U.S. patent application number 09/965607 was filed with the patent office on 2002-01-24 for micro cantilever style contact pin structure for wafer probing.
This patent application is currently assigned to AMST Co., Ltd.. Invention is credited to Ahn, Young Kyum, Chung, Sam Won, Jeong, Ha Poong, Kim, Dong II, Song, Byung Chang.
Application Number | 20020008530 09/965607 |
Document ID | / |
Family ID | 26634178 |
Filed Date | 2002-01-24 |
United States Patent
Application |
20020008530 |
Kind Code |
A1 |
Kim, Dong II ; et
al. |
January 24, 2002 |
Micro cantilever style contact pin structure for wafer probing
Abstract
The present invention is to provide a micro cantilever-type
probe disposed on a probe card, having such appropriate elasticity
and mechanical strength that the probe would recover its unforced
shape after deformation during an inspection and maintain its
original shape even after three hundred thousand uses. The present
invention provides a probe card comprising an electrically
insulated substrate fixed on a circuit board; a plurality of
elastic probes with a sharpened end fixed on the insulated
substrate; and wiring formed on the probe, the insulated substrate
and the circuit board. The inventive probe is manufactured by
patterning a substrate using photolithography and etching a portion
except a pattern-defined portion. The probe is coated by metal
layer(s).
Inventors: |
Kim, Dong II; (Seoul,
KR) ; Ahn, Young Kyum; (Sungnam, KR) ; Chung,
Sam Won; (Ansan, KR) ; Song, Byung Chang;
(Suwon, KR) ; Jeong, Ha Poong; (Suwon,
KR) |
Correspondence
Address: |
SCHIFF HARDIN & WAITE
6600 SEARS TOWER
233 S WACKER DR
CHICAGO
IL
60606-6473
US
|
Assignee: |
AMST Co., Ltd.
|
Family ID: |
26634178 |
Appl. No.: |
09/965607 |
Filed: |
September 27, 2001 |
Related U.S. Patent Documents
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Application
Number |
Filing Date |
Patent Number |
|
|
09965607 |
Sep 27, 2001 |
|
|
|
09410527 |
Oct 1, 1999 |
|
|
|
Current U.S.
Class: |
324/755.07 |
Current CPC
Class: |
G01R 1/06727 20130101;
G01R 1/06744 20130101; G01R 1/07342 20130101 |
Class at
Publication: |
324/754 |
International
Class: |
G01R 031/02 |
Foreign Application Data
Date |
Code |
Application Number |
Oct 1, 1998 |
KR |
1998-41311 |
Claims
What is claimed is:
1. A probe card for measuring electrical characteristics of a
device by electrically coupling probes to pads of said device, said
probe card comprising: an electrically insulated substrate fixed on
a circuit board; a plurality of probes fixed on said electrically
insulated substrate, each having a base, an elastic cantilever, and
a pointed end, such that said insulated substrate restricts an
elastic movement of said elastic cantilever; electrical wiring
pattern formed on said probes and said insulated substrate; and an
electrically conducting layer plated on said electrical wiring
pattern, wherein said base, said elastic cantilever, and said
pointed end of each of said probes are integrally made of single
crystal silicon.
2. A probe card according to claim 1, wherein said single crystal
silicon is (110)-oriented single crystal silicon.
3. A probe card according to claim 2, wherein said probes are
vertically etched using KOH, TMAH, EDP wet etchant, which has
anisotropic etch characteristics.
4. A probe card according to claim 1 or 2, wherein said
electrically insulating substrate is made of glass or ceramic.
5. A probe card according to claim 1, wherein said probes are
vertically etched by deep silicon dry etch on a (111)-oriented
single crystal silicon.
6. A probe card according to claim 1, wherein impurities are
introduced into said probes by ion implantation or thermal
diffusion to enhance an electrical conductivity of said probes.
7. A probe card according to claim 1, wherein said probes are
formed by a series of pattern-defining photolithographic and
etching processes that etch away unwanted portions from the single
crystal silicon.
8. A probe card according to claim 1, wherein said electrically
conducting layer is plated using electroplating or electroless
plating of one or more of metal layer(s) such as copper, platinum,
palladium, gold, tungsten, nickel, chrome, nickel chrome alloy.
