U.S. patent application number 11/065878 was filed with the patent office on 2005-06-30 for micromachined sensor with quadrature suppression.
This patent application is currently assigned to Analog Devices, Inc.. Invention is credited to Geen, John A..
Application Number | 20050139005 11/065878 |
Document ID | / |
Family ID | 27737467 |
Filed Date | 2005-06-30 |
United States Patent
Application |
20050139005 |
Kind Code |
A1 |
Geen, John A. |
June 30, 2005 |
Micromachined sensor with quadrature suppression
Abstract
Quadrature suppression is provided by placing a resonator mass
adjacent to a quadrature suppression electrode. The resonator mass
is capable of moving substantially parallel to the quadrature
suppression electrode and includes a notch formed adjacent to a
portion of the quadrature suppression electrode such that a length
of resonator mass that is directly adjacent to the quadrature
suppression electrode varies as the resonator mass moves relative
to the quadrature suppression electrode. The quadrature suppression
electrode is capable of producing a lateral force on the resonator
mass that varies based on the length of resonator mass that is
directly adjacent to the quadrature suppression electrode. Such
quadrature suppression can be used in sensors having one or more
resonator masses.
Inventors: |
Geen, John A.; (Tewksbury,
MA) |
Correspondence
Address: |
Jeffrey T. Klayman
Bromberg & Sunstein LLP
125 Summer Street
Boston
MA
02110-1618
US
|
Assignee: |
Analog Devices, Inc.
|
Family ID: |
27737467 |
Appl. No.: |
11/065878 |
Filed: |
February 25, 2005 |
Related U.S. Patent Documents
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Application
Number |
Filing Date |
Patent Number |
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11065878 |
Feb 25, 2005 |
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10360987 |
Feb 6, 2003 |
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6877374 |
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60354610 |
Feb 6, 2002 |
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60364322 |
Mar 14, 2002 |
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Current U.S.
Class: |
73/504.14 ;
73/510 |
Current CPC
Class: |
G01C 19/5719 20130101;
Y10T 74/12 20150115 |
Class at
Publication: |
073/504.14 ;
073/510 |
International
Class: |
G01P 001/04; G01P
009/04; G01P 015/14 |
Claims
What is claimed is:
1. A micromachined sensor with quadrature suppression comprising: a
quadrature suppression electrode; and a resonator mass positioned
adjacent to the quadrature suppression electrode, the resonator
mass capable of moving substantially parallel to the quadrature
suppression electrode, the resonator mass including a notch formed
adjacent to a portion of the quadrature suppression electrode such
that a length of resonator mass that is directly adjacent to the
quadrature suppression electrode varies as the resonator mass moves
relative to the quadrature suppression electrode, wherein the
quadrature suppression electrode is capable of producing a lateral
force on the resonator mass that varies based on the length of
resonator mass that is directly adjacent to the quadrature
suppression electrode.
2. A micromachined sensor according to claim 1, wherein the lateral
force is an electrostatic force.
3. A micromachined sensor according to claim 1, further comprising
a constant voltage applied to the quadrature suppression electrode,
wherein the lateral force is proportional to the length of
resonator mass that is directly adjacent to the quadrature
suppression electrode.
4. A micromachined sensor according to claim 1, further comprising
a varying voltage applied to the quadrature suppression electrode,
wherein the lateral force varies as a function of the length of
resonator mass that is directly adjacent to the quadrature
suppression electrode and the varying voltage.
5. A micromachined sensor according to claim 1, further comprising:
at least one drive electrode for causing movement of the resonator
mass substantially parallel to the quadrature suppression
electrode.
6. A micromachined sensor with quadrature suppression comprising: a
plurality of quadrature suppression electrodes; and a plurality of
resonator masses, each resonator mass positioned adjacent to a
respective one of the quadrature suppression electrodes and capable
of moving substantially parallel to its respective quadrature
suppression electrode, each resonator mass including a notch formed
adjacent to a portion of its respective quadrature suppression
electrode such that a length of resonator mass that is directly
adjacent to the quadrature suppression electrode varies as the
resonator mass moves relative to the quadrature suppression
electrode, wherein each quadrature suppression electrode is capable
of producing a lateral force on its respective resonator mass that
varies based on the length of resonator mass that is directly
adjacent to the quadrature suppression electrode.
7. A micromachined sensor according to claim 1, further comprising
a voltage applied to at least one of the plurality of quadrature
suppression electrodes determined to reduce quadrature of the
resonator masses.
8. A micromachined sensor according to claim 1, wherein the
resonator masses are mechanically coupled through a plurality of
levers, pivots, and flexures so as to produce substantially a
single resonance frequency for the plurality of resonator
masses.
9. A micromachined sensor according to claim 8, wherein the
plurality of resonator masses includes: a first pair of masses
mechanically coupled through a flexure; and a second pair of masses
mechanically coupled through a flexure, wherein the first pair of
masses and the second pair of masses resonate in anti-phase to one
another.
10. A micromachined sensor according to claim 1, wherein a
plurality of resonator masses are electrically coupled through
common drive and velocity sensing circuits such as to resonate at
substantially a single frequency.
11. A micromachined sensor with quadrature suppression comprising:
a substrate; a frame suspended above and substantially parallel to
the substrate by a first plurality of suspension flexures disposed
along an outer perimeter of the frame, the first plurality of
suspension flexures affixed to the substrate and formed so as to
substantially prevent translational movement of the frame relative
to the substrate within a plane of the frame and to permit
rotational movement of the frame about an axis perpendicular to the
frame and the substrate; a plurality of quadrature suppression
electrodes; and a plurality of resonator structures disposed within
an inner perimeter of the frame, the resonator structures operating
substantially within the plane of the frame, the resonator
structures including a plurality of resonator masses, each
resonator mass positioned adjacent to a respective one of the
quadrature suppression electrodes and capable of moving
substantially parallel to its respective quadrature suppression
electrode, each resonator mass including a notch formed adjacent to
a portion of its respective quadrature suppression electrode such
that a length of resonator mass that is directly adjacent to the
quadrature suppression electrode varies as the resonator mass moves
relative to the quadrature suppression electrode, wherein each
quadrature suppression electrode is capable of producing a lateral
force on its respective resonator mass that varies based on the
length of resonator mass that is directly adjacent to the
quadrature suppression electrode.
