U.S. patent application number 09/751998 was filed with the patent office on 2003-01-30 for combination loop textile.
Invention is credited to Hayes, Heather J., Morin, Brian G., Sasser, Michael P..
Application Number | 20030021944 09/751998 |
Document ID | / |
Family ID | 25024410 |
Filed Date | 2003-01-30 |
United States Patent
Application |
20030021944 |
Kind Code |
A1 |
Morin, Brian G. ; et
al. |
January 30, 2003 |
Combination loop textile
Abstract
A base substrate having a first side and a second side, first
and second receiving loops extending from the first and second side
of the base substrate, respectively, and first and second stiff
loops extending from the first and second side of the base
substrate, respectively. The base substrate is a flexible cloth or
cloth-like material. The receiving loops are an absorbent material
such as the material used in the base substrate. The stiff loops
are formed of a yarn having at least one filament with a
cross-section having an aspect ratio of greater than about 1.2, a
corner edge, and/or at least a concave portion.
Inventors: |
Morin, Brian G.; (Greer,
SC) ; Sasser, Michael P.; (Cowpens, SC) ;
Hayes, Heather J.; (Chesnee, SC) |
Correspondence
Address: |
Milliken & Company
P.O. Box 1927
Spartanburg
SC
29304
US
|
Family ID: |
25024410 |
Appl. No.: |
09/751998 |
Filed: |
December 29, 2000 |
Current U.S.
Class: |
428/89 ; 428/92;
428/93 |
Current CPC
Class: |
D10B 2331/04 20130101;
D03D 27/08 20130101; B32B 3/08 20130101; D04B 21/04 20130101; Y10T
428/23929 20150401; B32B 3/06 20130101; D10B 2331/02 20130101; Y10T
428/23957 20150401; A47L 13/16 20130101; Y10T 442/431 20150401;
D10B 2321/08 20130101; D04B 1/04 20130101; D03D 1/0017 20130101;
D03D 27/00 20130101; Y10T 428/23936 20150401; Y10T 428/23964
20150401; Y10T 428/23993 20150401; D03D 15/49 20210101 |
Class at
Publication: |
428/89 ; 428/92;
428/93 |
International
Class: |
D04H 011/00; B32B
003/02; D03D 027/00; D05C 017/00 |
Claims
What is claimed is:
1. An article comprising: a base substrate; a plurality of
receiving loops extending from said base substrate, said receiving
loops including at least one receiving filament; a plurality of
stiff loops extending from said base substrate, said stiff loops
including at least one stiff filament having a denier per filament
of at least about 10 denier per filament greater than the receiving
filament of said receiving loops.
2. The article according to claim 1, wherein said base substrate
includes a first side and a second side, and wherein said receiving
loops and said stiff loops extend from the first side of said base
substrate.
3. The article according to claim 2, wherein said receiving loops
are adjacent to the stiff loops.
4. The article according to claim 2, wherein said receiving loops
coincide with the stiff loops.
5. The article according to claim 1, wherein said base substrate
includes a first side and a second side, wherein said receiving
loops are disposed on the first side of said base substrate, and
wherein said stiff loops are disposed on the second side of said
base substrate.
6. An article comprising: a base substrate; a plurality of
receiving loops extending from said base substrate, said receiving
loops including at least one receiving filament with a denier per
filament of less than about 5; a plurality of stiff loops extending
from said base substrate, said stiff loops including at least one
stiff filament with a denier per filament of greater than about
10.
7. An article comprising: a base substrate; a plurality of
receiving filaments extending from said base substrate, said
receiving filaments having a denier per filament of less than about
5; a plurality of stiff filaments extending from said base
substrate, said stiff loops including at least one stiff filament
with a denier per filament of greater than about 10; wherein said
base substrate with said receiving filaments and said stiff loops
thereon have an absorbency of at least about 2 grams of water per
total gram weight.
8. The article according to claim 7, wherein said receiving
filaments extend from said base substrate in receiving loops, and
wherein said stiff filaments extend from said base substrate in
stiff loops.
Description
BACKGROUND
[0001] The present invention generally relates to textiles having
loops extending outwardly from a base material.
[0002] Loop textiles have many applications. As an example, terry
cloth loop textiles have been used for cleaning purposes. However,
the terry cloth loops do not always provide a surface sufficient
for scrubbing a surface. Therefore, there is a need for loop
textiles having different characteristics for engaging another
item.
