U.S. patent application number 10/079557 was filed with the patent office on 2002-08-22 for transflective liquid crystal display device and manufacturing method for the same.
Invention is credited to Ha, Kyoung-Su, Yi, Jong-Hoon.
Application Number | 20020113927 10/079557 |
Document ID | / |
Family ID | 19706132 |
Filed Date | 2002-08-22 |
United States Patent
Application |
20020113927 |
Kind Code |
A1 |
Ha, Kyoung-Su ; et
al. |
August 22, 2002 |
Transflective liquid crystal display device and manufacturing
method for the same
Abstract
A transflective liquid crystal display device having a first
substrate, a gate line and a data line defining a pixel region by
crossing each other on the first substrate, a thin film transistor
connected to the gate line and the data line, a passivation layer
covering the thin film transistor and having a first transmission
hole, a reflector disposed on the passivation layer in the pixel
region and having a second transmission hole, a color filter formed
on the reflector, a pixel electrode made of a transparent
conductive material formed on the color filter and connected to the
thin film transistor through a contact hole, a second substrate
spaced apart from the first substrate, a common electrode formed of
a transparent conductive material and disposed beneath the second
substrate, and a liquid crystal layer provided between the pixel
electrode and the common electrode.
Inventors: |
Ha, Kyoung-Su; (Seoul,
KR) ; Yi, Jong-Hoon; (Seoul, KR) |
Correspondence
Address: |
BIRCH STEWART KOLASCH & BIRCH
PO BOX 747
FALLS CHURCH
VA
22040-0747
US
|
Family ID: |
19706132 |
Appl. No.: |
10/079557 |
Filed: |
February 22, 2002 |
Current U.S.
Class: |
349/113 |
Current CPC
Class: |
G02F 1/133553 20130101;
G02F 1/1362 20130101; G02F 1/133555 20130101; G02F 1/136222
20210101; G02F 1/133514 20130101; G02F 2203/09 20130101; G02F
1/136227 20130101 |
Class at
Publication: |
349/113 |
International
Class: |
G02F 001/1335 |
Foreign Application Data
Date |
Code |
Application Number |
Feb 22, 2001 |
KR |
2001-09027 |
Claims
What is claimed is:
1. A transflective liquid crystal display device, comprising; a
first substrate; a gate line and a data line defining a pixel
region by crossing each other on the first substrate; a thin film
transistor connected to the gate line and the data line; a
passivation layer covering the thin film transistor and having a
first transmission hole; a reflector disposed on the passivation
layer in the pixel region and having a second transmission hole; a
color filter formed on the reflector; a pixel electrode made of a
transparent conductive material formed on the color filter and
connected to the thin film transistor through a contact hole; a
second substrate spaced apart from the first substrate; a common
electrode formed of a transparent conductive material disposed
between the second substrate and the first substrate; and a liquid
crystal layer disposed between the pixel electrode and the common
electrode.
2. The device according to claim 1, wherein the first substrate
further contains an uneven configuration that is formed of a same
material as the passivation layer and in a position corresponding
to the first and second transmission holes.
3. The device according to claim 1, wherein the passivation layer
has an uneven configuration under the reflector.
4. The device according to claim 3, wherein the first substrate
further includes an insulating layer that is formed of an organic
insulating material on the passivation layer.
5. The device according to claim 1, further includes a gate
insulating layer between the gate line and the data line and the
first and second transmission holes are extended through the gate
insulating layer.
6. The device according to claim 1, wherein the pixel electrode is
partially overlapped with the data line.
7. The device according to claim 6, wherein the first substrate
further includes an uneven configuration that is formed of a same
material as the passivation layer in a position corresponding to
the first and second transmission holes.
8. The device according to claim 6, wherein the passivation layer
has an uneven configuration under the reflector.
9. The device according to claim 8, wherein the first substrate
further includes an insulating layer that is formed of an organic
insulating material on the passivation layer.
