U.S. patent application number 10/217835 was filed with the patent office on 2002-12-19 for method of manufacturing photopolymer plates.
Invention is credited to Brunton, Colin J., Sculler, Steven J., Veress, Alexander R..
Application Number | 20020192597 10/217835 |
Document ID | / |
Family ID | 26846847 |
Filed Date | 2002-12-19 |
United States Patent
Application |
20020192597 |
Kind Code |
A1 |
Sculler, Steven J. ; et
al. |
December 19, 2002 |
Method of manufacturing photopolymer plates
Abstract
A method of manufacturing photopolymer marking structures is
disclosed. The improved method results in a substantially tack-free
marking structure.
Inventors: |
Sculler, Steven J.;
(Morganville, NJ) ; Brunton, Colin J.; (Rutland,
GB) ; Veress, Alexander R.; (Somervile, NJ) |
Correspondence
Address: |
LERNER, DAVID, LITTENBERG,
KRUMHOLZ & MENTLIK
600 SOUTH AVENUE WEST
WESTFIELD
NJ
07090
US
|
Family ID: |
26846847 |
Appl. No.: |
10/217835 |
Filed: |
August 13, 2002 |
Related U.S. Patent Documents
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Application
Number |
Filing Date |
Patent Number |
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10217835 |
Aug 13, 2002 |
|
|
|
09439468 |
Nov 15, 1999 |
|
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|
60149567 |
Aug 18, 1999 |
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Current U.S.
Class: |
430/302 ;
430/328 |
Current CPC
Class: |
G03F 7/2024 20130101;
G03F 7/405 20130101; G03F 7/40 20130101 |
Class at
Publication: |
430/302 ;
430/328 |
International
Class: |
G03F 007/038 |
Claims
We claim:
1. A method of making the surface of a marking structure
substantially tack-free, comprising the steps of: providing an at
least partially cured marking structure composed of a photopolymer
material, said marking structure having at least one surface; and
curing at least said surface of said at least partially cured
marking structure while said surface is in contact with a solution
including water, at least about 1% of a reducing agent by weight
and, at least about 0.01% of a surfactant by weight.
2. A method of making the surface of a marking structure
substantially free from surface tack comprising the steps of:
exposing selected portions of a desired amount of a photopolymer
material, in an uncured state, to an irradiation source whereby
said photopolymer material is partially cured; removing at least a
portion of any remaining uncured photopolymer material; and further
curing at least a portion of said partially cured marking structure
by exposure to an irradiation source while in contact with a
solution including water, at least about 1% of a reducing agent by
weight and at least about 0.01% of a surfactant by weight.
3. The method of claim 1 wherein said reducing agent comprises a
salt.
4. The method of claim 1 wherein said reducing agent comprises
sodium sulfite.
5. The method of claim 1 wherein said surfactant comprises an
alcohol sulfate.
6. The method of claim 1 wherein said solution comprises between
about 70%-99.9% of said water by weight.
7. The method of claim 1 further comprising the step of forming
said marking structure by exposing selected portions of a desired
amount of said photopolymer material in an uncured liquid state to
an irradiation source whereby said photopolymer material is
partially cured.
8. The method of claim 2 wherein said reducing agent comprises a
salt.
9. The method of claim 2 wherein said reducing agent comprises
sodium sulfite.
10. The method of claim 2 wherein said surfactant comprises an
alcohol sulfate.
11. The method of claim 2 wherein said solution comprises between
about 70%-99.9% of said water by weight.
12. The method of claims 1 or 2 wherein said solution includes no
more than about 15% by weight of each of said reducing agent and
said surfactant.
13. The method of claims 1 or 2 making the surface of a marking
structure substantially tack-free, comprising the steps of:
providing an at least partially cured marking structure composed of
a photopolymer material, said marking structure having at least one
surface; and curing at least said surface of said at least
partially cured marking structure while said surface is in contact
with a solution including water, between about 1% and about 15% of
a reducing agent by weight and between about 1% and about 15% of a
surfactant by weight.
14. The method of claims 1 or 2 making the surface of a marking
structure substantially free from surface tack comprising the steps
of: exposing selected portions of a desired amount of a
photopolymer material, in an uncured state, to an irradiation
source whereby said photopolymer material is partially cured;
removing at least a portion of any remaining uncured photopolymer
material; and further curing at least a portion of said partially
cured marking structure by exposure to an irradiation source while
in contact with a solution including water, between about 1% and
about 15% of a reducing agent by weight and between about 1% and
about 15% of a surfactant by weight.
