U.S. patent application number 10/345278 was filed with the patent office on 2003-07-24 for adhesive sheet for affixation of a wafer and method for processing using the same.
Invention is credited to Kudo, Kiyomitsu, Tsujimoto, Akira.
Application Number | 20030139019 10/345278 |
Document ID | / |
Family ID | 19191959 |
Filed Date | 2003-07-24 |
United States Patent
Application |
20030139019 |
Kind Code |
A1 |
Kudo, Kiyomitsu ; et
al. |
July 24, 2003 |
Adhesive sheet for affixation of a wafer and method for processing
using the same
Abstract
An adhesive sheet for affixation of a wafer includes a first
substrate, first adhesive layer arranged on the first substrate,
second substrate arranged on the first adhesive layer, and second
adhesive layer arranged on the second substrate. A chemical
reaction which causes reduction in the adhesion of the first
adhesive layer and a chemical reaction which causes reduction in
the adhesion of the second adhesive layer are different. A method
for processing using this sheet includes the steps of affixing the
sheet to a wafer, dicing the wafer with the sheet affixed thereto,
peeling the first substrate and first adhesive layer away from the
diced wafer by reducing the adhesion of the first adhesive layer
and, thereby, dividing the wafer into a plurality of chips, and
peeling the second substrate and second adhesive layer away from
each of the chips by reducing the adhesion of the second adhesive
layer.
Inventors: |
Kudo, Kiyomitsu; (Tokyo,
JP) ; Tsujimoto, Akira; (Kanagawa, JP) |
Correspondence
Address: |
FITZPATRICK CELLA HARPER & SCINTO
30 ROCKEFELLER PLAZA
NEW YORK
NY
10112
US
|
Family ID: |
19191959 |
Appl. No.: |
10/345278 |
Filed: |
January 16, 2003 |
Current U.S.
Class: |
438/460 ;
257/E21.599 |
Current CPC
Class: |
H01L 21/67132 20130101;
H01L 21/78 20130101; Y10T 156/1179 20150115; Y10T 156/1066
20150115; Y10S 156/93 20130101; H01L 2221/68327 20130101; Y10T
428/2809 20150115; Y10S 438/976 20130101; H01L 21/6836 20130101;
Y10T 428/2848 20150115 |
Class at
Publication: |
438/460 |
International
Class: |
H01L 021/301 |
Foreign Application Data
Date |
Code |
Application Number |
Jan 24, 2002 |
JP |
015681/2002 |
Claims
What is claimed is:
1. An adhesive sheet for affixation of a wafer, comprising: a first
substrate; a first adhesive layer arranged on the first substrate;
a second substrate arranged on the first adhesive layer; and a
second adhesive layer arranged on the second substrate, wherein a
chemical reaction which causes reduction in the adhesion of the
first adhesive layer and a chemical reaction which causes reduction
in the adhesion of the second adhesive layer are different.
2. The adhesive sheet for affixation of a wafer according to claim
1, wherein: the first adhesive layer comprises a radiation-setting
adhesive; and the second substrate comprises a heat-shrinkable
plastic film.
3. The adhesive sheet for affixation of a wafer according to claim
1, wherein: the first substrate comprises a heat-shrinkable plastic
film; and the second adhesive layer comprises a radiation-setting
adhesive.
4. A method for processing using the adhesive sheet for affixation
of a wafer according to claim 1, the method comprising the steps
of: affixing the sheet to the wafer; dicing the wafer with the
sheet affixed thereto; peeling the first substrate and the first
adhesive layer away from the diced wafer by reducing the adhesion
of the first adhesive layer of the sheet and, thereby, dividing the
wafer into a plurality of chips; and peeling the second substrate
and the second adhesive layer away from each of the chips by
reducing the adhesion of the second adhesive layer of the
sheet.
5. A method for processing using the adhesive sheet for affixation
of a wafer according to claim 2, the method comprising the steps
of: affixing the sheet to the wafer; dicing the wafer with the
sheet affixed thereto; peeling the first substrate and the first
adhesive layer away from the diced wafer by irradiating the first
adhesive layer of the sheet with radioactive rays so as to cure the
first adhesive layer and, thereby, dividing the wafer into a
plurality of chips; and peeling the second substrate and the second
adhesive layer away from each of the chips by allowing the second
substrate of the sheet to heat-shrink.