10. The device according to claim 1, wherein the reflector is
extended to cover the thin film transistor.
11. The device according to claim 10, wherein the first substrate
further includes an uneven configuration that is formed of the same
material as the passivation layer in a position corresponding to
the first and second transmission holes.
12. The device according to claim 10, wherein the passivation layer
has an uneven configuration under the reflector.
13. The device according to claim 12, wherein the first substrate
further includes an insulating layer that is formed of an organic
insulating material on the passivation layer.
14. The device according to claim 1, wherein the second substrate
further includes a black matrix that corresponds to the thin film
transistor.
15. The device according to claim 14, wherein the first substrate
further includes an uneven configuration that is formed of the same
material as the passivation layer in a position corresponding to
the first and second transmission holes.
16. The device according to claim 14, wherein the passivation layer
has an uneven configuration under the reflector.
17. The device according to claim 16, wherein the first substrate
further includes an insulating layer that is formed of an organic
insulating material on the passivation layer.
18. The device according to claim 1, wherein the second substrate
further includes a buffer layer, which has a third transmission
hole corresponding to the first and second transmission holes, on
the common electrode.
19. The device according to claim 18, wherein the first substrate
further includes an uneven configuration that is formed of the same
material as the passivation layer in a position corresponding to
the first and second transmission holes.
20. The device according to claim 18, wherein the passivation layer
has an uneven configuration under the reflector.
21. The device according to claim 20, wherein the first substrate
further includes an insulating layer made of an organic insulating
material and formed on the passivation layer.
22. A method of manufacturing a transflective liquid crystal
display device, comprising: forming a gate line and a data line
defining a pixel region by crossing each other on a first
substrate; forming a thin film transistor connected to the gate
line and the data line; forming a passivation layer covering the
thin film transistor and having a first transmission hole; forming
a reflector on the passivation layer in the pixel region and
containing a second transmission hole; forming a color filter on
the reflector; forming a pixel electrode on the color filter using
a transparent conductive material, the pixel electrode being
connected to the thin film transistor through a contact hole;
forming a common electrode on a second substrate using a
transparent conductive material; positioning the first substrate
and the second substrate to face each other; and forming a liquid
crystal layer between the pixel electrode and the common
electrode.
23. The method according to claim 22, further comprising the step
of forming the passivation layer having an uneven configuration
under the reflector.
24. The method according to claim 23, further including the step of
forming an insulating layer on the passivation layer using an
organic insulating material.
25. The method according to claim 22, further including the step of
forming the passivation layer having an uneven configuration in a
position that corresponds to the first and second transmission
holes, using the same material as the passivation layer.
26. The method according to claim 22, wherein the pixel electrode
may be partially overlapped with the data line.
27. The method according to claim 26, wherein the passivation layer
is formed with an uneven configuration under the reflector.
28. The method according to claim 27, further including the step of
forming an insulating layer on the passivation layer using an
organic insulating material.
29. The method according to claim 26, further including the step of
forming the passivation layer having an uneven configuration in a
position that corresponds to the first and second transmission
holes, using the same material as the passivation layer.
30. The method according to claim 22, wherein the reflector is
extended to cover the thin film transistor.
31. The method according to claim 30, wherein the passivation layer
is formed with an uneven configuration under the reflector.
32. The method according to claim 31, further including the step of
forming an insulating layer on the passivation layer using an
organic insulating material.
33. The method according to claim 30, further including the step of
forming the passivation layer having an uneven configuration in a
position that corresponds to the first and second transmission
holes, using the same material as the passivation layer.
34. The method according to claim 22, further including the step of
forming a black matrix which corresponds to the thin film
transistor, on the second substrate.
35. The method according to claim 34, wherein the passivation layer
is formed with an uneven configuration under the reflector.
36. The method according to claim 35, further including the step of
forming an insulating layer on the passivation layer using an
organic insulating material.
37. The method according to claim 34, further including the step of
forming the passivation layer having an uneven configuration in a
position that corresponds to the first and second transmission
holes, using the same material as the passivation layer.
