U.S. patent application number 11/426130 was filed with the patent office on 2007-01-11 for liquid crystal device, method of manufacturing liquid crystal device, and electronic apparatus.
This patent application is currently assigned to SANYO EPSON IMAGING DEVICES CORPORATION. Invention is credited to Masahiro HORIGUCHI.
Application Number | 20070008466 11/426130 |
Document ID | / |
Family ID | 37618001 |
Filed Date | 2007-01-11 |
United States Patent
Application |
20070008466 |
Kind Code |
A1 |
HORIGUCHI; Masahiro |
January 11, 2007 |
LIQUID CRYSTAL DEVICE, METHOD OF MANUFACTURING LIQUID CRYSTAL
DEVICE, AND ELECTRONIC APPARATUS
Abstract
A liquid crystal device includes display pixels which correspond
to at least a color of white or non-coloring and one color
different from the color of white or non-coloring, each of the
display pixels corresponding to one color having a transmissive
region and a reflective region, and each of the display pixels
corresponding to the color of white or non-coloring having only a
transmissive region, a substrate, a counter substrate which is
disposed so as to be opposite to the substrate, colored layers
which are provided in the display pixels of the substrate or the
counter substrate corresponding to one color,
cell-thickness-adjusting layers which are provided in the substrate
or the counter substrate and included in the reflective region of
each of the display pixels corresponding to one color and the
transmissive region of each of the display pixels corresponding to
the color of white or non-coloring, and a liquid crystal layer
which is interposed between the substrate and the counter
substrate, the thickness of the layer crystal layer that
corresponds to the transmissive region of each of the display
pixels corresponding to one color is larger than the thickness of
the liquid crystal layer that corresponds to the reflective region
of each of the display pixels corresponding to one color according
to the thickness of the cell-thickness-adjusting layer.
Inventors: |
HORIGUCHI; Masahiro;
(Azumino, JP) |
Correspondence
Address: |
HARNESS, DICKEY & PIERCE, P.L.C.
P.O. BOX 828
BLOOMFIELD HILLS
MI
48303
US
|
Assignee: |
SANYO EPSON IMAGING DEVICES
CORPORATION
4-1, Hamamatsu-cho, 2-chome
Tokyo
JP
|
Family ID: |
37618001 |
Appl. No.: |
11/426130 |
Filed: |
June 23, 2006 |
Current U.S.
Class: |
349/113 |
Current CPC
Class: |
G02F 1/133555 20130101;
G02F 1/133514 20130101; G02F 2201/52 20130101; G02F 1/133371
20130101 |
Class at
Publication: |
349/113 |
International
Class: |
G02F 1/1335 20060101
G02F001/1335 |
Foreign Application Data
Date |
Code |
Application Number |
Mar 29, 2006 |
JP |
2006-90365 |
Jul 6, 2005 |
JP |
2005-197074 |
Claims
1. A liquid crystal device comprising: display pixels which
correspond to at least a color of white or non-coloring and one
color different from the color of white or non-coloring, each of
the display pixels corresponding to one color having a transmissive
region and a reflective region, and each of the display pixels
corresponding to the color of white or non-coloring having only a
transmissive region; a substrate; a counter substrate which is
disposed so as to be opposite to the substrate; colored layers
which are provided in the display pixels of the substrate or the
counter substrate corresponding to one color;
cell-thickness-adjusting layers which are provided in the substrate
or the counter substrate and included in the reflective region of
each of the display pixels corresponding to one color and the
transmissive region of each of the display pixels corresponding to
the color of white or non-coloring; and a liquid crystal layer
which is interposed between the substrate and the counter
substrate, the thickness of the layer crystal layer that
corresponds to the transmissive region of each of the display
pixels corresponding to one color being larger than the thickness
of the liquid crystal layer that corresponds to the reflective
region of each of the display pixels corresponding to one color
according to the thickness of the cell-thickness-adjusting
layer.
2. A liquid crystal device comprising: display pixels which
correspond to at least a color of white or non-coloring and one
color different from the color of white or non-coloring, each of
the display pixels corresponding to one color and each of the
display pixels corresponding to the color of white or non-coloring
having a transmissive region and a reflective region; a substrate;
a counter substrate which is disposed so as to be opposite to the
substrate; colored layers which are provided in the display pixels
of the substrate or the counter substrate corresponding to one
color; cell-thickness-adjusting layers which are provided in the
substrate or the counter substrate, and included in at least the
reflective region of each of the display pixels corresponding to
one color and the transmissive region and the reflective region of
each of the display pixels corresponding to the color of white or
non-coloring, the thickness of the cell-thickness-adjusting layer
in the reflective region of each of the display pixels
corresponding to the color of white or non-coloring being larger
than the thickness of the cell-thickness-adjusting layer in the
transmissive region of each of the display pixels corresponding to
the color of white or non-coloring; and a liquid crystal layer
which is interposed between the substrate and the counter
substrate, the thickness of the liquid crystal layer that
corresponds to the transmissive region of each of the display
pixels corresponding to one color and the display pixels
corresponding to the color of white or non-coloring being larger
than the thickness of the liquid crystal layer that corresponds to
the reflective region of each of the display pixels corresponding
to one color and the display pixels corresponding to the color of
white or non-coloring according to the thickness of the
cell-thickness-adjusting layer.
3. The liquid crystal device according to claim 1, wherein, in the
display pixels corresponding to one color and the display pixels
corresponding to the color of white or non-coloring, the
cell-thickness-adjusting layers, each of which is made of the same
material, are provided.
4. The liquid crystal device according to claim 1, wherein the
thickness of the cell-thickness-adjusting layer that is provided in
the reflective region of each of the display pixels corresponding
to one color is equal to the thickness of the
cell-thickness-adjusting layer that is provided in the transmissive
region of each of the display pixels corresponding to the color of
white or non-coloring.
5. The liquid crystal device according to claim 1, wherein the
thickness of the liquid crystal layer that corresponds to the
transmissive region of each of the display pixels corresponding to
one color is equal to the thickness of the liquid crystal layer
that corresponds to the transmissive region of each of the display
pixels corresponding to the color of white or non-coloring.
6. The liquid crystal device according to claim 1, wherein the
thickness of the colored layer that corresponds to the transmissive
region is larger than the thickness of the colored layer that
corresponds to the reflective region.
7. The liquid crystal device according to claim 1, wherein, at a
location that corresponds to the reflective region of any one of
the substrate and the counter substrate, a reflecting layer that
has a function of reflecting light is provided.
8. An electronic apparatus comprising the liquid crystal device
according to claim 1 as a display unit.
9. A method of manufacturing a liquid crystal device, the liquid
crystal having display pixels that correspond to at least a color
of white or non-coloring and one color different from the color of
white or non-coloring, each of the display pixels corresponding to
one color having a transmissive region and a reflective region,
each of the display pixels corresponding to the color of white or
non-coloring having only a transmissive region, and the thickness
of a liquid crystal layer that corresponds to the transmissive
region of each of the display pixels corresponding to one color
being larger than the thickness of the liquid crystal layer that
corresponds to the reflective region of each of the display pixels
corresponding to one color, the method comprising: forming colored
layers in the display pixels corresponding to one color, on a
substrate; and forming cell-thickness-adjusting layers in the
reflective region of each of the display pixels corresponding to
one color and the transmissive region of each of the display pixels
corresponding to the color of white or non-coloring, on the
substrate, the cell-thickness-adjusting layers made of transparent
materials.
10. The method of manufacturing a liquid crystal device according
to claim 9, wherein each of the display pixels corresponding to the
color of white or non-coloring does not have the reflective
region.
11. The method of manufacturing a liquid crystal device according
to claim 9, wherein each of the display pixels corresponding to the
color of white or non-coloring has a reflective region, the
thickness of the liquid crystal layer that corresponds to the
transmissive region of each of the display pixels corresponding to
the color of white or non-coloring is larger than the thickness of
the liquid crystal layer that corresponds to the reflective region
of each of the display pixels corresponding to the color of white
or non-coloring, and during the forming of the
cell-thickness-adjusting layers, the cell-thickness-adjusting
layers are simultaneously formed in the reflective region of each
of the display pixels corresponding to one color and the
transmissive region and the reflective region of each of the
display pixels corresponding to the color of white or non-coloring,
on the substrate.
12. The method of manufacturing a liquid crystal device according
to claim 9, wherein, during the forming of the colored layers, an
opening is formed in the colored layer that is located in the
reflective region.
13. The method of manufacturing a liquid crystal device according
to claim 9, wherein, during the forming of the
cell-thickness-adjusting layers, the cell-thickness-adjusting layer
is formed with the same thickness as the colored layer.
14. The method of manufacturing a liquid crystal device according
to claim 9, wherein the forming of the cell-thickness-adjusting
layers includes adjusting the layer thickness, the adjusting of the
layer thickness includes: coating a resist on the colored layers of
the display pixels corresponding to the color of white or
non-coloring and the display pixels of one color, performing an
exposure process on the coated resist once by using a first mask
and then performing development and etching processes on the coated
resist, the first mask having a complete exposure region for
completely transmitting light and a complete light shielding region
for completely shielding the light, and performing the resist
coating again, performing an exposure process on the coated resist
once by using a second mask that has a complete exposure region and
a complete light shielding region and a structure different from a
structure of the first mask layer, and performing development and
etching processes on the coated resist, and during the adjusting of
the layer thickness, the thickness of the cell-thickness-adjusting
layer that is provided in the transmissive region of each of the
display pixels corresponding to the color of white or non-coloring
is equal to the thickness of the colored layer in the transmissive
region of each of the display pixels that correspond to one
color.
15. The method of manufacturing a liquid crystal device according
to claim 9, wherein the forming of the cell-thickness-adjusting
layer includes adjusting the layer thickness, the adjusting of the
layer thickness includes: coating a resist on the colored layers of
the display pixels corresponding to the color of white or
non-coloring and the display pixels of one color, performing an
exposure process on the coated resist at least once by using a mask
and then performing development and etching processes on the coated
resist, the mask having a complete exposure region for completely
transmitting light, a complete light shielding region for
completely shielding the light, and a halftone exposure region that
is made of a semitransparent film, and performing development and
etching processes on the coated resist, and during the adjusting of
the cell-thickness, the thickness of the cell-thickness-adjusting
layer that is provided in the transmissive region of each of the
display pixels corresponding to the color of white or non-coloring
is equal to the thickness of the colored layer in the transmissive
region of each of the display pixels that correspond to one
color.
16. The method of manufacturing a liquid crystal device according
to claim 9, further comprising; forming a protective film on the
colored layers of the display pixels corresponding to one color
between the forming of the colored layers and the forming of the
cell-thickness-adjusting layers, wherein during the forming of the
cell-thickness-adjusting layer, the cell-thickness-adjusting layer
is formed on the protective film in the reflective display region
of each of the display pixels corresponding to the color of white
or non-coloring and the display pixels corresponding to one color,
and during the adjusting of the layer thickness, the thickness of
the cell-thickness-adjusting layer that is provided in the
transmissive region of each of the display pixels corresponding to
the color of white or non-coloring is equal to the thickness of the
colored layer in the transmissive region of each of the display
pixels that correspond to one color.
17. The method of manufacturing a liquid crystal device according
to claim 9, further comprising, prior to the forming of the colored
layers: forming a reflecting layer in the reflective region, on the
substrate.
Description
BACKGROUND
[0001] 1. Technical Field
[0002] The present invention relates to a liquid crystal device
that is suitable for various information display, and to an
electronic apparatus.
[0003] 2. Related Art
[0004] In general, various electro-optical devices, such as liquid
crystal devices, organic electroluminescent display devices, plasma
display devices, and field emission display devices, are known.
[0005] As an example of these electro-optical devices, an
active-matrix-type liquid crystal device, which uses a switching
element, such as a thin film transistor (TFT), has advantages like
high definition, high responsibility, or the like, and thus it is
widely used for televisions or portable information terminals.
[0006] Such a liquid crystal device includes an element substrate
in which pixel electrodes, TFT elements, a plurality of scanning
lines (gate lines), a plurality of signal lines (source lines), a
driver IC, or the like are formed or mounted, and a counter
substrate in which color filters of three colors including R (red),
G (green), and B (blue) or a count electrode is formed. The element
substrate and the counter substrate are bonded to each other
through a sealant having a frame shape, and liquid crystal is
interposed therebetween.
[0007] In recent years, as this kind of liquid crystal device, a
liquid crystal device has been known in which in addition to three
primary colors including R, G, and B, a color of W (white) is
additionally used, and images are displayed while using pixels for
four colors as one dot (for example, see JP-A-2004-102292). By
using this liquid crystal device, light efficiency is increased,
and luminance and power efficiency are improved while maintaining
color reproducibility. In addition, according to a structure
disclosed in JP-A-2004-102292, a separated color filter is not
provided in a white pixel.
SUMMARY
[0008] An advantage of some aspects of the invention is that it
provides a transflective liquid crystal device having a multigap
structure which can reduce the manufacturing cost and use
respective colors including R, G, B, and W (white or transparent),
a method of manufacturing the same, and an electronic
apparatus.
[0009] According to a first aspect of the invention, a liquid
crystal device includes: display pixels which correspond to at
least a color of white or non-coloring and one color different from
the color of white or non-coloring, each of the display pixels
corresponding to one color having a transmissive region and a
reflective region, and each of the display pixels corresponding to
the color of white or non-coloring having only a transmissive
region; a substrate; a counter substrate which is disposed so as to
be opposite to the substrate; colored layers which are provided in
the display pixels of the substrate or the counter substrate
corresponding to one color; cell-thickness-adjusting layers which
are provided in the substrate or the counter substrate and included
in the reflective region of each of the display pixels
corresponding to one color and the transmissive region of each of
the display pixels corresponding to the color of white or
non-coloring; and a liquid crystal layer which is interposed
between the substrate and the counter substrate, the thickness of
the layer crystal layer corresponding to the transmissive region of
each of the display pixels corresponding to one color being larger
than the thickness of the liquid crystal layer corresponding to the
reflective region of each of the display pixels corresponding to
one color according to the thickness of the
cell-thickness-adjusting layer.
[0010] According to a second aspect of the invention, a liquid
crystal device includes: display pixels which correspond to at
least a color of white or non-coloring and one color different from
the color of white or non-coloring, each of the display pixels
corresponding to one color and each of the display pixels
corresponding to the color of white or non-coloring having a
transmissive region and a reflective region; a substrate; a counter
substrate which is disposed so as to be opposite to the substrate;
colored layers which are provided in the display pixels of the
substrate or the counter substrate corresponding to one color;
cell-thickness-adjusting layers which are provided in the substrate
or the counter substrate, and included in at least the reflective
region of each of the display pixels corresponding to one color and
the transmissive region and the reflective region of each of the
display pixels corresponding to the color of white or non-coloring,
the thickness of the cell-thickness-adjusting layer in the
reflective region of each of the display pixels corresponding to
the color of white or non-coloring being larger than the thickness
of the cell-thickness-adjusting layer in the transmissive region of
each of the display pixels corresponding to the color of white or
non-coloring; and a liquid crystal layer which is interposed
between the substrate and the counter substrate, the thickness of
the liquid crystal layer corresponding to the transmissive region
of each of the display pixels corresponding to one color and the
display pixels corresponding to the color of white or non-coloring
being larger than the thickness of the liquid crystal layer
corresponding to the reflective region of each of the display
pixels corresponding to one color and the display pixels
corresponding to the color of white or non-coloring according to
the thickness of the cell-thickness-adjusting layer.
[0011] Preferably, in the display pixels corresponding to one color
and the display pixels corresponding to the color of white or
non-coloring, the cell-thickness-adjusting layers, each of which is
made of the same material, are provided.
[0012] Preferably, the thickness of the cell-thickness-adjusting
layer that is provided in the reflective region of each of the
display pixels corresponding to one color is equal to the thickness
of the cell-thickness-adjusting layer that is provided in the
transmissive region of each of the display pixels corresponding to
the color of white or non-coloring.
[0013] Preferably, the thickness of the liquid crystal layer
corresponding to the transmissive region of each of the display
pixels corresponding to one color is equal to the thickness of the
liquid crystal layer corresponding to the transmissive region of
each of the display pixels corresponding to the color of white or
non-coloring.
[0014] The thickness of the colored layer corresponding to the
transmissive region is larger than the thickness of the colored
layer corresponding to the reflective region.
[0015] Preferably, at a location corresponding to the reflective
region of any one of the substrate and the counter substrate, a
reflecting layer that has a function of reflecting light is
provided.
[0016] According to a third aspect of the invention, a liquid
crystal device includes: a plurality of display pixels which
correspond to respective colors of R (Red), G (Green), B (Blue),
and W (white or non-coloring); a substrate; and a counter substrate
which is disposed to be opposite to the substrate with a liquid
crystal layer interposed therebetween. Each of the display pixels
of R, G, and B has a transmissive region and a reflective region,
and each of the display pixels of white or non-coloring has only a
transmissive region. The thickness of the liquid crystal layer
corresponding to the transmissive region of each of the display
pixels of R, G, and B is larger than the thickness of the liquid
crystal layer corresponding to the reflective region of each of the
display pixels of R, G, and B, and cell-thickness-adjusting layers
are provided in the reflective region of each of the display pixels
of R, G, and B and the transmissive region of each of the display
pixels corresponding to the color of white or non-coloring.
[0017] The liquid crystal device according to this aspect includes
the plurality of display pixels which correspond to the respective
colors of R (Red), G (Green), B (Blue), and W (White or
non-coloring), the substrate, and the counter substrate which is
disposed to be opposite to the substrate with a liquid crystal
layer interposed therebetween.
[0018] In addition, each of the display pixels of R, G, and B has a
transmissive region that performs transmissive display and a
reflective region that performs reflective display, while each of
the display pixels of white has only a transmissive region that
performs transmissive display. Therefore, it is possible to
construct a transflective liquid crystal device which has display
pixels corresponding to the respective colors of R, G, B, and
W.
