U.S. patent application number 10/279931 was filed with the patent office on 2003-10-23 for optical element having antireflection film.
This patent application is currently assigned to Hoya Corporation. Invention is credited to Mitsuishi, Takeshi, Shinde, Kenichi, Shirakawa, Hiroshi.
Application Number | 20030198818 10/279931 |
Document ID | / |
Family ID | 19143508 |
Filed Date | 2003-10-23 |
United States Patent
Application |
20030198818 |
Kind Code |
A1 |
Mitsuishi, Takeshi ; et
al. |
October 23, 2003 |
Optical element having antireflection film
Abstract
The present invention is directed to an optical element having
an antireflection film formed on a plastic substrate, wherein the
reflectance of the antireflection film is low while the
transmittance thereof is high. The impact resistance, the
adhesiveness, the heat resistance, the abrasion resistance and the
alkali resistance of the antireflection film on the plastic
substrate are superior. The optical element having an
antireflection film has at least one layer of the antireflection
film that is a hybrid layer made of an inorganic substance and an
organic substance.
Inventors: |
Mitsuishi, Takeshi; (Tokyo,
JP) ; Shirakawa, Hiroshi; (Tokyo, JP) ;
Shinde, Kenichi; (Tokyo, JP) |
Correspondence
Address: |
Finnegan, Henderson, Farabow,
Garrett & Dunner, L.L.P.
1300 I Street, N.W.
Washington
DC
20005-3315
US
|
Assignee: |
Hoya Corporation
|
Family ID: |
19143508 |
Appl. No.: |
10/279931 |
Filed: |
October 25, 2002 |
Current U.S.
Class: |
428/447 |
Current CPC
Class: |
Y10T 428/161 20150115;
Y10T 428/31663 20150401; G02B 1/111 20130101 |
Class at
Publication: |
428/447 |
International
Class: |
B32B 009/04 |
Foreign Application Data
Date |
Code |
Application Number |
Oct 25, 2001 |
JP |
2001-327252 |
Claims
What is claimed is:
1. An optical element comprising a plastic substrate and an
antireflection film, wherein at least one layer of the
antireflection film is a hybrid layer comprising at least one
inorganic substance and at least one organic substance.
2. The optical element according to claim 1, wherein the hybrid
layer is obtainable by an ion-assisted process.
3. The optical element according to claims 1 or 2, wherein the at
least one inorganic substance in the hybrid layer is SiO.sub.2.
4. The optical element according to claims 1 or 2, wherein the at
least one inorganic substance in the hybrid layer is SiO.sub.2 and
Al.sub.2O.sub.3.
5. The optical element according to claims 1 or 2, wherein the at
least one inorganic substance in the hybrid layer is at least one
inorganic oxide selected from Nb.sub.2O.sub.5, Ta.sub.2O.sub.5,
TiO.sub.2, ZrO.sub.2 and Y.sub.2O.sub.3.
6. The optical element according to claim 1, wherein the at least
one organic substance in the hybrid layer is a modified silicone
oil.
7. The optical element according to claim 6, wherein the modified
silicone oil comprises one or more compounds having a structure of
any of the following general formulae (a) to (d): (a) modified
silicone oil having an organic group introduced into the side
chains of polysiloxane: 7(b) modified silicone oil having an
organic group introduced into both ends of polysiloxane: 8(c)
modified silicone oil having an organic group introduced into one
end of polysiloxane: 9(d) modified silicone oil having an organic
group introduced into the side chains and both ends of
polysiloxane: 10where in the general formulae (a) to (d), m and n
each independently indicate an integer of 0 or more; and in the
general formula (c), R represents an alkyl group having from 1 to
10 carbon atoms, an alkenyl group having from 2 to 10 carbon atoms,
or an alkynyl group having from 2 to 10 carbon atoms.
8. The optical element according to claim 7, wherein the organic
group is selected from an amino group, an epoxy group, a carboxyl
group, a hydroxyl group, a hydroxyl group-containing hydrocarbon
group having 1 to 15 carbon atoms, a methacrylic group, a mercapto
group, a phenol group, an alkoxy group having from 1 to 15 carbon
atoms, a hydrocarbon group having 1 to 15 carbon atoms carrying one
or more of the substituents listed above, and combinations
thereof.
9. The optical element according to claim 7, wherein the organic
group is selected from an alkyl group having from 1 to 15 carbon
atoms, an ester group having from 2 to 15 carbon atoms, a
methylstyryl group, a poly(C.sub.2-15 alkylene)ether group, having
2 to 15 repeating units, an ester of a saturated or unsaturated
fatty acid having 16 to 20 carbon atoms, and a hydrocarbon group
having 1 to 15 carbon atoms that is substituted with one or more
fluorine atoms.
10. The optical element according to any one of claims 6 to 9,
wherein the modified silicone oil has a number-average molecular
weight of from 250 to 6,000.
11. The optical element according to claim 1, wherein the at least
one organic substance in the hybrid layer is a compound of the
following general formula (I): 11wherein x and z each independently
indicate an integer of 0 or more; y indicates an integer of 1 or
more; R.sub.1 to R.sub.6 each independently represent a hydrogen
atom or an organic group selected from a methyl group, a
hydrocarbon group having 1 to 15 carbon atoms containing an epoxy
group, an amino group, a (meth)acrylic group, a hydroxyl group, a
hydrocarbon group having 1 to 15 carbon atoms containing a carbonyl
group, a vinyl group, a thiol group, a carbon-carbon triple
bond-containing hydrocarbon group having 1 to 15 carbon atoms, an
alkoxysilane group having from 1 to 15 carbon atoms, an alkylamino
group having from 1 to 15 carbon atoms and a cyclic alkyl group
having from 5 to 8 carbon atoms.
12. The optical element according to claim 11, wherein at least one
of R.sub.1 to R.sub.6 is a sorbitan residue or a sorbitan ester
residue.
13. The optical element according to claim 11, wherein the compound
of the general formula (I) is polyethylene glycol monobutyl
monoglycidyl ether, polyethylene glycol diglycidyl ether,
polyoxyethylene .alpha.,.omega.-bis-3-aminopropyl ether,
polyethylene glycol sorbitan monolaurate, polyethylene glycol
sorbitan monooleate or polyoxyethylene monoacrylate.
14. The optical element having an antireflection film according to
any one of claims 11 to 13, wherein the compound of the general
formula (I) has a number-average molecular weight of from 250 to
6,000.
15. The optical element having an antireflection film according to
any one of claims 1, 8, 9 or 11, wherein the content of the at lest
one organic substance in the hybrid layer in the film is from 0.02%
by weight to 70% by weight of the hybrid layer.
16. The optical element according to any one of claims 1, 8, 9 or
11, which further includes a basic layer having a thickness of from
1 to 5 nm and comprising at least one metal selected from nickel
(Ni), silver (Ag), platinum (Pt), niobium (Nb) and titanium (Ti),
formed between the plastic substrate and the antireflection
film.
17. The optical element according to any one of claims 1, 8, 9 or
11, wherein the antireflection film is so configured that one
hybrid layer is nearest to the plastic substrate and another hybrid
layer, which may be the same or which may be different from the
first hybrid layer, is remotest from it.
18. The optical element according to claim 17, wherein the
antireflection film comprises the following layers formed in that
order on the plastic substrate: 1st layer: hybrid layer of
SiO.sub.2+Al.sub.2O.sub.3+organic substance (layer thickness, 10 to
180 nm), 2nd layer: Nb.sub.2O.sub.5 layer (layer thickness, 1 to 25
nm), 3rd layer: SiO.sub.2+Al.sub.2O.sub.3 layer (layer thickness,
10 to 50 nm), 4th layer: Nb.sub.2O.sub.5 layer (layer thickness, 10
to 55 nm), 5th layer: SiO.sub.2+Al.sub.2O.sub.3 layer (layer
thickness, 10 to 50 nm), 6th layer: Nb.sub.2O.sub.5 layer (layer
thickness, 10 to 120 nm), and 7th layer: hybrid layer of
SiO.sub.2+Al.sub.2O.sub.3 +organic substance (layer thickness, 70
to 100 nm).
19. The optical element according to any one of claims 8, 9, or 11,
wherein the hybrid layer is obtainable by an ion-assisted
process.
20. The optical element according to claim 18, wherein at least one
of the hybrid layers is obtainable by an ion-assisted process.
Description
CROSS-REFERENCE TO RELATED APPLICATION
[0001] The present application claims priority under 35 U.S.C.
.sctn. 119 of Japanese Application No. 2001-327252, filed Oct. 25,
2001, the disclosure of which is expressly incorporated by
reference herein in its entirety.
DESCRIPTION OF THE INVENTION
[0002] 1. Field of the Invention
[0003] The present invention relates to optical elements having an
antireflection film, and to those having an antireflection film
formed on a plastic substrate. The luminous reflectance of the
antireflection film is low while the luminous transmittance thereof
is high. The impact resistance, the adhesiveness, the heat
resistance, the abrasion resistance and the alkali resistance on
the plastic substrate are superior in optical elements of the
invention, and the productivity is good.
[0004] 2. Background of the Invention
[0005] Heretofore known are optical elements comprising a plastic
substrate and an antireflection film formed thereon through vapor
deposition of inorganic substances. Such optical elements have
superior properties in terms of their antireflection properties and
scratch resistance.
[0006] However, such optical elements having an antireflection film
are unsatisfactory with respect to their impact resistance and the
heat resistance. To solve the problem, for example, it is known to
provide a primer layer made of an organic compound between the
plastic substrate and the antireflection film, as in Japanese
Patent Laid-Open No. 141001/1988.
[0007] However, the primer layer is formed by applying a primer
solution onto a plastic substrate, followed by heating and curing
it, and thereafter, an antireflection film is formed through vapor
deposition. Therefore, one problem with it is that the primer layer
is often uneven in terms of the film thickness. Regarding the
primer disclosed in the above-cited patent publication, the primer
layer is formed in air while the antireflection film is formed in
vacuum. Therefore, other problems with it are that foreign matter
may likely enter the interface between the antireflection film and
the primer layer and that it takes a lot of time to fabricate the
final product.
SUMMARY OF THE INVENTION
[0008] The present inventors have found that when at least one
constitutive layer of the antireflection film is a hybrid layer
comprising an inorganic substance and an organic substance, an
optical element having an antireflection film, which has superior
impact resistance, adhesiveness, heat resistance and abrasion
resistance and, in addition, improved productivity, is
obtained.