38. The method according to claim 22, further includes a step of
forming a buffer layer, which has a third transmission hole
corresponding to the first and second transmission holes, on the
second substrate.
39. The method according to claim 38, wherein the passivation layer
is formed with an uneven configuration under the reflector.
40. The method according to claim 39, further including the step of
forming an insulating layer on the passivation layer using an
organic insulating material.
41. The method according to claim 38, further including the step of
forming the passivation layer having an uneven configuration in a
position that corresponds to the first and second transmission
holes, using the same material as the passivation layer.
Description
[0001] This application claims the benefit of Korean Patent
Application No. 2001-09027, filed on Feb. 22, 2001 in Korea, which
is hereby incorporated by reference for all purposes as if fully
set forth herein.
BACKGROUND OF THE INVENTION
[0002] 1. Field of the Invention
[0003] The present invention relates to a liquid crystal display
(LCD) device and more particularly, to a transflective liquid
crystal (CLC) display device and a method of manufacturing the
same.
[0004] 2. Discussion of the Related Art
[0005] Flat panel display devices, which have properties of being
thin, and having low weight and low power consumption, have been
required as the information age rapidly evolves. The flat panel
display device may be classified into two types depending on
whether it emits light or not. One is a light-emitting type display
device that emits light to display images and the other is a
light-receiving display device that uses an external light source
to display images. Plasma display panels (PDPs), filed emission
display (FED) devices and electro luminescence (EL) display devices
are examples of the light-emitting type display devices and liquid
crystal displays are an example of the light-receiving type display
device. The liquid crystal display device is widely used for
notebook computers and desktop monitors, etc. because of its
superior resolution, color image display and quality of displayed
images.
[0006] Generally, the liquid crystal display device has first and
second substrates, which are spaced apart and facing each other.
Each of the substrates includes an electrode and the electrodes of
each substrate are positioned to face each other. A Liquid crystal
is interposed between the first substrate and the second substrate.
Voltage is applied to the liquid crystal through the electrodes of
each substrate, and thus an alignment of the liquid crystal
molecules is changed according the applied voltage to display
images. Because the liquid crystal display device cannot emit light
as described before, it needs an additional light source to display
images.
[0007] The liquid crystal display device can be classified into two
types depending on the type of the light source that is used. One
is a transmissive liquid crystal display device and the other is a
reflective liquid crystal display device. The transmissive liquid
crystal display device displays a color image by irradiating
artificial light from a back light, which is positioned behind a
liquid crystal panel, to the liquid crystal and then controlling
the amount of the light according to the alignment of the liquid
crystal. The reflective liquid crystal display device displays a
color image by controlling a transmittance of the light according
to an alignment of the liquid crystal by reflecting ambient light
or artificial light. Because the transmissive liquid crystal
display device uses an artificial light source such as the back
light, it can display a bright image in dark surroundings but it
has a high power consumption. The reflective liquid crystal display
device depends on ambient light or an external artificial light
source for its light source and accordingly it has lower power
consumption than the transmissive liquid crystal display device but
it is not suitable for dark surroundings. Accordingly, the
transflective liquid crystal display device, which has
characteristics of both the transmissive liquid crystal display
device and the reflective liquid crystal display device, has been
suggested in the field.
[0008] FIG. 1 is a cross-sectional view of a conventional
transflective liquid crystal display device. As shown in the
figure, a pixel electrode 20 is formed on a first substrate 10,
referred to as an array substrate, that has a thin film transistor
(not shown), i.e., a switching element. The pixel electrode 20
consists of a transmission electrode 21 and a reflection electrode
22. A hole is formed in the reflection electrode 22 and the
transmission electrode 21 is formed in the hole. The transmission
electrode 21 is formed of transparent conductive material such as
indium tin oxide (ITO) or indium zinc oxide (IZO) that has a
relatively high transmittance of light. Whereas, the reflection
electrode 22 is formed of material such as aluminum (Al) that has a
low electric resistance and a high reflectance.
