U.S. patent application number 10/758481 was filed with the patent office on 2004-09-30 for optical recording medium and optical recording-reproducing method.
Invention is credited to Ashida, Sumio, Ichihara, Katsutaro, Todori, Kenji, Tsukamoto, Takayuki, Yusu, Keiichiro.
Application Number | 20040190432 10/758481 |
Document ID | / |
Family ID | 32900150 |
Filed Date | 2004-09-30 |
United States Patent
Application |
20040190432 |
Kind Code |
A1 |
Ichihara, Katsutaro ; et
al. |
September 30, 2004 |
Optical recording medium and optical recording-reproducing
method
Abstract
An optical recording medium includes an optical recording layer,
a separating layer formed on a reproducing light incident side of
the optical recording layer, and a phase-change reproducing layer
formed on the reproducing light incident side of the separating
layer, absorbance of which phase-change reproducing layer is
changed depending on whether a state of the optical recording layer
is a recording mark or a space. A transfer portion to which a state
of the optical recording layer is transferred is formed in a
portion having high absorbance of the phase-change reproducing
layer by irradiation with reproducing light, while a portion of the
phase-change reproducing layer other than the transfer portion is
kept in a state optically differing from the transfer portion.
Inventors: |
Ichihara, Katsutaro;
(Yokohama-shi, JP) ; Ashida, Sumio; (Tokyo,
JP) ; Yusu, Keiichiro; (Yokohama-shi, JP) ;
Todori, Kenji; (Yokohama-shi, JP) ; Tsukamoto,
Takayuki; (Kawasaki-shi, JP) |
Correspondence
Address: |
OBLON, SPIVAK, MCCLELLAND, MAIER & NEUSTADT, P.C.
1940 DUKE STREET
ALEXANDRIA
VA
22314
US
|
Family ID: |
32900150 |
Appl. No.: |
10/758481 |
Filed: |
January 16, 2004 |
Current U.S.
Class: |
369/275.1 ;
G9B/7.014; G9B/7.018; G9B/7.141; G9B/7.142; G9B/7.172;
G9B/7.186 |
Current CPC
Class: |
G11B 7/00454 20130101;
G11B 7/253 20130101; G11B 7/268 20130101; G11B 7/005 20130101; B82Y
10/00 20130101; G11B 7/261 20130101; G11B 7/00456 20130101; G11B
7/243 20130101; G11B 7/257 20130101; G11B 7/242 20130101 |
Class at
Publication: |
369/275.1 |
International
Class: |
G11B 007/24 |
Foreign Application Data
Date |
Code |
Application Number |
Jan 20, 2003 |
JP |
2003-011174 |
Claims
What is claimed is:
1. An optical recording medium, comprising: an optical recording
layer; a separating layer formed on a reproducing light incident
side of the optical recording layer; and a phase-change reproducing
layer formed on the reproducing light incident side of the
separating layer, absorbance of which phase-change reproducing
layer is changed depending on whether a state of the optical
recording layer is a recording mark or a space, wherein a transfer
portion to which a state of the optical recording layer is
transferred is formed in a portion having high absorbance of the
phase-change reproducing layer by irradiation with reproducing
light, while a portion of the phase-change reproducing layer other
than the transfer portion is kept in a state optically differing
from the transfer portion.
2. The optical recording medium according to claim 1, wherein the
transfer portion is magnified as compared with a recording mark in
the optical recording layer.
3. The optical recording medium according to claim 1, wherein the
optical recording layer is a phase-change optical recording
layer.
4. An optical recording medium, comprising: an optical recording
layer; a separating layer formed on a reproducing light incident
side of the optical recording layer; and a phase-change reproducing
layer formed on the reproducing light incident side of the
separating layer, absorbance of which phase-change reproducing
layer is changed depending on whether a state of the optical
recording layer is a recording mark or a space, wherein a reverse
transfer portion to which a state of the optical recording layer is
reversely transferred is formed in a portion having high absorbance
of the phase-change reproducing layer by irradiation with
reproducing light, while a portion of the reproducing layer other
than the reverse transfer portion is kept in a state optically
differing from the reverse transfer portion.
5. The optical recording medium according to claim 4, wherein the
reverse transfer portion is magnified as compared with a recording
mark in the optical recording layer.
6. The optical recording medium according to claim 4, wherein the
optical recording layer is a phase-change optical recording
layer.
7. An optical recording medium, comprising: a transparent substrate
having a pit train as an optical recording layer formed on a
surface thereof; and a phase-change reproducing layer formed on the
transparent substrate, absorbance of which phase-change reproducing
layer is changed depending on whether a state of the optical
recording layer is a recording mark or a space, wherein a transfer
portion to which a state of the optical recording layer is
transferred is formed in a portion having high absorbance of the
phase-change reproducing layer by irradiation with reproducing
light, while a portion of the phase-change reproducing layer other
than the transfer portion is kept in a state optically differing
from the transfer portion.
8. The optical recording medium according to claim 7, wherein the
transfer portion is magnified as compared with a recording mark of
the surface region of the transparent substrate.
9. An optical recording medium, comprising: a transparent substrate
having a pit train as an optical recording layer formed on a
surface thereof; and a phase-change reproducing layer formed on the
transparent substrate, absorbance of which phase-change reproducing
layer is changed depending on whether a state of the optical
recording layer is a recording mark or a space, wherein a reverse
transfer portion to which a state of the optical recording layer is
reversely transferred is formed in a portion having high absorbance
of the phase-change reproducing layer by irradiation with
reproducing light, while a portion of the reproducing layer other
than the reverse transfer portion is kept in a state optically
differing from the reverse transfer portion.
10. The optical recording medium according to claim 9, wherein the
reverse transfer portion is magnified as compared with a recording
mark of the surface region of the transparent substrate.
11. An optical recording-reproducing method, comprising:
irradiating the optical recording medium according to claim 1 with
reproducing light; transferring a recording mark or a space of the
recording layer to the phase-change reproducing layer heated to a
temperature not lower than a melting point or a crystallizing
temperature by irradiation with the reproducing light to form a
transfer portion; and detecting reflected light from the transfer
portion to perform reproduction.
12. The method according to claim 11, further comprising:
irradiating the optical recording medium with recording light; and
forming in the recording layer a train of recording marks each
having a size smaller than optical resolution determined by a
wavelength and a numerical aperture of an objective lens.
13. The method according to claim 11, further comprising: restoring
the reproducing layer having the transfer portion formed by
irradiation with the reproducing light to a state before the
transfer.
14. The method according to claim 11, wherein the optical recording
medium comprises a substrate having a pit train as a header section
formed on a surface thereof and the optical recording layer used as
a data section is a phase-change recording layer or a write-once
recording layer, and wherein, when the optical recording medium is
reproduced, read power for the header section and read power for
the data section are set at different values.
15. The method according to claim 11, wherein a modulation scheme
and a write strategy are set such that a shortest mark length is
made longer than a shortest space length, or a shortest mark length
is made shorter than a shortest space length.
16. An optical recording-reproducing method, comprising:
irradiating the optical recording medium according to claim 4 with
reproducing light; reversely transferring a recording mark or a
space of the recording layer to the phase-change reproducing layer
heated to a temperature not lower than a melting point or a
crystallizing temperature by irradiation with the reproducing light
to form a reverse transfer portion; and detecting reflected light
from the reverse transfer portion to perform reproduction.
17. The method according to claim 16, further comprising:
irradiating the optical recording medium with recording light; and
forming in the recording layer a train of recording marks each
having a size smaller than optical resolution determined by a
wavelength and a numerical aperture of an objective lens.
18. The method according to claim 16, further comprising: restoring
the reproducing layer having the reverse transfer portion formed by
irradiation with the reproducing light to a state before the
transfer.
19. The method according to claim 16, wherein the optical recording
medium comprises a substrate having a pit train as a header section
formed on a surface thereof and the optical recording layer used as
a data section is a phase-change recording layer or a write-once
recording layer, and wherein, when the optical recording medium is
reproduced, read power for the header section and read power for
the data section are set at different values.
20. The method according to claim 16, wherein a modulation scheme
and a write strategy are set such that a shortest mark length is
made longer than a shortest space length, or a shortest mark length
is made shorter than a shortest space length.
21. An optical recording-reproducing method, comprising:
irradiating the optical recording medium according to claim 7 with
reproducing light; transferring a recording mark or a space of the
recording layer to the phase-change reproducing layer heated to a
temperature not lower than a melting point, or a crystallizing
temperature by irradiation with the reproducing light to form a
transfer portion; and detecting reflected light from the transfer
portion to perform reproduction.
22. An optical recording-reproducing method, comprising:
irradiating the optical recording medium according to claim 9 with
reproducing light; reversely transferring a recording mark or a
space of the recording layer to the phase-change reproducing layer
heated to a temperature not lower than a melting point or a
crystallizing temperature by irradiation with the reproducing light
to form a reverse transfer portion; and detecting reflected light
from the reverse transfer portion to perform reproduction.
Description
CROSS-REFERENCE TO RELATED APPLICATIONS
[0001] This application is based upon and claims the benefit of
priority from the prior Japanese Patent Application No. 2003-11174,
filed Jan. 20, 2003, the entire contents of which are incorporated
herein by reference.
BACKGROUND OF THE INVENTION
[0002] 1. Field of the Invention
[0003] The present invention relates to an optical recording medium
and an optical recording-reproducing method for reproducing
information or recording-reproducing information by irradiation
with a light beam, particularly, to a technology for improving
recording density.
[0004] 2. Description of the Related Art
[0005] Optical disc memories for reproducing information or for
recording-reproducing information by irradiation with a light beam
have been widely put to practical use for recording, reproducing
and storing audio signals, video signals and computer data as a
recording apparatus having high capacity, capable of high-speed
access, and portability, and such optical disc memories are
expected to be further improved in the future for high recording
density (high recording capacity) and high-speed operation.
[0006] The recording density of an optical disc can be increased by
various approaches including, for example, use of a mastering laser
beam having a shorter wavelength, use of a light source mounted in
the apparatus, i.e., a semiconductor laser in general, having a
shorter wavelength, increase in the numerical aperture of an
objective lens, hereinafter referred to as the NA, decrease in the
thickness of a substrate (or a cover layer) on the light incident
side, mark length recording, land-groove recording and improvements
in modulation-demodulation system.
[0007] In addition to the approaches exemplified above, proposed is
super-resolution reproduction technology utilizing recording medium
films that produces a high effect of increasing the recording
density. The super-resolution reproduction technology was proposed
initially with respect to the magneto-optical disc (MOD). In the
super-resolution reproduction technology, a reproducing layer is
magnetically coupled with the recording layer by means of exchange
coupling or magnetostatic coupling, in which an optical aperture
smaller than a reproduction spot is formed in the reproducing layer
by utilizing heating achieved by irradiation with reproducing light
and change in temperature caused by the exchange force or the
magnetostatic force between the layers. The above super-resolution
reproduction technology, which utilizes in principle the magnetic
interaction between the layers, was considered to be high-density
technology inherent in MOD.
[0008] An attempt to form a super-resolution reproducing layer, in
which an optical constant is non-linearly changed upon irradiation
with reproducing light, on the light incident side of the recording
layer was reported later in respect of a read-only disc (ROM).
Since it is possible in principle to apply the method to not only
MODs and ROMs but also to phase-change recording discs (PCD) and
write-once discs (R or WO) typically having a dye recording layer,
various proposals have been made to date in respect of the
super-resolution reproduction medium using a nonlinear optical
film. The technology, called super-RENS (super-resolution
near-field structure), belongs to the super-resolution medium
technology.
[0009] In the conventional super-resolution reproduction technology
using a nonlinear optical film, proposed are a heat mode nonlinear
optical film represented by Sb, Sb.sub.2Te.sub.3, Te, Ge--Sb--Te,
or AgO.sub.x and a photon mode nonlinear optical film represented
by a photochromic film or a semiconductor fine particle dispersed
film.
[0010] All of the conventional super-resolution reproduction
technologies using these nonlinear optical films utilize an optical
response of the nonlinear optical film alone. In the conventional
super-resolution reproduction technology, the nonlinear optical
film was non-linearly changed continuously during irradiation with
the reproducing light so as to perform the reproducing operation
while reducing the reproducing spot size. In the conventional
super-resolution reproduction technology, however, load applied to
the nonlinear optical film is high, making it difficult to obtain a
practical number of repetitions for reproduction.
BRIEF SUMMARY OF THE INVENTION
[0011] An object of the present invention is to provide an optical
recording medium which permits reproduction of a recording mark
smaller than an optical limit so as to achieve high recording
density and which also permits increasing the number of repetitions
for reproduction.
[0012] According to an aspect of the present invention, there is
provided an optical recording medium, comprising: an optical
recording layer; a separating layer formed on a reproducing light
incident side of the optical recording layer; and a phase-change
reproducing layer formed on the reproducing light incident side of
the separating layer, absorbance of which phase-change reproducing
layer is changed depending on whether a state of the optical
recording layer is a recording mark or a space, wherein a transfer
portion to which a state of the optical recording layer is
transferred is formed in a portion having high absorbance of the
phase-change reproducing layer by irradiation with reproducing
light, while a portion of the phase-change reproducing layer other
than the transfer portion is kept in a state optically differing
from the transfer portion.
[0013] According to another aspect of the present invention, there
is provided an optical recording medium, comprising: an optical
recording layer; a separating layer formed on a reproducing light
incident side of the optical recording layer; and a phase-change
reproducing layer formed on the reproducing light incident side of
the separating layer, absorbance of which phase-change reproducing
layer is changed depending on whether a state of the optical
recording layer is a recording mark or a space, wherein a reverse
transfer portion to which a state of the optical recording layer is
reversely transferred is formed in a portion having high absorbance
of the phase-change reproducing layer by irradiation with
reproducing light, while a portion of the reproducing layer other
than the reverse transfer portion is kept in a state optically
differing from the reverse transfer portion.
[0014] According to still another aspect of the present invention,
there is provided an optical recording medium, comprising: a
transparent substrate having a pit train as an optical recording
layer formed on a surface thereof; and a phase-change reproducing
layer formed on the transparent substrate, absorbance of which
phase-change reproducing layer is changed depending on whether a
state of the optical recording layer is a recording mark or a
space, wherein a transfer portion to which a state of the optical
recording layer is transferred is formed in a portion having high
absorbance of the phase-change reproducing layer by irradiation
with reproducing light, while a portion of the phase-change
reproducing layer other than the transfer portion is kept in a
state optically differing from the transfer portion.
[0015] According to yet another aspect of the present invention,
there is provided an optical recording medium, comprising: a
transparent substrate having a pit train as an optical recording
layer formed on a surface thereof; and a phase-change reproducing
layer formed on the transparent substrate, absorbance of which
phase-change reproducing layer is changed depending on whether a
state of the optical recording layer is a recording mark or a
space, wherein a reverse transfer portion to which a state of the
optical recording layer is reversely transferred is formed in a
portion having high absorbance of the phase-change reproducing
layer by irradiation with reproducing light, while a portion of the
reproducing layer other than the reverse transfer portion is kept
in a state optically differing from the reverse transfer
portion.
[0016] According to yet another aspect of the present invention,
there is provided an optical recording-reproducing method,
comprising: irradiating any of the afore-mentioned optical
recording medium with reproducing light; transferring or reversely
transferring a recording mark or a space of the recording layer to
the phase-change reproducing layer heated to a temperature not
lower than a melting point or a crystallizing temperature by
irradiation with the reproducing light to form a transfer portion
or a reverse transfer portion; and detecting reflected light from
the transfer portion or the reverse transfer portion to perform
reproduction.
BRIEF DESCRIPTION OF THE SEVERAL VIEWS OF THE DRAWING
[0017] FIG. 1A is a cross-sectional view schematically showing the
construction of an optical recording medium according to an
embodiment of the present invention;
[0018] FIG. 1B is a graph showing intensity distribution of
reproducing light;
[0019] FIGS. 2A to 2E show the principle of transfer reproduction
according to an embodiment of the present invention;
[0020] FIGS. 3A to 3E show the principle of transfer reproduction
according to an embodiment of the present invention;
[0021] FIGS. 4A to 4E show the principle of transfer reproduction
according to an embodiment of the present invention;
[0022] FIGS. 5A to 5E show the principle of transfer reproduction
according to an embodiment of the present invention;
[0023] FIG. 6 is a graph exemplifying temperature hysteresis in the
transfer process of the phase-change reproducing layer according to
an embodiment of the present invention;
[0024] FIG. 7 is a graph exemplifying the frequency function of
crystal growth and the frequency function of crystal nucleus
formation in the phase-change reproducing layer according to an
embodiment of the present invention;
[0025] FIGS. 8A to 8C show the principle of magnified transfer
reproduction according to an embodiment of the present
invention;
[0026] FIGS. 9A to 9C show the principle of magnified transfer
reproduction according to an embodiment of the present
invention;
[0027] FIGS. 10A to 10C show the principle of magnified transfer
reproduction according to an embodiment of the present
invention;
[0028] FIGS. 11A to 11C show the principle of magnified transfer
reproduction according to an embodiment of the present
invention;
[0029] FIG. 12 is a graph exemplifying temperature hysteresis of
the recording layer according to an embodiment of the present
invention;
[0030] FIG. 13 is a graph exemplifying the frequency function of
crystal growth and the frequency function of crystal nucleus
formation in the recording layer according to an embodiment of the
present invention;
[0031] FIGS. 14A and 14B show the recording principle according to
an embodiment of the present invention;
[0032] FIGS. 15A and 15B show the recording principle according to
an embodiment of the present invention;
[0033] FIG. 16 is a block diagram exemplifying the construction of
an optical recording-reproducing apparatus according to an
embodiment of the present invention;
[0034] FIG. 17 exemplifies a light irradiation strategy by an
optical recording-reproducing apparatus according to an embodiment
of the present invention;
[0035] FIGS. 18A and 18B show the absorbance difference before
transfer and the reflectance difference after transfer,
respectively, of the reproducing layer used in the Examples of the
present invention;
[0036] FIG. 19 is a graph showing the relationship between CNR and
the sum of the mark length and the space length in the phase-change
optical recording medium for Examples of the present invention;
and
[0037] FIG. 20 is a cross-sectional view schematically showing the
construction of a ROM medium for Examples of the present
invention.
DETAILED DESCRIPTION OF THE INVENTION
[0038] Embodiments of the present invention will now be described
with reference to the accompanying drawings and Tables. To
facilitate understanding of the present invention, the embodiments
of the present invention will be described in the order of (1) the
example of the basic construction of the optical recording medium
of the present invention, (2) the principle of the typical transfer
reproduction, (3) the principle of the typical magnified transfer
reproduction, (4) modifications of the transfer reproduction
process and the magnified transfer reproduction process, (5) the
principle of the recording, (6) examples of the film materials and
the deposition method, which can be employed in the optical
recording medium of the present invention, and (7) the basic
construction of the optical recording-reproducing apparatus
according to an embodiment of the present invention.
[0039] (1) Basic construction of the optical recording medium of
the present invention:
[0040] FIG. 1A is a cross-sectional view schematically showing the
basic construction of the optical recording medium 1 according to
an embodiment of the present invention, and FIG. 1B is a graph
showing intensity distribution of reproducing light.
