U.S. patent application number 10/267688 was filed with the patent office on 2004-02-05 for method and device for producing a galvanic layer on a substrate surface.
Invention is credited to Koeberle, Konrad, Weber, Josef.
Application Number | 20040020779 10/267688 |
Document ID | / |
Family ID | 7701883 |
Filed Date | 2004-02-05 |
United States Patent
Application |
20040020779 |
Kind Code |
A1 |
Koeberle, Konrad ; et
al. |
February 5, 2004 |
Method and device for producing a galvanic layer on a substrate
surface
Abstract
A method and a device are described for producing a galvanic
layer having a defined spatial extent on an electrically conductive
substrate surface having any shaped contour at all. In this
context, an electrolyte jet from a nozzle is applied to the
substrate, and a current flows between the nozzle and the substrate
surface essentially via the electrolyte jet. The device is provided
with a pump for delivering an electrolyte from an electrolyte
reservoir to the nozzle and for producing an electrolyte jet
directed at the substrate surface. Moreover, the device has a
reactor in which are arranged the substrate to be coated, as well
as the nozzle. The substrate and the nozzle are connected to a
direct current source, and a configuration of the substrate and of
the nozzle in the reactor is variable during the coating
process.
Inventors: |
Koeberle, Konrad; (Backnang,
DE) ; Weber, Josef; (Oberriexingen, DE) |
Correspondence
Address: |
KENYON & KENYON
ONE BROADWAY
NEW YORK
NY
10004
US
|
Family ID: |
7701883 |
Appl. No.: |
10/267688 |
Filed: |
October 8, 2002 |
Current U.S.
Class: |
205/133 ;
204/227; 204/275.1; 205/148 |
Current CPC
Class: |
C25D 5/16 20130101; C25D
7/0678 20130101; C25D 7/0692 20130101; C25D 5/022 20130101 |
Class at
Publication: |
205/133 ;
205/148; 204/227; 204/275.1 |
International
Class: |
C25D 017/00; C25C
007/00; C25B 009/00 |
Foreign Application Data
Date |
Code |
Application Number |
Oct 9, 2001 |
DE |
101 49 733.4-45 |
Claims
What is claimed is:
1. A method for producing a galvanic layer having a defined spatial
extent on an electrically conductive substrate surface (2) having
any shaped contour at all, an electrolyte jet (7) being applied by
a nozzle (6) to the substrate surface (2), and a current flowing
between the nozzle (6) and the substrate surface (2) essentially
via the electrolyte jet (7), a configuration of the nozzle and of
the substrate surface being variable during the coating
process.
2. The method as recited in claim 1, wherein the electrolyte jet
(7) is a free jet.
3. The method as recited in claim 1, wherein the electrolyte jet
(7) is an immersion jet.
4. The method as recited in one of claims 1 through 3, wherein
parameters of the coating process are provided in such a way that
the substrate surface (2) is essentially coated in the impact
region of the electrolyte jet (7) on the substrate surface (2).
5. The method as recited in claim 4, wherein a diameter of the
coated region (25) is adjusted as a function of the diameter of the
nozzle (6), and/or as a function of the flow velocity of the
electrolyte (4), and/or as a function of a vertical distance
between the nozzle (6) and the substrate surface (2).
6. The method as recited in one of claims 1 through 5, wherein a
height of the coating (25) is adjusted as a function of a time
during which the current flows between the nozzle (6) and the
substrate surface (2), and/or as a function of the current
intensity.
7. The method as recited in one of claims 1 through 6, wherein the
nozzle (6) and/or the substrate (9) are moved during the coating
process.
8. The method as recited in claim 7, wherein the nozzle (6) and/or
the substrate (9) are moved to vary the vertical distance between
them, the vertical distance being varied, in particular, in such a
way that a profile layer (23) is produced on the substrate surface
(2).
9. The method as recited in claim 7, wherein the nozzle (6) and/or
the substrate (9) are moved to vary the impact region (21) of the
electrolyte jet (7) on the substrate surface (2), the impact region
(21) being varied, in particular, in such a way that a contour
layer (24) is produced on the substrate surface (2).
10. The method as recited in claim 7, wherein the nozzle (6) and/or
the substrate (9) are moved to vary the vertical distance between
them and to vary the impact region (21) of the electrolyte jet (7)
on the substrate surface (2).
11. The method as recited in one of claims 1 through 10, wherein a
plurality of electrolyte jets is applied simultaneously to the
substrate surface.
