U.S. patent application number 10/029536 was filed with the patent office on 2003-06-26 for temprature compensated chemical mechanical polishing apparatus and method.
Invention is credited to Misra, Sudhanshu Rid.
Application Number | 20030119427 10/029536 |
Document ID | / |
Family ID | 21849525 |
Filed Date | 2003-06-26 |
United States Patent
Application |
20030119427 |
Kind Code |
A1 |
Misra, Sudhanshu Rid |
June 26, 2003 |
Temprature compensated chemical mechanical polishing apparatus and
method
Abstract
A chemical mechanical polishing (CMP) system (22) having a
radiant heating apparatus (30) for direct radiant heating of the
polishing surface (26) of the polishing pad (16). Radiant energy
(28) is impinged onto a selected area of the polishing surface to
provide temperature compensation of the material removal rate
across the surface (24) of the wafer (14). The radiant energy may
be in the form of infrared radiation, a laser beam or microwave
energy. The power level, angle of impingement, duration of exposure
and footprint of the radiant energy may be controlled to achieve a
desired temperature gradient on the polishing surface. The
temperature of the polishing surface may further be regulated by
impinging a temperature conditioning gas (32) onto the polishing
surface.
Inventors: |
Misra, Sudhanshu Rid;
(Orlando, FL) |
Correspondence
Address: |
BEUSSE, BROWNLEE, BOWDOIN & WOLTER, P. A.
390 NORTH ORANGE AVENUE
SUITE 2500
ORLANDO
FL
32801
US
|
Family ID: |
21849525 |
Appl. No.: |
10/029536 |
Filed: |
December 20, 2001 |
Current U.S.
Class: |
451/41 |
Current CPC
Class: |
B24B 53/095 20130101;
B24B 49/14 20130101; B24B 53/017 20130101 |
Class at
Publication: |
451/41 |
International
Class: |
B24B 001/00 |
Claims
I claim as my invention:
1. A device for polishing a wafer, the device comprising: a
polishing pad having a polishing surface; a wafer carrier adapted
to urge a surface of a wafer against the polishing surface; and a
radiant heating apparatus positionable to provide radiant energy
onto the polishing surface remote from the surface of the
wafer.
2. The device of claim 1, wherein the radiant heating apparatus
comprises a source of infrared radiation.
3. The device of claim 1, wherein the radiant heating apparatus
comprises a laser.
4. The device of claim 1, wherein the radiant heating apparatus
comprises a source of microwave energy.
5. The device of claim 1, wherein the radiant heating apparatus is
disposed in a predetermined position with respect to the polishing
surface to establish a predetermined radiant energy footprint on
the polishing surface.
6. A device for polishing a wafer, the device comprising: a
polishing pad having a polishing surface; a wafer carrier adapted
to urge a surface of a wafer against the polishing surface; and a
means for applying heat energy directly to the polishing surface
from a source remote from the surface of the wafer.
7. The device of claim 6, wherein the means for applying heat
energy further comprises a flow of a temperature conditioning gas
directed onto the polishing surface.
8. The device of claim 7, wherein the flow of temperature
conditioning gas is provided at a temperature greater than a
temperature of the polishing surface.
9. The device of claim 7, wherein the flow of temperature
conditioning gas is provided at a temperature less than a
temperature of the polishing surface.
10. The device of claim 7, further comprising a radiant heating
apparatus impinging radiant energy onto the polishing surface
remote from the surface of the wafer.
11. A method of polishing a wafer, the method comprising: providing
a polishing pad having a polishing surface; urging a wafer surface
against the polishing surface while providing relative motion there
between; and impinging the polishing surface with radiant energy at
a location remote from the wafer surface to regulate a polishing
surface temperature.
12. The method of claim 11, further comprising varying an intensity
of the radiant energy during the step of impinging.
13. The method of claim 11, further comprising impinging the at
least a portion of the polishing surface with radiant energy prior
to the step of urging.
14. The method of claim 11, further comprising impinging the at
least a portion of the polishing surface with radiant energy during
the step of urging.
