U.S. patent application number 10/758688 was filed with the patent office on 2005-07-21 for method for polishing hard surfaces.
This patent application is currently assigned to ECOLAB INC.. Invention is credited to Smith, Kim R..
Application Number | 20050159088 10/758688 |
Document ID | / |
Family ID | 34749553 |
Filed Date | 2005-07-21 |
United States Patent
Application |
20050159088 |
Kind Code |
A1 |
Smith, Kim R. |
July 21, 2005 |
Method for polishing hard surfaces
Abstract
The present invention relates to a method for polishing hard
surfaces. The method includes applying a composition including an
alkoxylate to a hard surface to be polished.
Inventors: |
Smith, Kim R.; (Woodbury,
MN) |
Correspondence
Address: |
MERCHANT & GOULD PC
P.O. BOX 2903
MINNEAPOLIS
MN
55402-0903
US
|
Assignee: |
ECOLAB INC.
ST. PAUL
MN
|
Family ID: |
34749553 |
Appl. No.: |
10/758688 |
Filed: |
January 15, 2004 |
Current U.S.
Class: |
451/60 |
Current CPC
Class: |
C09G 1/14 20130101 |
Class at
Publication: |
451/060 |
International
Class: |
B24B 001/00 |
Claims
We claim:
1. A method of polishing a hard surface, comprising applying a
composition to the hard surface, the composition comprising: at
least one glycol.
2. The method according to claim 1, wherein the glycol is
represented by Formula I: HO(R--CHCH.sub.2O).sub.nH where R is an
alkyl group containing 1 to 3 carbon atoms and n is 1 to
10,000.
3. The method according to claim 2, wherein n is 1 to 1,000.
4. The method according to claim 2, wherein n is 1 to 100.
5. The method according to claim 2, wherein n is 1 to 10.
6. The method according to claim 1, wherein the glycol is at least
one of propylene glycol, dipropylene glycol, and polypropylene
glycol.
7. The method according to claim 1, wherein the composition further
comprises a wetting agent.
8. The method according to claim 1, further comprising diluting a
concentrate to form the composition.
9. The method according to claim 1, wherein the composition
comprises about 30 to about 70 wt-% glycol.
10. The method according to claim 1, wherein the composition
comprises about 0.1 to about 70 wt-% glycol.
11. The method according to claim 1, wherein the composition
comprises about 45 to about 55 wt-% glycol.
12. The method according to claim 11, wherein the glycol is
represented by Formula I: HO(R--CHCH.sub.2O).sub.nH where R is an
alkyl group containing 1 to 3 carbon atoms and n is 1 to
10,000.
13. The method according to claim 12, wherein the glycol is at
least one of propylene glycol, dipropylene glycol, and
polypropylene glycol.
14. The method according to claim 8, further comprising removing
soil from the hard surface.
15. The method according to claim 14, further comprising rinsing
the hard surface.
16. The method according to claim 1, wherein the hard surface is
metal.
17. The method according to claim 1, wherein the hard surface is a
tire.
18. A method of polishing a hard surface, comprising applying a
composition to the hard surface, the composition comprising about
45 wt-% to about 55 wt-% propylene glycol.
19. The method according to claim 18, further comprising removing
soil from the hard surface.
20. A method of polishing a hard surface, comprising applying a
composition to the hard surface, the composition comprising an
ethoxylate propoxylate.
21. The method according to claim 20, wherein applying comprises
foaming the composition onto the hard surface from an unpressurized
container.
22. An article of manufacture comprising: a container of a
composition including an alkoxylate and instructions on how to use
the composition as a polish.
23. An article of manufacture according to claim 22, further
comprising a wet wipe saturated with the composition.
24. An article of manufacture according to claim 22, wherein the
composition comprises glycol.
25. A method of polishing a hard surface, comprising applying a
composition to the hard surface as a foam from an unpressurized
container.
Description
FIELD OF THE INVENTION
[0001] The present invention relates to a method for polishing a
hard surface. The method includes applying a composition including
a glycol and/or alkoxylate to a hard surface to be polished.