12. A micromachined sensor according to claim 11, wherein the
plurality of resonator structures is suspended solely from the
inner perimeter of the frame.
13. A micromachined sensor according to claim 11, wherein the
resonator masses are mechanically coupled through a plurality of
levers, pivots, and flexures so as to produce substantially a
single resonance frequency for the plurality of resonator
masses.
14. A micromachined sensor according to claim 13, wherein the
plurality of resonator masses includes: a first pair of masses
mechanically coupled through a flexure; and a second pair of masses
mechanically coupled through a flexure, wherein the first pair of
masses and the second pair of masses resonate in anti-phase to one
another.
15. A micromachined sensor according to claim 13, wherein each of
the levers includes a plurality of lever fingers interdigitated
with corresponding fingers affixed to the substrate for at least
one of driving the lever and sensing position of the lever.
16. A micromachined sensor according to claim 15, wherein each of
the levers moves with an arcuate motion, and wherein the lever
fingers are disposed at varying angles so as to maintain
substantially equal distances from said corresponding fixed fingers
during movement of the levers.
17. A micromachined sensor according to claim 11, further
comprising: a plurality of frame fingers disposed along the outer
perimeter of the frame, the frame fingers interdigitated with
corresponding sensing fingers affixed to the substrate for sensing
said rotational movement of the frame.
18. A micromachined sensor according to claim 17, wherein the frame
fingers are disposed at varying angles so as to maintain
substantially equal distances from said corresponding sensing
fingers during rotational movement of the frame.
19. A micromachined sensor according to claim 11, wherein each
resonator mass includes a plurality of drive fingers interdigitated
with a corresponding array of fixed drive fingers affixed to the
substrate.
20. A micromachined sensor according to claim 19, wherein each
array of fixed drive fingers is affixed to the substrate using a
plurality of anchors, and wherein the anchors for pairs of
anti-phase arrays of fixed drive fingers are arranged to be
co-linear in a lateral direction relative to the motion of the
mass.
21. A micromachined sensor according to claim 11, wherein the outer
perimeter of the frame is substantially square and includes a
plurality of frame fingers disposed along each side of the frame,
the frame fingers interdigitated with corresponding sensing fingers
affixed to the substrate for sensing said rotational movement of
the frame that is induced by Coriolis acceleration when the
resonator structures are resonating and the apparatus is rotated
about the axis.
22. A micromachined sensor according to claim 11, wherein a
plurality of resonator masses are electrically coupled through
common drive and velocity sensing circuits such as to resonate at
substantially a single frequency.
Description
PRIORITY
[0001] This application is a divisional of U.S. patent application
Ser. No. 10/360,987 filed Feb. 6, 2003, currently allowed, which
claims priority from U.S. Provisional Patent Application No.
60/354,610 filed Feb. 6, 2002 and U.S. Provisional Patent
Application No. 60/364,322 filed Mar. 14, 2002. The
above-referenced patent applications are hereby incorporated herein
by reference in their entireties.
FIELD OF THE INVENTION
[0002] The present invention relates generally to micromachined
sensors, and more particularly to micromachined sensors with
quadrature suppression.
SUMMARY OF THE INVENTION
[0003] In embodiments of the present invention, quadrature
suppression is provided by placing a resonator mass adjacent to a
quadrature suppression electrode. The resonator mass is capable of
moving substantially parallel to the quadrature suppression
electrode and includes a notch formed adjacent to a portion of the
quadrature suppression electrode such that a length of resonator
mass that is directly adjacent to the quadrature suppression
electrode varies as the resonator mass moves relative to the
quadrature suppression electrode. The quadrature suppression
electrode is capable of producing a lateral force on the resonator
mass that varies based on the length of resonator mass that is
directly adjacent to the quadrature suppression electrode. Such
quadrature suppression can be used in sensors having one or more
resonator masses.
[0004] In accordance with one aspect of the invention there is
provided a micromachined sensor including a quadrature suppression
electrode and a resonator mass positioned adjacent to the
quadrature suppression electrode. The resonator mass is capable of
moving substantially parallel to the quadrature suppression
electrode and includes a notch formed adjacent to a portion of the
quadrature suppression electrode such that a length of resonator
mass that is directly adjacent to the quadrature suppression
electrode varies as the resonator mass moves relative to the
quadrature suppression electrode. The quadrature suppression
electrode is capable of producing a lateral force on the resonator
mass that varies based on the length of resonator mass that is
directly adjacent to the quadrature suppression electrode. The
lateral force is typically an electrostatic force that is produced
by either a constant voltage or a varying voltage that is applied
to the quadrature suppression electrode.
[0005] In accordance with another aspect of the invention there is
provided a micromachined sensor including a plurality of quadrature
suppression electrodes and a plurality of resonator masses. Each
resonator mass is positioned adjacent to a respective one of the
quadrature suppression electrodes and is capable of moving
substantially parallel to its respective quadrature suppression
electrode. Each resonator mass includes a notch formed adjacent to
a portion of its respective quadrature suppression electrode such
that a length of resonator mass that is directly adjacent to the
quadrature suppression electrode varies as the resonator mass moves
relative to the quadrature suppression electrode. Each quadrature
suppression electrode is capable of producing a lateral force on
its respective resonator mass that varies based on the length of
resonator mass that is directly adjacent to the quadrature
suppression electrode. A voltage may be applied to one or more of
the quadrature suppression electrodes to reduce as determined to
reduce quadrature of the resonator masses.