15. The method of claim 11, wherein the step of impinging further
comprises exposing the at least a portion of the polishing surface
to infrared radiation.
16. The method of claim 11, wherein the step of impinging further
comprises exposing the at least a portion of the polishing surface
to laser energy.
17. The method of claim 11, wherein the step of impinging further
comprises exposing the at least a portion of the polishing surface
to microwave energy.
18. The method of claim 11, further comprising disposing a source
of radiant energy at a predetermined position in relation to the
polishing surface in order to establish a predetermined radiant
energy footprint on the polishing surface.
19. A method of polishing a wafer, the method comprising: providing
a polishing pad having a polishing surface; urging a wafer surface
against the polishing surface while providing relative motion there
between; and impinging the polishing surface with at least one of
radiant energy and a temperature conditioning gas remote from the
wafer surface to regulate a polishing surface temperature.
20. The method of claim 19, further comprising impinging only an
edge portion of the polishing surface with the at least one of
radiant energy and a temperature conditioning gas.
Description
FIELD OF THE INVENTION
[0001] This invention relates generally to the field of
semiconductor device fabrication, and more particularly, to the
field of chemical mechanical polishing of semiconductor wafers.
BACKGROUND OF THE INVENTION
[0002] The fabrication of microelectronics devices involves the
deposition and removal of multiple layers of material on a
semiconductor substrate to form active semiconductor devices and
circuits. Such devices utilize multiple layers of metal and
dielectric materials that can selectively connect or isolate device
elements within a layer and between layers. Integrated circuits
using up to six levels of interconnects have been reported and even
more complex circuits are expected in the future. Device geometries
have gone from 0.50 micron to 0.12 micron and will soon be 0.08
micron. Multi-levels of metallization are required in such devices.
With these reductions in device geometry, each inter-metal level
must be planarized before forming a subsequent level. The generally
accepted process for creating sufficiently planar surfaces is
chemical mechanical polishing (CMP). CMP may be used to remove high
topographic variations and to remove defects, scratches or embedded
particles from the surface of a semiconductor wafer.
[0003] The CMP process generally involves rubbing a surface of a
semiconductor wafer against a polishing pad under controlled
pressure, temperature and rotational speed in the presence of a
chemical slurry. An abrasive material is introduced between the
wafer and the polishing pad, either as particles affixed to the
polishing pad itself or in fluid suspension in the chemical slurry.
The chemical and abrasive combination functions to to remove a
portion of the surface of the wafer in a polishing action. The
slurry movement assures temperature control and facilitates the
movement of the polishing debris away from the wafer.
[0004] As may be seen in FIG. 1, a chemical mechanical polishing
system 10 may include a carrier 12 for holding and moving a
semiconductor wafer 14 against a polishing pad 16 supported on a
rotatable platen 18. Slurry 20 is used to provide the desired
chemical interaction and abrasion when the wafer 14 is pressed and
rotated against the polishing pad 16. The rate of material removal
from the wafer 14 will depend upon many variables, including the
amount of force F exerted between the wafer 14 and the polishing
pad 16, the speeds of rotation R.sub.1 of the carrier and R.sub.2
of the platen, the transverse location of the carrier 12 relative
to the axis of rotation of the platen 18, the chemical composition
of the slurry 20, the temperature, and the composition and history
of use of the polishing pad 16. Numerous configurations of CMP
machines are known and are available in the industry. One
manufacturer of such CMP machines is Applied Materials, Inc. of
Santa Clara, Calif. (www.appliedmaterials.com) One manufacturer of
polishing pads is Rodel, Inc. of Phoenix, Ariz. (www.rodel.com)
[0005] A known difficulty with CMP operations is that the rate of
material removal may be uneven across the surface of the wafer 14.
U.S. Pat. No. 5,873,769 issued to Chiou, et al., describes a method
and apparatus for achieving a uniform removal rate across the
surface of a wafer. Chiou describes dividing both the platen and
the carrier into concentric circular segments, and controlling the
temperature of the various segments to adjust the rate of removal
of material across the surface of the wafer. Chiou describes the
use of multiple electric heating elements for controlling the
temperature of the respective multiple circular segments.