[0009] Specifically, the optical element having an antireflection
film of the invention is an optical element having an
antireflection film, which comprises a plastic substrate and an
antireflection film that may be formed thereon through vacuum
evaporation. At least one layer of the antireflection film is a
hybrid layer comprising an inorganic substance and an organic
substance. Having the hybrid layer therein, the optical element
having an antireflection film, which has superior adhesiveness,
heat resistance and abrasion resistance, can be provided without
impairing impact resistance, even when a primer layer such as that
described in Japanese Patent Laid-Open No. 141001/1988 is not
provided. Like the other constitutive layers, the hybrid layer is
laminated in vacuum. Therefore, curing necessary for providing the
primer layer as in Japanese Patent Laid-Open No. 141001/1988 can be
omitted, and in addition, the generation of foreign matter within
the antireflection film can be reduced.
DETAILED DESCRIPTION OF THE INVENTION
[0010] The particulars shown herein are by way of example and for
purposes of illustrative discussion of the various embodiments of
the present invention only. In this regard, no attempt is made to
show details of the invention in more detail than is necessary for
a fundamental understanding of the invention, the description
making apparent to those skilled in the art how the several forms
of the invention may be embodied in practice.
[0011] In the optical element of the invention, a hybrid layer
comprising an inorganic substance and an organic substance may be
formed within the antireflection film through vapor deposition,
whereby the flexibility of the antireflection film is increased,
and the internal stress thereof is reduced. Thus, it is possible to
provide an optical element having an antireflection film, which has
superior adhesiveness, heat resistance and abrasion resistance,
without impairing its impact resistance, that is comparable to
those disclosed in Japanese Patent Laid-Open No. 141001/1988. In
addition, since the optical element of the invention is not
required to provide a primer layer to be formed by applying a
primer solution, followed by heating in air, as in the technical
teaching of Japanese Patent Laid-Open No. 141001/1988, curing can
be omitted, contamination with foreign matter can be prevented, and
the film thickness of the antireflection film can be controlled
more accurately.
[0012] The hybrid layer can be formed in any layer of the
antireflection film. In one embodiment of the invention, it is
formed in a layer nearest to the plastic substrate and in a layer
remotest from it, in order to more effectively realize the
reflectance characteristics and the above-described physical
properties, especially the impact resistance. It may be desirable
that the antireflection film is formed of a plurality of layers.
The hybrid layer may be formed in an ion-assisted process in order
to obtain good film strength and adhesiveness.
[0013] For a suitable power range in the ion-assisted process, the
acceleration voltage is in the range of from 50 V to 150 V, and the
acceleration current is in the range of from 30 mA to 100 mA for
ensuring better reaction. The ionizing gas to be used in the
ion-assisted process may be argon (Ar) or a mixed gas of
argon+oxygen in view of the reactivity and the oxidation resistance
during the film formation.
[0014] In the optical element of the invention, a layer comprising
at least one metal having a catalytic action during the formation
of the hybrid layer mentioned below, which is selected from, for
example, nickel (Ni), silver (Ag), platinum (Pt), niobium (Nb) and
titanium (Ti), can be formed as a basic layer under the
antireflection film for improving the adhesiveness. The basic layer
is a metallic layer made of niobium for further enhancing the
impact resistance. When the metallic layer is used as the basic
layer, the reaction of the hybrid layer to be formed above the
basic layer is likely to be promoted, thereby obtaining substances
having an intramolecular network structure to improve the impact
resistance.
[0015] For ensuring good adhesiveness between the plastic substrate
and the basic layer and for ensuring good uniformity of the initial
film morphology of the vapor deposition substance, an ion gun
pretreatment may be carried out before the formation of the basic
layer. As the ionizing gas in the ion gun pretreatment, oxygen,
argon (Ar), etc. can be used. As a suitable power range in the
pretreatment, the acceleration voltage is in the range of from 50 V
to 200 V, and the acceleration current is in the range of from 50
mA to 150 mA from the standpoint of obtaining good adhesiveness and
abrasion resistance.
[0016] In the invention, the antireflection film may be formed
through vapor deposition. If desired, it can be formed through
physical vapor deposition (PVD), chemical vapor deposition (CVD),
sputtering, ion plating, plasma CVD or the like.
[0017] The constitutive layers other than the hybrid layer of the
antireflection film are not specifically limited. In order to
obtain good properties such as antireflection, it is preferred that
a low-refraction layer is made of SiO.sub.2 or a mixture of
SiO.sub.2 and Al.sub.2O.sub.3 and that a high-refraction layer is
made of Nb.sub.2O.sub.5 or TiO.sub.2.
[0018] Preferably, the inorganic substance to be used in the hybrid
layer in the invention is SiO.sub.2 alone, a mixture of SiO.sub.2
and Al.sub.2O.sub.3, or at least one inorganic oxide selected from
Nb.sub.2O.sub.5, Ta.sub.2O.sub.5, TiO.sub.2, ZrO.sub.2 and
Y.sub.2O.sub.3.
[0019] A suitable organic substance to be used in the hybrid layer
in the invention is a modified silicone oil. A suitable modified
silicone oil has a number-average molecular weight of from 250 to
6,000 and has a structure of any of the following general formulae
(a) to (d).
[0020] 1. Modified at Side Chains:
[0021] (a) Modified silicone oil having an organic group introduced
into the side chains of polysiloxane: 1
[0022] 2. Modified at Both Ends:
[0023] (b) Modified silicone oil having an organic group introduced
into both ends of polysiloxane: 2
[0024] 3. Modified at One End:
[0025] (c) Modified silicone oil having an organic group introduced
into one end of polysiloxane: 3
[0026] 4. Modified at Side Chains and at Both Ends:
[0027] (d) Modified silicone oil having an organic group introduced
into the side chains and both ends of polysiloxane: 4
[0028] (In the general formulae (a) to (d), m and n each
independently indicate an integer of 0 or more; and in the general
formula (c), R represents an alkyl group having from 1 to 10 carbon
atoms, an alkenyl group having from 2 to 10 carbon atoms, or an
alkinyl group having from 2 to 10 carbon atoms. The compounds of
the general formulae (a) and (d) can be either block copolymers or
random copolymers.)
[0029] Depending on the type of the organic group introduced
thereinto, the modified silicone oil is grouped into a reactive
silicone oil and a non-reactive silicone oil.
[0030] In the reactive silicone oil, examples of the organic group
include:
[0031] (1) an amino group,
[0032] (2) an epoxy group,
[0033] (3) a carboxyl group,
[0034] (4) a hydroxyl group-containing hydrocarbon group having 1
to 15 carbon atoms,
[0035] (5) a methacrylic group,
[0036] (6) a mercapto group,
[0037] (7) a phenol group,
[0038] (8) a C.sub.1-15 alkoxy group,
[0039] (9) a hydrocarbon group having 1 to 15 carbon atoms carrying
one or more of the substituents listed above, and
[0040] (10) an organic group containing a combination of two or
more of the above groups (preferably a combination of amino group
and alkoxy group, combination of epoxy group and polyether group,
or combination of amino group and polyether group).
[0041] In the non-reactive silicone oil, examples of the organic
group include:
[0042] (1) a poly(C.sub.2-15 alkylene)ether group, having 2 to 15
repeating units,
[0043] (2) a methylstyryl group,
[0044] (3) a C.sub.1-15 alkyl group,
[0045] (4) a C.sub.2-15 higher acid ester group,
[0046] (5) an ester of a fatty acid having 16 to 20 carbon atoms, ,
and
[0047] (6) and a hydrocarbon group having 1 to 15 carbon atoms that
is substituted with one or more fluorine atoms.
[0048] It is desirable that the number-average molecular weight of
the modified silicone oil is in the range of from 250 to 6,000 from
the standpoints of controlling the organic component in the hybrid
layer and enhancing the strength of the film itself.
[0049] Another suitable organic substance in the hybrid layer is a
compound of the following general formula (I): 5
[0050] wherein x and z each independently represent an integer of 0
or more; y represents an integer of 1 or more; R.sub.1 to R.sub.6
each independently represent a hydrogen atom or an organic group
selected from a methyl group, a hydrocarbon group having 1 to 15
carbon atoms containing an epoxy group, an amino group, a
(meth)acrylic group, a hydroxyl group, a hydrocarbon group having 1
to 15 carbon atoms containing a carbonyl group, a vinyl group, a
thiol group, a carbon-carbon triple bond-containing hydrocarbon
group having 1 to 15 carbon atoms, an alkoxysilane group having
from 1 to 15 carbon atoms, an alkylamino group having from 1 to 15
carbon atoms and a cyclic alkyl group having from 5 to 8 carbon
atoms.
[0051] According to one embodiment of the invention, at least one
of R.sub.1 to R.sub.6 is a sorbitan residue (derived from sorbitan
by removing one hydrogen atom from it) or a sorbitan ester residue
(derived from sorbitan ester by removing one hydrogen atom from
it). 6
[0052] The hydrocarbon group represented by R contains preferably
10 to 20 carbon atoms. It may be branched or linear and it may
contain one or more unsaturations.
[0053] The compound of the general formula (I) may be polyethylene
glycol monobutyl monoglycidyl ether, polyethylene glycol diglycidyl
ether, polyoxyethylene .alpha.,.omega.-bis-3-aminopropyl ether,
polyethylene glycol sorbitan monolaurate, polyethylene glycol
sorbitan monooleate or polyoxyethylene monoacrylate.
[0054] The number-average molecular weight of the compound of the
general formula (I) may be in the range of from 250 to 6,000 taking
into account the control of the organic component in the hybrid
layer and the strength of the hybrid layer. The control of the
organic component in the hybrid layer can be improved by selecting
compounds of the general formula (I) having low molecular weights
that may be in the range of 250 to 6000.
[0055] In the film formation of the organic substance in the
invention, for the purpose of controlling the amount of the organic
substance to be evaporated, it is desirable that the organic
substance is diluted with a solvent and the resulting dilution is
infiltrated into a bio-column filter and dried. The bio-column
filter is preferably produced from sinter stainless and inorganic
glass. The solvent is not specifically limited. Dimethyl ether is
preferred for amine-terminated organic compounds; ethyl acetate is
for epoxide-terminated organic compounds; trimethylethylsilane or
diethyl ether is preferred for polysiloxane-based organic compounds
of low polarity; and methanol is preferred for polyether-based
organic compounds of high polarity, respectively.
[0056] As to the film formation, it is desirable that a porous
material is heated to thereby vaporize and deposit the organic
substance on the substrate to form the intended layer thereon. When
the organic substance is dissolved in a solvent, and the amount of
the resulting solution is controlled, the film thickness can be
controlled. The heating device is not specifically limited. For
example, a halogen heater, a resistance heater or a ceramic heater
can be used.