[0019] In addition, in the liquid crystal device according to this
aspect, the thickness of the liquid crystal layer corresponding to
each of the transmissive regions of R, G, and B is larger than the
thickness of the liquid crystal layer corresponding to each of the
reflective regions of R, G, and B. This liquid crystal device has a
structure in which optimum optical characteristics are set in the
transmissive region and the reflective region, that is, a so-called
multigap structure.
[0020] In this case, generally, in the liquid crystal device that
has display pixels corresponding to the respective colors of R, G,
B, and W, the display pixels of W are additionally provided, in
addition to the respective display pixels of R, G, and B, so that
it is possible to achieve high luminance and high contrast.
Meanwhile, the coloring material does not exist in the display
pixels of W. Therefore, in order that the thickness of the liquid
crystal layer corresponding to the transmissive region of each of
the display pixels of R, G, and B (cell thickness) and the
thickness of the liquid crystal layer corresponding to the
transmissive region of each of the display pixels of W (cell
thickness) are set to have the same thickness, a transparent resin
layer for cell thickness adjustment needs to be provided at a
location that corresponds to the display pixel of W. In addition,
in a transflective electro-optical device that has a multigap
structure, in order to allow the optical characteristic to be
uniform in the transmissive region and the reflective region,
generally, a resin layer for a multigap is formed in the reflective
region, and the thickness of the liquid crystal layer corresponding
to the transmissive region is larger than the thickness of the
liquid crystal layer corresponding to the reflective region.
[0021] In a transflective liquid crystal device that has a multigap
structure, when the transflective liquid crystal device is
constructed so as to have the display pixels that correspond to the
respective colors of R, G, B, and W (hereinafter, referred to as
comparative example), it is required that a transparent resin layer
for cell thickness adjustment be provided at a location that
corresponds to the display pixel of W, and a resin layer for a
multigap, which is made of a material different from that of the
transparent resin layer, be separately provided in a reflective
region of each of the display pixels of R, G, and B. Due to this,
the number of processes is increased, and thus the manufacturing
cost of the liquid crystal device is increased.
[0022] In the liquid crystal device according to this aspect,
cell-thickness-adjusting layers, each of which is made of a
transparent resin material, are provided in a reflective region of
each of the display pixels corresponding to R, G, and B and a
transmissive region of each of the display pixels corresponding to
the color of W. In this case, the display pixel corresponding to
the color of W may be reddish, bluish, and yellowish. In addition,
the display pixel corresponding to the color of W is preferably
within a range of (x, y)=(0.3 to 0.4, 0.3 to 0.4) in a CIE
chromaticity diagram.
[0023] Preferably, in the reflective region of each of the display
pixels corresponding to R, G, and B and the transmissive region of
each of the display pixels corresponding to the color of W, the
cell-thickness-adjusting layers, each of which is made of the same
material, are preferably provided. That is, in the process of
manufacturing the liquid crystal device, the
cell-thickness-adjusting layer that is provided in the reflective
region of each of the display pixels corresponding to R, G, and B
and the cell-thickness-adjusting layer that is provided in a
transmissive region of each of the display pixels corresponding to
the color of W are simultaneously formed of the same material by
the same process. Thereby, at the same time, the multigap structure
can be formed at the location corresponding to the respective
display pixels of R, G, and B and a cell thickness adjusting layer
for cell thickness adjustment can be formed in the display pixels
corresponding to the color of W. As a result, the number of
processes can be reduced, as compared with a comparative example,
which results in reducing the manufacturing cost of the liquid
crystal device.
[0024] According to a fourth aspect of the invention, a liquid
crystal device includes: a plurality of display pixels which
correspond to respective colors of R, G, B, and W; a substrate; and
a counter substrate which is disposed to be opposite to the
substrate with a liquid crystal layer interposed therebetween. Each
of the display pixels of R, G, B, and W has a transmissive region
and a reflective region. In at least a reflective region of each of
the display pixels corresponding to R, G, and B, and the
transmissive region and the reflective region of each of the
display pixels corresponding to the color of W,
cell-thickness-adjusting layers are provided. The thickness of the
cell-thickness-adjusting layer in the reflective region of each of
the display pixels corresponding to W is larger than the thickness
of the cell-thickness-adjusting layer in the transmissive region of
each of the display pixels corresponding to the color of W, and the
thickness of the liquid crystal layer corresponding to the
transmissive region of each of the display pixels corresponding to
R, G, B, and W is larger than the thickness of the liquid crystal
layer corresponding to the reflective regions of each of the
display pixels corresponding to R, G, and B according to the
thickness of the cell-thickness-adjusting layer.
[0025] The liquid crystal device according to this aspect includes
the plurality of display pixels that correspond to the respective
colors of R, G, B, and W, the substrate, and the counter substrate
that is disposed to be opposite to the substrate with the liquid
crystal layer interposed therebetween. In addition, each of the
display pixels that correspond to the respective colors of R, G, B,
and W has a transmissive region and a reflective region. Therefore,
it is possible to construct a transflective electro-optical device
which has display pixels corresponding to the respective colors of
R, G, B, and W.
[0026] In addition, in the liquid crystal device according to this
aspect, in at least the reflective regions of the display pixels
corresponding to R, G, and B, the transmissive region of W and the
reflective regions of the display pixels corresponding to the color
of W, the cell-thickness-adjusting layers are provided. Further,
the thickness of the cell-thickness-adjusting layer in the
reflective region of each of the display pixels corresponding to
the color of W is larger than the thickness of the
cell-thickness-adjusting layer in the transmissive region of each
of the display pixels corresponding to the color of W, and the
thickness of the liquid crystal layer corresponding to the
transmissive regions of each of the display pixels corresponding to
the colors of R, G, B, and W is larger than the thickness of the
liquid crystal layer corresponding to the reflective regions of
each of the display pixels corresponding to the colors of R, G, and
B according to the cell-thickness-adjusting layer. In this case,
the display pixel corresponding to the color of W may be reddish,
bluish, and yellowish. In addition, the display pixel corresponding
to W is preferably within a range of (x, y)=(0.3 to 0.4, 0.3 to
0.4) in a CIE chromaticity diagram.
[0027] Preferably, in the reflective region and transmissive region
of each of the display pixels corresponding to the colors of R, G,
B, and W, the cell-thickness-adjusting layers, each of which is
made of the same material, are provided. That is, in the process of
manufacturing the liquid crystal device, the
cell-thickness-adjusting layer that is provided in at least the
reflective region (or both the reflective region and the
transmissive region) of each of the display pixels of R, G, and B
and the cell-thickness-adjusting layer that is provided in a
transmissive region and a reflective region of each of the display
pixels corresponding to the color of W are simultaneously formed of
the same material by the same process. Thereby, in the process of
manufacturing the liquid crystal device, at the same time, the
multigap structure can be simultaneously formed at the location
corresponding to the respective display pixels of R, G, B, and W.
As a result, the number of processes can be reduced, as compared
with the comparative example, and thus the manufacturing cost of
the liquid crystal device can be reduced.
[0028] Preferably, the thickness of the cell-thickness-adjusting
layer that is provided in the reflective region of each of the
display pixels of R, G, and B is set to have the same as the
thickness of the cell-thickness-adjusting layer that is provided in
the transmissive region corresponding to each of the display pixels
corresponding to the transparent color.
[0029] Preferably, the thickness of the liquid crystal layer
corresponding to the transmissive region of each of the display
pixels of R, G, and B is the same as the thickness of the liquid
crystal layer corresponding to the transmissive region of each of
the display pixels corresponding to the color of W. Thereby, the
predetermined optical characteristic can be set to the respective
transmissive regions of R, G, and B and the transmissive region of
W.
[0030] Preferably, at locations that correspond to the display
pixels of R, G, and B, the colored layers corresponding to the
respective colors of R, G, and B are respectively provided, and the
thickness of the colored layers of the respective colors of R, G,
and B that correspond to the transmissive regions is larger than
the thickness of each of the colored layers that are provided in
the reflective regions of R, G, and B.
[0031] In this case, at a location that corresponds to each of the
display pixels of R, G, and B, each of the colored layers
corresponding to the R, G, and B is provided. In addition, the
thickness of each of the colored layers that correspond to the
transmissive regions is larger than the thickness of each of the
colored layers that are provided in the reflective regions of R, G,
and B. Thereby, the predetermined optical characteristic can be set
to the respective reflective regions of R, G, and B and the
respective transmissive regions of R, G, and B. Preferably, the
thickness of the respective colored layers of R, G, and B that
correspond to the transmissive regions is about twice as large as
the thickness of the colored layers that are provided in the
respective reflective regions of R, G, and B.
[0032] Preferably, at a location that corresponds to the reflective
region of any one of the substrate and the counter substrate, a
reflecting layer that has a function of reflecting light is
provided. Thereby, the reflective display can be performed in a
reflective region.
[0033] According to a fifth aspect of the invention, a liquid
crystal device includes: display pixels which correspond to one
color or a plurality of display pixels corresponding to a plurality
of colors and display pixels which correspond to a color of W; a
substrate; and a counter substrate which is disposed to be opposite
to the substrate with a liquid crystal layer interposed
therebetween. Each of the display pixels that correspond to one
color or the plurality of display pixels that correspond to the
plurality of colors has a transmissive region and a reflective
region. Each of the display pixels that correspond to the color of
W has only a transmissive region. The thickness of the liquid
crystal layer that corresponds to each of the transmissive region
of the display pixels corresponding to one color or the plurality
of display pixels that correspond to the plurality of colors is
larger than the thickness of the liquid crystal layer that
corresponds to each of the reflective regions of the display pixels
corresponding to one color or the plurality of display pixels
corresponding to the plurality of colors, and the
cell-thickness-adjusting layers are formed in the reflective region
of each of the display pixels that correspond to one color or the
plurality of display pixels that correspond to the plurality of
colors and the transmissive region of each of the display pixels
that correspond to the color of W.
[0034] The liquid crystal device according to this aspect includes
the display pixels that correspond to one color or the plurality of
display pixels that correspond to the plurality of colors, and the
plurality of display pixels that correspond to the color of W, the
substrate, and the counter substrate that is disposed so as to be
opposite to the substrate with the liquid crystal layer interposed
therebetween.
[0035] In addition, each of the display pixels that correspond to
one color and the plurality of display pixels that correspond to
the plurality of colors has a transmissive region that performs
transmissive display and a reflective region that performs
reflective display, while each of the display pixels that
correspond to the color of W has only a transmissive region that
performs transmissive display. Therefore, it is possible to
construct a transflective liquid crystal device which includes
display pixels corresponding to one color or a plurality of display
pixels corresponding to a plurality of colors, and display pixels
corresponding to a color of W.
[0036] In this case, the thickness of the liquid crystal layer that
corresponds to the transmissive region of each of the display
pixels corresponding to one color or the plurality of display
pixels corresponding to the plurality of colors is larger than the
thickness of the liquid crystal layer that corresponds to the
reflective region of each of the display pixels corresponding to
one color or the plurality of display pixels corresponding to the
plurality of colors, and optimum optical characteristics are set in
the transmissive region and the reflective region. As a result, the
liquid crystal device has a multigap structure.
[0037] In particular, in this case, in the reflective region of
each of the display pixels that correspond to one color or the
plurality of display pixels that correspond to the plurality of
colors, and the transmissive region of each of the display pixels
corresponding to the color of W, the cell-thickness-adjusting
layers, each of which is made of a transparent resin material, are
provided. In this case, the display pixel corresponding to W may be
reddish, bluish, and yellowish. In addition, the display pixel
corresponding to W is preferably within a range of (x, y)=(0.3 to
0.4, 0.3 to 0.4) in a CIE chromaticity diagram.
[0038] That is, in the process of manufacturing the liquid crystal
device, the cell-thickness-adjusting layer that is provided in the
reflective region of each of the display pixels corresponding to
one color or the plurality of display pixels corresponding to the
plurality of colors and the cell-thickness-adjusting layer that is
provided in a transmissive region of each of the display pixels
corresponding to the color of W are simultaneously formed of the
same material by the same process. Thereby, at the same time, the
multigap structure can be formed at the location corresponding to
the display pixels that correspond to one color or the plurality of
display pixels that correspond to the plurality of colors, and a
cell thickness adjusting layer for cell thickness adjustment can be
formed in the display pixels corresponding to the color of W. As a
result, the number of processes can be reduced, as compared with a
comparative example, which results in reducing the manufacturing
cost of the liquid crystal device.
[0039] According to a sixth aspect of the invention, a liquid
crystal device includes: display pixels which correspond to one
color or a plurality of display pixels which correspond to a
plurality of colors, and display pixels which corresponds to a
color of W; a substrate; and a counter substrate which is disposed
to be opposite to the substrate with a liquid crystal layer
interposed therebetween. Each of the display pixels that correspond
to one color or the plurality of display pixels corresponding to
the plurality of colors and the display pixels corresponding to the
color of W has a transmissive region and a reflective region. In at
least a reflective region of each of the display pixels that
correspond to one color or the plurality of display pixels that
correspond to the plurality of colors, the cell-thickness-adjusting
layer is provided, and the thickness of the
cell-thickness-adjusting layer in the reflective region of each of
the display pixels corresponding to the color of W is larger than
the thickness of the cell-thickness-adjusting layer in the
transmissive region of each of the display pixels corresponding to
the color of W. The thickness of the liquid crystal layer that
corresponds to the transmissive region of each of the display
pixels corresponding to one color or the plurality of display
pixels corresponding to the plurality of colors and the display
pixels corresponding to the color of W is larger than the thickness
of the liquid crystal layer that corresponds to each of the
reflective regions of the display pixels corresponding to one color
or the plurality of display pixels corresponding to the plurality
of display pixels according to the thickness of the
cell-thickness-adjusting layer.
[0040] The liquid crystal device according to this aspect includes
the display pixels that correspond to one color or the plurality of
display pixels that correspond to the plurality of colors, and the
plurality of display pixels that correspond to the color of W, the
substrate, and the counter substrate that is disposed so as to be
opposite to the substrate with the liquid crystal layer interposed
therebetween. In addition, each of the display pixels that
correspond to one color or the plurality of display pixels that
correspond to the plurality of colors and the display pixels that
corresponds to the color of W has a transmissive region and a
reflective region. Therefore, it is possible to construct a
transflective electro-optical device which includes display pixels
corresponding to one color or a plurality of display pixels
corresponding to a plurality of colors, and display pixels
corresponding to a color of W.
[0041] In particular, in the liquid crystal device according to
this aspect, in at least the reflective region of each of the
display pixels that correspond to one color or the plurality of
display pixels that correspond to the plurality of colors, and the
transmissive region and the reflective region of each of the
display pixels corresponding to the color of W, the
cell-thickness-adjusting layers are provided. The thickness of the
cell-thickness-adjusting layer in the reflective region of each of
the display pixels corresponding to the color of W is larger than
the thickness of the cell-thickness-adjusting layer in the
transmissive region of each of the display pixels corresponding to
the color of W, and the thickness of the liquid crystal layer that
corresponds to the transmissive region of each of the display
pixels corresponding to one color and the plurality of display
pixels corresponding to the plurality of colors and the display
pixels corresponding to the color of W is set to be larger than the
thickness of the liquid crystal layer that corresponds to the
reflective region of each of the display pixels corresponding to
one color or the plurality of display pixels corresponding to the
plurality of colors according to the thickness of the
cell-thickness-adjusting layer. In this case, the display pixel
corresponding to W may be reddish, bluish, and yellowish. In
addition, the display pixel corresponding to W is preferably within
a range of (x, y)=(0.3 to 0.4, 0.3 to 0.4) in a CIE chromaticity
diagram.
[0042] That is, in the process of manufacturing the liquid crystal
device, the cell-thickness-adjusting layer that is provided in at
least the reflective region (or both the reflective region and the
transmissive region) of each of the display pixels corresponding to
one color or the plurality of display pixels corresponding to the
plurality of colors and the cell-thickness-adjusting layer that is
provided in a transmissive region of each of the display pixels
corresponding to the color of W are simultaneously formed of the
same material by the same process. Thereby, in the process of
manufacturing the liquid crystal device, the multigap structure can
be simultaneously formed at a location that corresponds to each of
the display pixels corresponding to one color or the plurality of
display pixels corresponding to the plurality of colors and the
display pixels corresponding to the color of W. As a result, the
number of processes can be reduced, as compared with a comparative
example, which results in reducing the manufacturing cost of the
liquid crystal device.
[0043] According to a seventh aspect of the invention, an
electronic apparatus includes the above-described liquid crystal
device as a display unit.
[0044] According to an eighth aspect, there is provided a method of
manufacturing a liquid crystal device, which has display pixels
corresponding to at least a color of W and one color different from
the color of W, each of the display pixels corresponding to one
color having a transmissive region and a reflective region, each of
the display pixels corresponding to the color of W having only a
transmissive region, and the thickness of a liquid crystal layer
corresponding to the transmissive region of each of the display
pixels corresponding to one color being larger than the thickness
of the liquid crystal layer corresponding to the reflective region
of each of the display pixels corresponding to one color. The
method of manufacturing a liquid crystal device includes: forming
colored layers in the display pixels corresponding to one color, on
a substrate; and forming cell-thickness-adjusting layers in the
reflective region of each of the display pixels corresponding to
one color and the transmissive region of each of the display pixels
corresponding to the color of W, on the substrate, the
cell-thickness-adjusting layers made of transparent materials.
[0045] Preferably, each of the display pixels corresponding to the
color of W does not have the reflective region.
[0046] Preferably, each of the display pixels corresponding to the
color of W has a reflective region, the thickness of the liquid
crystal layer that corresponds to the transmissive region of each
of the display pixels corresponding to the color of W is larger
than the thickness of the liquid crystal layer that corresponds to
the reflective region of each of the display pixels corresponding
to the color of W, and during the forming of the
cell-thickness-adjusting layers, the cell-thickness-adjusting
layers are simultaneously formed in the reflective region of each
of the display pixels corresponding to one color and the
transmissive region and the reflective region of each of the
display pixels corresponding to the color of W, on the
substrate.