Alternatively, Chiou describes the use of multiple tubes in the
platen and carrier for delivering fluid that is heated or cooled to
a desired temperature. Such a system requires a large amount of
energy to heat the platen and the carrier. Furthermore, because of
the thermal inertia of these structures, the system of Chiou may
not respond as quickly as desired to a required change in
temperature. The segmented and heated platen and carrier are more
expensive to manufacture and maintain than non-segmented,
non-heated components. Finally, the definition of the number and
location of the segments is fixed and can not be changed without a
corresponding equipment redesign.
[0006] In a further embodiment, Chiou describes the use of a
polishing pad with multiple concentric grooves and the supply of
polishing slurry to the various grooves at various different
temperatures to effect the desired temperature compensation. This
embodiment suffers from many of the same limitations as the
segmented carrier/platen embodiment. A special pad design is
required, and the definition of the number and location of the
grooves can not be easily changed. The abrasive slurry supply
system is necessarily more complicated and expensive to
manufacture, to operate and maintain than would be the traditional
single supply system. The transient response time of this
embodiment is also limited by whatever system is used to heat the
slurry and by the transit time of the slurry from the point of
heating to the polishing pad grooves. Furthermore, this design
would be of no use in a system that does not utilize a slurry for
abrasion or material removal. Accordingly, an improved apparatus
and method is needed for controlling the material removal rate
across the surface of a wafer during a chemical mechanical
polishing operation.
SUMMARY OF THE INVENTION
[0007] A device for polishing a wafer is described herein as
including: a polishing pad having a polishing surface; a wafer
carrier adapted to urge a surface of a wafer against the polishing
surface; and a radiant heating apparatus impinging radiant energy
onto the polishing surface remote from the surface of the wafer.
The radiant heating apparatus may be a source of infrared
radiation, a laser, or a source of microwave energy. The radiant
heating apparatus may be disposed in a predetermined position with
respect to the polishing surface to establish a predetermined
radiant energy footprint on the polishing surface.
[0008] In a further embodiment, a device for polishing a wafer is
described as including: a polishing pad having a polishing surface;
a wafer carrier adapted to urge a surface of a wafer against the
polishing surface; and a means for applying heat energy directly to
the polishing surface remote from the surface of the wafer.
[0009] Further, a device for polishing a wafer is described as
including: a polishing pad having a polishing surface; a wafer
carrier adapted to urge a surface of a wafer against the polishing
surface; and a flow of a temperature conditioning gas directed onto
the polishing surface. The flow of temperature conditioning gas may
be provided at a temperature greater than or less than a
temperature of the polishing surface. The device may further
include a radiant heating apparatus impinging radiant energy onto
the polishing surface remote from the surface of the wafer.
[0010] A method of polishing a wafer is described herein as
including: providing a polishing pad having a polishing surface;
urging a wafer surface against the polishing surface while
providing relative motion there between; and impinging the
polishing surface with radiant energy at a location remote from the
wafer surface to regulate a polishing surface temperature. The
intensity of the radiant energy may be varied during the step of
impinging. The radiant energy may be applied prior to and/or during
the step of urging. The radiant energy may be infrared radiation,
laser energy, and/or microwave energy. A predetermined radiant
energy footprint may be projected onto the polishing surface to
effect a desired temperature gradient.
[0011] An alternate method of polishing a wafer is described as
including the steps of: providing a polishing pad having a
polishing surface; urging a wafer surface against the polishing
surface while providing relative motion there between; and
impinging the polishing surface with at least one of radiant energy
and a temperature conditioning gas remote from the wafer surface to
regulate a polishing surface temperature.
BRIEF DESCRIPTION OF THE INVENTION
[0012] The features and advantages of the present invention will
become apparent from the following detailed description of the
invention when read with the accompanying drawings. Like numerals
are used to designate similar components in multiple figures.
[0013] FIG. 1 is a schematic illustration of a prior art chemical
mechanical polishing system.
[0014] FIG. 2 is a schematic illustration of a chemical mechanical
polishing system including a radiant heating apparatus impinging
radiant energy onto the polishing surface of the polishing pad and
a conditioned gas supply impinging a conditioned gas upon the
polishing surface.