6. A method for processing using the adhesive sheet for affixation
of a wafer according to claim 3, the method comprising the steps
of: affixing the sheet to the wafer; dicing the wafer with the
sheet affixed thereto; peeling the first substrate and the first
adhesive layer away from the diced wafer by allowing the first
substrate of the sheet to heat-shrink and, thereby, dividing the
wafer into a plurality of chips; and peeling the second substrate
and the second adhesive layer away from each of the chips by
irradiating the second adhesive layer of the sheet with radioactive
rays so as to cure the second adhesive layer.
Description
BACKGROUND OF THE INVENTION
[0001] 1. Field of the Invention
[0002] The present invention relates to an adhesive sheet for
affixation of a wafer and a method for processing using the same.
More particularly, the present invention relates to an adhesive
sheet for affixation of a wafer used in dicing of a semiconductor
wafer into chips and to a method for dicing a semiconductor wafer
by using the same.
[0003] 2. Description of the Related Art
[0004] In general, semiconductor wafers made of silicon, gallium
arsenide, etc., are manufactured in the condition of having a large
diameter. This wafer is cut and separated (diced) into element
chips and, thereafter, the resulting chips are subjected to a
mounting step. Conventionally, the semiconductor wafer is subjected
to each step of dicing, cleaning, drying, expanding, picking up and
mounting in the condition of being affixed to an adhesive sheet in
advance. As the adhesive sheet for affixation of a wafer used in
dicing, sheets described in, for example, Japanese Patent Laid-Open
No. 7-86212, are known. The adhesive sheet for affixation of a
wafer described in Japanese Patent Laid-Open No. 7-86212 is
composed of a radiation-setting adhesive layer arranged on a
substrate. This sheet can be peeled away from a semiconductor wafer
with ease by being irradiated with radioactive rays after
dicing.
[0005] However, there is the following problem in the method for
processing using the aforementioned conventional adhesive sheet for
affixation of a wafer. That is, when there is another step between
the steps of picking up and mounting, foreign matter, etc., may
adhere to even a chip having been already cleaned and dried. In
particular, since the back of the chip becomes a mounting surface,
when adhesion of foreign matter, etc., occurs, problems of
reduction in mounting precision, etc., are brought about.
SUMMARY OF THE INVENTION
[0006] It is an object of the present invention to provide a
reliable adhesive sheet for affixation of a wafer capable of
overcoming the aforementioned problems in the conventional
technology and reducing adhesion of foreign matter, etc., before
mounting of the chip.
[0007] The aforementioned object of the present invention can be
achieved by an adhesive sheet for affixation of a wafer, the
adhesive sheet including a first substrate, a first adhesive layer
arranged on the first substrate, a second substrate arranged on the
first adhesive layer, and a second adhesive layer arranged on the
second substrate, wherein a chemical reaction which causes
reduction in the adhesion of the first adhesive layer and a
chemical reaction which causes reduction in the adhesion of the
second adhesive layer are different.
[0008] Regarding the aforementioned adhesive sheet for affixation
of a wafer, for example, the first adhesive layer can be formed
from a radiation-setting adhesive, and the second substrate can be
formed from a heat-shrinkable plastic film. Furthermore, the first
substrate may be formed from a heat-shrinkable plastic film and the
second adhesive layer may be formed from a radiation-setting
adhesive.
[0009] A method for processing using the aforementioned adhesive
sheet for affixation of a wafer includes the step of affixing the
sheet to a wafer, the step of dicing the wafer with the sheet
affixed thereto, the step of peeling the first substrate and the
first adhesive layer away from the diced wafer by reducing the
adhesion of the first adhesive layer of the sheet and, thereby,
dividing the wafer into a plurality of chips, and the step of
peeling the second substrate and the second adhesive layer away
from each of the chips by reducing the adhesion of the second
adhesive layer of the sheet.