[0006] In accordance with another aspect of the invention there is
provided a micromachined sensor including a substrate; a frame
suspended above and substantially parallel to the substrate by a
first plurality of suspension flexures disposed along an outer
perimeter of the frame, the first plurality of suspension flexures
affixed to the substrate and formed so as to substantially prevent
translational movement of the frame relative to the substrate
within a plane of the frame and to permit rotational movement of
the frame about an axis perpendicular to the frame and the
substrate; a plurality of quadrature suppression electrodes; and a
plurality of resonator structures disposed within an inner
perimeter of the frame and operating substantially within the plane
of the frame. The resonator structures include a plurality of
resonator masses. Each resonator mass is positioned adjacent to a
respective one of the quadrature suppression electrodes and is
capable of moving substantially parallel to its respective
quadrature suppression electrode. Each resonator mass includes a
notch formed adjacent to a portion of its respective quadrature
suppression electrode such that a length of resonator mass that is
directly adjacent to the quadrature suppression electrode varies as
the resonator mass moves relative to the quadrature suppression
electrode. Each quadrature suppression electrode is capable of
producing a lateral force on its respective resonator mass that
varies based on the length of resonator mass that is directly
adjacent to the quadrature suppression electrode.
BRIEF DESCRIPTION OF THE DRAWINGS
[0007] In the accompanying drawings:
[0008] FIG. 1 shows an exemplary micromachined gyroscope structure
in accordance with an embodiment of the present invention;
[0009] FIG. 2 identifies various components of the micromachined
gyroscope structure in accordance with an embodiment of the present
invention;
[0010] FIG. 3 shows a highlighted view of the frame of the
micromachined gyroscope structure in accordance with an embodiment
of the present invention;
[0011] FIG. 4 shows a highlighted view of a movable mass of the
micromachined gyroscope structure in accordance with an embodiment
of the present invention;
[0012] FIG. 5 shows a highlighted view of a lever of the
micromachined gyroscope structure in accordance with an embodiment
of the present invention;
[0013] FIG. 6 shows a detailed view of an accelerometer suspension
flexure in accordance with an embodiment of the present
invention;
[0014] FIG. 7 shows a detailed view of a movable mass and its
related flexures and pivot flexures in accordance with an
embodiment of the present invention;
[0015] FIG. 8 shows a detailed view of two levers and a fork and
their related pivot flexures and electrostatic driver in accordance
with an embodiment of the present invention;
[0016] FIG. 9 shows a representation of the motions of the various
resonating structures of the micromachined gyroscope structure in
accordance with an embodiment of the present invention;
[0017] FIG. 10 shows the coriolis detector switch-overs for the
double differential configuration in accordance with an embodiment
of the present invention;
[0018] FIG. 11 shows a detailed view of an electrostatic driver for
a movable mass in accordance with an embodiment of the present
invention;
[0019] FIG. 12 shows a detailed view of quadrature suppression
structures in accordance with an embodiment of the present
invention;
[0020] FIG. 13 shows an alternate frame suspension configuration in
accordance with an embodiment of the present invention; and
[0021] FIG. 14 shows a configuration for drive or sensing fingers
that are incorporated into a coupling level in which the fingers
are raked back at varying angles to accommodate the arcuate motion
of the coupling lever, in accordance with an embodiment of the
present invention.
DETAILED DESCRIPTION OF A PREFERRED EMBODIMENT
[0022] A micromachined gyroscope includes a resonator made to
oscillate with a velocity and an accelerometer means for measuring
the orthogonal Coriolis acceleration which results from the effect
of rotation on that velocity. The usual means of attaching these
structures to each other and to an underlying substrate is by
filaments of micromachined material that are often referred to as
"tethers" or "flexures."
[0023] Thus, a micromachined gyroscope makes use of Coriolis
acceleration to detect and measure rotation rate about an axis
normal to the surface of a substrate. Specifically, various
resonating structures are suspended within a frame. The resonating
structures include phase and anti-phase masses that are
mechanically coupled through levers, pivot flexures, and forks in
order to produce a single resonance frequency for the entire
resonating system. The mechanical system ensures that the motion of
the resonators is severely restricted to one linear axis with no
net rotation. Rotation of the micromachined gyroscope about the
plane produces a rotational force on the frame. The frame is
suspended in such a way that its motion is severely restricted in
all but the rotational direction. Sensors on all sides of the frame
detect the rotational deflection of the frame for measuring the
change in direction.
[0024] It has been recognized in the prior art of micromachined
gyroscopes that balanced (or symmetric) structures give
significantly better performance and that mechanically coupled
pairs of resonators are much to be desired. See, for examples, U.S.
Pat. Nos. 5,392,650 and 5,635,638. Mechanically coupling the
resonating structures has a number of advantages, including
increasing the motion of the resonating structures, increasing the
amount of Coriolis acceleration (signal) produced by the resonating
structures, avoids chaotic motion, prevents motion of the frame in
the same direction as the resonating structures, provides better
phase definition, provides better rejection of external
accelerations, and improves the quality factor Q because angular
momentum is canceled locally.
[0025] It has proven possible to make satisfactory gyroscopes if a
pair of resonators is coupled by electrical means only. An example
is described in "Single-Chip Surface Micromachined Integrated
Gyroscope" (IEEE JSSC vol. 37 No. 12 December 2002) and U.S. Pat.
No. 6,122,961. Manufacturing tolerances are such that two
mechanically separate resonators cannot be fabricated with
identical frequencies but if the "Q" factors are low enough their
resonance curves overlap sufficiently for the pair to function
smoothly as a single electrical oscillator.
[0026] If more such devices could be manufactured per silicon wafer
then the cost of each would be less, so there is an advantage in
making smaller structures. In order to obtain low noise and
adequate signal from smaller structures, it is necessary to design
their resonances with higher "Q" factors. Then, the resonance
curves may no longer overlap adequately, making the oscillation
lower in amplitude and ill defined in frequency. In extreme cases,
the motion becomes chaotic with very deleterious effects on low
frequency noise (i.e. short term output instability which prevents
accurate navigation, one of the primary uses of the gyroscope).
[0027] Certain embodiments of the present invention allow smaller
structures to be used by providing a very effective mechanical
coupling based on a "double fork" as described in U.S. Pat. No.
5,635,640 for rotating resonators. Co-linear resonator pairs cannot
be directly coupled in this way so a set of levers is used to
transform the coupled motion from co-linear to parallel motion. The
levers have pivots defined at the points of attachment to the
accelerometer frame and resonator mass. Each pivot point is defined
by the intersection of the axes of at least two orthogonal
flexures. This ensures that the attachment point cannot translate
with respect to the lever, only rotate. Translational compliance
would compromise suppression of unwanted motions, as described
later. Netzer displays a similar idea in FIGS. 8 through 11 of U.S.