[0041] The optical recording medium 1 shown in FIG. 1A comprises a
substrate (or a cover layer) 11 and a stacked structure including a
first interference layer 12, a phase-change reproducing layer 13, a
separating layer 14, an optical recording layer 15, a second
interference layer 16 and a heat control layer 17, which are
stacked in the order mentioned on the substrate 11. Light is
incident on the substrate (or the cover layer) 11. It should be
noted that the phase-change reproducing layer 13 is formed on the
light incident side of the optical recording layer 15 with the
separating layer 14 interposed therebetween.
[0042] The optical recording layer 15 has recording marks formed
therein by irradiation with light so as to perform the function of
recording and storing information. The phase-change reproducing
layer 13 performs the function of transferring the recording marks
(or the space between the recording marks) formed in the optical
recording layer in the reproducing stage. FIG. 1A shows a state
that recording marks 15 a are formed in the optical recording layer
15, and the recording marks 15 a formed in the optical recording
layer 15 are partly transferred to the phase-change reproducing
layer 13 so as to form a transfer mark 13a.
[0043] In the case of employing a layer other than ROM or a
magneto-optical recording layer for the optical recording layer,
the separating layer 14 is formed. The separating layer 14 performs
the function of preventing the reproducing layer 13 and the optical
recording layer 15 from being mixed by melting or diffusion. In
addition, the separating layer 14 performs the function of
controlling the reflectance and the absorbance of the reproducing
layer 13 and the absorbance of the recording layer 15 and the
function of controlling the thermal response of the reproducing
layer 13 and the optical recording layer 15.
[0044] The first interference layer 12 and the second interference
layer 16 perform the function of controlling the reflectance and
the absorbance of the reproducing layer and the absorbance of the
recording layer and also performs the function of controlling the
thermal response of each of the reproducing layer and the recording
layer.
[0045] The heat control layer 17 mainly performs the function of
controlling the thermal response of the recording layer. In
addition, the heat control layer 17 performs the function of
improving the efficiency of utilizing the light (reflection
function) in the case where the total thickness of the reproducing
layer and the recording layer is small so as to permit the
transmission of the light to the side of the heat control layer.
Further, the heat control layer 17 performs the function of
controlling the reflectance and the absorbance of the reproducing
layer and the absorbance of the recording layer and also performs
the function of controlling the thermal response of each of the
reproducing layer and the recording layer like the first
interference layer, the second interference layer and the
separating layer.
[0046] The substrate 11 performs the function of mechanically
holding each of the layers made of thin films, and the function of
protecting each of the layers from the dust in the operating
environment and from the fingerprint attached during the medium
operation. Also, where header signals and tracking guide grooves
are pre-formatted in the substrate 11, the substrate 11 performs
the function of generating header signals (such as address signals
and various control signals) and tracking signals. In this case,
the various layers are generally formed upward in FIG. 1A on the
substrate 11 starting with the first interference layer 12.
[0047] In the case of using a cover layer, the cover layer performs
the function of mechanically holding each of the layers made of
thin films and the function of protecting each of the layers from
dust in the operating environment and fingerprints that adhere
during manipulation of the medium. In the case of using the cover
layer, it is possible for header signals and tracking signals to be
pre-formatted on the cover layer. Alternatively, it is possible to
dispose a substrate (not shown) having the header signals and the
tracking signals pre-formatted thereon on the heat control layer
17. In the case of disposing a pre-formatted substrate on the heat
control layer 17, the layers constituting the stacked structure are
formed downward in FIG. 1A on the substrate (not shown) starting
with the heat control layer 17.
[0048] The material, the thickness and the deposition method of
each of the layers will be described in detail in item (4) referred
to hereinafter.
[0049] FIG. 1B is a graph showing the intensity distribution of the
reproduced laser light. The light intensity I is plotted on the
ordinate and the position x in the track direction is plotted on
the abscissa in the graph shown in FIG. 1B. The graph of FIG. 1B is
depicted with the highest intensity on the x-axis set at eE-2. This
is also the case with the graphs shown in FIG. 2C and so on. The
intensity distribution of the reproducing light substantially
represents Gaussian distribution and, thus, is in symmetry with
respect to an axis. In other words, even if x is rotated by
360.degree. in the plane of the medium film, the intensity
distribution is rendered equal to that shown in FIG. 1B.
[0050] (2) Principle of typical transfer reproduction in the
present invention:
[0051] ( 2-1. Typical example of the transfer reproduction
process)
[0052] FIGS. 2-5 are intended to explain the typical principle of
the transfer reproduction process in the present invention. In each
of FIGS. 2 to 5, only the reproducing layer 13, the separating
layer 14 and the optical recording layer 15 of the recording medium
1 are depicted.
[0053] FIGS. 2-5 show the changes with time in the states of the
recording medium, covering the case where the medium is moved from
the right to the left relative to the reproducing beam. To be more
specific, FIG. 2 shows the state at time t1, FIG. 3 shows the state
at time t2, FIG. 4 shows the state at time t3, and FIG. 5 shows the
state at time t4. Times t1 to t4 are as follows:
[0054] t1: The time when the center of the reproducing beam is
substantially in the center of the recording mark.
[0055] t2: The time when the recording medium is moved to the left
by substantially half the mark length (substantially equal to the
space length) relative to the reproducing beam.
[0056] t3, t4: The time when the recording medium is further moved
to the left successively by substantially half the mark length
relative to the reproducing beam.
[0057] If recording marks are consecutively recorded in a
close-packed pattern in the track to be reproduced, when the
recording medium is further moved from time t4 to the left by
substantially half the mark length relative to the reproducing
beam, the state is brought to the state equal to that at time t1,
and the operation described above is repeated. In the transfer
reproduction principle of the present invention, it suffices to
describe the case where the close-packed pattern is recorded in the
track to be reproduced because the similar transfer reproduction
can be apparently be achieved in respect of a pattern longer than
the close-packed pattern. Such being the situation, the following
description covers the case where the close-packed pattern is
reproduced.
[0058] The capital letters A to E in each of FIGS. 2 to 5 denote
the situations given below:
[0059] Specifically, FIGS. 2A to 5A are plan views each showing the
optical recording layer 15 as viewed from the side opposite to the
light incident side, i.e., as viewed from the upper side.
[0060] FIGS. 2B to 5B are cross-sectional views each directed to
the main portion of the recording medium and showing the state
before the transfer operation.
[0061] FIGS. 2C to 5C are graphs each showing the temperature
distribution of the reproducing layer 13.
[0062] FIGS. 2D to 5D are cross-sectional views each directed to
the main portion of the recording medium and showing the state
after the transfer operation.
[0063] Further, FIGS. 2E to 5E are plan views showing the recording
medium after the transfer operation as viewed from the side of the
reproducing layer 13, i.e., as viewed from the lower side.
[0064] In each of FIGS. 2A to 5A and 2B to 5B, the hatched portion
in the optical recording layer 15 denotes the recording mark 15a,
and the blank portion denotes the space. The mark and the space are
shaped rectangular and have the same size in the drawing. The
actual shape of the mark is dependent on the profile (generally
Gaussian type) of the recording beam and the write strategy such
that the actual mark is shaped circular, semi-circular, and
elliptical or is shaped like a herringbone. It should be noted in
this connection that an accurate shape of the recording mark is not
needed in describing the principle of the present invention and,
thus, the recording mark is shaped rectangularly in each of FIGS.
2A to 5A. Here, the scale of the x-axis is not equal to the scale
of the y-axis. It is desirable for the track pitch to be set longer
than the shortest mark length.
[0065] Since the recording medium is irradiated in general with the
recording light by using the optical system equal to that of the
reproducing light, it is reasonable to understand that the spatial
distribution of the recording light is equal to the spatial
distribution of the reproducing light shown in FIG. 1B and differs
in the intensity alone from that of the reproducing light. What is
most desirable for simplifying the optical system in the present
invention is the mode that the recording light and the reproducing
light are equal to each other in spatial distribution. It should be
noted, however, that the present invention could be worked even if
the spatial distribution of the recording light differs from the
spatial distribution of the reproducing light. Particularly, where
the size of the recording spot is smaller than that of the
reproducing spot, it is possible to easily record the mark and the
space smaller than the resolution of the reproducing light, which
is advantageous for working the present invention.
[0066] Each of FIGS. 2A to 5A shows three tracks including the
track to be reproduced tr.sub.n and adjacent tracks tr.sub.n-1 and
tr.sub.n+1 positioned on both sides of the track tr.sub.n. Also,
each of FIGS. 2A to 5A shows the state that the marks and the
spaces of the same size are recorded in each track. The mark and
the space in the optical recording layer 15 correspond to the
close-packed pattern of the random data used in the recording stage
of, for example, the actual user data. Here, FIGS. 2B to 5B are
cross-sectional views of the tracks tr.sub.n to be reproduced shown
in the center in FIGS. 2A to 5A, respectively, along the track
direction. Also, in FIGS. 2A to 5A, the marks on the adjacent
tracks are formed contiguous to each other. However, a space is
formed in general between the adjacent tracks. It should be noted,
however, that, since the space between the adjacent tracks need not
be shown for explaining the principle of the present invention, the
space between the adjacent tracks is omitted in the drawings.
[0067] The eE-2 diameter of the reproducing spot is depicted by
means of a broken line in FIG. 2A. The actual spot is substantially
circular. However, since the x-axis and the y-axis differ from each
other in the scale, the reproducing spot is shown elliptical in
FIG. 2A. As apparent from FIG. 2A, a plurality of marks and spaces
are included in the reproducing beam in each of the track direction
and the track width direction. Therefore, in the recording medium
that does not include a phase-change reproducing layer,
inter-symbol interference and cross talk are rendered prominent so
as to make it impossible to perform significant reproduction
operation.
[0068] It should be noted that the reproduction limit is
theoretically given by .lambda./(2NA), where .lambda. represents
the reproducing wavelength, and NA denotes the numerical aperture
of the objective lens. The reproduction limit indicates that the
significant reproduction signal amplitude could not be provided if
the sum of the close-packed mark length and the close-packed space
length reach this value. It follows that the recording pattern of
the size smaller than the reproduction limit, i.e., the recording
pattern formed of the marks and spaces sized smaller than the
reproduction resolution, could not be reproduced significantly
because of the influences given by the inter-symbol interference
and the cross talk. It should be noted that the size of the
reproducing laser spot, i.e., the diameter of the portion having
eE-2 intensity to the central intensity, is given by about
0.8.times..lambda./(NA). In the case of using an optical
recording-reproducing apparatus having, for example, .lambda. of
413 nm and NA of 0.65 as in the Examples described hereinafter, the
reproduction limit is 318 nm and the eE-2 diameter is about 500 nm.
Since the length in the track direction of the recording mark and
the space and the distance between the adjacent tracks shown in
each of FIGS. 2A to A and 2B to 5B is assumed to be about 100 nm,
the sum of the recording mark length and the space length in the
track direction is about 200 nm. This value is markedly smaller
than the reproduction limit of 318 nm given above. It follows that
in the conventional recording medium that does not include the
phase-change reproducing layer, it is impossible to reproduce
significantly the recording pattern shown in each of FIGS. 2 to
5.
[0069] In the present invention, the mark or the space alone in the
recording layer is transferred to the phase-change reproducing
layer (in the ideal case, a single mark or space alone being
transferred), and the transferred mark or space is reproduced.
Therefore, it is possible to reproduce even the recording pattern
smaller than the reproduction limit.
[0070] Incidentally, the track pitch is seen to be about 100 nm in
FIGS. 2 to 5. However, since the scale of the x-axis is not equal
to the scale of the y-axis as described previously, the track pitch
on the drawing is about 200 nm. However, in view of the cross erase
(the phenomenon that the mark edge portion on the adjacent tracks
is erased in recording the mark), it is desirable to set the track
pitch at a value not smaller than .lambda./(2NA), and it is more
desirable to set the track pitch at a value not smaller than the
full width at half maximum (FWHM).
[0071] In each of FIGS. 2D to 5D and 2E to 5E, the hatched portion
in the optical recording layer 15 denotes a mark, the blank portion
denotes a space, and the hatched portion in the reproducing layer
13 denotes a transfer mark 13 a transferred to the reproducing
layer. The initial state of the phase-change reproducing layer (the
state before the transfer) is a crystalline state.
[0072] As described previously, each of FIGS. 2C to 5C is a graph
schematically showing the temperature distribution of the
reproducing layer 13 in the stage of the irradiation with the
reproducing light. The broken line in each of FIGS. 2C to 5C
corresponds to the temperature distribution of the reproducing
light. The actual temperature distribution is widened on the
downstream side in the moving direction of the recording medium (to
the right in the drawing) because of the limited thermal response
time and the movement of the recording medium. Therefore, strictly
speaking, it is necessary to determine the actual temperature
distribution by solving a thermal conduction equation in view of
the thermal diffusion in the in-plane direction and the thickness
direction of the film. It should be noted, however, that since it
is unnecessary to know strictly the temperature distribution in the
reproducing layer in describing the basic principle of the present
invention, the temperature distribution of the reproducing layer,
which is determined by the intensity distribution of the
reproducing light and the absorbance of the reproducing layer, is
shown in each of FIGS. 2C to 5C.
[0073] The present invention is featured in that the absorbance of
the phase-change reproducing layer is changed depending on whether
the state of the recording layer is the mark or the space. In the
present invention, the transfer reproduction is realized on the
principle that the mark or the space in the recording layer is
selectively transferred to the reproducing layer by the absorbance
difference in the reproducing layer. A typical example of the
transfer reproduction will now be described.
[0074] In FIGS. 2 to 5, the absorbance of the phase-change
reproducing layer before, for example, the transfer operation is
adjusted such that the absorbance at the time when the state of the
recording layer is a mark is substantially twice the absorbance at
the time when the state of the recording layer is a space. As
described previously under item ( 1 ), it is possible to control
the absorbance of the reproducing layer over a wide range depending
on the material, the deposition conditions (selection of the
complex refractive index relative to the operating wavelength), and
the thickness of the first interference layer 12, the separating
layer 14, the second interference layer 16, the heat control layer
17, the phase-change reproducing layer 13 and the optical recording
layer 15. Also, as described hereinafter, it is possible to form
the first interference layer, the separating layer, the second
interference layer and the heat control layer by stacking film
materials differing from each other in the refractive index. It is
also possible to form a layer of a semi-absorptive material within
the interference layer and the separating layer. It is also
possible to form a transparent layer within the heat control layer.
Thus, it is possible to control the absorbance of the phase-change
reproducing layer over a wide range by selecting appropriately the
construction of the stacked structure, the material and the
thickness of each layer.
[0075] When it comes to the principle of the typical transfer
reproduction shown in FIGS. 2 to 5, the absorbance of the
phase-change reproducing layer before the transfer operation is
controlled such that the absorbance at the time when the state of
the recording layer is a mark is substantially twice the absorbance
at the time when the state of the recording layer is a space, as
described previously. It follows that the temperature distribution
in the reproducing layer at time t1 is as shown in FIG. 2C
immediately before the transfer operation. Specifically, at time t1
when the center of the reproducing spot is in the vicinity of the
center of the recording mark, it is possible to control such that
the temperature is high in only that portion of the phase-change
reproducing layer corresponding to the recording mark and is low in
that portion of the phase-change reproducing layer corresponding to
the space. Here, the phase-change temperature in the reproducing
layer is set at the melting point (Tmr).
[0076] That portion of the reproducing layer heated to a
temperature higher than the melting point Tmr is melted so as to
exhibit an optical response differing from the surrounding portion
in a crystalline state, with the result that it is possible to
perform the transfer reproduction. It is possible to set the
melting point Tmr to fall within a wide range by selecting
appropriately the material and the deposition method of the
reproducing layer, as described hereinafter. The melting point Tmr
that permits at least the effect of the present invention to be
produced falls within a range of between Tmr(min) and Tmr(max)
shown in FIG. 2C. The temperature Tmr(min) corresponds to the eE-2
intensity of the reproducing spot. If the melting point Tmr is not
lower than the temperature Tmr(min), the adjacent mark edge portion
on the same track and the mark edge portion on the adjacent track
are not transferred, with the result that the effect of the present
invention are produced, even though it may be slightly, compared
with the conventional recording medium. On the other hand, the
temperature Tmr(max) corresponds to the highest temperature of the
reproducing layer in the reproducing stage. Where the melting point
Tmr is equal to the temperature Tmr(max), that portion alone which
is in the vicinity of the center of the mark of the recording layer
is transferred to the reproducing layer. In this case, the size of
the transfer mark is smaller than the size of the recording mark
and, thus, it is possible in principle to produce the effect of the
present invention, though the amplitude of the reproduction signal
is low. Where the recording mark is transferred as in FIGS. 2 to 5,
it is desirable for the melting point Tmr to be set to fall within
a range of between Tmr1 and Tmr2 shown in FIG. 2C. If the melting
point Tmr is set in this fashion, a mark of a size equal to that of
the mark in the recording layer is transferred to the reproducing
layer. The particular situation is as shown in FIGS. 2D and 2E. It
should be noted that only one mark in the center of the reproducing
beam is transferred to the reproducing layer in spite of the
situation that the reproducing spot itself includes a plurality of
marks and spaces in the recording layer. It follows that the
reproducing operation can be performed significantly while avoiding
the inter-symbol interference and the cross talk.
[0077] FIGS. 3A to 3E show the situation of the transfer at time t2
when the recording medium is further moved from time t1 to the left
relative to the reproducing spot by substantially half the mark so
as to allow the center of the reproducing beam to coincide
substantially with the boundary portion between the mark and the
space of the recording layer. In this case, a single mark is
transferred to the reproducing layer even if the melting point Tmr
is set at a level not lower than Tmr 3 and not higher than Tmr1 so
as to make it possible to perform significant reproduction.
[0078] FIGS. 4A to 4E show the situation of the transfer at time t3
when the recording medium is further moved from time t2 to the left
by substantially half the mark so as to allow the center of the
reproducing beam to coincide substantially with the center of the
space of the recording layer. In this case, the mark adjacent to
the space that is to be reproduced is not transferred at all, if
the melting point Tmr is set at Tmr1 shown in FIG. 4C. If the
temperature Tmr2 or the temperature Tmr3 is selected as the melting
point Tmr, the adjacent mark is partly transferred to the
reproducing layer. However, where the transfer portion is
sufficiently small and the amplitude of the reproduction signal is
not greatly impaired, it is possible to set the melting point Tmr
at a level lower than the temperature Tmr1, e.g., at Tmr2 or Tmr3.
In this typical example, it is most desirable for the melting point
Tmr to be set at the temperature Tmr1.
[0079] FIGS. 5A to 5E show the situation of the transfer at time t4
when the recording medium is further moved from time t3 to the left
by substantially half the mark so as to allow the center of the
reproducing beam to coincide substantially with the boundary
portion between the mark and the space of the recording layer. In
this case, the situation of the transfer is substantially equal to
that shown in FIGS. 3A to 3E.
[0080] The principle of the typical transfer reproduction in the
present invention is as described above. In the embodiment of the
present invention, it is an important condition that the mark or
space, once transferred, could be restored to the state before the
transfer after removal of the reproducing beam. If the particular
condition fails to be satisfied, a transfer mark train would
remain, with the result that it is impossible to reproduce
significantly the same track after the second reproduction or
later. The typical example of the process for restoring the
reproducing layer after the transfer reproduction to the state
before the transfer will now be described. Incidentally, there are
several modifications concerning the restoring process as described
hereinafter.