BACKGROUND OF THE INVENTION
[0002] Metal surfaces have long required polishing, in particular,
in the food service and health care industry. Recently, more and
more home kitchen appliances have begun to use stainless steel as a
facing. Unfortunately, the stainless steel readily shows grease
smudges, fingerprints, etc. and requires polishing to restore its
shine.
[0003] Current polishes include oil, such as mineral, vegetable, or
silicon oil as the polishing agent. Such polishes have several
disadvantages. For instance, any overspray of the polish onto the
floor presents a slip hazard due to the oil polishing agent. Also,
due to the low water solubility of the oil, any clean up of the
polish is difficult. In addition, mineral and silicon oils are
undesirable on surfaces that may come in contact with food, such as
steel sinks in restaurants. Vegetable oils oxidize on a metal
surface causing the metal surface to darken over time.
[0004] There remains need for a method for polishing that does not
employ an oil based polish.
SUMMARY OF THE INVENTION
[0005] The present invention relates to a method for polishing a
hard surface. The method includes applying a composition including
a glycol and/or alkoxylate to a hard surface to be polished.
[0006] In an embodiment, the method of polishing a hard surface
includes applying a composition including a glycol and/or
alkoxylate and a source of alkalinity.
[0007] In an embodiment, the method of polishing a hard surface
includes applying a composition including an glycol and/or
alkoxylate, a wetting agent, a source of alkalinity, and a
sequestrant.
[0008] In another embodiment, the glycol is represented by Formula
I: HO(R--CHCH.sub.2O).sub.nH, where R is an alkyl group containing
1 to 3 carbon atoms and n is 1 to 10,000.
[0009] In another embodiment, the method of polishing a hard
surface includes applying a composition including an ethoxylate
propoxylate.
[0010] In another embodiment, the method of polishing includes
removing soil.
DETAILED DESCRIPTION OF THE INVENTION
[0011] Definitions
[0012] As used herein, weight percent (wt-%), percent by weight, %
by weight, and the like are synonyms that refer to the
concentration of a substance as the weight of that substance
divided by the weight of the composition and multiplied by 100.
[0013] As used herein, the term "about" modifying the quantity of
an ingredient in the compositions of the invention or employed in
the methods of the invention refers to variation in the numerical
quantity that can occur, for example, through typical measuring and
liquid handling procedures used for making concentrates or diluting
concentrates in the real world; through inadvertent error in these
procedures; through differences in the manufacture, source, or
purity of the ingredients employed to make the compositions or
carry out the methods; and the like. Whether or not modified by the
term "about", the claims include equivalents to the quantities.
[0014] As used herein "polishing" means imparting smoothness,
gloss, surface protection, or a decorative finish on a hard
surface.
[0015] Method of Polishing
[0016] The present invention relates to a method of polishing a
hard surface. The method includes applying a composition including
a glycol and/or an alkoxylate to a hard surface. Applying the
composition to the hard surface can include spraying (e.g.,
nonaerosol spraying), wiping, rubbing, foaming on, or any other
form of contacting the composition with the hard surface to be
polished. In an embodiment, applying can include spraying (e.g.,
nonaerosol spraying), wiping, foaming, or rubbing.
[0017] Suitable hard surfaces that can be polished according to the
present method include stainless steel, aluminum, copper, vinyl,
plastic, metal, rubber, formica, wood, mild steel, melamine, brass,
ceramic, and stone. In an embodiment, the object or surface
polished by the present method can be opaque or translucent. In an
embodiment, the object or surface polished by the present method
can be opaque. Exemplary appliances or other devices requiring
polishing include refrigerators, stoves, dishwashers, elevators,
doors, faucets, countertops, sinks, and the like.
[0018] The present invention can also include diluting a
concentrate to form the composition that is applied to the hard
surface. Suitable diluents include water, glycol ether, ethanol,
propanol, and isopropanol. In an embodiment, the concentrate can be
diluted with water. In certain embodiments, the composition
contains about 10% by weight to about 90% by weight diluent, about
20% by weight to about 70% by weight diluent, about 90% by weight
to about 99.5% by weight diluent, and about 30% by weight to about
60% by weight diluent. The diluent can be present at any of these
amounts not as part of a range and/or at any of these amounts not
modified by about.