[0047] Preferably, during the forming of the colored layers, an
opening is formed in the colored layer that is located in the
reflective region.
[0048] Preferably, during the forming of the
cell-thickness-adjusting layers, the cell-thickness-adjusting layer
is formed with the same thickness as the colored layer.
[0049] Preferably, the forming of the cell-thickness-adjusting
layers includes adjusting the layer thickness. The adjusting of the
layer thickness includes: coating a resist on the colored layers of
the display pixels corresponding to the color of W and the display
pixels of one color, performing an exposure process on the coated
resist once by using a first mask and then performing development
and etching processes on the coated resist, the first mask having a
complete exposure region for completely transmitting light and a
complete light shielding region for completely shielding the light,
and performing the resist coating again, performing an exposure
process on the coated resist once by using a second mask that has a
complete exposure region and a complete light shielding region and
a structure different from a structure of the first mask layer, and
performing development and etching processes on the coated resist.
Furthermore, during the adjusting of the layer thickness, the
thickness of the cell-thickness-adjusting layer that is provided in
the transmissive region of each of the display pixels corresponding
to the color of W is equal to the thickness of the colored layer in
the transmissive region of each of the display pixels that
correspond to one color.
[0050] Preferably, the forming of the cell-thickness-adjusting
layer includes adjusting the layer thickness. Further, the
adjusting of the layer thickness includes: coating a resist on the
colored layers of the display pixels corresponding to the color of
W and the display pixels of one color, performing an exposure
process on the coated resist at least once by using a mask and then
performing development and etching processes on the coated resist,
the mask having a complete exposure region for completely
transmitting light, a complete light shielding region for
completely shielding the light, and a halftone exposure region that
is made of a semitransparent film, and performing development and
etching processes on the coated resist, and during the adjusting of
the cell-thickness, the thickness of the cell-thickness-adjusting
layer that is provided in the transmissive region of each of the
display pixels corresponding to the color of W is equal to the
thickness of the colored layer in the transmissive region of each
of the display pixels that correspond to one color.
[0051] Preferably, the method of manufacturing the liquid crystal
device further includes: forming a protective film on the colored
layers of the display pixels corresponding to one color between the
forming of the colored layers and the forming of the
cell-thickness-adjusting layers. During the forming of the
cell-thickness-adjusting layer, the cell-thickness-adjusting layer
is formed on the protective film in the reflective display region
of each of the display pixels corresponding to the color of W and
the display pixels corresponding to one color, and during the
adjusting of the layer thickness, the thickness of the
cell-thickness-adjusting layer that is provided in the transmissive
region of each of the display pixels corresponding to the color of
W is equal to the thickness of the colored layer in the
transmissive region of each of the display pixels that correspond
to one color.
[0052] Preferably, the method of manufacturing the liquid crystal
device further includes: before the forming of the colored layers,
forming a reflecting layer in the reflective region, on the
substrate.
[0053] According to a ninth aspect of the invention, there is
provided a method of manufacturing a liquid crystal device, in
which each of a plurality of display pixels corresponding to
respective colors of R, G, and B has a transmissive region and a
reflective region, each of the display pixels corresponding to the
color of W has only a transmissive region, and the thickness of a
liquid crystal layer corresponding to each of the transmissive
regions of R, G, and B is larger than the thickness of the liquid
crystal layer corresponding to the respective regions of R, G, and
B. The method of manufacturing a liquid crystal device includes:
forming colored layers having the respective colors of R, G, and B
in regions where the display pixels corresponding to the respective
colors of R, G, and B are formed, on the substrate; and forming
cell-thickness-adjusting layers made of transparent materials in
regions where the respective regions of R, G, and B and the
transmissive region of W are formed, on the substrate.
[0054] In this case, the method corresponds to a method of
manufacturing a liquid crystal device having a multigap structure
in which each of the display pixels corresponding to the respective
colors of R, G, and B has a transmissive region and a reflective
region, each of the display pixels corresponding to the color of W
has only a transmissive region, and the thickness of the liquid
crystal layer corresponding to the transmissive regions of R, G,
and B is set to be larger than the thickness of the liquid crystal
layer corresponding to the reflective regions of R, G, and B.
[0055] In the method of manufacturing a liquid crystal device
according to this aspect, the colored layers having the respective
colors of R, G, and B are formed in regions where the plurality of
display pixels corresponding to the respective colors of R, G, and
B are formed, on the substrate which is made of a material, such as
glass or quartz. Then, the cell-thickness-adjusting layer made of a
transparent material (for example, a transparent resin material or
the like) is formed in a region where the respective regions of R,
G, and B and the transmissive region of W are formed, on the
substrate.
[0056] Thereby, at the same time, the multigap structure can be
formed at the location corresponding to the display pixels of R, G,
and B, and a cell thickness adjusting layer for cell thickness
adjustment can be formed in the display pixels corresponding to the
color of W. As a result, the number of processes can be reduced, as
compared with a method of manufacturing a liquid crystal device
according to a comparative example, which results in reducing the
manufacturing cost of the liquid crystal device.
[0057] According to a tenth aspect of the invention, there is
provided a method of manufacturing a liquid crystal device, in
which each of a plurality of display pixels corresponding to
respective colors of R, G, B, and W has a transmissive region and a
reflective region, and the thickness of a liquid crystal layer
corresponding to each of transmissive regions of R, G, B, and W is
larger than the thickness of the liquid crystal layer corresponding
to respective regions of R, G, B, and W. The method of
manufacturing a liquid crystal device includes: forming colored
layers having the respective colors of R, G, and B in regions where
the display pixels corresponding to the respective colors of R, G,
and B are formed, on the substrate; and forming
cell-thickness-adjusting layers made of transparent materials in
regions where the respective regions of R, G, and B and the
transmissive region and the reflective region of W are formed, on
the substrate.
[0058] In this case, the method corresponds to a method of
manufacturing a liquid crystal device having a multigap structure
in which each of the display pixels corresponding the respective
colors of R, G, B, and W has a transmissive region and a reflective
region, and the thickness of the liquid crystal layer corresponding
to the transmissive regions of R, G, B, and W is larger than the
thickness of the liquid crystal layer corresponding to the
reflective regions of R, G, B, and W.
[0059] In the method of manufacturing a liquid crystal device
according to this aspect, the colored layers having the respective
colors of R, G, and B are formed in regions where the display
pixels corresponding to the respective colors of R, G, and B are
formed, on the substrate which is made of a material, such as glass
or quartz. Then, the cell-thickness-adjusting layer made of a
transparent material (for example, a transparent resin material or
the like) is formed in a region where the respective regions of R,
G, and B and the transparent transmissive and reflective regions
are formed, on the substrate.
[0060] Thereby, at the same time, the multigap structure can be
formed at the location corresponding to the display pixels of R, G,
B, and W. As a result, the number of processes can be reduced, as
compared with a method of manufacturing a liquid crystal device
according to a comparative example, which results in reducing the
manufacturing cost of the liquid crystal device.
[0061] Preferably, during the forming the colored layers, an
opening is formed in each of the colored layers of R, G, and B that
are located in the reflective regions. Thereby, the predetermined
optical characteristic can be set in the respective reflective
regions of R, G, and B and the respective transmissive regions of
R, G, and B,
[0062] Preferably, during the forming of the
cell-thickness-adjusting layer, the cell-thickness-adjusting layers
and the colored layers of R, G, and B can be formed with the same
thickness.
[0063] Preferably, the forming of the cell-thickness-adjusting
layer includes adjusting the layer thickness. The adjusting of the
layer thickness includes: forming, when the thickness of the
cell-thickness-adjusting layer is larger than the thickness of each
of the colored layers of R, G, and B, coating a resist on at least
the reflective regions of R, G, and B, the cell-thickness-adjusting
layer that is formed in each of the transmissive region and/or the
reflective region of W, and the colored layers of R, G, and B that
are formed in the transmissive regions of R, G, and B; performing
an exposure process once with respect to the coated resist by using
a first mask having a complete exposure region for completely
transmitting light and a complete light shielding region for
completely shielding light and performing development and etching
processes on the coated resist; and coating the resist again,
performing an exposure process once with respect to the resist by
using a second mask, and performing development and etching
processes on the resist, the second mask having the complete
exposure region and the complete light shielding region, and the
second mask having a different structure from that of the first
mask. During the adjusting of the layer thickness, the thickness of
the cell-thickness-adjusting layer that is provided in the
transmissive region of at least W and the thickness of the colored
layers of the transmissive regions of R, G, and B are set to have
the same thickness.
[0064] In this case, the forming of the cell-thickness-adjusting
layer has adjusting layer thickness. In addition, the adjusting of
the layer thickness includes a resist coating process, a first
exposure process, and a second exposure process. First, during the
coating of the resist, when the thickness of the
cell-thickness-adjusting layer is larger than the thickness of each
of the colored layers of R, G, and B, the resist (photosensitive
resin) is coated on at least the respective reflective regions of
R, G, and B, the cell-thickness-adjusting layer that is formed in
each of the transmissive region and/or the reflective region of W,
and the colored layers of R, G, and B that are formed in the
respective transmissive regions of R, G, and B.
[0065] Next, during the firs exposure process, the exposure process
is performed on the coated resist once by using the first mask
including a complete exposure region for completely transmitting
the light (light, such as ultraviolet rays or i rays, and this is
the same in the below description) and a complete light shielding
region, and the development and etching processes are
performed.
[0066] Next, during the second exposure process, the resist coating
process is performed again, the exposure process is performed once
on the coated resist (photosensitive resin) by using a second mask
including a complete exposure region and a complete light shielding
region and having a different structure from that of the first
mask, and the development and etching processes are performed.
During the adjusting of the layer thickness, the thickness of the
cell-thickness-adjusting layer that is provided in the transmissive
region of at least W and the thickness of the colored layers of the
respective transmissive regions of R, G, and B are set to have the
same thickness by using these series of processes. Thereby,
predetermined optical characteristic can be set in the respective
transmissive regions of R, G, and B and the transmissive regions of
W.
[0067] Preferably, the forming of the cell-thickness-adjusting
layer includes adjusting the layer thickness. The adjusting of the
layer thickness includes: forming, when the thickness of the
cell-thickness-adjusting layer is larger than the thickness of each
of the colored layers of R, G, and B, coating a resist on at least
the reflective regions of R, G, and B, the cell-thickness-adjusting
layer that is formed in each of the transmissive region and/or the
reflective region of W, and the colored layers of R, G, and B that
are formed in the transmissive regions of R, G, and B; and
performing an exposure process once on the coated resist by using a
mask having a complete exposure region for completely transmitting
light, a complete light shielding region for completely shielding
light, and a halftone exposure region made of a semitransparent
film and performing development and etching processes on the coated
resist. During the adjusting of the layer thickness, the thickness
of the cell-thickness-adjusting layer that is provided in the
transmissive region of at least W and the thickness of the colored
layers of the transmissive regions of R, G, and B are set to have
the same thickness.
[0068] In this case, the forming of the cell-thickness-adjusting
layer includes adjusting the layer thickness. The adjusting of the
layer thickness includes the resist coating process and a halftone
exposure process.
[0069] First, during the coating of the resist, when the thickness
of the cell-thickness-adjusting layer is larger than the thickness
of each of the colored layers of R, G, and B, a resist
(photosensitive resin) is coated on at least the reflective regions
of R, G, and B, the cell-thickness-adjusting layer that is formed
in each of the transmissive region and/or the reflective region of
W, and the colored layers of R, G, and B that are formed in the
transmissive regions of R, G, and B.
[0070] Then, during the halftone exposure, an exposure process is
performed at least once on the coated resist by using a mask having
a complete exposure region for completely transmitting light, a
complete light shielding region for completely shielding light, and
a halftone exposure region made of a semitransparent film, and
development and etching processes are performed on the coated
resist. During the adjusting of the layer thickness, the thickness
of the cell-thickness-adjusting layer that is provided in the
transmissive region of at least W and the thickness of the colored
layers of the respective transmissive regions of R, G, and B are
set to have the same thickness by using these series of processes
(halftone exposure method). Thereby, predetermined optical
characteristic can be set in the respective transmissive regions of
R, G, and B and the transmissive regions of W.
[0071] Preferably, the method of manufacturing a liquid crystal
device further includes: before the forming of the colored layers,
forming a reflecting layer on the reflective regions of R, G, and
B, on the substrate. Thereby, in the reflective regions of R, G,
and B, the reflective display corresponding to the respective
colors can be performed.
[0072] Preferably, the method of manufacturing a liquid crystal
device further includes: before the forming of the colored layers,
forming a reflecting layer on the reflective regions of R, G, and B
and the reflective region of W, on the substrate. Thereby, in the
reflective regions of R, G, B, and W, the reflective display
corresponding to the respective colors can be performed.
[0073] According to an eleventh aspect of the invention, there is
provided a method of manufacturing a liquid crystal device, in
which each of display pixels corresponding to one color or each of
a plurality of display pixels corresponding to a plurality of
colors has a transmissive region and a reflective region, each of
display pixels corresponding to W has only a transmissive region,
and the thickness of a liquid crystal layer corresponding to each
of transmissive regions of the display pixels corresponding to one
color or the plurality of display pixels corresponding to the
plurality of colors is larger than the thickness of the liquid
crystal layer corresponding to each of reflective regions of the
display pixels corresponding to one color or the plurality of
display pixels corresponding to the plurality of colors. The method
of manufacturing a liquid crystal device includes: forming colored
layers having one color or the plurality of colors in regions where
the display pixels corresponding to one color or the plurality of
colors are formed, on the substrate; and forming a
cell-thickness-adjusting layer made of a transparent material in a
region where the respective reflective regions of the display
pixels corresponding to one color or the plurality of display
pixels corresponding to the plurality of colors and the
transmissive regions of W are formed, on the substrate.
[0074] In this case, the method corresponds to a method of
manufacturing a liquid crystal device having a multigap structure
in which Each of the display pixels corresponding to one color and
the plurality of pixels corresponding to the plurality of colors
has a transmissive region and a reflective region. Each of the
display pixels that correspond to W has only a transmissive region.
Further, the thickness of the liquid crystal layer that corresponds
to each of the transmissive regions of the display pixels
corresponding to one color and the plurality of display pixels
corresponding to the plurality of colors is larger than the
thickness of the liquid crystal layer that corresponds to each of
the reflective regions of the display pixels corresponding to one
color and the plurality of display pixels corresponding to the
plurality of colors.
[0075] In the method of manufacturing a liquid crystal device
according to this aspect, during the forming of the colored layer,
the colored layers having one color or the plurality of colors are
formed in regions where the display pixels corresponding to one
color or the plurality of display pixels corresponding to the
plurality of colors are formed, on the substrate which is made of a
material, such as glass or quartz. Then, during the forming of the
cell-thickness-adjusting layer, the cell-thickness-adjusting layer
made of a transparent material (for example, a transparent resin
material or the like) is formed in a region where the respective
regions of the display pixels corresponding to one color or the
plurality of display pixels corresponding to the plurality of
colors and the transmissive regions of W are formed, on the
substrate.
[0076] Thereby, at the same time, the multigap structure can be
formed at the location corresponding to the display pixels
corresponding to one color or the plurality of display pixels
corresponding to the plurality of colors, and the
cell-thickness-adjusting layer for cell thickness adjustment is
formed in the display pixels of W. As a result, the number of
processes can be reduced, as compared with a method of
manufacturing a liquid crystal device according to a comparative
example, which results in reducing the manufacturing cost of the
liquid crystal device.
[0077] According to a twelfth aspect of the invention, there is
provided a method of manufacturing a liquid crystal device, in
which each of display pixels corresponding to one color or each of
a plurality of pixels corresponding to a plurality of colors, each
of display pixels corresponding to W has a transmissive region and
a reflective region, and the thickness of a liquid crystal layer
corresponding to a transmissive region of each of the display
pixels corresponding to one color or the plurality of display
pixels corresponding to the plurality of colors and the display
pixels of W is larger than the thickness of the liquid crystal
layer corresponding to a reflective region of each of the display
pixels corresponding to one color or the plurality of display
pixels corresponding to the plurality of colors and the display
pixels of W. The method of manufacturing a liquid crystal device
includes: forming colored layers having one color or the plurality
of colors in regions where the display pixels corresponding to one
color or the plurality of colors are formed, on the substrate; and
forming a cell-thickness-adjusting layer made of a transparent
material in a region where the respective reflective regions of the
display pixels corresponding to one color or the plurality of
display pixels corresponding to the plurality of colors and the
transmissive regions and the reflective regions of W are formed, on
the substrate.
[0078] In this case, the method corresponds to a method of
manufacturing a liquid crystal device having a multigap structure
in which each of the display pixels corresponding to one color or
the plurality of pixels corresponding to the plurality of colors
and the display pixels of W has a transmissive region and a
reflective region. Each of the display pixels that correspond to W
has only a transmissive region. Further, the thickness of the
liquid crystal layer that corresponds to each of the transmissive
regions of the display pixels corresponding to one color or the
plurality of display pixels corresponding to the plurality of
colors and the display pixels of W is larger than the thickness of
the liquid crystal layer that corresponds to each of the reflective
regions of the display pixels corresponding to one color or the
plurality of display pixels corresponding to the plurality of
colors and the display pixels of W.
[0079] In the method of manufacturing a liquid crystal device
according to this aspect, during the forming of the colored layer,
the colored layers having one color or the plurality of colors are
formed in regions where the display pixels corresponding to one
color or the plurality of display pixels corresponding to the
plurality of colors are formed, on the substrate which is made of a
material, such as glass or quartz. Then, during the forming of the
cell-thickness-adjusting layer, the cell-thickness-adjusting layer
made of a transparent material (for example, a transparent resin
material or the like) is formed in a region where the respective
regions of the display pixels corresponding to one color or the
plurality of display pixels corresponding to the plurality of
colors and the transmissive regions and the reflective regions of W
are formed, on the substrate.