[0081] (2-2. Typical example of restoring process after the
transfer operation):
[0082] In this case, the restoring process conforming with the
typical example of the transfer reproduction processes described
above is mainly described. The other restoring processes will be
described hereinafter under item (4) of "Modifications of the
transfer reproduction process and the magnified transfer
reproduction process".
[0083] In the typical transfer reproduction process described
above, the initial state of the phase-change reproducing layer
(i.e., the state before the transfer) is crystalline, and the
absorbance of the reproducing layer is increased in the mark
portion of the recording layer. Also, that portion of the
reproducing layer heated to a temperature not lower than the
melting point Tmr is melted so as to cause the mark of the
recording layer to be transferred to the molten portion, with the
result that the optical response in the molten portion of the
reproducing layer is rendered markedly different from that in the
portion that is not melted so as to make it possible to achieve
reproduction.
[0084] In the case of the typical example of the transfer
reproduction described above, the restoration after the melting and
transfer implies the recrystallization after passage of the
reproducing beam. The recrystallization after the melting is known
in the art in the ordinary phase-change recording technology. In
the present invention, the recrystallization after the melting is
positively utilized.
[0085] FIG. 6 is a graph exemplifying the change with time (t) in
the temperature (Tr) of the reproducing layer (temperature
hysteresis) in the transfer process. In the graph of FIG. 6, Tmr
denotes the melting point of the reproducing layer, Txr denotes the
crystallizing temperature of the reproducing layer, and txr denotes
the time required for the reproducing layer to pass through the
temperature zone in which the crystallization can be achieved in
the cooling process after the transfer.
[0086] FIG. 7 is a graph showing the relationship between the
temperature Tr of the reproducing layer and the frequency function
(.upsilon.r) of the crystallization in the reproducing layer. In
the graph of FIG. 7, Gr denotes the frequency function of the
crystal growth, and Nr denotes the frequency function of the
crystal nucleus formation. It is widely known to the art in the
field of the phase-change material that the crystallizing time
(.tau.) of the material of the phase-change film is changed
depending on the constituent elements, the composition thereof and
the thickness of the phase-change film. In the phase-change
reproducing layer according to the present invention, the
crystallizing time (.tau.xr) is set shorter than the time txr shown
in FIG. 6. The time txr is dependent on the moving speed (linear
velocity: Vl) of the medium relative to the reproducing light, on
the strategy in the reproducing stage (the ordinary reproduction
being performed in a DC manner), and on the thermal response of the
medium. If the thermal design and the selection of the material of
the phase-change reproducing layer are carried out in view of the
linear velocity Vl, the reproduction strategy, and the thermal
response the medium, it is possible to satisfy the condition of
.tau.xr<txr. The examples of the specific materials will be
described hereinafter. Also, the crystallization after the melting
of the reproducing layer takes place in the temperature zone lower
than the melting point Tmr and not lower than the temperature Txr.
In the temperature zone close to the melting point Tmr, the crystal
growth is predominant as shown in FIG. 7, and in the temperature
zone close to the crystallizing temperature Txr, the crystal
nucleus formation is predominant. It is also possible to set Gr and
Nr at appropriate values by selecting the constituting elements and
the composition of the phase-change reproducing layer.
[0087] Also, in the case of selecting the phase-change reproducing
layer in which the crystallizing temperature Txr is not higher than
the temperature of the environment in which the medium is used, it
is clearly possible to restore the reproducing layer to the initial
state until the next reproducing operation even if txr is shorter
than .tau.xr.
[0088] In such a manner, the molten transfer portion of the
phase-change reproducing layer is recrystallized and restored to
the state before the transfer after passage of the reproducing
laser beam. It follows that it is possible to realize the transfer
reproduction process as already described in conjunction with FIGS.
2 to 5.
[0089] (3) Typical example of the magnified transfer reproduction
process:
[0090] Typical example of the magnified transfer reproduction
process according to an embodiment of the present invention will
now be described with reference to the accompanying drawings. FIGS.
8 and 9 are intended to explain the typical principle of the
magnified transfer reproduction process of the present invention.
The members performing the functions equal to those performed by
the members shown in the drawings referred previously are denoted
by the same reference numerals.
[0091] FIGS. 8 and 9 show the changes with time in the state,
covering the case where the recording medium is moved from the
right to the left relative to the reproducing beam, like FIGS. 2 to
5. To be more specific, FIG. 8 corresponds to the state at time t1,
and FIG. 9 corresponds to the state at time t3. Incidentally, time
t1 and time t3 are as defined previously.
[0092] Also, FIGS. 8A to 8C and 9A to 9C correspond to FIGS. 2C to
2E, 3C to 5E, 2D to 5D and 2E to 5E. Since the states corresponding
to FIGS. 2A, 2B, 3A, 3B, 4A, 4B, 5A and 5B are exactly the same in
FIGS. 8 and 9, the states corresponding to these drawings are
omitted in FIGS. 8 and 9. To be more specific, FIGS. 8A and 9A are
graphs each showing the temperature distribution of the
phase-change reproducing layer in the magnified transfer
reproduction process. FIGS. 8B and 9B are cross-sectional views
showing the recording medium after the transfer operation. Further,
FIGS. 8C and 9C are plan views of the recording medium after the
transfer as viewed from the side of the reproducing layer 13.
[0093] The basic idea of the magnified transfer reproduction is to
utilize the sharp temperature distribution in the in-plane
direction of the phase-change reproducing layer formed in the
transfer stage. The principle of magnified transfer reproduction
according to the present invention will now be described with
reference to FIGS. 8 and 9. In FIG. 8A, the temperature of the
region in the vicinity of the center of the phase-change
reproducing layer corresponding to the mark in the recording layer
is selectively elevated, and the temperature of the phase-change
reproducing layer is lowered in the portion corresponding to the
space in the recording layer. In other words, a sharp thermal
diffusion is generated in the in-plane direction of the
phase-change reproducing layer, as denoted by arrows in FIG. 8A. In
accordance with the thermal diffusion, the mark transferred to the
phase-change reproducing layer is expanded in the in-plane
direction of the film, with the result that the mark is magnified
to a size larger than the size of the mark in the recording layer
as shown in FIGS. 8B and 8C.
[0094] In the present invention, the process of magnified transfer
reproduction is not absolutely necessary. However, the particular
process provides a preferred embodiment of the present invention.
In order to facilitate the process of magnified transfer
reproduction, it is possible to take various measures. For example,
it is desirable to use materials having a high thermal conductivity
for forming the reproducing layer, to increase the thickness of the
reproducing layer as much as possible within the range capable of
establishing the present invention, and to use materials having a
low thermal conductivity for forming the first interference layer
and the separating layer on the upper and lower surfaces of the
reproducing layer in order to promote the thermal diffusion in the
in-plane direction while preventing the heat conduction in the
thickness direction of the film.
[0095] In order to produce prominently the effect of the
high-density recording-reproduction in the present invention, it is
desirable for the mark and the space formed in the recording layer
to be as small as possible, compared with the reproducing spot
size. It should be noted, however, that, where the transfer
reproduction are carried out in accordance with the principle shown
in FIGS. 2 to 5, the ratio of the area occupied by the mark in the
reproducing spot is rendered small, which is disadvantageous in
terms of the amplitude of the reproduction signal. Incidentally, it
is of course possible to obtain the effect of eliminating the
inter-symbol interference and the cross talk so as to make it
possible to achieve a significant reproduction. On the other hand,
it is more desirable to magnify the transfer mark by utilizing the
sharp temperature distribution in the in-plane direction of the
phase-change reproducing layer because the amplitude of the
reproduction signal can be improved in this case.
[0096] FIG. 9A shows the temperature distribution in the
reproducing layer, covering the case where the reproducing spot
substantially coincides with the center of the space in the
recording layer. In this case, the thermal diffusion in the
reproducing layer is exerted in the direction denoted by arrows in
the drawing so as to seemingly shorten the space transferred to the
reproducing layer. Where the thermal diffusion has taken place,
however, the highest temperature itself is rendered lower than the
temperature Tmr1, with the result that the mark adjacent to the
space in the recording layer is not transferred at all to the
reproducing layer. Since the initial state (the state before the
transfer) of the phase-change reproducing layer is crystalline in
this example, too, the reproducing layer exhibits the states shown
in FIGS. 9B and 9C at time t3, and the signal level is equal to
that in the case of FIG. 4.
[0097] In order to perform effectively the magnified transfer
reproduction, it is useful to set the modulation scheme and the
write strategy such that the shortest mark length is rendered
longer than the shortest space length or the shortest mark length
is rendered shorter than the shortest space length. In the typical
example of the magnified transfer reproduction, it is desirable for
the shortest mark length to be set shorter than the shortest space
length.
[0098] FIGS. 10A to 10C exemplify the processes of the magnified
transfer reproduction in which the shortest mark length is set
shorter than the shortest space length. FIGS. 10A to 10C show the
state at time t3 like FIGS. 9A to 9C. The shortest mark length can
be set shorter than the shortest space length by the modulation
scheme and the write strategy in the recording stage, which is one
of the features of the optical recording-reproducing apparatus of
the present invention. In this case, the adjacent mark is not
transferred at all in transfer reproducing the space even if the
melting point Tmr is set at the temperature Tmr4 that is lower than
the temperature Tmr1 shown in each of FIGS. 8A and 9A, because the
space length is large.
[0099] Also, if the temperature Tmr4 is not lower than the
temperature Tmr2 shown in FIG. 8A, which is not particularly shown
in the drawing, the process of the magnified transfer reproduction
apparently take place at time t1 exactly as in FIG. 8. Also, the
lower limit of the temperature Tmr4 is not equal to the temperature
Tmr2. It is possible for the lower limit of the temperature Tmr4 to
be lower than the temperature Tmr2 as far as the space length is
set longer in FIG. 10.
[0100] FIGS. 11A to 11 show the process of magnified transfer
reproduction for the comparative case (not the prior art). FIGS.
11A to 11C show the states at time t3 like FIGS. 9A to 9C. FIGS.
11A to 11C cover the case where the mark length is substantially
equal to the space length in the recording layer and the melting
point Tmr is equal to the temperature Tmr 4. The broken line shown
in FIG. 11A denotes the temperature distribution before the thermal
diffusion takes place in the in-plane direction of the reproducing
layer, and the solid line denotes the temperature distribution
after occurrence of the thermal diffusion. In this case, the edge
portion of the adjacent mark in the recording layer is transferred
to the reproducing layer even before the occurrence of thermal
diffusion in the in-plane direction of the reproducing layer.
However, the transfer portion is magnified after the thermal
diffusion and the reproducing level of the space is shifted to the
reproducing level of the mark so as to lower the amplitude of the
reproduction signal. It should be noted, however, that, if the
shift amount of the space reproducing level falls within an
allowable level in terms of the system, it is possible for the
effect of the present invention to be exhibited even in the
embodiment shown in FIG. 1.
[0101] (4) Modifications of the transfer reproduction process and
the magnified transfer reproduction process:
[0102] Various modifications of the transfer reproduction process
and the magnified transfer reproduction process described above
will now be described. Table 1 shows the conditions of the typical
example and modifications of the transfer (or magnified transfer)
reproduction process. To be more specific, the conditions for the
transfer (or magnified transfer) reproduction are shown in Table 1
by defining the transfer in accordance with the initial state (the
state before the transfer) of the phase-change reproducing layer
and the state of the recording layer.
1TABLE 1 Typical Example (No. 1) and Modifications (Nos. 2 to 6) of
Transfer (or Magnified Transfer) Reproduction Process Initial state
of State of Examples of conditions of transfer (or reproducing
recording layer magnified transfer) reproduction No. layer Mark (M)
Space (S) Transfer Masking Transfer Reproduction Restoration 1
Crystalline c.fwdarw.m c.fwdarw.c Normal Rcr (M).about. Acr
(M).about. Rmr (M) .noteq. Rcr (S) .tau.xr < txr (c) (a) Rcr (S)
Amr (M) > Acr or or or (S) .PHI. mr (M) .noteq. .PHI. Txr <
Ta .PHI. cr (M).about. cr (S) .PHI. cr (S) 2 Ditto c.fwdarw.c
c.fwdarw.m Reverse Rcr (M).about. Acr (S).about. Rmr (S) .noteq.
Rcr (M) .tau.xr < txr (a) Rcr (S) Amr (S) > Acr or or or (M)
.PHI. mr (S) .noteq. .PHI. Txr < Ta .PHI. cr (M).about. cr (M)
.PHI. cr (S) 3 Ditto c.fwdarw. c.fwdarw.c Normal Rcr (M).about. Acr
(M).about. Rc'r (M) .noteq. Rcr (S) .tau.xr < txr coarse c Rcr
(S) Ac'r (M) > Acr or or or (S) .PHI. c'r (M) .noteq. .PHI. Txr
< Ta .PHI. cr (M).about. cr (S) .PHI. cr (S) 4 Ditto c.fwdarw.m
c.fwdarw. Reverse Rcr (M).about. Acr (S).about. Rc'r (S) .noteq.
Rcr (M) .tau.xr < txr (a) coarse c Rcr (S) Ac'r (S) > Acr or
or or (M) .PHI. c'r (S) .noteq. .PHI. Txr < Ta .PHI. cr
(M).about. cr (M) .PHI. cr (S) 5 Amorphous a.fwdarw.c a.fwdarw.a
Reverse Rar (M).about. Aar (M).about. Rcr (M) .noteq. Rar (S)
Irradiation (a) Rar (S) Acr (M) > Aar or with or (S) .PHI. cr
(M) .noteq. .PHI. restoring .PHI. ar (M).about. ar (S) light .PHI.
ar (S) 6 Ditto a.fwdarw.a a.fwdarw.c Normal Rar (M).about. Aar
(S).about. Rcr (S) .noteq. Rar (M) Irradiation Rar (S) Acr (S) >
Aar or with or (M) .PHI. cr (S) .noteq. .PHI. restoring .PHI. ar
(M).about. ar (M) light .PHI. ar (S)
[0103] The various conditions for the transfer reproduction shown
in Table 1 will now be described. The conditions for preventing the
mark and the space in the recording layer from being optically
modulated (no substantial optical change as viewed from the
reproducing optical system) under the state before the transfer are
shown in the column of "masking". The conditions for allowing the
mark or the space in the recording layer to be selectively
transferred to the phase-change reproducing layer are shown in the
column of "transfer". The conditions for allowing the transfer
portion and the non-transfer portion to be optically modulated
(there is a significant optical change as viewed from the
reproducing optical system) after the selective transfer of the
mark or the space in the recording layer to the phase-change
reproducing layer are shown in the column of "reproduction".
Further, the conditions for restoring the transfer portion of the
phase-change reproducing layer to the initial state after passage
of the reproducing beam are shown in the column of
"restoration".
[0104] Before explaining the conditions, the definition of the
symbols included in the conditional formulas given in Table 1 will
now be described. Specifically, "R" in Table 1 denotes the
reflectance of the reproducing layer as viewed from the reproducing
optical system, ".phi." denotes the phase of the reproducing layer
as viewed from the reproducing optical system, and "A" denotes the
absorbance of the reproducing layer. The subscripts of the symbols
denote the states of the reproducing layer. Specifically, the
subscript "c" denotes the crystalline state, the subscript "m"
denotes the molten state, the subscript "c'" denotes the coarse
crystalline state, and the subscript "a" denotes the amorphous
state. Further, the subscript "r" accompanying all the symbols
denotes the reproducing layer. In Table 1, it is unnecessary to use
the subscript "r". However, the subscript "r" is useful for the
clear distinction from the subscript "w" accompanying the recording
layer, which will be referred to hereinafter. The symbol put in the
parenthesis denotes the state of the recording layer. Specifically,
"M" denotes the mark, and "S" denotes the space. Further, ".tau.xr"
denotes the crystallizing time of the reproducing layer, "txr"
denotes the time required for the passage through the temperature
zone capable of crystallization during the cooling process of the
reproducing layer after the transfer, "Txr" denotes the
crystallizing temperature of the reproducing layer, and "Ta"
denotes the temperature of the environment in which the medium is
used. For example, "Rcr(M)" denotes the reflectance when the
reproducing layer r corresponding to the mark M of the recording
layer is under a crystalline state c.
[0105] No. 1 given in Table 1 denotes a typical example of the
transfer reproduction process. Since the details of the transfer
reproduction process are already described under item (2), the
various conditions for the transfer reproduction (examples of main
conditions) will be mainly described in the following. Although the
transfer reproduction processes are mainly described in the
following, the magnified transfer reproduction processes can be
performed by utilizing the sharp temperature distribution in the
vicinity of the transfer portion in the reproducing layer. Such
being the situation, it is obvious that the magnified transfer
reproduction processes can be performed in any of the modifications
as in the typical example described previously in detail in item
(3).
[0106] As already described in detail in item (2), a series of
processes including the melting of the phase-change reproducing
layer corresponding to the mark of the recording layer, the
generation of the optical change from the non-transfer portion by
the melting, and the recrystallization of the transfer portion
after passage of the reproducing beam constitute the principle of
the transfer reproduction in the typical example (No. 1). First of
all, it is necessary for the mark and the space in the recording
layer not to be optically modulated (no substantial optical change
as viewed from the reproducing optical system) before the transfer
reproduction. To be more specific, it is necessary for a plurality
of marks and spaces included in the reproducing spot to be
optically equal to each other as viewed from the side of the
reproducing beam in, for example, FIG. 2A. In a sense of masking
the mark or the space, this is termed the masking condition.
[0107] The masking condition in the reproduction based on the
reflectance difference is that, in the reproducing layer before the
transfer, the reflectance (Rcr(M)) in a portion corresponding to
the mark should be substantially equal to the reflectance (Rcr(S))
in a portion corresponding to the space. Also, the masking
condition in the reproduction based on the phase difference is
that, in the reproducing layer before the transfer, the phase
(.phi.cr(M)) in a portion corresponding to the mark should be
substantially equal to the phase (.phi.cr(S)) in a portion
corresponding to the space. It is unnecessary for the reflectance
Rcr(M) to coincide perfectly with the reflectance Rcr(S). It is
possible for the reflectance Rcr(M) to differ from the reflectance
Rcr(S) by several % to about 10%. Likewise, it is possible for the
phase .phi.cr(M) to differ from the phase .phi.cr(S) by about
scores of degrees. With increase in reflectance difference or the
phase difference after the transfer, which is to be described
hereinafter, the allowable amount of the reflectance difference or
the phase difference before the transfer is increased.
[0108] The transfer condition is that each of the absorbance Acr(M)
in a portion corresponding to the mark in the reproducing layer
before the transfer and the absorbance Amr(M) in a portion
corresponding to the mark in the reproducing layer after the
transfer is higher than the absorbance Acr(S) in a portion
corresponding to the space in the reproducing layer before and
after the transfer. It should be noted that, concerning the
condition required for the transfer, it is necessary for the
absorbance Acr(M) to be higher than the absorbance Acr(S), and it
is not absolutely necessary for the absorbance Amr(M) to be high.