[0057] The dissolved organic substance is charged into a suitable
vessel, and heated and vaporized. Preferably, the vessel is made of
a porous material, and the solution is infiltrated into it and
heated. In that manner, the vapor deposition rate can be suitably
controlled. More concretely, the porous material is preferably a
sintered filter produced by sintering a metal powder of high
thermal conductivity such as copper. From the standpoint of
obtaining a suitable vapor deposition rate, the pore size of the
porous material is generally in the range of from 40 to 200 .mu.m,
and preferably in the range of from 80 to 120 .mu.m.
[0058] The vessel is heated at 200 to 300.degree. C., and
preferably 200 to 240.degree. C. from the standpoint of obtaining a
suitable vapor deposition rate.
[0059] The heating device may be provided with a shutter mechanism
for controlling the film formation. Also, the heating device may be
covered for preventing the film-forming substance from scattering
therearound to contaminate the plastic substrate during the
heating. For stable supply of the film-forming substance in the
step of film formation, it is desirable that the bio-column filter
is kept in an evaporation rate-controlling chamber having small
holes. Regarding their shape, the holes are preferably oval for
ensuring better distribution orientation of the film-forming
organic substance.
[0060] Generally, the content of the organic substance in the
hybrid layer in the film is in the range of from 0.02% by weight to
70% by weight taking into account the matter that a particularly
good physical property-improving effect is obtained. A particularly
preferred content of the organic substance is in the range of 0.5%
by weight to 25% by weight.
[0061] The content of the organic substance in the hybrid layer in
the film can be determined by, for example, previously grasping the
refractive indices of the inorganic substance and organic substance
and measuring the film thickness of the hybrid layer and the
reflectance thereof. The content of the organic substance in the
hybrid layer can be determined by means of interpolation from the
refractive index of the hybrid layer, using of the refractive index
of a layer consisting of the organic substance and the refractive
index of a layer consisting of the inorganic substance as a
basis.
[0062] In forming the hybrid layer, it is desirable that separate
vapor deposition sources of inorganic and organic substances are
simultaneously vaporized and deposited. The relative content of the
organic substance can be controlled by varying the temperature
and/or surface of the heating devices of the organic substance
and/or of the inorganic substance. If the hybrid layer is to
contain more than one inorganic substance or more than one organic
substance, these are preferably vaporized in separate heating
devices.
[0063] One embodiment of the layer constitution of the
antireflection film formed on a plastic substrate in the invention
is as follows:
[0064] 1st layer: hybrid layer of SiO.sub.2+Al.sub.2O.sub.3+organic
substance (layer thickness, 10 to 180 nm),
[0065] 2nd layer: Nb.sub.2O.sub.5 layer (layer thickness, 1 to 25
nm),
[0066] 3rd layer: SiO.sub.2+Al.sub.2O.sub.3 layer (layer thickness,
10 to 50 nm),
[0067] 4th layer: Nb.sub.2O.sub.5 layer (layer thickness, 10 to 55
nm),
[0068] 5th layer: SiO.sub.2+Al.sub.2O.sub.3 layer (layer thickness,
10 to 50 nm),
[0069] 6th layer: Nb.sub.2O.sub.5 layer (layer thickness, 10 to 120
nm), and
[0070] 7th layer: hybrid layer of SiO.sub.2+Al.sub.2O.sub.3+organic
substance (layer thickness, 70 to 100 nm).
[0071] The ranges of the layer thickness mentioned above are
preferred ones for the impact resistance, adhesiveness, heat
resistance and abrasion resistance of the optical element having an
antireflection film formed on a plastic substrate.
[0072] Another embodiment of the layer constitution of the
antireflection film is as follows:
[0073] Basic layer: Nb layer (layer thickness, 1 to 5 nm),
[0074] 1st layer: hybrid layer of SiO.sub.2+Al.sub.2O.sub.3+organic
substance (layer thickness, 10 to 180 nm),
[0075] 2nd layer: Nb.sub.2O.sub.5 layer (layer thickness, 10 to 55
nm),
[0076] 3rd layer: SiO.sub.2+Al.sub.2O.sub.3 layer (layer thickness,
10 to 50 nm),
[0077] 4th layer: Nb.sub.2O.sub.5 layer (layer thickness, 10 to 55
nm),
[0078] 5th layer: SiO.sub.2+Al.sub.2O.sub.3 layer (layer thickness,
10 to 50 nm),
[0079] 6th layer: Nb.sub.2O.sub.5 layer (layer thickness, 10 to 120
nm), and
[0080] 7th layer: hybrid layer of SiO.sub.2+Al.sub.2O.sub.3+organic
substance (layer thickness, 70 to 100 nm).
[0081] The ranges of the layer thickness mentioned above are
preferred ones for the impact resistance, adhesiveness, heat
resistance and abrasion resistance of the optical element having an
antireflection film formed on a plastic substrate. For better
properties, at least one layer in the film constitution may be
formed in an ion-assisted process.
[0082] In one embodiment of the invention, the range of the
refractive index of the hybrid layer of
SiO.sub.2+Al.sub.2O.sub.3+organic substance is from 1.450 to 1.485
from the standpoint of obtaining good abrasion resistance and
impact resistance.
[0083] The material for the plastic substrate for use in the
invention is not specifically limited, including, for example,
methyl methacrylate homopolymers, copolymers of methyl methacrylate
and one or more other monomers, diethylene glycol bisallyl
carbonate homopolymers, copolymers of diethylene glycol bisallyl
carbonate and one or more other monomers, sulfur-containing
copolymers, halogen copolymers, polycarbonates, polystyrenes,
polyvinyl chlorides, unsaturated polyesters, polyethylene
terephthalates, polyurethanes, and polythiourethanes.
[0084] The optical element of the invention may have a cured film
between the plastic substrate and the basic layer. For the cured
film, in general, a composition that comprises metal oxide colloid
particles and an organosilicon compound of the following general
formula (II) is used:
(R.sub.7).sub.a(R.sub.8).sub.bSi(OR.sub.9).sub.4-(a+b) (II)
[0085] wherein R.sub.7 and R.sub.8 each independently represent an
organic group selected from an alkyl group having from 1 to 8
carbon atoms, an alkenyl group having from 2 to 8 carbon atoms, an
aryl group having from 6 to 8 carbon atoms, an acyl group having
from 1 to 8 carbon atoms, a halogen atom, a glycidoxy group, an
epoxy group, an amino group, a mercapto group, a methacryloxy group
and a cyano group; R.sub.9 represents an organic group selected
from an alkyl group having from 1 to 8 carbon atoms, an acyl group
having from 1 to 8 carbon atoms and an aryl group having from 6 to
10 carbon atoms; and a and b each independently represent an
integer of 0 or 1.
[0086] Examples of the metal oxide colloid particles include those
of tungsten oxide (WO.sub.3), zinc oxide (ZnO), silicon oxide
(SiO.sub.2), aluminum oxide (Al.sub.2O.sub.3), titanium oxide
(TiO.sub.2), zirconium oxide (ZrO.sub.2), tin oxide (SnO.sub.2),
beryllium oxide (BeO), and antimony oxide (Sb.sub.2O.sub.5). These
metal oxides may be used alone or be combined herein.
[0087] Examples of the organosilicon compound of the general
formula (II) include methyl silicate, ethyl silicate, n-propyl
silicate, i-propyl silicate, n-butyl silicate, sec-butyl silicate,
t-butyl silicate, tetraacetoxysilane, methyltrimethoxysilane,
methyltriethoxysilane, methyltripropoxysilane,
methyltriacetoxysilane, methyltributoxysilane,
methyltripropoxysilane, methyltriamyloxysilane,
methyltriphenoxysilane, methyltribenzyloxysilane,
methyltriphenethyloxysilane, glycidoxymethyltrimethoxysilane,
glycidoxymethyltriethoxysilane,
.alpha.-glycidoxyethyltriethoxysilane,
.beta.-glycidoxyethyltrimethoxysil- ane,
.beta.-glycidoxyethyltriethoxysilane,
.alpha.-glycidoxypropyltrimetho- xysilane,
.alpha.-glycidoxypropyltriethoxysilane, .beta.-glycidoxypropyltr-
imethoxysilane, .beta.-glycidoxypropyltriethoxysilane,
.gamma.-glycidoxypropyltrimethoxysilane,
.gamma.-glycidoxypropyltriethoxy- silane,
.gamma.-glycidoxypropyltripropoxysilane, .gamma.-glycidoxypropyltr-
ibutoxysilane, .gamma.-glycidoxypropyltriphenoxysilane,
.alpha.-glycidoxybutyltrimethoxysilane,
.alpha.-glycidoxybutyltriethoxysi- lane,
.beta.-glycidoxybutyltrimethoxysilane,
.beta.-glycidoxybutyltriethox- ysilane,
.gamma.-glycidoxybutyltrimethoxysialne, .gamma.-glycidoxybutyltri-
ethoxysilane, .delta.-glycidoxybutyltrimethoxysilane,
.delta.-glycidoxybutyltriethoxysilane,
(3,4-mercaptopropyltrimethoxysilan- e,
.gamma.-mercaptopropyltriethoxysilane,
.beta.-cyanoethyltriethoxysilane- , chloromethyltrimethoxysilane,
chloromethyltriethoxysilane,
N-(.beta.-aminoethyl)-.gamma.-aminopropyltrimethoxysilane,
N-(.beta.-aminoethyl)-.gamma.-aminopropylmethyldimethoxysilane,
.gamma.-aminopropylmethyldimethoxysilane,
N-(.beta.-aminoethyl)-.gamma.-a- minopropyltriethoxysilane,
N-(.beta.-aminoethyl)-.gamma.-aminopropylmethyl- diethoxysilane,
dimethyldimethoxysilane, phenylmethyldimethoxysilane,
dimethyldiethoxysilane, phenylmethyldiethoxysilane,
.gamma.-chloropropylmethyldimethoxysilane,
.gamma.-chloropropylmethyldiet- hoxysilane,
dimethyldiacetoxysilane, .gamma.-methacryloxypropylmethyldimet-
hoxysilane, .gamma.-methacryloxypropylmethyldiethoxysilane,
.gamma.-mercaptopropylmethyldimethoxysilane,
.gamma.-mercaptopropylmethyl- diethoxysilane,
methylvinyldimethoxysilane, and methylvinyldiethoxysilane.
[0088] In general, the composition to be used to obtain the cured
film may contain between 1 and 20 weight % of the metal oxide
colloid particles based on the total weight of the composition, and
preferably between 5 and 15 weight %.
[0089] The coating solution to form the cured film can be
formulated in a conventional manner. If desired, a curing catalyst
as well as various organic solvents and surfactants can be
contained for the purposes of improving the wettability during the
application and improving the smoothness of the cured film. In
addition, UV absorbents, antioxidants, light stabilizers,
anti-aging agents, etc. can be added so far as the desired physical
properties of the coating composition and the cured film are
achieved.