[0019] The present invention can also include removing soil.
Applying the composition to a hard surface can remove soil. The
composition can include components that are suitable in removing
soil from a hard surface. Such soil can include oil, grease, dirt,
contaminant, bacteria, food, body fluids, mixture thereof, or the
like. In an embodiment, the soil includes oil, grease, or dirt.
[0020] Polishing Composition
[0021] The composition employed in the present method includes a
polishing agent. The composition can also include a cleaning agent
or any of a variety of other components. The composition can be in
the form of liquid, gel, paste, solid, powder, or foam.
[0022] Polishing Agent
[0023] The polishing agent can include a glycol such as an alkylene
glycol. Suitable alkylene glycols include those represented by
formula I:
HO(R--CHCH.sub.2O).sub.nH (I)
[0024] In formula I, R can be, for example, an alkyl group
containing 1 to 3 carbon atoms. The alkyl group can be straight or
branched chain. In certain embodiments, n can be 1 to 10,000, 1 to
1,000, 1 to 100, or 1 to 10. An exemplary polishing agent is
propylene glycol and any of its oligomers. Propylene glycol and
dipropylene glycol are considered safe according to government
(e.g. FDA or USDA, listed on FDA's Generally Recognized As Safe
list) rules and regulations. Preferred polishing agents do not
include glycol ether.
[0025] The polishing agent can include an alkoxylate. In an
embodiment, the alkoxylate includes a C3-C6 alkoxy substituent.
Exemplary alkoxylates that can be used according to the invention
include surfactant including nonionic block copolymers, alcohol
alkoxylates, and alkoxylates having additional functionality
including alkyl polyglycosides, zwitterionics, anionics, and
mixtures thereof. Additional exemplary polishing agents include
alcohol propoxylates; alkylphenol ethoxylate-propoxylates;
alkoxylated derivatives of carboxylic acids, amines, amides and
esters; and ethylene oxide-propylene oxide copolymers. Exemplary
ethylene oxide-propylene oxide polymers include those available
under the names Pluronic, Pluronic R, Tetronic, and Tetronic R from
BASF.
[0026] Exemplary nonionic block copolymer surfactants include
polyoxyethylene-polyoxypropylene block copolymers. Exemplary
polyoxyethylene-polyoxypropylene block copolymers that can be used
have the formulae:
(EO).sub.x(PO).sub.y(EO).sub.x
(PO).sub.y(EO).sub.x(PO).sub.y
(PO).sub.y(EO).sub.x(PO).sub.y(EO) .sub.x(PO).sub.y
[0027] wherein EO represents an ethylene oxide group, PO represents
a propylene oxide group, and x and y reflect the average molecular
proportion of each alkylene oxide monomer in the overall block
copolymer composition. Preferably, x is from about 10 to about 130,
y is about to about 70, and x plus y is about 25 to about 200. It
should be understood that each x and y in a molecule can be
different. The total polyoxyethylene component of the block
copolymer is preferably at least about 20 mol-% of the block
copolymer and more preferably at least about 30 mol-% of the block
copolymer. The material preferably has a molecular weight greater
than about 1,500 and more preferably greater than about 2,000.
Although the exemplary polyoxyethylene-polyoxypropylene block
copolymer structures provided above have 3 blocks and 5 blocks, it
should be appreciated that the nonionic block copolymer surfactants
according to the invention can include more or less than 3 and 5
blocks. In addition, the nonionic block copolymer surfactants can
include additional repeating units such as butylene oxide repeating
units. Furthermore, the nonionic block copolymer surfactants that
can be used according to the invention can be characterized heteric
polyoxyethylene-polyoxypropylene block copolymers. Exemplary
sheeting agents that can be used according to the invention are
available from BASF under the name Pluronic, and an exemplary EO-PO
co-polymer that can be used according to the invention is available
under the name Pluronic N3.
