U.S. patent application number 10/792813 was filed with the patent office on 2005-05-19 for photosensitive material for non-substrate liquid crystal display.
This patent application is currently assigned to Industrial Technology Research Institute. Invention is credited to Chang, Yih-Her, Chuang, Wen-Ping, Lee, Juh-Shyong, Sheen, Yuung-Ching, Wei, Su-Mei.
Application Number | 20050106496 10/792813 |
Document ID | / |
Family ID | 34568642 |
Filed Date | 2005-05-19 |
United States Patent
Application |
20050106496 |
Kind Code |
A1 |
Sheen, Yuung-Ching ; et
al. |
May 19, 2005 |
Photosensitive material for non-substrate liquid crystal
display
Abstract
The present invention provides a photosensitive material for
non-substrate liquid crystal display. This photosensitive material
includes photo-initiator selected from the free-radical type or
cation type photo-initiator or mixture thereof, photosensitive
polymerizable monomers or oligomers selected from the group
consisting of double-bond compounds, compounds having epoxy
functional group and mixtures thereof, and modifier selected from
the group consisting of long-alkyl-chain functional group,
silicone-alkyl compounds, double-bond compounds and mixtures
thereof. The photosensitive material can surround liquid crystal
display cell and separate from assisting substrates that a
non-substrate liquid crystal cell surrounded by photosensitive
material is acquired.
Inventors: |
Sheen, Yuung-Ching; (Hsinchu
County, TW) ; Lee, Juh-Shyong; (Hsinchu City, TW)
; Chuang, Wen-Ping; (Taipei County, TW) ; Chang,
Yih-Her; (Hsinchu County, TW) ; Wei, Su-Mei;
(Hsinchu City, TW) |
Correspondence
Address: |
BACON & THOMAS, PLLC
625 SLATERS LANE
FOURTH FLOOR
ALEXANDRIA
VA
22314
|
Assignee: |
Industrial Technology Research
Institute
Hsin Chu
TW
|
Family ID: |
34568642 |
Appl. No.: |
10/792813 |
Filed: |
March 5, 2004 |
Current U.S.
Class: |
430/270.1 |
Current CPC
Class: |
G03F 7/029 20130101;
C09K 2323/059 20200801; C09K 2323/053 20200801; G02F 1/1341
20130101; C09K 2323/00 20200801; Y10T 156/11 20150115; Y10T 428/10
20150115; G03F 7/0007 20130101; B29C 63/0056 20130101; G02F
1/133377 20130101; G03F 7/038 20130101; Y10T 428/1068 20150115;
Y10T 428/249987 20150401; Y10T 428/1082 20150115 |
Class at
Publication: |
430/270.1 |
International
Class: |
G03C 001/76 |
Foreign Application Data
Date |
Code |
Application Number |
Nov 18, 2003 |
TW |
92132258 |
Claims
What is claimed is:
1. A photosensitive material for non-substrate liquid crystal
display having a composition comprising: photo-initiator selected
from the group consisting of diethoxy acetophenone, benzophenone,
benzyl benzoin isobutyl ether, benzyl dimethyl ketal,
1-hydroxycyclohexyl phenyl ketone, diethyl thioxanthone, 2-ethyl
anthraquinone, 2-hydroxy-2-methyl-1-phenylp- ropane-1-one,
1-(4-isopropylphenyl)-2-hydroxy-2-methylpropane-1-one),
(2-methyl-[4-(methylthio)phenyl]2-morpholino-1-propane), aromatic
diazonium salts, triallysulfonium salts, diallyiodonium salts,
triallylselenium salts of Lewis acid as well as metallocene
compounds and mixtures thereof; photosensitive polymerizable
monomers or oligomers selected from the group consisting of
double-bond compounds, compounds having epoxy functional group and
mixtures thereof; and modifier selected from the group consisting
of long-alkyl-chain functional group, silicone-alkyl compounds,
double-bond compounds and mixtures thereof; wherein said
photosensitive material can surround the liquid crystal display
cell after polymerization and curing that a non-substrate liquid
crystal display cell surrounded by photosensitive material is
acquired.
2. The photosensitive material for non-substrate liquid crystal
display according to claim 1, wherein said photo-initiator
comprises 2,2-diethoxyacetophenone or benzophenone.
3. The photosensitive material for non-substrate liquid crystal
display according to claim 1, wherein said photosensitive
polymerizable monomer comprises polyurethane type acrylate, acrylic
monomer, epoxy compound, urethane acrylates, acrylic acrylates,
epoxy acrylates, polyester acrylates
4. The photosensitive material for non-substrate liquid crystal
display according to claim 1, wherein said modifier comprises
siloxane, fluorinated ether or alcohol.
