U.S. patent application number 10/797809 was filed with the patent office on 2005-09-15 for lens array and method of making same.
Invention is credited to Tang, Yin S..
Application Number | 20050200960 10/797809 |
Document ID | / |
Family ID | 34887638 |
Filed Date | 2005-09-15 |
United States Patent
Application |
20050200960 |
Kind Code |
A1 |
Tang, Yin S. |
September 15, 2005 |
LENS ARRAY AND METHOD OF MAKING SAME
Abstract
Systems and methods are provided for a lens or microlens array
or non-spherical lens with or without an integrated sensor unit. A
dielectric between a substrate and a lens material has curved
recesses, which are filled in by the lens material. Light enters
the lens material layer and is focused by the curved recess
portions.
Inventors: |
Tang, Yin S.; (Irvine,
CA) |
Correspondence
Address: |
Tom Chen
MacPHERSON KWOK CHEN & HEID LLP
Suite 226
1762 Technology Drive
San Jose
CA
95110
US
|
Family ID: |
34887638 |
Appl. No.: |
10/797809 |
Filed: |
March 9, 2004 |
Current U.S.
Class: |
359/619 |
Current CPC
Class: |
G02B 3/0043 20130101;
G02B 3/0031 20130101; G02B 3/0012 20130101; G02B 3/0056 20130101;
H01L 27/14627 20130101 |
Class at
Publication: |
359/619 |
International
Class: |
G02B 027/10 |
Claims
1. A method for making a lens or lens array, comprising: providing
a substrate; depositing a dielectric layer over the substrate;
depositing a patterning layer over the dielectric layer; removing a
portion of the patterning layer overlying an area of the dielectric
layer corresponding to a to-be-formed lens; removing the exposed
portion of the dielectric layer to form a curved recess in the
exposed portion of the dielectric layer; and filling the curved
recess with a lens material.
2. The method of claim 1, wherein the removing comprises wet
etching.
3. The method of claim 1, wherein the removing comprises exposure
trough a grey scale or shadow mask.
4. The method of claim 1, further comprising forming an array of
sensor elements over the substrate before depositing the dielectric
layer.
5. The method of claim 4, wherein the sensor array comprises an
array of CMOS sensor elements.
6. The method of claim 4, wherein the sensor array comprises an
array of CCD sensor elements.
7. The method of claim 1, wherein the dielectric layer has a lower
index of refraction than the lens material.
8. The method of claim 1, wherein the lens material is
inorganic.
9. The method of claim 4, wherein the sensor elements underlie an
array of to-be-formed microlenses.
10. The method of claim 1, further comprising polishing the lens
material layer.
11. The method of claim 1, further comprising treating and
smoothing the curved recess.
12. The method of claim 1, wherein the interface between the cured
recess and the lens material has a roughness that is less than the
wavelength of visible light.
13. The method of claim 12, wherein the roughness is less than
approximately {fraction (1/10)} the wavelength of the visible
light.
14. The method of claim 1, wherein the two removing steps forms a
plurality of curved recesses.
15. The method of claim 14, wherein at least one of the curved
recesses has a shape different than the other ones of the curved
recesses.
16. The method of claim 1, wherein the curved recess is
non-spherical.
17. The method of claim 1, further comprising removing remaining
portions of the patterning layer after removing the exposed portion
of the dielectric layer.
18. The method of claim 1, wherein the lens is a microlens or
non-spherical lens.
19. (canceled)
20. A lens or lens array device, comprising: a substrate; a
dielectric laser over the substrate, wherein the dielectric layer
comprises at least one curved recess on the upper surface of the
dielectric layer; a lens material layer over the dielectric layer;
and an array of sensor elements between the substrate and the
dielectric layer.
21. The device of claim 20, wherein the sensor elements are CMOS or
CCD devices.
22. A lens or lens array device, comprising: a substrate; a
dielectric layer over the substrate, wherein the dielectric layer
comprises at least one curved recess on the upper surface of the
dielectric layer; and a lens material layer over the dielectric
layer wherein the lens material layer has a higher index of
refraction than the dielectric layer.
23. The device of claim 22, wherein the dielectric layer comprises
an array of curved recesses.