[0028] The polishing agent can be present in the composition at
about 0.025 to about 90 wt-%, about 0.1 to about 10 wt-%, about 0.1
to about 70 wt-%, about 0.5 to about 2 wt-%, about 0.025 to about 4
wt-%, about 10 to about 90 wt-%, about 25 to about 90 wt-%, about
30 to about 70 wt-%, about 40 to about 60 wt-%, about 20 to about
60 wt-%, or about 45 to about 55 wt-%. The polishing agent can be
present at any of these amounts not as part of a range and/or at
any of these amounts not modified by about.
[0029] Additional Components
[0030] The composition may include additional components. Exemplary
additional components include sequestrant, source of alkalinity,
acid, wetting agent, organic solvents, and aesthetic modifiers such
as dye or fragrance.
[0031] Sequestrant/Builder
[0032] The composition employed in the present method can include a
sequestrant or builder. In general, a sequestrant is a molecule
capable of coordinating (i.e., binding) the metal ions commonly
found in natural water to prevent the metal ions from interfering
with the action of the other ingredients of the composition. For a
further discussion of chelating agents/sequestrants, see
Kirk-Othmer, Encyclopedia of Chemical Technology, Third Edition,
volume 5, pages 339-366 and volume 23, pages 319-320.
[0033] A variety of sequestrants or builders can be used in the
composition, including, for example, organic phosphonate,
aminocarboxylic acid, condensed phosphate, inorganic builder,
polymeric polycarboxylate, mixtures thereof, or the like. Such
sequestrants and builders are commercially available.
[0034] Suitable condensed phosphates include sodium and potassium
orthophosphate, sodium and potassium pyrophosphate, sodium and
potassium tripolyphosphate, sodium hexametaphosphate, and the like,
e.g., the sodium salt, e.g., of pyrophosphate. A condensed
phosphate may also assist, to a limited extent, in solidification
of the composition by fixing the free water present in the
composition as water of hydration.
[0035] Polymeric polycarboxylates that can be used according the
invention can include a polymer and/or an oligomer containing
pendant carboxylic acid groups and/or pendant carboxylic acid salt
groups. It should be understood that the term "pendant" refers to
the groups being present other than in the polymer backbone and/or
oligomer backbone. The dispersants can be available as homopolymers
or co-polymers or as homo-oligomers or co-oligomers. Exemplary
sequestrants include, for example, poly(acrylic acid), poly(maleic
acid/olefin) copolymer, poly(acrylic acid/maleic acid) copolymer,
polymethacrylic acid, acrylic acid-methacrylic acid copolymers,
hydrolyzed polyacrylamide, hydrolyzed polymethacrylamide,
hydrolyzed polyamide-methacrylamide copolymers, hydrolyzed
polyacrylonitrile, hydrolyzed polymethacrylonitrile, hydrolyzed
acrylonitrile-methacrylonitrile copolymers, polymaleic acid,
polyfumaric acid, copolymers of acrylic and itaconic acid,
phosphino polycarboxylate, and the like. An exemplary sequestrant
is maleic anhydride/olefin copolymer. An exemplary maleic
anhydride/olefin copolymer is available from Rohm & Haas under
the name Acusol 460N. An exemplary polyacrylic acid sodium salt
having a molecular weight of about 4,500 is available from Rohm
& Haas under the name Acusol 434N. An exemplary acrylic
acid/maleic acid co-polymer having a molecular weight of about
3,200 is available from Rohm & Haas under the Acusol 448. An
exemplary acrylic acid/maleic acid sodium salt having a molecular
weight of about 70,000 is available from Rohm & Haas under the
name Acusol 479N. An exemplary acrylic acid/maleic acid sodium salt
having a molecular weight of about 40,000 is available from Rohm
& Haas under the name Acusol 505N.
[0036] In an embodiment, the present composition includes as
sequestrant or builder condensed phosphate and polyacrylate, or
another polymer, for example, sodium tripolyphosphate and
polyacrylate. In an embodiment, sodium salts of condensed
phosphates are preferred to the corresponding potassium salts. In
an embodiment, the present composition includes as sequestrant or
builder polycarboxylates, such as polyacrylate and/or phosphino
polycarboxylate.