9. A probe card according to claim 1, wherein said probes are fixed
on said electrically insulating substrate by using fusion bonding
or anodic bonding.
10. A probe card according to claim 1, wherein said electrical
wiring pattern is created by sputtering, chemical vapor deposition,
or evaporation of a electrically conducting material and etching or
lifting-off.
11. A probe card according to claim 10, wherein, when said
lifting-off is used, a sacrificial layer is deposited on the
electrically-insulating substrate before said plurality of probes
are fixed on said insulated substrate.
12. A probe card according to claim 10, wherein said sacrificial
layer for said liftoff is made of Al, Ti, Cu, Cr or oxides like as
Al.sub.2O.sub.3, SiO.sub.2, TiO.sub.2.
13. A probe card according to claim 10, wherein said
photolithography is done by spray coating on a surface of said
probe for conformal step coverage of photo resist.
14. A probe card according to claim 1, wherein said probes are
structurally and electrically separated from one another.
15. A probe card according to claim 1, wherein said pointed end of
each of said probes is plated with tungsten or tungsten
silicide.
16. A probe card according to claim 1, wherein said electrical
wiring is connected to the said circuit board by wire bonding
method.
17. A probe card according to claim 1, wherein said electrical
wiring is connected to the said circuit board by forming one or
plurality of hole(s) in the said insulated substrate and filling
the hole with electrically conducting material.
18. A probe card according to claim 1, wherein said insulated
substrate is cut into desired shape by UV laser, excimer laser,
dicing saw, ultrasonic cutter and/or EDM (electrochemical discharge
machining).
19. A method for manufacturing probe needles, said method
comprising: providing a monolithic single crystal silicon; forming
probe needles by defining a pattern on said monolithic single
crystal silicon by photolithography and etching away undefined
portions of said monolithic single crystal silicon; forming a thin
metal layer by sputtering a first metal on the surface of said
probe needles; and forming a thicker metal layer by plating a
second metal on said thin metal layer, wherein said probe needles
each comprises a base, an elastic cantilever, and a pointed
end.
20. A method according to claim 16, said method further comprising:
forming a sacrificial layer by sputtering third metal on a
substrate; etching said sacrificial layer using predetermined
photoresist pattern to expose selected areas of said substrate;
forming said thin metal layer by sputtering said first metal on
said sacrificial layer and on the surface of said probe needle
body; and forming a wiring pattern by lift-off process on said thin
metal layer.
Description
RELATED APPLICATION
[0001] This application is a Continuation-In-Part of co-pending
U.S. Patent application Ser. No. 09/410,527, entitled
"Vertical-Type Probe Card", filed on Oct. 1, 1999.
FIELD OF THE INVENTION
[0002] The present invention relates generally to the testing of
semiconductor devices and in particular to the fabrication of a
micro-cantilever style contact pin structure as probe card for the
test of microelectronic devices.
BACKGROUND OF THE INVENTION
[0003] When electronic devices such as semiconductor integrated
circuits, LCD, PDP, FPD are produced they are inspected prior to
being shipped out to verify their electrical characteristics as
designed. A probe station, schematically shown in FIG. 5A, is
commonly used for such inspection. The probe station includes a
probe card with a plurality of probes that couple test signal
generation/detection circuitry of the probe station to one or
plurality of pad(s) on a device undergoing inspection. The probe
card is divided largely into two parts, i.e., a printed circuit
board 12 and a plurality of probe needles 13 ("probes" hereafter).
The circuit board 12 structurally supports the probes 13 and has
wiring such that test signals from the signal generation/detection
means can be communicated all the way to the pointed tips of the
probes 13. The probes are made to contact respective pads on the
device 6 during inspection, as shown in FIG. 5A.
[0004] The probe card is attached to the lower side of an insert
ring which is connected to a head plate 10 in the periphery of the
probe station. An electronic device 6 to be tested is placed on a
stage 14, which is positioned below the probe card and is
controlled to move horizontally and/or vertically in order to align
with the probe card above. The probe station generates electric
signals and transfers the signals to the probe card via so-called
pogo pin 11 before applying them to electrical contact pads 5 (See
FIG. 5B) of the device 6 via wiring formed on the probe card in
order to see if the device works as designed. Signals from the
device 6 are transferred to the probe station via the same
path.