Pat. No. 5,763,781. However, none of those structures will work in
a practical micromachined gyroscope of the type described in this
disclosure because, first, the pivots are defined by single
flexures allowing unacceptable orthogonal motions, second, the same
defect of design allows too much compliance to in-phase motion of
the coupled masses and, third, they allow no stress stiffening
relief, the provision of which is essential, as also described
later.
[0028] It is also known to be very advantageous to suppress the
so-called "quadrature" signals which arise from the resonator and
accelerometer axes being imperfectly orthogonal. The suppression
means may be electrical, as described by Howe et al in U.S. Pat.
Nos. 6,067,858 and 6,250,156, or mechanical as described by Geen in
U.S. Pat. No. 6,122,961. The latter uses separate resonator and
accelerometer frames together with a system of levers and flexures
to inhibit unwanted motions and is very effective in practice.
However, that configuration is topologically incompatible with
direct mechanical coupling of the resonators. First, half the
accelerometer fingers, those in between the resonators, would be
lost, reducing the signal substantially. Second, the linear
Coriolis forces from the resonator pair would cancel in an
accelerometer frame attached to them both.
[0029] Certain embodiments of the present invention permit the
mechanical coupling of resonators without loss of accelerometer
signal from a separate, quadrature-suppressed frame. This is
accomplished by recognizing that the coupled antiphase resonator
masses produce a Coriolis torque proportional to the separation of
their centers of mass even though the linear Coriolis forces
cancel. Thus, a surrounding accelerometer frame can be adapted to
detect rotational rather than linear motion. Then, mechanical
quadrature suppression becomes a matter of inhibiting any net
rotational motion of the co-linear resonator pair and preventing
linear motions of the accelerometer. Also, all four sides of a
rectangular accelerometer frame move when it rotates so that all
may be lined with fingers to detect that motion, thereby restoring
the total sensitivity to that of two linear accelerometers but in
half the total area compared with the prior art of U.S. Pat. No.
6,122,961.
[0030] Another problem encountered is that for a large Coriolis
signal the resonators should have a large travel. The primary
flexures of the resonator will "stress stiffen" in these
circumstances. That is, they have to reach further when deflected
and the resulting stretching causes longitudinal tension in the
flexure with a marked increase in lateral stiffness. The relative
increase in stiffness is well known to vary as the square of the
ratio of the lateral deflection to the width of the tether. Thus, a
typical 1.7 micrometer wide tether deflecting by 10 micrometers
would stiffen by a factor of 36 which would give unacceptable
non-linearity, require much more drive force and make the resonant
frequency ill-defined by a large factor. This longitudinal stress
can be relieved by simple transverse flexures, as in U.S. Pat. No.
5,392,650, but this allows overall resonator motion in the tether
longitudinal direction and prevents mechanical quadrature
suppression.
[0031] Certain embodiments of the present invention provide a means
of relieving the longitudinal tension in the tethers without taking
the space for extra levers as were used in the prior art of U.S.
Pat. No. 6,122,961. This is achieved by using the resonator masses
themselves, including the drive mechanism, as stress reduction
levers. The elimination of the extra, tether-suspended levers not
only saves area, but also enhances the overall out-of-plane
stiffness of the gyroscope. This makes the device more rugged and
suitable for use in vehicle locations experiencing large shocks or
vibration, such as in the engine compartment of a car.
[0032] In certain embodiments of the invention, a resonator mass is
modified to relieve tension by splitting it and rejoining with a
very short flexure. This allows the mass to pivot slightly about
the flexure such that diagonally opposite corners can then
simultaneously accommodate the shortening of the projected lengths
of both the primary resonator flexure and the coupling lever. The
distances from the pivot to the flexure and lever must be in the
correct proportion to effectively relieve both so the positioning
of the short flexure is critical, but this not a difficult
calculation in geometry.
[0033] In an exemplary embodiment of the present invention, the
micromachined gyroscope includes two phase masses and two
anti-phase masses that are mechanically coupled through levers,
pivot flexures, and forks. Ideally, this provides a single
resonance frequency. The single resonance frequency provides a
higher Q factor, and therefore more signal. The configuration of
the coupling reduces extraneous forces on the frame (such as
translational and rotational forces caused by unbalanced motion of
the resonating structures) that can be misread as Coriolis
accelerations.
[0034] Certain embodiments of the present invention incorporate
drive or sensing fingers into the coupling levers in order to save
area. The effectiveness of the resonator mass in producing Coriolis
torque from its velocity is proportional to its distance from the
center line. Consequently, it is desirable that resonator drive
apparatus, or velocity sensing apparatus for the purpose of
completing an electromechanical oscillator, should be placed as
close to the center line as possible. This most effectively
utilizes the available area. Removing part of the apparatus from
the mass to the coupling lever is, therefore, particularly
advantageous.
[0035] Because the lever moves in an arc, interdigitated fingers
placed on it mesh at different angles along its length, depending
on the radius from the pivot point of the lever. Therefore, in
order to prevent the moving fingers from excessive lateral motion
with respect to a fixed, interdigitated comb, the fingers may be
raked back at varying angles as dictated by the geometry of the
lever. This is shown in FIG. 14.
[0036] A similar issue exists with the accelerometer frame and the
sensing fingers placed around its periphery, since the
accelerometer frame is adapted to rotate. Therefore, the sensing
finger could likewise be raked back at varying angles. However, the
rotation of the accelerometer frame is typically much less than the
rotation of the levers (perhaps {fraction (1/100,000)}.sup.th), so
such raking is typically not used for the sensing fingers.
