U.S. patent application number 09/731055 was filed with the patent office on 2002-04-11 for apparatus for sputter-coating glass and corresponding method.
Invention is credited to Lemmer, Jean-Marc, Schloremberg, Marcel.
Application Number | 20020040846 09/731055 |
Document ID | / |
Family ID | 24752760 |
Filed Date | 2002-04-11 |
United States Patent
Application |
20020040846 |
Kind Code |
A1 |
Schloremberg, Marcel ; et
al. |
April 11, 2002 |
APPARATUS FOR SPUTTER-COATING GLASS AND CORRESPONDING METHOD
Abstract
A sputter coating apparatus includes at least a first sputter
coating line and a second sputter coating line. The first and
second sputter coating lines may be operated in parallel with one
another in certain embodiments in order to independently form
coating systems and respective coated articles. However, the two
coating lines may also be utilized so as to operate in series with
one another to form a coated article. In the latter case, a
transition zone is provided between an end of the first line and an
end of the second line so as to selectively couple an output of the
first line to an input of the second line when it is desired to
utilize the two sputter coating lines in series with one another.
In such a manner, it is possible to avoid many of the
inefficiencies associated with conventional sputter coating
apparatuses and processes.
Inventors: |
Schloremberg, Marcel;
(Habay-la-Neuve, BE) ; Lemmer, Jean-Marc;
(Luxembourg, LU) |
Correspondence
Address: |
NIXON & VANDERHYE P.C.
1100 North Glebe Road, 8th Floor
Arlington
VA
22201-4714
US
|
Family ID: |
24752760 |
Appl. No.: |
09/731055 |
Filed: |
December 7, 2000 |
Related U.S. Patent Documents
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Application
Number |
Filing Date |
Patent Number |
|
|
09731055 |
Dec 7, 2000 |
|
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09685568 |
Oct 11, 2000 |
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Current U.S.
Class: |
204/192.12 ;
204/192.13; 204/192.26; 204/298.23; 204/298.25 |
Current CPC
Class: |
C23C 14/568 20130101;
C03C 17/3649 20130101; C03C 17/3626 20130101; C03C 17/3618
20130101; C03C 17/3652 20130101; C03C 17/3639 20130101; C03C 17/36
20130101; C03C 17/002 20130101 |
Class at
Publication: |
204/192.12 ;
204/192.13; 204/192.26; 204/298.25; 204/298.23 |
International
Class: |
C23C 014/32 |
Claims
What is claimed is:
1. A sputter coating apparatus comprising: a first sputter coating
line including a plurality of zones and a plurality of targets; a
second sputter coating line including a plurality of zones and a
plurality of targets; and a transition chamber or zone including
first and second gates or valves which may be selectively opened,
said transition chamber being selectively coupleable to the first
sputter coating line and the second sputter coating line, said
transition chamber selectively coupling the first and second
sputter coating lines to one another so that when not coupled to
one another the first and second lines can run in parallel with one
another and when coupled to one another by the transition chamber
the first and second lines run in series with one another.
2. The sputter coating apparatus of claim 1, wherein said
transition chamber is maintained at a pressure less than
atmospheric pressure.
3. The sputter coating apparatus of claim 2, wherein said
transition chamber is maintained at a pressure of from about 1.0 to
3.0.times.10.sup.-3 Torr.
4. The sputter coating apparatus of claim 1, wherein said second
sputter coating line is reversible so that a first end of said
second sputter coating line is an output end of said second sputter
coating line when the first and second sputter coating lines are
running in parallel to one another and said first end of said
second sputter coating line is an input end of said second sputter
coating line when said first and second sputter coating lines are
running in series with one another.
5. The sputter coating apparatus of claim 1, wherein said
transition chamber comprises a conveyor that may be selectively
moves between first and second positions depending upon whether
said first and second sputter coating lines are running in parallel
or in series with one another.
6. A method of sputter coating a glass substrate, the method
comprising: providing the glass substrate; causing the glass
substrate to pass through a first sputter coating line including a
plurality of zones and a plurality of targets so that at least
first and second layers are sputtered onto the first substrate in
the first sputter coating line; upon the glass substrate exiting
the first sputter coating line, forwarding the glass substrate to a
second sputter coating line including a plurality of zones and a
plurality of targets; and causing the glass substrate to pass
through the second sputter coating line so that at least third and
fourth layers are sputtered onto the first substrate over the first
and second layers in the second sputter coating line.