12. A device for producing a galvanic layer having a defined
spatial extent on an electrically conductive substrate surface (2)
having any shaped contour at all, comprising a pump (3) for
delivering an electrolyte (4) from an electrolyte reservoir (5) to
a nozzle (6) and for producing an electrolyte jet (7) directed to
substrate surface (2), a reactor (8) in which are placed the
substrate (9) to be coated as well as the nozzle (6), and a direct
current source (10) which is connected to the substrate (9) and the
nozzle (6), a configuration of the nozzle (6) and/or of the
substrate (9) in the reactor (8) being variable.
13. The device as recited in claim 12, wherein the reactor (8) has
a protective container (11) and a substrate holder (12) configured
in the protective container (11).
14. The device as recited in claim 12 or 13, wherein a valve (13)
for controlling a delivery quantity of the electrolyte (4) is
provided between the nozzle (6) and the pump (3).
15. The device as recited in claim 13 or 14, wherein the protective
container (11) is connected to the electrolyte reservoir (5), and
this connection is blockable via a shutoff valve (18).
16. The device as recited in claim 15, wherein in a free-jet
operation, the shutoff valve (18) is opened, and, in an
immersion-jet operation, the shutoff valve (18) is closed, during
the immersion jet operation, the electrolyte (4) is accumulated in
the protective container (11), and is fed back via an output (22)
to the electrolyte reservoir (5).
17. The device as recited in one of claims 12 through 16, wherein
the electrolyte reservoir (5) is equipped with a device (19) for
tempering the electrolyte (4).
18. The device as recited in one of claims 13 through 17, wherein
the nozzle (6) and/or the substrate holder (12) are provided with a
controlled positioning device for guiding the nozzle (6) and/or the
substrate holder (12) during the coating process.
Description
BACKGROUND INFORMATION
[0001] The present invention is directed to a method and a device
for producing a galvanic layer having a defined spatial extent on
an electrically conductive substrate surface.
[0002] Generally, galvanically produced layers which are applied
precisely to a limited area of a substrate surface, are described
as partial precision layers. The galvanic layers having limited
spatial dimensions are produced by selectively influencing a
current flow in an electrolyte between an anode and the substrate
to be coated, in a generally known way, using screening.
[0003] It is additionally provided in the case of a so-called mask
technique, to provide the substrate surface to be coated, for
example, with a photosensitive resist, which stops a current flow
between the anode and the substrate in this region and prevents a
deposition of coating material.
[0004] The known devices in which the galvanic coating processes
take place have the disadvantage, however, of being tailored to the
geometric form of the particular substrate to be coated, and also
of requiring replacement or retrofitting when another substrate or
component type is to be coated. The necessity to fix the devices in
position in order to produce a galvanic layer on substrates having
a specific, spatial form makes the coating process inflexible, and
a layer thickness of the partial precision layers is only able to
be influenced in its totality by altering the process parameters of
the coating process each time.
[0005] This leads disadvantageously to the situation where using
devices and methods known in the field for producing a galvanic
layer on a substrate surface, for the most part, a contour layer
having a constant layer thickness can be applied, a surface contour
of the substrate surface being identically replicated by the
galvanic contour layer, and a profile layer, which, in its spatial
extent, has a variable layer thickness, being only able to be
produced with considerable cost for equipment.
[0006] A device and a method for producing galvanic layers on
electrically conductive substrates are known from the German DE 197
36 340 A1. The device is provided for producing uniformly
unpatterned, as well as patterned galvanic layers, patterned
galvanic layers being producible using the described method.
[0007] The device of the DE 197 36 340 A1 has a bath for the
electrolyte into which the holder for the substrate and the anode
connected to the voltage source, dip. The holder is composed of a
cylindrical housing having two open ends and one closure which can
be screwed onto the one housing end, thereby sealing it. The
interior of the housing is made up of three concentrically disposed
cylindrical sections. To ensure adequate movement of the
electrolyte over the metal layer or the substrate, an agitator is
provided. Alternatively, it can also be provided, however, for the
electrolyte to be suctioned out of the housing, thereby producing
the desired electrolyte motion for compensating for concentration
gradients in the electrolyte.
[0008] To produce a patterned galvanic layer on the electrically
conductive substrate surface, a mask pattern of a polymer resist is
initially applied to the one-sided metallized, dielectric substrate
surface, photolithographically or using excimer laser ablation. The
mask pattern is identical to the negative of the patterned galvanic
layer to be produced. A mesh for producing a patterned galvanic
layer of a uniform thickness is placed between the agitator and the
substrate surface.
