compounds
(A), Compounds (B), Compounds (C) [an intermediate alumina
(.gamma.-alumina) obtained in Preparation Examples III-1 or an
alumina sol (boehmite)], and balance ion-exchanged water, to give a
composition as shown in Table 4 with stirring. Here, the pH of each
composition in Examples III-1 to III-8 and Comparative Examples
III-1 to III-5 was adjusted to 4.0 or 7.0 with nitric acid or an
aqueous ammonia, to give 100 parts by weight of each polishing
composition of Examples III-1 to III-8 and Comparative Examples
III-1 to III-5. TABLE-US-00004 TABLE 4 Compounds (A) Compounds (B)
Compounds (C) .alpha.-Alumina Amount Amount Amount (parts by (parts
by (parts by (parts by weight) Compound weight) Compound weight)
Compound weight) pH Ex. No. III-1 7 Glycolic 0.15 Aluminumammonium
ethylene- 0.8 Intermediate 1 4 acid diaminetetraacetate Alumina
III-2 7 Glycolic 0.15 Maleic acid 0.5 Intermediate 1 7 acid Alumina
III-3 7 Oxalic 0.15 Itaconic acid 0.5 Intermediate 1 7 acid Alumina
III-4 7 Tartaric 0.15 Fumaric acid 0.5 Intermediate 1 7 acid
Alumina III-5 7 Citric 0.15 Succinic acid 0.5 Intermediate 1 7 acid
Alumina III-6 7 Glycolic 0.15 Diammonium ethylenediamine 0.8
Alumina Sol*.sup.1 1.5 4 acid tetraacetate III-7 7 Glycolic 0.15
Glycine 0.5 Intermediate 1 7 acid Alumina III-8 7 Glycolic 0.15
Aluminumammonium ethylene- 0.8 Intermediate 1 4 acid
diaminetetraacetate Alumina Citric 0.05 acid Comp. Ex. No. III-1 7
None -- None -- None -- 4 III-2 7 None -- Aluminumammonium 0.8
Intermediate 1 4 ethylene- Alumina diaminetetraacetate III-3 7
Glycolic 0.15 Aluminumammonium ethylene- 0.8 None -- 4 acid
diaminetetraacetate III-4 7 Glycolic 0.15 None -- Intermediate 1 7
acid Alumina III-5 7 None -- Diammonium ethylenediamine 0.8 Alumina
Sol*.sup.1 1.5 4 tetraacetate *.sup.1Commercially available from
Nissan Chemical Industries, Ltd. under the trade name of Alumina
Sol-200.
[0199] Using each of the resulting polishing compositions, a
substrate surface made of an Ni--P plated aluminum alloy, the
substrate surface having an average deviation, of all points from
plane fit to test part surface Ra of 0.2 .mu.m, as determined by
the method described above, a thickness of 0.8 mm and a diameter of
95 mm was polished with a double-sided processing machine under Set
Conditions II for Double-Sided Processing Machine given above, to
give a polished Ni--P plated, aluminum alloy substrate usable for
magnetic recording media.
[0200] After polishing, the thickness of the aluminum alloy
substrate of Examples was determined by using a thickness tester (a
laser thickness tester, commercially available from Mitsutoyo
Corporation, Model LGH-110/LHC-11N). A rate of decrease in the
thickness was obtained from the changes in the thickness of an
Ni--P plated aluminum alloy substrate before and after polishing,
and expressed as a relative value (relative polishing rate) of
Comparative Example III-1.