7. A method of operating a sputter coating apparatus, the method
comprising: providing first and second sputter coating lines
selectively coupleable to one another; causing a substrate to pass
through the first sputter coating line so that at least first and
second layers are sputtered onto the substrate in the first sputter
coating line; determining whether additional layer(s) is/are to be
sputtered onto the substrate; based upon a result of said
determining step, determining whether to forward the substrate to
the second sputter coating line or to an apparatus exit area.
Description
[0001] This is a continuation-in-part (CIP) application of U.S.
Ser. No. 09/685,568, filed Oct. 11, 2000, the disclosure of which
is hereby incorporated herein by reference.
BACKGROUND AND SUMMARY OF THE INVENTION
[0002] Sputter coated glass articles are known in the art. For
example, see U.S. Pat. Nos. 5,770,321, 5,298,048, and 5,403,458,
the disclosures of which are all hereby incorporated herein by
reference. Sputter coated layer systems on glass substrates are
typically utilized for achieving solar management properties (e.g.,
low emissivity or low-E) in many types of glass articles, including
but not limited to architectural windows, automotive windows,
automotive windshields, and the like.
[0003] Sputter coating may be an electric discharge process, often
conducted in a vacuum chamber in the presence of one or more gases.
A sputter coating apparatus typically includes at least one vacuum
chamber in which a substrate is located, a power source, an anode,
and one or more specially prepared cathode targets of or covered
with a material to be used in creating a layer on the substrate.
When an electric potential is applied to the cathode target, the
gas(es) forms a plasma that bombards the target causing particles
of the coating material to be liberated or lifted from the target
itself. The liberated coating material from the target falls onto
the underlying substrate and adheres thereto. When conducted in the
presence of a "reactive" gas, a reactive product of the coating
material from the target and the gas may be deposited on the
substrate.
[0004] Unfortunately, conventional sputter coating apparatuses
suffer from certain inefficiencies, especially when one desires or
needs to manufacture different types of sputter coated articles
using the same sputter coating apparatus.
[0005] Consider, for purposes of examples only, a scenario where
one wishes to manufacture the coated articles of FIGS. 1 and 2
utilizing a sputter coating apparatus. The coated article of FIG. 1
includes glass substrate 1 on which are located silicon nitride
(Si.sub.3N.sub.4) layer 2, nichrome or nichrox (NiCr or
NiCrO.sub.x) layer 3, silver (Ag) layer 4, nichrome or nichrox
(NiCr or NiCrO.sub.x) layer 5, and silicon nitride
(Si.sub.3N.sub.4) layer 6. Optionally, another layer (e.g., a
dielectric layer) may also be provided between substrate 1 and
layer 2. Further details regarding the coated article of FIG. 1 may
be found in U.S. Pat. No. 5,770,321, incorporated herein by
reference. Meanwhile, the coated article of FIG. 2 also includes
layers 2-6 provided on glass substrate 1. However, the coated
article of FIG. 2 further includes a thicker silicon nitride
(Si.sub.3N.sub.4) layer 6a (instead of layer 6 shown in FIG. 1),
nichrome or nichrox (NiCr or NiCrO.sub.x) layer 7, second silver
(Ag) layer 8, nichrome or nichrox (NiCr or NiCrO.sub.x) layer 9,
and silicon nitride (Si.sub.3N.sub.4) layer 10. The coating system
of FIG. 2 may be referred to as a dual silver coating system
because it includes first and second silver (Ag) layers 4 and 8
provided for infrared (IR) radiation reflection, respectively, as
opposed to the single silver layer 4 provided in the coated article
of FIG. 1.
[0006] To manufacture both the coated article of FIG. 1 and the
coated article of FIG. 2 using the same sputter coating apparatus,
one would typically obtain a sputter coating apparatus as shown in
FIG. 3. The FIG. 3 sputter coating apparatus includes enough
targets and zones to enable each of layers 2-10 to be deposited on
a substrate 1 (i.e., it is large enough and has enough capacity to
enable either the FIG. 1 or the FIG. 2 article to be made therein).