Description
CROSS REFERENCE TO RELATED APPLICATIONS
[0001] This application is a divisional application of U.S.
application Ser. No. 09/439,468, filed Nov. 15, 1999, which claims
the benefit of provisional patent application serial No.
60/149,567, filed on Aug. 18, 1999, the disclosures of which are
incorporated by reference herein.
BACKGROUND OF THE INVENTION
[0002] The present invention relates to methods of manufacturing
marking structures. More particularly, the present invention
relates to methods of manufacturing photopolymer marking
structures.
[0003] It is known to manufacture photopolymer printing plates by
exposing a photosensitive material to ultraviolet ("UV") light. It
is also known to use a negative film having transparent areas
corresponding to a desired image pattern, where the UV light will
pass through and cure the photopolymer to produce relief image
areas of a desired photopolymer printing plate. The purpose of UV
light is to cure, or at least partially cure, exposed areas of the
photopolymer material. Other methods of curing desired areas of
photopolymer printing plates have been used to manufacture marking
devices and other devices made of photopolymer materials.
[0004] After the relief image areas are created through the use of
negative film and UV light exposure, or other means, it is known to
develop the exposed image areas by removing the photopolymer from
the non-image areas (corresponding to black, nontransparent areas
of the negative film). This can be done by washing the newly
created photopolymer plate in a water/surfactant medium.
Optionally, an air knife can be used as part of a polymer recovery
step prior to washing the photopolymer printing plate.
[0005] It is common to then subject the partially manufactured
photopolymer printing plate to a post exposure process which
involves submerging it in a water based solution and then
irradiating it with UV light.
[0006] A substantial problem with known methods of manufacturing
photopolymer printing plates is that the finished product often has
too much surface tack. This problem is particularly prevalent for
photopolymer printing plates prepared from liquid resins. The
surface tack problem is due, in part, to the inhibition by oxygen
of the acrylate polymerization process at the plate surface. It is
believed that all commercially available photopolymer printing
plates rely on an acrylate polymerization mechanism to create the
plate relief and characters.
[0007] Efforts have been made to overcome the problem of unwanted
surface tack on photopolymer plates. However, all such efforts have
been largely unsuccessful or suffer from additional problems.
[0008] For example, it is known to incorporate hydrogen abstracting
photoinitiators, such as benzophenone, into the photopolymer
formulation. It is also known to incorporate amine synergists into
the photopolymer material. There are at least two problems
associated with the incorporation of such compositions into the
photopolymer material. First, photoinitiators are powerful
absorbers of UV light especially at the surface of the photopolymer
printing plate. This often results in undercutting of the plate
characters. A second problem is that the addition of a hydrogen
abstracting type photoinitiator can render the plate more
susceptible to attack and subsequent degradation by stray UV light
(e.g., daylight).
[0009] Long-chain fatty acids, such as myristic and palmitic acids,
have also been added to photopolymer formulations in an attempt to
manufacture a product free of surface tack. Such long chained fatty
acids tend to bloom to the surface of the printing plate where a
waxy layer is formed thereby rendering the surface substantially
tack free. Although the incorporation of long-chain fatty acids may
be effective to cover up and substantially eliminate surface tack,
such approach has a substantial disadvantage in that it reduces the
plate wetting tension and thus, results in poor pick up and
transfer of ink.
[0010] Another way that the prior art has attempted to reduce
surface tack is through the use of germicidal lamps at the post
exposure stage as well as standard actinic lamps. This approach
also has disadvantages. Namely, it is necessary to use an
additional machine which adds substantial costs to the process.
Further, the germicidal lamps emit short wave UV radiation that is
harmful to the bulk physical properties of the photopolymer
printing plate.
[0011] Other approaches at the post exposure stage include the
incorporation of sodium sulfite, a salt, into a water solution to
facilitate the removal of oxygen from the water. The intent of this
approach is to again reduce the surface tack. However, the
water/sodium sulfite solution has proven to be only marginally
successful at reducing surface tack of the manufacturing
photopolymer printing plate.
[0012] Another post exposure approach has been to add a surfactant
into the post exposure water solution in an effort to reduce
surface tack. It has been observed that this approach is successful
when long-chain fatty acids are also added to the photopolymer
formulation itself as discussed above. However, the use of
surfactants in a water based solution have proven to be only
marginally successful in reducing surface tack of the manufactured
photopolymer printing plates.