[0201] In addition, the surface roughness (average deviation, of
all points from plane fit to test part surface Ra), pits, and
roll-off of each substrate after polishing were determined in the
same manner in accordance with the methods described above. Here,
the average deviation, of all points from plane fit to test part
surface Ra was obtained as a relative value (relative roughness) on
the basis of the surface roughness of Comparative Example III-1. In
addition, the roll-off was obtained as a relative value (relative
roll-off) on the basis of the roll-off value of Comparative Example
III-2. The results are shown in Table 5. TABLE-US-00005 TABLE 5
Evaluation of Properties Polishing Surface Surface Rate Roughness
Defects Roll-Off (-) (-) (Pits) (-) Ex. No. III-1 2.3 0.70 S 0.26
III-2 2.5 0.75 S 0.28 III-3 2.3 0.67 S 0.30 III-4 2.4 0.71 S 0.31
III-5 2.3 0.68 S 0.31 III-6 1.8 0.95 A 0.31 III-7 2.0 0.83 S 0.42
III-8 2.4 0.74 S 0.25 Comp. Ex. No. III-1 1.0 1.0 C Undeter-
minable* III-2 2.2 0.76 S 1.0 III-3 1.8 1.80 B 0.29 III-4 1.4 0.65
S 0.28 III-5 1.7 0.92 A 1.05 *Undeterminable due to generation of
ski jump.
[0202] It is clear from the results in Table 5 that all of the
polishing compositions obtained in Examples III-1 to III-8 are
excellent, simultaneously satisfying all of effects of increasing
polishing rates, effects of reducing surface defects such as pits,
effects of reducing surface roughness and effects of reducing
roll-off, as compared with those of the polishing compositions
obtained in Comparative Examples III-1 to III-5.
[0203] Further, the polishing composition prepared in each of
Example III-5, Example III-8 and Comparative Example III-2 was
subjected to polishing evaluation mentioned above for 20 repeated
times, and a ratio of a twentieth relative polishing rate to the
first relative polishing rate was determined as a measure for an
ability of preventing pad clogging. As a result, the ratio of a
twentieth relative polishing rate to the first relative polishing
rate in the polishing composition of Example III-5 was 0.91, the
ratio in the polishing composition of Example III-8 was 0.90, and
the ratio in the polishing composition of Comparative Example III-2
was 0.48.
[0204] It is clear from the evaluation results of ability of
preventing pad clogging for the polishing compositions of Examples
III-5 and III-8 exhibit excellent ability for preventing pad
clogging, as compared with that of Comparative Example III-2.
Examples IV-1 to IV-7 and Comparative Examples IV-1 to IV-3
[0205] There were mixed together an abrasive [a-alumina (purity:
about 99.9%) having primary average particle size: 0.23 .mu.m, and
secondary average particle size: 0.6 .mu.m], Compounds (A),
Compounds (B), and ion-exchanged water, and other components as
occasion demands, to give a composition as shown in Table 6 with
stirring. Here, the pH of each composition in Examples IV-1 to IV-7
and Comparative Examples IV-2 to IV-3 was adjusted with nitric
acid, and the pH of the composition in Comparative Example IV-1 was
adjusted with an aqueous ammonia, to a pH of 4.0 or 7.0, to give
100 parts by weight of each polishing composition of Examples IV-1
to IV-7 and Comparative Examples IV-1 to IV-3.
[0206] Using each of the resulting polishing compositions, a
substrate surface made of an Ni--P plated aluminum alloy, the
substrate surface having an average deviation, of all points from
plane fit to test part surface Ra of 0.2 .mu.m, as determined by
the method described above, a thickness of 0.8 mm and a diameter of
95 mm was polished with a double-sided processing machine under Set
Conditions II for Double-Sided Processing Machine given above, to
give a polished Ni--P plated, aluminum alloy substrate usable for
magnetic recording media.
[0207] After polishing, the thickness of the aluminum alloy
substrate of Examples was determined by using a thickness tester (a
laser thickness tester, commercially available from Mitsutoyo
Corporation, Model LGH-110/LHC-11N). A rate of decrease in the
thickness was obtained from the changes in the thickness of an
Ni--P plated aluminum alloy substrate before and after polishing,
and expressed as a relative value (relative polishing rate) of
Comparative Example IV-1.