[0010] Regarding the aforementioned method for processing, when the
first adhesive layer is composed of a radiation-setting adhesive,
and the second substrate is composed of a heat-shrinkable plastic
film, the first substrate is peeled away from the wafer by
irradiating the first adhesive layer with radioactive rays, and the
second substrate is peeled away from each of the chips by being
allowed to heat-shrink.
[0011] On the other hand, regarding the aforementioned method for
processing, when the first substrate is composed of a
heat-shrinkable plastic film, and the second adhesive layer is
composed of a radiation-setting adhesive, the first substrate is
peeled away from the wafer by being allowed to heat-shrink, and the
second substrate is peeled away from each of the chips by
irradiating the second adhesive layer with radioactive rays so as
to cure the second adhesive layer.
[0012] Further objects, features and advantages of the present
invention will become apparent from the following description of
the preferred embodiments with reference to the attached
drawings.
BRIEF DESCRIPTION OF THE DRAWINGS
[0013] FIG. 1 is a schematic sectional view showing an adhesive
sheet for affixation of a wafer according to a first embodiment of
the present invention.
[0014] FIG. 2A to FIG. 2D are schematic sectional views for
illustrating a method for processing a wafer by using the adhesive
sheet for affixation of a wafer according to the first
embodiment.
[0015] FIG. 3 is a schematic sectional view showing an adhesive
sheet for affixation of a wafer according to a second embodiment of
the present invention.
[0016] FIG. 4A to FIG. 4D are schematic sectional views for
illustrating a method for processing a wafer by using the adhesive
sheet for affixation of a wafer according to the second
embodiment.
DESCRIPTION OF THE PREFERRED EMBODIMENTS
[0017] The embodiments of the present invention will be described
below in detail with reference to the drawings.
First Embodiment
[0018] FIG. 1 is a schematic sectional view showing an adhesive
sheet for affixation of a wafer according to a first embodiment of
the present invention. As shown in FIG. 1, an adhesive sheet 101
for affixation of a wafer is composed of a first substrate 102, a
first adhesive layer 103, a second substrate 104, and a second
adhesive layer 105. In order to protect the second adhesive layer
105 before being subjected to use, preferably, a strippable sheet
106 is temporarily adhered on the second adhesive layer 105.
[0019] As the first substrate 102, preferably, a synthetic resin
film having extensibility in the length direction and width
direction is used. Specific examples of such films include
polyethylene films, polypropylene films, polybutene films,
poly(vinyl chloride) films, poly(ethylene terephthalate) films,
poly(butylene terephthalate) films, polybutadiene films,
polyurethane films, polymethylpentene films, ethylene-vinyl acetate
films, ionomers, ethylene-methacrylic acid copolymer films, etc.,
and cross-linked films thereof. The first substrate 102 may be
composed of a laminate of these films. In general, the film
thickness of the first substrate 102 is 10 to 300 .mu.m, and
preferably, is 50 to 200 .mu.m.
[0020] The first adhesive layer 103 is composed of a
radiation-setting adhesive, and a system primarily containing the
adhesive and a system primarily containing a radiation-polymerized
synthetic oligomer are uniformly dispersed. The adhesion of this
radiation-setting adhesive is significantly reduced by irradiation
of radioactive rays.
[0021] The second substrate 104 is composed of a heat-shrinkable
plastic film. Examples of such films suitably used include
transparent films having been subjected to adequate extension
processing and being made of, for example, polyolefins, e.g.,
polyethylene, polypropylene, and polymethylpentene, poly(vinyl
chloride), polyester, and polystyrene. In particular, a film having
a film thickness of 10 to 300 .mu.m is preferable. The heat
shrinkage factor (%) of this heat-shrinkable plastic film is
preferably 5% or more in any one of the vertical direction and the
horizontal direction of the film, more preferably, is 10% or more,
and especially preferably, 20% or more.
[0022] The second adhesive layer 105 is composed of a material
containing at least a partially cross-linked material of a carboxyl
group-containing hydrophilic polymer in which a part of the
carboxyl groups are partially neutralized and a surfactant. This
surfactant is composed of at least one surfactant selected from the
group consisting of anionic surfactants and cationic surfactants,
and is in a liquid state at room temperature.