24. The device of claim 23, wherein at least one of the curved
recesses is non-spherical.
25. A lens or lens array device, comprising: a substrate; a
dielectric layer over the substrate, wherein the dielectric layer
comprises at least one curved recess on the upper surface of the
dielectric layer; and a lens material layer over the dielectric
layer, wherein the dielectric layer comprises an array of curved
recesses, and wherein at least one of the curved recesses has a
shape different than the other ones of the curved recesses.
26. A lens or lens array device, comprising: a substrate; a
dielectric layer over the substrate, wherein the dielectric layer
comprises at least one curved recess on the upper surface of the
dielectric layer; a lens material layer over the dielectric layer,
wherein the dielectric layer and lens material layer are formed by
deposition.
27. A lens or lens array device, comprising: a substrate; a
dielectric layer over the substrate, wherein the dielectric layer
comprises at least one curved recess on the upper surface of the
dielectric layer; a lens material layer over the dielectric layer,
wherein the lens material layer has a polished upper surface.
28. A lens or lens array device, comprising: a substrate; a
dielectric layer over the substrate, wherein the dielectric layer
comprises at least one curved recess on the upper surface of the
dielectric layer; a lens material layer over the dielectric layer,
wherein a roughness of the dielectric layer at the interface of the
lens material layer is less than the wavelength of visible
light.
29. The device of claim 28, wherein the roughness is approximately
{fraction (1/10)} or less of the wavelength of the visible
light.
30. The device of claim 27, wherein the curved recess is
non-spherical.
31. The device of claim 27, wherein the curved recess forms a
microlens or non-spherical lens.
32. A method for manufacturing a lens or lens array, comprising:
providing a substrate; depositing a dielectric layer over the
substrate; selectively removing a portion of the dielectric layer
corresponding to a to-be-formed lens to form a curved recess on the
dielectric layer, and forming a layer of lens material over the
dielectric layer.
33. The method of claim 32, further comprising forming a sensor
array over the substrate before depositing the dielectric
layer.
34. The method of claim 32, wherein the refractive index of the
lens material is higher than that of the dielectric layer.
35. The method of claim 32, wherein the to-be-formed lens is a
microlens.
36. The method of claim 32, wherein the to-be-formed lens is
non-spherical.
37. The method of claim 32, wherein the forming comprises
depositing the lens material to fill the curved recess.
38. The method of claim 32, wherein the forming comprises using the
dielectric layer with the curved recess as a molding template.
39. A method of forming a molding for making a lens, comprising:
providing a substrate; depositing a dielectric layer over the
substrate; depositing a patterning layer over the dielectric layer;
removing a portion of the patterning layer overlying an area of the
dielectric layer corresponding to a to-be-formed lens; and roving
the exposed portion of the dielectric layer to form a curved recess
in the exposed portion of the dielectric layer.
40. The method of claim 39, wherein the to-be-formed lens comprises
a microlens or a non-spherical lens.
41. (canceled)
42. (canceled)
Description
BACKGROUND
[0001] 1. Field of the Invention
[0002] The present invention relates generally to microlens arrays
and optical lenses, and more particularly to methods for
manufacturing microlens arrays or non-spherical lenses.
[0003] 2. Related Art
[0004] Microlens arrays provide optical versatility in a miniature
package for imaging applications. Traditionally, a microlens is
defined as a lens with a diameter less than one millimeter;
however, a lens having a diameter as large as five millimeters or
more has sometimes also been considered a microlens.
[0005] There are many conventional methods for manufacturing
microlens arrays, such as using reflow or diffusion. FIGS. 1A-1C
show a typical sequence of steps for making a microlens array by
depositing material, patterning, and reflowing. In FIG. 1A, a
photosensitive layer 10, such as a photosensitive resin, is formed
on a planarization layer 12 over a silicon substrate (not shown).
The material of the photosensitive layer is used to form the
microlens array. In FIG. 1B, photosensitive layer 10 is patterned
to form an array of shapes, such as rectangles, stripes, or squares
14, where the shapes are located where the individual microlenses
will be formed. Patterning, for example, can be with a conventional
mask and photoresist process, where a photoresist is deposited on
photosensitive layer 10, exposed through a mask having opaque
areas, developing (or removing) selected portions of the
photoresist, and etching areas of photosensitive layer 10 left
exposed by the photoresist. Squares 14 are then heated sufficiently
to cause them to reflow, thereby forming an array of semi-spherical
microlenses 16, as shown in FIG. 1C.