However, if the absorbance of the transfer portion is rendered
excessively low after the melting and the transfer, it is possible
for the molten section to be partly crystallized during the
transfer and the reproduction. Thus, it is desirable for the
absorbance Amr(M) to be set higher than the absorbance Acr(S). It
is described that the absorbance in a portion corresponding to the
space in the reproducing layer before the transfer would coincide
with that after the transfer. This is because there is no optical
change in the space between the state before the transfer and the
state after the transfer, as apparent from the principle described
previously in item (2). It should be noted, however, that the
present invention can be achieved even if an optical change (such
as the absorbance or the reflectance) in the space has been
generated in the space of the reproducing layer between the state
before the transfer and the state after the transfer by the other
factor such as the temperature elevation caused by irradiation with
the reproducing beam.
[0109] The reproduction condition for reproduction based on the
reflectance difference is that, in the reproducing layer after the
transfer, the reflectance Rmr(M) in a portion corresponding to the
mark should be different from the reflectance Rcr(S) in a portion
corresponding to the space. Also, the reproduction condition for
reproduction based on the phase difference is that, in the
reproducing layer after the transfer, the phase .phi.mr(M) in a
portion corresponding to the mark should be different from the
phase .phi.cr(S) in a portion corresponding to the space. It is
desirable for the difference between the reflectance Rmr(M) and the
reflectance Rcr(S) and the difference between the phase .phi.mr(M)
and the phase .phi.cr(S) to be as large as possible because the
amplitude of the reproduction signal is increased with an increase
in the difference noted above.
[0110] The restoring condition is as already described in item
(2-2).
[0111] Next, transfer (or magnified transfer) reproduction
processed and conditions thereof for modifications will be
described. As shown in Table 1, three modifications (Nos. 2 to 4)
of transfer (or magnified transfer) reproduction are included in
the case where the initial state of the phase-change reproducing
layer is crystalline, and two modifications (Nos. 5 and 6) are
included in the case where the initial state of the phase-change
reproducing layer is amorphous.
[0112] No. 2 is directed to a modification in which the absorbance
of the phase-change reproducing layer is controlled to be low in
the mark of the recording layer and to be high in the space, which
is opposite to that in the case of No. 1. In this case, the
temperature of the phase-change reproducing layer is elevated in
the portion corresponding to the space of the recording layer, and
the temperature elevation is suppressed in the portion
corresponding to the mark. The details of the transfer (or
magnified transfer) reproduction process are similar to those
described previously in items (2) and (3), except that the mode of
the transfer is rendered opposite to that in the typical example of
No. 1 (reverse transfer). Also, concerning the conditions for the
transfer and the reproduction, it suffices to reverse the mark and
the space in the case of the typical example of No. 1 and, thus,
the detailed description is omitted.
[0113] No. 3 is directed to the case where the absorbance of the
phase-change reproducing layer is controlled to be low in a portion
corresponding to the mark of the recording layer and to be high in
a portion corresponding to the space, and the temperature of the
transfer portion is not elevated to reach the melting point Tmr of
the phase-change reproducing layer but is elevated to the level not
lower than the crystallizing temperature Txr. In this case, it is
desirable for the initial state of the phase-change reproducing
layer to be rendered microcrystalline. However, it is possible to
control the diameter of the crystal grain in the initial state by
the selection of the phase-change reproducing layer and the
initializing conditions. It is known to the art that the optical
constant of the material of the phase-change film is changed
depending on the diameter of the crystal grain. This is utilized in
each of the modified examples Nos. 3 and 4. As already shown in
FIG. 7, a region (Gr) in which the crystal growth is predominant,
which is present in a portion close to the melting point Tmr, is
included in the temperature zone in which the phase-change
reproducing layer can be crystallized. Therefore, even if the
temperature of the reproducing layer in the transfer stage is lower
than the melting point Tmr, the diameter of the crystal grain in
the transfer portion can be increased when the temperature of the
reproducing layer is elevated to the region of high Gr shown in
FIG. 7. As a result, an optical change is generated so as to make
it possible to perform the reproduction operation. In this case, it
is possible to obtain the essential effect of the present
invention, though the amplitude of the reproduction signal is
rendered low, compared with the typical example of No. 1 and the
modified example of No. 2, because the change in the optical
constant between the fine crystal and the coarse crystal is
utilized. Also, in each of the typical example of No. 1 and the
modified example of No. 2, the recrystallization after the melting
is utilized for the restoration of the reproducing layer to the
initial state after the transfer. On the other hand, in each of the
modified examples of Nos. 3 and 4, the crystal portion coarsened in
the transfer stage is passed through the temperature zone having a
high nucleus forming frequency (Nr) as shown in FIG. 7 in the
cooling process after passage of the reproducing beam, with the
result that the crystal portion can be restored again to the
initial microcrystalline state. It may be reasonable to state that
reverse transfer is achieved in the modified example of No. 3 in
the sense that the phase-change reproducing layer corresponding to
the mark of the recording layer is rendered coarse crystalline
state. However, the transfer for the modified example of No. 3 is
defined to be the normal transfer because the transfer is equal to
that in the typical example of No. 1 in the sense that the
temperature of the phase-change reproducing layer corresponding to
the mark of the recording layer is selectively elevated so as to
change the optical constant. The transfer condition for the
modified example of No. 3 is as shown in Table 1 and, thus, the
detailed description thereof is omitted.
[0114] The modified example of No. 4 is already described partly in
conjunction with the modified example of No. 3. The relationship
between the modified examples of Nos. 3 and 4 is similar to that
between the typical example of No. 1 and the modified example of
No. 2. To be more specific, in the modified example of No. 3, the
temperature of the phase-change reproducing layer corresponding to
the mark of the recording layer is selectively elevated so as to
form the coarse crystal. On the other hand, in the modified example
of No. 4, the temperature of the phase-change reproducing layer
corresponding to the space of the recording layer is selectively
elevated so as to form the coarse crystal (reverse transfer). The
process thereafter is equal to that for the modified example of No.
3. Also, concerning the transfer reproduction conditions, it
suffices to reverse the mark and the space for the modified example
of No. 3.
[0115] Each of the modified examples of Nos. 5 and 6 is directed to
the case where the initial state of the phase-change reproducing
layer is amorphous. To make the initial state of the phase-change
reproducing layer amorphous, it suffices to use the amorphous state
as deposited or to initialize the molten state at such a linear
velocity as not to cause recrystallization. The details of these
modified examples are equal to those for the typical example of No.
1. It is possible to design the change in the absorbance of the
reproducing layer in accordance with the recording mark and the
space when the phase-change reproducing layer is in the amorphous
state by controlling the construction, the material, the deposition
conditions and the thickness of each of the first interference
layer, the second interference layer, the separating layer, and the
reflecting layer shown in FIG. 1. In the modified example of No. 5,
the absorbance of the phase-change reproducing layer corresponding
to the recording mark is selectively set at a high value, and the
reproducing layer is heated to the temperature falling within the
range between the crystallizing temperature and the melting point
so as to crystallize the transfer portion. The modified example of
No. 5 is equal to the typical example of No. 1 in the sense that
the temperature of the phase-change reproducing layer corresponding
to the mark of the recording layer is selectively elevated so as to
change the optical constant. However, since the mark of the
recording layer is transferred to the reproducing layer in the form
of a crystal, the transfer for the modified example of No. 5 is
defined as reverse transfer. In the modified example of No. 6, the
temperature of the phase-change reproducing layer corresponding to
the space of the recording layer, which is opposite to that for the
modified example of No. 5, is selectively elevated to the level not
lower than the crystallizing temperature for achieving the transfer
and the reproduction in the form of a crystal. The transfer for the
modified example of No. 6 is defined as normal transfer. The
modified examples of Nos. 5 and 6 differ from the modified examples
of Nos. 3 and 4 in that it is not absolutely necessary to elevate
the temperature in the reproducing layer of the transfer portion to
the temperature zone having a high value of Gr in FIG. 7, and it
suffices to elevate the temperature noted above to about the
temperature zone having a high value of Nr.
[0116] The transfer and the reproduction conditions for the
modified examples of Nos. 5 and 6 are as shown in Table 1 and,
thus, the detailed description of these conditions is omitted. It
should be noted, however, that modified examples of Nos. 5 and 6
differ from the examples of No. 1-4 in the restoration condition.
Where the transfer portion of crystal is formed in the reproducing
layer whose initial state is amorphous, it is impossible to restore
again the transfer portion to the initial amorphous state in the
cooling process at the time when the reproducing beam is moved
away. It follows that a positive means for restoring the
reproducing layer to the state before the transfer after the
process of the transfer (or magnified transfer) reproduction is
required in each of the modified examples of Nos. 5 and 6. The
particular means includes, for example, the means for bringing the
track in reproduction to the initial amorphous state at a linear
velocity high enough not to bring about the recrystallization. It
is possible for this means to be a light beam equal to at least one
of the light beams used for the recording and for the reproduction.
It is also possible to use another light beam irradiating means as
the particular means. Also, as described in conjunction with the
recording principle described hereinafter, the present invention
includes the embodiment that the temperature of the phase-change
reproducing layer is elevated during the recording operation to
form a molten state either in the formation of mark or in the
formation of space. Therefore, it is possible to initialize the
reproducing layer by utilizing the particular recording operation.
Where the reproducing operation of the same track is consecutively
carried out a plurality of times, the initializing operation,
differing from the reproducing operation and the recording
operation, is required after the reproduction carried out once. In
this case, it is possible to perform the operation requiring two
rotations by using a recording or reproducing beam. It is also
possible to perform the initializing operation by means of
irradiation with another light beam.
[0117] The means for initializing the reproducing layer is
absolutely required in each of the modified examples of Nos. 5 and
6. However, the means for initializing the reproducing layer is not
absolutely required in the transfer (or magnified transfer)
reproduction processes shown in Table 1 other than those. However,
it is possible to employ a positive means such as irradiation with
an initializing beam as in the modified examples of Nos. 5 and 6 in
the case where the melting and recrystallization in the cooling
process after the transfer is insufficient as in the typical
example of No. 1 and the modified example of No. 2 and in the case
where the microcrystallization in the cooling process after the
transfer is insufficient as in each of the modified examples of
Nos. 3 and 4.
[0118] (5) Principle of the recording
[0119] Typical examples will now be described in respect of the
recording principle suitable for the present invention. The basic
concept of the present invention is to cope with the high-density
recording by the transfer reproduction. In order to realize a
sufficiently high recording density, it is desirable to form in the
recording stage the recording mark and the space at the size not
larger than the reproducing resolution.
[0120] The simplest means for forming the recording mark and the
space at the size not larger than the reproducing resolution is to
make the size of the recording beam smaller than the size of the
reproducing beam, i.e., to change at least one of .lambda. and NA.
However, this measure is not desirable in that the optical system
is rendered complex.
[0121] Where the recording and reproduction are carried out by
using the same optical system, the simplest method for forming the
recording mark and the space in the size not larger than the
reproducing resolution is the method (i.e., the so-called "pen-tip
recording") using the rise portion of the .GAMMA.-characteristics
(the rise characteristics of the signal amplitude relative to the
recording power). However, this method is not practical because the
fluctuation of the recording mark and the space is rendered very
large relative to the temperature of the environment in which the
medium is used. It is conceivable to control strictly the recording
power by monitoring the temperature of the environment in which the
medium is used. However, it is difficult to achieve a perfect
control because the temperature of the environment in which the
medium is used is not necessarily coincident with the temperature
of the nonirradiated portion of the recording layer.
[0122] Under the circumstances, the means for stably forming the
recording mark and the space in the size not larger than the
reproducing resolution will now be described, covering the case
where the recording and the reproduction are carried out by using
the same optical system. The recording layer is not particularly
limited in the present invention. It is possible for the recording
layer to be freely selected from the group consisting of a
phase-change recording layer, a write-once recording layer and a
read-only recording layer. The following describes the means for
forming the recording mark and the space in the size not larger
than the reproducing resolution by using the same optical system
both in recording and reproducing operations for each kind of the
recording layer.
[0123] (5-1. Phase-change recording layer):
[0124] The recrystallization in the cooling process after the
recording in the phase-change recording is known to the art as
described previously in item 2-2 directed to the restoration of the
phase-change reproducing layer to the initial state after the
transfer. Where a phase-change recording layer is used, the
recrystallization phenomenon after the melting is used. FIG. 12 is
a graph showing the changes with time (t) in the temperature (Tw)
of the recording layer (temperature hysteresis) in the stage of
forming the recording mark (amorphous mark) in the recording
process. Tmw shown in the graph denotes the melting point of the
recording layer, Txw denotes the crystallizing temperature of the
recording layer, and txw denotes the time required for the passage
of the recording layer through the temperature region in which the
recrystallization can be achieved in the cooling process after the
melting. FIG. 13 is a graph showing the relationship between the
frequency function (.upsilon.w) for the crystallization of the
recording layer and the temperature (Tw) of the recording layer. Gw
shown in the graph denotes the frequency function for the crystal
growth of the recording layer, and Nw denotes the frequency
function for the crystal nucleus formation in the recording
layer.
[0125] The frequency functions Gw and Nw can be controlled by means
of the constituent elements and composition of the recording layer
and the deposition method of the recording layer. The time txw is
dependent on the linear velocity in the recording stage, the
recording power (Pw), the write strategy in the recording, and the
thermal response of the medium. The crystallizing time (.tau.w) of
the recording layer is determined by the frequency functions Gw and
Nw. However, it is possible to form in the recording layer the mark
and the space of the size smaller than the resolution of the
recording beam by designing appropriately the relationship between
the crystallizing time .tau.w and the time txw.
[0126] FIGS. 14 and 15 exemplify the formation in the recording
layer of the mark and the space having the size smaller than the
resolution of the recording beam. In FIGS. 14 and 15, the members
performing the functions equal to those performed by the members
shown in the drawings referred to previously are denoted by the
same reference numerals.
[0127] FIG. 14 shows the state that the recording layer is
irradiated with a recording beam at a power level to form a
recording mark (Pw) at time t1. FIG. 15 shows the state that the
recording layer is irradiated with a recording beam at a power
level to form a crystal space (Pe) at time t2 after time t1. Each
of FIGS. 14A and 15A is a cross-sectional view showing the
recording medium in the recording process. The hatched portion
denotes the molten portion or the amorphous portion. Also, each of
FIGS. 14B and 15B is a graph showing the temperature distribution
in the recording layer.
[0128] In the case of selecting the power Pw, which is stable and
has a wide margin in the .GAMMA. characteristics, in place of the
pen-tip recording, that portion of the recording layer which
corresponds substantially to the full width at half maximum (FWHM)
in the recording beam is melted. The FWMH diameter can be
substantially given by .lambda./(2NA), where .lambda. represents
the recording wavelength, and NA denotes the numerical aperture of
the objective lens. FWHM is about 330 nm in the case where .lambda.
is 413 nm and NA is 0.65 as referred to hereinafter. The size of
that portion of the optical recording layer 15 hatched in FIG. 14A
corresponds to FWHM. As shown in FIG. 14B, the molten portion of
the reproducing layer 13 is broader than the molten portion of the
recording layer 15. However, the molten portion of the reproducing
layer 13 is restored to the initial state after passage of the
recording beam, as described previously.
[0129] In the recording layer 15, a region of about FWHM is once
melted. However, it is possible for the molten region to be partly
recrystallized when the recording power is changed from Pw to Pe.
FIG. 15 shows the particular situation. The molten portion at time
t1 is denoted by M(t1), and the position of the recording layer 15
melted at time t1 and recrystallized at time t2 is denoted by X. To
be more specific, the molten portion positioned at X(t1) at time t1
is moved to the position of X(t2) at time t2 by the movement of the
medium. Where t2-t1, Pw, Pe and the write strategy are set
appropriately, the point X is recrystallized during the time zone
of t2-t1. As a result, only that portion of the optical recording
layer 15 hatched in FIG. 15A is formed as an amorphous mark.
Concerning the recrystallization of the point X during the time
zone of t2-t1, it is possible for Gw shown in FIG. 13 to be
predominant or for Nw to be predominant. However, according to a
conventional report, it is more desirable for Gw to be predominant
in order to make prominent the melting and recrystallization. The
description given above covers the preferred recording process in
the case of employing a phase-change recording layer.
[0130] (5-2. Write-once recording layer):
[0131] The write-once recording layer includes a recording layer
(so-called "R") using an organic dye represented by a
phthalocyanine dye or an azo dye and a recording layer (so-called
"WO" or "WORM") using an inorganic recording layer represented by,
for example, Ge--Te, Te--C, Te--O.sub.x, or Te--Pd--O.sub.x. In the
case of using these materials, it is impossible to employ the means
such as the melting and recrystallization of the phase-change
recording layer described previously in item (5-1). In the case of
using these materials, it is advisable to make the recording beam
finer than the reproducing beam or to use the pen-tip recording.
However, in the case of the phase-change WORM recording layer in
which the crystallizing time is very long (unlikely to be
crystallized) such as GeTe, it is possible to utilize the melting
and recrystallization described previously in item (5-1) in the
method of decreasing the moving velocity of the medium in the
recording stage.
[0132] (5-3. ROM)
[0133] As known to the art, the recording of ROM is performed by
mastering process. It is relatively easy to form the mark (pre-pit)
and the space smaller than the reproduction limit by the wavelength
of the light and NA used in the mastering. In the case of using an
electron beam mastering, it is possible to record the mark and
space further smaller than those formed by the light mastering. In
the case of employing the phase-change recording layer, the
magneto-optical recording layer or the write-once recording layer,
the header section is recorded in general as ROM. It follows that
the particular technology can be applied to any type of the
recording medium. However, where it is difficult to optimize the
processes of the magnified transfer reproduction in both the header
section and the data section, it is advisable to record in the
header section the mark and the space slightly larger than the
reproduction limit. Also, where the header section and the data
section differ from each other in the optimum reproducing power for
the magnified transfer reproduction, it is advisable to change the
reproducing power for the header section and for the data section.
This also constitutes a feature of the optical
recording-reproducing apparatus according to the present
invention.
[0134] (6) The material and deposition method of each of the layers
included in the optical recording medium of the present
invention:
[0135] The materials and deposition methods of each of the layers
included in the optical recording medium of the present invention
will now be exemplified. Suitable materials for each layer in
accordance with the construction shown in FIG. 1 are exemplified.
First of all, the phase-change reproducing layer will be described,
followed by describing the recording layer, the separating layer,
the first interference layer, the second interference layer, and
the heat control layer in the order mentioned. However, since the
three layers including the separating layer, the first interference
layer and the second interference layer are common to each other in
many respects, they will be described collectively.
[0136] (6-1. Phase-change reproducing layer):
[0137] The materials and the deposition methods for the
phase-change reproducing layer will be exemplified first.
[0138] The conditions for the transfer reproduction among the
various conditions required for the reproducing layer are as
already shown in Table 1 and described partly in item (4) directed
to the modifications of the transfer (or magnified transfer)
reproduction processes. The conditions shown in Table 1, which are
related to the selection of the materials of the reproducing layer,
are also deeply related to the selection of the materials
(particularly, the optical constant and the thermal constant), the
thickness and the depositing conditions of each layer included in
the recording medium. The reproducing layer is required to exhibit
a reversible phase-change (including the case of the irradiation
with a restoring light beam).