[0090] The coating composition is cured by drying with hot air or
by exposure to active energy rays. Preferably, it is cured in hot
air at 70 to 200.degree. C., more preferably at 90 to 150.degree.
C. Examples of the active energy rays include far-infrared rays, so
that a damage by heat can be suppressed.
[0091] Examples of the method for forming a cured film made of the
coating composition on a substrate include a method in which the
coating composition is applied onto the substrate. The application
can be carried out by means of any ordinary method such as dipping,
spin coating or spraying. In view of the face accuracy dipping or
spin coating is especially preferred.
EXAMPLES
[0092] The invention is described in more detail with reference to
the following Examples, which, however, are not intended to
restrict the invention.
[0093] The physical properties of the optical elements obtained in
the following Examples and Comparative Examples were measured
according to the methods mentioned below.
[0094] (1) Luminous Transmittance:
[0095] Using a spectrophotometer, U-3410 made by Hitachi, Ltd., the
luminous transmittance, Y of a sample of a plastic lens having an
antireflection film formed on both surfaces was measured.
[0096] (2) Luminous Reflectance:
[0097] Using a spectrophotometer, U-3410 made by Hitachi, Ltd., the
luminous reflectance, Z of a sample of a plastic lens having an
antireflection film formed on both surfaces was measured.
[0098] (3) Impact Resistance:
[0099] A plastic lens having a center thickness (CT) of 2.0 mm and
a power of lens of -4.00 D was prepared and subjected to a drop
ball test as defined by FDA (Food and Drug Administration). "O"
indicates good samples; and "x" indicates rejected samples. The
drop ball test was continued until the lens samples were broken,
and the strength was confirmed as a maximum load. The weight of the
ball was 14 g.
[0100] (4) Adhesiveness:
[0101] Using a cutting tool, the surface of a plastic lens was cut
to have 100 cross-cuts of 1 mm.times.1 mm each. An adhesive tape,
Cellotape was stuck on its cross-cut area, and peeled off at a
stroke. The number of the remaining cross-cuts was counted and
shown in the following Tables, in which (number of remaining
cross-cuts)/100 indicates the adhesiveness.
[0102] (5) Abrasion Resistance:
[0103] The surface of a plastic lens was rubbed with steel wool
under a load of 1 kgf/cm.sup.2 applied thereto. After 10 strokes of
rubbing, the surface condition of the plastic lens was evaluated
according to the following criteria:
[0104] UA: Scratched little.
[0105] A: A few thin scratch marks found.
[0106] B: Many thin scratch marks and a few thick scratch marks
found.
[0107] C: Many thin and thick scratch marks found.
[0108] D: Almost completely peeled
[0109] (6) Heat resistance:
[0110] A plastic lens was heated in a dry oven for 1 hour. The
heating temperature at the start of the test was 60.degree. C., and
it was elevated at intervals of 5.degree. C. The temperature at
which it cracked was read.
[0111] (7) Alkali resistance:
[0112] A plastic lens was dipped in an aqueous 10% NaOH solution at
20.degree. C. for 1 hour, and its surface condition was evaluated
according to the following criteria:
[0113] UA: Changed little.
[0114] A: A few peeled dots found.
[0115] B: Many peeled dots found everywhere on the surface.
[0116] C: Many peeled dots found everywhere on the surface, and a
few peeled squares found.
[0117] D: Almost completely peeled.
Examples 1 to 20
[0118] 90 parts by weight of colloidal silica (Snowtex-40 available
from Nissan Chemical Industries, Ltd.), 81.6 parts by weight of
methyltrimethoxysilane and 176 parts by weight of
.gamma.-glycidoxypropyl- trimethoxysilane as organosilicon
compounds, 2.0 parts by weight of 0.5 N hydrochloric acid, 20 parts
by weight of acetic acid, and 90 parts by weight of water were
charged into a glass container, and the solution was stirred at
room temperature for 8 hours. The resulting solution was left at
room temperature for 16 hours to obtain a hydrolyzed solution. To
this solution were added 120 parts by weight of isopropyl alcohol,
120 parts by weight of n-butyl alcohol, 16 parts by weight of
aluminum acetylacetone, 0.2 parts by weight of a silicone
surfactant, and 0.1 parts by weight of a UV absorbent. The mixture
was stirred at room temperature for 8 hours, and then aged at room
temperature for 24 hours to obtain a coating solution.
[0119] A plastic lens substrate (made of diethylene glycol bisallyl
carbonate, and having a refractive index of 1.50, a center
thickness of 2.0 mm, a diameter of 70 mm and a power of lens of
0.00), which had been pretreated with an aqueous alkali solution,
was dipped in the coating solution. After completion of dipping,
the plastic lens was taken out at a pulling rate of 20 cm/min.
Then, the plastic lens was heated at 120.degree. C. for 2 hours to
form a cured film (hard coat layer A). Next, the resulting plastic
lens was subjected to an ion gun pretreatment using an Ar gas under
the condition of the ion acceleration voltage as shown in Tables 1
to 10.
[0120] Next, under the conditions shown in Tables 1 to 10, an
antireflection film composed of 1 st to 7th layers was formed on
the hard coat layer A to obtain plastic lenses.
[0121] In forming the hybrid layer, the inorganic substance and the
organic substance were almost simultaneously evaporated and
deposited in a mode of controlled two-way vapor deposition. The
organic substance was dissolved in an organic solvent, and the
resulting solution was infiltrated into a sintered stainless
steel-made filter (pore size, 80 to 100 .mu.m, diameter: 18 mm,
thickness: 3 mm). The ratio of the organic substance to the solvent
was {fraction (1/4 )}by weight, and the content of the organic
substance and the solvent was 1 ml per one filter chip. The filter
was set in a vacuum evaporation chamber and heated at 250.degree.
C. However, since the organic substance E was vaporized in an
external heating tank, and its vapor was introduced into the vapor
deposition chamber using a gas valve and a mass flow controller, no
filter chip was used.
[0122] The structures of the products, organic substances A to E in
the Tables are as follows.
[0123] Organic Substance A:
[0124] This is a reactive silicone oil, KF1001 (available from
Shin-Etsu Silicone Co., Ltd.) of the general formula (a) in which
the organic group is an epoxy group. The solvent is
trimethylethylsilane, LS-865 (available from Shin-Etsu Chemical
Co:, Ltd.).
[0125] Organic Substance B:
[0126] This is a reactive silicone oil, X22-4741 (available from
Shin-Etsu Silicone Co., Ltd.) of the general formula (a) in which
the organic group is an epoxy group and a polyether group. The
solvent is ethyl acetate.
[0127] Organic Substance C:
[0128] This is a reactive silicone oil, X22-8008 (available from
Shin-Etsu Silicone Co., Ltd.) of the general formula (a) in which
the organic group is an aminoalkyl group. The solvent is diethyl
ether.
[0129] Organic Substance D:
[0130] This is polyoxyethylene monoacrylate, AE-400 (available from
NOF Corporation). The solvent is ethyl acetate.
[0131] Organic Substance E:
[0132] This is polyethylene glycol glycidyl ether, E-400 (available
from NOF Corporaiton). No solvent is used.
[0133] The obtained plastic lenses were evaluated according to the
test methods (1) to (7) mentioned above, and the results are shown
in Tables 1 to 10. In the Tables, .lambda. indicates the wavelength
of the light applied, and .lambda.=500 nm. The refractive index of
the hybrid layer was measured at .lambda.=500 nm.
Comparative Examples 1 to 4
[0134] Plastic lenses were fabricated under the conditions shown in
Tables 11 and 12, in which the hard coat layer and the functional
film of the first to seventh layers were all formed of an inorganic
substance only.
[0135] The plastic lenses were evaluated according to the test
methods (1) to (7) mentioned above, and the results are shown in
Tables 11 and 12.
[0136] Layers, which were produced without an ion assisted process,
are indicated in the following tables by the sign "-" in the column
"Ion gun setting". These layers were deposited through conventional
vapour deposition.
1 TABLE 1-1 Example 1 Example 2 Plastic lens substrate Diethylene
glycol bisallyl carbonate Diethylene glycol bisallyl carbonate Hard
Coat layer Layer A Layer A Setting for ion gun pretreatment
Acceleration voltage: 200 V, Acceleration current: 100 mA
Acceleration voltage: 200 V, Acceleration current: 100 mA Gas used
Ar Ar Film type & Film thickness Ion gun setting Film type
& Film thickness Ion gun setting 1st Layer SiO.sub.2 +
Al.sub.2O.sub.3 + organic substance 100 V, 70 mA SiO.sub.2 +
Al.sub.2O.sub.3 + organic substance 100 V, 70 mA A: 0.25 .lambda.
Ar gas A: 0.25 .lambda. Ar gas Layer refractive index: 1.468 Layer
refractive index: 1.468 Refractive index of SiO.sub.2 +
Al.sub.2O.sub.3: Refractive index of SiO.sub.2 + Al.sub.2O.sub.3:
1.486 1.486 Refractive index of organic Refractive index of organic
substance A: 1.425 substance A: 1.425 Content of organic substance:
Content of organic substance: about 31 wt. % about 31 wt. % 2nd
Layer Nb.sub.2O.sub.5: 0.053 .lambda. -- Nb.sub.2O.sub.5: 0.055
.lambda. -- 3rd Layer SiO.sub.2 + Al.sub.2O.sub.3: 0.119 .lambda.
-- SiO.sub.2 + Al.sub.2O.sub.3 + organic substance 100 V, 70 mA A:
0.1137 .lambda. Ar gas Layer refractive index: 1.468 Refractive
index of SiO.sub.2 + Al.sub.2O.sub.3: 1.486 Refractive index of
organic substance A: 1.425 Content of organic substance: about 31
wt. % 4th Layer Nb.sub.2O.sub.5: 0.146 .lambda. -- Nb.sub.2O.sub.5:
0.1427 .lambda. -- 5th Layer SiO.sub.2 + Al.sub.2O.sub.3: 0.077
.lambda. -- SiO.sub.2 + Al.sub.2O.sub.3 + organic substance 100
V,70 mA A: 0.0781 .lambda. Ar gas Layer refractive index: 1.468
Refractive index of SiO.sub.2 + Al.sub.2O.sub.3: 1.486 Refractive
index of organic substance A: 1.425 Content of organic substance:
about 31 wt. % 6th Layer Nb.sub.2O.sub.5: 0.131 .lambda. --
Nb.sub.2O.sub.5: 0.128 .lambda. -- 7th Layer SiO.sub.2 +
Al.sub.2O.sub.3 + organic substance 100 V, 70 mA SiO.sub.2 +
Al.sub.2O.sub.3 + organic substance 100 V, 70 mA A: 0.276 .lambda.