[0080] Thereby, at the same time, the multigap structure can be
formed at the location corresponding to the display pixels
corresponding to one color or the plurality of display pixels
corresponding to the plurality of colors and the display pixels of
W, and the cell-thickness-adjusting layer for cell thickness
adjustment is formed in the display pixels of W. As a result, the
number of processes can be reduced, as compared with a method of
manufacturing a liquid crystal device according to a comparative
example, which results in reducing the manufacturing cost of the
liquid crystal device.
BRIEF DESCRIPTION OF THE DRAWINGS
[0081] The invention will be described with reference to the
accompanying drawings, wherein like numbers reference like
elements.
[0082] FIG. 1 is a plan view schematically illustrating a structure
of a liquid crystal device according to a first embodiment of the
invention.
[0083] FIG. 2 is a plan view illustrating a structure of one pixel
including R, G, B, and W in a liquid crystal device according to a
first embodiment of the invention.
[0084] FIG. 3A is a plan view illustrating a structure of an
element substrate corresponding each of sub-pixels of R, G, and B
in an electro-optical device according to a first embodiment of the
invention.
[0085] FIG. 3B is a plan view illustrating a structure of each of
sub-pixels of R, G, and B in an electro-optical device according to
a first embodiment of the invention.
[0086] FIG. 4A is a partial cross-sectional view taken along the
cut line IVA-IVA in FIGS. 3A and 3B.
[0087] FIG. 4B is a partial cross-sectional view taken along the
cut line IVB-IVB in FIGS. 3A and 3B.
[0088] FIG. 5 is a partial cross-sectional view taken along the cut
line V-V in FIG. 3.
[0089] FIG. 6 is a partial cross-sectional view taken along the cut
line VI-VI in FIG. 2.
[0090] FIG. 7 is a plan view illustrating a structure of one pixel
including R, G, B, and W in a liquid crystal device according to a
second embodiment of the invention.
[0091] FIG. 8A is a plan view illustrating a structure of an
element substrate corresponding each of sub-pixels of R, G, and B
in an electro-optical device according to a second embodiment of
the invention.
[0092] FIG. 8B is a plan view illustrating a structure of each of
sub-pixels of R, G, and B in an electro-optical device according to
a second embodiment of the invention.
[0093] FIG. 9A is a partial cross-sectional view taken along the
cut line IXA-IXA in FIGS. 8A and 8B.
[0094] FIG. 9B is a partial cross-sectional view taken along the
cut line IXB-IXB in FIG. 8.
[0095] FIG. 10 is a partial cross-sectional view taken along the
cut line X-X in FIG. 7.
[0096] FIG. 11 is a partial cross-sectional view illustrating a
structure of a modification of a liquid crystal device according to
a second embodiment of the invention.
[0097] FIG. 12 is a partial cross-sectional view illustrating a
structure of a modification of a liquid crystal device according to
a second embodiment of the invention.
[0098] FIG. 13A is a plan view illustrating a modification of the
configuration of one pixel including R, G, and B.
[0099] FIG. 13B is a plan view illustrating a modification of the
configuration of one pixel including R, G, and B.
[0100] FIG. 14A is a plan view illustrating a modification of a
structure of one pixel including R, G, B, and W.
[0101] FIG. 14B is a plan view illustrating a modification of a
structure of one pixel including R, G, B, and W.
[0102] FIG. 15 is a flowchart illustrating a method of
manufacturing liquid crystal devices according to first and second
embodiment of the invention.
[0103] FIG. 16 is a flow chart illustrating a method of
manufacturing a color filter substrate according to a first
embodiment of the invention.
[0104] FIG. 17A is a cross-sectional view illustrating a process of
a method of manufacturing a color filter substrate according to a
first embodiment of the invention.
[0105] FIG. 17B is a cross-sectional view illustrating a process of
a method of manufacturing a color filter substrate according to a
first embodiment of the invention.
[0106] FIG. 18 is a cross-sectional view illustrating a process of
a method of manufacturing a color filter substrate according to a
first embodiment of the invention.
[0107] FIG. 19A is a cross-sectional view illustrating a process of
a method of manufacturing a color filter substrate according to a
first embodiment of the invention.
[0108] FIG. 19B is a cross-sectional view illustrating a process of
a method of manufacturing a color filter substrate according to a
first embodiment of the invention.
[0109] FIG. 20 is a cross-sectional view illustrating a process of
a method of manufacturing a color filter substrate according to a
first embodiment of the invention.
[0110] FIG. 21 is a cross-sectional view illustrating a process of
a method of manufacturing a color filter substrate according to a
first embodiment of the invention.
[0111] FIG. 22 is a flow chart illustrating a process of a method
of manufacturing a color filter substrate according to a second
embodiment of the invention.
[0112] FIG. 23A is a cross-sectional view illustrating a process of
a method of manufacturing a color filter substrate according to a
second embodiment of the invention.
[0113] FIG. 23B is a cross-sectional view illustrating a process of
a method of manufacturing a color filter substrate according to a
second embodiment of the invention.
[0114] FIG. 24A is a cross-sectional view illustrating a process of
a method of manufacturing a color filter substrate according to a
second embodiment of the invention.
[0115] FIG. 24B is a cross-sectional view illustrating a process of
a method of manufacturing a color filter substrate according to a
second embodiment of the invention.
[0116] FIG. 25A is a cross-sectional view illustrating a process of
a method of manufacturing a color filter substrate according to a
second embodiment of the invention.
[0117] FIG. 25B is a cross-sectional view illustrating a process of
a method of manufacturing a color filter substrate according to a
second embodiment of the invention.
[0118] FIG. 26A is a cross-sectional view illustrating a process of
manufacturing a color filter substrate according to a
modification.
[0119] FIG. 26B is a cross-sectional view illustrating a process of
manufacturing a color filter substrate according to a
modification.
[0120] FIG. 26C is a cross-sectional view illustrating a process of
manufacturing a color filter substrate according to a
modification.
[0121] FIG. 27 is a circuit block diagram illustrating an
electronic apparatus to which a liquid crystal device according to
embodiments of the invention is applied.
[0122] FIG. 28A is a diagram illustrating an example of an
electronic apparatus to which a liquid crystal device according to
embodiments of the invention is applied.
[0123] FIG. 28B is a diagram illustrating an example of an
electronic apparatus to which a liquid crystal device according to
embodiments of the invention is applied.
DESCRIPTION OF EXEMPLARY EMBODIMENTS
[0124] Hereinafter, the preferred embodiments of the invention will
be described in detail with reference to the accompanying drawings.
In various embodiments described below, the invention is applied to
a liquid crystal device which is an example of an electro-optical
device.
First Embodiment
[0125] According to the first embodiment, the invention is applied
to an active-matrix-driven liquid crystal device that uses an a-si
type thin film transistor (hereinafter, referred to as TFT) which
is an example of a three-terminal element.
Structure of Liquid Crystal Device
[0126] First, a structure of a liquid crystal device 100 according
to the first embodiment of the invention will be described with
reference to FIGS. 1 to 5.
[0127] FIG. 1 is a plan view schematically illustrating a structure
of a liquid crystal device 100 according to the first embodiment of
the invention. In FIG. 1, a color filer substrate 92 is disposed on
the front side of the paper (viewing side), and an element
substrate 91 is disposed on the interior side of the paper. In FIG.
1, a longitudinal direction of the paper (column direction) is
defined as a Y direction, and a horizontal direction of the paper
(row direction) is defined as an X direction. In addition, in FIG.
1, each of regions corresponding to R (red), G (green), B (blue),
and W (transparent) indicates one sub-pixel region SG, and
sub-pixel regions SG of two rows and two columns that correspond to
R, G, B, and W indicate one pixel region AG.
[0128] In the present embodiment, each of the pixel regions AG has
sub-pixels corresponding to R, G, B, and W. Therefore, the
invention is different from the related art in that one pixel
region is composed of sub-pixels that correspond to R, G, and B. As
a result, in the present embodiment, different from the related
art, display is performed by using a plotting operation technology
(rendering). The rendering uses an image process technology.
According to this image process technology, in any pixel region AG,
gradation signals, which are applied to sub-pixel regions SG each
of which has one colored layer among colored layers corresponding
to the respective colors including R, G, and B, are applied to not
only the sub-pixel regions SG in the corresponding pixel region AG
but also sub-pixel regions in peripheral pixel regions of the
corresponding pixel region AG having the same colors so as to
overlap each. That is, the sub-pixel regions SG (sub-pixels) of the
respective colors including R, G, and B in one pixel region AG
(display pixel) are applied with gradation signals contributing to
display of the sub-pixels in one display pixel such a manner that
the gradation signals are applied to not only the respective
sub-pixel regions SG in one pixel region AG but also the sub-pixels
in the peripheral display pixels of the one display pixel having
the same colors so as to overlap each other, and thus display is
performed.
[0129] In this way, a viewer can feel a sense of resolution more
than a sense of resolution as much as the actual number of pixels.
For example, when using a liquid crystal device having screen
display resolution corresponding to a QVGA (Quarter Video Graphics
Array) standard, it is possible to achieve screen display
resolution corresponding to a VGA (Video Graphics Array)
standard.
[0130] A liquid crystal device 100 includes an element substrate 91
and a color filter substrate 92 that is disposed so as to be
opposite to the element substrate 91. The element substrate 91 and
the color filter substrate 92 are bonded to each other through a
sealant 5. Liquid crystal is injected inside the sealant 5 so as to
form a liquid crystal layer 4.
[0131] In this case, the liquid crystal device 100 corresponds to a
liquid crystal device for color display which is constructed by
using four colors including R, G, B, and W and an
active-matrix-driven liquid crystal device that uses an a-Si type
TFT element serving as a switching element. Further, the liquid
crystal device 100 corresponds to a transflective liquid crystal
device in which each of the sub-pixel regions SG corresponding to
R, G, and B has a transmissive region and a reflective region and a
liquid crystal device having a multigap structure in which the
thickness of a liquid crystal layer 4 is different in the
corresponding transmissive region and the corresponding reflective
region.
[0132] First, a planar structure of the element substrate 91 will
be described. On an inner surface of the element substrate 91, a
plurality of source lines 32, a plurality of gate lines 33, a
plurality of a-Si type TFT elements 21, a plurality of pixel
electrodes 10, a driver IC 40, external connection wiring lines 35,
an FPC (Flexible Printed Circuit) 41, or the like are formed or
mounted.
[0133] As shown in FIG. 1, the element substrate 91 has an
extending region 31 that extends from one side of the color filter
substrate 92 to the outside, and the driver IC 40 is mounted on the
extending region 31. An input-side terminal (not shown) of the
driver IC 40 is electrically connected to one end of each of the
plurality of external connection wiring lines 35, and the other end
of each of the plurality of external connection wiring lines 35 is
electrically connected to the FPC. The respective source lines 32
are formed such that they extend in a Y direction at predetermined
intervals in an X direction, and one end 32 of each of the source
lines 32 is electrically connected to an output-side terminal (not
shown) of the driver IC 40.
[0134] Each of the gate lines 33 has a first wiring line 33a that
is formed so as to extend in a Y direction, and a second wiring
line 33b that is formed so as to extend in an X direction from a
terminating portion of the first wiring line 33a. The second wiring
lines 33b of the respective gate lines 33 are formed such that they
extend in a direction crossing the respective source lines 32, that
is, an X direction at predetermined intervals in a Y direction. One
end of the first wiring line 33a of each of the gate lines 33 is
electrically connected to an output-side terminal (not shown) of
the driver IC 40. Further, the TFT element 21 is provided at a
location corresponding to an intersection between each source line
32 and the second wiring line 33b of each gate line 33, and each
TFT element 21 is electrically connected to each source line 32,
each gate line 33, and each pixel electrode 10. Each TFT element 21
and each pixel electrode 10 are provided at locations corresponding
to each sub-pixel region SG. Each pixel electrode 10 is formed of a
transparent conductive material, such as, for example, an ITO
(Indium-Tin Oxide) or the like.
[0135] An effective display region V (a region surrounded with
two-dot chain lines) corresponds to a region where a plurality of
pixel regions AG are disposed in a matrix in an X direction and a Y
direction. In the effective display region V, images, such as
characters, figures, diagrams, or the like, are displayed. Further,
a region outside the effective display region V forms a frame
region 38 that is not related to display. Furthermore, on inner
surfaces of each source line 32, each gate line 33, each TFT
element 21, each pixel electrode 10, or the like, an alignment film
(not shown) is formed.
[0136] Next, a planar structure of the color filter substrate 92
will be described. This color filter substrate 92 has a light
shielding layer (it is generally referred to as a `black matrix`,
and in the below description, it is simply referred to as `BM`),
colored layers 6R, 6G, and 6B of three colors including R, G, and
B, a common electrode 8, or the like. Further, in the below
description, when indicating the colored layer regardless of a
color thereof, it is simply described as a `colored layer 6`, and
when indicating the colored layer depending on a color thereof, it
is simply described as a `colored layer 6R`. The BM is formed at a
location that partitions the respective sub-pixel regions SG. In
FIG. 1, in the respective sub-pixel region SG that corresponds to
W, the colored layers are not provided. Similar to the pixel
electrode, the common electrode 8 is formed of a transparent
conductive material, such as an ITO or the like, and it is provided
over substantially an entire surface of the color filter substrate
92. In a region E1 of a corner of the sealant 5, the common
electrode 8 is electrically connected to one end of the wiring line
15, and the other end of the corresponding wiring line 15 is
electrically connected to an output terminal that corresponds to
COM of the driver IC 40.
[0137] In the liquid crystal device 100 having the above-described
structure, the gate lines 33 are sequentially and exclusively
selected one by one by the driver IC 40 in the order of G1, G2, . .
. , Gm-1, and Gm (m is a natural number) on the basis of power and
a signal from the FPC 41 side that is connected to the electronic
apparatus or the like, and the selected gate lines 33 are provided
with a gate signal of selected voltage while the other gate lines
33 that are not selected are supplied with a gate signal of the
non-selected voltage. In addition, the driver IC 40 supplies a
source signal according to display contents to the pixel electrodes
10 formed at locations corresponding to the selected gate line 33
through the corresponding source lines 32 of S1, S2, . . . , Sn-1,
and Sn (n is a natural number) and the TFT elements 21. As a
result, a display state of the liquid crystal layer 4 is changed to
a non-display state or an intermediate display state, and thus an
alignment state of the liquid crystal layer 4 is controlled.
Structure of Pixel
[0138] Next, a structure of one pixel region AG will be described
with reference to FIG. 2. FIG. 2 is an enlarged plan view
illustrating a portion corresponding to one pixel region AG (a
portion surrounded with broken lines) in FIG. 1.
[0139] As shown in FIG. 2, one pixel region AG has a structure in
which it has sub-pixel regions SG of two rows and two columns that
correspond to R, G, B, and W. Further, each of the sub-pixel
regions SG that correspond to R, G, and B has a transmissive region
E10 where transmissive display is performed, and a reflective
region E11 where reflective display is performed. Meanwhile, the
sub-pixel region SG that corresponds to W has only a transmissive
region E10, and does not have a reflective region Eli.
[0140] Next, a structure of each of the sub-pixel regions SG that
correspond to R, G, and B in FIG. 2 will be described with
reference to FIG. 3 in a state in which it is divided into a
structure of the reflective region E11 and a structure of the
transmissive region E10.
[0141] FIG. 3A is a partial enlarged plan view illustrating a
structure of an element substrate 91 that corresponds to the
respective sub-pixel regions SG of R, G, and B. FIG. 3B is a
partial enlarged plan view illustrating a structure of a color
filter substrate 92 that is disposed to be opposite to the element
substrate 91 of FIG. 3A and corresponds to the respective sub-pixel
regions SG of R, G, and B. FIG. 4A is a partial cross-sectional
view taken along the cutting lines IVA-IVA in FIGS. 3A and 3B, and
illustrates a sectional structure of the liquid crystal device 100
that corresponds to the respective reflective regions E11 of R, G,
and B. FIG. 4B is a partial cross-sectional view taken along the
cutting lines IVB-IVB in FIGS. 3A and 3B, and illustrates a
sectional structure of the liquid crystal device 100 that
corresponds to the respective sub-pixel regions SG of R, G, and
B.
[0142] First, a structure of a reflective region E11 in one of the
sub-pixel regions SG of R, G, and B will be described.
[0143] On a lower substrate 1 that is formed of a material, such as
glass or quartz, the gate lines 33 are formed. In FIG. 3A, a second
wiring line 33b that is an element of the gate line 33 has a main
line portion 33ba that extends in an X direction, and a branch line
portion 33bb that is branched from the main line portion 33ba so as
to be curved in a Y direction. On the lower substrate 1 and the
gate line 33, a gate insulating layer 50 having an insulating
property is formed. At a location of a top surface of the gate
insulating layer 50 which overlaps the branch line portion 33bb of
the gate line 33 in plan view, an a-Si layer 52 that is an element
of the TFT element 21 is provided. The source line 32 is formed
such that it extends on the gate insulating layer 50 in a direction
crossing the gate line 33.
[0144] As shown in FIG. 3A, each of the source lines 32 has a main
line portion 32a that extends in a Y direction, and a branch line
portion 32b that is branched from the main line portion 32a so as
to be curved in an X direction. A portion of the branch line
portion 32b of the source line 32 is formed on a portion of the
a-si layer 52 at one end side. On a portion of the a-si layer 52 at
the other end side and the gate insulating layer 50, a storage
capacitor electrode 16 is formed which is made of metal. Therefore,
the a-si layer 52 is electrically connected to the source line 32
and the storage capacitor electrode 16. In addition, at a location
that corresponds to the a-si layer 52, the TFT element 21 that
includes the a-si layer 52 as an element is formed.