[0139] In the typical example of No. 1 and the modified example of
No. 2, such conditions as given below are required in order to melt
the transfer portion in the reproducing layer:
[0140] (i) The melting point (Tmr) of the phase-change reproducing
layer should be suitably low.
[0141] (ii) Since the phase-change reproducing layer is heated to a
considerably high temperature in the recording stage, the
phase-change reproducing layer should exhibit a high resistance to
the repeated heat hysteresis (as described hereinafter, the
temperature of the reproducing layer is not elevated abnormally
because of heat conduction in the in-plane direction and the
thickness direction.)
[0142] (iii) The phase-change reproducing layer should exhibit a
large optical change between the states before the transfer and
after the transfer, i.e., between the crystalline state and the
molten state (the optical change can be increased by the design of
all the layers included in the recording medium).
[0143] (iv) The crystallizing time (.tau.xr) of the phase-change
reproducing layer should be short or the crystallizing temperature
Txr should be low in order to meet the restoration condition (this
is also the case with the modified examples of Nos. 3 and 4.)
[0144] The requirements peculiar to the modified examples of Nos. 3
and 4 are that the phase-change reproducing layer should have an
appropriate value of the crystallizing temperature Txr (the
crystallizing temperature should not be excessively high), and that
the difference in the optical constant (complex refractive index)
between the microcrystals and the coarse crystals should be large
(which can be achieved by the design of all the layers included in
the recording medium) because the reproducing layer of the transfer
portion is coarsely crystallized. In the modified examples of Nos.
3 and 4, the temperature elevation of the reproducing layer can be
suppressed in the recording stage to the level considerably lower
than that for the typical example of No. 1 and the modified example
of No. 2. Such being the situation, the requirement for the
resistance to the repeated thermal hysteresis is not severe.
[0145] The requirement peculiar to the modified examples of Nos. 5
and 6 is that the phase-change reproducing layer should be restored
to the initial amorphous state by irradiation with a restoring
light beam in addition to the requirement (i) for the modified
examples of Nos. 3 and 4 and the requirement (iii) for the typical
example of No. 1 and the modified example of No. 2.
[0146] Table 2 exemplifies the elements suitable for use for
forming the phase-change reproducing layer of the present invention
and the melting point of each of these elements. In order to allow
the phase-change reproducing layer to bring about a reversible
phase-change, the materials equal to that known as the general
phase-change recording material are used.
2TABLE 2 Typical examples of the elements constituting the
phase-change reproducing layer and the melting point of the
elements Melting point Element (.degree. C.) Zn 420 In 157 Sn 232
Se 220 Bi 271 S 119 Te 450 Sb 631 Ge 959 Ag 962 Pb 328 Ga 30 Rb 39
Tl 303 Cs 29
[0147] Typically, it is desirable for the phase-change reproducing
layer used in the present invention to have a composition on the
line of the Ge--Sb--Te pseudo-binary alloy (i.e., the line joining
the two intermetallic compounds of GeTe and Sb.sub.2Te.sub.3) and a
composition falling within a range of about .+-.10 atomic % (at %),
preferably about .+-.5 at %, and more preferably about .+-.2 at %
in a direction perpendicular to the pseudo-binary alloy line, in
particular, a composition in Sb.sub.2Te.sub.3 rich having a short
crystallizing time .tau.xr. Also, it is possible to use a
composition on the line joining the elemental Sb and the elemental
Te, in particular, a composition falling with the range of .+-.20
at % of Sb.sub.2Te.sub.3. It is also possible to use a composition
falling with a range of .+-.20 at % of the Sb.sub.70Te.sub.30
eutectic composition. Further, it is possible to use a composition
prepared by adding or substituting about 0 to 30 at %, preferably,
about 2 to 20 at % of Ag, In or Ge to the compositions given
above.
[0148] Incidentally, in the case of melting the phase-change
reproducing layer in the transfer stage, in particular, in the case
of using a recording layer formed of a material other than ROM as
in the typical example of No. 1 and the modified example of No. 2,
it is desirable to use an alloy prepared by adding or substituting
at least one metal having a low melting point, which is shown in
Table 2, e.g., at least one element selected from the group
consisting of Zn, In, Sn, Se, Bi, S, Pb, Ga, Rb, Tl and Cs, to the
semi-metal simple substance or the chalcogen-based alloy given
above in an amount of about 2 to 50 at %, preferably about 5 to 40
at %, and more preferably about 10 to 30 at %. It is advantageous
to add these metals having a low melting point because it is
possible to lower the temperature of the reproducing layer in the
transfer stage and to prevent the temperature of the reproducing
layer from being excessively elevated in the recording stage.
However, it is not desirable to use Cs in view of radioactivity, to
use Tl in view of toxicity, to use Rb because Rb is rare, or to use
Pb in view of the environmental pollution problem. Such being the
situation, it is particularly desirable to add at least one element
selected from the group consisting of In, Sn, Se, Bi, S and Ga in
order to lower efficiently the melting point Tmr. It is desirable
for the melting point Tmr to fall within a range of between
150.degree. C. and 450.degree. C., preferably between 200.degree.
C. and 400.degree. C. It is desirable for the crystallizing time
.tau.xr to fall within a range of between 2 and 40 nsec, preferably
between 2 and 20 nsec, in the case where the crystallizing
temperature Txr is higher than the operating temperature of the
medium. It is desirable for the thickness to fall within a range of
between 5 and 80 nm, preferably between 10 and 50 nm. The optimum
values of the melting point Tmr, etc., are determined in accordance
with the thermal response of the recording medium (the construction
of the recording medium as well as the apparatus conditions such as
the linear velocity, the power and the write strategy).
[0149] In order to prevent the-reproducing layer from being
deteriorated by flowing in the recording stage for improving the
resistance to the thermal hysteresis, it is desirable to add at
least one kind of the material having a high melting point, which
is selected from the group consisting of W, Mo, Ta, B, C, Si, Ti,
V, Cr, Mn, Fe, Co, Ni, Cu, Y, Zr, Nb, Tc, Ru, Pd, a lanthanide
metal, Hf, Re, Os, Ir, Pt and Au, in an amount falling within a
range of between 2 and 20 at %, preferably between 5 and 10 at %.
It is also possible to add materials having a high melting point
such as an oxide, a nitride, a carbide, a boride or a fluoride in
addition to the metals having a high melting point, which are
enumerated above. The oxide, nitride, carbide, sulfide, boride and
fluoride referred to above are also suitable for use as the
materials of the interference layer and the separating layer
described hereinafter and, thus, the specific compounds will be
exemplified hereinafter.
[0150] The materials described above are suitable for use for
forming the phase-change reproducing layer in mainly the typical
example of No. 1 and the modified example of No. 2. In the case of
the modified examples of Nos. 3 and 4, the melting point Tmr is not
particularly limited, and it is desirable for the crystallizing
time .tau.xr to be set somewhat shorter than for the typical
example of No. 1 and the modified example of No. 2. In the case of
the modified examples of Nos. 5 and 6, the melting point Tmr is not
particularly limited, and the crystallizing time Txr is also not
particularly limited.
[0151] The candidates of the materials used for forming the
phase-change reproducing layer and satisfying the conditions that
the transfer is brought about at an appropriate temperature and
that the optical characteristics are changed by the transfer
include, for example, Ag--O.sub.x (x: 0.5 to 1.5) proposed in the
so-called "Super-RENS", leuco dye, a photochromic organic material
(in this case, irradiation with a restoring beam is required) and
fullerene, which are proposed as a super-resolution film material,
in addition to the chalcogen-based phase-change film material
described above and the phase-change film material prepared by
adding a low melting point metal.
[0152] As described above, it is possible to use various materials
in the present invention for the phase-change reproducing layer.
For depositing the phase-change reproducing layer, it is possible
to employ various methods including sputtering, evaporation,
spin-coating and CVD. It is possible to control the optical
constant, the thermal constant, the crystallizing temperature and
the crystallizing time by the selection of the deposition method
and the deposition conditions in addition to the selection of
materials and the thickness of the reproducing layer. For example,
in the case of depositing a chalcogen-based phase-change
reproducing layer by sputtering, it is possible to control the
physical constants thereof by selecting appropriately the
sputtering gas species, the gas pressure, the sputtering power, the
cathode drop voltage, and the positional relationship between the
target and the substrate.
[0153] (6-2. Recording layer):
[0154] As described previously in item (5) directed to the
recording principle, the recording layer is not particularly
limited in the present invention. It is possible to employ any of
the phase-change recording layer, the write-once recording layer
and ROM in the present invention.
[0155] It is possible to employ the film material similar to the
material of the phase-change reproducing layer described previously
for the phase-change recording layer. However, the recording layer
differs from the reproducing layer in the suitable composition
range of the material.
[0156] As apparent from the principle described previously in item
(5), the phase-change recording layer is required, for example, to
have an appropriate crystallizing time (.tau.xw) such that fine
marks and spaces smaller than the optical limit of the recording
light can be recorded by the melting and the recrystallization, to
have an appropriately high crystallizing temperature (Txw) such
that the degradation of reproduction (local crystallization of the
amorphous mark) is unlikely to be brought about in the reproducing
stage, and to have an appropriately low melting point (Tmw) and
crystallizing temperature Txw such that the phase-change
reproducing layer exhibits an appropriate sensitivity.
[0157] The phase-change recording layer meeting these requirements
is formed of the materials known generally as the materials of the
phase-change recording layer. The materials of the phase-change
recording layer used in the present invention include those having,
for example, a composition on the line of the Ge--Sb--Te
pseudo-binary alloy (i.e., the line joining the two intermetallic
compounds of GeTe and Sb.sub.2Te.sub.3), and a composition within a
range of about .+-.5 at %, preferably about .+-.2 at %, in a
direction perpendicular to the pseudo binary alloy line. In
particular, it is desirable to use the composition on the
relatively GeTe rich side in which the crystallizing time .tau.xw
falls within an appropriate time range. It is also possible to use
a composition prepared by adding or substituting about 5 to 30 at
%, preferably, about 10 to 20 at % of Ag, In or Ge to the
composition falling with a range of .+-.20 at % of the
Sb.sub.70Te.sub.30 eutectic composition.
[0158] The material of the recording layer differs from the
material of the reproducing layer in that the crystallizing time
.tau.xw is set somewhat longer than that for the reproducing layer
and that the melting point Tmw is appropriately high. It is
desirable for the crystallizing time .tau.xw to fall within a range
of between 5 and 100 nsec, preferably between 10 and 50 nsec. It is
desirable for the melting point Tmw to fall within a range of
between 400.degree. C. and 800.degree. C., preferably between
500.degree. C. and 700.degree. C. These optimum values are
determined in accordance with the thermal response of the medium
(depending on the apparatus conditions such as the linear velocity,
the power and the write strategy in addition to the construction of
the medium.) It is desirable for the phase-change recording layer
to have a thickness falling within a range of between about 5 nm
and 70 nm, preferably between about 7 nm and 50 nm.
[0159] It is possible for the write-once recording layer to be
formed of a dye recording layer represented by phthalocyanine or
azo dye employed nowadays in the CD-R and DVD-R, or Te--C,
Te--O.sub.x, GeTe, or Te--Pd--O.sub.x employed or proposed in WORM.
In the case of employing the write-once recording layer in the
present invention, it is desirable to use a recording beam finer
than the reproducing beam for recording the mark smaller than the
optical limit of the recording beam. Alternatively, it is desirable
to employ the pen-tip recording in the case of employing the same
light beam for the recording and the reproduction. This is because
it is difficult to utilize the melting and the recrystallization as
in the phase-change material. However, in the case of recording the
mark and the space having a size very close to the optical limit of
the recording beam, it is unnecessary to use a light beam differing
from the reproducing beam or to perform the pen-tip recording. Even
in this case, it is obvious that the transfer (or magnified
transfer) reproduction of the present invention is effective. Also,
in the case of the phase-change WORM recording layer in which the
crystallizing time .tau.xw is very long as in GeTe, it is possible
to utilize the melting and recrystallization through a method that
the moving speed of the recording medium is lowered in the
recording stage. In the case of using the dye material, it is
desirable for the recording layer to have a thickness of 10 to 200
nm, preferably 40 to 150 nm. In the case of using Te--C,
Te--O.sub.x, or Te--Pd--O.sub.x, it is desirable for the recording
layer to have a thickness of 5 to 100 nm. Further, in the case of
using GeTe, it is desirable for the recording layer to have a
thickness of about 5 to 70 nm.
[0160] The situation in the case of using a ROM as the recording
layer is as already described in item (5-3). In the case of the
ROM, the construction of the recording medium slightly differs from
the basic construction of the recording medium of the present
invention shown in FIG. 1. This will be described hereinafter in
Examples of the present invention with reference to the drawings.
Incidentally, the header section generally has a construction
similar to that of ROM in also the case of using the phase-change
recording layer and the write-once recording layer. It follows
that, even in the recordable medium, the medium construction shown
in FIG. 1 is formed above the ROM pit train in the header section.
Where the header section and the data section differ from each
other in the construction of the medium adapted for the transfer
(or magnified transfer) reproduction, it is possible to take
various measures. For example, it is possible to optimize the
construction of the recording medium in the data section, while the
transfer (or magnified transfer) reproduction in the header section
is optimized by taking suitable measures in the shape of the ROM
pit such as the depth and shape in the in-plane direction in the
header section. It is also possible to allow the header section and
the data section to differ from each other in the reproducing
power. Further, it is possible to lower the recording density in
the header section, compared with the recording density in the data
section, so as to make it possible to ensure a sufficient amplitude
of the reproduction signal in the header section without performing
the transfer (or magnified transfer) reproduction.
[0161] Various methods such as sputtering, evaporation,
spin-coating and CVD can be applied in respect of the deposition of
the recording layer. It is possible to control the optical
constant, the thermal constant, the melting point, the
crystallizing temperature and the crystallizing time of the
recording layer by the selection of the deposition method and the
selection of the deposition conditions in addition to the selection
of the material of the recording layer and the thickness. For
example, in the case of depositing a chalcogen-based phase-change
recording layer by sputtering, it is possible to control the
physical constants of the phase-change recording layer by suitably
selecting the sputtering gas species, the gas pressure, the
sputtering power, the cathode drop voltage, and the positional
relationship between the target and the substrate.
[0162] (6-3. Separating layer and interference layer):
[0163] For each of the first interference layer 12, the separating
layer 14, and the second interference layer 16, it is possible to
use at least one material or a plurality of materials differing
from each other in the optical characteristics (refractive index)
selected from the group consisting of an oxide, a nitride, a
carbide, a sulfide, a boride and a fluoride. Also, it is possible
to stack a layer of a semi-absorptive material formed of Ge, Si,
Au, Cu, Ag, Al or an alloy thereof in the layer formed of the
oxide, the nitride, the carbide, the sulfide, the boride or the
fluoride. In the case of using the semi-absorptive material, it is
desirable for the thickness to fall within a range of between 1 nm
and 20 nm, preferably between 1 nm and 10 nm.
[0164] The first interference layer 12, the separating layer 14 and
the second interference layer 16 are required to be capable of
imparting the optical response satisfying the transfer (or
magnified transfer) reproduction conditions given in Table 1, and
to be capable of imparting an appropriate optical response in the
recording stage. These requirements are also related to the
selection of the heat control layer (reflective layer) described
hereinafter.
[0165] The transparent interference material used for the
separating layer and the interference layer includes at least one
compound selected from the group consisting of Al--C, Si--O, Si--N,
Si--O--N, Al--N, Al--O--N, Ti--O, Si--C, Zn--O, Zr--O, Ta--O,
Ta--O--N, Zn--S, Cr--O, Mo--O, W--O, V--O, Nb--O, Hf--O, In--O,
In--Sn--O, Sn--O, B--N, DLC (diamond-like carbon), a-C (amorphous
carbon), Ca--F, Mg--F, C--H, C--F (C--H and C--F being the plasma
polymerized or sputtered organic films). The hyphen (-) used in the
expressions given above implies that the compounds falling within
the range of about .+-.20 at % of the stoichiometric composition
are included. The suitable thickness of each of the separating
layer and the interference layer is determined not only by the
material of the separating layer and the interference layer and the
stacked structure but also by the overall optical design and the
thermal design including the reproducing layer, the recording layer
and the reflecting layer. Concerning the suitable thickness within
a practical range, which is also dependent on the operating
wavelength, it is desirable for each of the first interference
layer and the second interference layer to have a thickness of 0 to
200 nm, preferably about 20 to 100 nm, and for the separating layer
to have a thickness of 5 to 200 nm, preferably about 10 to 100
nm.
[0166] Various methods such as sputtering, evaporation,
spin-coating and CVD can be employed for forming each of the
separating layer and the interference layer. It is possible to
control the optical constant, the thermal constant, etc., of the
separating layer and the interference layer by the selection of the
deposition method and by the selection of the deposition conditions
in addition to the selection of the material and the thickness. For
example, in the case of forming any of the separating layer and the
interference layer by sputtering, it is possible to control the
physical constants by suitably selecting the sputtering gas
species, the gas pressure, the sputtering power, the cathode drop
voltage, and the positional relationship between the target and the
substrate.
[0167] (6-4. Heat control layer):
[0168] The heat control layer is not absolutely necessary in the
present invention like the first interference layer and the second
interference layer. However, where the total thickness of the
reproducing layer and the recording layer is small so as to permit
the light transmission, it is desirable to form the heat control
layer in order to improve the light utilization efficiency and to
improve the optical response of the entire recording medium. It is
also desirable to form the heat control layer in order to control
the thermal response of the entire recording medium, particularly,
in order to control the cooling rate of the recording layer. The
material used for the heat control layer is not particularly
limited if it is a metal and an alloy. The material, the thickness
and the deposition method of the heat control layer are optimized
in accordance with the optical response design and the thermal
response design. For improving the light utilization efficiency and
for controlling the optical response, it is desirable to select a
film material having a high reflectance relative to the operating
wavelength. For the heat control layer, it is desirable to use at
least one material selected from the group consisting of Au, Ag,
Al, Cu and an alloy thereof with respect to the red wavelength
(>600 nm), and to use at least one material selected from the
group consisting of Al, Ag and an alloy thereof with respect to the
blue wavelength (<500 nm). Also, it is desirable to use a metal
or an alloy having a relatively high thermal conductivity in order
to control the thermal response of the entire recording medium,
particularly, cooling rate of the recording layer. It is also
possible to use suitably compounds having a high thermal
conductivity such as Si--C, Al--N, DLC, and BeO. It is desirable
for the thickness of the heat control layer, which should be
optimized by the optical response and the thermal response, to be
10 to 300 nm, preferably 50 to 200 nm.
[0169] Various methods such as sputtering, evaporation,
spin-coating and CVD can be employed for forming the heat control
layer. It is possible to control the optical constant, the thermal
constant, etc., of the heat control layer by the selection of the
deposition method and by the selection of the deposition conditions
in addition to the selection of the material and the thickness. For
example, in the case of forming the heat control layer by
sputtering, it is possible to control the physical constants by
suitably selecting the sputtering gas species, the gas pressure,
the sputtering power, the cathode drop voltage, and the positional
relationship between the target and the substrate.