Ar gas A: 0.279 .lambda. Ar gas Layer refractive index: 1.468 Layer
refractive index: 1.468 Refractive index of SiO.sub.2 +
Al.sub.2O.sub.3: Refractive index of SiO.sub.2 + Al.sub.2O.sub.3:
1.486 1.486 Refractive index of organic Refractive index of organic
substance A: 1.425 substance A: 1.425 Content of organic substance:
Content of organic substance: about 31 wt. % about 31 wt. % Organic
substance A. KF1001 made by Shin-Etsu Silicone Co., Ltd. A: KF1001
made by Shin-Etsu Silicone Co., Ltd. used
[0137]
2TABLE 1-2 Evaluation of plastic lens performance Example 1 Example
2 Luminous reflectance, Y % 0.82% 0.80% Luminous transmittance, Z %
99.0% 99.01% Impact resistance CT = 2.0, FDA O, CT = 2.0, FDA O,
Maximum 28 g Maximum 36 g Adhesiveness 100/100 100/100 Abrasion
resistance UA UA to A Heat resistance 95.degree. C. 100.degree. C.
Alkali resistance UA UA to A
[0138]
3TABLE 2-1 Example 3 Example 4 Plastic lens substrate Diethylene
glycol bisallyl carbonate Diethylene glycol bisallyl carbonate Hard
Coat layer Layer A Layer A Setting for ion gun pretreatment
Acceleration voltage: 200 V, Acceleration current: 100 mA
Acceleration voltage: 200 V, Acceleration current: 100 mA Gas used
Ar Ar Film type & Film thickness Ion gun setting Film type
& Film thickness Ion gun setting 1st Layer SiO.sub.2 +
Al.sub.2O.sub.3 + organic substance 100 V, 70 mA SiO.sub.2 +
Al.sub.2O.sub.3 + organic substance 100 V, 70 mA A: 0.25 .lambda.
Ar gas A: 0.25 .lambda. Ar gas Layer refractive index: 1.468 Layer
refractive index: 1.468 Refractive index of SiO.sub.2 +
Al.sub.2O.sub.3: Refractive index of SiO.sub.2 + Al.sub.2O.sub.3:
1.486 1.486 Refractive index of organic Refractive index of organic
substance A: 1.425 substance A: 1.425 Content of organic substance:
Content of organic substance: about 31 wt. % about 31 wt. % 2nd
Layer Nb.sub.2O.sub.5: 0.0568 .lambda. 350 V, 130 mA
Nb.sub.2O.sub.5: 0.0581 .lambda. 350 V, 130 mA O.sub.2/Ar, 8/2
O.sub.2/Ar, 8/2 3rd Layer SiO.sub.2 + Al.sub.2O.sub.3: 0.1205
.lambda. -- SiO.sub.2 + Al.sub.2O.sub.3 + organic substance 100 V,
70 mA A: 0.1131 .lambda. Ar gas Layer refractive index: 1.468
Refractive index of SiO.sub.2 + Al.sub.2O.sub.3: 1.486 Refractive
index of organic substance A: 1.425 Content of organic substance:
about 31 wt. % 4th Layer Nb.sub.2O.sub.5: 0.1469 .lambda. 350 V,
130 mA Nb.sub.2O.sub.5: 0.1465 .lambda. 350 V, 130 mA O.sub.2/Ar,
8/2 O.sub.2/Ar, 8/2 5th Layer SiO.sub.2 + Al.sub.2O.sub.3: 0.0788
.lambda. -- SiO.sub.2 + Al.sub.2O.sub.3 + organic substance 100 V,
70 mA A: 0.0768 .lambda. Ar gas Layer refractive index: 1.468
Refractive index of SiO.sub.2 + Al.sub.2O.sub.3: 1.486 Refractive
index of organic substance A: 1.425 Content of organic substance:
about 31 wt. % 6th Layer Nb.sub.2O.sub.5: 0.1210 .lambda. 350 V,
130 mA Nb.sub.2O.sub.5: 0.125 .lambda. 350 V, 130 mA O.sub.2/Ar,
8/2 O.sub.2/Ar, 8/2 7th Layer SiO.sub.2 + Al.sub.2O.sub.3 + organic
substance 100 V, 70 mA SiO.sub.2 + Al.sub.2O.sub.3 + organic
substance 100 V, 70 mA A: 0.274 .lambda. Ar gas A: 0.279 .lambda.
Ar gas Layer refractive index: 1.468 Layer refractive index: 1.468
Refractive index of SiO.sub.2 + Al.sub.2O.sub.3: Refractive index
of SiO.sub.2 + Al.sub.2O.sub.3: 1.486 1.486 Refractive index of
organic Refractive index of organic substance A: 1.425 substance A:
1.425 Content of organic substance: Content of organic substance:
about 31 wt. % about 31 wt. % Organic substance A: KF1001 made by
Shin-Etsu Silicone Co., Ltd. A: KF1001 made by Shin-Etsu Silicone
Co., Ltd. used
[0139]
4TABLE 2-2 Evaluation of plastic lens performance Example 3 Example
4 Luminous reflectance, Y % 0.72% 0.70% Luminous transmittance, Z %
99.10% 99.11% Impact resistance CT = 2.0, FDA O, CT = 2.0, FDA O,
Maximum 28 g Maximum 36 g Adhesiveness 100/100 100/100 Abrasion
resistance UA UA to A Heat resistance 100.degree. C. 110.degree. C.
Alkali resistance UA UA to A
[0140]
5TABLE 3-1 Example 5 Example 6 Plastic lens substrate Diethylene
glycol bisallyl carbonate Diethylene glycol bisallyl carbonate Hard
Coat layer Layer A Layer A Setting for ion gun pretreatment
Acceleration voltage: 200 V, Acceleration current: 100 mA
Acceleration voltage: 200 V, Acceleration current: 100 mA Gas used
Ar Ar Film type & Film thickness Ion gun setting Film type
& Film thickness Ion gun setting 1st Layer SiO.sub.2 +
Al.sub.2O.sub.3 + organic substance 100 V, 70 mA SiO.sub.2 +
Al.sub.2O.sub.3 + organic substance 100 V, 70 mA B: 0.25 .lambda.
Ar gas B: 0.25 .lambda. Ar gas Layer refractive index: 1.465 Layer
refractive index: 1.465 Refractive index of SiO.sub.2 +
Al.sub.2O.sub.3: Refractive index of SiO.sub.2 + Al.sub.2O.sub.3:
1.486 1.486 Refractive index of organic Refractive index of organic
substance B: 1.427 substance B: 1.427 Content of organic substance:
Content of organic substance: about 37 wt. % about 37 wt. % 2nd
Layer Nb.sub.2O.sub.5: 0.053 .lambda. -- Nb.sub.2O.sub.5: 0.055
.lambda. -- 3rd Layer SiO.sub.2 + Al.sub.2O.sub.3: 0.119 .lambda.
-- SiO.sub.2 + Al.sub.2O.sub.3 + organic substance 100 V, 70 mA B:
1.1137 .lambda. Ar gas Layer refractive index: 1.465 Refractive
index of SiO.sub.2 + Al.sub.2O.sub.3: 1.486 Refractive index of
organic substance B: 1.427 Content of organic substance: about 37
wt. % 4th Layer Nb.sub.2O.sub.5: 0.146 .lambda. -- Nb.sub.2O.sub.5:
0.1427 .lambda. -- 5th Layer SiO.sub.2 + Al.sub.2O.sub.3: 0.077
.lambda. -- SiO.sub.2 + Al.sub.2O.sub.3 + organic substance 100 V,
70 mA B: 0.0781 .lambda. Ar gas Layer refractive index: 1.465
Refractive index of SiO.sub.2 + Al.sub.2O.sub.3: 1.486 Refractive
index of organic substance B: 1.427 Content of organic substance:
about 37 wt. % 6th Layer Nb.sub.2O.sub.5: 0.131 .lambda. --
Nb.sub.2O.sub.5: 0.128 .lambda. -- 7th Layer SiO.sub.2 +
Al.sub.2O.sub.3 + organic substance 100 V, 70 mA SiO.sub.2 +
Al.sub.2O.sub.3 + organic substance 100 V, 70 mA B: 0.276 .lambda.
Ar gas B: 0.279 .lambda. Ar gas Layer refractive index: 1.465 Layer
refractive index: 1.465 Refractive index of SiO.sub.2 +
Al.sub.2O.sub.3: Refractive index of SiO.sub.2 + Al.sub.2O.sub.3:
1.486 1.486 Refractive index of organic Refractive index of organic
substance B: 1.427 substance B: 1.427 Content of organic substance.
Content of organic substance: about 37 wt. % about 37 wt. % Organic
substance B: X22-4741 made by Shin-Etsu Silicone Co., Ltd. B:
X22-4741 made by Shin-Etsu Silicone Co., Ltd. used
[0141]
6TABLE 3-2 Evaluation of plastic lens performance Example 5 Example
6 Luminous reflectance, Y % 0.82% 0.80% Luminous transmittance, Z %
99.0% 99.01% Impact resistance CT = 2.0, FDA O, CT = 2.0, FDA O,
Maximum 45 g Maximum 50 g Adhesiveness 100/100 100/100 Abrasion
resistance UA UA to A Heat resistance 95.degree. C. 100.degree. C.
Alkali resistance UA UA to A
[0142]
7TABLE 4-1 Example 7 Example 8 Plastic lens substrate Diethylene
glycol bisallyl carbonate Diethylene glycol bisallyl carbonate Hard
Coat layer Layer A Layer A Setting for ion gun pretreatment
Acceleration voltage: 200 V, Acceleration current: 100 mA
Acceleration voltage: 200 V, Acceleration current: 100 mA Gas used
Ar Ar Film type & Film thickness Ion gun setting Film type
& Film thickness Ion gun setting 1st Layer SiO.sub.2 +
Al.sub.2O.sub.3 + organic substance 100 V, 70 mA SiO.sub.2 +
Al.sub.2O.sub.3 + organic substance 100 V, 70 mA B: 0.25 .lambda.