5. The photosensitive material for non-substrate liquid crystal
display according to claim 1, wherein the mixing ratio of
photo-initiator, photosensitive polymerizable monomers or
oligomers, and modifier is 0.1-15 wt % photo-initiator, 10-99 wt %
photosensitive polymerizable monomers or oligomers, and 0-5 wt %
modifier.
6. The photosensitive material for non-substrate liquid crystal
display according to claim 5, wherein the mixing ratio of
photo-initiator, photosensitive polymerizable monomers or
oligomers, and modifier by weight is 2:96:2.
7. The photosensitive material for non-substrate liquid crystal
display according to claim 1, wherein said photosensitive material
is polymerized and cured under the irradiation of 350-380 nm
ultraviolet light or high-pressure mercury lamp.
8. The photosensitive material for non-substrate liquid crystal
display according to claim 7, wherein said photosensitive material
is polymerized and cured with 365 nm ultraviolet light.
9. The photosensitive material for non-substrate liquid crystal
display according to claim 1, wherein said photosensitive material
is further mixed with liquid crystal material.
10. The photosensitive material for non-substrate liquid crystal
display according to claim 1, wherein said photosensitive material
is further mixed with nanometer particles.
11. A photosensitive material for non-substrate liquid crystal
display having a composition comprising: 0.1-15 wt %
photo-initiator selected from the group consisting of diethoxy
acetophenone, benzophenone, benzyl benzoin isobutyl ether, benzyl
dimethyl ketal, 1-hydroxycyclohexyl phenyl ketone, diethyl
thioxanthone, 2-ethyl anthraquinone,
2-hydroxy-2-methyl-1-phenylpropane-1-one,
1-(4-isopropylphenyl)-2-hydroxy- -2-methylpropane-1-one),
(2-methyl-[4-(methylthio)phenyl]2-morphoholino-1-- propane),
aromatic diazonium salts, triallysulfonium salts, diallyiodonium
salts, triallylselenium salts of Lewis acid as well as metallocene
compounds and mixtures thereof; 10-99 wt % photosensitive
polymerizable monomers or oligomers selected from the group
consisting of double-bond compounds, compounds having epoxy
functional group and mixtures thereof; and 0-5 wt % modifier
selected from the group consisting of long-alkyl-chain functional
group, silicone-alkyl compounds, double-bond compounds and mixtures
thereof; wherein said photosensitive material can surround liquid
crystal display cell after curing that a non-substrate liquid
crystal display cell surrounded by photosensitive material is
acquired.
12. The photosensitive material for non-substrate liquid crystal
display according to claim 11, wherein said photo-initiator
comprises 2,2-diethoxyacetophenone or benzophenone.
13. The photosensitive material for non-substrate liquid crystal
display according to claim 11, wherein said photosensitive
polymerizable monomer comprises polyurethane type acrylates,
acrylic monomer, epoxy compound, urethane acrylates, acrylic
acrylates, epoxy acrylates, polyester acrylates.
14. The photosensitive material for non-substrate liquid crystal
display according to claim 11, wherein the mixing ratio of
photo-initiator, photosensitive polymerizable monomers or
oligomers, and modifier by weight is 2:96:2.
15. The photosensitive material for non-substrate liquid crystal
display according to claim 11, wherein said photosensitive material
is polymerized and cured under the irradiation of 350-380 nm
ultraviolet light at wavelength or high-pressure mercury lamp.
16. The photosensitive material for non-substrate liquid crystal
display according to claim 15, wherein said photosensitive material
is polymerized and cured with 365 nm ultraviolet light.
17. The photosensitive material for non-substrate liquid crystal
display according to claim 11, wherein said photosensitive material
is further mixed with liquid crystal material.
18. The photosensitive material for non-substrate liquid crystal
display according to claim 11, wherein said photosensitive material
is further mixed with nanometer particles.
Description
BACKGROUND OF THE INVENTION
[0001] 1. Field of the Invention
[0002] The present invention relates to a photosensitive material
for non-substrate liquid crystal display that can surround liquid
crystal display cell and separate from assisting substrates that a
non-substrate liquid crystal display cell is obtained.
[0003] 2. Description of the Related Art
[0004] The application of flat panel display (FPD) has helped
reduce the weight and volume of display. The currently available
liquid crystal display (LCD) technologies employ passive scan or
active matrix to display images, which however requires
considerable thickness stability for precision control. Otherwise
even slight deformation will lead to serious image distortion. To
bring about thinner and more impact-resistant FPD, some of the FPD
technologies for conventional glass substrate process have shifted
focus to the R&D of plastic substrate. The development of
flexible FPD has brought FPD to a new prospect in terms of
thinness, impact-resistance and ease of carriage.