[0037] Certain embodiments of the present invention allow the
quadrature signal to be finely trimmed to near null. Despite the
suppression of quadrature by the configuration of the suspension
flexures and levers, there is a residual quadrature element from
distortion of the accelerometer frame by the reaction forces of the
resonator suspended from it. It is desirable to keep this frame as
light as possible both to save space and to maximize its response
to Coriolis forces. Unfortunately, a light frame distorts more, so
there is a compromise in design which allows some residual
quadrature. This can be trimmed to near zero using a general
principle described by Clark in U.S. Pat. No. 5,992,233 which uses
an array of fingers arranged in groups of 3 at different voltages
so as to provide a lateral force which varies with the meshing of
the fingers. Embodiments of the present invention instead use a
notch cut from the edge of the resonator mass. This has the
advantage of consuming less space than the finger array and lending
itself to being accommodated in otherwise unusable areas.
[0038] The drive fingers work longitudinally using interdigitated
combs, some moving, and some attached to the substrate. The
principle is that described by Tang and Howe in U.S. Pat. No.
5,025,346. One of the most troublesome side effects of using
longitudinal electrostatic comb drives for gyroscopes is that small
imbalances of the gaps between the fingers induce lateral motion as
well as the desired longitudinal component. This motion has a
component with the unfortunate property of being in-phase with the
Coriolis signal so that, unlike the much larger quadrature signal,
it cannot be rejected by a phase sensitive rectifier. Any
instability of this in-phase signal becomes directly a gyroscope
error. One of the most significant ways in which the gaps can
become imbalanced is by relative motion of the substrate anchor
points of the fixed fingers and the moving structure. Another is
the displacement of the moving structure from external
accelerations. Fortunately, most of these can be made to cancel by
careful attention to the symmetries of the structure and the drive
apparatus. However, surface shear distortion of the substrate is
particularly difficult to accommodate in this way. It is easily
caused by variations in package stress induced during use and
produces both a relative displacement of arrays of fixed fingers
and a rotation of the individual finger anchors.
[0039] In certain embodiments of the present invention, the anchors
for pairs of antiphase arrays of fixed drive fingers are arranged
to be co-linear in the lateral direction. In this way, any surface
shear of the substrate will not cause them to move laterally with
respect to each other. Also, the anchors are typically laid down in
pairs joined to each other at the top ends, remote from the
substrate, so that the tops resist the individual twisting at the
substrate end. Furthermore, the finger busbars are typically
attached to the top ends by flexible, folded fingers. These provide
isolation of the busbar from any distortion transmitted by the
anchor pairs and from displacement by shrinkage stresses in the
micromachined material. They also serve as drivers thereby
minimizing the loss of drive from the isolation measures. The
finger attachment means provide about an order of magnitude
improvement in the gyroscope performance.
[0040] FIG. 1 shows an exemplary micromachined gyroscope structure
100 in accordance with an embodiment of the present invention.
Micromachined gyroscope structure 100 is typically one of many
micromachined from a single silicon wafer. The micromachined
gyroscope structure 100 is typically mounted to a substrate. The
micromachined gyroscope structure 100 is substantially symmetrical
top-to-bottom along the x axis as well as side-to-side along the y
axis.
[0041] FIG. 2 identifies various components of the micromachined
gyroscope structure 100. Among other things, the micromachined
gyroscope structure 100 includes a substantially square frame 210
that is suspended at its four corners by accelerometer suspension
flexures 202, 204, 206, and 208. FIG. 3 shows the frame 210
highlighted. On the outside four edges of the frame 210 are fingers
212, 213, 214, 215, 216, 217, 218, and 219. Various resonating
structures are suspended within the frame 210. These resonating
structures include four movable masses 220, 222, 224, and 226, four
levers 228, 230, 232, and 234, and two forks 236 and 238. FIG. 4
shows the mass 220 highlighted. It should be noted that the masses
222, 224, and 226 are substantially the same shape, size, and mass
as the mass 220, and are oriented as mirror images of the mass 220
along the x and/or y axes. FIG. 5 shows the lever 228 highlighted.
It should be noted that the levers 230, 232, and 234 are
substantially the same shape, size, and mass as the lever 228, and
are oriented as mirror images of the lever 228 along the x and/or y
axes. The four movable masses 220, 222, 224, and 226 are suspended
from the frame 210 by flexures 240, 242, 244, and 246,
respectively. Movement of the four movable masses 220, 222, 224,
and 226 is controlled electrostatically using electrostatic drivers
248, 250, 252, 254, 256, 258, 260, and 262. These and other
features of the micromachined gyroscope structure 100 are described
in more detail below.
[0042] The four accelerometer suspension flexures 202, 204, 206,
and 208 help to control movement of the frame 210 relative to the
substrate. The four accelerometer suspension flexures 202, 204,
206, and 208 substantially restrict movement of the frame 210 along
the x axis and along the y axis (i.e., translational movement), but
allow the frame 210 to rotate more freely in either direction
(i.e., rotational movement). Such rotational movement of the frame
110 is caused mainly from the coriolis effect due to movement of
the frame of reference of the resonating structures.
[0043] FIG. 6 shows the accelerometer suspension flexure 202 in
greater detail.
[0044] The accelerometer suspension flexure 202 is anchored to the
substrate at locations 630 and 640. The accelerometer suspension
flexure 202 substantially restricts translational movement of the
frame 210, but allows for rotational movement of the frame 210. The
structures 650 and 660 are etch equalizers that are used to ensure
accurate formation of the other flexure structures. This principle
is taught in U.S. Pat. No. 6,282,960. It should be noted that the
accelerometer suspension flexures 204, 206, and 208 are
substantially the same as the accelerometer suspension flexure
202.
[0045] The fingers 212, 213, 214, 215, 216, 217, 218, and 219
extend from the four sides of the frame 210. Positioned between the
fingers 212, 213, 214, 215, 216, 217, 20 218, and 219 are two sets
of coriolis detectors.
[0046] FIG. 6 shows the relationship between a finger 212 and two
coriolis detectors 610 and 620.
[0047] The two sets of coriolis detectors 610 and 620 are
mechanically coupled to the substrate and do not move relative to
the substrate. Movement of the frame 210 results in movement of the
fingers 212, 213, 214, 215, 216, 217, 218, and 219 relative to the
coriolis detectors, as described below. Movement of the fingers
212, 213, 214, 215, 216, 217, 218, and 219 relative to the coriolis
detectors produces a change in capacitance that can be measured by
electronic circuitry (not shown). This can be done in a variety of
ways.