[0009] However, this device known from the related art has the
disadvantage that, prior to producing a patterned galvanic layer,
it is necessary to prepare the substrate to be coated, i.e., its
surface, or the area surrounding the substrate, i.e., the device
itself, in accordance with the layer to be produced. This
preparation corresponds to the application of a photoresist or the
placement of appropriate screening to guide the current field
within the electrolyte. However, such process-preparation
production steps entail considerable outlay and increase the
production costs related to the coated substrates and/or
components.
SUMMARY OF THE INVENTION
[0010] In contrast, the method according to the present invention
having the features of claim 1 has the advantage that galvanic
layers, formed as contour or profile layers, are able to be applied
to an electrically conductive substrate surface having any shaped
contour at all, without entailing costly process-preparation
production steps.
[0011] This is achieved in that an electrolyte jet is applied to
the substrate surface, a current flows between a nozzle and the
substrate essentially via the electrolyte jet, and a configuration
of the nozzle and of the substrate surface is variable during the
coating process, so that to fabricate patterned contour galvanic
layers, as well as patterned profile galvanic layers, measures are
not needed to mask the components or the substrate surfaces, or an
arrangement of screens or meshes is not needed, since a coating is
provided essentially only in the region of the substrate surface
where the electrolyte jet impinges.
[0012] Applying the method according to the present invention which
constitutes a "jet coating technique", a coating of substrates,
that is, to a large degree, independent of components, and a rapid
adaptation to new conditions is possible, through which means, in
comparison to known coating techniques, such as, for example, the
mask technique and/or the screen technique, the jet coating
technique exhibits a substantially greater flexibility.
[0013] The device according to the present invention having the
features of claim 17 has the advantage that any desired contour of
a substrate to be coated, or its surface may be simulated, without
retrofitting the device, and nearly every desired form of a
galvanic layer may be applied to the substrate.
[0014] For this, the device for producing a galvanic layer having a
defined spatial extent on an electrically conductive substrate
surface having any shaped contour at all, is provided with a pump
for delivering an electrolyte from an electrolyte reservoir to a
nozzle and for producing an electrolyte jet directed at the
substrate surface, and with a reactor in which are arranged the
substrate to be coated, as well as the nozzle, and with a direct
current source which is connected to the substrate and the nozzle.
Moreover, an arrangement of the nozzle and/or of the substrate
during the coating process in the reactor is variable, so that the
electrolyte jet or the nozzle is able to be guided similarly to a
pin with respect to the substrate surface. Thus, the galvanic layer
is able to be applied with a specific contour or with a specific
profile to the desired regions of the substrate surface.
[0015] Moreover, it is advantageous that substrates having any
desired surface contour, such as rotationally symmetric bodies,
substrates having grooves or depressions, but also flat plates, are
able to be provided with a galvanic layer in a simple manner. In
this context, it is particularly advantageous that a change in the
substrate type does not necessitate retrofitting the device
according to the present invention, since any surface contour at
all is able to be covered by the nozzle. In the present connection,
the term "substrate type" is to be understood as a variable
geometric form of the substrate to be coated.
[0016] Further advantages and refinements of the present invention
are derived from the description, the drawing, and the claims.
BRIEF DESCRIPTION OF THE DRAWING
[0017] An exemplary embodiment of the device according to the
present invention for producing a galvanic layer on a substrate
surface is shown in a schematically simplified version in the
drawing and is elucidated in more detail in the following
description. in which:
[0018] FIG. 1 shows a method flow chart of a device or system for
producing a galvanic layer on a substrate surface;
[0019] FIG. 2 a nozzle and a substrate, an electrolyte jet which
constitutes a free jet being applied to the substrate;
[0020] FIG. 3 the nozzle and the substrate according to FIG. 2, the
electrolyte jet being an immersion jet;
[0021] FIG. 4 a schematic representation of a substrate, on which a
locally limited galvanic layer is applied, a superposition of
galvanically produced individual spots being represented in the
right illustration; and
[0022] FIG. 5 a comparison of a profile layer applied to a
substrate and a contour layer applied to a substrate.