[0005] The conventional structure shown in FIGS. 5A and 5B is
called as the horizontal type or the tungsten needle type. In this
conventional structure, a tungsten needle 13 having the sharpened
end portion is fixed to the station, and the sharpened end portion
contacts the pad 5 of the device 6 to measure the electrical
characteristics of the device. However, as the semiconductor device
become smaller, the pads also becomes smaller, with side of several
tens micrometers and with several tens of micrometers spacing. The
width of the tungsten needle used in the conventional type is in
the range of several hundreds micrometers, and therefore it is
impossible to contact adjacent pads or to measure all circuit
patterns which are needed to verify the circuit characteristics.
Furthermore, it is difficult to assemble the probe needles
accurately at desired positions since the tungsten needles are
fixed on probe card manually under microscope.
[0006] To overcome the above-mentioned problems, micromachining has
been adopted for the fabrication of the probe portion. Some
representative of macromachined probes are disclosed in the U.S.
Pat. Nos. 4,961,052, 5,172,050, 5,723,347 and 5,869,974.
Micromachining technology has been extensively developed for
fabrication of mechanical structures sized less than millimeter
down to few microns. Further, micromachining usually employs
photolithographic process which ensures accurate positioning of the
structure. Application of micromachining allowed fabrication of
smaller probes disposed on the substrate, and a large number of
probes can be arranged with narrow spacing. Further, the electrical
characteristics of the probe card are improved since the probes are
very short. Further, micromachining process using silicon as the
base material has been well established. Silicon, especially in
single crystal form, has excellent elastic property which can be
readily used for probe structure material. It is important that all
the probes can accurately contact the pads of the device, and
therefore, each of the probes should contact the pad by pressing
with a predetermined value of pressure to ensure the accurate
contact between the probe and the pad, and the sharpened end
portions of probes should be placed at uniform height to maintain
the preferred co-planarity. If the probe has elasticity and can be
elastically deformed, the desired measurement can be accomplished
even when the sharpened end portions of the probes are variously
disposed or when the height of the pads varies, i.e., the
semiconductor wafer, in which the device is located, is distorted.
Therefore, the probe is required to have elasticity. Employing
elastic material such as silicon for the probe material can
facilitate fabrication of elastic probes.
[0007] Silicon probes can be formed as membrane type probe card.
However, membrane type probe card has disadvantage of small
elasticity. This property is caused by the fact that the sharpened
end portion of the probe is connected to the substrate in all 360
degree directions. To create probe card for large area probing, it
is usually required elastic deformation of more than tens of
microns and spacing between the centers of the sharpened end
portions less than one hundred microns in some places. Membrane
type probe meets the spacing requirement but usually it is not
possible to satisfy the elastic deformation criteria.
[0008] Cantilever style silicon probes can overcome the
disadvantage of membrane type card, provided that there is some
space where the cantilever can be extended. The spacing between the
centers of the sharpened end portions can be less than 50 microns.
The disadvantage of silicon probe is the brittleness of silicon.
Hence, to ensure sufficient elastic deformation, the length of
cantilever should be lengthened accordingly. Further, the previous
design of silicon cantilevers usually employed stacking of multiple
layers by various deposition methods, which complicates the
fabrication process and also reduces the mechanical stability.
[0009] In view of the aforementioned problems for micromachined
probes, it is an objective of the present invention to provide a
probe card with improved mechanical property and relative freedom
of size and position using silicon cantilevers for the testing of
the microelectronic devices.
SUMMARY OF THE INVENTION
[0010] An objective of the present invention is to provide a micro
cantilever-type probe disposed on a probe card, having such
appropriate elasticity and mechanical strength that the probe would
recover its unforced shape after deformation during an inspection
and maintain its original shape even after three hundred thousand
uses.