[0009] A second substrate 30, i.e., referred to as a color filter
substrate, is positioned over the first substrate 10 maintaining a
certain distance from the first substrate 10. A color filter 40,
which corresponds to the pixel electrode 20, is formed beneath the
second substrate 30. The color filter 40 includes sub-color-filters
red (R), green (G), and blue (B) and each of the sub-color filters
corresponds to each of the pixel electrode 20. A common electrode
50 is formed beneath the color filter 40 using transparent
conductive material. A black matrix (not shown) is positioned
between the second substrate 30 and the color filter 40 to protect
any leakage of light in an area other than the pixel. A liquid
crystal layer 60 is positioned between the common electrode 50 and
the pixel electrode 20.
[0010] A first retardation film 71 and a second retardation film 72
are formed on the outer side of the first substrate 10 and the
second substrate 30 respectively. The first retardation film 71 and
the second retardation film 72 serve to change the polarization
state of light. Because the first and second retardation films 71
and 72 have a phase difference of .lambda./4, the first and second
retardation films 71 and 72 change linear polarization into
circular polarization and circular polarization into linear
polarization. A lower polarizer 81 and an upper polarizer 82 are
positioned on outer side of the first retardation film 71 and the
second retardation film 72, respectively. The light transmission
axis of the upper polarizer 82 is perpendicular to the light
transmission axis of the lower polarizer 81. A back light 90 is
positioned under the lower polarizer 81 and serves as a light
source for a transmission mode. The transfective liquid crystal
display device is designed on the basis of a reflection mode and
thus when a voltage is not applied, the transmittance of the
transmission mode is only one-half of the transmittance of the
reflection mode. Accordingly, a transflective liquid crystal
display device in which the transmittance of the transmission mode
is controlled the same as the transmittance of the reflection mode
by forming the thickness of a liquid crystal layer of the
transmission mode thicker than the thickness of a liquid crystal
layer of the reflection mode, has been suggested in the field. The
transflective liquid crystal display device is manufactured through
a series of process steps like the conventional liquid crystal
display device. That is, the manufacturing process for the
transflective liquid crystal display device includes a process for
producing an array substrate, which includes a plurality of the
thin film transistors and pixel electrodes thereon, a process for
producing a color filter substrate, which includes the color filter
and the common electrode, and a process for producing a liquid
crystal cell, which includes such processes as an alignment of the
two substrates, an injection of the liquid crystal and sealing and
forming the polarizer. The alignment of the array substrate and the
color filter substrate is performed as follows. A number of seal
patterns are formed on one of the array substrate and the color
filter substrate and a number of spacers are dispersed on one of
the two substrates to maintain a distance between the two
substrates. The two substrates then are aligned in such a way that
each of the sub-color filters corresponds to each of the pixel
electrode and finally the two substrates are assembled by a
pressure hardening of the seal pattern. If a misalignment of the
array substrate and the color filter substrate occurs during the
alignment process, inferiorities such as a leakage of light may be
generated. The width of the black matrix on the second substrate
may be formed wide enough to prevent the leakage of light but this
tends to lower the aperture ratio of the liquid crystal display
device.
SUMMARY OF THE INVENTION
[0011] Accordingly, the present invention is directed to a
transflective liquid crystal display device and a method of
manufacturing the reflective liquid crystal display device that
substantially obviates one or more of the problems encountered due
to the limitations and disadvantages of the related art.
[0012] An advantage of the present invention is to provide a
transflective liquid crystal display device in which a color filter
is formed on the lower substrate to increase luminance, and the
luminance and color purity are controlled uniformly by controlling
the thickness of the cell gap and the thickness of the color
filter.
[0013] Another advantage of the present invention is to provide a
method of manufacturing a transflective liquid crystal display
device that has a color filter on a lower substrate and a black
matrix or a buffer layer on an upper substrate.