[0145] On the source line 32, the storage capacitor electrode 16,
and the gate insulating layer 50, a passivation layer (reaction
preventing layer) 51 that has an insulating property is formed. The
passivation layer 51 has a contact hole (opening) 51a that is
formed at a location which overlaps the storage capacitor electrode
16 in plan view. On the passivation layer 51, a resin layer 17 is
formed which is made of a resin material. On a surface of the resin
layer 17, a plurality of unevenness portions, each of which has a
function of scattering light, are formed. The resin layer 17 has a
contact hole 17a that is formed at a location which corresponds to
the contact hole 51a of the passivation layer 51. On the resin
layer 17, a reflective electrode 5, which is formed of Al
(aluminum) or the like and has a reflecting function, is formed.
Since the reflective electrode 5 is formed on a resin layer 17
having a plurality of minute unevenness portions, the reflective
electrode 5 is formed in a shape that reflects the plurality of
minute unevenness portions. At a location of the reflective
electrode 5 that corresponds to the contact holes 51a and 17a, a
transmissive opening region 80 is formed for transmitting light. On
the reflective electrode 5, the pixel electrode 10 is formed.
[0146] In addition, a phase difference plate 13 (1/4 wavelength
plate) is disposed on an external surface of the lower substrate 1,
and a polarizer 14 is disposed on an external surface of the phase
difference plate 13. In addition, a backlight 15 that serves as an
illumination device is disposed on an external surface of the
polarizer 14. Preferably, the backlight 15 may be a combination
between a point light source such as an LED (Light Emitting Diode)
or a line light source such as a cold cathode fluorescent lamp and
a light guiding plate.
[0147] Meanwhile, a structure of the color filter substrate 92 that
corresponds to the reflective region E11 in one of the sub-pixel
regions SG of R, G, and B is as follows.
[0148] At locations of a top surface of an upper substrate 2 made
of the same material as the lower substrate 1, which correspond to
the reflective region E11, colored layers 6 of R, G, and B are
formed. The thickness of each of the colored layers 6 is set to d3.
Each of the colored layers 6 has an opening 6a that has a function
of uniformly displaying a color in a transmissive region E10 and a
reflective region E11. At a location which partitions adjacent
colored layers 6, the BM is formed. On the colored layer 6, a
cell-thickness-adjusting insulating layer 18 is formed which is
made of a resin material. As described below, the
cell-thickness-adjusting insulating layer 18 has some functions.
That is, the cell-thickness-adjusting insulating layer 18 has a
function of setting to optimum values the thickness of the liquid
crystal layer 4 (thickness of cells) that correspond to the
respective transmissive regions E10 of R, G, and B and the
thickness of the liquid crystal layer 4 that corresponds to the
respective reflective regions E11 of R, G, and B and setting
optical characteristic at both regions of the liquid crystal layer
to be uniform, that is a function of having a multigap structure;
and has a function of setting the thickness of the liquid crystal
layer 4 that correspond to the respective transmissive regions E10
of R, G, and B and the thickness of the liquid crystal layer 4 that
corresponds to a sub-pixel region SG (transmissive region E10) of W
to the same value and setting optical characteristic at both
regions of the liquid crystal layer to be uniform. The thickness of
the cell-thickness-adjusting insulating layer 18 is set to have the
same thickness as the thickness d3 of each colored layer 6. On the
cell-thickness-adjusting insulating layer 18, a common electrode 8
is formed.
[0149] In addition, a phase difference plate 11 (1/4 wavelength
plate) is disposed on an external surface of an upper substrate 2,
and a polarizer 12 is disposed on an external surface of the phase
difference plate 11.
[0150] The element substrate 91 that corresponds to the
above-described reflective region E11 and the color filter
substrate 92 that corresponds to the corresponding reflective
region E11 are opposite to each other with the liquid crystal layer
4 interposed therebetween. In addition, the thickness of the liquid
crystal layer 4 that corresponds to the reflective region E11 is
set to d2.
[0151] Further, when reflective display is performed in a
reflective region E11 having the above-described structure,
external light, which is incident on the liquid crystal device 100,
propagates along a path R shown in FIGS. 4A and 4B. That is, the
external light having been incident on the liquid crystal device
100 is reflected on the reflective electrode 5 and then propagates
to a viewer. In this case, the external light is transmitted
through a region where the respective colored layers 6 of R, G, and
B, the common electrode 8, and the pixel electrode 10 are formed,
then reflected on the reflective electrode 5 located below the
pixel electrode 10, and then transmitted through the pixel
electrode 10, the common electrode 8, and the colored layer 6 so as
to represent predetermined hue and brightness. In this way, a
viewer can view a desired color display image.
[0152] Next, a structure of the transmissive region E10 in one of
the sub-pixel regions SG of R, G, and B will be described.
[0153] As shown in FIG. 4B, on the lower substrate 1, a gate
insulating layer 50 is formed. On the gate insulating layer 50, the
passivation layer 51 is formed. On the passivation layer 51, a
resin layer 17 is formed. As described above, the plurality of
minute unevenness portions are formed on the surface of the resin
layer 17 formed in the reflective region E11 while the minute
unevenness portion is not formed on the surface of the resin layer
15 formed in the transmissive region E10. That is, the resin layer
17 that is formed in the transmissive region E10 is formed such
that its surface is substantially flat. On the resin layer 17, the
pixel electrode 10 is formed. In addition, the phase difference
plate 13 is disposed on an external surface of the lower substrate
1, and the polarizer 14 is disposed on an external surface of the
phase difference plate 13. Further, a backlight 15 is disposed on
an external surface of the polarizer 14.
[0154] Meanwhile, a structure of the color filter substrate 92 that
corresponds to the transmissive region E10 in one of the sub-pixel
regions SG of R, G, and B is as follows. On the upper substrate 2,
colored layers 6 of R, G, and B are formed. On the respective
colored layers 6, the common electrode 8 is formed. In addition, a
phase difference plate 11 is disposed on an external surface of the
upper substrate 2, and the polarizer 12 is disposed on an external
surface of the phase difference plate 11.
[0155] The element substrate 91 that corresponds to the
above-described transmissive region E10 and the color filter
substrate 92 that corresponds to the transmissive region E10 are
opposite to each other with the liquid crystal layer 4 interposed
therebetween. In addition, the thickness d1 of the liquid crystal
layer 4 that corresponds to the transmissive region E10 is set to
be larger than the thickness d2 of the liquid crystal layer 4 that
corresponds to the reflective region E11, which results in forming
a multigap structure.
[0156] Further, when transmissive display is performed in a
transmissive region E10 having the above-described structure,
illumination light, which is emitted from the backlight 15,
propagates along a path T shown in FIG. 4B, and then passes through
the gate insulating layer 50, the passivation layer 51, the pixel
electrode 10, and the colored layer 6 so as to propagate to a
viewer. In this case, the illumination light is transmitted through
the respective colored layers of R, G, and B so as to represent
predetermined hue and brightness. In this way, a viewer can view a
desired color display image.
[0157] Next, a structure of a sub-pixel SG corresponding to W will
be described with reference to FIG. 5.
[0158] FIG. 5 is a partial cross-sectional view taken along the
line V-V in FIG. 2, which illustrates a sectional structure
including a sub-pixel region SG corresponding to W. In addition, in
order to easily recognize a different portion between the sectional
structure of the sub-pixel region SG corresponding to W and the
sectional structure of each of the sub-pixel regions SG
corresponding to R, G, and B, FIG. 5 also shows a sectional
structure of a sub-pixel region SG that corresponds to G among the
three colors including R, G, and B. In addition, in FIG. 5, the
sub-pixel region SG corresponding to W is simply denoted by SG (W),
and the sub-pixel region SG corresponding to G is simply denoted by
SG (G). Further, in the below description, the constituent elements
that are the same as the above-described constituent elements are
denoted by the same reference numerals, and the description thereof
will be simplified or omitted.
[0159] First, a structure of the element substrate 91 that
corresponds to the sub-pixel region SG of W will be described while
comparing it with a structure of the element substrate 91 that
corresponds to the sub-pixel region SG of G.
[0160] In order that the difference between both structures can be
easily recognized by comparing both structures with each other, in
the sub-pixel region SG that corresponds to W, a reflective
electrode 5 is not provided between the resin layer 17 and the
pixel electrode 10. In addition, both structures are substantially
equal to each other in the other portions. Therefore, the sub-pixel
region SG of W has a structure in which only a transmissive region
E10 is provided. Meanwhile, a structure of a color filter substrate
92 that corresponds to the sub-pixel region SG of W is as follows.
The cell-thickness-adjusting insulating layer 18 is formed on the
upper substrate 2 so as to have predetermined thickness d3, and the
common electrode 8 is formed on the cell-thickness-adjusting
insulating layer 18. In addition, in the sub-pixel region SG that
corresponds to W, the colored layer using a white material is not
provided, as described above.
[0161] The element substrate 91 that corresponds to the
above-described sub-pixel region SG of W and the color filter
substrate 92 that corresponds to the corresponding transmissive
region E10 are opposite to each other with the liquid crystal layer
4 interposed therebetween. In addition, the thickness of the liquid
crystal 4 that corresponds to the sub-pixel region SG of W is set
to have the same value as the thickness d1 (.apprxeq.d2+d3) of the
liquid crystal layer 4 that corresponds to the respective
transmissive regions E10 of R, G, and B.
[0162] In addition, the reason why the transmissive display is
performed in the sub-pixel region SG of W is substantially the same
as the above. That is, when the transmissive display is performed
in the sub-pixel region SG of W, the illumination light, which is
emitted from the backlight 15, propagates along a path T shown in
FIG. 5, then passes through the gate insulating layer 50, the
passivation layer 51, the pixel electrode 10, the common electrode
8, and the cell-thickness-adjusting insulating layer 18, and then
propagates to a viewer. In this case, the illumination light is
transmitted through the above-described elements so as to represent
predetermined brightness. Thereby, the luminance and the contrast
can be improved.
[0163] Next, advantages and effects of the liquid crystal device
100 according to the first embodiment of the invention will be
described.
[0164] In general, in the liquid crystal device that has display
pixels corresponding to the respective colors of R, G, B, and W
(transparent), the display pixel of W is added, in addition to the
respective display pixels of R, G, and B, which results in
achieving high luminance and high contrast. Meanwhile, a color
material does not exist in the display of W. Therefore, in order
that the thickness of the liquid crystal layer (cell thickness)
that corresponds to the transmissive regions of the display pixels
of R, G, and B is set to the same thickness as the liquid crystal
layer (cell thickness) that corresponds to the transmissive region
of the display pixel of W, a cell-thickness-adjusting transparent
resin layer needs to be provided at a location that corresponds to
the display pixel of W. In addition, in the transflective liquid
crystal device that has a multigap structure, in order that optical
characteristic is made to be uniform in the transmissive region and
the reflective region, a resin layer for a multigap is generally
formed in the reflective region. Further, the thickness of the
liquid crystal layer that corresponds to the transmissive region is
set to be larger than the thickness of the liquid crystal device
that corresponds to the reflective region.
[0165] In the transflective liquid crystal device having such a
multigap structure, in a case in which the liquid crystal device is
constructed such that it has display pixels corresponding to the
respective colors of R, G, B, and W (transparent) (hereinafter,
referred to as a comparative example), it is necessary that the
cell-thickness-adjusting transparent resin layer and a resin layer
for a multigap made of a different material from that of the
cell-thickness-adjusting transparent resin layer be respectively
provided at a location corresponding to the display pixel of W and
in the respective reflective regions of the respective display
pixels of R, G, and B in a separated manner. Due to this, the
number of processes is increased, which results in increasing the
manufacturing cost of the liquid crystal device.
[0166] In the liquid crystal device 100 according to the first
embodiment, in particular, the cell-thickness-adjusting insulating
layer 18, which is made of the same transparent material (for
example, a transparent resin material), is provided in the
reflective regions E11 of R, G, and B and the transmissive region
E10 of W (transparent). That is, in the course of manufacturing the
liquid crystal device 100, the cell-thickness-adjusting insulating
layer 18 that is provided on the respective colored layers 6 in the
respective reflective regions E11 of R, G, and B and the
cell-thickness-adjusting insulating layer 18 that is provided in
the transmissive region E10 of W (transparent) are simultaneously
formed of the same transparent material through the same process.
Thereby, the multigap structure and the cell-thickness-adjusting
insulating layer 18 can be simultaneously respective formed at a
location that corresponds each of the sub-pixel regions SG of R, G,
and B and the sub-pixel region SG (transmissive region E10) of W.
As a result, it is possible to reduce the number of processes as
compared with the comparative example, which results in reducing
the manufacturing cost of the liquid crystal device 100.
[0167] As described above, in the relationship among the thickness
d1 of the liquid crystal layer 4 that corresponds to the respective
transmissive regions E10 of R, G, B, and W, the thickness d2 of the
liquid crystal layer 4 that correspond to the respective reflective
regions E11 of R, G, and B, the thickness d3 of the
cell-thickness-adjusting insulating layer 18 that corresponds to
the respective reflective regions E11 of R, G, and B, the thickness
d3 of the cell-thickness-adjusting insulating layer 18 that
corresponds to the respective transmissive region E10 of W, and the
thickness d3 of the respective colored layers 6, the relationship
is preferably set to satisfy the condition d1.apprxeq.d2+d3. In
addition, when the thickness d1 is set to 4 .mu.m and the thickness
d2 is set to 2 .mu.m, the thickness d3 is preferably set to about 2
.mu.m.
Second Embodiment
[0168] In the second embodiment, the invention is applied to an
active-matrix-driven liquid crystal device that uses a TFD (Thin
Film Diode) element as an example of a two-terminal element.
Structure of Liquid Crystal Device
[0169] Next, a structure of a liquid crystal device 200 according
to the second embodiment of the invention will be described. In the
below description, the same constituent elements as the first
embodiment are denoted by the same reference numerals, and the
description thereof is simplified or omitted.
[0170] FIG. 6 is a plan view schematically illustrating a structure
of a liquid crystal device 200 according to the second embodiment
of the invention. As shown in FIG. 6, the liquid crystal device 200
includes an element substrate 93 and a color filter substrate 94
that is disposed so as to be opposite to the element substrate 93.
The element substrate 93 and the color filter substrate 94 are
bonded to each other through a sealant 5 with a frame shape in
which conductive members 7, such as a plurality of metallic
particles, are mixed. Liquid crystal is injected inside the sealant
5 so as to form a liquid crystal layer 4. In FIG. 6, the element
substrate 93 is disposed on the front side of the paper (viewing
side), and the color filter substrate 94 is disposed on the
interior side of the paper. That is, the arrangement of both
substrates in the second embodiment is opposite to that in the
first embodiment.
[0171] In this case, the liquid crystal device 200 corresponds to a
liquid crystal device for color display which is constructed by
using four colors including R, G, B, and W and an
active-matrix-driven liquid crystal device that uses a TFD element
as a switching element. Further, the liquid crystal device 200
corresponds to a transflective liquid crystal device in which each
of the sub-pixel regions SG corresponding to R, G, and B has a
transmissive region and a reflective region and a liquid crystal
device having a multigap structure in which the thickness of a
liquid crystal layer 4 is different in the corresponding
transmissive region and the corresponding reflective region.
[0172] First, a planar structure of the element substrate 93 will
be described. The element substrate 93 mainly includes a plurality
of data lines 62, a plurality of TFD elements 63, a plurality of
pixel electrodes 10, a plurality of wiring lines 61, a Y driver IC
69, a plurality of X driver ICs 66, a plurality of external
connection wiring lines 35, and an FPC 41.
[0173] As shown in FIG. 6, the plurality of data lines 62 are
linear wiring lines that extend in a Y direction, and they are
formed from an extending region 31 to an effective display region
V. The respective data lines 62 are formed at predetermined
intervals in an X direction. Further, each of the data lines 62 is
connected to each of the corresponding TFD elements 63, and each of
the TFD elements 63 is connected to each of the corresponding pixel
electrodes 10. Therefore, the respective data lines 62 and the
respective pixel electrodes 10 are electrically connected to each
other through the respective TFD elements 63.
[0174] Each of the plurality of wiring lines 61 has a main line
portion 61a that extends in a Y direction, and a bent portion 61b
that is bent at substantially a right angle with respect to the
main line portion 61a in an X direction. Each of the main line
portions 61a is formed such that it extends in a frame region 38
from the extending region 31 to a Y direction. In addition, each of
the main line portions 61a is formed so as to be substantially
parallel to each data line 62 at a predetermined interval. Each of
the bent portions 61b extends to the sealant 5 located at the left
and right sides in an X direction, in the frame region 38. In
addition, a terminating portion of the bent portion 61b is
electrically connected to the conductive member 7 in the sealant
5.
[0175] On the extending region 31 of the element substrate 93, the
Y driver IC 69 and the plurality of X driver ICs 66 are mounted.
Further, a plurality of external connection wiring lines 35 are
formed on the extending region 31.
[0176] An input side of each of the X driver ICs 66 is electrically
connected to one end side of each of the external circuit
connection wiring lines 35, and an output side of each of the X
driver ICs 66 is electrically connected to one end side of each of
the wiring lines 61. Thereby, each of the X driver ICs 66 can
output a scanning signal to each of the wiring lines 61.
[0177] An input side of the Y driver IC 69 is electrically
connected to one end side of each of the external circuit
connection wiring lines 35, and an output side of the Y driver IC
69 is electrically connected to one end side of each of the data
lines 62. Thereby, the Y driver IC 69 can output a data signal to
each of the date lines 62.
[0178] The FPC 41 is electrically connected to an electronic
apparatus to be described below and the other end side of each of
the plurality of external circuit connection wiring lines 35.
[0179] In the element substrate 93 having the above-described
structure, the data signals and the scanning signals are
respectively output to the respective data lines 62 and the
respective wiring lines 61 through the FPC 41, the Y driver IC 69,
and each of the X driver ICs 66 from the electronic apparatus, such
as, for example, the cellular phone or the information
terminal.
[0180] Next, a planar structure of the color filter substrate 94
will be described. As shown in FIG. 6, the color filter substrate
94 mainly has the respective colored layers 6 of R, G, and B, and
the scanning electrodes 64 that are formed in a stripe.