[0005] As for the substrate of flexible FPD, plastic materials have
received the most attention for their characteristics of being
lighter, thinner, more impact-resistant, mobile, and easy to carry.
But in processes with temperature of 200.degree. C. or higher,
plastic material is prone to deformation or even decomposition,
hence limiting its dimensions and applications. To bypass the
shortcomings of plastic substrate, non-substrate FPD is expected to
be the process that draws the focus attention.
[0006] The patent of Philips entitled Liquid Crystal Display
Laminate and Method of Manufacturing Such filed with WIPO
(WO02/42832 A2) and published in Nature in 2002 reveals a process
for single substrate LCD. The process employs UV radiation to
produce polymerization and at the same time form polymer-covered
liquid crystal with PSCOF (phase separated composite organic film)
structure, which maintains uniformity on curved screens.
[0007] In the efforts to develop lighter and thinner non-substrate
flexible FPD with greater design flexibility, photosensitive
material is one of the key materials and technologies for the new
process. Through the design of molecular structure, adjustment of
compositions, and application of modification technologies
targeting different needs, photosensitive material can be made to
possess good flexibility and physical properties and stay free of
the drawbacks of plastic materials, including poor resistance to
high temperature and infiltration of oxygen and moisture that would
cause damage to the liquid crystal display cell.
SUMMARY OF THE INVENTION
[0008] The present invention discloses a photosensitive material
for non-substrate liquid crystal display which comprises
photo-initiator selected from the group consisting of diethoxy
acetophenone, benzophenone, benzyl benzoin isobutyl ether, benzyl
dimethyl ketal, 1-hydroxycyclohexyl phenyl ketone, diethyl
thioxanthone, 2-ethyl anthraquinone,
2-hydroxy-2-methyl-1-phenylpropane-1-one,
1-(4-isopropylphenyl)-2-hydroxy-2-methylpropane-1-one),
(2-methyl-[4-(methylthio)phenyl]2-morpholino-1-propane), aromatic
diazonium salts, triallysulfonium salts, diallyiodonium salts,
triallylselenium salts of Lewis acid as well as metallocene
compounds and mixtures thereof; photosensitive polymerizable
monomers or oligomers selected from the groups consisting of
double-bond compounds, compounds having epoxy functional group and
mixtures thereof; and modifier selected from the groups consisting
of long-alkyl-chain functional group, silicone-alkyl compounds,
double-bond compounds and mixtures thereof. The photosensitive
material can surround liquid crystal display cell after
polymerization and curing that a non-substrate liquid crystal
display cell surrounded by photosensitive material is obtained.
[0009] The aforesaid photo-initiator comprises
2,2-diethoxyacetophenone or benzophenone.
[0010] The aforesaid photosensitive polymerizable monomer or
oligomer comprises PU type acrylate, acrylic monomer, epoxy
compound, urethane acrylates, acrylic acrylates, epoxy acrylates,
polyester aAcrylates.
[0011] The aforesaid modifier comprises siloxane, fluorinated ether
or alcohol.
[0012] The aforesaid modifier increases the flexibility and
releasability of the photosensitive material.
[0013] The mixing ratio of the aforesaid photo-initiator,
photosensitive polymerizable monomer or oligomer, and modifier in
the photosensitive material is 0.1-15 wt % photo-initiator, 10-99
wt % photosensitive polymerizable monomer or oligomer, and 0-5 wt %
modifier, and the ratio of photo-initiator: photosensitive
polymerizable monomer or oligomer: modifier by weight is preferably
2:96:2.
[0014] The aforesaid photosensitive material may polymerize and
cure under the irradiation of 350-380 nm ultraviolet light or
high-pressure mercury lamp.
[0015] The aforesaid photosensitive material may be further mixed
with liquid crystal material or other nanometer particles.