[0011] For this purpose, the present invention provides a probe
card comprising an electrically insulated substrate fixed on a
circuit board; a plurality of elastic probes with a sharpened end
fixed on said insulated substrate; and wiring formed on said probe,
said insulated substrate and said circuit board. The inventive
probe is manufactured by patterning a substrate using
photolithography and etching a portion except a pattern-defined
portion. The insulated substrate controls the probe so that a
deformation of said probe may be stopped before said probe reaches
a limit of elastic deformation. The probe is coated by metal
layer(s)
[0012] Further, according to the present invention, the probe card
comprises a substrate made of insulating material and probes are
made of single crystal silicon. That is, the probe, which comprises
a base, a cantilever, and a pointed end, is made up of a single
material. There is provided space between the substrate and the
probes to allow the body of the probes to elastically move.
BRIEF DESCRIPTION OF THE DRAWINGS
[0013] The foregoing and other objects, features and advantages of
the present invention will be apparent from the following
description of a preferred embodiment of the present invention, as
illustrated in the accompanying drawings.
[0014] FIG. 1 is a perspective view of a probe card according to
the present invention.
[0015] FIG. 2A is a side view of a probe card according to the
present invention.
[0016] FIG. 2B is a side view of a probe card according to the
present invention in the state of elastic deformation during its
use.
[0017] FIG. 3 shows a silicon wafer which is attached to the
insulating substrate after first etching.
[0018] FIG. 4A shows an example of connection of the wiring portion
to the circuit board.
[0019] FIG. 4B shows another example of connection of the wiring
portion to the circuit board.
[0020] FIG. 5A is a schematic drawing of a conventional probe
station.
[0021] FIG. 5B is an enlarged partial perspective of the probe
portion in the conventional probe station.
[0022] FIGS. 6A through 6F illustrate a silicon wafer manufacturing
process before substrate bonding.
[0023] FIGS. 7A through 7E illustrate the preparation of an
electrically insulated substrate on which the probes are bonded and
the boding process.
[0024] FIGS. 8A through 8E illustrate the process of covering the
probes with a metal layer.
DETAILED DESCRIPTION OF THE INVENTION
[0025] FIG. 1 shows one embodiment a probe card according to the
present invention. The probe card is mainly composed of a plurality
of probes 2 that are bonded on an insulating substrate 1. The
probes, made of single-crystal silicon, are reinforced with a
coating of a high-strength metal, for example tungsten. Wiring 4 is
formed on the substrate for electrical connection between the
probes and an external testing/control circuitry usually disposed
in the main body of a probe station. In FIG. 1, only two probes 2
with sharpened end portions 3 are shown for illustrative purposes.
In reality the number of probes depends on the number of pads in a
device to be inspected and could be as many as several thousands.
FIG. 2A is a side view of the probe card of FIG. 1. An electronic
device 6 with a plurality of pads 5 on its surface is also shown.
As the device 6 is controllably raised with the vertical movement
of a stage on which the device 6 is placed, the pointed tips of the
probes contacts the pad 5 of the device 6 and the arms of the
probes are elastically bent under pressure, as shown in FIG. 2B.
When the probe station is separated from the device after
inspection, the probe arms are restored to their original
shape.
[0026] An exemplary process for fabricating the probes according to
the present invention is described hereinafter.
[0027] First, a probe pattern is defined by using lithography on a
single-crystal silicon substrate. When selected areas of the
substrate in accordance with the probe pattern are removed in a
sequence of repeated lithographic and etching processes, probes,
each having a base, a cantilever and a sharpened end, are formed.
The resultant probes are attached onto a substrate made of glass or
ceramics by fusion or anodic bonding. An electrically conducting
layer is deposited all over on thus-formed probes by sputtering,
evaporation or chemical vapor deposition (CVD). Electrical
circuitry needed on the probe card to carry signals to the
sharpened ends may be formed by a series of photolithography and
etching or a series of photolithography and lift-off process. Then
a metal layer is electroplated or electrolessly plated over the
point. The metal layer reinforces the probes and thus helps to
prevent fracture of the cantilever when it is bent. The metal layer
also increases wear resistance of the sharpened end portion during
the lifetime of probe card. A material having a high mechanical
strength such as tungsten may be deposited on the sharpened end 3
of the probe 2 (See FIG. 1). Alternatively, the sharpened end of
the probe may be separately manufactured with tungsten and attached
to an open end of the probe. Finally, the single-crystal silicon
substrate that is now transformed into a probe block is bonded to a
circuit board and electrical connection between the two is
made.