[0023] In order to peel the second substrate 104 and the second
adhesive layer 105 away from the wafer affixed thereto, the second
substrate 104 is heated so as to bring about heat-shrinkage. The
heating is performed in a furnace or in a hot water bath. The
heating temperature is determined depending on the material of the
heat-shrinkable plastic film of the second substrate 104, and it is
essential that the heating temperature is equivalent to or more
than the temperature at which this heat-shrinkable plastic film
brings about heat-shrinkage. However, the heating must be performed
within the range in which circuits arranged on the wafer surface
are not adversely affected. Specifically, regarding the furnace,
the heating is desirably performed at 60.degree. C. to 200.degree.
C., and preferably, at 80.degree. C. to 100.degree. C. Desirably,
the heating time is 20 seconds to 5 minutes, and preferably, is 40
seconds to 2 minutes. Regarding the hot water bath, desirably, the
heating temperature is 60.degree. C. to 100.degree. C., and
preferably, at 70.degree. C. to 100.degree. C., while the heating
time is 20 seconds to 5 minutes, and preferably, is 40 seconds to 2
minutes. According to such a heating, the heat-shrinkable plastic
film as the second substrate 104 is allowed to heat-shrink into the
shape of a roll or cluster, and accompanying this, the adhesion of
the second adhesive layer 105 is reduced.
[0024] Next, a method for processing a wafer by using the adhesive
sheet for affixation of a wafer according to the first embodiment
will be described with reference to schematic sectional views shown
in FIG. 2A to FIG. 2D. In FIG. 2A to FIG. 2D, the same members are
indicated by the same reference numerals.
[0025] FIG. 2A shows the condition that the adhesive sheet 101 for
affixation of a wafer according to the first embodiment is affixed
to a silicon wafer 110. Reference numerals 102, 103, 104, and 105
denote the first substrate, first adhesive layer, second substrate,
and second adhesive layer, respectively, similarly to those in FIG.
1.
[0026] The silicon wafer 110 provided with the adhesive sheet 101
for affixation of a wafer by affixation is diced into the condition
shown in FIG. 2B. Although the wafer 110 is cut into a plurality of
silicon chips 110a, these are joined to each other by the sheet
101. Subsequently, radioactive rays are applied from the first
substrate 102 side and, therefore, the adhesive of the first
adhesive layer 103 is cured. According to this, the adhesion of the
first adhesive layer 103 is significantly reduced and, therefore,
the first substrate 102 and the first adhesive layer 103 can be
peeled away from the wafer 110.
[0027] FIG. 2C shows the condition that the first substrate 102 and
the first adhesive layer 103 have been peeled off. Individual
silicon chips 110a are in the condition of being separated from
each other, and under this condition, it is also possible to
electrically connect by tape automated bonding (TAB) and inner lead
bonding (ILB).
[0028] The separated individual silicon chips 110a are heated from
the second substrate 104 side and, therefore, the second substrate
104 is allowed to heat-shrink. Accompanying this, the adhesion of
the second adhesive layer 105 is reduced. Consequently, the second
substrate 104 and the second adhesive layer 105 can be peeled away
from the silicon chip 110a. As shown in FIG. 2D, the chip 110a
after these are peeled away therefrom is mounted on a mount member
120 immediately after the peeling.
[0029] As described above, according to the present embodiment,
since the silicon chip 110a is covered with the second substrate
104 as the back between the instant when the silicon wafer 110 is
cut and the instant when the silicon chip 110a is mounted, adhesion
of foreign materials, etc., can be prevented. Consequently,
reduction in mounting precision due to adhesion of foreign
materials, etc., can be avoided during mounting and, therefore, a
semiconductor chip having high reliability can be provided.
Second Embodiment
[0030] FIG. 3 is a schematic sectional view showing an adhesive
sheet for affixation of a wafer according to a second embodiment of
the present invention. As shown in FIG. 3, an adhesive sheet 201
for affixation of a wafer is composed of a first substrate 202, a
first adhesive layer 203, a second substrate 204, and a second
adhesive layer 205. In order to protect the second adhesive layer
205 before being subjected to use, preferably, a strippable sheet
206 is temporarily adhered on the second adhesive layer 205.