[0181] The respective colored layers 6 are formed at locations that
correspond to the pixel electrodes 10. A light shielding layer 67
(see FIG. 9A), which is formed by overlapping the colored layers of
any two colors among the respective colored layers 6 of R, G, and
B, is formed between adjacent colored layers 6 in a Y direction. In
addition, a light shielding layer 68 (see FIG. 9B), which is formed
by overlapping the colored layers of three colors among the
respective colored layers 6 of R, G, and B, is formed between
adjacent colored layers 6 in an X direction. The respective
scanning electrodes 64 are formed such that they extend in an X
direction at predetermined intervals in a Y direction. As shown in
FIG. 6, left end portions or right end portions of the respective
scanning electrodes 64 extend to the inside of the sealant 5, and
they are electrically connected to the plurality of conductive
members 7 that are provided in the sealant 5.
[0182] The above-described state in which the color filter
substrate 94 and the element substrate 93 are bonded to each other
through the sealant 5 is shown in FIG. 6. As shown in FIG. 6, the
respective scanning electrodes 64 of the color filter substrate 94
cross the respective data lines 62 of the element substrate 93, and
overlap two-dimensionally the plurality of pixel electrodes 10 that
forms columns in an X direction. As such, one sub-pixel region SG
is constructed by a region where one scanning electrode 64 and one
pixel electrode 10 overlap each other.
[0183] In addition, the respective scanning electrodes 64 of the
color filter substrate 94 and the respective wiring lines 61 of the
element substrate 93 are alternately disposed between the left side
200a and the right side 200b, as shown in the drawing. The
respective scanning electrodes 64 and the respective wiring lines
61 are vertically connected to each other through conductive
members 7 provided in the sealant 5. That is, the respective
scanning electrodes 64 of the color filter substrate 94 and the
respective wiring lines 61 of the element substrate 93 are
alternately disposed between the left side 200a and the right side
200b, as shown in the drawing, so that they are electrically
connected to each other. For this reason, the respective scanning
electrodes 64 of the color filter substrate 94 are electrically
connected to the respective X driver ICs 66, which are respectively
located on the right and left sides of the paper, through the
respective wiring lines 61 of the element substrate 93.
[0184] In the liquid crystal device 200 having the above-described
structure, the respective scanning electrodes 64 are sequentially
and exclusively selected one by one by the respective X driver ICs
66 through the respective wiring lines 61 on the basis of power and
a signal from the FPC 41 side that is connected to the electronic
apparatus or the like, and the selected scanning electrodes 64 are
supplied with a gate signal of the selection voltage. Meanwhile,
the other non-selected scanning electrodes 64 are provided with the
scanning signals of the non-selected voltage. In addition, the Y
driver IC 69 supplies data signals according to display contents to
the pixel electrodes 10 formed at locations corresponding to the
selected scanning electrode 64 through the corresponding data lines
62 and the corresponding TFD elements 63. As a result, a display
state of the liquid crystal layer 4 is changed to a non-display
state or an intermediate display state, and an alignment state of
the liquid crystal layer 4 is controlled.
Structure of Pixel
[0185] Next, a structure of one pixel region AG will be described
with reference to FIG. 7. FIG. 7 is an enlarged plan view
illustrating a portion corresponding to one pixel region AG (a
portion surrounded with broken lines) in FIG. 6.
[0186] As shown in FIG. 7, one pixel region AG has a structure in
which sub-pixel regions SG of two rows and two columns
corresponding to R, G, B, and W are provided. Further, each of the
sub-pixel regions SG that correspond to R, G, and B has a
transmissive region E10 where transmissive display is performed,
and a reflective region E11 where reflective display is performed.
Meanwhile, the sub-pixel region SG that corresponds to W has only a
transmissive region E10, and does not have a reflective region
E11.
[0187] Next, a structure of each of the sub-pixel regions SG that
correspond to R, G, and B in FIG. 7 will be described with
reference to FIG. 8.
[0188] FIG. 8A is a partial enlarged plan view illustrating a
structure of an element substrate 93 corresponding to the
respective sub-pixel regions SG of R, G, and B. FIG. 8B is a
partial enlarged plane view illustrating a structure of a color
filter substrate 94 that corresponds to the respective sub-pixel
regions SG of R, G, and B. FIG. 9A is a partial cross-sectional
view taken along the cutting line IXA-IXA in FIG. 8A, and
illustrates a sectional structure of the liquid crystal device 200
that corresponds to the respective reflective regions E11 of R, G,
and B. FIG. 9B is a partial cross-sectional view taken along the
cutting line IXB-IXB in FIG. 8A, and illustrates a sectional
structure of the liquid crystal device 200 that corresponds to the
respective sub-pixel regions SG of R, G, and B.
[0189] First, a structure of an element substrate 93 that
corresponds to one of the sub-pixel regions SG of R, G, and B will
be described. On a lower substrate 81 that is formed of a material,
such as glass, the data line 62, the TFD element 63, and the pixel
electrode 10 are formed. As shown in FIG. 8, the data line 62 is
formed such that it extends in a Y direction near a right end of
the sub-pixel region SG. The TFD element 63 is provided near a
corner of the sub-pixel region SG. The pixel electrode 10 is
provided in the sub-pixel region SG, so that it is electrically
connected to the TFD element 63. Therefore, the data line 62 is
electrically connected to the pixel electrode 10 through the TFD
element 63. In addition, on the pixel electrode 10 or the like, an
alignment film (not shown) is formed.
[0190] Next, a structure of the color filter substrate 94 that
corresponds to one sub-pixel region SG will be described. Here, one
sub-pixel region SG is divided into a structure of a transmissive
region E10 and a structure of a reflective region E11.
[0191] First, a structure of the reflective region E11 in one of
the sub-pixel regions SG of R, G, and B will be described.
[0192] On the upper substrate 82 that is made of glass or the like,
the resin layer 17 is formed. On the surface of the resin layer 17,
a plurality of unevenness portions, each of which has a function of
scattering light, are formed. On the resin layer 17, a reflecting
layer 65 made of Al or the like is formed. For this reason, the
reflecting layer 65 is formed in a shape that reflects the
plurality of unevenness portions of the resin layer 17. On the
reflecting layer 65, the respective colored layers 6 of R, G, and B
are formed. Each of the colored layers 6 of R, G, and B has an
opening 6a that has a function of uniformly displaying a color in a
transmissive region E10 and a reflective region E11. In FIG. 8B, a
region that is partitioned by the sub-pixel region SG and the
broken line region E30 has a region in which a light shielding
layer 67 where the colored layers 6 of any two colors among the
colored layers 6 of R, G, and B overlap each other is formed, and a
region in which a light shielding layer 68 where the colored layers
6 of any three colors overlap one another is formed. On the colored
layer 6 and the reflecting layer 65 that is located in the opening
6a, a protective layer 19 having an insulating property is formed.
The protective layer 19 has a function of protecting the colored
layer 6 from being corroded or contaminated due to impurities that
are used in a process of manufacturing the color filter substrate
94. The distance between the top surface of the resin layer 17 and
the top surface to the protective layer 19 is set to d7. On the
protective layer 19, the cell-thickness-adjusting insulating layer
18 is formed. The thickness of the cell-thickness-adjusting
insulating layer 18 is set to d7. The scanning electrode 64 is
formed on the cell-thickness-adjusting insulating layer 18.
Further, an alignment film (not shown) is formed on the scanning
electrode 64.
[0193] In addition, on an external surface of the lower substrate
81, a phase difference plate 13 is disposed, and on an external
surface of the phase difference plate 13, a polarizer 14 is
disposed. Further, a backlight 15 is disposed on an external
surface of the polarizer 14.
[0194] The element substrate 93 that corresponds to the
above-described reflective region E11 and the color filter
substrate 94 that corresponds to the corresponding reflective
region E11 are opposite to each other with the liquid crystal layer
4 interposed therebetween. In addition, the thickness of the liquid
crystal layer 4 that corresponds to the reflective region E11 is
set to d6.
[0195] Furthermore, when the reflective display is performed in a
reflective region E11 having the above-described structure,
external light, which is incident on the liquid crystal device 200,
propagates along a path R shown in FIGS. 9A and 9B. That is, the
external light having been incident on the liquid crystal device
200 is reflected on the reflecting layer 65 and then propagates to
a viewer. In this case, the external light passes through a region
where the pixel region 10, the cell-thickness-adjusting insulating
layer 18, and the respective colored layers 6 of R, G, and B are
formed, then reflected on the reflecting layer 65 located below the
respective colored layers 6 and the reflecting layer 65 located in
the opening 6a, and then passes through the colored layer 6, the
cell-thickness-adjusting insulating layer 18, and the pixel
electrode 10 again so as to represent predetermined hue and
brightness. In this way, a viewer can view a desired color display
image.
[0196] Next, a structure of the transmissive region E10 in one of
the sub-pixel regions SG of R, G, and B will be described.
[0197] As shown in FIG. 9B, on the lower substrate 81, a resin
layer 17 is formed. On the resin layer 17, a transmissive opening
region 85 that transmits the light is formed. In addition, on the
resin layer 17 that is located in the transmissive opening region
85, the colored layers 6 of R, G, and B are formed. On the colored
layers 6 of R, G, and B, the protective layer 19 is formed. In
addition, on the protective layer 19, the scanning electrode 64 is
formed. In addition, on the scanning electrode 64, an alignment
film (not shown) is formed.
[0198] Further, on an external surface of the lower substrate 81, a
phase difference plate 13 is disposed, and a polarizer 14 is
disposed on the external surface of the phase difference plate 13.
Further, on an external surface of the polarizer 14, a backlight 15
is disposed. Meanwhile, on the upper substrate 82, the pixel
electrode 10 is formed. Further, on the pixel electrode 10, an
alignment film (not shown) is formed.
[0199] The element substrate 93 that corresponds to the
above-described transmissive region E10 and the color filter
substrate 94 that corresponds to the corresponding transmissive
region E10 are opposite to each other with the liquid crystal layer
4 interposed therebetween. In addition, the thickness d5
(.apprxeq.d6+d7) of the liquid crystal layer 4 that corresponds to
the transmissive region E10 is set to be larger than the thickness
d6 of the liquid crystal layer 4 that corresponds to the reflective
region E11, which results in forming a multigap structure.
[0200] Further, when transmissive display is performed in a
transmissive region E10 having the above-described structure,
illumination light, which is emitted from the backlight 15,
propagates along a path T shown in FIG. 9B, and then passes through
the resin layer 17, the colored layer 6, the protective layer 19,
the scanning electrode 64, and the pixel electrode 10 so as to
propagate to a viewer. In this case, the illumination light passes
through the colored layers 6 of R, G, and B, which results in
representing predetermined hue and brightness. In this way, a
viewer can view a desired color display image.
[0201] Next, a structure of a sub-pixel SG corresponding to W will
be described with reference to FIG. 10.
[0202] FIG. 10 is a partial cross-sectional view taken along the
cutting line X-X in FIG. 7, which illustrates a sectional structure
including a sub-pixel region SG corresponding to W. In addition, in
order to easily recognize a different portion between the sectional
structure of the sub-pixel region SG corresponding to W and the
sectional structure of each of the sub-pixel regions SG
corresponding to R, G, and B, FIG. 10 also shows a sectional
structure of a sub-pixel region SG that corresponds to G among the
three colors. In addition, in FIG. 10, the sub-pixel region SG
corresponding to W is simply denoted by SG (W), and the sub-pixel
region SG corresponding to G is simply denoted by SG (G). Further,
in the below description, the constituent elements that are the
same as the above-described constituent elements are denoted by the
same reference numerals, and the description thereof will be
simplified or omitted.
[0203] First, a structure of the color filter 94 that corresponds
to the sub-pixel region SG of W will be described. On the lower
substrate 81, the resin layer 17 is formed. The resin layer 17,
which is formed in the transmissive region E10, is formed such that
its surface is flat. On the resin layer 17, the
cell-thickness-adjusting insulating layer 18 is formed. On the
cell-thickness-adjusting insulating layer 18, the scanning
electrode 64 is formed. Further, on the scanning electrode 64, an
alignment film (not shown) is formed. For this reason, the
sub-pixel region SG which corresponds to W has only a transmissive
region E10. In addition, in the sub-pixel region SG that
corresponds to W, a colored layer that uses a white material is not
provided. Meanwhile, a structure of the element substrate 93 that
corresponds to the sub-pixel region SG corresponding to W is the
same as that of the element substrate 93 that corresponds to the
sub-pixel regions SG of R, G, and B.
[0204] The element substrate 93 that corresponds to the
above-described sub-pixel region SG of W and the color filter
substrate 94 that corresponds to the corresponding transmissive
region E10 are opposite to each other with the liquid crystal layer
4 interposed therebetween. In addition, the thickness of the liquid
crystal layer 4 that corresponds to the sub-pixel region SG of W is
set to have the same value as the thickness d5 of the liquid
crystal layer 4 that corresponds to the respective transmissive
regions E10 of R, G, and B.
[0205] In addition, the reason why the transmissive display is
performed in the sub-pixel region SG of W is substantially the same
as the above. That is, when the transmissive display is performed
in the sub-pixel region SG of W, the illumination light, which is
emitted from the backlight 15, propagates along a path T shown in
FIG. 10, then passes through the resin layer 17, the
cell-thickness-adjusting insulating layer 18, the scanning
electrode 64, and the pixel electrode 10, and then propagates to a
viewer. In this case, the illumination light passes through the
above-described elements so as to represent predetermined
brightness. Thereby, the luminance and the contrast can be
improved.
[0206] Next, advantages and effects of the liquid crystal device
200 according to the second embodiment of the invention will be
described. The liquid crystal device 200 according to the second
embodiment has the same advantages and effects as the liquid
crystal device according to the first embodiment.
[0207] That is, in the liquid crystal device 200, in particular, in
the reflective region E11 of each of R, G, and B and the
transmissive region E10 of W (transparent), the
cell-thickness-adjusting insulating layer 18, which is made of the
same transparent material (for example, transparent resin
material), is provided. That is, in the course of manufacturing the
liquid crystal device 200, the cell-thickness-adjusting insulating
layer 18 that is provided on the respective protective layers 19 in
the respective reflective regions E11 of R, G, and B and the
cell-thickness-adjusting insulating layer 18 that is provided in
the transmissive region E10 of W (transparent) are simultaneously
formed of the same transparent material through the same process.
Thereby, the multigap structure and the cell-thickness-adjusting
insulating layer 18 can be simultaneously respective formed at a
location that corresponds each of the sub-pixel regions SG of R, G,
and B and the sub-pixel region SG (transmissive region E10) of W.
As a result, it is possible to reduce the number of processes as
compared with the comparative example, which results in reducing
the manufacturing cost of the liquid crystal device 200.
[0208] As described above, in the relationship among the thickness
d5 of the liquid crystal layer 4 that corresponds to the respective
transmissive regions E10 of R, G, B, and W, the thickness d6 of the
liquid crystal layer 4 that correspond to the respective reflective
regions E11 of R, G, and B, and the thickness d7 of the
cell-thickness-adjusting insulating layer 18 that corresponds to
the respective reflective regions E11 of R, G, and B, and the
cell-thickness-adjusting insulating layer 18 that corresponds to
the respective transmissive region E10 of W, the relationship is
set to satisfy the condition d5.apprxeq.d6+d7. In addition, when
the thickness d5 is set to 4 .mu.m and the thickness d6 is set to 2
.mu.m, the thickness d7 is preferably set to about 2 .mu.m.
Modification
[0209] In the first embodiment, since the uniform color is
displayed in the transmissive region E10 and the reflective region
E11 in the respective sub-pixel regions SG of R, G, and B at the
color filter substrate 92 side, the opening 6a is provided in the
colored layer 6 that is formed in the reflective region E11. The
invention is not limited thereto, and the opening 6a is not
provided in the colored layer 6, the thickness of the colored layer
6 that is provided in the transmissive region E10 is made to be
larger than the thickness of the colored layer 6 that is formed in
the reflective region E11 so as to obtain the same advantages and
effects.
[0210] The above-described structure will be simply described with
reference to FIG. 11. FIG. 11 is a cross-sectional view that
corresponds to FIG. 5. In this case, in FIG. 11, as can be
apprehended in the sub-pixel region SG of G, the thickness of the
colored layer 6 that is formed in the transmissive region E10 is
different from that of the colored layer 6 that is formed in the
reflective region E11.
[0211] That is, as shown in FIG. 11, when focusing on the sub-pixel
region SG that corresponds to the colored layer 6G, the structures
of the transmissive region E10 and the reflective region E11 are as
follows. First, in the transmissive region E10, the colored layer
6G is formed on the upper substrate 2, and the common electrode 8
is formed on the colored layer 6G. Meanwhile, in the reflective
region E11, the resin layer 20, which is made of a resin material,
is formed on the upper substrate 2, the colored layer 6G is formed
on the resin layer 20, and the cell-thickness-adjusting insulating
layer 18 is formed on the colored layer 6G. In addition, on the
cell-thickness-adjusting insulating layer 18, the common electrode
8 is formed. Further, the thickness of the colored layer 6G that is
formed in the transmissive region E10 is set to d8, and the
thickness of the colored layer 6G that is formed in the reflective
region E11 is set to d9 (<d8). In this case, preferably, the
thickness d8 of the colored layer 6G that is formed in the
transmissive region E10 is set to the thickness that is twice as
much as the thickness d9 of the colored layer 6G that is formed in
the reflective region E11.
[0212] In this structure, when the transmissive display is
performed, the illumination light that has been emitted from the
backlight 15 passes through the colored layer 6G of the
transmissive region E10 along the path T one time. Meanwhile, when
the reflective display is performed, the external light firstly
passes through the colored layer 6G of the reflective region E11
along the path R, then the external light that has passed through
the colored layer 6G is reflected on the reflective electrode 5
that is disposed below the colored layer 6G, and then passes
through the colored layer 6G along the path R again. As a result,
the external light passes through the colored layer 6G twice. That
is, when the reflective display is performed, the external light
passes though the colored layer 6G by the small number of times, as
compared with the case in which the transmissive display is
performed.