[0014] Additional features and advantages of the present invention
will be set forth in the description which follows, and in part
will be apparent from the description, or may be learned by
practice of the present invention. The objectives and other
advantages of the invention will be realized and attained by the
structure particularly pointed out in the written description and
the claims herein as well as the appended drawings.
[0015] To achieve these and other advantages and in accordance with
the purpose of the present invention, as embodied and broadly
described, a transflective liquid crystal display device comprises
a first substrate, a gate line and a data line defining a pixel
region by crossing each other on the first substrate, a thin film
transistor connected to the gate line and the data line, a
passivation layer covering the thin film transistor and having a
first transmission hole, a reflector disposed on the passivation
layer in the pixel region and having a second transmission hole, a
color filter formed on the reflector, a pixel electrode formed of a
transparent conductive material formed on the color filter and
connected to the thin film transistor through a contact hole, a
second substrate spaced apart from the first substrate, a common
electrode formed of a transparent conductive material provided
beneath the second substrate, and a liquid crystal layer disposed
between the pixel electrode and the common electrode. The pixel
electrode may be partially overlapped with the data line and the
reflector may be extended to cover the thin film transistor. The
second substrate may further include a black matrix that
corresponds to the thin film transistor, and a buffer layer, which
has a third transmission hole corresponding to the first and second
transmission holes, on the common electrode. The first substrate
may further include an unevenness that is formed of the same
material as the passivation layer in a position corresponding to
the first and second transmission holes. The passivation layer may
have an unevenness under the reflector. The first substrate may
further include an insulating layer that is formed of an organic
insulating material on the passivation layer. The transflective
liquid crystal display device may further include a gate insulating
layer between the gate line and the data line and thus the first
and second transmission holes may further extended to the gate
insulating layer.
[0016] A manufacturing method of a transflective liquid crystal
display device comprises the steps of forming a gate line and a
data line defining a pixel region by crossing each other on the
first substrate; forming a thin film transistor connected to the
gate line and the data line; forming a passivation layer covering
the thin film transistor and having a first transmission hole;
forming a reflector on the passivation layer in the pixel region
and having a second transmission hole; forming a color filter on
the reflector, forming a pixel electrode on the color filter using
transparent conductive material, the pixel electrode being
connected to the thin film transistor through a contact hole;
forming a common electrode on a second substrate using a
transparent conductive material, facing the first substrate and the
second substrate toward each other and forming a liquid crystal
layer between the pixel electrode and the common electrode. The
pixel electrode may be partially overlapped with the data line and
the reflector may be extended to cover the thin film transistor.
The manufacturing method of the transflective liquid crystal
display device may further include a step of forming a black
matrix, which corresponds to the thin film transistor, on the
second substrate. The manufacturing method of the transflective
liquid crystal display device may further include a step of forming
a buffer layer, which has a third transmission hole corresponding
to the first and second transmission holes, on the second
substrate. The step of forming the passivation layer may further
include a step of forming unevenness under the reflector. The
manufacturing method of the transflective liquid crystal display
device may further include a step of forming an insulating layer on
the passivation layer using an organic insulating material. The
step of forming the passivation layer may further include a step of
forming unevenness in a position that corresponds to the first and
second transmission holes using the same material as the
passivation layer.
[0017] It is to be understood that both the foregoing general
description and the following detailed description are exemplary
and explanatory and are intended to provide further explanation of
the invention as claimed.