[0013] A new method of manufacturing photopolymer marking
structures is needed where the manufactured marking structure has a
substantially tack-free surface but nonetheless has desirable ink
pick up and transfer qualities.
SUMMARY OF THE INVENTION
[0014] The present invention overcomes the problems associated with
prior art methods by providing new methods of manufacturing
photopolymer marking structures that have a substantially tack-free
surface while retaining desirable ink pick-up and transfer
qualities.
[0015] In accordance with one aspect of the present invention, a
method of manufacturing marking structures is provided. The method
comprises forming a marking structure from a photopolymer material
and subsequently placing the marking structure in a solution
comprising water, a reducing agent and a surfactant.
[0016] It is preferable to expose the marking structure to UV light
when the marking structure is immersed within the solution.
[0017] It is preferable for the reducing agent to comprises a salt
such as sodium sulfite. However, various other reducing agents may
be used in accordance with the scope of the present method.
[0018] The surfactant preferably comprises an alcohol sulfate such
as sodium lauryl sulfate. One commercially manufactured alcohol
sulfate is marketed under the trademark EMPICOL LXV. The
surfactants used in the present invention presumably suspend or
otherwise dissolve the uncured polymer into the aqueous phase, thus
making it possible to clean the marking structure leaving it
substantially free of uncured photopolymer.
[0019] In accordance with a preferred step of the present method,
the solution in which the photopolymer marking structure is placed
may comprise between about 70%-99.9% of water by weight. The
solution may also comprise between about 0.01%-15% of the reducing
agent by weight. It is also preferable for the solution to comprise
between about 0.01%-15% of the surfactant by weight. The marking
structure is preferably at least partially cured in the solution by
exposure to UV light, other irradiation sources or other curing
means such as chemical catalysis. It is a desired quality of the
solution to substantially reduce or eliminate surface tack that
would otherwise exist on the marking structure.
[0020] In a preferred embodiment, the solution may comprise between
about 1%-5% of the reducing agent by weight and between about 1%-5%
of the surfactant by weight.
[0021] In accordance with a preferred method of manufacturing
marking structures, a desired amount of a photopolymer material is
placed into a marking structure manufacturing device when the
photopolymer material is in an uncured liquid state. The marking
structure manufacturing device in which the photopolymer material
is cured may include identified desired image areas while other
areas are shielded. It is also preferable to expose the
photopolymer material arranged at the desired identified image
areas to an irradiation source whereby the exposed image areas
become partially cured. Preferably, the irradiation source is a UV
light source. However, in an embodiment where a light source is
required, irradiation sources other than an UV light source may be
used. It is also preferred to remove uncured portions of the
photopolymer material after the photopolymer material has been
exposed to the light source so that the partially cured image areas
remain. The partially cured photopolymer marking structure are then
placed in a solution comprising water, a reducing agent and a
surfactant to remove surface tack. UV light or other curing means
is preferably applied to the marking structure when it is in the
solution to further cure it.
[0022] In a preferred and important aspect of the present
invention, a solution comprising a reducing agent such as sodium
sulfite, a surfactant and water is used as a post exposure solution
in which the partially cured photopolymer marking structure is
placed after such marking structure is at least partially cured
through exposure to UV light or other curing means. Such a solution
is significant for its contribution through the manufacturing
process of creating a photopolymer marking structure having a
substantially tack-free surface.
[0023] The present invention will be more fully understood when the
following claims are considered in conjunction with the following
detailed description of the preferred embodiments and associated
drawings.
BRIEF DESCRIPTION OF THE DRAWINGS
[0024] FIG. 1 is a top plan schematic view of a support plate
assembly of a preferred marking structure manufacturing device.
[0025] FIG. 2 is a top plan schematic view of the support plate
assembly shown in FIG. 1 with an added frame.
[0026] FIG. 3 is a top plan schematic view of the support plate
assembly shown in FIG. 2 with a photopolymer in a liquid state
arranged thereon.
[0027] FIG. 4 is a partially cross section side view of the support
plate assembly shown in FIG. 3 with a flexible substrate cover.
[0028] FIG. 5 is a perspective view of a marking structure
manufacturing device shown in an open position for receiving the
support plate assembly of FIGS. 1-4.
DETAILED DESCRIPTION
[0029] A photopolymer marking structure manufactured in accordance
with the present method is generally made of a polymeric material
including photosensitive compositions that may be cured by exposure
to an irradiation source. Preferably, the incident irradiation
waves comprise UV light waves. However, other irradiation sources
may be used with certain types of photopolymer materials in order
to at least partially cure the material.