[0213] For this reason, in a case in which the thickness d8 of the
colored layer 6G that is formed in the transmissive region E10 is
set to the thickness that is twice as much as the thickness d9 of
the colored layer 6G that is formed in the reflective region E11,
the light passes through the transmissive region E10 and the
reflective region E11 at the same wavelength. As a result, a color
can be uniformly displayed in both the transmissive region and the
reflective region. In this case, although not described, each of
the sub-pixel regions of R and B can have the same structure as the
modification.
[0214] Further, similar to the first embodiment, in order that in
each of the sub-pixel regions SG of R, G, and B, the uniform color
is displayed in the transmissive region E10 and the reflective
region E11, the second embodiment is constructed such that the
opening 6a is provided in the colored layer 6 that is formed in the
reflective region E11.
[0215] The invention is not limited thereto. That is, even in the
second embodiment, the same structure as the above-described
modification can be used. This characteristic is simply described
with reference to FIG. 12. FIG. 12 is a cross-sectional view that
corresponds to FIG. 10. In this case, in FIG. 12, the thickness of
the colored layer 6 that is formed in the transmissive region E10
is different from that of the colored layer 6 that is formed in the
reflective region E11, as is apprehended by focusing on the
sub-pixel region SG of G.
[0216] That is, as shown in FIG. 12, when focusing on the sub-pixel
region SG that corresponds to the colored layer 6G, the structures
of the transmissive region E10 and the reflective region E11 are as
follows. First, in the transmissive region E10, the colored layer
6G is formed on the lower substrate 81, the protective layer 19 is
formed on the colored layer 6G, and the scanning electrode 64 is
formed on the protective layer 19. Meanwhile, in the reflective
region E11, the resin layer 17 is formed on the lower substrate 81,
and the reflecting layer 65 is formed on the resin layer 17. In
addition, the colored layer 6G is formed on the reflecting layer
65, and the protective layer 19 is formed on the colored layer 6G.
In addition, on the protective layer 19, the
cell-thickness-adjusting insulating layer 18 is formed, and the
scanning electrode 64 is formed on the cell-thickness-adjusting
insulating layer 18.
[0217] In addition, the thickness of the colored layer 6G that is
formed in the transmissive region E10 is set to d10, and the
thickness of the colored layer 6G that is formed in the reflective
region E11 is set to d11 (<d10). In this case, preferably, the
thickness d10 of the colored layer 6G that is formed in the
transmissive region E10 is set to the thickness that is twice as
much as the thickness d11 of the colored layer 6G that is formed in
the reflective region E11. As a result, by using the
above-mentioned method, the light is transmitted through the
transmissive region E10 and the reflective region E11, and the
uniform color can be displayed in the transmissive region E10 and
the reflective region E11. In addition, each of the sub-pixel
regions SG of R and B can have the same structure as the
above-mentioned modification.
[0218] In addition, in the first and second embodiments (including
the above-mentioned modification), in each of the respective
sub-pixel regions SG of R, G, and B, the transmissive region E10
and the reflective region E11 are provided, while only the
transmissive region E10 is provided in the sub-pixel region SG of
W. However, the invention is not limited thereto. In the first and
second embodiments of the invention, similar to the structures of
the respective sub-pixel regions SG of R, G, and B, the sub-pixel
region SG of W also has a structure in which the transmissive
region E10 and the reflective region E11 are provided. FIGS. 13A
and 13B illustrates a planar structure of one pixel region AG
having the above-mentioned structure in which the sub-pixel region
SG of W has the transmissive region E10 and the reflective region
E11. FIG. 13A is a plan view illustrating a portion the corresponds
to FIG. 2 showing the liquid crystal device according to the first
embodiment of the invention, and illustrates a structure in which
the transmissive region E10 and the reflective region E11 are
provided in the sub-pixel region SG of W. FIG. 13B is a plan view
illustrating a portion the corresponds to FIG. 7 showing the liquid
crystal device according to the second embodiment of the invention,
and illustrates a structure in which the transmissive region E10
and the reflective region E11 are provided in the sub-pixel region
SG of W.
[0219] In this case, in the first embodiment (including the
above-mentioned modification), at the element substrate 91 side,
the reflective electrode 5 needs to be provided between the resin
layer 17 and the pixel electrode 10 that correspond to the
reflective region E11 of W. Meanwhile, in the second embodiment
(including the above-described modification), at the color filter
substrate 94 side, the reflecting layer 65 needs to be provided
between the resin layer 17 and the cell-thickness-adjusting
insulating layer 18 in the reflective region E11 of W.
[0220] In addition, in the first and second embodiments, one pixel
region AG is formed by the sub-pixel regions SG of two rows and two
columns that include the colored layers 6 of R, G, B, and W, but
the invention is not limited thereto. That is, as shown in FIG.
14A, one pixel region AG may be formed by sub-pixel regions SG
(each of which has the same area) of one row and four columns
including the colored layers 6 of R, G, B, and W. In addition, at
this time, the arrangement order of R, G, B, and W is not limited
to the structure shown in FIG. 14A, and it may be properly changed,
if necessary. As described above, if the colored layer of W is
provided in one pixel region AG, the luminance is improved, while
the color density is lowered due to the high luminance. Therefore,
in order to prevent the color density from being lowered while
improving the luminance, as shown in FIG. 14B, the area of
sub-pixel region SG of W is preferably set such that it is
relatively smaller than an area of each of the sub-pixel regions SG
of R, G, and B. In the present embodiment, the structure of one
pixel region, which includes the colored layers 6 of R, G, B, and
W, is not limited to the above-mentioned structure, but various
changes and modifications can be made without departing from the
spirit and scope of the invention.
[0221] In addition, in the first and second embodiments of the
invention, since the cell-thickness-adjusting insulating layer 18
may serve as the protective film of the respective colored layers 6
of R, G, and B, on the portion of the colored layer 6 that
corresponds to the transmissive region of each of the colored
layers of R, G, and B, the cell-thickness-adjusting insulating
layer 18 may remain as a thin-walled portion.
[0222] In addition, in the first and second embodiments of the
invention, the cell-thickness-adjusting insulating layer 18 and the
colored layer are disposed on the same substrate, but the invention
is not limited thereto. The cell-thickness-adjusting insulating
layer 18 and the colored layer 6 may be disposed on the separate
substrates. Specifically, the cell-thickness-adjusting insulating
layer 18 may be disposed on the substrate where the switching
element is provided, and the colored layer 6 may be disposed on the
substrate that is disposed to be opposite to the corresponding
substrate. At this time, the reflective electrode 5 or the
reflecting layer 65 may be disposed on the cell-thickness-adjusting
insulating layer 18. That is, it is preferable that it is prevented
by the cell-thickness-adjusting insulating layer 18 that the
difference in the thickness of the liquid crystal layer is largely
different between the transmissive region of each of the display
pixels including the colored layers 6 of R, G, and B and the
transmissive region of each of the display pixels of W not having
the colored layer.
Method of Manufacturing Liquid Crystal Device
[0223] Next, a method of manufacturing each of the liquid crystal
devices according to the first and second embodiment of the
invention will be described.
Method of Manufacturing Liquid Crystal Device According To First
Embodiment
[0224] First, a method of manufacturing a liquid crystal device 100
according to the first embodiment of the invention will be
described with reference to FIGS. 15 to 21. FIG. 15 is a flowchart
illustrating a method of manufacturing each of the liquid crystal
devices 100 and 200 according to the first and second embodiment of
the invention. FIG. 16 is a flowchart illustrating a method of
manufacturing a color filter substrate 92 according to the first
embodiment of the invention. FIGS. 17 to 21 are diagrams
illustrating the respective processes that correspond to the
process S1 in FIG. 15. In FIGS. 17 to 21, the SG (W) indicates the
sub-pixel region SG that corresponds to W (transparent), and the SG
(G) indicates the sub-pixel region SG that corresponds to G
(green). In addition, E10 indicates the region that becomes the
transmissive region, and E11 indicates the region that becomes the
reflective region. In the below description, the sectional
structure of the color filter substrate 92 shown in FIG. 5 will be
exemplified.
[0225] First, the above-mentioned color filter substrate 92 is
manufactured (Process S1). This color filter substrate 92 is
manufactured through the processes P1 to P6.
[0226] Specifically, first, the upper substrate 2, which is made of
a material, such as glass or quartz, is prepared. Then, a BM film,
which is made of, for example, a black resin material, is formed on
the upper substrate 2 by means of a photolithography technology,
and then an etching process is performed. Thereby, as shown in FIG.
17A, the BM is formed around the sub-pixel region SG so as to have
a frame shape (Process P1).
[0227] Next, the respective colored layer of R, G, and B are formed
(Process P2). Specifically, as shown in FIG. 17B, the respective
colored layers 6 of R, G, and B are formed in the respective
sub-pixel regions SG by means of a photolithography technology such
that they form the arrangement patterns shown in FIG. 1. At this
time, the thickness of each of the colored layers 6 is set to d3.
Preferably, the thickness d3 of each of the colored layers 6 is set
to about 2 .mu.m. Further, at this time, the opening 6a, which has
a function of uniformly displaying a color in the transmissive
region E10 and the reflective region E11, is provided in the
respective colored layers 6R, 6G, and 6B that correspond to the
reflective region 11. At this time, the colored layer 6, which is
formed in the sub-pixel region SG of W, is removed by means of an
etching process.
[0228] Next, the cell-thickness-adjusting insulating layer is
formed (Process P3). Specifically, the cell-thickness-adjusting
insulating layer 18, which is made of a transparent resin material,
is formed over one entire surface of the portion of the upper
substrate 2, the BM and the colored layer 6, and then an etching
process is performed. At this time, the thickness of the
cell-thickness-adjusting insulating layer 18 is set to have the
same thickness d3 as the colored layer 6. Thereby, when the liquid
crystal device 100 is manufactured by the above-mentioned method,
the thickness of the liquid crystal layer 4 at the transmissive
region E10 of W can be set to have the same thickness as the liquid
crystal layer 4 at the respective transmissive regions E10 of R, G,
and B, and the thickness of the liquid crystal layer 4 at the
respective transmissive region E10 of R, G, and B and the thickness
of the liquid crystal layer 4 at the respective reflective regions
E11 of R, G, and B can be set to the predetermined thickness.
[0229] Specifically, in this process, the cell-thickness-adjusting
insulating layer 18, which is made of the same transparent resin
material, are simultaneously formed in the sub-pixel region SG of W
and the respective reflective regions E11 of R, G, and B.
Therefore, when compared with a method of manufacturing a liquid
crystal device in which the cell-thickness-adjusting insulating
layer 18 is separately formed in the sub-pixel region SG of W and
the respective reflective regions E11 of R, G, and B (comparative
example), the number of the processes can be reduced. As a result,
it is possible to reduce the manufacturing cost of the liquid
crystal device 100 which is manufactured by the present
manufacturing method.
[0230] However, due to the process, the thickness of the
cell-thickness-adjusting insulating layer 18 may be larger than the
thickness of each of the colored layers 6.
[0231] In this case, the thickness of the liquid crystal device 4
that corresponds to the sub-pixel region SG (transmissive region
E10) of W (transparent) becomes different from that of the liquid
crystal layer 4 that corresponds to the respective transmissive
regions E10 of R, G, and B, which causes the variation in the
optical characteristic to occur in both regions.
[0232] Accordingly, in this case, the process P4 as a following
process is performed, and the thickness of the
cell-thickness-adjusting insulating layer 18 that corresponds to
the sub-pixel region SG (transmissive region E10) of W can be made
to be the same thickness as the respective colored layers 6 that
correspond to the respective transmissive regions E10 of R, G, and
B. Further, when the thickness of the cell-thickness-adjusting
insulating layer 18 and the thickness of the respective colored
layer 6 are set to have the same thickness, the process P4 does not
need to be performed. In addition, the process P4 may not the
following process of the process P3 but may be included in the
process P3.
[0233] In this case, the process P4 will be described with
reference to FIGS. 19 and 20. As described above, when the
thickness of the cell-thickness-adjusting insulating layer 18 is
larger than the thickness of each of the colored layers 6, in order
to resolve the disadvantages, in the process P4, the thickness of
the cell-thickness-adjusting insulating layer 18 is made to be the
same thickness as the respective colored layers 6 by means of a
photolithography process that includes a resist coating process, a
preliminary drying (prebaking) process, an exposure process, a
development process, and an etching process. At this time, as an
exposure method, for example, a double exposure method or a
halftone exposure method can be preferably used. In this case, `the
double exposure method` refers to a method of exposing the
substrate manufactured by the above-mentioned process by using each
of two different kinds of masks 70 and 75 having different
structures (totally, the exposure is performed twice). Meanwhile,
`a halftone exposing method` refers to a method of exposing the
substrate manufactured by the above-mentioned process once by using
a mask 76 of which a portion has a semitransparent film with the
smaller light transmittance than the transparent film.
[0234] First, a method of setting the thickness of the
cell-thickness-adjusting insulating layer 18 that corresponds to
the sub-pixel region SG of W (transmissive region E10) and the
thickness of the respective colored layer 6 with the same thickness
by means of the double exposing method will be described with
reference to FIG. 19. In the below description, in the
photolithography technology, the description of the other processes
other than the exposure process will be omitted or simplified.
[0235] As described above, the structure of the mask 70 is
different from that of the mask 75. The mask 70 is used when
performing first exposure to the substrate while the mask 75 is
used when performing second exposure to the substrate. In addition,
each of the plurality of arrows shown in FIGS. 19A and 19B
indicates a propagating direction of light, such as a UV
(ultraviolet) ray or an i ray.
[0236] First, in FIG. 19A, on the substrate that is manufactured by
the process P3, a photosensitive resin (resist) 18x, which becomes
a cell-thickness-adjusting insulating layer 18, is coated. At this
time, for example, when the thickness of each of the colored layers
6 of R, G, and B is set to d20, the resist 18 is coated by
predetermined thickness d21 (=2.times.d20). Next, first exposure is
performed by using the mask 70 that is disposed on a predetermined
location of the substrate, and then exposure and etching processes
are performed so as to remove any unnecessary resist 18x of the
predetermined region. In addition, at this time, as the resist 18x,
a positive resist is preferably used in which a resist of the
region where light is shielded by the mask is cured, and a resist
of the region exposed by the mask is removed.
[0237] In this case, as shown in FIG. 19A, the mask 70 has the
following regions that are sequentially formed from the left. That
is, the mask 70 has a first complete exposure region where an
opening for completely transmitting the light is formed (disposed
on a location that corresponds to the region of SG (W)), a complete
light shielding region that is made of a material for completely
shielding the light (disposed on a location that corresponds to the
respective reflective regions E11 of SG(G), SG(R), and SG(B)), and
a second complete exposure region (disposed on a location that
corresponds to the respective transmissive regions E10 of SG(G),
SG(R), and SG(B)).
[0238] Thereby, the resist 18x (corresponding to the thickness
d20), which is completely exposed by the mask 70 and corresponds to
the region E50 formed on a colored layer 6 of each of the
transmissive regions E10 of R, G, and B, and the resist 18x
(corresponding to the thickness d20), which corresponds to the
region E51 of the sub-pixel region SG of W, are removed. In
contrast, the resist 18x, which is completely shielded by the mask
70 and corresponds to each of the reflective regions E11 of R, G,
and B, remains as it is without being removed.
[0239] Then, the second exposure is performed by using the mask 75.
First, as shown in FIG. 19B, the mask 75 is disposed at a
predetermined location on the substrate, the second exposure is
performed through the mask 75, and the development and etching
processes are performed so as to remove the unnecessary
portion.
[0240] As shown in FIG. 19B, the mask 75 has the following regions
that are sequentially formed from the left. That is, the mask 75
has a first region for completely shielding the light (disposed on
a location that corresponds to the region of SG (W)), a second
region for completely shielding the light (disposed on a location
that corresponds to the respective reflective regions E11 of SG(G),
SG(R), and SG(B)), and a complete exposure region (disposed on a
location that corresponds to the respective transmissive regions
E10 of SG(G), SG(R), and SG(B)).
[0241] Thereby, the resist 18x (corresponding to the thickness
d21), which is completely exposed by the mask 75 and corresponds to
the region E52 of each of the transmissive regions E10 of R, G, and
B, is completely removed. In contrast, the resist 18x, which is
completely shielded by the mask 75 and corresponds to the sub-pixel
region SG of W, and the resist 18x that corresponds to each of the
reflective regions E11 of R, G, and B, remain as they are without
being removed.
[0242] By adopting the above-mentioned double exposure method, it
is possible to achieve the same state as the substrate shown in
FIG. 18, that is, the thickness of the cell-thickness-adjusting
insulating layer 18 that corresponds to the sub-pixel region SG
(transmissive region E10) of W and the thickness of the respective
colored layers 6 that correspond to the respective transmissive
regions E10 of R, G, and B can be set to have the same thickness.
Thereby, the thickness of the liquid crystal layer 4 that
corresponds to the sub-pixel region SG (transmissive region E10) of
W (transparent) and the thickness of the liquid crystal layer 4
that corresponds to the respective transmissive regions E10 of R,
G, and B can be set to have the same thickness, and the same
optical characteristic can be set in both regions.
[0243] Next, a method in which the thickness of the
cell-thickness-adjusting insulating layer 18 that corresponds to
the sub-pixel region SG (transmissive region E10) of W and the
thickness of the respective colored layers 6 that correspond to the
respective transmissive region E10 of R, G, and B can be set to
have the same thickness by means of a half tone exposure method
other than the double exposure method will be described with
reference to FIG. 20.