[0048] The two sets of coriolis detectors 610 and 620 are coupled
through four switch-overs 1010, 1020, 1030, and 1040 in a double
differential fashion, as shown in FIG. 10. The switch-overs 1010,
1020, 1030, and 1040 substantially cancel signals induced
electrically from surrounding circuits and signals produced by
translational movement of the frame 210 but substantially amplify
signals produced by rotational movement of the frame 210.
Specifically, when there is translational movement of the frame
210, approximately half of the coriolis detectors produce a signal
and the other half produce a substantially equal and opposite
signal, resulting in a net signal of zero. Thus, translational
movements of the frame 210 are substantially canceled out
electronically. When there is rotational movement of the frame 210,
however, all coriolis detectors produce complementary signals that,
when combined and amplified, represents the magnitude of the
rotational movement. By placing fingers and coriolis detectors on
all sides of the frame 210, a larger signal is produced as opposed
to a solution in which fingers and coriolis detectors are placed on
only two sides of the frame 210.
[0049] The resonating structures, including the masses 220, 222,
224, and 226, the flexures 240, 242, 244, and 246, the levers 228,
230, 232, and 234, and the forks 236 and 238, are mechanically
coupled. With reference again to FIG. 2, the masses 220 and 222 are
mechanically coupled via a pivot flexure 264, and the masses 224
and 226 are mechanically coupled via a pivot flexure 266. The
masses 220 and 224 are mechanically coupled via the levers 228 and
230 and the fork 236, and the masses 222 and 226 are mechanically
coupled via the levers 232 and 234 and the fork 238. The pivot
flexures 264 and 266, the levers 228, 230, 232, and 234, and the
forks 236 and 238 allow the masses 220, 222, 224, and 226 to move
together.
[0050] The mass 220 is suspended from the frame 210 by the flexure
240, from the mass 222 by the pivot flexure 264, and from the lever
228 by the pivot flexure 268. The mass 222 is suspended from the
frame 210 by the flexure 242, from the mass 220 by the pivot
flexure 264, and from the lever 232 by the pivot flexure 272. The
mass 224 is suspended from the frame 210 by the flexure 244, from
the mass 226 by the pivot flexure 266, and from the lever 230 by
the pivot flexure 276. The mass 226 is suspended from the frame 210
by the flexure 246, from the mass 224 by the pivot flexure 266, and
from the lever 234 by the pivot flexure 280.
[0051] The lever 228 is suspended from the frame 210 by the pivot
flexure 270, from the mass 220 by the pivot flexure 268, and from
the lever 230 by the fork 236. The lever 230 is suspended from the
frame 210 by the pivot flexure 278, from the mass 224 by the pivot
flexure 276, and from the lever 228 by the fork 236. The lever 232
is suspended from the frame 210 by the pivot flexure 274, from the
mass 222 by the pivot flexure 272, and from the lever 234 by the
fork 238. The lever 234 is suspended from the frame 210 by the
pivot flexure 282, from the mass 226 by the pivot flexure 280, and
from the lever 232 by the fork 238.
[0052] FIG. 7 shows the mass 220 and related components in greater
detail. The mass 220 is suspended from the frame 210 by the flexure
240, from the mass 222 by the pivot flexure 264, and from the lever
228 by a pivot flexure 268. The flexure 240 is preferably formed
from three parallel etches, where the center etch is unbroken and
the outer etches are broken in two places. The outer etches are
etch equalizers that are used to ensure accurate formation of the
center etch. It should be noted that the masses 222, 224, and 226
and their related components are substantially the same as the mass
220 and its related components.
[0053] FIG. 8 shows the levers 228 and 230 and their related
components in greater detail. The lever 228 is suspended from the
frame 210 by the pivot flexure 270, from the mass 220 by the pivot
flexure 268, and from the fork 236 by the pivot flexure 820. The
lever 230 is suspended from the frame 210 by the pivot flexure 278,
from the mass 224 by the pivot flexure 276, and from the fork 236
by the pivot flexure 830. The fork 236 is suspended from the lever
228 by the pivot flexure 820 and from the level 230 by the pivot
flexure 830. It should be noted that the levers 232 and 234 and
their related components are substantially the same as the levers
228 and 230 and their related components.
[0054] The flexures 240, 242, 244, and 246 substantially restrict
movement of the masses 220, 222, 224, and 226 respectively along
the y axis, but allow movement of the masses 220, 222, 224, and 226
respectively along the x axis. The flexures 240, 242, 244, and 246
also allow the masses 220, 222, 224, and 226 respectively to pivot
slightly as they move.
[0055] The pivot flexure 264 essentially locks the masses 220 and
222 together so that they move together. Likewise, the pivot
flexure 266 essentially locks the masses 224 and 226 together so
that they move together (although oppositely to the masses 220 and
222).
[0056] The levers 228 and 230, the fork 236, and the pivot flexures
268, 270, 820, 830, 276, and 278 essentially lock the masses 220
and 224 together so that they move in substantially equal but
opposite directions. The levers 232 and 234, the fork 238, the
pivot flexures 272, 274, 280, and 282, and the pivot flexures
coupling the levers 232 and 234 to the fork 238 (not shown)
essentially lock the masses 222 and 226 together so that they move
in substantially equal but opposite directions.
[0057] The levers 228 and 230 essentially translate the
substantially equal but opposite side-to-side motion of the masses
220 and 224 into a substantially linear motion of the fork 236
along the y axis. Specifically, the side-to-side motion of the mass
220 is transferred to the lever 228 through the pivot flexure 268,
while the side-to-side motion of the mass 224 is transferred to the
lever 230 through the pivot flexure 276. The levers 228 and 230
pivot at pivot flexures 270 and 278, respectively, and at pivot
flexures 820 and 830, respectively, to cause the linear motion of
the fork 236 along the y axis. These transfers cause the masses 220
and 224 to pivot slightly as they move side-to-side. Specifically,
the mass 220 pivots slightly toward the mass 222 when moving to the
left and slightly away from the mass 222 when moving to the right,
while the mass 224 pivots slightly toward the mass 226 when moving
to the right and slightly away from the mass 226 when moving to the
left.