DETAILED DESCRIPTION OF THE INVENTION
[0015] FIG. 2 is a schematic illustration of a chemical mechanical
polishing apparatus 22 providing localized temperature compensation
for controlling the material removal rate across the surface of a
wafer being polished. The polishing apparatus 22 contains many
components that are similar to those of the prior art apparatus 10
illustrated in FIG. 1. A polishing pad 16 is disposed over a
rotatable platen 18. A wafer 14 having a surface to be polished 24
is urged against a polishing surface 26 of the polishing pad 16 by
a rotatable carrier 12. Chemical slurry 20 containing abrasive
particles is delivered to the polishing surface 26 to provide the
desired polishing action. The term polishing surface as used herein
includes not only a top-most layer of the polishing pad 16 but also
any portion of the slurry 20 entrained thereon.
[0016] The temperature of at least a portion of the polishing
surface 26 may be increased by the direct impingement of radiant
energy 28 onto the polishing surface 26. The term direct (or
directly) as used herein refers to the application of heat energy
to the top polishing surface 26 without applying the heat energy
through the thickness of the polishing pad 16, as is done in the
prior art systems. The polishing surface 26 may be heated in an
area remote from the area of contact with the wafer surface 24. By
controlling the area exposed to the radiant energy 28, one may
induce a change in the temperature profile of the polishing surface
26 across the wafer surface 24 as the heated portion of the
polishing surface 26 is rotated to be in contact with the wafer 14.
A change in the temperature of the polishing pad material will
alter the hardness of the pad material, thereby changing the
visco-elastic characteristics and wafer material removal rate of
the pad in that localized area. Every visco-elastic material has a
stress-strain characteristic that is dependent upon the temperature
of the material. The stress-strain characteristic defines the rate
of deformation (deformation per unit time) upon the relaxation of
the applied stress resulting from the down force during the
polishing operation. The temperature of the pad material directly
impacts this relaxation. Pad deformation is, in turn, related to
the amount of reaction force that is exerted onto the abrasive
material in the slurry and upon the raised areas of the surface
being polished. The reaction force determines the mechanical
component of the CMP process, thereby impacting the material
removal rate. Thus, the application of radiant energy 28 to the
polishing surface 26 provides a mechanism for temperature
compensation of the wafer material removal rate. For most
pad/slurry applications, an increase in the temperature is expected
to increase the material removal rate during a CMP operation.
However, one skilled in the art will appreciate that the response
of the material removal rate to a change in temperature must be
evaluated for each particular pad/slurry application.
[0017] The radiant energy 28 is provided by a radiant heating
apparatus 30. The radiant heating apparatus 30 is located proximate
the polishing pad opposed the platen 18, thereby avoiding the need
for conductive heating of the polishing surface 26. By applying the
energy 28 directly onto the polishing surface 26, it is possible to
affect the material removal rate without heating of the entire
platen 18 and without heating the entire thickness of the polishing
pad 16 to the desired temperature. Accordingly, a relatively low
amount of energy 28 is needed to achieve a desired temperature
rise. It may be desired to achieve a temperature rise of up to
90.degree. C. or preferably in the range of 20-60.degree. C. above
the ambient temperature.
[0018] The proximity of the radiant heating apparatus 30 to the
polishing surface 26 may vary depending upon the particular design
of the CMP apparatus 22. Furthermore, the proximity of the radiant
heating apparatus 30 may vary depending upon the type and power
level of radiant energy 28 utilized. The radiant heating apparatus
30 is located at any distance from the polishing surface 26
appropriate for exposing the surface to a desired energy flux. In
one embodiment, the means for providing the radiant heating may be
a source of infrared radiation, such as a heat lamp located
directly above the polishing surface 26. In a further embodiment, a
laser may be used to provide the radiant energy 28, with the
delivery of the laser energy being through a conventional mirror
system or through an optical fiber. Due to the congruence of a
laser beam, it may be possible to locate the source of the laser
energy at a greater distance away from the polishing pad 16 than
would be possible with an infrared radiation source. Alternatively,
a microwave radiation source may be used at any desired frequency
or combination of frequencies. One or more such sources of radiant
energy may be used singly or in combination.