DESCRIPTION OF THE EXEMPLARY EMBODIMENT
[0023] FIG. 1 shows a device 1 for producing a galvanic layer
having a defined spatial extent on an electrically conductive
substrate surface 2 which has a pump 3 for delivering an
electrolyte 4 from an electrolyte reservoir 5 to a nozzle 6 and for
producing an electrolyte jet 7 directed to substrate surface 2. In
addition, device 1 has a reactor 8 in which are placed substrate 9
to be coated as well as nozzle 6, substrate 9 and nozzle 6 each
being connected to a direct current source 10.
[0024] Reactor 8 has a protective container 11 and a substrate
holder 12 or workpiece holder configured in the protective
container. In addition, between nozzle 6 and pump 3, a valve 13 is
provided for controlling a delivery quantity of electrolyte 4. In
parallel to a connection line 14 between pump 3 and valve 13 is a
line 15 which, starting from electrolyte reservoir 5, leads into
connection line 14 upstream from valve 13 and is provided with a
further valve 16. Thus, the delivery quantity of electrolyte 4 to
nozzle 6 is adjustable by way of valve 13 and additional valve 16,
as well as by way of the conveying capacity of pump 3.
[0025] Protective container 11 is connected via a further
connection line 17 to electrolyte reservoir 5, further connection
line 17 being blockable via a shutoff valve 18 and being provided
for recirculating electrolyte 4 into electrolyte reservoir 5.
[0026] To ensure a proper functioning of device 1, electrolyte
reservoir 5 is equipped with a device 19 for tempering electrolyte
4, so that the coating process is substantially independent of the
ambient temperatures. Situated underneath reactor 1 and electrolyte
reservoir 5 is a catch pan 20 used to collect electrolyte flows
escaping from the closed system in the case of possible leakage
from reactor 8, electrolyte reservoir 5, and the line system of
device 1, and to avoid contaminating the environment with
electrolytes potentially containing substances harmful to health
and the environment.
[0027] Device 1 is designed to be able to operated in a so-called
free-jet operation or in a so-called immersion jet operation.
[0028] During the free-jet operation of device 1 in accordance with
the representation in FIG. 2, nozzle 6 situated in protective
container 11 and substrate 9 are not immersed in electrolyte 4.
Electrolyte jet 7 emanating from nozzle 6 is applied in empty
protective container 11 as a free jet to substrate 9. In this
context, the diameter of electrolyte jet 7 corresponds to the
nozzle diameter and only increases slightly in size with increasing
distance from nozzle 6. In the area of an impact point 21 on
substrate surface 2, electrolyte 4 on substrate surface 2 flows
away "to the outside", i.e., radially outwardly from electrolyte
jet 7, and collects in the bottom area of protective container 11.
From there, electrolyte 4 flows via further connection line 17 back
into electrolyte reservoir 5, shutoff valve 18 being opened.
[0029] During immersion jet operation of device 1, shutoff valve 18
is closed, so that electrolyte 4 is accumulated in protective
container 11, and is fed back via an output 22 to electrolyte
reservoir 5. This means that in the immersion jet operation of
device 1, substrate 9, as well as nozzle 6 are immersed in
electrolyte 4, i.e., protective container 11 is completely filled
with electrolyte 4, and electrolyte jet 7 is formed as flow threads
in electrolyte 4. In this context, electrolyte jet 7 widens with
increasing distance from nozzle 6, i.e., its diameter increasingly
enlarges. From an impact region 21 on substrate surface 2,
electrolyte jet 7 flows off radially, directed toward substrate
surface 2.
[0030] The course of electrolyte jet 7 during free-jet operation,
as well as during immersion-jet operation of device 1, is shown
greatly schematized in FIGS. 2 and 3, respectively. It proceeds
from these basic representations that the impact region of
electrolyte jet 7 in the free-jet operation of device 1 has a
smaller diameter than in the immersion-jet operation.
[0031] In the context of the method according to the present
invention for producing a galvanic layer having a defined spatial
extent on a substrate surface having any shaped contour at all,
nozzle 6 is essentially directed at an electrically conductive,
i.e., metallic surface of substrate 9. Electrolyte 4 flows as a
liquid jet through nozzle 6 and meets with substrate surface 2 to
be coated, i.e., a workpiece surface. In this context, nozzle 6 is
designed as an electrode, so that electric current is able to flow
via electrolyte 4, i.e., electrolyte jet 7, to substrate 9, and a
metal deposition is effected on a narrowly restricted area around
impact region 21, i.e., the impact point of electrolyte jet 7.