[0030] Portions of a support plate assembly intended for use with a
marking structure manufacturing assembly used to form photopolymer
marking structures are shown in FIGS. 1-4. FIG. 5 illustrates a
marking structure manufacturing machine 26 that is intended to used
with the support plate assembly 10 as shown in FIGS. 1-4 in
accordance with the present method of manufacturing photopolymer
marking structures.
[0031] More particularly as shown in FIGS. 1-4, the support plate
10 comprises a bottom glass plate 12 on which a negative film 14 is
arranged.
[0032] In order to create a desired marking structure, it is known
to first create the negative film 14. The negative film 14 is
preferably used as a mask to shield UV light from certain areas of
a photopolymer material while the area in the negative film that is
clear (i.e., the image area) will allow UV light to pass through so
that desired image patterns on the photopolymer material can be
cured.
[0033] With respect to the negative film 14 of FIGS. 1-4, the
exposed areas are designated by reference numeral 16 while the
blackened areas that shield UV light from the photopolymer material
are designated by reference numeral 18.
[0034] The background and image relief areas of a photopolymer
material may be simultaneously exposed to UV light or may be
successively exposed one area at a time. The exposed background
forms the foundation (i.e., base) on which the image relief pattern
is supported.
[0035] The portion of the support plate assembly 10 on which the
photopolymer material is placed prior to exposure is shown in FIGS.
1-4 as a glass plate 12 on which the negative film 14 is placed. A
solution of glycerin and water 20 is applied to the surface of the
glass plate 12 to form a border around the negative film 14. A
cover film 22 is then placed over the negative film 14 and the
glycerin/water solution 20. A seal is formed between the cover film
22 and the glass plate 12 by the glycerin/water solution 20. The
use of the glycerin/water solution 20 is optional. Alternate
systems may use a vacuum channel to pull the cover film 22 down
onto the negative film 14 and the glass plate 12. Other alternate
systems may not require a seal of any type.
[0036] A frame made of a foam tape 24 (or other compressible
material) is then placed on the cover film 22 in which a desired
volume of photopolymer composition 26 in liquid form is poured
prior to curing procedures. After the photopolymer composition 26
is poured onto the cover film 22, a substrate, such as a
substantially translucent and flexible plastic, or glass, is placed
on top of the liquid photopolymer composition 26 and is supported
by the foam frame 24. This aspect of the present method is shown in
FIG. 5. The foam frame 24 is an optional feature. Alternate systems
may use a built in frame as a dam, or may entirely eliminate the
frame.
[0037] It should be appreciated that the marking structure
manufacturing devices shown in FIGS. 1-5 are known in the art. They
are preferred devices used in conjunction with the present improved
method to manufacture an improved photopolymer marking structure as
discussed above and further below.
[0038] In order to assemble the support plate structure 10 on which
the photopolymer marking structure will be manufactured, it is
desirable to place the negative film 14 in the center of the glass
support plate 12 as illustrated in FIG. 2. The images 16, such as
letters and numbers, of the negative film 14 should be arranged in
a right reading emulsion up position (as shown in FIG. 2).
[0039] A small brush or a soft cloth may then be used to apply a
solution that preferably comprises 50% water and 50% glycerin or
the like about one half inch from the perimeter of the negative
film 14 on the surface of the glass plate 12. Care should be taken
not to apply too much of the glycerin/water solution 20 onto the
glass plate 12 in order to avoid seepage of the solution onto the
negative film 14.
[0040] The cover film 22 should then be placed over the entire
negative film 14. The cover film 22 should also be placed over the
glycerin/water border 20 applied on the surface of the glass plate
12. Preferably, the cover film 22 will not hang over the edges of
the glass support plate 12.
[0041] Using a paint roller (not shown) or the like, apply light
pressure to push the cover film 22 down toward the glass support
plate 12. It is preferable to start rolling from the center of the
cover film 22 and to push outwardly toward the edges thereof. This
step will make the cover film 22 smooth and tight over the glass
plate 12. At this stage, the support plate assembly 10 is shown in
FIG. 1.
[0042] The frame 24 should then placed on the surface of the cover
film 22 as illustrated in FIGS. 2-4. The frame 24 may be made of
foam tape. In a preferred embodiment such as that shown in FIGS.