[0170] (7) Basic construction and features of the optical
recording-reproducing apparatus of the present invention:
[0171] FIG. 16 is a block diagram showing the construction of the
optical recording-reproducing apparatus according to an embodiment
of the present invention. As shown in the drawing, the optical
recording-reproducing apparatus of the present invention comprises
optical recording medium 101 of the present invention, a spindle
motor 102, a pickup head 103, a voice coil motor 104, a
pre-amplifier 105, a variable gain amplifier (VGA) 106, an
analog-to-digital converting circuit 107, a linear equalizing
circuit 108, a data detecting circuit 109, a decoder 110, a drive
controller 111, an interface 112, a mechanical drive control
circuit 113, a laser driver 114, and a modulation circuit 115.
[0172] The optical recording medium 101 has a construction
basically equal to that shown in FIG. 1. In the case of using a
substrate having a thickness of 1.2 mm, a protective coating is
formed on the heat control layer. In the case of using a substrate
having a thickness of 0.6 mm, a counter substrate having a
thickness of 0.6 mm is attached to the heat control layer with an
adhesive layer interposed therebetween. It is possible for the
counter substrate noted above to have a film structure similar to
that shown in FIG. 1 or to be only a substrate. In the case of
using a substrate having a thickness of 1.1 mm, a film stacked in
the opposite order to that shown in FIG. 1 is formed on the
substrate, followed by attaching a cover layer on the light
incident side having a thickness of, for example, 0.1 mm to the
stacked film.
[0173] It is possible to perform recording and reproduction using
the optical recording-reproducing apparatus shown in FIG. 16 by,
for example, the procedure given below. The medium 101 mounted in a
recording apparatus is rotated at a prescribed rotating speed by
the spindle motor 102. The recording medium 101 is irradiated with
the light emitted from the light source (practically, a
semiconductor laser) housed within the pickup head 103 so as to
perform reproduction or recording-reproduction.
[0174] For performing the reproducing operation, the reflected
light from the medium is guided into the pickup head 103 and is
converted into an electrical signal by the light-detecting element
housed in the pickup head 103, and then the electric signal is
transmitted through the pre-amplifier 105, the variable gain
amplifier 106, the A/D converting circuit 107, the linear
equalizing circuit 108, the date detecting circuit 109, and the
decoder 110. The pre-amplifier 105 and the variable gain amplifier
106 serve to amplify the output signal of the light detector. The
A/D converting circuit 107 serves to convert the amplified signal
into a digital signal representing a quantized sampling value in a
discrete time. The linear equalizing circuit 108 is a type of the
digital filter. The date detecting circuit 109 is a signal
processing circuit for performing the estimation by the maximum
likelihood (ML) for detecting the data from the wave form of the
reproduction signal equalized by, for example, partial response
(PR). To be more specific, the data detecting circuit 109 is formed
of a Viterbi decoder. The decoder 110 serves to restore the encoded
bit train detected by the data detecting circuit 109 to the
original recording data.
[0175] The driving of each of the spindle motor 102 and the voice
coil motor 104 is controlled by the drive controller 111 via the
drive control circuit 113.
[0176] The data recording means comprises the modulation circuit
115, the laser driver 114, and the pickup head 103. The modulation
circuit 115 executes encoding operation for converting the
recording data forwarded from the drive controller into a
prescribed encoded bit train. The laser driver 114 serves to drive
the pickup head 103 such that the mark and the space conforming
with the encoded bit train generated from the modulation circuit
115 are recorded on the recording medium 101. Incidentally, in the
case of using ROM as the recording layer included in the medium, it
is not absolutely necessary to mount the data recording means. In
other words, it is possible for the apparatus to be provided with
the data reproducing means alone, i.e., to be an optical
reproducing apparatus.
[0177] The drive controller 111, which is a main control system of
the recording-reproducing apparatus, is connected to, for example,
a personal computer or AV equipment via the interface 112 so as to
control the transfer of the recording-reproducing data. An error
detecting and correcting circuit is included in the optical
recording-reproducing apparatus, though the error detecting and
correcting circuit is not shown in FIG. 16. The error detecting and
correcting circuit serves to correct the error in the data
demodulated by a moving image compression circuit, a moving image
expansion circuit, and the data detecting circuit 109 required in
the recording-reproducing stage of a video information. Where the
recording medium 101 is capable of recording and erasing the data,
the erasing beam for erasing the recorded data is formed in the
modulation circuit 115. For example, in the case of using a
phase-change recording layer as the recording layer of the optical
recording medium, an erasing beam having an erasing power level
(Pe) lower than the recording power level (Pw) is generated in a DC
manner or a pulsed manner.
[0178] The basic construction of the optical recording-reproducing
apparatus of the present invention, which is similar to the basic
construction of the conventional optical recording-reproducing
apparatus, has several features peculiar to the present invention.
Some of the features of the apparatus are related to the write
strategy. Such being the situation, a write strategy is exemplified
with reference to FIG. 17.
[0179] In the graph of FIG. 17, the irradiating power is plotted on
the ordinate, and the time is plotted on the abscissa. The
irradiating power level plotted on the ordinate includes a
recording power level Pw, an erasing power level Pe, a data
reproducing level Pr and a header reproducing level Prh. The
modulating scheme is not particularly limited in the present
invention. FIG. 17 shows an example of recording a 2T mark and a 4T
mark where the shortest mark length is 2T such as in 1-7RLL or
1-9RLL. Here, "T" denotes the shortest period for operating the
system, i.e., the clock period. As exemplified in FIG. 17, the
irradiation interval Pw in recording the shortest mark is defined
as Mmin and the irradiation interval Pe in recording the shortest
space is defined as Smin. Also, in FIG. 17, the time denoted by
[t1-Pw] and [t2-Pe] corresponds to the time required for bringing
about the states shown in FIGS. 14 and 15 referred to previously.
In the case of using the phase-change recording layer, Pw
corresponds to the level to form an amorphous mark, and Pe
corresponds to the level to form a crystalline space.
[0180] A first feature of the optical recording-reproducing
apparatus of the present invention is that the level of the data
reproducing power Pr is controlled to permit the phase-change
reproducing layer to be heated to the melting point or to a
temperature higher than the crystallizing temperature such that the
mark or the space of the recording layer is transferred to the
phase-change reproducing layer and the transfer portion is
reproduced.
[0181] As known to the art, it is impossible to achieve the
temperature elevation with the Pr level to the temperature at which
the phase-change is brought about in the phase-change film in the
phase-change recording apparatus available on the market. On the
other hand, it is known to the art that, in the proposal of the
super-resolution technology, used is a Pr level for elevating the
temperature of the heat mode super-resolution film to the
phase-change temperature, or used is a Pr level corresponding to
the number of photons that brings about an optical change in the
photon mode super-resolution film. However, in the super-resolution
reproduction technology, the phase-change or the optical change
continues to be brought about in the super-resolution film at the
Pr level.
[0182] On the other hand, in the present invention, phase-change is
brought about at the Pr level in a part of the reproducing layer
corresponding to any one of the mark and the space of the recording
layer. The optical recording medium of the present invention
markedly differs from the conventional super-resolution medium in
this point.
[0183] A second feature of the optical recording-reproducing
apparatus of the present invention resides in that a train of the
recording marks having a size smaller than the optical resolution
limit, which is determined by the wavelength and the numerical
aperture of the objective lens, is formed by irradiation with the
recording light. The particular second feature permits further
clarifying the effect brought about by the first feature. The
second feature is as already described in detail under the
paragraph of the recording principle. It is certainly possible to
form the mark and the space of the size smaller than the optical
resolution limit of the recording beam even in the recording medium
that does not include a phase-change reproducing layer. However, it
is impossible to achieve reproduction by means of the light
irradiation in such a medium.
[0184] A third feature of the optical recording-reproducing
apparatus of the present invention resides in that the apparatus
comprises the means for restoring the transfer portion of the
reproducing layer after irradiation with the reproducing light to
the state before the transfer. As described previously, it is
possible to achieve the restoration by irradiation with a restoring
light beam differing from the recording-reproducing beam or with
the light beam equal to the recording-reproducing beam. However, it
is most desirable to use a means that controls the passing time of
the reproducing beam (linear velocity) so as to restore the state
immediately after passage of the reproducing beam. Also, in the
strategy in FIG. 17, it is depicted that Pr or Prh irradiation is
performed in a DC manner. However, if the light irradiation is
performed in a pulsed manner also in the read stage and the
strategy is optimized, the restoration of the phase-change
reproducing layer after the transfer is facilitated.
[0185] A fourth feature of the optical recording-reproducing
apparatus of the present invention resides in that, where the
optical recording layer of the optical recording medium is formed
of a phase-change recording layer or a write-once recording layer,
the reproducing power for the header section and the reproducing
power for the data section are set at different levels. This is the
feature for coping with the situation that the transfer (or
magnified transfer) reproduction conditions in the data section do
not necessarily coincide with those of the header section in the
case where a recordable recording layer is applied to the present
invention. As exemplified in FIG. 17, it is possible to achieve
easily appropriate transfer (or magnified transfer) reproduction in
each of the data section and the header section by allowing Pr and
Prh to be different from each other. Also, if read strategy is
applied to at least one of Pr and Prh, the optimization of the
magnified transfer reproduction can be further facilitated in both
of the header section and the data section.
[0186] A fifth feature of the optical recording-reproducing
apparatus of the present invention resides in that the modulating
scheme and the write strategy are set to permit the shortest mark
length to be longer than the shortest space length or to permit the
shortest mark length to be shorter than the shortest space length,
in the recording stage. For example, in the case of using the
recording medium of the typical example of No. 1 shown in Table 1,
the shortest mark length is set shorter than the shortest space
length. As already described in detail under paragraph (3) directed
to the principle of magnified transfer reproduction, the setting is
particularly effective in the magnifying process. When it comes to
the strategy shown in FIG. 17, it corresponds to the situation that
Mmin is set shorter than Smin and thus the shortest mark length is
recorded in the recording layer substantially shorter than the
shortest space length. In the embodiments that the temperature in
that portion of the reproducing layer corresponding to the mark is
selectively elevated as in the recording medium for Nos. 1, 3 and 5
shown in Table 1, it is useful to record the shortest mark length
in the recording layer substantially shorter than the shortest
space length. On the other hand, in the embodiments that the
temperature in that portion of the reproducing layer corresponding
to the space is selectively elevated as in Nos. 2, 4 and 6 shown in
Table 1, it is useful to set the shortest mark length longer than
the shortest space length.
[0187] Further, a sixth feature of the optical
recording-reproducing apparatus of the present invention is
directed to the combination of the second feature and the fifth
feature. That is, in recording the mark and the space smaller than
the resolution (optical limit), the recording modulation scheme and
the write strategy, in which the shortest mark and the shortest
space are positively made different in the length as in the fifth
feature of the present invention, are employed.
EXAMPLES
[0188] Examples of the optical recording medium and the optical
recording-reproducing apparatus of the present invention will now
be described. The Examples will be described in the order of: (1) a
typical example and various modifications of the magnified transfer
reproduction from the phase-change recording layer to the
phase-change reproducing layer, (2) an example of the magnified
transfer reproduction from the write-once recording layer to the
phase-change reproducing layer, and (3) an example of the transfer,
magnification, and reproduction from the read-only memory to the
phase-change reproducing layer.
[0189] The testing apparatus for the recording-reproduction used in
the Examples will now be described. The basic construction of the
recording-reproducing apparatus is substantially equal to that
shown in FIG. 16. However, in order to clarify the effect of the
present invention, the waveform of the reproduction signal and CNR
were examined by connecting an oscilloscope and a spectrum analyzer
to the variable gain amplifier 106 shown in FIG. 16. Also, the
recording-reproduction experiments were carried out with changing
the mark length and the space length while the input data was set
to a single frequency. Incidentally, since it is impossible to
obtain a semiconductor laser (LD) of a high output with a short
wavelength at this stage, a Kr ion laser having a wavelength of 413
nm was used as the light source in the Examples. The NA of the
objective lens was set at 0.65. However, it is obvious that the
wavelength of the light source and the NA of the objective lens are
not limited in the present invention. To be more specific, it is
possible to design the optimum recording medium for each wavelength
by setting the optical constant of each layer of the stacked
structure constituting the recording medium in accordance with the
wavelength of the light source. Also, the maximum power of LD of,
for example, 405 nm is about 20 mW at this stage. However, since
the maximum power of LD for CD having a wavelength of 780 nm, which
has already been put to the practical use, is several hundreds of
mW, it is considered sufficiently possible in the future to apply
LD having a short wavelength and high power to the present
invention.
Example 1
[0190] In this Example, a phase-change recording layer was used as
the recording layer. First of all, described is the result of
confirming the principle of the present invention through (1-1) an
example of designing optical response of a recording medium having
a simple structure. Then, (1-2) the optical design example and the
result of evaluation using the recording medium having an improved
optical response are described. Further, (1-3) Examples directed to
the various modifications shown in Table 1 are described.
[0191] (1-1) An example of designing optical response of a medium
having a simple structure:
[0192] First, the results of the optical design relating to the
typical example of No. 1 and the modified example of No. 2 are
described. Specifically, a recording medium as shown in FIG. 1 was
manufactured by using the materials given below:
[0193] Substrate 11: polycarbonate substrate;
[0194] First interference layer 12: ZnS--SiO.sub.2 (ZnS: 80 at
%);
[0195] Phase-change reproducing layer 13:
Ge.sub.5(Sb.sub.70Te.sub.30).sub- .95;
[0196] Separating layer 14: ZnS--SiO.sub.2 (ZnS: 80 at %);
[0197] Phase-change optical recording layer 15: GeSbTe (2-2-5
composition);
[0198] Second interference layer 16: ZnS--SiO.sub.2 (ZnS: 80 at
%);
[0199] Heat control layer 17: Ag alloy.
[0200] An eccentric rotation magnetron sputtering method was
employed for forming each of the layers given above. In this
sputtering method, Ar was used as the sputtering gas and the gas
pressure was set at 0.25 Pa. The sputtering power was set at 1 kW
for forming each of the interference layer, the separating layer
and the heat control layer, and at 250 W for forming each of the
reproducing layer and the recording layer.
[0201] The result of the actual measurement using an ellipsometer
was used as the optical constant for each layer. The optical
constant for each of the phase-change reproducing layer and the
recording layer was measured for two cases, i.e., under the
amorphous state as deposited and after the crystallization. The
optical constant of the reproducing layer under the molten state is
required for the strict optical design. However, since the optical
constants under the molten state and the amorphous state are, in
general, substantially equal to each other, the optical constant
under the amorphous state as deposited was used as the optical
constant under the molten state in this Example.
[0202] The optical design was performed by setting the thickness of
each of the phase-change reproducing layer 13 and the phase-change
optical recording layer 15 at 10 nm, the thickness of the second
interference layer 16 at 100 nm, and the thickness of the heat
control layer 17 at 200 nm, while changing the thickness of each of
the first interference layer 12 and the separating layer 14. In
terms of the optical design, the thickness of the substrate 11
produces no effect. FIGS. 18A and 18B are graphs showing the
results. In the graph of each of FIGS. 18A and 18B, the thickness
of the separating layer is plotted on the ordinate, and the
thickness of the first interference layer is plotted on the
abscissa. FIG. 18A is a contour diagram showing the difference in
the absorbance of the reproducing layer before the transfer. FIG.
18B is a contour diagram showing the difference in the reflectance
of the reproducing layer after the transfer.
[0203] The difference in the absorbance shown in FIG. 18A is
represented by Acr(S)-Acr(M) using the symbols defined in Table 1.
The numeral on each contour line denotes the difference in the
absorbance. With increase in the difference in the absorbance, the
difference in the temperature elevation between the mark and the
space is increased, indicating that the present invention can be
established easily. The negative symbol (-) in FIG. 18A indicates
that Acr(M) is higher than Acr(S), i.e., the temperature of the
reproducing layer corresponding to the mark of the recording layer
is rendered higher than the temperature of the reproducing layer
corresponding to the space. This corresponds to the embodiment of
typical example of No. 1. The positive symbol in FIG. 18A implies
that Acr(M) is lower than Acr(S), i.e., the temperature of the
reproducing layer corresponding to the mark of the recording layer
is rendered lower than the temperature of the reproducing layer
corresponding to the space. This corresponds to the embodiment of
the modified example of No. 2. As apparent from FIG. 18A, it is
possible to permit the mark to be markedly different from the space
in the absorbance of the reproducing layer before transfer even in
the simple medium structure in this Example.
[0204] The difference in the reflectance shown in FIG. 18B is
represented by Rcr(S)-Rmr(M) using the symbols defined in Table 1.
As apparent from FIG. 18B, a relatively large value of
Rcr(S)-Rmr(M) is obtained within the range of the thickness in
which it is possible to obtain a relatively large difference in the
absorbance before the transfer in FIG. 18A. This clearly indicates
that the basic principle of the present invention is
established.
[0205] (1-2) Optical response and result of evaluation of a
recording medium having an improved structure corresponding to
typical example of No. 1:
[0206] A recording medium (A) having the basic structure similar to
that shown in FIG. 1 and having an improved optical response,
compared with the recording medium in item (1-1) given above, was
manufactured.
[0207] A 0.6 mm-thick polycarbonate disc provided with header
sections and tracking grooves was used as the substrate 11. The
track pitch was set at 0.34 .mu.m, which is slightly broader than
FWHM (0.33 .mu.m) of the light beam, which was formatted for the
land-groove recording. The reason why the track pitch was set
slightly broader than FWHM is that the recording medium of the
present invention, which is highly effective for the cross talk
(XT), is incapable of producing a sufficient effect relative to the
cross erase (XE) in the recording stage. In the case of using the
recording medium of a low XE, it is possible to set the track pitch
narrower.
[0208] The first interference layer 12 was prepared by stacking a
ZnS--SiO.sub.2 layer (ZnS: 80 at %) having a thickness of 8 nm, a
TiO.sub.2 layer having a thickness of 8 nm, and a ZnS--SiO.sub.2
layer (ZnS: 80 at %) having a thickness of 5 nm in the order
mentioned starting with the substrate side.
[0209] The phase-change reproducing layer 13 was formed with a
thickness of 25 nm by using a material obtained by adding 20 at %
of In and 5 at % of W to Ge.sub.3(Sb.sub.70Te.sub.30).sub.97.
Indium (In) serves to control the melting point Tmr, and tungsten
(W) serves to improve the resistance to the thermal hysteresis. As
a result of the DSC measurement, the crystallizing temperature Txr
of the phase-change reproducing layer was found to be 100.degree.
C. and the melting point was found to be 380.degree. C. Also, the
crystallizing rate was estimated experimentally using a static
tester. In the static tester, a small piece of a sample is
irradiated with a light beam in a pulsed manner so as to estimate
the phase-change rate, particularly, the crystallizing rate, with
the pulse intensity and pulse time used as parameters. The
crystallizing time .tau.xr was found to be about 5 nsec.
[0210] The separating layer 14 was prepared by stacking a
ZnS--SiO.sub.2 layer (ZnS: 80 at %) having a thickness of 15 nm, an
SiO.sub.2 layer having a thickness of 30 nm, and a ZnS--SiO.sub.2
layer (ZnS: 80 at %) having a thickness of 20 nm in the order
mentioned starting with the side of the reproducing layer.