In particular, the sputter coating apparatus includes six different
zones (i.e., zones 1-6) which are separated from one another by
curtains or walls 52. Zone 1 includes targets 21-26. Zone 2
includes targets 27-29. Zone 3 includes targets 30-35. Zone 4
includes targets 36-41. Zone 5 includes targets 42-44. Zone 6
includes targets 46-50. A different gas (e.g., argon, nitrogen,
oxygen, etc.) may be utilized in each zone at low pressure, while
vacuum pumps 51 are provided between zones in order to keep gaseous
atmospheres from one zone from significantly leaking into an
contaminating adjacent zone(s).
[0007] In order to manufacture the coated article of FIG. 1 using
the sputter coating apparatus of FIG. 3, a typical line speed of
the sputter coater is 205 inches per minute for this five layer
system. For the FIG. 1 coating system to be deposited, targets
21-26 in zone 1 are silicon (Si) targets, while nitrogen gas at low
pressure is provided in that zone. Following deposition of silicon
nitride layer 2 in zone 1 using targets 21-26, the substrate 1
passes into zone 2 via a conveyor. In zone 2, targets 27 and 29 are
of nickel and/or chrome, while target 28 is of silver. An argon
(Ar) atmosphere may be utilized in zone 2. After the nichrome
layers 3 and 5 and silver layer 4 are deposited in zone 2, a
conveyor moves the substrate into zone 3 beneath targets 30-35. In
zone 3, targets 30-35 are of silicon (Si) while a nitrogen
(N.sub.2) gas at low pressure is utilized in that zone. Each of
zones 1-3 may be maintained at a pressure of from about 1.0 to
3.0.times.10.sup.-3 Torr, or any other pressure disclosed in any of
the aforesaid '321, '048 and '458 patents. Upon leaving zone 3, the
coating system of FIG. 1 will have been formed. Thus, zones 4-6 and
their respective targets 36-50 are inoperative in the FIG. 3
apparatus when the coated article of FIG. 1 is deposited as
discussed above. Unfortunately, the inoperation of these three
zones 4-6 is wasteful, and also presents a requirement for passing
a coated article through inoperative zones thereby leading to
potential contamination and/or undesirable delay.
[0008] However, when it is desired to manufacture the coated
article of FIG. 2 utilizing the apparatus of FIG. 3, zones 1-3 are
set up and utilized as described above regarding the FIG. 1
article. In addition, zones 4-6 are set up just like zones 1-3,
respectively. Thus, the upper half of silicon nitride layer 6a and
layers 7-10 are deposited in zones 4-6. In other words, targets
36-41 are silicon targets in a nitrogen atmosphere of zone 4,
targets 42 and 44 are nickel and/or chrome targets in an argon
atmosphere in zone 5, target 43 is a silver target in the same
argon atmosphere of zone 5, and targets 45-50 are silicon targets
in a nitrogen atmosphere of zone 6. Thus, all six zones (i.e.,
zones 1-6) are utilized when forming the layer system of the FIG. 2
coated article.
[0009] Unfortunately, as can be seen from the above, it is often
desired to manufacture coated articles of different types such as
those of FIGS. 1 and 2. If this is to be done utilizing the same
sputter coating apparatus, such an apparatus must be obtained which
has enough zones and targets to enable the coating system having
the largest number of layers to be manufactured. Thus, one desiring
to manufacture the articles of both FIG. 1 and FIG. 2 would have to
purchase a sputter coating apparatus such as that shown in FIG. 3
having sufficient zones and targets to accommodate the FIG. 2
article. Unfortunately, many of these zones and targets are wasted
and not utilized when only the article of FIG. 1 is manufactured
(i.e., certain zones and/or targets would likely be inoperative
during manufacture of the FIG. 1 article). In other words, a
significant portion of the coating apparatus may not be used when
certain coated articles having a small number of layer(s) are being
manufactured. Yet another problem is that when it is desired to
upgrade a particular sputter coating apparatus, the line (i.e., all
zones 1-6) must be shut down.
[0010] In view of the above, it will be appreciated by those
skilled in the art that there exist a need for a sputter coating
apparatus which can more efficiently manufacture sputter coated
articles of different types without wasting significant resources
(e.g., zones and/or targets). There also exists a need in the art
for a corresponding method.
[0011] It is a purpose of different embodiments of this invention
to fulfill any and/or all of the above described needs in the art,
and/or other needs which will become apparent to the skilled
artisan once given the following disclosure.
[0012] An object of this invention is to provide a sputter coating
apparatus capable of more efficiently depositing different types of
sputter coated layer systems.