2-4, a small gap such as 0.125 inch, should be left between each
strip of the foam. As is known, the foam frame 24 is generally used
to help retain the photopolymer in its liquid state within the
perimeter of the frame 24 prior to curing of the photopolymer
composition 26.
[0043] As is also known in the art, the photopolymer composition
should then be poured onto the cover film 22 overlaying the
negative film 14 within the perimeter of the frame 24. This
arrangement is shown in FIGS. 3 and 4.
[0044] After the photopolymer composition 26 is spread out and
filled to a desired volume within the perimeter of the foam frame
24, a flexible substrate 28, such as a flexible and translucent
plastic, should then be placed over the liquid photopolymer
composition 26 as illustrated in FIG. 4. A top glass plate (also
not shown) may then be placed on top of the flexible substrate 28.
Clamps (not shown) may then be applied around the perimeter of the
overall support plate assembly 10. This process and structure is
also known.
[0045] The support plate assembly 10 with the liquid photopolymer
composition 26 therein can then be placed in a photopolymer curing
machine 30 (shown in FIG. 5) as is also known in the art. While
various photopolymer curing machines may be used, highly desirable
machines are sold by M&R Marking Systems, Inc. of Piscataway,
N.J. under the IDEAL trademark as system 1010 and system 1020
machines.
[0046] As illustrated in FIG. 5, the photopolymer curing machine 30
includes a top lid 32 having top UV lamps 34 arranged therein and a
bottom section 36 having bottom UV lamps 38 arranged therein. The
top UV lamp 34 is used to partially cure the background support
portion of the photopolymer marking structure while the bottom UV
lamps 38 are used to partially cure the image relief patterns
through the exposed areas 16 of the negative film 14.
[0047] After the initial exposure process is complete, the support
plate assembly 10 including the partially cured photopolymer
composition 26 therein is then removed from the exposure machine
30. The partially cured photopolymer marking structure is then
removed from the support assembly 10 and may be subjected to a
washing and brushing process where the unexposed portions of the
photopolymer composition is removed and the exposed partially cured
portions of the photopolymer composition remain so that a support
base and image relief patterns are clearly visible.
[0048] The present invention contemplates the use of readily
available photopolymers, examples of which are i40 marketed by
M&R Marking, Inc. Piscataway, N.J., IDEAL 40, F 5000 and LF 55G
all manufactured by McDermid The present invention also provides
for the use of other polymeric formulations suitable for
manufacturing marking structures.
[0049] The present method is particularly significant at this stage
in the manufacturing process. The partially cured photopolymer
marking structure should then be subjected to a post exposure
process. The present method contemplates placing the partially
cured photopolymer marking structure in a solution which comprises
water, an reducing agent such as sodium sulfite and a surfactant
such as alcohol sulfate (e.g., sodium lauryl sulfate) and olefin
sulfonates.
[0050] This post exposure solution preferably includes the reducing
agent (e.g., sodium sulfite) in an amount of between about 1%-5% by
weight while the surfactant is also preferably present in an amount
of between about 1%-5% by weight of the total solution. In other
embodiments, the reducing agent and the surfactant may each
comprise between about 0.01%-15% of the total solution by weight.
In still another embodiment of the invention, the marking structure
is exposed to UV light while it is immersed in the solution. While
the use of higher percentages of the reducing agent and the
surfactant come within the scope of the present invention, such
higher percentages may cloud the water and may not be useful as the
compositions may simply drop out of the solution.
[0051] While not intending to be bound to a particular theory of
operation, it is believed that this solution suspends or otherwise
dissolves re-deposited uncured photopolymer which allows for easier
and more facile cleaning of the surface of the cured photopolymer
marking structure. The solution also may provide an environment
more conducive to curing by sequestering dissolved oxygen in the
aqueous medium, thus allowing the marking structure to further
cure.
[0052] It should be appreciated that the present invention is not
limited to the surfactants described herein or the use of sodium
sulfite as a reducing agent. The combination of these compositions
in the post exposure solution facilitate the creation of a
substantially tack-free photopolymer marking structure.
[0053] While the foregoing detailed description describes preferred
methods of manufacturing marking structures and preferred solutions
used in such methods in accordance with the present invention, it
should be appreciated that the invention is defined by the claims
set forth below and is not intended to be limited to the preferred
embodiments. Accordingly, those of skill in the art are encouraged
to modify the preferred steps, components and compositions
described herein while remaining within the scope of the present
invention.
* * * * *