Ar gas B: 0.25 .lambda. Ar gas Layer refractive index: 1.465 Layer
refractive index: 1.465 Refractive index of SiO.sub.2 +
Al.sub.2O.sub.3: Refractive index of SiO.sub.2 + Al.sub.2O.sub.3:
1.486 1.486 Refractive index of organic Refractive index of organic
substance B: 1.427 substance B: 1.427 Content of organic substance:
Content of organic substance: about 37 wt. % about 37 wt. % 2nd
Layer Nb.sub.2O.sub.5: 0.0568 .lambda. 350 V, 130 mA
Nb.sub.2O.sub.5: 0.0581 .lambda. 350 V, 130 mA O.sub.2/Ar, 8/2
O.sub.2/Ar, 8/2 3rd Layer SiO.sub.2 + Al.sub.2O.sub.3: 0.1205
.lambda. -- SiO.sub.2 + Al.sub.2O.sub.3 + organic substance 100 V,
70 mA B: 0.1131 .lambda. Ar gas Layer refractive index: 1.465
Refractive index of SiO.sub.2 + Al.sub.2O.sub.3: 1.486 Refractive
index of organic substance B: 1.427 Content of organic substance:
about 37 wt. % 4th Layer Nb.sub.2O.sub.5: 0.1469 .lambda. 350 V,
130 mA Nb.sub.2O.sub.5: 0.1465 .lambda. 350 V, 130 mA O.sub.2/Ar,
8/2 O.sub.2/Ar, 8/2 5th Layer SiO.sub.2 + Al.sub.2O.sub.3, 0.0788
.lambda. -- SiO.sub.2 + Al.sub.2O.sub.3 + organic substance 100 V,
70 mA B: 0.0768 .lambda. Ar gas Layer refractive index: 1.465
Refractive index of SiO.sub.2 + Al.sub.2O.sub.3: 1.486 Refractive
index of organic substance B: 1.427 Content of organic substance:
about 37 wt. % 6th Layer Nb.sub.2O.sub.5: 0.1210 .lambda. 350 V,
130 mA Nb.sub.2O.sub.5: 0.125 .lambda. 350 V, 130 mA O.sub.2/Ar,
8/2 O.sub.2/Ar, 8/2 7th Layer SiO.sub.2 + Al.sub.2O.sub.3 + organic
substance 100 V, 70 mA SiO.sub.2 + Al.sub.2O.sub.3 + organic
substance 100 V, 70 mA B: 0.274 .lambda. Ar gas B: 0.279 .lambda.
Ar gas Layer refractive index: 1.465 Layer refractive index: 1.465
Refractive index of SiO.sub.2 + Al.sub.2O.sub.3: Refractive index
of SiO.sub.2 + Al.sub.2O.sub.3: 1.486 1.486 Refractive index of
organic Refractive index of organic substance B: 1.427 substance B:
1.427 Content of organic substance: Content of organic substance:
about 37 wt. % about 37 wt. % Organic substance B: X22-4741 made by
Shin-Etsu Silicone Co., Ltd. B: X22-4741 made by Shin-Etsu Silicone
Co., Ltd used
[0143]
8TABLE 4-2 Evaluation of plastic lens performance Example 7 Example
8 Luminous reflectance, Y % 0.72% 0.70% Luminous transmittance, Z %
99.1% 99.11% Impact resistance CT = 2.0, FDA O, CT = 2.0, FDA O,
Maximum 45 g Maximum 50 g Adhesiveness 100/100 100/100 Abrasion
resistance UA UA to A Heat resistance 95.degree. C. 100.degree. C.
Alkali resistance UA UA to A
[0144]
9TABLE 5-1 Example 9 Example 10 Plastic lens substrate Diethylene
glycol bisallyl carbonate Diethylene glycol bisallyl carbonate Hard
Coat layer Layer A Layer A Setting for ion gun pretreatment
Acceleration voltage: 200 V, Acceleration current: 100 mA
Acceleration voltage: 200 V, Acceleration current: 100 mA Gas used
Ar Ar Film type & Film thickness Ion gun setting Film type
& Film thickness Ion gun setting 1st Layer SiO.sub.2 +
Al.sub.2O.sub.3 + organic substance 100 V, 70 mA SiO.sub.2 +
Al.sub.2O.sub.3 + organic substance 100 V, 70 mA B: 0.25 .lambda.
Ar gas B: 0.25 .lambda. Ar gas Layer refractive index: 1.465 Layer
refractive index: 1.465 Refractive index of SiO.sub.2 +
Al.sub.2O.sub.3: Refractive index of SiO.sub.2 + Al.sub.2O.sub.3:
1.486 1.486 Refractive index of organic Refractive index of organic
substance B: 1.427 substance B: 1.427 Content of organic substance:
Content of organic substance: about 37 wt. % about 37 wt. % 2nd
Layer Nb.sub.2O.sub.5: 0.053 .lambda. -- Nb.sub.2O.sub.5: 0.055
.lambda. -- 3rd Layer SiO.sub.2 + Al.sub.2O.sub.3: 0.119 .lambda.
-- SiO.sub.2 + Al.sub.2O.sub.3 + organic substance 100 V, 70 mA B:
2.1137 .lambda. Ar gas Layer refractive index: 1.465 Refractive
index of SiO.sub.2 + Al.sub.2O.sub.3: 1.486 Refractive index of
organic substance B: 1.427 Content of organic substance: about 37
wt. % 4th Layer Nb.sub.2O.sub.5: 0.146 .lambda. -- Nb.sub.2O.sub.5:
0.1427 .lambda. -- 5th Layer SiO.sub.2 + Al.sub.2O.sub.3: 0.077
.lambda. -- SiO.sub.2 + Al.sub.2O.sub.3 + organic substance 100 V,
70 mA B: 0.0781 .lambda. Ar gas Layer refractive index: 1.465
Refractive index of SiO.sub.2 + Al.sub.2O.sub.3: 1.486 Refractive
index of organic substance B: 1.427 Content of organic substance:
about 37 wt. % 6th Layer Nb.sub.2O.sub.5: 0.131 .lambda. --
Nb.sub.2O.sub.5: 0.128 .lambda. -- 7th Layer SiO.sub.2 +
Al.sub.2O.sub.3 + organic substance 100 V, 70 mA SiO.sub.2 +
Al.sub.2O.sub.3 + organic substance 100 V, 70 mA B + organic
substance C: 0.276 .lambda. Ar gas B + organic substance C: 0.279
.lambda. Ar gas Layer refractive index: 1.468 Layer refractive
index: 1.468 Refractive index of SiO.sub.2 + Al.sub.2O.sub.3:
Refractive index of SiO.sub.2 + Al.sub.2O.sub.3: 1.486 1.486
Refractive index of organic Refractive index of organic substance
B: 1.427 substance B: 1.427 Refractive index of organic Refractive
index of organic substance C: 1.435 substance C: 1.435 Content of
organic substances B & Content of organic substances B & C:
about 35 wt. % C: about 35 wt. % Organic substance B: X22-4741 made
by Shin-Etsu Silicone Co., Ltd. B: X22-4741 made by Shin-Etsu
Silicone Co., Ltd. used C: X22-8008 made by Shin-Etsu Silicone Co.,
Ltd. C: X22-8008 made by Shin-Etsu Silicone Co., Ltd.
[0145]
10TABLE 5-2 Evaluation of plastic lens performance Example 9
Example 10 Luminous reflectance, Y % 0.82% 0.80% Luminous
transmittance, Z % 99.0% 99.01% Impact resistance CT = 2.0, FDA O,
CT = 2.0, FDA O, Maximum 50 g Maximum 67 g Adhesiveness 100/100
100/100 Abrasion resistance UA UA to A Heat resistance 95.degree.
C. 100.degree. C. Alkali resistance UA UA to A
[0146]
11TABLE 6-1 Example 11 Example 12 Plastic lens substrate Diethylene
glycol bisallyl carbonate Diethylene glycol bisallyl carbonate Hard
Coat layer Layer A Layer A Setting for ion gun pretreatment
Acceleration voltage: 200 V, Acceleration current: 100 mA
Acceleration voltage: 200 V, Acceleration current: 100 mA Gas used
Ar Ar Film type & Film thickness Ion gun setting Film type
& Film thickness Ion gun setting 1st Layer SiO.sub.2 +
Al.sub.2O.sub.3 + organic substance 100 V, 70 mA SiO.sub.2 +
Al.sub.2O.sub.3 + organic substance 100 V, 70 mA B:0.25 .lambda. Ar
gas B:0.25 .lambda. Ar gas Layer refractive index: 1.465 Layer
refractive index: 1.465 Refractive index of SiO.sub.2 +
Al.sub.2O.sub.3 Refractive index of SiO.sub.2 + Al.sub.2O.sub.3:
1.486 1.486 Refractive index of organic Refractive index of organic
substance B: 1.427 substance B: 1.427 Content of organic substance:
Content of organic substance: about 37 wt. % about 37 wt. % 2nd
Layer Nb.sub.2O.sub.5: 0.0568 .lambda. 350 V, 130 mA
Nb.sub.2O.sub.5: 0.0581 .lambda. 350 V, 130 mA O.sub.2/Ar, 8/2
O.sub.2/Ar, 8/2 3rd Layer SiO.sub.2 + Al.sub.2O.sub.3: 0.1205
.lambda. -- SiO.sub.2 + Al.sub.2O.sub.3 + organic substance 100 V,
70 mA B: 0.1131 .lambda. Ar gas Layer refractive index: 1.465
Refractive index of SiO.sub.2 + Al.sub.2O.sub.3: 1.486 Refractive
index of organic substance B: 1.427 Content of organic substance:
about 37 wt. % 4th Layer Nb.sub.2O.sub.5: 0.1469 .lambda. 350 V,
130 mA Nb.sub.2O.sub.5: 0.1465 .lambda. 350 V, 130 mA O.sub.2/Ar,
8/2 O.sub.2/Ar, 8/2 5th Layer SiO.sub.2 + Al.sub.2O.sub.3: 0.0788
.lambda. -- SiO.sub.2 + Al.sub.2O.sub.3 + organic substance 100 V,
70 mA B: 0.0768 .lambda. Ar gas Layer refractive index 1.465
Refractive index of SiO.sub.2 + Al.sub.2O.sub.3: 1.486 Refractive
index of organic substance B: 1.427 Content of organic substance:
about 37 wt. % 6th Layer Nb.sub.2O.sub.5: 0.1210 .lambda. 350 V,
130 mA Nb.sub.2O.sub.5: 0.125 .lambda. 350 V, 130 mA O.sub.2/Ar,
8/2 O.sub.2/Ar, 8/2 7th Layer SiO.sub.2 + Al.sub.2O.sub.3 + organic
substance 100 V, 70 mA SiO.sub.2 + Al.sub.2O.sub.3 + organic
substance 100 V, 70 mA B + organic substance C: 0.274 .lambda. Ar
gas B + organic substance C: 0.279 .lambda. Ar gas Layer refractive
index: 1.468 Layer refractive index: 1.468 Refractive index of
SiO.sub.2 + Al.sub.2O.sub.3: Refractive index of SiO.sub.2 +
Al.sub.2O.sub.3: 1.486 1.486 Refractive index of organic Refractive
index of organic substance B 1.427 substance B. 1.427 Refractive
index of organic Refractive index of organic substance C: 1.435
substance C: 1.435 Content of organic substances B & Content of
organic substances B & C: about 35 wt. % C: about 35 wt. %
Organic substance B: X22-4741 made by Shin-Etsu Silicone Co., Ltd.