[0037] The builder can include an organic phosphonate, such as an
organic-phosphonic acid and alkali metal salts thereof. Some
examples of suitable organic phosphonates include:
[0038] 1-hydroxyethane-1,1-diphosphonic acid:
CH.sub.3C(OH)[PO(OH).sub.2].- sub.2;
[0039] aminotri(methylenephosphonic acid):
N[CH.sub.2PO(OH).sub.2].sub.3;
[0040] aminotri(methylenephosphonate), sodium salt 1
[0041] 2-hydroxyethyliminobis(methylenephosphonic acid):
HOCH.sub.2CH.sub.2N[CH.sub.2PO(OH).sub.2].sub.2;
[0042] diethylenetriaminepenta(methylenephosphonic acid):
[0043]
(HO).sub.2POCH.sub.2N[CH.sub.2CH.sub.2N[CH.sub.2PO(OH).sub.2].sub.2-
].sub.2;
[0044] 2-phosphonobutane-1, 2, 4-tricarboxylic acid;
[0045] diethylenetriaminepenta(methylenephosphonate), sodium salt:
C.sub.9H.sub.(28-x)N.sub.3Na.sub.xO.sub.15P.sub.5 (x=7);
[0046] hexamethylenediamine(tetramethylenephosphonate), potassium
salt: C.sub.10H.sub.(28-x)N.sub.2K.sub.xO.sub.12P.sub.4 (x=6);
[0047] bis(hexamethylene)triamine(pentamethylenephosphonic
acid):
[0048]
n(HO.sub.2)POCH.sub.2N[(CH.sub.2).sub.6N[CH.sub.2PO(OH).sub.2].sub.-
2].sub.2; and
[0049] phosphorus acid H.sub.3PO.sub.3; and other similar organic
phosphonates, and mixtures thereof.
[0050] Suitable organic phosphonates include PBTC, ATMP, and
DTPMP.
[0051] The sequestrant can be or include aminocarboxylic acid type
sequestrant. Suitable aminocarboxylic acid type sequestrants
include the acids or alkali metal salts thereof, e.g., amino
acetates and salts thereof. Some examples include the
following:
[0052] N-hydroxyethylaminodiacetic acid;
[0053] hydroxyethylenediaminetetraacetic acid, nitrilotriacetic
acid (NTA);
[0054] ethylenediaminetetraacetic acid (EDTA);
[0055] N-hydroxyethyl-ethylenediaminetriacetic acid (HEDTA);
[0056] diethylenetriaminepentaacetic acid (DTPA); and
[0057] alanine-N,N-diacetic acid;
[0058] and the like; and mixtures thereof.
[0059] Suitable aminocarboxylates include ethylenediamine
tetraacetic acid (EDTA), diethylenetriamine pentaacetic acid
(DTPA), their alkali metal salts, and mixtures thereof.
[0060] The sequestrant/builder can be present in a use dilution of
the composition at about 0 to about 1 wt-%, about 0.01 to about 0.5
wt-%, about 0.01 to about 0.04 wt-%, about 0.005 to about 0.08
wt-%, about 0.0025 to about 0.1 wt-%, or about 0.005 to about 0.2
wt-%. The polishing agent can be present at any of these amounts
not as part of a range and/or at any of these amounts not modified
by about.
[0061] Source of Alkalinity
[0062] The composition employed in the present method can include
one or more alkalinity sources, which can enhance polishing of a
hard surface and improve soil removal performance of the
composition. The source of alkalinity can include an alkali metal
salt, such as alkali metal carbonate, alkali metal hydroxide,
alkali metal silicate (e.g., metasilicate), or the like; metal
borate, such as sodium or potassium borate, and the like;
alkanolamines and amines; inorganic alkalinity source, such as
alkali metal hydroxide or silicate (e.g., metasilicate), or the
like; and other like alkaline sources. The choice and the quantity
of alkalinity source can be sufficient to render the composition
alkaline. An exemplary source of alkalinity is
monoethanolamine.