[0013] Another object of this invention is to provide a sputter
coating apparatus including first and second sputter coating lines
that are selectively coupleable to one another via a transition
zone. Each of the first and second sputter coating lines may be
independently utilized to deposit particular coating systems on a
substrate. However, when it is desired to deposit a coating system
having more than a predetermined number of layers (e.g., a layer
system having more layers than either of the lines is capable for
depositing), the transition zone couples the two lines together
thereby enabling an incompleted sputter coated article leaving the
first sputter coating line to be routed to the second sputter
coating line so that additional layer(s) may be sputter coated
thereon. Thus, the two sputter coating lines may be used either
independently (e.g., run in parallel to one another), or
alternatively may be used in conjunction with one another (e.g.,
run in series with one another).
[0014] Yet another object of this invention is to fulfill any
and/or all of the aforesaid objects and/or needs.
[0015] Generally speaking, certain embodiments of this invention
fulfill one or more of the above-listed needs and/or objects by
providing a sputter coating apparatus comprising:
[0016] a first sputter coating line including a plurality of zones
and a plurality of targets;
[0017] a second sputter coating line including a plurality of zones
and a plurality of targets; and
[0018] a transition zone coupled to the first sputter coating line
and the second sputter coating line, said transition zone
selectively coupling the first and second sputter coating lines to
one another so that when not coupled to one another the first and
second lines can run in parallel with one another and when coupled
to one another by the transition zone the first and second lines
run in series with one another.
[0019] Certain other embodiments of this invention fulfill one or
more of the above-listed needs and/or objects by providing a method
of sputter coating a glass substrate, the method comprising the
steps of:
[0020] providing the glass substrate;
[0021] causing the glass substrate to pass through a first sputter
coating line including a plurality of zones and a plurality of
targets so that at least first and second layers are sputtered onto
the first substrate in the first sputter coating line;
[0022] determining whether it is desired to provide additional
layers on the glass substrate, and if so then upon the glass
substrate exiting the first sputter coating line causing the glass
substrate to be forwarded to a second sputter coating line
including a plurality of zones and a plurality of targets; and
[0023] causing the glass substrate to pass through the second
sputter coating line so that at least third and fourth layers are
sputtered onto the first substrate over the first and second layers
in the second sputter coating line.
IN THE DRAWINGS
[0024] FIG. 1 is sectional view of a conventional sputter coated
article.
[0025] FIG. 2 is a sectional view of another sputter coated
article.
[0026] FIG. 3 is a schematic diagram of a conventional sputter
coating apparatus.
[0027] FIG. 4 is a schematic functional diagram of a sputter
coating apparatus according to an embodiment of this invention, the
sputter coating apparatus including two sputter coating lines
capable of running in parallel with one another or alternatively in
series with one another.
[0028] FIG. 5 is a schematic functional diagram of either the
sputter coating line "A" and/or the sputter coating line "B" of
FIG. 4.
[0029] FIG. 6 is a schematic functional diagram of the adjustable
transition zone of the FIG. 4 sputter coating apparatus.
[0030] FIG. 7 is a flowchart illustrating certain steps taken
during the course of carrying out a particular embodiment of this
invention.
[0031] FIG. 8 is a schematic functional diagram of a transition
zone for selectively coupling ends of first and second sputter
coating lines according to another embodiment of this
invention.
[0032] FIG. 9 is a schematic functional diagram of an apparatus
according to another embodiment of this invention.
DETAILED DESCRIPTIONS OF CERTAIN EMBODIMENTS OF THIS INVENTION
[0033] Referring now more particularly to the accompanying drawings
in which like reference numerals indicate like parts throughout the
several views.
[0034] FIG. 4 is a schematic functional diagram of a sputter
coating apparatus according to an embodiment of this invention. The
sputter coating apparatus of FIG. 4 includes a first sputter
coating line 58, a second sputter coater line 59, and adjustable
transition zone 60 coupling respective ends of the two sputter
coating lines. FIG. 5 is a schematic functional diagram of both the
first sputter coater line 58 and the second sputter coater line 59
of FIG. 4. As can be seen, each of the lines 58 and 59 have three
zones (zones 1-3) in this exemplary embodiment and include targets
21-35. Transition zone 60 is provided at the end of each sputter
coating line 58, 59 so as to enable the lines to be selectively
coupled to one another when desired. In other words, the two
sputter coating lines 58, 59 may be used independently from one
another so as to operate in parallel to one another when each line
is depositing an entire coating system on a substrate independent
of the other line. Alternatively, when it is desired to form a
larger coating system having more layers than one of lines 58, 59
is capable of depositing on a substrate, then transition zone is
capable of coupling lines 58 and 59 to one another so that the
lines operate in series with one another in forming the larger
coating system on the substrate.