B: X22-4741 made by Shin-Etsu Silicone Co., Ltd. used C: X22-8008
made by Shin-Etsu Silicone Co., Ltd. C: X22-8008 made by Shin-Etsu
Silicone Co., Ltd.
[0147]
12TABLE 6-2 Evaluation of plastic lens performance Example 11
Example 12 Luminous reflectance, Y % 0.72% 0.70% Luminous
transmittance, Z % 99.1% 99.11% Impact resistance CT = 2.0, FDA O,
CT = 2.0, FDA O, Maximum 50 g Maximum 67 g Adhesiveness 100/100
100/100 Abrasion resistance UA UA to A Heat resistance 100.degree.
C. 110.degree. C. Alkali resistance UA UA to A
[0148]
13TABLE 7-1 Example 13 Example 14 Plastic lens substrate Diethylene
glycol bisallyl carbonate Diethylene glycol bisallyl carbonate Hard
Coat layer Layer A Layer A Setting for ion gun pretreatment
Acceleration voltage: 200 V, Acceleration current: 100 mA
Acceleration voltage: 200 V, Acceleration current: 100 mA Gas used
Ar Ar Film type & Film thickness Ion gun setting Film type
& Film thickness Ion gun setting 1st Layer SiO.sub.2 +
Al.sub.2O.sub.3 + organic substance 100 V, 70 mA SiO.sub.2 +
Al.sub.2O.sub.3 + organic substance 100 V, 70 mA D: 0.25 .lambda.
Ar gas D: 0.25 .lambda. Ar gas Layer refractive index: 1.462 Layer
refractive index: 1.462 Refractive index of SiO.sub.2 +
Al.sub.2O.sub.3 Refractive index of SiO.sub.2 + Al.sub.2O.sub.3:
1.486 1.486 Refractive index of organic Refractive index of organic
substance D: 1.420 substance D: 1.420 Content of organic substance:
Content of organic substance: about 30 wt. % about 30 wt. % 2nd
Layer Nb.sub.2O.sub.5: 0.053 .lambda. -- Nb.sub.2O.sub.5: 0.055
.lambda. -- 3rd Layer SiO.sub.2 + Al.sub.2O.sub.3: 0.119 .lambda.
-- SiO.sub.2 + Al.sub.2O.sub.3 + organic substance 100 V, 70 mA D:
0.1137 .lambda. Ar gas Layer refractive index: 1.462 Refractive
index of SiO.sub.2 + Al.sub.2O.sub.3: 1.486 Refractive index of
organic substance D: 1.420 Content of organic substance: about 30
wt. % 4th Layer Nb.sub.2O.sub.5: 0.146 .lambda. -- Nb.sub.2O.sub.5:
0.1427 .lambda. -- 5th Layer SiO.sub.2 + Al.sub.2O.sub.3: 0.077
.lambda. -- SiO.sub.2 + Al.sub.2O.sub.3 + organic substance 100 V,
70 mA D: 0.0781 .lambda. Ar gas Layer refractive index: 1.462
Refractive index of SiO.sub.2 + Al.sub.2O.sub.3: 1.486 Refractive
index of organic substance D: 1.420 Content of organic substance
about 30 wt. % 6th Layer Nb.sub.2O.sub.5: 0.131 .lambda. --
Nb.sub.2O.sub.5: 0.128 .lambda. -- 7th Layer SiO.sub.2 +
Al.sub.2O.sub.3 + organic substance 100 V, 70 mA SiO.sub.2 +
Al.sub.2O.sub.3 + organic substance 100 V, 70 mA D: 0.276 .lambda.
Ar gas D: 0.279 .lambda. Ar gas Layer refractive index: 1.462 Layer
refractive index. 1.462 Refractive index of SiO.sub.2 +
Al.sub.2O.sub.3: Refractive index of SiO.sub.2 + Al.sub.2O.sub.3:
1.486 1.486 Refractive index of organic Refractive index of organic
substance D: 1.420 substance D: 1.420 Content of organic substance:
Content of organic substance: about 30 wt. % about 30 wt. % Organic
substance D: AE-400 (Blemmer) made of NOF Corporation D: AE-400
(Blemmer) made of NOF Corporation used
[0149]
14TABLE 7-2 Evaluation of plastic lens performance Example 13
Example 14 Luminous reflectance, Y % 0.81% 0.78% Luminous
transmittance, Z % 99.0% 99.02% Impact resistance CT = 2.0, FDA O,
CT = 2.0, FDA O, Maximum 28 g Maximum 36 g Adhesiveness 100/100
100/100 Abrasion resistance UA UA to A Heat resistance 95.degree.
C. 100.degree. C. Alkali resistance UA UA to A
[0150]
15TABLE 8-1 Example 15 Example 16 Plastic lens substrate Diethylene
glycol bisallyl carbonate Diethylene glycol bisallyl carbonate Hard
Coat layer Layer A Layer A Setting for ion gun pretreatment
Acceleration voltage: 200 V, Acceleration current: 100 mA
Acceleration voltage: 200 V, Acceleration current: 100 mA Gas used
Ar Ar Film type & Film thickness Ion gun setting Film type
& Film thickness Ion gun setting 1st Layer SiO.sub.2 +
Al.sub.2O.sub.3 + organic substance 100 V, 70 mA SiO.sub.2 +
Al.sub.2O.sub.3 + organic substance 100 V, 70 mA D: 0.25 .lambda.
Ar gas D: 0.25 .lambda. Ar gas Layer refractive index: 1.462 Layer
refractive index: 1.462 Refractive index of SiO.sub.2 +
Al.sub.2O.sub.3: Refractive index of SiO.sub.2 + Al.sub.2O.sub.3:
1.486 1.486 Refractive index of organic Refractive index of organic
substance D: 1.420 substance D: 1.420 Content of organic substance:
Content of organic substance: about 30 wt. % about 30 wt. % 2nd
Layer Nb.sub.2O.sub.5: 0.0568 .lambda. 350 V, 130 mA
Nb.sub.2O.sub.5: 0.0581 .lambda. 350 V, 130 mA O.sub.2/Ar, 8/2
O.sub.2/Ar, 8/2 3rd Layer SiO.sub.2 + Al.sub.2O.sub.3: 0.1205
.lambda. -- SiO.sub.2 + Al.sub.2O.sub.3 + organic substance 100 V,
70 mA D: 0.1131 .lambda. Ar gas Layer refractive index. 1.462
Refractive index of SiO.sub.2 + Al.sub.2O.sub.3: 1.486 Refractive
index of organic substance D: 1.420 Content of organic substance:
about 30 wt. % 4th Layer Nb.sub.2O.sub.5: 0.1469 .lambda. 350 V,
130 mA Nb.sub.2O.sub.5: 0.1465 .lambda. 350 V, 130 mA O.sub.2/Ar,
8/2 O.sub.2/Ar, 8/2 5th Layer SiO.sub.2 + Al.sub.2O.sub.3: 0.0788
.lambda. -- SiO.sub.2 + Al.sub.2O.sub.3 + organic substance 100 V,
70 mA D: 0.0768 .lambda. Ar gas Layer refractive index: 1.462
Refractive index of SiO.sub.2 + Al.sub.2O.sub.3: 1.486 Refractive
index of organic substance D: 1.420 Content of organic substance:
about 30 wt. % 6th Layer Nb.sub.2O.sub.5: 0.1210 .lambda. 350 V,
130 mA Nb.sub.2O.sub.5: 0.125 .lambda. 350 V, 130 mA O.sub.2/Ar,
8/2 O.sub.2/Ar, 8/2 7th Layer SiO.sub.2 + Al.sub.2O.sub.3 + organic
substance 100 V, 70 mA SiO.sub.2 + Al.sub.2O.sub.3 + organic
substance 100 V, 70 mA D: 0.274 .lambda. Ar gas D: 0.279 .lambda.
Ar gas Layer refractive index: 1.462 Layer refractive index: 1.462
Refractive index of SiO.sub.2 + Al.sub.2O.sub.3: Refractive index
of SiO.sub.2 + Al.sub.2O.sub.3: 1.486 1.486 Refractive index of
organic Refractive index of organic substance D: 1.420 substance D:
1.420 Content of organic substance: Content of organic substance:
about 30 wt. % about 30 wt. % Organic substance D: AE-400 (Blemmer)
made of NOF Corporation D: AE-400 (Blemmer) made of NOF Corporation
used
[0151]
16TABLE 8-2 Evaluation of plastic lens performance Example 15
Example 16 Luminous reflectance, Y % 0.72% 0.70% Luminous
transmittance, Z % 99.10% 99.11% Impact resistance CT = 2.0, FDA O,
CT = 2.0, FDA O, Maximum 28 g Maximum 36 g Adhesiveness 100/100
100/100 Abrasion resistance UA UA to A Heat resistance 100.degree.
C. 110.degree. C. Alkali resistance UA UA to A
[0152]
17TABLE 9-1 Example 17 Example 18 Plastic lens substrate Diethylene
glycol bisallyl carbonate Diethylene glycol bisallyl carbonate Hard
Coat layer Layer A Layer A Setting for ion gun pretreatment
Acceleration voltage: 200 V, Acceleration current: 100 mA
Acceleration voltage: 200 V, Acceleration current: 100 mA Gas used
Ar Ar Film type & Film thickness Ion gun setting Film type
& Film thickness Ion gun setting 1st Layer SiO.sub.2 +
Al.sub.2O.sub.3 + organic substance 70 V, 70 mA SiO.sub.2 +
Al.sub.2O.sub.3 + organic substance 70 V, 70 mA E: 0.25 .lambda. Ar
gas E: 0.25 .lambda. Ar gas Layer refractive index: 1.468 Layer
refractive index: 1.468 Refractive index of SiO.sub.2 +
Al.sub.2O.sub.3: Refractive index of SiO.sub.2 + Al.sub.2O.sub.3:
1.486 1.486 Refractive index of organic Refractive index of organic
substance E: 1.437 substance E: 1.437 Content of organic substance:
Content of organic substance: about 28 wt. % about 28 wt. % 2nd
Layer Nb.sub.2O.sub.5: 0.053 .lambda. -- Nb.sub.2O.sub.5: 0.055
.lambda. -- 3rd Layer SiO.sub.2 + Al.sub.2O.sub.3: 0119 .lambda.