[0063] Suitable alkali metal hydroxides include, for example,
sodium or potassium hydroxide, e.g., sodium hydroxide. An alkali
metal hydroxide may be added to the composition in a variety of
forms, including for example in the form of solid beads, dissolved
in an aqueous solution, or a combination thereof. Alkali metal
hydroxides are commercially available as a solid in the form of
prilled solids or beads having a mix of particle sizes ranging from
about 12-100 U.S. mesh, or as an aqueous solution, as for example,
as a 50 wt-% and a 73 wt-% solution.
[0064] Examples of useful alkaline metal silicates include sodium
or potassium silicate (with a M.sub.2O:SiO.sub.2 ratio of 1:2.4 to
5:1, M representing an alkali metal) or metasilicate. In an
embodiment, the alkaline metal silicate includes sodium
metasilicate.
[0065] In certain embodiments, the alkaline source includes a salt
of metasilicate, of silicate, or of carbonate, e.g., a sodium
salt.
[0066] The source of alkalinity can be present in a use dilution of
the composition at about 0 to about 1 wt-%, about 0.01 to about 0.5
wt-%, about 0.045 to about 0.18 wt-%, about 0.02 to about 0.36
wt-%, about 0.01 to about 0.72 wt-%, or about 0.05 to about 0.15
wt-%. The source of alkalinity can be present at any of these
amounts not as part of a range and/or at any of these amounts not
modified by about.
[0067] Acids or Acidulants
[0068] The composition employed in the present method can include
one or more ingredients to decrease the pH, e.g. one or more acids
or acidulants. Suitable acids include organic and inorganic acids.
For example, suitable inorganic acids include phosphoric acid,
hydrochloric acid, nitric acid, sulfuric acid, sulfamic acid,
mixtures thereof, or the like. For example, suitable organic acids
include lactic acid, citric acid, propionic acid, acetic acid,
hydroxyacetic acid, formic acid, glutaric acid, malic acid, hydroxy
propionic acid, succinic acid, glutaric acid, adipic acid, fumaric
acid, mixtures thereof, or the like. The organic acid can be a
mixture of adipic, malic, and succinic acids sold under the
tradename Sokalan. In an embodiment, the acid includes phosphoric
acid, lactic acid, or a mixture thereof. In an embodiment, the acid
includes phosphoric acid, lactic acid, hydroxyacetic acid, or a
mixture thereof. In an embodiment, the acid includes citric acid,
lactic acid, urea hydrochloride, or a mixture thereof.
[0069] The acidulant or acid can be present in the composition at
about 0 to about 1 wt-%, about 0.1 to about 0.5 wt-%, about 0.045
to about 0.18 wt-%, about 0.02 to about 0.36 wt-%, about 0.01 to
about 0.72 wt-%, or about 0.05 to about 0.15 wt-%. The acidulant or
acid can be present at any of these amounts not as part of a range
and/or at any of these amounts not modified by about.
[0070] Wetting or Defoaming Agent
[0071] Also useful in the composition of the invention are wetting
and defoaming agents. Wetting agents function to increase the
surface contact or penetration activity of the composition employed
in the method of the invention. Wetting agents, which can be used
in the composition of the invention, include any of those
constituents known within the art to raise the surface activity of
the composition of the invention.
[0072] Along these lines, surfactants, and especially nonionic
surfactants, can also be useful in the present invention. Nonionic
surfactants, which can be useful in the present invention, are
those which include ethylene oxide moieties, propylene oxide
moieties, as well a mixtures thereof, and ethylene oxide-propylene
oxide moieties in either heteric or block formation. Additionally
useful in the present invention are nonionic surfactants which
include an alkyl ethylene oxide compounds, alkyl propylene oxide
compounds, as well as mixtures thereof, and alkyl ethylene
oxide-propylene oxide compounds where the ethylene oxide propylene
oxide moiety is either in heteric or block formation. Further
useful in the present invention are nonionic surfactants having any
mixture or combination of ethylene oxide-propylene oxide moieties
linked to a alkyl chain where the ethylene oxide and propylene
oxide moieties can be in any randomized or ordered pattern and of
any specific length. Nonionic surfactants useful in the present
invention can also include randomized sections of block and heteric
ethylene oxide propylene oxide, or ethylene oxide-propylene oxide,
such as ethylene diamine ethylene oxides, ethylene diamine
propylene oxides, mixtures thereof, and ethylene diamine EO-PO
compounds, including those sold under the tradename Tetronic. An
exemplary wetting agent is sodium lauryl sulfate.