[0058] Likewise, the levers 232 and 234 essentially translate the
substantially equal but opposite side-to-side motion of the masses
222 and 226 into a substantially linear motion of the fork 238
along the y axis. Specifically, the side-to-side motion of the mass
222 is transferred to the lever 232 through the pivot flexure 272,
while the side-to-side motion of the mass 226 is transferred to the
lever 234 through the pivot flexure 280. The levers 232 and 234
pivot at pivot flexures 274 and 282, respectively, and at the pivot
flexures coupling the levers 232 and 234 to the fork 238 (not
shown), respectively, to cause the linear motion of the fork 238
along the y axis. These transfers cause the masses 222 and 226 to
pivot slightly as they move side-to-side. Specifically, the mass
222 pivots slightly toward the mass 220 when moving to the left and
slightly away from the mass 220 when moving to the right, while the
mass 226 pivots slightly toward the mass 224 when moving to the
right and slightly away from the mass 224 when moving to the
left.
[0059] It should be noted that the symmetry of the resonator
together with the precision of the antiphase motion causes the
angular momenta from the pivoting motions to cancel and not induce
rotation of the accelerometer frame.
[0060] FIG. 9 shows the relative movement of the masses 220, 222,
224, and 226 and the forks 236 and 238. It should be noted that, in
actuality, these and other resonator structures move extremely
small distances, and the arrows are greatly exaggerated to show
that the masses 220, 222, 224, and 226 move side-to-side and
pivot.
[0061] As discussed above, the masses are moved and controlled
electrostatically using electrostatic drivers. FIG. 11 shows a
detailed view of an electrostatic driver, and, in particular, the
electrostatic driver 250 for mass 220. The electrostatic driver 250
is micromachined so as to form a cavity within the mass 220 that
includes two sets of drive fingers 1110 and 1120 that are integral
to the mass 220 and two sets of electrode fingers 1130 and 1140
that are disposed within the cavity and are coupled to the
substrate. The electrode fingers 1140 fit around and between the
drive fingers 1110, and the electrode fingers 1130 fit around and
between the drive fingers 1120. When a voltage is applied to the
electrode fingers 1140, the drive fingers 1110 are pulled toward
the electrode fingers 1140, generating a force on the mass 220
toward the right. When a voltage is applied to the electrode
fingers 1130, the drive fingers 1120 are pulled toward the
electrode fingers 1130, generating a force on the mass 220 toward
the left. Applying voltages alternately to the electrode fingers
1130 and to the electrode fingers 1140 causes the mass to move back
and forth. The two sets of electrode fingers 1130 and 1140 are
preferably anchored to the substrate linearly in order to reduce
torque produced by surface shear of the substrate that can produce
torque on the mass 220. It should be noted that the electrostatic
drivers 248, 252, 254, 256, 258, 260, and 262 are substantially the
same as the electrostatic driver 250.
[0062] It should be noted that the electrostatic drivers 248, 252,
254, 256, 258, 260, and 262 are positioned close to the middle of
the micromachined gyroscope structure 100 so that most of the mass
is away from the center. This increases the sensitivity of the
micromachined gyroscope structure 100 to Coriolis
accelerations.
[0063] There is also an electrostatic driver for the levers 228,
230, 232, and 234. FIG. 8 shows a portion of the electrostatic
driver 810 for the levers 228, 230, 232, and 234. The electrostatic
driver 810 is micromachined so as to form a drive fingers on each
lever and a set of electrode fingers that are coupled to the
substrate. The electrode fingers fit around and between the drive
fingers. When a voltage is applied to the electrode fingers, the
drive fingers are pulled toward the electrode fingers, generating a
force on each lever toward the electrode fingers. The electrostatic
driver 810 is used to reinforce the movement of the resonating
structures. An alternative use for these is to sense the velocity
of the resonator. That velocity signal can be used to close an
electromechanical oscillator loop which will excite the
resonance.
[0064] It should be noted that the resonating structures are
preferably driven at or near their natural resonance frequency in
order to enhance the range of motion of the resonating structures.
This in turn increases the sensitivity of the gyroscope.
[0065] It should be noted that, in theory, the various gyroscope
structures are perfectly balanced so that they move with
substantially the same frequency and phase. In practice, however,
the various gyroscope structures are not perfectly balanced. For
example, the masses 220, 222, 224, and 226 are theoretically
identical (albeit mirror images in the x and/or y axes), but
typically are not identical due at least in part to variations in
the material and processes used to form the masses. Similar
imbalances can occur in other gyroscope structures, such as the
various levers, pivots, and flexures. These imbalances can manifest
themselves in out-of-phase lateral movements of the masses
(referred hereinafter to as "quadrature"), and can vary from device
to device. The mechanical stifffnesses of the structures
substantially suppresses these motions, but there is some residual
quadrature.
[0066] Therefore, electrical quadrature suppression structures are
typically used to reduce the amount of quadrature. The general
principle was taught by Clark in U.S. Pat. No. 5,992,233. In an
embodiment of the present invention, a quadrature suppression
structure typically includes at least one electrode located
proximately to a portion of a mass along the direction of motion of
the mass. When a voltage is applied to the electrode, a resulting
electrostatic force produces a lateral force that attracts the mass
toward the electrode. A single electrode is typically associated
with each mass, although not all electrodes are typically
activated. Rather, the quadrature behavior of a particular device
is typically characterized to determine which (if any) electrodes
to activate to reduce the quadrature.
[0067] Because the amount of quadrature varies with the movement of
the mass, it is preferable for the lateral force applied by the
electrode to likewise vary with the movement of the mass.
[0068] One way to vary the lateral force applied to the mass by the
electrode is to vary the voltage applied to the electrode based
upon the position of the mass. Specifically, the voltage would be
increased as the mass moves outward toward the frame and would be
decreased as the mass moves inward away from the frame. Such a
solution would be very difficult in practice.