BRIEF DESCRIPTION OF THE DRAWINGS
[0003] FIG. 1 is a cross-sectional view of an embodiment of the
present invention, illustrated as a loop textile.
[0004] FIG. 2 is a cross-sectional view of another embodiment of
the present invention.
[0005] FIG. 3 is a cross-sectional view of yet another embodiment
of the present invention.
[0006] FIG. 4A-F are enlarged cross-sectional views of a filament
from a loop of the textile in FIGS. 1-3.
[0007] FIG. 5 is a block diagram illustrating one embodiment of a
method for forming the loop textiles in FIGS. 1-3.
DETAILED DESCRIPTION
[0008] Referring now to the figures, and in particular to FIGS.
1-3, there is shown a cross-sectional view of various embodiments
of the present invention, illustrated as the loop textiles 10, 20,
and 30. The textiles 10, 20 and 30, generally include a base
substrate 100 with a first surface 110 and a second surface 120, a
plurality of first and second receiving loops 210, 220 extending
from the base substrate 100, and a plurality of first and second
stiff loops 310, 320 extending from the base substrate 100.
[0009] As illustrated in FIGS. 1-3, the base substrate 100 is a
knitted cloth formed from a plurality of substrate yarns 101.
Although the base substrate 100 is illustrated in FIGS. 1-3 as a
knitted cloth, the base substrate 100 can be any material that
provides a flexible cloth-like base from which the loops 210, 220,
310, 320 can extend. For example, the base substrate can also be
woven, non-woven, foam (open or closed cell), film, or any other
similar web-like material. In one embodiment, the base substrate
100 is absorbent. In another embodiment, the base substrate 100 can
receive particles.
[0010] The first receiving loops 210 are a yarn that originate and
extend outwardly from the first surface 110 of the base substrate
100, and return into the first surface 110 of the base substrate
100. The second receiving loops 220 are a yarn that originate and
extend outwardly from the second surface 120 of the base substrate
100, and return into the second surface 120 of the base substrate
100. In one embodiment, the height (h) of the receiving loop 210,
220 is between about 0.1 millimeter and about 5 millimeters, and
the width (w) of the receiving loop 210, 220 is between about 0.1
millimeters and about 5 millimeters at the widest point. In another
embodiment, the height (h) of the receiving loop 210, 220 is
between about 0.3 millimeter and about 3 millimeters, and the width
(w) of the receiving loop 210, 220 is between about 0.3 millimeters
and about 3 millimeters at the widest point. In a particular
embodiment, the receiving loop 210, 220 extends to a height (h) of
about 0.8 millimeters from the base substrate 100, and is about 1.0
millimeter wide (w) at the widest point.
[0011] The receiving loops 210, 220 are absorbent and/or retain
particles. In one embodiment, the yarn forming the first and second
receiving loops 210, 220, is the same yarn as the substrate yarn
101 forming the base substrate 100. In another embodiment, the yarn
forming the first and second receiving loops 210, 220, can be a
different yarn than the substrate yarn 101 forming the base
substrate 100. The yarn forming the receiving loops 210, 220 can be
filament or staple yarns, textured or non-textured, and include an
appropriate surface finish. The receiving loops 210, 220 have a
denier per yarn of greater than about 10 in one embodiment, and
greater than about 20 in another embodiment. The receiving loops
210, 220 also have a denier per yarn of less than about 1000 in one
embodiment, and less than about 500 in another embodiment. In one
embodiment, the receiving loops 210, 220 can have from 10 to 10,000
filaments per yarn, and at least one of the filaments can range
from about 0.01 to about 5 denier per filament. In another
embodiment, the receiving loops 210, 220 have at least one filament
with a denier per filament of less than about 1.
[0012] The first stiff loops 310 are a yarn that originate and
extend outwardly from the first surface 110 of the base substrate
100, and return into the first surface 110 of the base substrate
100. The second stiff loops 320 are a yarn that originate and
extend outwardly from the second surface 120 of the base substrate
100, and return into the second surface 120 of the base substrate
100. The stiff loops 310, 320 have a height and width that is
generally sufficient to receive material within the stiff loops
310, 320 when the textile 10, 20, 30 passes over another surface.