[0244] First, as shown in FIG. 20, on the substrate that is
manufactured by the process P3, the resist 18x is coated. At this
time, for example, when the thickness of the respective colored
layers 6 of R, G, and B is set to d20, the resist 18 is coated with
the predetermined thickness d21 (=2.times.d20). Next, the exposure
is performed once by the mask 76 that is disposed at a
predetermined location on the top surface of the substrate, and
then the development and etching processes are performed with
respect to the corresponding substrate so as to remove the
unnecessary resist or the like.
[0245] In this case, as shown in FIG. 20, the mask 76 has the
following regions that are sequentially formed from the left. That
is, the mask 76 has a half tone exposure region that is made of a
semitransparent film having smaller light transmittance than the
transparent film (disposed on a location that corresponds to the
region of SG (W))), a complete light shielding region (disposed on
a location that corresponds to the respective reflective regions
E11 of SG(G), SG(R), and SG(B)), and a complete exposure region
(disposed on a location that corresponds to the respective
transmissive regions E10 of SG(G), SG(R), and SG(B)).
[0246] Thereby, the resist 18x that is subjected to the half tone
exposure by the mask 76 and corresponds to a region E54 of the
sub-pixel region SG of W (transmissive region E10) is removed by
the predetermined thickness d20 by means of an etching process,
such that its thickness becomes smaller. In addition, the resist
18x that is completely shielded by the mask 76 and corresponds to
the respective reflective regions E11 of R, G, and B remains as it
is without being removed, and the resist 18x (having the thickness
d21) that is completely exposed by the mask 76 and corresponds to
the region E53 of each of the transmissive regions E10 of R, G, and
B is completely removed.
[0247] By adopting the above-mentioned half tone exposure method,
similar to the above-mentioned double exposure method, the
thickness of the liquid crystal layer 4 that corresponds to the
sub-pixel region SG (transmissive region E10) of W (transparent)
and the thickness of the liquid crystal layer 4 that corresponds to
the respective transmissive regions E10 of R, G, and B can be set
to have the same thickness. As a result, the same optical
characteristic can be set in both regions.
[0248] Next, as shown in FIG. 21, the common electrode 8, which is
made of an ITO or the like, is formed on the
cell-thickness-adjusting insulating layer 18 and the respective
colored layers 6, and an alignment film (not shown) is formed on
the common electrode 8 (Process P5). Then, the other constituent
elements, for example, the phase difference plate 11 and the
polarizer 12 are provided on the outer surface side of the upper
substrate 2 (Process P6). In this manner, the color filter
substrate 92 according to the first embodiment, which is shown in
FIG. 5, is manufactured.
[0249] Then, referring back to FIG. 15, the element substrate 91
according to the first embodiment, which is shown in FIG. 5, is
manufactured by means of a known method (Process S2). Then, the
color filter substrate 92 and the element substrate 91 are bonded
to each other through the sealant 5 (not shown) having the frame,
the liquid crystal is inserted in both substrates through an
opening that is provided in the sealant 5, and the opening is
sealed by the resin material (Process S3). In addition, the
essential elements are mounted (Process S4), and the liquid crystal
device 100 according to the first embodiment, which is shown in
FIGS. 1 and 5, is manufactured.
Method of Manufacturing Liquid Crystal Device According To Second
Embodiment
[0250] First, a method of manufacturing a liquid crystal device 200
according to the second embodiment of the invention will be
described with reference to FIGS. 15, and 22 to 25. FIG. 22 is a
flowchart illustrating a method of manufacturing the color filter
substrate 94 according to the second embodiment of the invention.
FIGS. 23 to 25 are diagram illustrating the respective processes
that correspond to the process S1 in FIG. 15. In FIGS. 23 to 25,
the SG (W) indicates the sub-pixel region SG that corresponds to W,
and the SG (G) indicates the sub-pixel region SG that corresponds
to G. In addition, E10 indicates the region that becomes the
transmissive region, and E11 indicates the region that becomes the
reflective region. In the below description, the sectional
structure of the color filter substrate 94 shown in FIG. 10 will be
exemplified.
[0251] First, the above-mentioned color filter substrate 94 is
manufactured (Process S1). This color filter substrate 94 is
manufactured through the processes R1 to R8.
[0252] Specifically, first, the lower substrate 81, which is made
of a material, such as glass or quartz, is prepared. Then, a resin
layer 17, which is made of, for example, a resin material, is
formed on the lower substrate 81 by means of a photolithography
technology, and then an etching process is performed on the surface
of the resin layer 17 that corresponds to the respective sub-pixel
regions SG of R, G, and B. Thereby, a plurality of minute
unevenness portions are formed on the surface of the resin layer 17
(Process R1).
[0253] Next, the respective layer 65 is formed (Process R2).
Specifically, on a resin layer 17 that corresponds to the
respective reflective regions E11 of R, G, and B, an Al film is
formed, and then a portion of the reflecting layer 65, which is
formed on the resin layer 17 that corresponds to the respective
transmissive regions E10 of R, G, and B, is removed by an etching
process. Thereby, a transmissive opening region 85 that has
function of transmitting the light is formed in the transmissive
region E10 of each of the colored layers of R, G, and B, and the
reflecting layer 65 is formed in the respective reflective regions
E11 of R, G, and B.
[0254] Then, the respective colored layers 6 of R, G, and B are
formed by a known method (Process R3). At this time, for example,
in order to the respective colored layers 6B, 6R, and 6C, the
respective colored layers 6R, 6G, and 6B are formed in the
sub-pixel regions SG in which the respective colored layers should
be formed. In addition, the order in which the respective colored
layers 6R, 6G, and 6B are formed is limited thereto. At this time,
an opening 6a, which has a function of displaying the uniform color
in the transmissive region E10 and the reflective region E11, is
formed in each of the colored layers that correspond to the
respective reflective regions E11 of R, G, and B. In addition, in
the regions that partition the respective colored layers 6, a light
shielding layer 67 where colored layers of any two colors among the
respective colored layers 6R, 6G, and 6B overlap each other, and a
light shielding layer 68 where the colored layers 6R, 6G, and 6B of
three colors overlap one another are formed (see FIG. 8B).
[0255] Next, buy using the known method, the protective film 19,
which is made of an acrylic resin or the like, is formed at a
location that corresponds to the respective sub-pixel regions SG of
R, G, and B (Process R4). At this time, the distance from the top
surface of the resin layer 17 to the top surface of the protective
layer 19 is set to d7.
[0256] Then, the cell-thickness-adjusting insulating layer is
formed (Process R5). Specifically, by using the same method as the
color filter substrate 92 according to the first embodiment, the
cell-thickness-adjusting insulating layer 18, which is made of a
transparent resin material, is formed over the resin layer 17 that
corresponds to the sub-pixel region SG of W and the protective
layer 19 that corresponds to the respective sub-pixel regions SG of
R, G, and B, and then an etching process is performed with respect
to the substrate. At this time, the thickness of the
cell-thickness-adjusting insulating layer 18 is set to d7. Thereby,
when the liquid crystal device 100 is manufactured by the
above-mentioned method, the thickness of the liquid crystal layer 4
at the transmissive region E10 of W can be set to have the same
thickness as the liquid crystal layer 4 at the respective
transmissive regions of R, G, and B, and the thickness of the
liquid crystal layer 4 at the respective transmissive region E10 of
R, G, and B and the thickness of the liquid crystal layer 4 at the
respective reflective regions E11 of R, G, and B can be set to the
predetermined thickness.
[0257] Specifically, in this process, the cell-thickness-adjusting
insulating layer 18, which is made of the same transparent resin
material, are simultaneously formed in the sub-pixel region SG of W
and the respective reflective regions E11 of R, G, and B.
Therefore, when compared with a method of manufacturing a liquid
crystal device in which the cell-thickness-adjusting insulating
layer 18 is separately formed in the sub-pixel region SG of W and
the respective reflective regions E11 of R, G, and B (comparative
example), the number of the processes can be reduced. As a result,
it is possible to reduce the manufacturing cost of the liquid
crystal device which is manufactured by the present manufacturing
method. In addition, if necessary, similar to the method of
manufacturing the color filter substrate 92 according to the first
embodiment, a process for adjusting the thickness of the
cell-thickness-adjusting insulating layer 18 can be performed
(Process R6). Further, the process R6 may not the following process
of the process R5, but may be included in the process R5.
[0258] Next, on the resin layer 17 and the cell-thickness-adjusting
insulating layer 18, a scanning electrode 64, which is made of an
ITO, is formed in a stripe. Then, an alignment film (not shown) is
formed on the scanning electrode 64 or the like (Process R7). Then,
the other constituent elements, for example, the phase difference
plate 13, the polarizer 14, and the backlight 15 are provided on
the outer surface side of the lower substrate 81 (Process R8). In
this manner, the color filter substrate 94 according to the second
embodiment, which is shown in FIG. 10, is manufactured.
[0259] Then, referring back to FIG. 15, the element substrate 93
according to the second embodiment, which is shown in FIG. 10, is
manufactured by means of a known method (Process S2). Then, the
color filter substrate 94 and the element substrate 93 are bonded
to each other through the sealant 5 (not shown) in which a
plurality of conductive members 7 are mixed and which has the
frame, the liquid crystal is inserted in both substrates through an
opening that is provided in the sealant 5, and the opening is
sealed by the resin material (Process S3). In addition, the
essential elements are mounted (Process S4), and the liquid crystal
device 200 according to the second embodiment, which is shown in
FIGS. 6 and 10, is manufactured.
Method of Manufacturing Color Filter Substrate (Modification)
[0260] Next, a method of manufacturing the color filter substrate
96 that has a structure similar to a structure according to a
modification shown in FIG. 12 will be described.
[0261] The color filter substrate 96 has the structure that is
substantially similar to the structure shown in FIG. 12. However,
in the structure of FIG. 12, it is constructed to have the
transmissive region E10 and the reflective region E11 in the
sub-pixel region SG of W (that is, including the structure that
corresponds to FIG. 13B). FIG. 26A is a partial cross-sectional
view illustrating a structure of the color filter substrate 96.
[0262] First, the structure of the color filter substrate 96 will
be simply described with reference to FIG. 26A. In the below
description, the same constituent elements as the above-mentioned
constituent elements are denoted by the same reference numerals,
and the description is omitted or simplified.
[0263] As shown in the drawing, the color filter substrate 96 has a
structure in which each of the respective sub-pixel regions SG of
R, G, B, and W has a transmissive region E10 and a reflective
region E11. On each of the lower substrate 81 that corresponds to
the reflective region E11 of W and the lower substrate 81 that
corresponds to the respective reflective regions E11 of R, G, and
B, a reflecting layer 71, which is made of Al or the like, is
formed. In addition, on the lower substrate 81 that corresponds to
the respective transmissive regions E10 of R, G, and B and the
reflecting layer 71 that corresponds to the respective reflective
regions E11 of R, G, and B, the colored layers 6R, 6G, and 6B are
respectively formed. Therefore, as shown in the drawing, the
thickness of the respective colored layers 6 that correspond to the
respective transmissive regions E10 of R, G, and B is set to be
larger than the thickness of each of the colored layers 6 that are
formed on the respective reflecting layers 71. In addition, on the
respective colored layers 6 that correspond to the respective
reflective regions E11 of R, G, and B, the lower substrate 81 that
corresponds to the transmissive region E10 of W, and the reflecting
layer 71 that corresponds to the reflective region E11 of W, the
cell-thickness-adjusting insulating layer 18, which is made of the
same material, is formed. Although not shown, in the color filter
substrate 96 that has the above-mentioned structure, the thickness
of the liquid crystal layer 4 that corresponds to the respective
transmissive regions E10 of R, G, and B is set to the same value as
the thickness of the liquid crystal layer 4 that corresponds to the
respective reflective regions E11 of R, G, and B, and the thickness
of the liquid crystal layer 4 that corresponds to the reflective
region E11 of W is set to the same value.
[0264] Next, a method of manufacturing the color filter substrate
96 having the above-mentioned structure will be simply described
with reference to FIGS. 26B and 26C. In this case, only the
processes that correspond to the processes P3 and P4 of FIG. 16 or
the processes R5 and R6 of FIG. 22 will be described.
[0265] The color filter substrate 96 is manufactured through the
process T1 and the process T2 that corresponds to the process
subsequent to the process T1. First, in FIG. 26B, the substrate
having the structure in which the cell-thickness-adjusting
insulating layer 18 is removed is manufactured by the known method,
and then the cell-thickness-adjusting insulating layer 18 is formed
on the corresponding substrate so as to have the predetermined
thickness (Process T1).
[0266] Next, as shown in FIG. 26C, in the photolithography
technology, the half tone exposure method is carried out so as to
remove the unnecessary cell-thickness-adjusting insulating layer
18. At this time, the used mask 79 has the following regions that
are sequentially formed from the left. That is, the mask 79 has a
complete exposure region 9 (disposed on a location that corresponds
to the respective transmissive regions E10 of R, G, and B), a half
tone exposure region (disposed on a location that corresponds to
the respective reflective regions E11 of R, G, and B), a half tone
exposure region (disposed on a location that corresponds to the
transmissive region E10 OF W), and a complete light shielding
region (disposed on a location that corresponds to the reflective
region E11 of W).
[0267] Thereby, in the respective sub-pixel regions SG of R, G, and
B, the cell-thickness-adjusting insulating layer 18 that
corresponds to the region E50 (hook-shaped region) is removed while
the cell-thickness-adjusting insulating layer 18 that corresponds
to the region E51 (region surrounded with a broken-line portion)
remains as it is. In addition, in the transmissive region E10 of W,
the cell-thickness-adjusting insulating layer that corresponds to
the region E52 (region surrounded with a broken-line portion) is
removed, while in the sub-pixel region SG of W, the
cell-thickness-adjusting insulating layer 18 that corresponds to
the region E53 remains as it is. In this way, the color filter
substrate 96 having the above-mentioned structure is
manufactured.
[0268] In this manufacturing method, the thickness of the colored
layers 6 that correspond to the respective transmissive regions E10
of R, G, and B, and the thickness of the cell-thickness-adjusting
insulating layer 18 that corresponds to the respective transmissive
regions of W are preferably set to have the same thickness. In
addition, the total thickness of the colored layer 6 and the
cell-thickness-adjusting insulating layer 18 that correspond to the
respective reflective regions E11 of R, G, and B are preferably set
to the same value.
[0269] Thereby, the advantages and effects of the invention can be
achieved in the liquid crystal devices according to the first and
second embodiments. In addition, although the color filter
substrate 96 is manufactured by using the half tone exposure method
in the second embodiment, but the invention is not limited thereto.
Specifically, the color filter substrate 96 may be manufactured by
using the double exposure method.
Electronic Apparatus
[0270] Next, an example in which the liquid crystal device 100 or
200 according to the first or second embodiment of the invention
(including the above-described modifications, and it is the same in
the below description) is used as a display device of an electronic
apparatus will be described.
[0271] FIG. 27 is a diagram schematically illustrating an entire
structure of the present example. The electronic apparatus that is
illustrated in the present example includes the above-described
liquid crystal device 100 or 200, and a control unit 410 that
controls the liquid crystal device. In this case, the liquid
crystal device 100 or 200 which is conceptually divided into a
panel structure 403, and a driving circuit 402 having a
semiconductor IC or the like is shown. In addition, the control
unit 410 includes a display information output source 411, a
display information processing circuit 412, a power supply circuit
413, and a timing generator 414.
[0272] The display information output source 411 includes a memory
that is composed of a ROM (Read Only Memory) or a RAM (Random
Access Memory), a storage unit that is composed of a magnetic
recording disk or an optical recording disk, a tuning circuit that
tunes the digital image signal. The display information output
source 411 is constructed such that the display information is
supplied to the display information processing circuit 412 in a
form of an image signal having a predetermined format.
[0273] The display information processing circuit 412 includes
various circuit, such as a serial-parallel conversion circuit, an
amplifying/inverting circuit, a rotation circuit, a gamma
correction circuit, or the like, and processes the input display
information and supplies the image information to the driving
circuit 402 together with the clock signal CLK. The driving circuit
402 includes a scanning line driving circuit, a data line driving
circuit, and a test circuit. In addition, the power supply circuit
413 supplies the predetermined voltage to the above-described
respective constituent elements.
[0274] Next, a specific example of an electronic apparatus to which
the liquid crystal device 100 or 200 according to the first or
second embodiment of the invention (including the above-mentioned
various modifications) can be applied will be described with
reference to FIG. 28.
[0275] First, an example in which the liquid crystal device 100 or
200 according to the first or second embodiment of the invention
(including the above-mentioned various modifications, and it is the
same in the below description) is applied to the display unit of
the portable personal computer (so-called notebook-type personal
computer) will be described. FIG. 28A is a perspective view
illustrating a structure of a personal computer. As shown in FIG.
28A, the personal computer 710 includes a main body unit 712 that
has a keyboard 711 and a display unit 713 in which the liquid
crystal device according to the present embodiment is applied as a
panel.
[0276] Next, an example in which the liquid crystal device 100 or
200 according to the first and second embodiments of the invention
(including the various modifications) is applied to the display
unit of the cellular phone will be described. FIG. 28B is a
perspective view illustrating a structure of a cellular phone. As
shown in the drawing, the cellular phone 720 includes, in addition
to a plurality of operation buttons 721, an earpiece 722, a
mouthpiece 723, and a display unit 724 to which the liquid crystal
device according to the first to third embodiments of the invention
is applied.
[0277] In addition, examples of an electronic apparatus in which
the liquid crystal device 100 or 200 according to the first or
second embodiment (including the various modifications) include, in
addition to the personal computer shown in FIG. 28A and the
cellular phone shown in FIG. 28B, a liquid crystal television, a
view-finder-type or monitor-direct-view-type video tape recorder, a
car navigation device, a pager, an electronic note, an electronic
calculator, a word processor, a work station, a video phone, a POS
terminal, a digital still camera or the like.
[0278] The entire disclosure of Japanese Patent Application
Nos:2005-197074, filed Jul. 6, 2005 and 2006-090365, filed March
29, 2006 are expressly incorporated by reference herein.
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