[0073] The composition used in the methods of the invention can
also contain additional ingredients as necessary to assist in
defoaming.
[0074] Generally, defoamers which can be used in accordance with
the invention include silica and silicones; aliphatic acids or
esters; alcohols; sulfates or sulfonates; amines or amides;
halogenated compounds, such as fluorochlorohydrocarbons; vegetable
oils, waxes, mineral oils as well as their sulfated derivatives;
fatty acid soaps such as alkali, alkaline earth metal soaps; and
phosphates and phosphate esters such as alkyl and alkaline
diphosphates, and tributyl phosphates among others; and mixtures
thereof.
[0075] The wetting agent or defoaming agent can be present in the
composition at about 0 to about 1 wt-%, about 0.1 to about 0.5
wt-%, about 0.035 to about 0.14 wt-%, about 0.02 to about 0.21
wt-%, about 0.015 to about 0.28 wt-%, about 0.01 to about 0.49
wt-%, or about 0.05 to about 0.10 wt-%. The wetting agent or
defoaming agent can be present at any of these amounts not as part
of a range and/or at any of these amounts not modified by
about.
[0076] Dyes/Odorants
[0077] Various dyes, odorants including perfumes, and other
aesthetic enhancing agents may also be included in the composition.
Dyes may be included to alter the appearance of the composition, as
for example, Direct Blue 86 (Miles), Fastusol Blue (Mobay Chemical
Corp.), Acid Orange 7 (American Cyanamid), Basic Violet 10
(Sandoz), Acid Yellow 23 (GAF), Acid Yellow 17 (Sigma Chemical),
Sap Green (Keyston Analine and Chemical), Metanil Yellow (Keystone
Analine and Chemical), Acid Blue 9 (Hilton Davis), Sandolan
Blue/Acid Blue 182 (Sandoz), Hisol Fast Red (Capitol Color and
Chemical), Fluorescein (Capitol Color and Chemical), Acid Green 25
(Ciba-Geigy), Pylaklor Pink LX-10613, and the like.
[0078] Fragrances or perfumes that may be included in the
compositions include, for example, terpenoids such as citronellol,
aldehydes such as amyl cinnamaldehyde, a jasmine such as
C1S-jasmine or jasmal, vanillin, and the like.
[0079] Polishing
[0080] The hard surface to be polished can include any surface that
requires polishing. Such hard surfaces include tires, bumpers on
vehicles, plastic, tire rims, elevators, countertops, formica,
sinks, faucets, and kitchen appliances.
[0081] Exemplary industries that may use the present invention are
the food industry, the transportation industry (e.g. cars, trucks,
boats, aircraft), the restaurant industry, the hospitality industry
(e.g., hotels, motels), consumer industry, healthcare industry
(e.g. hospitals, nursing homes, dental and medical offices), and
schools.
[0082] Depending upon the formulation, the composition of the
invention can be a liquid, semi-liquid, gel, dispersion, paste,
foam, powder, or solid, and can be in the form of a concentrate or
ready-to-use formulation. The composition generally has a
capability of being used on a wide range of surfaces.
[0083] The present invention includes a broad variety of polishing
applications. Some examples include manual or machine polishing and
the like. The methods may be used manually, with hand operated
polishing equipment or in automatic polishing equipment.
[0084] Exemplary application techniques include low pressure
application, hand pressure application, water jet spray apparatus
or other manual or mechanical application methods and systems can
be used, depending upon the form of the composition. Some
embodiments of the invention include applying composition, allowing
to dry, and then removing or buffing off. Other embodiments are
applied and worked into the surface immediately.