[0006] However, microlens arrays made by thermal reflowing, as
described above, have several disadvantages. Typically,
photosensitive resins contain components which absorb
proportionally more light in the blue region of the visible
spectrum. As a result, the color spectrum is distorted, producing
an image that is more "yellowish" than it should be. This color
distortion increases with time due to oxidation of the resin.
Another disadvantage is that the resolution with which the
photosensitive resin can be patterned is limited by the thickness
of the resin layer. The thicker the resin layer, the farther apart
the microlenses in the array, which reduces the light collection
efficiency of the array. On the other hand, the resin layer must be
thick enough so that, when reflowed, the sag of the resultant
microlenses is sufficient to cause the desired focusing effect.
Consequently, it is difficult to obtain the highest possible
collection efficiency with microlens arrays fabricated in this
manner. Yet another disadvantage results from the fact that as the
curvature radius of the microlens becomes small, the incident light
is focused on a point near the microlens. Thus, the photosensitive
layer is patterned to be square or rectangular in shape according
to the shape of a cell, using a mask that is simply divided into
opaque regions and light-transmissive regions, and is thermally
treated to form a microlens. Thus, a curvature radius of the
microlens is decreased. Moreover, because a microlens formed in a
rectangular shape has a significant difference between its
curvature radius in the width and the length directions, it is
difficult to focus incident light on the corresponding photodiode
without error, and a part of the light is focused on the
planarization layer or color filter layer between the photodiode
and the microlens, causing loss of light and deterioration of
sensitivity and resolution.
[0007] Another conventional method of forming microlens arrays is
by diffusion, such as described in "Light Coupling Characteristics
of Planar Microlens", by M. Oikawa et al., Proc. SPIE, 1544, 1991,
pp. 226-237, which is incorporated by reference in its entirety.
FIGS. 2A-2G showsteps for forming a microlens array using two types
of diffusion. In FIG. 2A, a glass substrate 20 is provided. In FIG.
2B, a metal film 22 is deposited on glass substrate 20. Metal film
22 is then patterned, such as with conventional processes, to
remove portions 24 where individual microlenses are to be formed,
as shown in FIG. 2C. FIGS. 2D and 2E show one type of further
processing, where the exposed areas 24 are diffused with an
appropriate dopant and energy (FIG. 2D) and then the remaining
metal is removed and the surface is polished, such as with a
chemical or machine polish, to form microlenses 26 (FIG. 2E). FIGS.
2F and 2G show another type of further processing, where ions,
protons, or other suitable molecules are used to bombard (e.g.,
with low energy) (FIG. 2F) and diffuse into substrate 20 and the
remaining metal portions removed and the irradiated portions
"swelled" (FIG. 2G), such as with an organic vapor, to form
microlenses 28. The result is a high numeral aperture planar
microlens array. One disadvantage to forming microlens arrays using
diffusion is that control of the thickness along the optical axis
is limited.
[0008] Microlens arrays are typically used with an underlying array
of sensors, such as complementary metal oxide semiconductor (CMOS)
or charge couple device (CCD) sensors, to form an imaging device.
The microlenses collect and focus light onto corresponding sensors.
The microlenses significantly improve the light sensitivity of the
imaging device by collecting light from a large light collecting
area and focusing it on a small light sensitive area of the sensor
(i.e., pixel). One conventional method of generating an image
signal is shown in FIG. 3. Light rays 30 are collected and focused
by a microlens layer 32 comprising an array of microlenses 34
overlying a planarization layer 36, such as formed by processes
described above. After passing through planarization layer 36,
light rays 30 are filtered by color filters 38 in a filter layer
40, with each color filter allowing only light of a specific color
to pass, such as red, green, and blue (RGB). Light through the
filters are then passed through a sensor layer 42, comprising an
array of sensors 44, such as photodiodes or CCD devices. A
processor (not shown) combines signals from the sensors to create a
color image.