In one embodiment, the height (h) of the stiff loop 310, 320 is
between about 0.1 millimeter and about 5 millimeters, and the width
(w) of the stiff loop 310, 320 is between about 0.1 millimeters and
about 5 millimeters at the widest point. In another embodiment, the
height (h) of the stiff loop 310, 320 is between about 0.3
millimeter and about 3 millimeters, and the width (w) of the stiff
loop 310, 320 is between about 0.3 millimeters and about 3
millimeters at the widest point. In a particular embodiment, the
stiff loop 310, 320 extends to a height (h) of about 1.0
millimeters from the base substrate 100, and is about 0.8
millimeter wide (w) at the widest point.
[0013] As illustrated in FIGS. 1-3, the stiff loops 310, 320 are a
mono-filament yarn. However, it is contemplated that the yarn
forming the stiff loops 310, 320 can be either a mono-filament yarn
or a multiple filament yarn. In one embodiment, the yarn forming
the stiff loops 310, 320 has at least one filament with a denier
per filament of at least about 10. In another embodiment the yarn
forming the stiff loops 310, 320 have at least one filament with a
denier per filament of at least about 20. In one embodiment the
yarn forming the stiff loops 310, 320 have a denier per yarn of no
greater than about 500 in one embodiment, and about 1000 in another
embodiment.
[0014] Referring now to FIG. 4A-F, there are shown enlarged
cross-section of various embodiments of filaments that can be used
in the yarn of the stiff loops 310, 320 from FIGS. 1-3. The
cross-section of the filaments used in the yarn of the stiff loops
310, 320 can be circular, or as shown in FIGS. 4A-F, or another
cross-section. In FIG. 4A is illustrated a filament having an
elliptical cross-section. In FIG. 4B is illustrated a filament
having a rectangular cross-section. In FIG. 4C is illustrated a
filament having a square cross-section. In FIG. 4D is illustrated a
filament having a tear drop shaped cross-section. In FIG. 4E is
illustrated a filament having a crescent shaped cross-section. In
FIG. 4F is illustrated a filament having a multi-lobe
cross-section, such as a tri-lobe.
[0015] In one embodiment, the cross-section of the filament(s)
forming the stiff loops 310, 320 have an aspect ratio of greater
than 1.2, as illustrated in FIGS. 4A-F. As used herein an aspect
ratio shall mean the width of the cross-section at its widest point
divided by the width of the cross-section at its narrowest point.
In another embodiment, the cross-section of the filament(s) forming
the stiff loops 310, 320 have at least one corner edge, as
illustrated in FIGS. 4B-F. In yet another embodiment, the
cross-section of the filament(s) forming the stiff loops 310, 320
have a cross-section with at least a portion of the cross-section
being concave, as illustrated in FIGS. 4E-F. As used herein,
concave shall mean a shape that the outer perimeter extends within
a straight line drawn between any two points on the outer
perimeter.
[0016] In an embodiment where the stiff loops 310, 320 are formed
of mono-filament yarns, the cross sections of the filaments can
either be all one type of cross-section, or multiple cross-sections
can be used for the filaments forming the various stiff loops 310,
320. In an embodiment where the loops are formed of multiple
filament yarns, the cross sections of the filaments forming the
yarns can either be all of one type of cross-section (homogeneous),
or multiple types of cross-sections (heterogeneous). Additionally,
the various stiff loops 310, 320 can be yarns of different
filaments, including any combination of homogenous yarns and/or
heterogeneous yarns. Furthermore, the various stiff loops 310, 320
can be combinations of any of the mono-filament yarns and multiple
filament yarns.
[0017] Referring back now to FIGS. 1-3, the yarn forming the stiff
loops 310, 320 can be stiffer than the material of the base
substrate 110. The yarn forming the first and second stiff loops
310, 320 can also be stiffer than the material of the receiving
loops 210, 220. In one embodiment, filaments forming the stiff
loops 310, 320 are at least about a 10 denier per filament size
larger than the filaments forming the receiving loops 210, 220.