[0211] The phase-change optical recording layer 15 was formed of a
Ge.sub.10(Sb.sub.70Te.sub.30).sub.90 having a thickness of 10 nm.
This recording layer exhibited a crystallizing temperature Txw of
220.degree. C., a melting point Tmw of 600.degree. C. and a
crystallizing time .tau.xw of 200 nsec.
[0212] The second interference layer 16 was prepared by stacking a
ZnS--SiO.sub.2 layer (ZnS: 80 at %) having a thickness of 10 nm, an
AlN layer having a thickness of 10 nm, and a ZnS--SiO.sub.2 layer
(ZnS: 80 at %) having a thickness of 50 nm in the order mentioned
starting with the side of the reproducing layer.
[0213] The heat control layer was formed of an Ag alloy layer
having a thickness of 150 nm.
[0214] Each of the layers noted above was formed as in the
recording medium in item (1-1). In this recording medium, a stacked
structure of dielectric layers differing in the refractive index
was used for each of the interference layer and the separating
layer. The use of the particular stacked structure was intended to
achieve the optimum design in respect of the absorbance of each of
the reproducing layer and the recording layer and the reflectance
of the reproducing layer before and after the transfer as well as
to achieve the optimum design in respect of the heat response in
recording and reproduction. After deposition, each of the
phase-change reproducing layer and the phase-change optical
recording layer was subjected to the initial crystallization by
using a general bulk initializer.
[0215] Typical levels of the power required for formation of an
amorphous phase, for the crystallization and for the reproduction
were examined in respect of the conventional phase-change recording
medium before the experiment on the optical design and on the
evaluation of the actual recording medium of the present invention.
The examination was intended to estimate the temperatures of the
reproducing layer and the recording layer in the reproducing stage
and the recording stage so as to prevent degradation in
reproduction (local crystallization of the mark in the recording
layer during the reproducing operation) from taking place.
[0216] The construction of the conventional phase-change recording
medium prepared as a control case was as follows. Specifically, a
stacked structure comprising:
[0217] a first interference layer including a ZnS--SiO.sub.2 layer
(ZnS: 80 at %) having a thickness of 20 nm, a SiO.sub.2 layer
having a thickness of 50 nm, an Ag alloy layer having a thickness
of 8 nm and a ZnS--SiO.sub.2 layer (ZnS: 80 at %) having a
thickness of 10 nm;
[0218] a recording layer formed of a GeTe rich pseudo-binary GeSbTe
and having a thickness of 15 nm;
[0219] a second interference layer formed of a ZnS--SiO.sub.2 layer
(ZnS: 80 at %) having a thickness of 20 nm; and
[0220] a reflecting layer (which also acts as a heat control layer)
formed of a Ag alloy and having a thickness of 200 nm,
[0221] which were stacked in the order mentioned was formed on a
substrate.
[0222] The recording layer exhibited a crystallizing temperature
Txw of 220.degree. C., a melting point Tmw of 600.degree. C., an
absorbance Amw under the amorphous state of 0.5, and an absorbance
Asw under the crystalline state of 0.6.
[0223] The recording medium thus prepared was evaluated by using an
evaluating machine having a wavelength of 413 nm and NA of 0.65 at
the linear velocity of 6 m/s so as to examine the optimum power for
formation of an amorphous phase, the optimum crystallizing power
and the optimum reproducing power. Table 3 shows the result. The
optimum power obtained in the experiment is given in the column of
"Power" included in Table 3. The values multiplying the optimum
power in the experiment by the absorbance is given in the column of
"Effective power input". The letter "M" corresponds to the
amorphous mark, and "S" corresponds to the crystalline space. It is
seen from Table 3 that it is possible to form a mark of the optimum
size when the effective power input is 3.5 mW. If the environmental
temperature during use of the recording medium is set at the
ordinary level of 30.degree. C., the temperature is elevated by
"Tmw-30=570.degree. C." when the effective power input is 3.5 mW.
In other words, the temperature of the phase-change recording film
is elevated by about 163.degree. C./mW of the effective power
input. The optical design and the evaluation were performed in
respect of the recording medium for Example (1-2), with the above
result taken into consideration.
3TABLE 3 Example of power used in conventional phase change
recording medium Power Effective power (mW) input (mW) Recording 7
3.5 (M), 4.2 (S) (formation of amorphous phase) Erasure 4 2.4 (M),
2.4 (S) (crystallization) Reproduction 0.5 0.25 (M), 0.3 (S)
[0224] Table 4 shows the optical design of each of the reproducing
layer and the recording layer constituting the recording medium for
Example (1-2) and the temperatures of the reproducing layer and the
recording layer in the reproducing stage and the recording stage.
The expression "AM" in Table 4 denotes the absorbance when the
recording layer is in an amorphous mark, "AC" denotes the
absorbance when the recording layer is in a crystalline space, "RM"
denotes the reflectance when the recording layer is in a mark, "RS"
denotes the reflectance when the recording layer is in a space,
"TM" denotes the temperature when the recording layer is in a mark,
and "TS" denotes the temperature when the recording layer is in a
space. The marks "M" and "S" in the column of the effective power
input correspond to the situation when the recording layer is in a
mark and the situation when the recording layer is in a space,
respectively. Table 4 shows an example in which the reproducing
power (Pr) for the magnified transfer is set at 2.8 mW, the
recording power Pw for forming an amorphous phase in the recording
layer is set at 35 mW, and the erasing power Pe for crystallizing
the recording layer is set at 20 mW.
4TABLE 4 Example of absorbance (A) in each layer, the reflectance
(R) of reproducing layer and temperature (T) of each layer in
optical recording medium of present invention Effective power input
(mW) AM AS RM RS M S TM (.degree. C.) TS (.degree. C.) (4-1)
Reproducing process: before transfer, reproducing power (Pr) = 2.8
mW Recording layer 0 0.4 -- -- 0 1.12 30 212 Phase change Acr (M)
Acr (S) Rcr (M) Rcr (S) 2.24 1.12 395 212 reproducing layer 0.8 0.4
0. 2 0.2 (4-2) Reproducing process: after transfer, reproducing
power (Pr) = 2.8 mW Recording layer 0 0.4 -- -- 0.28 1.12 76 212
Phase change Amr (M) Acr (S) Rmr (M) Rcr (S) 2.38 1.12 418 212
reproducing layer 0.85 0.4 0.05 0.2 (4-3) Recording process:
recording power (Pw) = 35 mW Recording layer 0.1 0.15 -- -- 3.5
5.25 600 885 Phase change 0.85 0.8 0.05 0.05 29.75 28 (4875) (4590)
reproducing layer (4-4) Erasing process: erasing power (Pe) = 20 mW
Recording layer 0.1 0.15 -- -- 2.0 3.0 356 519 Phase change 0.85
0.8 0.05 0.05 17.0 16.0 (2799) (2636) reproducing layer
[0225] The AM, AS, RM and RS of the reproducing layer correspond to
Acr(M), Acr(S), Rcr(M) and Rcr(S), respectively, before the
transfer, and to Amr(M), Acr(S), Rmr(M) and Rcr(S), respectively,
after the transfer. In table 4, the sum of R of the reproducing
layer and A of the recording layer and the reproducing layer is
substantially 1 in accordance with the mark (M) and the space (S).
It should be noted in this connection that the transmittance (Tr)
as the entire recording medium is zero because the recording medium
in this Example is of the total reflection type including a
reflective layer, and that the amount of the light transmitted to
the side of the heat control layer through the reproducing layer
(25 nm) and the recording layer (10 nm) is low, though the light is
slightly absorbed by the Ag alloy in the heat control layer other
than the recording layer and the reproducing layer.
[0226] Table 4-1 directed to the state before the transfer
indicates that Acr(M) is higher than Acr(S), i.e.,
Acr(M)>Acr(S), supporting that the transfer condition of the
typical example of No. 1 is satisfied. Table 4-1 also shows the
state of Rcr(M).about.Rcr(S), supporting that the masking condition
is satisfied. The effective power input in the reproducing stage is
"Pr.times.A". The values obtained by multiplying the effective
power input of "Pr.times.A" by about 163.degree. C./mW, which is
estimated from the experimental data on the conventional recording
medium described previously, followed by adding the ambient
temperature of 30.degree. C. during use of the recording medium are
given as TM and TS, respectively. The value of TM of the
reproducing layer given in Table 4-1 indicates that the temperature
of the reproducing layer before the transfer in the transfer
process exceeded the melting point of 380.degree. C., supporting
that the melt transfer takes place in that portion of the recording
layer which corresponds to the mark. Also, the value of TM of the
recording layer is kept at 30.degree. C., with the result that it
is quite impossible for the reproducing degradation to take place.
On the other hand, the temperature TS in the space is 212.degree.
C., which is lower than Txm of the recording layer and not lower
than Txr of the reproducing layer. Since the initial state of the
reproducing layer is crystalline in the recording medium for this
Example, no problem is generated even if TS of the reproducing
layer is not lower than Txr in the reproducing stage.
[0227] Then, attention should be paid to the state after the
transfer given in Table 4-2. If the transfer takes place, only the
reproducing layer in the mark is selectively melted so as to change
the optical constant, and the reproducing layer in the space
remains unchanged from the state before the transfer. In this case,
Amr(M) after the transfer of the reproducing layer exhibits a high
value of 0.85 like the state before the transfer. This implies that
the molten state is maintained even after the transfer. Because of
the situations that Amr(M) differs from Acr(M) before the transfer,
and that AM of the recording layer before the transfer differs from
that after the transfer, Rmr(M) after the transfer is greatly
changed to 0.05 from Rcr(M) before the transfer so as to exhibit a
large difference from Rcr(S). This implies that the amplitude of
the reproduction signal generated from the transfer portion alone
is increased by the transfer. The values of TM and TS after the
transfer indicate that the optical recording-reproducing apparatus
of the present invention is quite free from the problem of
degradation of reproduction and is capable of performing a stable
reproducing operation.
[0228] The reproducing layer is in the molten state in forming an
amorphous mark and in forming a crystalline space in the recording
layer in each of the recording process shown in Table 4-3 and the
erasing process shown in Table 4-4. It follows that the values of
AS and RS in the reproducing layer differ from those in the
reproducing stage. The value of each of RM and RS in the recording
and erasing stages is about 5%, which is a value sufficient for
performing the focusing servo and the tracking servo. As a matter
of fact, it was possible to perform the servo without giving rise
to any problem in actually performing the evaluation by the
evaluating machine. The temperature of the recording layer in the
recording stage reached the melting point Tmw in each of the
amorphous portion and the crystalline portion, supporting that it
was possible to perform the overwrite recording. The temperature of
the recording layer in the erasing stage was maintained to fall
within a range of between the crystallizing temperature and the
melting point in each of the amorphous portion and the crystalline
portion, supporting that it was possible to obtain a satisfactory
erasure rate. The temperature of the reproducing layer in the
recording and erasing stages, which was estimated by the
calculation, seems to be elevated to about a level close to the
melting point of the material of the reproducing layer. However,
since the heat conduction is promoted in proportion to the
temperature difference, the temperature of the reproducing layer is
not actually promoted to the level shown in Tables 4-3 and 4-4. It
is considered reasonable to understand that the molten region of
the reproducing layer is expanded in the recording and erasing
stages to reach the edge portion of the light beam because of the
large temperature difference formed in the reproducing layer in the
in-plane direction and the thermal diffusion accompanying the large
temperature difference noted above so as to bring about the
situation described above. The thermal diffusion in the in-plane
direction is also observed in the transfer process shown in each of
Tables 4-1 and 4-2. The difference between TM and TS of the
reproducing layer brings about the thermal diffusion in the
in-plane direction of the reproducing layer, i.e., the magnified
transfer reproduction of the present invention.
[0229] In the optical recording medium using a super-resolution
reproducing layer proposed in the past, the temperature of the
super-resolution reproducing layer is considered to be elevated in
the recording stage to an extent substantially equal to that in the
transfer type phase-change reproducing layer used in the present
invention. It is reported that the repeated recording can be
performed in the example of the super-resolution recording medium.
However, the resistance to the repeated reproduction of the
super-resolution reproducing layer is considered to be markedly
lower, compared with the present invention, because the recording
layer is always under a molten state, under a thermal reaction
state or under an optically changed state (in the case of the
photon mode) whether or not the recording layer is in a mark or a
space. It should be noted in this connection that, in the present
invention, that region of the reproducing layer which is melted in
the reproducing stage is limited to the portion corresponding to
the mark or the space of the recording layer in the embodiments in
which the reproducing layer is melted (Nos. 1 and 2 shown in Table
1 ).
[0230] Then, a recording medium for this Example was manufactured
on the trial basis, and FIG. 19 is a graph showing the result of
the evaluation performed by using an evaluating machine. For
clarifying the effect of the transfer reproduction as well as the
effect of the magnified transfer reproduction, several recording
media differing from each other in the thickness of the reproducing
layer were manufactured on the trial basis. The construction and
thickness of each of the interference layer and the separating
layer were also changed in accordance with the thickness of the
reproducing layer so as to control the recording medium to be
capable of obtaining the response substantially equal to that shown
in Table 4. In performing the evaluation, the linear velocity was
set at 6 m/s.
[0231] In the graph of FIG. 19, the reproduction signal CNR is
plotted on the ordinate, and the sum of the mark length and the
space length is plotted on the abscissa. The intensity of the
reproduction signal was examined by recording a pattern of a single
frequency that was three times as large as the sum of the mark
length and the space length plotted on the abscissa of the graph of
FIG. 19, followed by performing the recording (mark
length.about.space length) of the single frequency on a track to be
recorded and reproduced. A signal differing from that recorded in
the recording track was recorded in advance in the adjacent track
in order to clarify the effect on the crosstalk (XT).
[0232] The curve "REF" shown in FIG. 19 denotes the reproducing
characteristics of the ordinary phase-change recording medium. To
reiterate, the ordinary phase-change recording medium was prepared
by forming a stacked structure comprising a first interference
layer including a 20 nm-thick ZnS--SiO.sub.2 layer (ZnS: 80 at %),
a 50 nm-thick SiO.sub.2 layer, a 8 nm-thick Ag alloy layer, and a
10 nm-thick ZnS--SiO.sub.2 layer (ZnS: 80 at %); an optical
recording layer formed of a 15 nm-thick GeTe rich pseudo-binary
GeSbTe layer; a second interference layer formed of a 20 nm-thick
ZnS--SiO.sub.2 layer (ZnS: 80 at %); and a reflecting layer formed
of a 200 nm-thick Ag alloy film, which were stacked in the order
mentioned, on a substrate.
[0233] In FIG. 19, REF denotes the CNR of the single frequency
signal of the mark length/space length plotted on the abscissa and
recorded in the recording track, and REF(XT) denotes the CNR of the
XT signal from the adjacent track. In the conventional recording
medium, the CNR is lowered to substantially zero at the
reproduction limit .lambda./(2NA) (i.e., 318 nm in this example),
and the track pitch (340 nm) is considerably smaller than the eE-2
diameter (500 nm) of the reproducing beam, with the result that the
XT is excessively high apparently. Incidentally, if CNR is lowered
to about 25 dB or less, the amplitude of the reproduction signal on
an oscilloscope was rendered substantially zero. However, it is
possible to confirm even on the oscilloscope that the signal can be
recorded, if asymmetry is observed. To have the asymmetry matched
implies that the reproduction signal is positioned in the level
that is substantially in the center between the peak and the bottom
of the reproduction signal. If the asymmetry is matched, the system
can be established by using the demodulation means such as PRML,
even in the case where it is impossible to obtain significant
amplitude. However, if the CNR is lower than 20 dB, it is difficult
to establish the system even where the asymmetry is matched. It is
difficult to determine the lowest CNR that permits establishing the
system because the lowest CNR in question is dependent on the
demodulation system such as the level of the PRML and the detecting
and correcting capability of the error. Then, if the lowest CNR is
assumed to be 20 dB, the limit is 350 nm in the conventional
recording medium. Also, the value of XT that is considered to
permit establishing the system, which is also dependent on the
demodulation system, is -30 dB. However, in the conventional
recording medium shown in FIG. 19, the difference between CNR of
the reproducing track and the leaking CNR from the adjacent track
fails to reach -30 dB. It follows that, where the track pitch is
340 nm, the system is not established at all regardless of the
values of the mark length and the space length.
[0234] Curves-A and B shown in FIG. 19 denote the results of the
recording-reproduction of the recording medium of the present
invention. The curve A denotes the results obtained from the
recording medium for this Example. The curve B denotes the results
obtained from the recording medium of the present invention, which
was designed such that the thickness of the reproducing layer was
set at 15 nm, which was smaller than the thickness (25 nm) of the
reproducing layer for curve A, and the thickness of each of the
other layers was adjusted so as to make it possible to obtain the
response substantially equal to that shown in Table 4. The value
for the XT signal was substantially 0 dB and, thus, is not shown in
the drawing. This is the result that can be sufficiently expected
from the transfer reproduction principle of the present invention
shown in FIGS. 2 to 5 and from the masking effect shown in Table
4.
[0235] The curves A and B shown in FIG. 19 indicate that the
reproduction can be achieved with a sufficiently high CNR until the
mark length is decreased to 110 nm (i.e., until the sum of the mark
length and the space length is decreased to 220 nm). The
experimental data was not obtained in the case where the mark
length was smaller than 110 nm because it was difficult to form in
the recording stage a mark having a length smaller than 110 nm.
This can be expected from the recording principle shown in FIG. 15
in view of the crystallizing time .tau.wx of the recording layer,
which was 20 nsec, the linear velocity, which was 6 m/s, and the
write strategy. To be more specific, M(t1) (.about.FWHM) shown in
FIG. 15 is about 330 nm. Where the linear velocity is 6 m/s, 55
nsec is required for the light beam to pass through the distance of
330 nm. On the other hand, the distance (time.times.linear
velocity) for twx to be made longer than .tau.xw in FIG. 12 is
expected to be about 120 nm in the strategy shown in FIG. 17. It
follows that, in the linear velocity, the write strategy and
.tau.xw in this Example, the limit of the recording mark length is
110 nm. The mark length to be recorded can be further shortened if
the recrystallization is facilitated by lowering the linear
velocity, by improving the write strategy, or by further shortening
.tau.xw.
[0236] When the recording medium A including a 25 nm-thick
reproducing layer is compared with the recording medium B including
a 15 nm-thick reproducing layer, the recording medium A including a
relatively thick reproducing layer is superior in the
characteristics to the recording medium B. This correctly reflects
the effect of the magnified reproduction after the transfer. To be
more specific, in the recording medium A including a relatively
thick reproducing layer, thermal diffusion is likely to take place
easily in the in-plane direction of the reproducing layer.
Therefore, it is considered reasonable to understand that the
magnification after the transfer is promoted in recording medium A
so as to improve the characteristics.