[0035] Referring to FIG. 4-5, exemplary uses of this embodiment are
described as follows. Consider a situation where one desires to
manufacture significant quantities of sputter coated articles as
shown in FIG. 1. In such a case, each of sputter coating lines 58
and 59 is set up so that targets 21-26 are silicon (Si) targets in
a nitrogen atmosphere of zone 1, targets 27 and 29 are nickel
and/or nickel-chrome targets in an argon (Ar) atmosphere of zone 2,
target 28 is a silver (Ag) target in the argon atmosphere of zone
2, and targets 30-35 are silicon (Si) targets in a nitrogen
atmosphere of zone 3. Thus, in each coating line 58, 59, zones 1
and 3 deposit the respective silicon nitrides layer 2 and 6, while
layers 3-5 are deposited in zone 2. In other words, coating line 58
functions to form the layer system of the FIG. 1 coated article, as
does coating line 59. The two lines may work on parallel with one
another in an independent manner. When operating in parallel with
one another, lines 61 and 62 in FIG. 4 illustrate respective paths
of substrates being coated as they pass through the respective
sputter coating lines and transition zone 60, so that FIG. 1 coated
articles formed in each of lines 58 and 59 exit transition zone 60
as illustrated.
[0036] Accordingly, it can be seen that the sputter coating
apparatus of FIGS. 4-5 enables coated articles as shown in FIG. 1
to be manufactured without the requirement for a significant number
of inoperative zones and/or chambers. In other words, significant
or substantial portions of both sputter coating line 58 and sputter
coating line 59 are in operation at all times during the
manufacture of FIG. 1 coated articles. Significant resources are
not being wasted. Alternatively, in other embodiments of this
invention it is possible to run sputter coating lines 58 and 59 in
parallel with one another while line 58 is forming a first type of
layer system (e.g., Si.sub.3N.sub.4/NiCr/Ag/NiCr/Si.sub.3N.sub.4)
and line 59 is forming a second type of layer system (e.g.,
SnO/Ag/SnO) on respective substrates 1.
[0037] However, consider the scenario where one desires to utilize
the FIG. 4-5 sputter coating apparatus to manufacture coated
articles as shown in FIG. 2 (e.g., a dual silver layer system). In
such a case, the first sputter coating line 58 is set up to deposit
layers 2-5 and a lower portion of layer 6a on substrate 1. Upon
leaving the first sputter coating line 58, the incomplete coated
article enters transition zone 60 which directs the incomplete
coated article to an end of the second sputter coating line 59 as
shown by dotted line 63 in FIG. 4. Reversible sputter coating line
59 is set up so as to deposit the remainder of layers 6a as well as
layers 7-10 on substrate 1. The resulting FIG. 2 coated article
exits the second coating line 59 at the other end 67 thereof as
shown in FIG. 4. Thus, the two coating lines 58 and 59 work in
series with one another as a first portion of the coating system is
deposited by sputter coating line 58 and a second subsequent
portion of the coating system is deposited by sputter coating line
59. Adjustable transition zone 60 selectively couples the output
end of first coating line 58 to an input/output end of coating line
59. Thus, layer 2 is deposited in zone 1 of line 58, layers 3-5 in
zone 2 of line 58, the first half of layer 6a in zone 3 of line 58,
the second half of layer 6a in zone 3 of line 59, layers 7-9 in
zone 2 of line 59, and layer 10 in zone 1 of sputter coating line
59 (e.g., zones 1-3 of line 58 may be set up in the same manner as
zone 1-3 of line 59 so that the incomplete coated article exiting
line 58 may enter the second sputter coating line 59 from either
end thereof as a function of convenience).
[0038] As can be seen by the different substrate paths illustrated
by reference numerals 62 and 63 in FIG. 4, sputter coating line 59
is reversible in that substrates may pass therethrough in either
direction depending upon the functionality of transition zone 60
(i.e., whether transition zone 60 is causing coated articles
exiting lines 58, 59 to pass straight through as shown by reference
numerals 61 and 62 to exit the overall coating apparatus, or
whether transition zone 60 is directing incomplete coated articles
exiting coating line 58 to an input of coating line 59 as shown by
reference numeral 63).