[0018] The textile 10, 20, 30 having the two type of loops 210,
220, and 310, 320, can be imparted with favorable absorbency
characteristics. Absorbency is defined by the mass of water
absorbed by a textile per mass of textile. A common test procedure
for this characteristic is the Institute of Environmental Science
& Technology (IEST), Control Division Recommended Practice
004.2, test IEST-RP-CC004.2, "Evaluating Wiping Materials Used in
Cleanrooms and Other Controlled Environments". In one embodiment,
the textile 10, 20, 30 has an absorbency rate of at least about 2
grams of water per gram of textile. In another embodiment, the
textile 10, 20, 30 has an absorbency rate of at least about 2.5
grams of water per gram of textile. In yet another embodiment, the
textile 10, 20, 30 has an absorbency rate of at least about 3 grams
of water per gram of textile.
[0019] Referring now to FIG. 1, the first receiving loops 210 and
the first stiff loops 310 originate at about the same location in
the first side 110 of the base substrate 100, and return to the
first side 110 of the base substrate 100 at about the same location
as each other. Similarly, the second receiving loops 220 and the
second stiff loops 320 originate at about the same location in the
second side 120 of the base substrate 100, and return at about the
same location in the second side 120 of the base substrate 100 as
each other. Although the loop textile 10 has been illustrated in
FIG. 1 with receiving loops 210, 220 and stiff loops 310, 320 on
both sides 110, 120 of the base substrate 100, it is contemplated
that the present invention may have only receiving loops 210 and
stiff loops 310 on the first side 110, receiving loops 210 and
stiff loops 310 on the first side 110 with only receiving loops 220
on the second side 120, receiving loops 210 and stiff loops 310 on
the first side 110 with only stiff loops 320 on the second side
120, or only receiving loops 210 on the first side 110 with only
stiff loops 320 on the second side 120.
[0020] Referring now to FIG. 2, the first receiving loops 210 and
the first stiff loops 310 originate in the first side 110 of the
base substrate 100 and return into the first side 110 of the base
substrate 100. The first receiving loops 210 can originate and
return adjacent to each other, or adjacent to first stiff loops
310. Similarly, the first stiff loops 310 can originate and return
adjacent to each other, or adjacent to first receiving loops 210.
The second receiving loops 220 and the second stiff loops 320
originate in the second side 120 of the base substrate 100 and
return to the second side 120 of the base substrate 100. The second
receiving loops 220 can originate and return adjacent to each
other, or adjacent to second stiff loops 320. Similarly, the second
stiff loops 320 can originate and return adjacent to each other, or
adjacent to second receiving loops 220. Although the loop textile
20 has been illustrated in FIG. 2 with receiving loops 210, 220 and
stiff loops 310, 320 on both sides 110,120 of the base substrate
100, it is contemplated that the present invention may have only
receiving loops 210 and stiff loops 310 on the first side 110,
receiving loops 210 and stiff loops 310 on the first side 110 with
only receiving loops 220 on the second side 120, receiving loops
210 and stiff loops 310 on the first side 110 with only stiff loops
320 on the second side 120, or only receiving loops 210 on the
first side 110 with only stiff loops 320 on the second side
120.
[0021] Referring now to FIG. 3, the first receiving loops 210 and
the first stiff loops 310 originate in the first side 110 of the
base substrate 100 and return into the first side 110 of the base
substrate 100. The first receiving loops 210 can originate and
return adjacent to each other, or adjacent to first stiff loops
310. Similarly, the first stiff loops 310 can originate and return
adjacent to each other, or adjacent to first receiving loops 210.
However, the second receiving loops 220 and the second stiff loops
320 originate at about the same location in the second side 120 of
the base substrate 100, and return at about the same location in
the second side 120 of the base substrate 100 as each other.
Although the loop textile 30 has been illustrated in FIG. 3 with
receiving loops 210, 220 and stiff loops 310, 320 on both sides
110, 120 of the base substrate 100, it is contemplated that the
present invention may have only receiving loops 210 and stiff loops
310 on the first side 110, receiving loops 210 and stiff loops 310
on the first side 110 with only receiving loops 220 on the second
side 120, receiving loops 210 and stiff loops 310 on the first side
110 with only stiff loops 320 on the second side 120, or only
receiving loops 210 on the first side 110 with only stiff loops 320
on the second side 120.
[0022] Additionally, it is anticipated that the present invention
can be a textile that has sections according to the textile 10 in
FIG. 1 and sections according to the textile 20 in FIG. 2 on either
side, or both sides, of the textile. Also, it is anticipated that
the receiving loops 210, 220 can be smaller, larger, or the same
size as the stiff loops 310, 320, in height and/or width.
