U.S. patent application number 10/829191 was filed with the patent office on 2005-11-10 for operation method for non-volatile memory.
Invention is credited to Shone, Fuja.
Application Number | 20050248987 10/829191 |
Document ID | / |
Family ID | 35207033 |
Filed Date | 2005-11-10 |
United States Patent
Application |
20050248987 |
Kind Code |
A1 |
Shone, Fuja |
November 10, 2005 |
OPERATION METHOD FOR NON-VOLATILE MEMORY
Abstract
An operation method for non-volatile memory is conducted as
follows. First, a non-volatile memory cell capable of storing a
first bit and a second bit is provided. The non-volatile memory
cell comprises a first region and a second region with a channel
therebetween and a gate above the channel but separated therefrom
by a charge trapping layer, wherein the first bit and the second
bit are positioned close to the first and second regions,
respectively. Next, a first programmed voltage for the first bit, a
second programmed voltage for the second bit and an erased voltage
for the first and second bits are determined, wherein the first
programmed voltage is smaller than the second programmed voltage.
For reading the first bit, a voltage is applied to the second
region, inducing a depletion region around the second region. For
reading the second bit, a voltage is applied to the second region,
wherein the voltage applied to the second region is smaller than
that for reading the first bit.
Inventors: |
Shone, Fuja; (Hsinchu,
TW) |
Correspondence
Address: |
VOLENTINE FRANCOS, & WHITT PLLC
ONE FREEDOM SQUARE
11951 FREEDOM DRIVE SUITE 1260
RESTON
VA
20190
US
|
Family ID: |
35207033 |
Appl. No.: |
10/829191 |
Filed: |
April 22, 2004 |
Current U.S.
Class: |
365/185.28 |
Current CPC
Class: |
G11C 16/0475
20130101 |
Class at
Publication: |
365/185.28 |
International
Class: |
G11C 016/04 |
Claims
What is claimed is:
1. An operation method for non-volatile memory, comprising the
steps of: providing a non-volatile memory cell capable of storing
at least a first bit and a second bit and having a first region and
a second region with a channel therebetween and a gate above the
channel but separated therefrom by a charge trapping layer
sandwiched between a first dielectric layer and a second dielectric
layer, wherein the first bit and the second bit are positioned
close to the first and second regions respectively; determining a
first programmed voltage for the first bit, a second programmed
voltage for the second bit and an erased voltage for the first and
second bits, wherein the first programmed voltage is smaller than
the second programmed voltage; reading the first bit by applying a
voltage to the second region; and reading the second bit by
applying a voltage to the second region, wherein the voltage
applied to the second region for reading the second bit is smaller
than that for reading the first bit.
2. The operation method for non-volatile memory in accordance with
claim 1, wherein the voltage applied to the second region for
reading the first bit is so large that a depletion region around
the second region is induced and whether the second bit is
programmed or not is ignored.
3. The operation method for non-volatile memory in accordance with
claim 1, wherein a voltage is further applied to the gate for
reading the first bit, and the voltage applied to the gate for
reading the first bit is between the erased voltage and the first
programmed voltage.
4. The operation method for non-volatile memory in accordance with
claim 1, wherein a voltage is further applied to the gate for
reading the second bit, and the voltage applied to the gate for
reading the second bit is between the first programmed voltage and
the second programmed voltage.
5. The operation method for non-volatile memory in accordance with
claim 1, wherein the voltage applied to the second region for
reading the second bit is between 0.1 and 0.5 volts.
6. The operation method for non-volatile memory in accordance with
claim 1, wherein the voltage applied to the second region for
reading the first bit is between 0.6 and 2 volts.
7. The operation method for non-volatile memory in accordance with
claim 1, wherein the first programmed voltage is between 2 and 4
volts.
8. The operation method for non-volatile memory in accordance with
claim 1, wherein the second programmed voltage is between 4 and 6
volts.
9. The operation method for non-volatile memory in accordance with
claim 1, wherein the erased voltage is between 0.5 and 2 volts.
10. The operation method for non-volatile memory in accordance with
claim 1, wherein the charge trapping layer is composed of silicon
nitride.
11. The operation method for non-volatile memory in accordance with
claim 1, wherein the non-volatile memory cell is of N-type.
12. The operation method for non-volatile memory in accordance with
claim 1, wherein the non-volatile memory cell is a vertical memory
cell.
Description
BACKGROUND OF THE INVENTION
[0001] (A) Field of the Invention
[0002] The present invention is related to an operation method for
non-volatile memory, and more particularly to an operation method
for non-volatile memory capable of storing two bits.