SiO.sub.2 + Al.sub.2O.sub.3 + organic substance 70 V, 70 mA E:
0.1137 .lambda. Ar gas Layer refractive index: 1.468 Refractive
index of SiO.sub.2 + Al.sub.2O.sub.3: 1.486 Refractive index of
organic substance E: 1.437 Content of organic substance: about 28
wt. % 4th Layer Nb.sub.2O.sub.5: 0.146 .lambda. -- Nb.sub.2O.sub.5:
0.1427 .lambda. -- 5th Layer SiO.sub.2 + Al.sub.2O.sub.3: 0.077
.lambda. -- SiO.sub.2 + Al.sub.2O.sub.3 + organic substance 70 V,
70 mA E: 0.0781 .lambda. Ar gas Layer refractive index: 1.468
Refractive index of SiO.sub.2 + Al.sub.2O.sub.3: 1.486 Refractive
index of organic substance E: 1.437 Content of organic substance:
about 28 wt. % 6th Layer Nb.sub.2O.sub.5: 0.131 .lambda. --
Nb.sub.2O.sub.5;:0.128 .lambda. -- 7th Layer SiO.sub.2 +
Al.sub.2O.sub.3 + organic substance 70 V, 70 mA SiO.sub.2 +
Al.sub.2O.sub.3 + organic substance 70 V, 70 mA E: 0.276 .lambda.
Ar gas E: 0.279 .lambda. Ar gas Layer refractive index: 1.468 Layer
refractive index: 1.468 Refractive index of SiO.sub.2 +
Al.sub.2O.sub.3: Refractive index of SiO.sub.2 + Al.sub.2O.sub.3:
1.486 1.486 Refractive index of organic Refractive index of organic
substance E: 1.437 substance E: 1.437 Content of organic substance:
Content of organic substance: about 28 wt. % about 30 wt. % Organic
substance E: E-400 (Epiol) of NOF Corporation E: E-400 (Epiol) made
of NOF Corporation used
[0153]
18TABLE 9-2 Evaluation of plastic lens performance Example 17
Example 18 Luminous reflectance, Y % 0.81% 0.78% Luminous
transmittance, Z % 99.0% 99.02% Impact resistance CT = 2.0, FDA O,
CT = 2.0, FDA O, Maximum 28 g Maximum 36 g Adhesiveness 100/100
100/100 Abrasion resistance UA UA to A Heat resistance 95.degree.
C. 100.degree. C. Alkali resistance UA UA to A
[0154]
19TABLE 10-1 Example 19 Example 20 Plastic lens substrate
Diethylene glycol bisallyl carbonate Diethylene glycol bisallyl
carbonate Hard Coat layer Layer A Layer A Setting for ion gun
pretreatment Acceleration voltage: 200 V, Acceleration current: 100
mA Acceleration voltage: 200 V, Acceleration current: 100 mA Gas
used Ar Ar Film type & Film thickness Ion gun setting Film type
& Film thickness Ion gun setting 1st Layer SiO.sub.2 +
Al.sub.2O.sub.3 + organic substance 70 V, 70 mA SiO.sub.2 +
Al.sub.2O.sub.3 + organic substance 70 V, 70 mA E: 0.25 .lambda. Ar
gas E: 0.25 .lambda. Ar gas Layer refractive index. 1.468 Layer
refractive index: 1.468 Refractive index of SiO.sub.2 +
Al.sub.2O.sub.3: Refractive index of SiO.sub.2 + Al.sub.2O.sub.3:
1.486 1.486 Refractive index of organic Refractive index of organic
substance E: 1.437 substance E: 1.437 Content of organic substance:
Content of organic substance: about 28 wt. % about 28 wt. % 2nd
Layer Nb.sub.2O.sub.5: 0.0568 .lambda. 350 V, 130 mA
Nb.sub.2O.sub.5: 0.0581 .lambda. 350 V, 130 mA O.sub.2/Ar, 8/2
O.sub.2/Ar, 8/2 3rd Layer SiO.sub.2 + Al.sub.2O.sub.3: 0.1205
.lambda. -- SiO.sub.2 + Al.sub.2O.sub.3 + organic substance 70 V,
70 mA E: 0.1131 .lambda. Ar gas Layer refractive index: 1.468
Refractive index of SiO.sub.2 + Al.sub.2O.sub.3: 1.486 Refractive
index of organic substance E: 1.437 Content of organic substance:
about 28 wt. % 4th Layer Nb.sub.2O.sub.5: 0.1469 .lambda. 350 V,
130 mA Nb.sub.2O.sub.5: 0.1465 .lambda. 350 V, 130 mA O.sub.2/Ar,
8/2 O.sub.2/Ar, 8/2 5th Layer SiO.sub.2 + Al.sub.2O.sub.3: 0.0788
.lambda. -- SiO.sub.2 + Al.sub.2O.sub.3 + organic substance 70 V,
70 mA E, 0.0768 .lambda. Ar gas Layer refractive index: 1.468
Refractive index of SiO.sub.2 + Al.sub.2O.sub.3: 1.486 Refractive
index of organic substance E: 1.437 Content of organic substance:
about 28 wt. % 6th Layer Nb.sub.2O.sub.5: 0.1210 .lambda. 350 V,
130 mA Nb.sub.2O.sub.5: 0.125 .lambda. 350 V, 130 mA O.sub.2/Ar,
8/2 O.sub.2/Ar, 8/2 7th Layer SiO.sub.2 + Al.sub.2O.sub.3 + organic
substance 70 V, 70 mA SiO.sub.2 + Al.sub.2O.sub.3 + organic
substance 70 V, 70 mA E: 0.274 .lambda. Ar gas E: 0.279 .lambda. Ar
gas Layer refractive index: 1.468 Layer refractive index: 1.468
Refractive index of SiO.sub.2 + Al.sub.2O.sub.3: Refractive index
of SiO.sub.2 + Al.sub.2O.sub.3: 1.486 1.486 Refractive index of
organic Refractive index of organic substance E: 1.437 substance E:
1.437 Content of organic substance: Content of organic substance:
about 28 wt. % about 28 wt. % Organic substance E: E-400 (Epiol)
made of NOF Corporation E: E-400 (Epiol) made of NOF Corporation
used
[0155]
20TABLE 10-2 Evaluation of plastic lens performance Example 19
Example 20 Luminous reflectance, Y % 0.72% 0.70% Luminous
transmittance, Z % 99.10% 99.11% Impact resistance CT = 2.0, FDA O,
CT = 2.0, FDA O, Maximum 28 g Maximum 36 g Adhesiveness 100/100
100/100 Abrasion resistance UA UA to A Heat resistance 100.degree.
C. 110.degree. C. Alkali resistance UA UA to A
[0156]
21 TABLE 11 Comparative Example 1 Comparative Example 2 Plastic
lens substrate Diethylene glycol bisallyl carbonate Diethylene
glycol bisallyl carbonate Hard coat layer Layer A Layer A Ion
acceleration voltage for pretreatment No pretreatment No
pretreatment Current Exposure time Gas used Film type & Film
thickness Ion gun setting Film type & Film thickness Ion gun
setting Basic layer -- -- -- -- 1st Layer SiO.sub.2: 0.25.lambda.
-- SiO.sub.2: 0.25.lambda. -- 2nd Layer Nb.sub.2O.sub.5:
0.0228.lambda. -- TiO.sub.2: 0.0238.lambda. -- 3rd Layer SiO.sub.2.
0.1177.lambda. -- SiO.sub.2: 0.0778.lambda. -- 4th Layer
Nb.sub.2O.sub.5: 0.0450.lambda. -- TiO.sub.2: 0.0466.lambda. -- 5th
Layer SiO.sub.2: 0.0465.lambda. -- SiO.sub.2: 0.0489.lambda. -- 6th
Layer Nb.sub.2O.sub.5: 0.4956.lambda. -- TiO.sub.2: 0.4991.lambda.
-- 7th Layer SiO.sub.2: 0.2368.lambda. -- SiO.sub.2: 0.2348.lambda.
-- Evaluation of plastic lens performance Luminous reflectance, Y %
1.1% 1.2% Luminous transmittance, Z % 98.7% 98.6% Impact resistance
CT = 2.0. FDA x CT = 2.0. FDA x Adhesiveness 95/100 95/100 Abrasion
resistance B B to C Heat resistance 70.degree. C. 65.degree. C.
Alkali resistance B B to C
[0157]
22 TABLE 12 Comparative Example 3 Comparative Example 4 Plastic
lens substrate Diethylene glycol bisallyl carbonate Diethylene
glycol bisallyl carbonate Hard coat layer Layer A Layer A Ion
acceleration voltage for pretreatment No pretreatment No
pretreatment Current Exposure time Gas used Film type & Film
thickness Ion gun setting Film type & Film thickness Ion gun
setting Basic layer -- -- -- -- 1st Layer SiO.sub.2: 0.25.lambda.
-- SiO.sub.2: 0.0209.lambda. -- 2nd Layer Ta.sub.2O.sub.5:
0.0118.lambda. -- Ta.sub.2O.sub.5: 0.0527.lambda. -- 3rd Layer
SiO.sub.2: 0.1816.lambda. -- SiO.sub.2: 0.1084.lambda. -- 4th Layer
Ta.sub.2O.sub.5: 0.0891.lambda. -- Ta.sub.2O.sub.5: 0.1880.lambda.
-- 5th Layer SiO.sub.2: 0.0405.lambda. -- SiO.sub.2: 0.0484.lambda.
-- 6th Layer Ta.sub.2O.sub.5: 0.4077.lambda. -- Ta.sub.2O.sub.5:
0.1820.lambda. -- 7th Layer SiO.sub.2: 0.2425.lambda. -- SiO.sub.2:
0.2681.lambda. -- Evaluation of plastic lens performance Luminous
reflectance, Y % 1.1% 1.2% Luminous transmittance, Z % 98.7% 98.7%
Impact resistance CT = 2.0. FDA x CT = 2.0 FDA x Adhesiveness
95/100 95/100 Abrasion resistance A to B B Heat resistance
70.degree. C. 75.degree. C. Alkali resistance A to B B
[0158] As shown in Tables 1 to 10, the plastic lenses of Examples 1
to 20 had an extremely small luminous reflectance of from 0.70 to
0.82% and had a large luminance transmittance of from 99.0 to
99.11%. In addition, their impact resistance, adhesiveness,
abrasion resistance, heat resistance and alkali resistance were
good.
[0159] In contrast, the plastic lenses of Comparative Examples 1 to
4 all had a high luminous reflectance of from 1.1 to 1.2%, as in
Tables 11 and 12. In addition, their impact resistance was low, and
their adhesiveness, abrasion resistance, heat resistance and alkali
resistance were lower than those in Examples 1 to 20.
[0160] While the invention has been described in connection with
certain embodiments so that aspects thereof may be more fully
understood and appreciated, it is not intended to limit the
invention to these particular embodiments. On the contrary, it is
intended to cover all alternatives, modifications and equivalents
as may be included within the scope of the invention as defined by
the appended claims.
* * * * *