[0039] FIG. 6 is a functional top view diagram of transition zone
60 which selectively couples respective ends of sputter coating
lines 58 and 59 according to the FIG. 4-5 embodiment of this
invention. As can be seen, transition zone 60 includes conveyor 70
coupled to an output end of sputter coating line 58, rotatable
conveyor platform 71 including conveyor 75 which may be selectively
deployable in different positions, conveyor 72 provided between a
potential output of conveyor 75 and conveyor 74, conveyor 73
provided between another potential output of conveyor 75 and an
output of the overall sputter coating apparatus, and reversible
conveyor 74 provided at an input/output of sputter coating line 59.
End 83 of line 59 can function as an output end when lines 58 and
59 are operating in parallel with one another, and as an input end
of line 59 when lines 58 and 59 are operating in series with one
another. Platform 71 and conveyor 75 thereon are selectively
deployable in different positions in order to selectively couple
output end 81 of sputter coating line 58 to an input/output 83 end
of sputter coating line 59 when desired.
[0040] When sputter coating lines 58 and 59 are not coupled
together by transition zone 60, platform 71 and conveyor 75 are in
the position illustrated in FIG. 6 by solid lines so that lines 58
and 59 are operating in parallel with one another. In this case,
for example, FIG. 1 coated articles may be exiting sputter coating
line 58 at output 81 and are being conveyed to the overall output
of the apparatus by conveyor 70 which dumps articles onto conveyor
75 which dumps them onto conveyor 73. Likewise, FIG. 1 coated
articles may simultaneously be exiting output 83 of sputter coating
line 59, and being forwarded to the output of the overall apparatus
by conveyor 74 as shown by the solid lines illustrated in conveyor
74.
[0041] When it is desired make a larger coating system (e.g., the
layer system of FIG. 2) on a substrate having more layers than
either of lines 58, 59 is capable of forming, then the direction of
conveyor 74 may be reversed and platform 71 may be rotated 85 in
order to selectively couple output 81 of sputter coating line 58 to
an input end 83 of sputter coating line 59. See FIG. 6 in this
regard. Rotation 85 moves conveyor 75 from the solid line position
to the dotted line position shown in FIG. 6. Accordingly, an
incomplete coated article exits coating line 58 at 81 onto conveyor
70 (e.g., when making the FIG. 2 layer system, the coated article
at this point may include layers 2-5 and half of layer 6a on
substrate 1). The incomplete article is dumped onto conveyor 75 by
conveyor 70. Once on conveyor 75, platform 71 rotates 85 until
conveyor 75 is in the position illustrated in dotted lines in FIG.
6. Conveyor 75 then dumps the incomplete article onto conveyor 72,
which in turn dumps the incomplete coated article onto conveyor 74
which is traveling in direction 86 (i.e., its reverse direction).
Conveyor 74 then conveys the incomplete coated article to input 83
of coating line 59 so that the additional layer(s) can be sputter
coated thereon (e.g., the rest of layer 6a and layers 7-10 may be
deposited on substrate 1 in line 59).
[0042] Once an incomplete coated article exiting line 58 has been
forwarded to conveyor 72 by conveyor 75, platform 71 may rotate
back to the solid line position shown in FIG. 6 in order to accept
another complete or incomplete coated article from output 81 of
coating line 59. Whether or not additional layer(s) are to be
deposited on newly received article(s) determines whether or not
platform 71 causes an article received thereon to be forwarded to
conveyor 72 or conveyor 73. Likewise, the direction of conveyor 74
is determined by whether or not end 83 of coating line 59 is
functioning as an output or an input (end 83 functions as an input
when receiving incomplete coated articles from conveyor 72 and
platform 71).
[0043] FIG. 7 is a flowchart illustrating certain steps carried out
and in accordance with an embodiment of this invention. Referring
to FIGS. 4-7, and especially FIG. 7, a substrate 1 (e.g.,
soda-lime-silica glass substrate) is first provided (step 90).