[0009] Such an arrangement of microlenses, filters, and sensors has
several disadvantages. Several processing steps are needed to form
the separate microlens layer 32, filter layer 40, and sensor layer
42, which increase cost and time. The layers also increase the
separation between the microlenses and the sensors, which can
increase crosstalk between pixels, due in part to light impinging
on adjacent sensors instead of the desired sensor.
[0010] In addition to microlenses, high quality non-spherical
lenses are also critical components to many applications in the
imaging field. They are widely used in optical systems for
controlling critical light propagation and correcting image color
quality, such as in professional cameras and video imaging
equipment. However, the fabrication of non-spherical lenses is
complicated and can only be done through skilled manual operation
by highly trained professionals. Unlike spherical lenses which can
be manufactured quickly by using conventional machines,
non-spherical or specially sized or shaped lenses are typically
shaped and polished manually and frequently individually. This can
be time consuming and costly.
[0011] Accordingly, there is a need for an improved lens,
microlens, or array and method of manufacturing such, including
non-spherical lenses, that overcomes the disadvantages of
conventional lens arrays or non-spherical lenses and related
processes, such as described above. Further, there is a need for an
integrated microlens array and sensor array that overcomes the
disadvantages as described above with conventional microlens/sensor
devices.
SUMMARY
[0012] The present invention provides improved microlens arrays or
non-spherical lenses and processes of forming microlens arrays or
non-spherical lenses. In one aspect, the microlens array is formed
on a sensor array, resulting in an integrated microlens/sensor
device.
[0013] According to one embodiment, an array of sensors is first
fabricated on a substrate. A dielectric layer, such as a spin-on
polymer (e.g., polyimide) or an oxide (e.g., SiO.sub.2) is
deposited over the sensor array. A patterning photosensitive
dielectric layer, such as a spin-on photoresist, is next formed
over the dielectric layer. Selected portions of the patterning
layer are removed to expose areas of the dielectric layer overlying
the individual sensors where microlenses are to be formed. The
exposed portions are then processed to form curved recesses, such
as by using a wet etch, a grey-scale mask, or a shadow mask. The
curved recesses may have a controlled shape and range from a
shallow recess to a deep spherical recess, depending on the desired
characteristics of the microlens. Remaining portions of the
patterning layer are then removed. An inorganic lens material
having a higher refractive index than the underlying dielectric
layer, such as SiO.sub.2, SiO.sub.xN.sub.y, Si.sub.3N.sub.4,
TiO.sub.2, or a polymer, is deposited over the dielectric layer to
form an integrated array of microlenses and sensors. The layer of
lens material may be polished, if desired.
[0014] In other embodiments, the dielectric layer can be deposited
over any substrate and does not have to be a sensor array. In such
embodiments, the process forms and/or can be used to make plastic
molding templates to form individual spherical or non-spherical
lenses, or an array of spherical and/or non-spherical microlenses
of any desired shape or shapes. The process of the present
invention allows a lens or microlens array to be formed with
different shaped non-spherical and/or spherical lenses. This gives
the lens manufacturer more flexibility to fabricate many additional
types of lens arrays at discount prices.
[0015] The present invention provides numerous advantages over
conventional microlens arrays and methods. Since the microlens
array is formed directly onto the sensor array with fewer
processing steps than conventional methods, microlens/sensor
devices of the present invention are easier and less expensive to
fabricate than conventional devices. The focal length of the
microlenses can be controlled depending on the type of dielectric
materials used for the microlenses and/or process control (i.e.,
curvature of the lens elements.)
[0016] The present invention also provides improved sensor
sensitivity due to the ability to make non-spherical lenses using
wet etching, grey-scale mask or shadow mask processing. Another
advantage is that using non-organic lens materials extends the
reliability or useful lifetime of the microlens. The color quality
of the image produced by the sensor is also improved because the
lens material does not have the adverse characteristics of
resin-containing materials, which as discussed above, can absorb
proportionally more blue light to make the image yellowier than
desired. Yet another advantage the current invention provides is
that the resulting microlens/sensor device is thinner and more
resistant to environmental effects because the microlens array acts
as a protection layer for the sensor elements.