BRIEF DESCRIPTION OF THE DRAWINGS
[0018] The accompanying drawings, which are included to provide a
further understanding of the present invention and are incorporated
in and constitute a part of this specification, illustrate
embodiments of the present invention and together with the
description serve to explain the principles of the invention,
wherein:
[0019] FIG. 1 is a cross-sectional view of a conventional
transflective liquid crystal display device;
[0020] FIG. 2 is a plan view of an array substrate of a
transflective liquid crystal display device according to the
present invention;
[0021] FIG. 3 is a cross-sectional view taken along line III-III of
FIG. 2;
[0022] FIG. 4 is a cross-sectional view of a transflective liquid
crystal display device according to a first embodiment of the
present invention;
[0023] FIG. 5 is a cross-sectional view of a transflective liquid
crystal display device according to a second embodiment of the
present invention;
[0024] FIG. 6 is a cross-sectional view of a transflective liquid
crystal display device according to a third embodiment of the
present invention;
[0025] FIG. 7 is a cross-sectional view of a transflective liquid
crystal display device according to a fourth embodiment of the
present invention; and
[0026] FIG. 8 is a cross-sectional view of a transflective liquid
crystal display device according to a fifth embodiment of the
present invention.
DETAILED DESCRIPTION OF THE ILLUSTRATED EMBODIMENTS
[0027] Reference will now be made in detail to the illustrated
embodiment of the present invention, which is shown in the
accompanying drawings.
[0028] FIG. 2 is a plan view of an array substrate of a
transflective liquid crystal display device according to the
present invention and FIG. 3 is a cross-sectional view taken along
line III-III of FIG. 2. An area of a first substrate 110 is divided
into a transmission portion and a reflection portion. As shown in
FIG. 2 and FIG. 3, a horizontal gate line 121 and a gate electrode
122 that extends from the gate line 121 are formed on a transparent
insulating substrate 110 such as glass using conductive material
such as metal. A gate insulating layer 130 is formed on the gate
line 121 and the gate electrode 122 using an inorganic insulating
material such as silicon oxide (SiO.sub.2) or silicon nitride
(SiN.sub.X). An active layer 141 is formed on the gate insulating
layer 130 that extends over the gate electrode 122 using an
amorphous silicon. Ohmic contact layers 151 and 152 are formed on
the active layer 141 using doped amorphous silicon. A data line
161, a source electrode 162 and a drain electrode 163 are formed
over the ohmic contact layers 151 and 152 using transparent
conductive material such metal. The data line 161 defines a pixel
region by crossing the gate line 121, and the source electrode 162
is extended from the data line 161. The drain electrode 163 is
spaced apart from the source electrode 162. The gate electrode 122,
the source electrode 162 and the drain electrode 163 consist of a
thin film transistor. A passivation layer 170 is formed on the data
line 161, the source electrode 162 and the drain electrode 163
using an insulating material. Though the passivation layer may be
formed of inorganic insulating material such as silicon oxide
(SiO.sub.2) or silicon nitride (SiN.sub.X), it is preferable, for
example, to use an organic insulating material such as
benzocyclobutene (BCB) or a photosensitive acrylic resin as the
passivation layer 170. A first contact hole 171, which exposes the
drain electrode 163 to the air, and a first transmission hole 172,
which corresponds to the transmission portion, are formed through
the passivation layer 170. The first transmission hole 172 is
provided for making a difference between the cell gap of the
reflection portion and the cell gap of the transmission portion to
equalize the luminance of the reflection portion and the luminance
of the transmission portion. The first transmission hole 172 may be
formed through the gate insulating layer 130 as shown in FIG.
3.
[0029] A reflector 181 is formed on the passivation layer 170 in
the pixel region. The reflector 181 has a second transmission hole
182 corresponding to the first transmission hole 172 and an opening
183 over the first contact hole 171. The reflector 181 is partially
overlapped with the data line 161 with the passivation layer 170
being disposed between the data line 161 and the reflector 181. The
reflector 181 may be formed of a conductive material such as
aluminum (Al) or an aluminum alloy, which reflects light well, or
any other material which reflects light effectively. A color filter
191 is formed on the reflector 181. The color filter 191 consists
of sub-color-filters red (R), green (G), and blue (B) and each of
the sub-color filters corresponds to each of the pixel regions. The
color filter 191 has a hollow portion in the transmission portion
due to a step of the first and second transmission holes, and
because the color filter 191 is formed of a photoresist resin, the
thickness of the transmission potion may be thicker than the
thickness of the reflection potion. The color filter 191 has a
second contact hole 192, which is connected to the first contact
hole 171, over the first contact hole 171. The color filter 191
displays colors and also serves as an insulating layer. A pixel
electrode 200 is formed on the color filter 191 using a transparent
conductive material such as indium tin oxide (ITO) or indium zinc
oxide (IZO). The pixel electrode 200 contacts the drain electrode
163 through the first and second contact holes 171 and 192. The
pixel electrode 200 is partially overlapped with the data line 161.