[0003] (B) Description of the Related Art
[0004] Non-volatile memory devices are currently in wide use in
electronic components that require the retention of information
when electrical power is terminated. Non-volatile mermory devices
include read only memory (ROM), programmable read only memory
(PROM), erasable programmable read only memory (EPROM) and
electrically erasable programmable read only memory (EEPROM)
devices. EEPROM devices differ from other non-volatile memory
devices in that they can be electrically programmed and erased.
Flash EEPROM devices are similar to EEPROM devices in that memory
cells can be programmed and erased electrically. However, Flash
EEPROM devices enable the erasing of all memory cells in the device
using a single electrical current pulse.
[0005] Typically, an EEPROM device includes a floating-gate
electrode upon which electrical charge is stored. In a flash EEPROM
device, electrons are transferred to a floating-gate electrode
through a dielectric layer overlying the channel region of the
transistor. The electron transfer is initiated by either hot
electron injection or Fowler-Nordheim (F-N) tunneling. One
important dielectric material for the fabrication of the
floating-gate electrode is an oxide-nitride-oxide (ONO) structure.
During programming, electrical charges are transferred from the
substrate to the silicon nitride layer in the ONO structure and
trapped therein. Moreover, non-volatile memory designers have taken
advantage of the localized nature of electron storage within a
silicon nitride layer and have designed memory circuits that
utilize two regions of stored charge within an ONO layer. This type
of non-volatile memory device is known as a two-bit EEPROM. The
two-bit EEPROM is capable of storing twice as much information as a
conventional EEPROM in a memory array of equal size. A left bit and
right bit are stored in physically different areas of the silicon
nitride layer, near left and right regions of each memory cell.
[0006] Referring to FIG. 1, U.S. Pat. No. 6,011,725 introduces an
operation method to an EEPROM device 10, or namely SONOS
(silicon-oxide-nitride-oxide-silicon) device, having a
non-conducting charge trapping dielectric, such as a silicon
nitride layer 20, sandwiched between two silicon oxide layers 18
and 22 acting as electrical insulators. In view of localized
trapping electron charge capability of the silicon nitride layer
20, the EEPROM device 10 is capable of storing two bits of
information, i.e., there are two bits per cell. A left bit and a
right bit are stored in physically different areas of the silicon
nitride layer 20, near left and right regions of the memory cell
10, respectively. For programming, voltages are applied to a gate
24 and a drain 16 to create vertical and lateral electrical fields,
which accelerate electrons from a source 14 along the length of the
channel. As the electrons move along the channel, some of them gain
sufficient energy to jump over the potential barrier of the bottom
silicon oxide layer 18 and become trapped in the silicon nitride
layer 20. For the right bit, for example, the electrons are trapped
near the drain 16 indicated by the dashed circle 23. For the left
bit, on the contrary, electrons are trapped in the nitride layer 20
near the source 14 as dashed cycle 21. For reading, a way to read
in reverse direction, i.e., in a direction opposite to that of
programming, is conducted. For instance, to read the right bit of
the device 10, voltages are applied to the source 14 and the gate
24, whereas the drain 16 is grounded, in which the voltage applied
to the source 14 has to be high enough to ignore the affection by
the left bit charge. If there is charge in right bit, no current
occurs. In contrast, current is generated if there is no charge in
right bit. As to the reading of the left bit, voltages are applied
to the drain 16 and the gate 24, whereas the source 14 is
grounded.
[0007] Accordingly, the above-mentioned technique limits that the
reading has to be conducted in a reverse direction, which may
enhance the complex of operation.
SUMMARY OF THE INVENTIION
[0008] The objective of the present invention is to provide an
alternative operation method for a non-volatile memory device
capable of storing two bits, so as to simplify the operation.
[0009] To achieve the above objective, an operation method for
non-volatile memory can be conducted as follows. First, a
non-volatile memory cell capable of storing a first dielectric bit
and a second bit is provided. The non-volatile memory cell
comprises a first region, e.g., a source, and a second region,
e.g., a drain, with a channel therebetween and a gate above the
channel but separated therefrom by a charge trapping layer sandwich
between a first and a second dielectric layer, wherein the first
bit and the second bit are positioned close to the first and second
regions, respectively. Next, a first programmed voltage for the
first bit, a second programmed voltage for the second bit and an
erased voltage for the first and second bits are determined,
wherein the first programmed voltage is smaller than the second
programmed voltage.