[0017] The resulting microlens array may be used with devices for a
variety of application, from a small display screen for a camera, a
digital camera sensor, a personal digital assistant, or a laptop to
a large display screen for a projection screen, a wall-sized
display screen, or a billboard-sized display screen. The processing
or fabrication of the array/sensor unit allows high throughput with
consistent characteristics between each array/sensor unit.
[0018] The scope of the invention is defined by the claims, which
are incorporated into this section by reference. A more complete
understanding of embodiments of the present invention will be
afforded to those skilled in the art, as well as a realization of
additional advantages thereof, by a consideration of the following
detailed description of one or more embodiments. Reference will be
made to the appended sheets of drawings that will first be
described briefly.
BRIEF DESCRIPTION OF THE DRAWINGS
[0019] FIGS. 1A-1C show a typical sequence of steps for making a
microlens array by reflowing according to a conventional
process;
[0020] FIGS. 2A-2E show steps for forming a microlens array using
one type of diffusion according to a conventional process;
[0021] FIGS. 2A-2C and 2F-2G show steps for forming a microlens
array using another type of conventional process;
[0022] FIG. 3 shows one type of conventional microlens array and
sensor array device;
[0023] FIG. 4 is a flow chart showing a process for fabricating a
microlens array onto a sensor array according to one embodiment of
the present invention;
[0024] FIGS. 5A-5G show various stages of a process for fabricating
a microlens/sensor array according to one embodiment;
[0025] FIGS. 6A and 6B show a grey scale mask and characteristic of
a grey scale mask, respectively, for use in one embodiment of the
invention;
[0026] FIGS. 7A-7C show various stages of a process for forming
controlled curvature recesses using a grey scale mask according to
one embodiment; and
[0027] FIG. 8 is an angled view of a microlens array according to
one embodiment of the present invention.
[0028] Embodiments of the present invention and their advantages
are best understood by referring to the detailed description that
follows. It should be appreciated that like reference numerals are
used to identify like elements illustrated in one or more of the
figures.
DETAILED DESCRIPTION
[0029] FIG. 4 is a flowchart illustrating a method 400 in
accordance with an embodiment of the present invention for
fabricating a microlens array or a non-spherical lens. A substrate
is first provided in step 402, where the substrate may include an
array of CMOS or CCD sensors. The sensor array may be any suitable
size, ranging from small screen applications to large display
devices. A dielectric layer is then deposited on the substrate in
step 404. A patterning layer, such as a spin-on photoresist or
other photosensitive material, is deposited on the dielectric layer
in step 406. Selected portions of the patterning layer are removed,
such as by conventional photolithography processing, in step 408.
The removed portions expose areas of the dielectric layer where the
microlenses or non-spherical lenses are to be formed. With
embodiments having a sensor array, the exposed areas correspond to
locations of individual sensor elements.
[0030] In step 410, the exposed portions of the dielectric layer
are selectively etched, such as with a wet etch, a grey scale mask,
or shadow mask, to form controlled curved recesses. The curved
recesses deepest in the center and taper up toward the sides or
circumference. The etching does not remove all the dielectric
material such that the underlying substrate or sensors are exposed.
Further, the curved recesses can be any suitable shape, such as
semi-spherical or non-spherical, depending on the application. The
remaining portions of the patterning layer are removed in step 412,
and the resulting template is ready for further processing steps or
can be used for plastic molding of specially designed lenses. When
the template is to be continued for further processing, a layer of
inorganic lens material is deposited over dielectric layer, in step
414, to fill in the curved recesses. The lens material, in one
embodiment, has a refractive index higher than that of the
dielectric layer. Examples of suitable lens materials include, but
are not limited to, SiO.sub.2, SiO.sub.xN.sub.y, Si.sub.3N.sub.4,
TiO.sub.2, a polymer, or plastics in the case of plastic molding.
The layer of lens material may then be polished if necessary.