[0069] Another way to vary the lateral force applied to the mass by
the electrode is to vary the amount of the mass that is adjacent to
the electrode based upon the position of the mass. FIG. 12 shows a
detailed view of a quadrature suppression structure 1200 in
accordance with an embodiment of the present invention. Two
electrodes 1210 and 1220 are placed between two adjacent masses 220
and 222, specifically in a cavity formed in and by the two masses
220 and 222. The electrode 1210 is adjacent to the mass 220, and is
capable of applying a lateral force on the mass 220 in the downward
direction. The electrode 1220 is adjacent to the mass 222, and is
capable of applying a lateral force on the mass 222 in the upward
direction. In order to vary the amount of lateral force applied by
an electrode, a notch is formed in each mass. The notch is formed
adjacent to a portion of the electrode toward the end of the
electrode closer to the frame. As the mass moves outward toward the
frame, the length of mass that is directly adjacent to the
electrode increases, resulting in a larger lateral force applied to
the mass. As the mass moves inward away from the frame, the length
of mass that is directly adjacent to the electrode decreases,
resulting in a smaller lateral force applied to the mass.
[0070] In a typical embodiment of the present invention, a voltage
is applied to one but not both of the electrodes 1210 and 1220. The
electrode to which a voltage is applied is typically selected by
characterizing the quadrature and determining the electrode (if
any) that most decreases the quadrature.
[0071] It should be noted that a similar quadrature suppression
structure is formed between the masses 224 and 226. In order to
cancel out static forces, it is common to activate one electrode
between the masses 220 and 222 and one electrode between the masses
224 and 226.
[0072] It should be noted that the position of the quadrature
suppression electrodes is not limited to a cavity at the juncture
between two masses. The electrodes can be placed in other
positions. The positions of the various electrodes should be
balanced. The electrodes generally produce a certain amount of
torque on the mass, and the amount of torque depends at least to
some degree on the position of the electrode. A small amount of
torque is generally not a problem.
[0073] In a typical embodiment of the invention, a constant voltage
is applied to the electrode. This generally produces good results.
Alternatively, the voltage applied to the electrode can be varied.
When done properly, this can result in improved quadrature
suppression, but at the cost of increased complexity.
[0074] Although FIGS. 1 and 2 show the accelerometer suspension
flexures 202, 204, 206, and 208 positioned at the four corners of
the frame, it should be noted that the present invention is not
limited to such positioning of accelerometer suspension flexures.
Rather, accelerometer suspension flexures can be positioned at
various points along the frame. The accelerometer suspension
flexures preferably restrict translational movement of the frame
while allowing rotational movement of the frame about the center of
mass. This can be accomplished by positioning the accelerometer
suspension flexures such that the linear axis between each pair of
opposing accelerometer suspension flexures passes through the
gyroscope's effective center of mass.
[0075] Various aspects of the present invention are described in
greater detail in attachment pages A-1 through A-9 of the
provisional applications incorporated by reference above.
[0076] In an alternate embodiment of the present invention, the
accelerometer suspension flexures are placed at the middle of the
four sides of the frame rather than at the four corners of the
frame. FIG. 13 shows an alternate frame suspension configuration in
accordance with an embodiment of the present invention. In this
embodiment, four accelerometer suspension flexures 1304, 1306,
1308, and 1310 are placed at the middle of the four sides of the
frame 1302. There are certain production advantages to such a
placement of the accelerometer suspension flexures. Specifically,
certain etching equipment produces etches based upon a rectilinear
grid, so it is easier to produce features that are aligned with the
grid (as the side-positioned flexures would be) compared to
features that are set at an angle to the grid (as the
corner-positioned flexures would be). The corner-positioned
flexures are also not particularly space efficient.
[0077] The gyroscope is typically produced by depositing an oxide
layer (approximately 2 .mu.m thick) on top of a substrate
(approximately 600 um thick), using photolithography on the oxide
layer to produce holes at desired locations (and particularly at
locations where the micromachined gyroscope structure 100 is to be
coupled to the substrate), depositing a polysilicon layer
(approximately 4 um thick) over the oxide layer which forms a thin
film that bonds to the substrate through the holes in the oxide,
using photolithography on the polysilicon layer to produce the
complex structures of the micromachined gyroscope structure 100,
and removing the oxide layer using hydrofluoric acid. Thus, the
resulting micromachined gryoscope structure 100 is suspended
approximately 2 um above the substrate. It should be noted from the
various drawings that the micromachined gyroscope structure 100 has
a large number of holes, particularly in the masses 220, 222, 224,
and 226, the levers 228, 230, 232, and 234, and the frame 210.
These holes are formed in the micromachined gyroscope structure 100
in order to allow the hydrofluoric acid to flow sufficiently
through to the oxide layer. If such a micromachined gyroscope
structure 100 was placed in a vacuum, the micromachined gyroscope
structure 100 would typically be extremely fragile and would
typically have a high resonance frequency that tends to ring. By
operating the micromachined gyroscope structure 100 in air, the air
cushions the micromachined gyroscope structure 100 and reduces
ringing.
[0078] It should be noted that a micromachined gyroscope of the
present invention typically operates in air rather than a vacuum.
Operation in air has a number of advantages and disadvantages. On
one hand, air tends to impede the motion of moving components due
to viscous damping resulting in smaller output signals, tends to
give a phase shift that spoils synchronous rectification, and tends
to cause noise due to the impact of air molecules (brownian motion)
resulting in reduced signal-to-noise ratio. On the other hand,
however, operation in air enables the micromachined gyroscope to be
a thin film structure, provides air cushioning that makes the thin
film structure rugged, and eliminates the need for hermetic sealing
of the gyroscope package resulting in a lower overall cost of the
final product.
[0079] The present invention may be embodied in other specific
forms without departing from the true scope of the invention. The
described embodiments are to be considered in all respects only as
illustrative and not restrictive.
[0080] Thus, the present invention is in no way limited to such
things as the shape and size of the frame, the shape and size of
the resonating structures (including masses, levers, forks,
flexures, and pivot flexures), the number of movable masses, the
manner in which the resonating structures are mechanically coupled,
the number of fingers used for detecting Coriolis accelerations,
the manner in which the coriolis detectors are electrically
coupled, the manner in which the resonating structures are driven,
and the materials and manner in which the gyroscope is produced,
among other things.
* * * * *