[0031] The first substrate 202 is composed of a heat-shrinkable
plastic film. The material, thickness, and heat shrinkage factor
suitably adopted for this film are similar to those for the second
substrate 104 in the first embodiment. As the first adhesive layer
203, one similar to the second adhesive layer 105 in the first
embodiment is used suitably.
[0032] The peeling of the first substrate 202 and the first
adhesive layer 203 is performed by heating the second substrate 104
so as to bring about heat-shrinkage. The heating is performed in a
furnace or in a hot water bath. Regarding the heating temperature
and the heating time, suitable conditions are similar to those in
the peeling of the second substrate 104 and the second adhesive
layer 105 in the first embodiment.
[0033] As the second substrate 204, preferably, a synthetic resin
film having extensibility in the length direction and width
direction is used. The specific material and suitable thickness of
such a film can be similar to those of the first substrate 102 in
the first embodiment. As the second adhesive layer 205, a
radiation-setting adhesive similar to the first adhesive layer 103
in the first embodiment can be used suitably.
[0034] Next, a method for processing a wafer by using the adhesive
sheet for affixation of a wafer according to the second embodiment
will be described with reference to schematic sectional views shown
in FIG. 4A to FIG. 4D. In FIG. 4A to FIG. 4D, the same members are
indicated by the same reference numerals.
[0035] FIG. 4A shows the condition that the adhesive sheet 201 for
affixation of a wafer according to the second embodiment is affixed
to a silicon wafer 210. Reference numerals 202, 203, 204, and 205
denote the first substrate, first adhesive layer, second substrate,
and second adhesive layer, respectively, similarly to those in FIG.
3. The silicon wafer 210 in the present embodiment has openings
arranged by anisotropic etching from the back of the silicon wafer.
Since openings are arranged, it is possible to use the chips for an
ink feed path in an ink-jet head.
[0036] The silicon wafer 210 provided with the adhesive sheet 201
for affixation of a wafer by affixation is diced into the condition
shown in FIG. 4B. Although the wafer 210 is cut into a plurality of
silicon chips 210a, these are joined to each other by the sheet
201. Subsequently, heating is performed from the first substrate
202 side and, therefore, the first substrate 202 is allowed to
shrink. As a result, the adhesion of the first adhesive layer 203
is significantly reduced and, therefore, the first substrate 202
and the first adhesive layer 203 can be peeled away from the wafer
210.
[0037] FIG. 4C shows the condition that the first substrate 202 and
the first adhesive layer 203 have been peeled off. Individual
silicon chips 210a are in the condition of being separated from
each other, and under this condition, it is also possible to
electrically connect by TAB and ILB.
[0038] The separated individual silicon chips 210a are irradiated
with radioactive rays from the second substrate 204 side and,
therefore, the second adhesive layer 205 is cured so that the
adhesive thereof is significantly reduced. Consequently, the second
substrate 204 and the second adhesive layer 205 can be peeled away
from the silicon chip 210a. As shown in FIG. 4D, the chip 210a,
after these are peeled away therefrom, is mounted on a mount member
220 immediately after the peeling. As described above, according to
the present embodiment, since the silicon chip 210a is covered with
the second substrate 204 as the back between the instant when the
silicon wafer 210 is cut and the instant when the silicon chip 210a
is mounted, adhesion of foreign materials, etc., can be prevented.
Consequently, reduction in mounting precision due to adhesion of
foreign materials, etc., can be avoided during mounting and,
therefore, a semiconductor chip having high reliability can be
provided. When the silicon chip having an opening for an ink feed
path in an ink-jet head is used, intrusion of foreign materials
into the opening causes non-ejection during ejection of ink.
However, when the adhesive sheet for affixation of a wafer
according to the present embodiment is used, intrusion of foreign
materials into the opening can be reduced and, therefore,
significant improvement of the reliability in manufacture of the
ink-jet head is achieved.
[0039] While the present invention has been described with
reference to what are presently considered to be the preferred
embodiments, it is to be understood that the invention is not
limited to the disclosed embodiments. On the contrary, the
invention is intended to cover various modifications and equivalent
arrangements included within the spirit and scope of the appended
claims. The scope of the following claims is to be accorded the
broadest interpretation so as to encompass all such modifications
and equivalent structures and functions.
* * * * *