[0031] FIGS. 5A-5G show various stages of fabricating a microlens
array according to one embodiment of the invention. FIG. 5A shows a
top view of a substrate 500 onto which the microlens array will be
formed. In one embodiment, substrate 500 is a glass or silicon
substrate, in which the resulting device is a microlens array. In
another embodiment, substrate 500 is a sensor array formed on top
of a supporting substrate, such as glass or silicon, in which the
resulting device is an integrated sensor/microlens array. The
sensor array can be an array of CMOS or CCD sensors, such as
photodiodes or other sensor elements. Fabrication of the sensor
array is with conventional methods. FIG. 5A shows the embodiment
where a sensor array 502 with individual sensor elements 504 is
formed on a supporting substrate 506. A dielectric layer 508, such
as an oxide (e.g., SiO.sub.2, TiO.sub.2), nitride (e.g.,
SiO.sub.xN.sub.y), spin-on polymer, is deposited on sensor array
502, as shown in FIG. 5B. The thickness of the dielectric layer 508
depends on specific application requirements. In one embodiment for
integrated sensor/microlens array, dielectric layer 508 is between
1 .mu.m and several millimeters thick. In another embodiment for
individual non-spherical lens, dielectric layer 508 can be up to
one centimeter or thicker.
[0032] Next, in FIG. 5C, a patterning layer 510 is deposited over
dielectric layer 508, where patterning layer 510 will be used to
expose portions of the dielectric layer where microlenses or
non-spherical lenses will be formed. Patterning layer 510 is a
photosensitive dielectric material and is selected based on the
type of patterning process used. For example, for a
photolithography process, patterning layer 510 can be a spin-on
photoresist or other photosensitive material. The desired pattern
can then formed on patterning layer 510 by exposure through a
photomask. The photomask, if the photoresist is positive, may have
an array of circular openings, where the circular openings
correspond to locations of the microlenses to be formed. If the
microlenses are to have different shapes and/or sizes, the
individual openings of the photomask can be adjusted accordingly.
Exposed portions of patterning layer 510 are then removed to expose
portions 512 of dielectric layer 508 where microlenses or
non-spherical lenses are to be formed, as shown in FIG. 5D. With an
underlying sensor array, portions 512 correspond to individual
sensor elements 504.
[0033] In FIG. 5E, exposed portions 512 of dielectric layer 508 are
then etched to form curved recesses 514 overlying sensor elements
504. Curved recesses 514 can be semi-spherical, as shown in FIG.
5F, which is a top view of FIG. 5E. As noted above, the shape of
individual curved recesses 514 can be varied according to the
microlens application. Further, curved recesses 514 are formed, in
one embodiment, by controlled etches, such as a wet etch or etching
after patterning using a grey scale mask or shadow mask. Other
etching processes for tapered etching may also be suitable with the
present invention. The depth and taper of the etch also determines
the optical characteristics, such as focal length, of the microlens
or lens. Thus, by controlling the etch of the dielectric layer,
different types of microlens arrays can be easily fabricated.
[0034] FIGS. 6A and 6B and 7A-7C show a method of forming
controlled curved recesses using a grey scale mask process
according to one embodiment. FIG. 6A shows an example of one
opening 600 of a grey scale mask, where a typical grey scale mask
will have many such openings 600 separated by opaque sections in
between. A grey scale mask lets different amounts of light through
different radius locations of the opening, such as shown in FIG.
6B. The degree of grey at different radii of the opening 600 on the
grey scale mask determines the degree of light exposure at
corresponding locations of the underlying photosensitive dielectric
such as photoresist. As shown, less light passes through radially
outward from the center of the opening, from a maximum of
approximately 100% at the center to approximately 0% at the edge or
outer circumference. The light transmission curve "a" can be any
suitable shape for forming the desired microlens or lens.
[0035] FIGS. 7A-7C show a sequence of steps using a grey scale mask
to form the controlled curved recesses. In FIG. 7A, a small portion
of patterning layer 510 (such as a positive photoresist) is exposed
through one opening 600 of a grey scale mask. Note that the
portions between openings of the grey scale mask in the x-direction
are opaque. Patterning layer 510 is developed and a dry etch is
performed to transfer the exposed pattern to underlying dielectric
layer 508, as shown in FIGS. 7B and 7C, to form curved recesses
514. Thus, by controlling the scale of the grey on the grey scale
mask and dry etch, both spherical and non-spherical microlenses and
lenses of different designs can be formed quickly and
inexpensively.