Because the color filter 191 serves as an insulating layer, bad
influences due to a parasitic capacitance is not generated, even
when the pixel electrode 200 is overlapped with the data line 161.
Accordingly, the pixel electrode 200 can be formed to be wider than
that of the related art. Because the color filter 191 is formed on
the first substrate in the present invention, the reflector 181
should be formed under the color filter 191.
[0030] FIG. 4 is a cross-sectional view of a transflective liquid
crystal display device according to a first embodiment of the
present invention. As shown in the figure, a second substrate 310,
which is spaced apart from the array substrate 300 and formed of
transparent insulating material, is positioned over the array
substrate. A black matrix 320 is formed under the second substrate
310. The black matrix 320 is formed only in the region
corresponding to the thin film transistor and the first and the
second contact holes 171 and 192. The black matrix 320 prevents
photoelectric current, which is caused by incident light to a
channel region of the thin film transistor, from being generated
and prevents leakage of light, which is caused by a change in the
alignment of the liquid crystal due to the step of the first and
second contact holes 171 and 192, from occurring. A common
electrode 330 is formed beneath the black matrix 320 and beneath a
whole area of the second substrate 310. The common electrode 330 is
formed of transparent conductive material. An alignment film (not
shown) is formed on the pixel electrode 200 and beneath the common
electrode 330 respectively and a liquid crystal layer 350 is
injected between the pixel electrode 200 and the common electrode
330. As shown in the figure, the reflector 181 extends over the
thin film transistor "T" in the present invention. Accordingly,
because the reflector 181 prevents the light from reaching the
channel region of the thin film transistor "T", the black matrix
320 of the second substrate 310 may be omitted. Because the color
filter 191 is formed on the first substrate 110, a misalignment
between the color filter and the pixel electrode does not occur
when assembling the first substrate 110 and the second substrate
310. Accordingly, because the area of the black matrix 320 of the
second substrate 310 can be reduced or omitted, the aperture ratio
of the liquid crystal display device can be improved. In addition,
because the color filter 191 serves as the insulating layer and
thus the pixel electrode 200 can be overlapped with the data line
161, the aperture ratio of the liquid crystal display device can
further be improved.
[0031] FIG. 5 is a cross-sectional view of a transfective liquid
crystal display device according to a second embodiment of the
present invention. Because the second embodiment of the present
invention has substantially the same structure as the first
embodiment of the present invention except for an upper substrate,
a description of equivalent structure will be omitted. As shown in
the figure, the color filter 191 is formed on the first substrate
and a buffer layer 340 and a common electrode 330 is sequentially
formed under the second substrate 310. The buffer layer 340 is for
establishing a cell gap difference between the transmission portion
and the reflection portion. That is, because the buffer layer 340
has a third transmission hole 341 corresponding to the transmission
portion, the cell gap of the transmission portion is thicker than
the cell gap of the reflection portion. It is preferable to form
the cell gap of the transmission portion to be twice of the cell
gap of the reflection portion and thus the luminance of the
reflection portion and the luminance of the transmission portion
can be equalized in a transflective liquid crystal display device
that is driven in a normally white mode.