[0208] In addition, the surface roughness (average deviation, of
all points from plane fit to test part surface Ra) and roll-off of
each substrate after polishing were determined in the same manner
in accordance with the methods described above. Here, the roll-off
was obtained as a relative value (relative roll-off) on the basis
of the roll-off value of Comparative Example IV-2. The results are
shown in Table 6. TABLE-US-00006 TABLE 6 Compounds (A) Compounds
(B) .alpha.-Alumina Amount Amount Others Evaluation of Properties
(parts by (parts by (parts by (parts by Polishing weight) Compound
weight) Compound weight) weight) pH Rate Roll-Off Ex. No. IV-1 7
Glycolic 0.15 Aluminumammonium 0.8 -- 4 1.9 0.21 acid
ethylenediamine- tetraacetate IV-2 7 Glycolic 0.15 Maleic acid 0.5
-- 7 2.1 0.22 acid IV-3 7 Tartaric 0.15 Itaconic acid 0.5 -- 7 1.9
0.24 acid IV-4 7 Malonic 0.15 Fumaric acid 0.5 -- 7 1.9 0.27 acid
IV-5 7 Citric 0.15 Diglycolic acid 0.5 -- 7 2.0 0.24 acid IV-6 7
Glycolic 0.15 Diammonium 0.8 -- 4 1.9 0.25 acid ethylenediamine-
tetraacetate IV-7 7 Glycolic 0.15 Maleic acid 0.5 -- 7 2.0 0.21
acid Citric 0.05 acid Comparative Examples IV-1 7 None -- None --
-- 4 1 Undeter- minable.sup.1) IV-2 7 None -- Aluminumammonium 0.8
-- 4 1.8 1.sup.3) ethylenediamine- tetraacetate IV-3 7 None --
Succinic acid 0.6 Alumina 4 1.5 0.90 Sol.sup.2) (0.4)
.sup.1)Undeterminable due to generation of ski jump.
.sup.2)Commercially available from Nissan Chemical Industries, Ltd.
under the trade name of Alumina Sol-200. .sup.3)The roll-off value
was 0.37 .mu.m/.mu.m.
[0209] It is clear from the results in Table 6 that all of the
polishing compositions obtained in Examples IV-1 to IV-7 have high
polishing rates, and markedly reduced roll-off in the polished
substrate, as compared with the polishing compositions obtained in
Comparative Examples IV-1 to IV-3.
[0210] Further, the polishing composition prepared in each of
Example IV-5, Example IV-7 and Comparative Example IV-3 was
subjected to polishing evaluation mentioned above for 20 repeated
times, and a ratio of a twentieth relative polishing rate to the
first relative polishing rate was determined as a measure for an
ability of preventing pad clogging. As a result, the ratio of a
twentieth relative polishing rate to the first relative polishing
rate in the polishing composition of Example IV-5 was 0.95, the
ratio in the polishing composition of Example IV-7 was 0.92, and
the ratio in the polishing composition of Comparative Example IV-3
was 0.55.
[0211] It is clear from the evaluation results of ability of
preventing pad clogging for the polishing compositions of Examples
IV-5 and IV-7 exhibit excellent ability for preventing pad
clogging, as compared with that of Comparative Example IV-3.
[0212] By polishing a substrate for precision parts or the like
with the roll-off reducing agent of the present invention, there
can be exhibited excellent effects that the roll-off of the
polished substrate can be remarkably reduced, and that the
polishing rate can be increased.
[0213] In addition, by polishing a substrate for precision parts or
the like with the polishing composition of the present invention,
there can be exhibited excellent effects that the roll-off and the
surface roughness of the polished substrate are remarkably
reduced.
Equivalents
[0214] The present invention being thus described, it will be
obvious that the same may be varied in many ways. Such variations
are not to be regarded as a departure from the spirit and scope of
the invention, and all such modifications as would be obvious to
one skilled in the art are intended to be included within the scope
of the following claims.
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