[0016] Another objective of the present invention is to provide a
photosensitive material for non-substrate liquid crystal display,
which comprises:
[0017] 0.1-15 wt % photo-initiator selected from the group
consisting of diethoxy acetophenone, benzophenone, benzyl benzoin
isobutyl ether, benzyl dimethyl ketal, 1-hydroxycyclohexyl phenyl
ketone, diethyl thioxanthone, 2-ethyl anthraquinone,
2-hydroxy-2-methyl-1-phenylpropane-1- -one,
1-(4-isopropylphenyl)-2-hydroxy-2-methylpropane-1-one),
(2-methyl-[4-(methylthio)phenyl]2-morpholino-1-propane), aromatic
diazonium salts, triallysulfonium salts, diallyiodonium salts,
triallylselenium salts of Lewis acid as well as metallocene
compounds and mixtures thereof;
[0018] 10-99 wt % photosensitive polymerizable monomers or
oligomers selected from the group consisting of double-bond
compounds, compounds having epoxy functional group and mixtures
thereof; and
[0019] 0-5 wt % modifier selected from the group consisting of
long-alkyl-chain functional group, silicone-alkyl compounds,
double-bond compounds and mixtures thereof; said photosensitive
material can surround liquid crystal display cell after curing that
a non-substrate liquid crystal display cell surrounded by
photosensitive material is obtained.
[0020] The photosensitive material disclosed in this invention may
be used in the process for non-substrate liquid crystal display to
fabricate a display without the support of substrate but merely
surrounded by photosensitive material, which, after curing,
exhibits flexibility and releasability superior to those of regular
photosensitive polymerization-cured resins. Such photosensitive
material is a key material in the manufacturing of substrate-free
flexible liquid crystal display.
BRIEF DESCRIPTION OF THE DRAWINGS
[0021] FIG. 1 illustrates the flow chart for the fabrication of
first assisting substrate.
[0022] FIG. 2 illustrates the flow chart for the fabrication of
second assisting substrate.
[0023] FIG. 3 illustrates the flow chart for the fabrication of
non-substrate liquid crystal display cell.
DETAILED DESCRIPTION OF THE INVENTION
[0024] The present invention discloses a photosensitive material
for non-substrate liquid crystal display comprising photo-initiator
selected from the group consisting of diethoxy acetophenone,
benzophenone, benzyl benzoin isobutyl ether, benzyl dimethyl ketal,
1-hydroxycyclohexyl phenyl ketone, diethyl thioxanthone, 2-ethyl
anthraquinone, 2-hydroxy-2-methyl-1-phenylpropane-1-one,
1-(4-isopropylphenyl)-2-hydroxy- -2-methylpropane-1-one),
(2-methyl-[4-(methylthio)phenyl]2-morpholino-1-pr- opane), aromatic
diazonium salts, triallysulfonium salts, diallyiodonium salts,
triallylselenium salts of Lewis acid as well as metallocene
compounds and mixtures thereof, preferably 2,2-diethoxyacetophenone
or benzophenone; photosensitive polymerizable monomers or oligomers
selected from the group consisting of double-bond compounds,
compounds having epoxy functional group and mixtures thereof,
preferably polyurethane type acrylate; and modifier selected from
the group consisting of long-alkyl-chain functional group,
silicone-alkyl compounds, double-bond compounds and mixtures
thereof, preferably siloxane, fluorinated ether, or alcohol. Said
photosensitive material can surround liquid crystal cell after
polymerization and curing that a non-substrate liquid crystal
display cell surrounded by photosensitive material is obtained.
[0025] The mixing ratio of the aforesaid photo-initiator,
photosensitive polymerizable monomer or oligomer, and modifier in
the photosensitive material by weight is 2:96:2. The aforesaid
modifier can enhance the flexibility and releasability of
photosensitive material.
[0026] The aforesaid photosensitive material may polymerize and
cure under the irradiation of 350-380 nm ultraviolet light or
high-pressure mercury lamp, preferably by 365 nm ultraviolet
light.
[0027] The advantages of the present invention are further depicted
with the illustration of examples, but the descriptions made in the
examples should not be construed as a limitation on the actual
application of the present invention.
EXAMPLE 1
Preparation of Photosensitive Material (I)
[0028] After mixing modifier Zonyl FSO (DuPont) at 0.1 wt % of
photosensitive material and photosensitive material Norland Optical
Adhesive 65 (NOA-65, Norland), apply the mixture to 50 .mu.m PET
film with 4# wire rod (9 .mu.m) or dip coat the mixture on glass.
Subject the mixture to irradiation of 365 nm ultraviolet light for
5 seconds, then measure its contact angle. The results are
presented in Table 1.
EXAMPLE 2
Preparation of Photosensitive Material (II)
[0029] After mixing modifier BYK333 at 1.5 wt % of photosensitive
material and photosensitive material NOA-65, apply the mixture to
50 .mu.m PET film with 4# wire rod (9 .mu.m) or dip coat the
mixture on glass. Subject the mixture to irradiation of 365 nm
ultraviolet light for 5 seconds, then measure its contact angle.