[0237] Each of recording medium A and recording medium B was found
to be capable of repeated reproduction and repeated recording by
the same recording-reproducing beam without using an auxiliary
restoring light beam. The capability of the repeated reproduction
implies that it was possible to realize the restoration of the
reproducing layer after the transfer reproduction. This is because
the crystallizing time .tau.xr (5 nsec), the read strategy (DC read
in this Example) and the linear velocity in this Example satisfy
the conditions required for perfectly realizing the
recrystallization after the transfer reproduction (the transfer by
the formation of the amorphous phase in the reproducing layer in
this Example). It seems difficult to achieve the repeated recording
in view of the estimated temperature of the reproducing layer in
the recording stage shown in Table 4. However, the estimated
temperature shown in Table 4 is no more than the result obtained by
calculation of the result of the experiment of the REF recording
medium by simply multiplying the recording and erasing power by the
absorbance of the reproducing layer (effective power input). Since
the thermal diffusion is promoted from the reproducing layer in the
in-plane direction and the thickness direction in the actual case
in the recording stage, the temperature of the reproducing layer in
the recording stage is considerably lower than that shown in Table
4 (for example, only about 1,000.degree. C. in terms of the highest
temperature.) Such being the situation, it is possible to achieve
the repeated recording.
[0238] Next, the recording strategy was adjusted by using the
recording medium A that exhibited a prominent magnified
reproduction after the transfer so as to examine the case where the
shortest mark length was set shorter than the shortest space
length. When it comes to the result shown in FIG. 19, there was no
problem in the transfer of the adjacent mark accompanying the
magnification even if the shortest mark length was substantially
equal to the shortest space length. This is because the melting
point Tmr of the recording medium A was set at the temperature
corresponding to Tmr1 in the magnified transfer reproduction
principle shown in FIGS. 8 and 9.
[0239] Where the reproducing power (Pr) is increased or the melting
point of the reproducing layer is lowered, the magnified transfer
of the adjacent mark is brought about in the magnified reproduction
stage as shown in FIG. 11 so as to lower the signal amplitude and
CNR. Actually, where the reproducing power Pr was increased from
2.8 mW referred to above to 3.5 mW, the amplitude and CNR were
slightly lowered. It should be noted that, even in the case where
the reproducing power Pr was set at 3.5 mW (Pr=3.5 mW), there was
no problem in terms of the degradation of the reproduction because
the temperature in the amorphous mark portion of the recording
layer was kept lower than the Txw. Even in the case of the
reproduction at 3.5 mW, it was possible to obtain the signal
amplitude and CNR substantially equal to those in the case of the
reproduction at 2.8 mW as a result of employment of the write
strategy in which the space length was increased to a level about
1.2 times as much as the mark length (adjustment of Mmin and Smin
shown in FIG. 17). It follows that the particular situation, which
is somewhat disadvantageous in terms of the recording density
compared with the Example described previously in the case where
the mark length is the same, is advantageous in expanding the
reproducing power margin. In this fashion, the effect produced by
the change of the shortest mark length and the shortest space
length was demonstrated. The description given above covers the
case where the reproducing power Pr was changed. However, it is
obvious that the similar effect can be obtained even in the case
where the melting point Tmr of the reproducing layer is
lowered.
[0240] A detailed description has been given above in respect of
the optical recording medium for the typical example (No. 1 shown
in Table 1) of the present invention including a phase-change
recording layer and performing the magnified transfer reproduction,
and a recording-reproducing method using the optical
recording-reproducing apparatus of the present invention.
[0241] (1-3) Examples of various modifications in the case of using
a phase-change recording layer:
[0242] The modifications shown in Table 1 (Nos. 2 to 6) will now be
described.
Modified Example No. 2
[0243] As shown in Table 1, the modified Example No. 2 is in a
reversed relationship to the typical Example No. 1 in the transfer.
That is, the absorbance of the reproducing layer corresponding to
the space of the recording layer is set at a high value in the
modified Example No. 2 so as to permit that portion of the
reproducing layer which corresponds to the space to be selectively
melted. As already described in Example (1-1) with reference to
FIG. 18, it can be seen that the embodiment of the modified Example
No. 2 can be realized easily because the design that permits
Acr(S)-Acr(M) to be positive (+) is established.
[0244] To be more specific, it may be advisable to prepare a
recording medium substantially equal to the recording medium for
Example (1-2) in the first interference layer 12, the reproducing
layer 13, the optical recording layer 15, the second interference
layer 16, and the heat control layer 17 and having the separating
layer 14 obtained by successively stacking a 5 nm-thick
ZnS--SiO.sub.2 layer (ZnS: 80 at %), a 20 nm-thick SiO.sub.2 layer,
and a 5 nm-thick ZnS--SiO.sub.2 layer (ZnS: 80 at %) in the order
mentioned on the side of the reproducing layer. In this recording
medium, it is possible to substantially reverse AM and AS shown in
Table 4. In this case, the temperature of the recording mark in the
reproducing stage, which is higher than that in the recording
medium for Example (1-2), is kept lower than Txw and, thus, no
problem is generated in terms of the degradation of the
reproduction. Also, the effect similar to that shown in FIG. 19 was
obtained.
Modified Examples No. 3 and No. 4
[0245] The modified Examples No. 3 and No. 4 are directed to the
examples in which a coarse crystal is formed in the reproducing
layer of the transfer portion. It was possible to work these
modified Examples by lowering the reproducing power in the typical
Example No. 1 and the modified Example No. 2. However, it is
desirable to use a reproducing layer having a large difference in
the optical response between the coarse crystal and the initial
microcrystal.
[0246] As the particular reproducing layer, it is possible to use a
reproducing layer equal to that used in the typical Example No. 1,
i.e., a reproducing layer prepared by adding 20 at % of In serving
to control the melting point Tmr and 5 at % of W for improving the
resistance to the thermal hysteresis to
Ge.sub.3(Sb.sub.70Te.sub.30).sub.97. Also, it is possible to apply
all the materials of the phase-change reproducing layer described
previously in the item (6). It is also possible to increase the
difference in the reflectance between the initial microcrystal and
the transferred coarse crystal by the overall optical design
including the interference layer, the separating layer and the heat
control layer.
[0247] If the design similar to that shown in Table 4 is performed
with the absorbance set at Ac'r(M) and Ac'r(S) and the reflectance
set at Rc'r(M) and Rc'r(S) at the time when the reproducing layer
is in the coarse crystalline state, the values corresponding to
Amr(M) and Rmr(M) shown in Table 4-2 can be set at: Ac'r(M)=0.78
and Rc'r(M)=0.12. Also, if the layer construction is changed to
reflect the relationship between the example of the typical Example
No. 1 and the modified Example No. 2, it is possible to set Ac'r(S)
and Rc'r(S) shown in Table 4-2 as described above.
[0248] It has been clarified that the modified Examples No. 3 and
No. 4 are capable of producing the effect of the present invention,
though the change in the reflectance after the transfer is small in
these modified Examples compared with the case where the
reproducing layer after the transfer is modulated into the molten
state and the crystalline state as in the typical Example No. 1. In
the case of Example (1-2) (typical Example), the reproducing power
in the transfer stage was about 2.8 mW. However, it was unnecessary
to elevate the temperature of the reproducing layer in the transfer
stage to a level not lower than the melting point Tmr and it was
possible to achieve the reproduction with a low power. For example,
in the case of using a reproducing layer equal to that for Example
(1-2), it suffices to elevate the temperature of the reproducing
layer in the transfer stage to a level not lower than at least
100.degree. C. because Txr is 100.degree. C. and Tmr is 380.degree.
C. For coarsening the crystal, it is desirable to perform the
heating to about, for example, 200.degree. C. by referring to FIG.
7. It suffices for the reproducing power required for heating the
reproducing layer to 200.degree. C. to be about 1 mW. This Example
is desirable in that the reproducing power can be set at a low
level so as to make it possible to widen the reproducing power
margin, and that it is possible to suppress the degradation of the
reproduction. As a result of the recording-reproducing test, it has
been found that CNR, which was certainly low compared with FIG. 19,
falls in a range within which the system can be established. In
addition, it was possible to obtain improvement in the recording
density substantially equal to that for the typical Example No. 1
and the modified Example No. 2.
Modified Examples No. 5 and No. 6
[0249] The modified Examples No. 5 and No. 6 are directed to the
case where the initial state of the phase-change reproducing layer
is an amorphous state. In this case, the transfer implies
crystallization of a potion of the reproducing layer corresponding
to the recording mark (modified Example No. 5), or, conversely,
crystallization of the reproducing layer portion corresponding to
the recording space (modified Example No. 6). It is possible to
initialize the recording medium by using a bulk initializer as in
typical Example No. 1 and the modified Examples Nos. 2 to 4. For
example, it is possible to apply the means for subjecting each of
the recording layer and the reproducing layer to the initial
crystallization, followed by selectively forming an amorphous phase
in the reproducing layer alone by changing the conditions for the
initialization. Also, where the recording layer is arranged on the
side close to the substrate as in the recording medium having a
cover layer on the light side, it is possible to achieve the
initial crystallization in the recording layer after formation of
the recording layer or after formation of the separating layer,
followed by forming the reproducing layer and leaving the
reproducing layer amorphous as deposited.
[0250] Since it suffices for the transfer portion to be simply
crystallized in the modified Examples No. 5 and NO. 6, it suffices
to elevate the temperature to the temperature zone having a high
value of Nr in FIG. 7. In the case of using a reproducing layer
having Txr substantially equal to that for Example (1-2), it
suffices for the temperature of the reproducing layer required for
the transfer reproduction to be about 120.degree. C. and for the
power to be about 0.5 to 0.6 mW. These Examples are desirable in
that it is possible to set the reproducing power at a level further
lower than that for the modified Examples No. 3 and No. 4 so as to
make it possible to further broaden the reproducing power margin,
and that it is possible to suppress the degradation of the
reproduction. Also, since the reproducing layer after the transfer
is modulated into the amorphous phase and the crystalline phase, it
is possible to obtain a reproduction signal having high amplitude
as in the typical Example No. 1 and the modified Example No. 2.
[0251] However, the portion crystallized by the transfer remains
crystallized even after the passage of the reproducing beam and,
thus, it is impossible to employ the process of the melting and
recrystallization as in the typical Example No. 1 and the modified
Example No. 2 or the process of the micro-crystallization after the
coarse crystallization as in the modified Examples No. 3 and No. 4.
Such being the situation, it is necessary to employ the two
rotation operation for restoring the reproducing layer to the
initial amorphous state or to employ the reproducing beam differing
from the recording-reproducing beam. A recording-reproducing test
was conducted such that the reproducing layer was restored to the
initial amorphous state by controlling the power of the
recording-reproducing beam and the linear velocity in the rotation
stage after the transfer reproduction, followed by performing the
next reproducing operation. As a result, it was possible to obtain
an effect similar to that shown in FIG. 19.
[0252] (2) An Example using a write-once recording layer:
[0253] For the write-once recording layer, it is possible to use
the materials described previously in the item (6). In this
Example, a recording layer formed of a phthalocyanine dye was used.
In the case of using the write-once recording layer incapable of
erasure, in particular, the dye recording layer for this Example,
it is impossible to employ the process of the melting and
recrystallization as in the phase-change recording layer for
recording the mark smaller than the optical limit of the recording
light. Then, the .GAMMA.-characteristics were made gentle by using
a recording medium in which the heat control layer shown in FIG. 1
was formed of a material having a low thermal conductivity or a
recording medium that did not include the heat control layer, and
the recording was performed in the rise portion of the
.GAMMA.-characteristics. The change in the mark and the space
relative to the change in the recording power and the change in the
ambient temperature is large, compared with the case of using the
recording power in the saturated region of the
.GAMMA.-characteristics, even if the rise of the
.GAMMA.-characteristics is made gentle. Under the circumstances, an
experiment was conducted while controlling the temperature of a
recording-reproduction evaluating machine. The reproducing layer
used was similar to that used in Example (1-2), and the
construction and material of each of the first interference layer,
the separating layer and the second interference layer were
adjusted in conformity with the optical constant of the recording
layer before and after the recording. A heat control layer was not
formed in an attempt to make the .GAMMA.-characteristics gentle.
The thickness of the recording layer was set at 100 nm in order to
increase the recording sensitivity and to increase the amplitude of
the reproduction signal. It was possible to obtain the optical
response characteristics equivalent to those shown in Table 4.
According to the result of evaluation, the CNR was found to fall in
a range within which the system is established, though the CNR was
lower than that shown in FIG. 19. In addition, it was possible to
achieve high-density recording and reproduction equivalent to those
shown in FIG. 19.
[0254] (3) An Example of a ROM:
[0255] The construction for application of ROM is similar to the
construction for application of the header section of a recordable
recording medium. FIG. 20 exemplifies the typical construction of
the ROM recording medium. The members shown in FIG. 20, which
perform the functions equal to those performed by the members shown
in the other drawings, are denoted by the same reference numerals.
As shown in FIG. 20, a pre-pit train 15 as a recording mark train
is formed on the surface of a ROM substrate 11. Also, a first
interference layer 12, a phase-change reproducing layer 13, a
second interference layer 16 and a heat control layer 17 are formed
in the order mentioned on the surface having a pre-pit train 15 of
the substrate 11. The recording medium shown in FIG. 20 differs
from that shown in FIG. 1 in that an irregular surface region of
the substrate 11 is used instead of the recording layer, and that a
separating layer is not included in the recording medium shown in
FIG. 20. The recording of information is performed by the formation
of a pit train, as a recording mark train, on the surface region of
the substrate 11, the pit train can be formed through the ordinary
mastering process, the stamper process and the injection process. A
pit train of a size smaller than the optical limit of the
reproducing beam is formed for prominently producing the effect of
the present invention. The particular pit train can be formed by
use of deep ultra-violet (DUV) light having a wavelength of 266 nm
or an electron beam (EB) in the mastering process. It is not
absolutely necessary for the first and second interference layers
to be included in the recording medium shown in FIG. 20. However,
it is desirable to form the first and second interference layers in
order to obtain a suitable optical response in the magnified
transfer reproduction for the present invention.
[0256] The ordinary ROM is constructed such that a layer having a
high reflectance is formed on a substrate having a pit train formed
thereon, and reproduction based on a reflectance difference or
phase difference is performed by controlling the depth of the pit
to about .lambda./4. On the other hand, in the case of applying the
present invention to ROM, the pit depth is set such that the
optical response of the phase-change reproducing layer is rendered
appropriate. In the case of ROM according to the present invention,
the pit depth falls within a range of between .lambda./12 and
.lambda./2 in the first period. The first period implies that an
equivalent optical response can be obtained, if .lambda./2 is added
to the pit depth noted above.
[0257] The phase-change reproducing layer used in this Example is
equivalent to that used in Example (1-2) described previously. The
pit depth was set at .lambda./6, i.e., about 70 nm, and the
construction and thickness of the first interference layer, the
second interference layer and the heat control layer were adjusted.
Tables 5 and 6 show two examples of the optical design.
Specifically, Table 5 is directed to the example of utilizing the
change in the absorbance of the heat control layer, and Table 6 is
directed to the example of utilizing the change in the
transmittance of the recording medium. Since the recording mark
train is formed of a pit train in the case of ROM, it is impossible
to change the absorbance or the reflectance of the recording layer
before and after the transfer unlike the recordable recording
medium shown in FIG. 1. Such being the situation, prepared were the
recording medium directed to the example of utilizing the change in
the absorbance of the heat control layer before and after the
transfer (Table 5) and the recording medium directed to the example
of decreasing the thickness of the heat control layer (to, for
example, 50 nm or less, preferably to 25 nm or less) for allowing
the entire recording medium to exhibit transmission and to change
the transmittance before and after the transfer (Table 6). In
addition, it is possible to bring about an optical change before
and after the transfer by utilizing the pit train itself. For
example, it is possible to arrange a semi-absorptive film in the
first interference layer on the pit plane and to change the
reflectance, the transmittance and the absorbance of the
semi-absorptive film before and after the transfer.
5TABLE 5 Example of absorbance (A) for each layer, reflectance (R)
of reproducing layer, and temperature (T) for each layer in the
optical recording medium (ROM) of present invention: (Example of
utilizing absorbance of heat control layer) Effective power AM AS
RM RS input (mW) TM (.degree. C.) TS (.degree. C.) (5-1)
Reproducing process: before transfer, reproducing power (Pr) = 4 mW
Phase change Acr (M) Acr (S) Rcr (M) Rcr (S) 2.0 0.8 356 160
reproducing 0.5 0.2 0.3 0.3 layer Heat control 0.2 0.5 -- -- 0.8
2.0 95 193 layer (5-2) Reproducing process: after transfer,
reproducing power (Pr) = 4 mW Phase change Amr (M) Acr (S) Rcr (M)
Rcr(S) 2.6 0.8 453 160 reproducing 0.65 0.2 0 0.3 layer Heat
control 0.35 0.5 -- -- 1.4 2.0 144 193 layer
[0258]
6TABLE 6 Example of absorbance (A) for each layer, reflectance (R)
of reproducing layer, and temperature (T) for each layer in the
optical recording medium (ROM) of present invention: (Example of
utilizing transmittance (TR) of recording medium) Effective power
AM AS RM RS TrM Trs input (mW) TM (.degree. C.) TS (.degree. C.)
(6-1) Reproducing process: before transfer, reproducing power (Pr)
= 4 mW Phase change 0.65 0.2 0.05 0.4 -- -- 2.6 0.8 453 160
reproducing layer Medium -- -- -- -- 0.3 0.4 -- -- -- --
Transmittance (6-2) Reproducing process: after transfer,
reproducing power (Pr) = 4 mW Phase change 0.5 0.2 0.4 0.4 -- --
2.0 0.8 356 160 reproducing layer Medium -- -- -- -- 0.1 0.4 -- --
-- -- Transmittance
[0259] As apparent from Tables 5 and 6, the present invention can
work even in the case of being applied to a ROM. As a result of the
reproducing experiment, it was possible to obtain the effect of
increasing the recording-reproducing density equal to that shown in
FIG. 19 with CNR higher than that in FIG. 19. Where the mastering
is performed with EB, it is possible to perform the reproduction
with a sufficient CNR even if the mark (pit) is shorter than that
shown in FIG. 19.
[0260] In each of the Examples described above, the present
invention is applied mainly to a single-layer, single-sided
recording medium. However, the present invention is not limited to
the single-layer, single-sided structure. It is obvious that the
present invention can also be applied to a dual-layer, single-sided
recording medium. In the case of the dual-layer, single-sided
recording medium, it is desirable for the optimum thickness of each
of the absorptive layers such as the phase-change reproducing
layer, the recording layer and the heat control layer to be smaller
than the value described previously in conjunction with the
Examples of the present invention.
[0261] Also, a Kr ion laser having a wavelength of 413 nm was used
in the Example in which the recording-reproducing experiment was
carried out by applying the present invention to a recordable
recording medium. However, the wavelength of the light source is
not limited in the present invention. The present invention can be
worked by conducting an optical design in conformity with the
optical constant of each layer included in the recording medium
corresponding to the wavelength. Also, in the Example described
above, an objective lens having NA of 0.65 was used. However, it is
obvious that the present invention is not dependent on the NA of
the objective lens. The present invention is also applicable to a
near-field recording system such as a solid immersion lens (SIL)
recording-reproducing system or a probe recording-reproducing
system.
[0262] Additional advantages and modifications will readily occur
to those skilled in the art. Therefore, the invention in its
broader aspects is not limited to the specific details and
representative embodiments shown and described herein. Accordingly,
various modifications may be made without departing from the spirit
or scope of the general inventive concept as defined by the
appended claims and their equivalents.
* * * * *