Substrate 1 is then conveyed through a first sputter coating line
58 so that a plurality of layer(s) can be deposited thereon (step
91) (e.g., layers 2-6 of FIG. 1, or layers 2-6a of FIG. 2). The
coated article including a plurality of sputter coated layers on
substrate 1 then exits the first sputter coating line 58 and enters
transition zone 60 (step 92). A determination is then made by
controller 101 as to whether or not the desired layer system has
been completed or whether additional layers need to be
sputter-coated thereon (step 93). This determination by controller
101 may be based upon input from a keyboard, or any other suitable
means such as a programmed listing of articles to be made by the
system. If it is determined that the layering system has been
completed and no additional layers need be sputtered thereon, then
the sputter coated article exits the transition zone (step 94) and
the overall sputter coating apparatus (step 95) when conveyor 75 is
in the position shown in FIG. 6 by solid lines. However, when
controller 101 (which may access and utilize programs stored in
memory 103) determines in step 93 that the layering system is
incomplete and requires additional layer(s), then controller 101
causes motor 105 to rotate platform/disk 71 so as to move conveyor
75 and the coated article thereon to the position 90 shown in
dotted lines in FIG. 6. Then, the coated article is conveyed to end
83 of sputter coating line 59 via conveyor 72 and conveyor 74 (step
96). The coated article enters sputter coating line 59 so that
additional layers (e.g., the remainder of layer 6a and layers 7-10)
can be sputtered thereon (step 97). After passing through sputter
coating line 59, the article exits the coating apparatus/system at
67 (step 95).
[0044] It is noted that transition zone 60 is preferably maintained
in a given atmosphere (e.g., argon atmosphere) at a low pressure
similar to the pressures in zones 1-3 (e.g., from about 1.0 to
3.0.times.10.sup.-3 Torr) according to certain embodiments of this
invention, so as to reduce the potential for contamination of
coated articles when traveling between coating lines 58 and 59.
[0045] FIG. 8 is a functional schematic diagram of a transition
zone for selectively coupling sputter coating line 58 and sputter
coating line 59 according to another embodiment of this invention.
This embodiment is similar to that of FIGS. 4-6, except that the
two lines 58 and 59 are staggered relative to one another so that
second line 59 need not have a reversible conveyor. In other words,
in the FIG. 8 embodiment end 83 of second sputter coating line 59
is an input end of line 59 regardless of whether lines 58 and 59
are operating in parallel or in series.
[0046] An exemplary operation of the FIG. 8 embodiment is as
follows. A substrate 1 is fed into and passes through first sputter
coating line 58 including targets 21-35 (see FIG. 5) so that layer
2 is deposited in zone 1, layers 3-5 in zone 2, and layer 6 or half
of layer 6a in zone 3. The article including these layers exits the
first sputter coating line 58 via conveyor 70. The article is fed
onto conveyor 75. It is determined (either at this time or in
advance) whether additional layer(s) have to be deposited onto the
article. If not, then platform 71 remains in the position shown in
FIG. 8 and conveyor 75 forwards the article with complete layering
system thereon to conveyor 73 which takes the coated article out of
transition zone 60 and out of the overall sputter coating
apparatus. However, if it is desired to provide additional layer(s)
on the article, then platform 71 rotates as discussed above until
conveyor 75 is in position 90 shown in dotted lines in FIG. 8. This
enables conveyor 75 to forward the article to conveyor 92 which
need not be reversible in all embodiments. Once on conveyor 92, the
article enters second sputter coating line 59 including zones 1-3
and respective targets (e.g., see FIG. 5). In second line 59, the
remainder of layer 6a is sputtered on in zone 1, layers 7-9 are
sputtered on in zone 2, and layer 10 is sputtered on in zone 3 of
line 59. Alternatively, lines 58 and 59 may operate in parallel
with one another so that each can form the layering system of FIG.
1 on respective substrates 1 at the same time.
[0047] It is also noted that the coated articles of FIGS. 1 and 2
are provided for purposes of example only and are not intended to
be limiting. The sputter coating apparatus of FIGS. 4-6 and 8, and
method of FIG. 7, may be utilized to manufacture any type of
sputter coated article according to different embodiments of this
invention. Coating lines 58 and 59 may be operated in the same
direction in parallel with one another as shown by paths 61 and 62
when the two lines are not coupled to one another. However, when it
is desired to utilize both lines 58 and 59 to manufacture a single
coated article, transition zone 60 functions to selectively couple
an output end of a first line to an input end of a second line so
that the lines 58 and 59 run in series with one another. The second
line may be reversible in nature so that its input end may also
function as an output end when it is operating in series with the
first line (e.g., path 62). Moreover, the instant invention need
not be limited to sputter coating apparatuses, and may be used in
conjunction with other types of layer deposition systems.