[0019] The radiant heating apparatus 30 may be placed in a
predetermined position with respect to the polishing surface 26 in
order to impinge energy onto a predetermined energy footprint on
the polishing surface 26. A change in energy intensity across the
footprint may be achieved by locating the radiant heating apparatus
30 at an appropriate angle with respect to a plane of the polishing
surface 26. Such an energy gradient will generate a corresponding
change in the temperature rise generated in the polishing surface
26 across the footprint. Furthermore, a lens or other
beam-spreading device may be used to accomplish a desired energy
gradient across the footprint. In one embodiment, only an edge
portion of the polishing surface 26 is heated. In other
embodiments, various other portions of the polishing surface 26 may
be heated. More than one portion of the polishing surface 26 may be
heated to the same or differing temperatures.
[0020] The operation of chemical mechanical polishing apparatus 22
provides a high degree of flexibility for temperature compensation
of the CMP process. In one embodiment, radiant heating apparatus 30
may be operated for a predetermined period of time at a
predetermined power level as the platen 18 is rotated prior to the
wafer 14 being brought into contact with the polishing pad 16. This
would allow a selected area of the polishing surface 26 exposed to
the energy footprint to be brought to a desired temperature prior
to initiating the polishing action. The flux of energy 28 may then
be terminated and the radiant heating apparatus 30 moved away from
the platen 18 in order to protect it from possible exposure to
splashing of the slurry 20. Alternatively, the radiant energy 28
may be initiated concurrently with the polishing activity, and/or
the energy 28 may continue to impinge upon the polishing surface 26
during the polishing process.
[0021] It is also possible to change the power level of the radiant
heating apparatus 30 at various times before and throughout the
polishing process. For example, a first power level may be used to
pre-heat the polishing surface 26 prior to the initiation of the
flow of slurry 20, then a second power level may be used to
maintain a desired temperature after the slurry 20 begins to flow.
Changes in temperature may be quickly achieved due to the low
thermal inertia of the polishing surface 26, since there is no need
to change the temperature of the platen 18 or the entire thickness
of the polishing pad 16.
[0022] The location of the impingement of energy 28 may be changed
as a CMP process progresses, or it may be changed in response to a
changed polishing requirement. The operation of the radiant heating
apparatus 30 may be controlled manually or by an automatic control
system responsive to a measurement of the temperature of the
polishing surface 26 and/or to any other appropriate control
parameter. Such control parameters may be determined by developing
correlations between measurable parameters such as removal rate,
removal uniformity or slurry composition, and they may be used as a
tool for generating an appropriate control response. For example,
removal rates may be measured for sequential polishing experiments.
The effect of temperature can be correlated to the amount of
material removed and the removal rate during such sequential
polishing operations. A feedback loop incorporating such
correlations may be used as a calibration tool for temperature
control.
[0023] The polishing surface temperature may also be regulated by
impingement of a temperature conditioning gas 32 onto polishing
surface 26. The gas 32 may be air or other gas compatible with the
polishing operation, and it may be supplied from a gas conditioning
apparatus 34 such as a heater, air conditioner, or combined
heating-ventilating-air conditioning (HVAC) system. The gas 32 may
be supplied from conditioning apparatus 34 at a temperature greater
than or less than the temperature of the polishing surface 26.
Accordingly, temperature conditioning gas 32 serves to add or to
remove heat energy directly to/from the surface 26 of pad 16 in
order to raise or lower the temperature of at least a portion of
the polishing surface 26 to a predetermined temperature.
Temperature conditioning gas 32 may be used together with or
separately from radiant energy 28 to effect a desired temperature
control scheme.
[0024] While the preferred embodiments of the present invention
have been shown and describe herein, it will be obvious that such
embodiments are provided by way of example only. Numerous
variations, changes and substitutions will occur to those of skill
in the art without departing from the invention herein.
Accordingly, it is intended that the invention be limited only by
the spirit and scope of the appended claims.
* * * * *