[0036] Depending on the type of patterning and etch, curved
recesses 514 may need to be treated to smooth out irregularities on
the surface of the curved recesses. The "roughness" of the curved
recesses should be small compared to the wavelength of the visible
light. In one embodiment, the roughness should be approximately
{fraction (1/10)} the wavelength of the visible light. "Roughness"
as defined herein refers to the distance or variation between peaks
and troughs on the surface of the curved recesses. For example,
when using dry etch to form curved recesses 514, a quick wet etch
or wash may be added to smooth out any roughness of the surface of
curved recesses 514. An alternative to the quick wet etch is to
coat the surface of curved recesses 514 with a thin dielectric
material of the same refractive index as underlying dielectric
layer 508. Other suitable methods to smooth out the surface areas
of the recesses 514 include those such as properly designed
chemical mechanical polishing (CMP) and the like.
[0037] After forming curved recesses 514 of dielectric layer 508
(and polished if necessary), the structure can be used as a
template for making plastic lenses through plastic molding, or to
continue further processing for microlens/sensor integration. For
plastic molding of lenses, multiple templates of the same pattern
design and curved shapes or different design and shapes may be used
depending on specific applications. When used for microlens/sensor
integration, referring back to FIG. 5G, after curved recesses 514
of dielectric layer 508 are formed (and polished if necessary), a
layer of transparent lens material 516 is deposited, as shown in
FIG. 5G, to form the microlens array. In one embodiment, the lens
material is inorganic and has a higher index of refraction than
that of underlying dielectric layer 508. Some suitable materials
for lens material 516 include dielectrics, such as SiO.sub.2,
SiO.sub.xN.sub.y, Si.sub.3N.sub.4, TiO.sub.2, a polymer, plastics
or a combination of them. Thus, depending on the microlens
requirements, dielectric layer 508 and lens material 516 are
selected accordingly. In one embodiment, the deposited thickness of
lens material 516 is approximately the same as the depth at the
center of the curved recesses or thicker depending on the
application requirement. Use of inorganic lens materials, as
opposed to resin-based reflow processes, produces lenses that
create a truer color image. That is, there is no extra absorption
in the blue spectrum, which produces yellowier images. Further,
forming the microlens by deposition instead of diffusion provides
better control of the lens shape and the thickness along the
optical axis. After deposition of lens material 516, the upper
surface can be polished to produce a flat smooth surface if
necessary.
[0038] FIG. 8 is an angled view of a microlens array 800 having
integrated sensors/microlenses. Transparent lens material 516 can
act as a protection layer for the underlying microlenses 802 and
sensor array 502. Each microlens 802 corresponds to an underlying
sensor element 808, which are supported by substrate 506. Light
entering microlens array 800 is directed toward individual sensors
in the sensor array by corresponding microlenses 802. The process
of making the microlens array allows more light to be received by
the sensors, thereby improving image sensitivity and color quality.
However, as noted above, microlens array 800 or an individual
non-spherical lens does not require an underlying array of
sensors.
[0039] The present invention allows a microlens array or individual
lens having non-spherical or different sized/shaped
microlenses/lens to be manufactured easily. In conventional
processes for making non-spherical or specially sized or shaped
lenses, the lenses are typically shaped and polished manually and
sometimes individually. This can be costly in terms of time and
effort. On the other hand, spherical lens arrays can be
manufactured quickly by using conventional machines. However, the
machines do not allow non-spherical lenses to be formed nor do they
allow lenses of different shapes or sizes to be formed on the same
array. Advantageously, the present invention allows microlens
arrays or lenses having non-spherical microlenses or lenses of
different shapes or sizes to be made quickly and inexpensively.
[0040] Embodiments described above illustrate but do not limit the
invention. It should also be understood that numerous modifications
and variations are possible in accordance with the principles of
the present invention. For example, the above embodiments describe
the use of a patterning layer over a dielectric layer. However, the
dielectric layer can be excluded if the patterning photosensitive
dielectric layer can be directly used to form usable curved
recesses or to form the curved recesses using other means such as
suitable chemical processes or ion beam sputtering and the like.
Accordingly, the scope of the invention is defined only by the
following claims.
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