[0032] The coating point is primarily described as spot 25, the
diameter of this spot 25 being determined by the flow shape, the
nozzle diameter of the electrolyte jet, the flow velocity of
electrolyte jet 7, as well as by the distance between nozzle 6 and
substrate 9. Here, the flow shape of electrolyte 4 is to be
understood as whether electrolyte 4 is applied to substrate surface
2 in the form of an immersion jet or a free jet.
[0033] A change in or enlargement of the vertical distance of
nozzle 6 from substrate surface 2 effects that the layer profile
becomes increasingly flatter, and the diameter of spot 25
increases, this trend being more pronounced in free-jet operation
than in immersion-jet operation.
[0034] A height of spot 25 or of the coating is adjusted as a
function of a time during which the current flows between nozzle 6
and substrate surface 2. A further parameter of the coating process
which influences the height of spot 25 is the magnitude of the
applied current intensity, a greater amperage effecting an
intensified deposition, the height of spot 25 being greater, and
the diameter of spot 25 remaining essentially the same.
[0035] In a schematized representation, FIG. 4 shows substrate 9
which is coated with a spot 25. To produce a flat expansion of a
galvanic layer on substrate surface 2, a plurality of individual
spots 25 are arranged in a series. To produce a profile layer, a
plurality of spots 25 are superposed, this being referred to as
superposition.
[0036] To implement a superposition, it is provided to move the
workpiece to be coated or substrate 9 and/or nozzle 6 during the
coating process, so that a contour layer or a profile layer may be
produced in a simple manner on substrate 9. In this manner, the
need is eliminated for a conventional mask and screen technique to
selectively coat a substrate surface. Moreover, preparatory
production steps, such as applying a resist layer to substrate
surface 2, or retrofitting a coating device are eliminated.
[0037] By moving substrate 9 or nozzle 6, a vertical distance
between them may be altered, for example to form a profile layer
23, as depicted in FIG. 5, on substrate surface 2. Furthermore, the
nozzle and/or substrate 9 may be moved to change impact region 21
of the electrolyte jet on substrate surface 2, so that a contour
layer having a uniform layer thickness may be produced on the
substrate surface.
[0038] Of course, deviating herefrom, it is within the discretion
of one skilled in the art to execute the individual movements of
nozzle 6 and of substrate 9 in combination. This means that the
vertical distance between nozzle 6 and substrate surface 2, and
also impact region 21 of electrolyte jet 7 on substrate surface 2
are suitably changed. Thus, a galvanic layer may be precisely
applied to substrate surface 2 and with a defined spatial extent,
and with any shaped contour at all. A contour layer 24 of this kind
is shown in the right representation of FIG. 5, contour layer 24
having a constant layer thickness, and the surface contour of
substrate 9 being identically replicated by contour layer 24.
[0039] To move nozzle 6 and substrate 9, a positioning unit is
provided for nozzle 6, and for substrate 9 or substrate holder 12.
The positioning unit is not shown here in greater detail in the
drawing and may be designed as a robot, similarly to resist
technology. By designing device 1 in this manner, it is possible
for the nozzle to be driven into grooves or other depressions in
substrate surface 2 and, there, for a galvanic layer having the
desired contour or desired profile to be produced. One possible
application case is, for instance, coating components of a valve.
It is conceivable in this context, on a seat area of a valve
tappet, to place a ring at the crown rim, so that this ring rests
only at the rim and not in the entire area of the crown at the
valve seat.
[0040] Using the present jet-coating technique, which provides for
depositing a metal layer in the form of a spot 25 as the result of
impact of electrolyte jet 7 on substrate surface 2, it is possible
to produce galvanic layers having any desired pattern delineation
at all as a contour or profile layer on a substrate surface, since
the coating in impact region 21 in the form of spot 25, even in the
free-jet operation of device 1, does not come in contact with air
or oxygen. In this manner, a passive surface layer is prevented
from forming on the already applied metal layer, because a liquid
film or an electrolyte film flows permanently over spot 25. For
this reason, it is possible to build up further spots on a
deposited spot 25 or to place them next to it, the individually
applied spots, among themselves, forming a permanent bond.
[0041] Various series of measurements have revealed that, in the
free-jet operation of device 1, high elevated spots 25 formed with
a small diameter are produced on substrate surface 2. In the
immersion-jet operation of device 1, flatter spots 21 having a
larger diameter are produced on substrate surface 2, since the
greater flow resistance of electrolyte 4 surrounding electrolyte
jet 7, causes it to widen with increasing distance from nozzle
6.
* * * * *