[0048] FIG. 9 is a functional top view diagram of transition zone
or chamber 101 which selectively couples respective ends or
portions of sputter coating lines 58 and 59 according to the FIG.
4-5 embodiment of this invention. As illustrated, each coating line
includes a transfer chamber 102, a buffer chamber 103, and an exit
chamber 104. Transfer zone or chamber 101 in this embodiment is
located between the buffer chambers 103 of the two sputter coating
lines. As illustrated, transfer in chamber/zone 101 is performed by
enabling coated glass to be moved in the chamber/zone 101 in a
direction perpendicular to the line directions of lines 58, 59.
Accordingly, buffer chambers 103 also are capable of causing coated
glass to be transferred in both the (a) line directions of lines
58, 59 (i.e., the same direction the glass is transported during
sputter coating in the line), and (b) directions transverse to the
line directions of lines 58, 59. Chambers 101 and 103 may be
approximately the same size as one another.
[0049] Transition zone/chamber 101 preferably has a gate and/or
valve 105 at each end thereof, such gates/valves being selectively
openable/closeable in order to allow coated glass to enter/leave
the chamber 101 and thus be transferred from one coating line to
the other coating line.
[0050] Transition zone/chamber 101 may include a conveyor (e.g.,
reversible conveyor) coupled to the buffer chamber 103 of coating
line 58 and the buffer chamber 103 of line 59 so as to enable
coated glass to be transferred from one coating line to the other.
Controller 106, using program(s) stored in memory 107, selectively
controls gates 105 and a conveyor of the chamber 101 so as to
enable such transfers when desired.
[0051] Exit chambers 104 can function as output ends of the coating
lines when lines 58 and 59 are operating in parallel with one
another (i.e., where substrates proceed through the coating lines
along paths 110 shown in dotted lines). Thus, when sputter coating
lines 58 and 59 are not coupled together by transition zone 101,
the coating lines 58 and 59 are operating in parallel with one
another so that substrates proceeding therethrough move alongyaths
110 (dotted lines) and FIG. 1 coated articles may be formed and
caused to exit sputter coating lines 58 and 59 at exit chambers
104.
[0052] Still referring to FIG. 9, when it is desired make a larger
coating system (e.g., the layer system of FIG. 2) on a substrate
having more layers than either of lines 58, 59 is capable of
forming, then transition zone/chamber 101 may be used (including
opening of gates/valves 105) to selectively couple the buffer
chambers 103 of the respective lines 58, 59 thereby coupling
sputter coating line 58 to sputter coating line 59. Path 111 is now
used in the FIG. 9 embodiment. Accordingly, an incomplete coated
article exits coating line 58 at 81 and moves into the buffer
chamber 103 of line 58. From this buffer, the incomplete article is
caused to change directions (see path 111 in FIG. 9) and proceed
into transition zone 101 (e.g., via a conveyor) and then out of
zone 101 and into buffer 103 of the other sputter coating line 59
(e.g., when making the FIG. 2 layer system, the coated article at
this point may include layers 2-5 and half of layer 6a on substrate
1). The incomplete article is then dumped on line 59 (which is in
reverse) and enters the line at 83 so that the additional layer(s)
can be sputter coated thereon (e.g., the rest of layer 6a and
layers 7-10 may be deposited on substrate 1 in line 59). Then, what
had been an input end of line 59 becomes an output end of line 59
when FIG. 2 coated articles are made in accordance with the FIG. 9
embodiment of this invention.
[0053] Still referring to FIG. 9, FIG. 1 coated articles may be
produced using one or both lines 58, 59 for several days at a time
(or alternatively, for only several hours at a time). Then, gates
105 may be opened (manually, or automatically via controller) so
that FIG. 2 coated articles can be produced using lines 58-59 as
described above. Thus, there is no need to make a determination in
the controller after each glass sheet runs through whether the next
sheet will go to the other line or not (however, this may in fact
be done in certain embodiments).
[0054] Once given the above disclosure, many other features,
modifications, and improvements will become apparent to the skilled
artisan. Such other features, modifications, and improvements are
therefore considered to be a part of this invention, the scope of
which is to be determined by the following claims.
* * * * *