[0032] FIG. 6 is a cross-sectional view of a transflective liquid
crystal display device according to a third embodiment of the
present invention. Because the structure of the third embodiment of
the present invention is substantially the same as that of the
second embodiment except for the passivation layer part, a
description on the equivalent structure will be omitted. As shown
in the figure, unevenness 175 is formed in the passivation layer
170 of the reflection portion. The unevenness 175 is formed to the
gate insulating layer 130 in the figure and it may be formed only
in the passivation layer 170. Whereas the light of a reflection
mode passes through the color filter 191 twice, light of a
transmission mode passes through the color filter 191 only once.
Accordingly, a color purity difference between the reflection mode
and the transmission mode may occur due to a different degree of
coloring. The height of the color filter 191 in the reflection
portion is lowered as compared with that of the second embodiment
of the present invention because of a hollow portion of the
unevenness 175 in the passivation layer 170 of the reflection
portion. Accordingly, because the thickness of the color filter 191
in the reflection portion can be reduced as a result, the color
purity difference between the transmission portion and the
reflection portion can be reduced. Because the thickness of the
color filter 191 is controlled by the pattern of the passivation
layer 170 to reduce the color purity difference, an additional
process is not needed in the present invention.
[0033] FIG. 7 is a cross-sectional view of a transflective liquid
crystal display device according to a fourth embodiment of the
present invention. The fourth embodiment of the present invention
is directed to a transflective liquid crystal display device in
which the color purity difference is reduced and simultaneously the
luminance is increased. As shown in FIG. 6, if the unevenness 175
does not have a proper curved surface when it is formed by
patterning the passivation layer 170, the direction of the
reflected light is changed and thus the reflected light does not
come into sight which may result in a decrease of the luminance. In
FIG. 7, an insulating layer 250 is further formed on the
passivation layer 170 of the reflection portion where the
unevenness 175 is formed, using an organic insulating material such
as for example, benzocyclobutene (BCB) or a photosensitive acrylic
resin. Because the insulating layer 250 is formed by depositing the
fluid organic insulating material and hardening it by heating, the
unevenness 175 can develop a proper curved surface. The curved
surface increases the amount of the reflected light that comes into
sight and thus the luminance of the liquid crystal display device
is increased. At this time, the organic insulating material, which
is used for the insulating layer 250, is formed using a method such
as spin coating and the curved surface of the unevenness can be
controlled by varying the speed of revolution of a spin coater or
the viscosity of the organic insulating material.
[0034] FIG. 8 is a cross-sectional view of a transflective liquid
crystal display device according to a fifth embodiment of the
present invention. As shown in the figure, a passivation layer 170
has an unevenness 176 formed in the transmission portion and the
top surface of the color filter in the reflection portion and a top
surface of the color filter in the transmission portion are formed
to be flat. At this time, a convex pattern of the unevenness 176 of
the passivation layer 170 formed small and a distance between the
convex patterns is formed to be wide, so that most of the color
filter thickness in the transmission portion becomes thicker than
the color filter thickness in the reflection portion. Accordingly,
the color purity difference between the transmission portion and
the reflection portion can be decreased. Because the top surface of
the array substrate is formed to be flat in the pixel region, it is
desirable to obtain an uniform luminance by controlling the cell
gap of the transmission portion and the cell gap of the reflection
portion by forming the buffer layer 340 on the second substrate 310
and forming the third transmission hole 341 which corresponds to
the transmission portion.
[0035] As it has been described hereinbefore, the aperture ratio is
improved, the luminance of the transmission mode and the luminance
of the reflection mode are controlled to be uniform and the color
purity difference between the transmission mode and the reflection
mode can be decreased without an additional process. In addition,
because the color filter 191 is formed on the first substrate,
i.e., the lower substrate, the leakage of light, which is caused by
the misalignment between the first substrate 110 and the second
substrate 310, does not occur and thus the contrast ratio can be
increased.
[0036] It will be apparent to those skilled in the art that various
modifications and variations can be in the fabrication and
application of the present invention without departing from the
spirit or scope of the invention. Thus, it is intended that the
present invention cover the modifications and variations of the
present invention provided that they come within the scope of the
appended claims and their equivalents.
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