The results are presented in Table 1.
EXAMPLE 3
Preparation of Photosensitive Material (III)
[0030] After mixing modifier BYK333 (BYK Chemie USA Inc.) at 1.0 wt
% of photosensitive material, Surfynol OP340 (Air Products and
Chemicals, INC) at 0.5 wt % of photosensitive material, and
photosensitive material NOA-65, apply the mixture to 50 .mu.m PET
film with 4# wire rod (9 .mu.m) or dip coat the mixture on glass.
Subject the mixture to irradiation of 365 nm ultraviolet light for
5 seconds, then measure its contact angle. The results are
presented in Table 1.
EXAMPLE 4
Preparation of Photosensitive Material (IV)
[0031] After mixing modifier BYK333 at 2.0 wt % of photosensitive
material and photosensitive material NOA-65, apply the mixture to
50 .mu.m PET film with 4# wire rod (9 .mu.m) or dip coat the
mixture on glass. Subject the photosensitive material to
irradiation of 365 nm ultraviolet light for 5 seconds, then measure
its contact angle. The results are presented in Table 1.
EXAMPLE 5
Preparation of Photosensitive Material (V)
[0032] After mixing modifier BYK333 at 1.5 wt % of photosensitive
material, Surfynol OP340 (Air Products and Chemicals, INC) at 0.5
wt % of photosensitive material, and photosensitive material
NOA-65, apply the mixture to 50 .mu.m PET film with 4# wire rod (9
.mu.m) or dip coat the mixture on glass. Subject the photosensitive
material to irradiation of 365 nm ultraviolet light for 5 seconds,
then measure its contact angle. The results are presented in Table
1.
1TABLE 1 Measurements of Contact Angles from Examples 1.about.5
Contact Angle PET film coated with Example release film fPET film 1
59.47 39.56 2 44.65 36.9 3 45.68 37.7 4 33.35 41.69 5 31.5
38.72
[0033] As shown in Table 1, with the mixture of photosensitive
material and modifier applied on PET film with or without the
coating of release film, the contact angles measured in Examples
1.about.3 are greater on PET films coated with release film than
those on PET films without release film, while it is the opposite
in Examples 4 & 5. Smaller contact angle value means the
proximity of the surface tension of the two matters. Thus the
modifiers in Examples 4 & 5 exhibit better effect, while that
in Example 5 shows the best result.
EXAMPLE 6
Non-substrate Liquid Crystal Display Cell Process
[0034] The manufacturing of first assisting substrate 10 is carried
out first. As shown in FIG. 1, apply a layer of release agent 20 on
first assisting substrate 10. Next, apply photosensitive material
30 prepared in Example 5 on release agent layer 20 as shown in FIG.
1B; as shown in FIG. 1C, irradiate 365 nm UV light on
photosensitive material 30 for 5 seconds to form a cured
photosensitive material layer 30'; as shown in FIG. 1D, fabricate
electrode pattern 40 on cured photosensitive material layer 30.
[0035] Next carry out the manufacturing of second assisting
substrate 11. As shown in FIG. 2A to 2C, the steps in the process
are the same as those in the manufacturing of first assisting
substrate: first apply release agent layer 21 on second assisting
substrate 11 as shown in FIG. 2A. Next apply photosensitive
material 31 on release agent layer 21 as shown in FIG. 2B, then
polymerize and cure the photosensitive material with UV light to
form cured photosensitive material layer 31' as shown in FIG. 2C.
Then fabricate electrode pattern 41 on cured photosensitive
material layer 31' as shown in FIG. 2D and coat alignment layer 50.
Subsequently apply photo-polymerizable mixture 60, which contains
photosensitive material and liquid crystal material on alignment
layer 50 as shown in FIG. 2E.
[0036] FIG. 3 depicts the process of assembling first assisting
substrate 10 and second assisting substrate 11. As shown in FIG.
3A, place first assisting substrate 10 upside down over second
assisting substrate 11 and align as shown in FIG. 3A, and then
expose the two substrates to UV light through photomask (not shown
in the figure); after exposure, the photo-polymerizable mixture 60
forms a plurality of polymer walls 70 which adjoin the first
assisting substrate 10 and the second assisting substrate 11, and
induce the phase-separation between liquid crystal and
photosensitive material with polymer walls 70 surrounding the
liquid crystal 80; next, peel off first assisting substrate 10,
second assisting substrate 11, and their respective release agent
layer 20 and 21 as shown in FIG. 3C; finally, a non-substrate
liquid crystal display cell 100 is obtained as shown in FIG.
3D.
* * * * *