[0085] The composition can be applied to the hard surface by
pouring the composition onto the hard surface directly or onto a
cloth or rag, which is then used to wipe the hard surface. The
composition can be sprayed onto the surface as a liquid, foam, or
aerosolized liquid. The composition is then spread over the entire
hard surface by wiping the hard surface with a cloth or rag,
spreading the composition over the entire hard surface. The cloth
or rag can include the composition or spread the composition that
has been poured directly onto the hard surface. Exemplary wiping
motions can be circular, zigzag, or back and forth. The excess
polish can be removed by wiping a new rag or cloth or the existing
rag or cloth over the excess polish.
[0086] The composition can also be contained within a liquid tight
container. The container can include directions. The directions can
include directions on how to apply the composition or use the
composition as a polish. The container can also include a wet wipe
that is impregnated or saturated with the composition. The
container can also include a label identifying the container, such
as a polish holding container.
[0087] The method of polishing can include rinsing. Typically
rinsing means removing any excess composition from the hard surface
to be polished. Exemplary rinsing steps include the use of a
liquid, such as water. The water is contacted with the hard surface
to remove any excess composition.
[0088] The present invention may be better understood with
reference to the following examples. These examples are intended to
be representative of specific embodiments of the invention, and are
not intended as limiting the scope of the invention.
EXAMPLES
Example 1
[0089] Various solutions of propylene glycol in water were prepared
and tested as a polish on a stainless steel door of a dishwasher.
The concentration had an impact on performance in terms of overall
gloss and whether or not streaking occurs. For instance, the 30% by
weight propylene glycol had slight streaking and good gloss
behavior. Good gloss behavior means an individual can discern 15
point letters in a reflection that is 6 inches from the hard
surface, but the reflection is not crisp or well defined. The 50%
by weight propylene glycol had no streaking and excellent gloss
behavior. Excellent gloss behavior means an individual can discern
15 point letters in a reflection that is 6 inches from the hard
surface, and the reflection has crisp edges and is well
defined.
1TABLE 1 Results of Propylene Glycol as a polish % Propylene Glycol
Streaking Gloss* 1 severe poor 20 moderate poor 30 slight good 50
none excellent *poor gloss = cannot discern individual letters of a
15 point print word in reflection from 6" good gloss = can discern
individual 15 point letters but not crisp and well defined
excellent gloss = each 15 point letter has crisp edges and is well
defined
Example 2
[0090] The following composition is an exemplary composition that
may be used according to the present invention.
Example 2
[0091]
2 Weight % Material 58.655 Deionized water 40.000 Propylene glycol
0.050 Acusol 460 N, 25% 0.900 N-propoxypropanol 0.095
Monoethanolamine, 99% 0.005 Pluronic N3 0.245 Sodium Lauryl
Sulfate, 30% 0.050 Tetrasodium EDTA, 40%
Example 3
[0092] The following composition is an exemplary composition that
may be used according to the present invention.
Example 3
[0093]
3 Weight % Material 1 Pluronic N3 99 Deionized water
Example 4
[0094] The following composition is an exemplary composition that
may be used according to the present invention.
Example 4
[0095]
4 Weight % Material 50 Propylene glycol 50 Deionized water
Example 5
[0096] The following composition is an exemplary composition that
may be used according to the present invention.
Example 5
[0097]
5 Weight % Material 1 Propylene glycol (2000 molecular weight) 99
Deionized water
[0098] It should be noted that, as used in this specification and
the appended claims, the singular forms "a," "an," and "the"
include plural referents unless the content clearly dictates
otherwise. Thus, for example, reference to a composition containing
"a compound" includes a mixture of two or more compounds. It should
also be noted that the term "or" is generally employed in its sense
including "and/or" unless the content clearly dictates
otherwise.
[0099] All publications and patent applications in this
specification are indicative of the level of ordinary skill in the
art to which this invention pertains.
[0100] The invention has been described with reference to various
specific and preferred embodiments and techniques. However, it
should be understood that many variations and modifications may be
made while remaining within the spirit and scope of the
invention.
* * * * *