[0010] For reading the first bit, voltages are applied to the
second region and to the gate, and the first region is grounded,
wherein the voltage applied to the gate is between the erased
voltage and the first programmed voltage, and the voltage applied
to the second region induces a depletion region around the second
region, with a view to ignoring the influence of the second bit if
programmed. When the first bit is being read, the first bit is not
programmed if there is a current flowing through the channel,
whereas the first bit is programmed if there is no current flowing
through the channel.
[0011] For reading the second bit, voltages are also applied to the
second region and to the gate and the first region is grounded,
wherein the voltage applied to the gate is between the first
programmed voltage and the second programmed voltage, and the
voltage applied to the second region is relatively small, e.g.,
0.1-0.5 volts, to increase the current in the channel, if any.
Further, the voltage applied to the second region has to be smaller
than that when the first bit is being read to avoid that the
depletion region formed around the second region is too large to
read the second bit. When the second bit is being read, the second
bit is not programmed if there is a current flowing through the
channel, whereas the second bit is programmed if there is no
current flowing through the channel.
[0012] Accordingly, in any case of reading the first or second bit,
voltages are applied to the same electrodes, i.e., reading in the
same forward direction, and to sense which bit is manipulated only
by varying the applying voltages. Therefore, the operation method
put forth in the present invention provides an alternative for the
prior art, and simplifies the reading operation.
BRIEF DESCRIPTION OF THE DRAWINGS
[0013] FIG. 1 illustrates a known SONOS memory cell and operation
method thereof;
[0014] FIG. 2 illustrates a known non-volatile memory cell and
operation method thereof for reading the left bit in accordance
with the present invention;
[0015] FIG. 3 illustrates a known non-volatile memory cell and
operation method thereof for reading the right bit in accordance
with the present invention;
[0016] FIG. 4 illustrating a non-volatile memory array, which
intends to exemplify the operation method in accordance with the
present invention; and
[0017] FIG. 5 illustrates a vertical memory cell that can apply the
operation method in accordance with the present invention.
DETAILED DESCRIPTION OF THE INVENTION
[0018] Embodiments of the present invention are now being described
with reference to the accompanying drawings.
[0019] Referring to FIG. 2, a non-volatile memory cell 30 of NMOS
type is built up on a silicon substrate 31, in which a source 32
and a drain 33 are formed, and a gate 34, an first dielectric layer
35, a charge trapping layer 36 and a second dielectric layer 37 are
formed thereon. The charge trapping layer 36 may be composed of
silicon nitride, and the first and second dielectric layers 35, 37
may be made of silicon dioxide. The non-volatile memory cell 30 can
be programmed by the way of conventional art, for example, the
drain 33 and gate 34 are respectively applied by voltages V.sub.D
and V.sub.G, e.g., larger than or equal to 5V and 5V, respectively,
so as to program the left bit near the source 32 to a voltage of
3.5V. The right bit near the drain 33 can be programmed to a
voltage of 5.5V by applying voltages larger than 6V to the drain 33
and 5V to the gate 34, respectively. The programming conditions are
summarized in Table 1.
1 TABLE 1 Drain Gate Source Substrate Left bit V.sub.D .gtoreq. 5 V
V.sub.G > 5 V 0 V 0 V Right bit V.sub.D .gtoreq. 6 V V.sub.G
> 5 V 0 V 0 V
[0020] Accordingly, the programmed voltage of the left bit denoted
by Vtlp is 3.5V, and the programmed voltage of the right bit
denoted by Vtrp is 5V. Assuming an erased voltage for the first and
second bits denoted by Vte is 1.5V. To read the left bit, the drain
voltage V.sub.D is greater than 1V to make a depletion region 38
around the drain 33 for ignoring the effect of the charge of the
right bit if programmed, and a gate voltage V.sub.G between Vte and
Vtlp, e.g., 2.5V, is applied to the gate 34. Accordingly, if the
left bit is not programmed, current I.sub.DS will be generated in
the channel 39 between the source 32 and drain 33 in the light of
the formula (1). 1 I DS + W L C OX [ ( V G - V T ) .times. V DS - 1
2 V DS 2 ] ( 1 )
[0021] wherein W is the channel width of the memory cell;
[0022] L is the channel length of the memory cell;
[0023] .mu. is mobility;
[0024] Cox is capacitance of gate oxide;
[0025] V.sub.G is voltage applied to the gate;
[0026] V.sub.T is threshold voltage;
[0027] V.sub.DS is voltage between the source and drain.
[0028] On the contrary, no current occurs if the left bit is
programmed.