[0023] Referring now to FIG. 5, there is shown a block diagram of a
method 500 of forming one embodiment of the textile according to
any one of FIGS. 1-3. The method 500 illustrated in FIG. 5
generally includes the steps of acquiring a sheet of polymer
material 510, slitting the sheet of polymer material into strips
520, acquiring a receiving yarn 530, and forming a base substrate
and attaching the strips of polymer to the base substrate as stiff
loops extending from the base substrate and attaching the receiving
yarn to the base substrate as receiving loops extending from the
base substrate 540.
[0024] In step 510, the acquired sheet of polymer material can be a
polymer that is extruded, cast, blown, or that is formed in any
other manner that produces a sheet of polymer. The polymer can be
polyethylene, polyester, polypropylene, or the like. The thickness
of the sheet can be from about 0.0005 inches to about 0.005 inches.
In one embodiment, the film is about 0.0015 inches thick.
[0025] In step 520, the sheet of polymer material is slit into
individual filaments. In one embodiment, a long sheet of polymer
material is unrolled and engages a row of knives that slit the
sheet of polymer from its original width to many strips of the
polymer material, the number of strips determined by the number of
knives. The width of the filaments can be from about 0.002 inches
to about 0.25 inches. In one embodiment, the individual filaments
are strips of polymer that are about 0.0145 inches wide.
[0026] In step 540, the forming a base substrate and attaching the
strips of polymer and receiving yarn can be performed by double
knitting the base substrate, tucking the strips of polymer and
receiving yarn into the base substrate, and knitting the polymer
strips and receiving yarn into the base substrate as loops. In one
embodiment, the polymer strips and receiving yarn are attached as
loops to the base substrate by attaching a first section of the
strip of polymer and the receiving yarn to the base substrate 541,
bringing the strip of polymer and receiving yarn around sacrificial
yarn, attaching a second section of the strip of polymer and
receiving yarn to the base substrate on the opposite side of the
sacrificial yarn from the first section of the strip of polymer and
receiving yarn 542, and removing the sacrificial yarn from between
the base substrate and the strip of polymer and receiving yarn to
form a stiff loop of the strip of polymer and a receiving loop of
the receiving yarn 543. In a further embodiment, the step of
removing the sacrificial yarn is performed by dissolving the
sacrificial yarn.
[0027] The present invention can also be better understood by
reference to the following example. A polymer sheet was acquired of
a polyester film being about 0.0015 inches thick. The polymer sheet
was slit into filament strips of about 0.0145 inches wide. A base
substrate was formed from a substrate yarn of textured filament
polyester yarn, having 34 filaments per yarn at a yarn denier of
150 (such as Dacron 56T by DuPont). The filament polymer strips
were attached to the base substrate as stiff loops by tucking the
filament polymer strips into a first side of the base substrate as
it was being formed, and knitting the filament polymer strips into
the base substrate around a one ply, 40 denier per filament, 12
filament sacrificial water-soluble poly(vinyl alcohol) yarn (such
as Solvron by Nitivy) on the first side of the base substrate. A
soft yarn of splittable of Nylon/PET, 150 denier per yarn, 48
filament (splittable into 48.times.11=528 filaments) (such as Wramp
by Kuraray), was attached to the base substrate as receiving loops
by tucking the soft yarn into a second side of the base substrate
as it was being formed, and knitting the soft yarn into the base
substrate around a one ply, 40 denier per filament, 12 filament
sacrificial water-soluble poly(vinyl alcohol) yarn (such as Solvron
by Nitivy) on the second side of the base substrate. The
sacrificial yarn was removed by immersing the textile into a hot
water scour of 160 F. After formation of the loops by dissolving
the sacrificial yarn, the textile was dyed, slit to proper width,
dried, and cut to the appropriate size. The textile according to
this first example had an absorbency of about 3 grams of water per
gram of textile.
[0028] In a second example, the first example was formed with an
additional soft yarn being attached and knitted into the base
substrate as receiving loops on the same side of the base substrate
as the stiff loops. The textile according to this second example
had an absorbency of about 4 grams of water per gram of
textile.
* * * * *