[0029] As shown in FIG. 3, to read the right bit, a relatively
small drain voltage V.sub.D, e.g., 0.1-0.5V, is applied, and the
gate voltage V.sub.G has to be greater than Vtlp, e.g., 4.5V, to
ensure that the left bit is turned on regardless of whether the
left bit is programmed or not, with a view to ignoring the
influence of the left bit. Further, the V.sub.G is smaller than
Vtrp to verify the state of the right bit, i.e.,
Vtlp<V.sub.G<Vtrp. The application of the small drain voltage
V.sub.D is intended to obtain a larger current, but the amount of
V.sub.D has to be limited because too large of V.sub.D may give
rise to a too broad depletion region around the drain 33 that
obstructs the reading of the right bit. Hence, at least, the
V.sub.D for reading the right bit has to be smaller than the
V.sub.D for reading the left bit. Accordingly, no current occurs if
the right bit is programmed, whereas current is generated in the
light of the formula (1) if the right bit is not programmed. As a
result, both reading the right and left bits are conducted by
controlling the drain voltage and gate voltage, i.e., reading in
the same forward direction. The above reading conditions are
summarized in Table 2.
2TABLE 2 Drain Gate Source Substrate Left bit V.sub.D > 1 V Vte
< V.sub.G < Vtlp 0 V 0 V Right bit V.sub.D > 0.1 V Vtlp
< V.sub.G < Vtrp 0 V 0 V
[0030] To sum up, to sense whether there is a bit programmed at
source edge, word line voltage, i.e., gate voltage, is set at the
middle range of erased voltage and programmed voltage of source
edge where drain voltage, i.e., 1.2V, is biased to ignore whether
the bit at drain edge is programmed or not. On the other hand, to
sense whether there is a bit programmed at drain edge, word line
voltage is set at the middle range of programmed voltages of drain
and source to make sure that the source edge is turned on if
programmed. At the same time, a small voltage is biased at the
drain edge to deplete the drain slightly, thereby the impact to
drain voltage once the bit at drain edge is programmed can be
avoided. Preferably, the V.sub.D for reading the left bit is
between 0.6-2V, and reading the right bit is between 0.1-0.5V, the
Vtlp is between 2-4V, the Vtrp is between 4-6V and the Vte is
between 0.5-2V.
[0031] FIG. 4 illustrates an array of 2-bit per cell, which are
constituted of word lines WL.sub.0, WL.sub.1 and bit lines D.sub.0
left, D.sub.0 right, D.sub.1 left, D.sub.1 right and D.sub.2 left.
Assuming the Vte, Vtlp and Vtrp are 1.5V, 3.5V and 5.5V,
respectively, examples for reading, programming and erasing of
memory cell WL.sub.1, D.sub.1 left, D.sub.1 right, i.e., the one
with dash line circle in FIG. 4, are shown in Table 3.
3TABLE 3 Function WL.sub.0 WL.sub.1 D.sub.1 left D.sub.1 right
D.sub.0 right D.sub.2 left V.sub.sub Read Left 0 V 2.5 V 0 V 1.2 V
0 V 0 V 0 V bit Right 0 V 4.5 V 0 V 0.5 V 0 V 0 V 0 V bit Program
Left 0 V 8 V 5 V 0 V floating 0 V 0 V bit Right 0 V 8 V 0 V 6 V 0 V
float- 0 V bit ing Erase one 0 V -8 V 0 V 0 V 0 V 0 V 0 V WL
erase
[0032] In addition to the application to a non-volatile memory cell
of NMOS type as the above mentioned, a memory cell of PMOS type
also can be implemented without departing from the spirit of the
present invention.
[0033] Moreover, the operation method put forth in the present
invention is not limited to be applied to a two-bit cell, and can
be applied to multi-bit cell also, i.e., there are multiple bits
near the source 32 and multiple bits near the drain 33, without
departing from the scope of the present invention.
[0034] As shown in FIG. 5, a vertical memory cell 50 is built in a
P-type substrate 51, and the substrate 51 comprises a top N+ region
56, a bottom N+ region 55, a mask layer 52, an ONO layer 53 and a
polysilicon block 54. The top and bottom N+ regions 56 and 55 may
act as a source and a drain, and the areas in ONO layer 53 near the
top and bottom N+ regions 56 and 55 are able to store bits of
information, respectively. The polysilicon 15 block 54 acts as a
gate. In the case of applying the operation method of the present
invention to the vertical memory cell 50, the bit near the top
N+region 56 is deemed the left bit, whereas the bit near the bottom
N+region 55 is deemed the right bit.
[0035] The above-described embodiments of the present invention are
intended to be illustrative only. Numerous alternative embodiments
may be devised by those skilled in the art without departing from
the scope of the following claims.
* * * * *