[0028] This process for forming probes according to the present
invention will be described more in detail.
[0029] A silicon oxide and a silicon nitride film are deposited on
both surfaces of a single crystal silicon wafer by thermal CVD,
physical vapor deposition (PVD) or plasma enhanced CVD (PECVD). A
pattern of probes is defined by photolithography. The silicon layer
is vertically etched in depth of 5-500 micrometer by anisotropic
wet etching using a KOH solution or by deep silicon dry etching
that uses the loops of etching by SF.sub.6 gas and side wall
passivation by C.sub.4F.sub.8 gas. The etched silicon layer is
attached to a glass substrate by fusion bonding under the
conditions of 1-5 atmosphere and 300-600 degrees Centigrade.
Alternatively, the silicon and glass substrate can be anodic-bonded
under the conditions of 200-500 degrees Centigrade, and application
of electricity of 100-2000 V and 1-100 mA. The shape of bonded
layer is shown in FIG. 3 and the etched portion 7 is left as vacant
space. After bonding, if the thickness of silicon is above the
desired value, the side 21 opposite to the bonded surface 20 of
silicon layer is polished to adjust the thickness of silicon. The
thickness of silicon layer is determined according to the size of
the probe to be manufactured.
[0030] After polishing is performed, silicon oxide and/or silicon
nitride film is deposited on the side of the silicon layer by using
thermal CVD, physical vapor deposition (PVD), or plasma enhanced
CVD (PECVD). The pattern of the area of the sharpened end portion
is defined by photolithography and etched. The etched silicon oxide
film or silicon nitride film is used as a mask for etching silicon.
The silicon layer is vertically etched in depth of 5-500 micrometer
by using anisotropic wet etching using KOH solution to manufacture
the sharpened end portion 3 of the probe. Alternatively, deep
silicon dry etch process can be utilized for the etching of the
silicon. After forming the pointed portion, silicon oxide film or a
silicon nitride film is deposited by using thermal CVD, physical
vapor deposition (PVD), or plasma enhanced CVD (PECVD). The pattern
of the area of the body portion of the probe is defined by the
photolithography and etched to manufacture the body portion 2 of
the probe. The etching process can be proceeded by vertically
etching the silicon layer in depth of 5 500 micrometer by using
anisotropic wet etching using KOH solution. Alternatively, deep
silicon dry etch process can be utilized for the etching of the
silicon. According to the above processes, the basic shape of the
probe is formed. Further, the process of introducing boron or
phosphorus into the silicon probe by using ion implantation or
thermal diffusion can be added to enhance the electrical
conductivity of the probe. And then, the wiring is formed from the
sharpened end portion 3 to the substrate 1 by using the deposition
process such as sputtering, evaporation or CVD together with the
photolithography. The wiring can be formed on the side of the
substrate on which the probe is installed, on the opposite side of
the substrate on which the probe is installed, or in the substrate
as imbedded layers. Copper, platinum, palladium, gold, tungsten,
nickel, chrome, nickel chrome alloy or other metal layer of 1-20
micron thick is deposited on the formed probe using electro- or
electroless-plating. The manufactured probe fixed on the substrate
is attached to the circuit board.
[0031] Various methods exist for connecting the circuit board and
the wiring portion formed on the substrate, and FIG. 4A and FIG. 4B
show two examples. FIG. 4A shows a method of forming a hole through
the substrate and filling the conductive material therein, and FIG.
4B shows a method of forming the wiring on the probe and the
substrate and accomplishing a wire bonding to the wiring.
[0032] Another process for forming probes according to the present
invention will be described in detail in reference to FIGS.
6-8.
[0033] First, silicon oxide films 12, 12b and silicon nitride films
13, 13b are formed on either side of a single crystal silicon wafer
11, as shown in FIG. 6A. As the single crystal silicon wafer 11, a
(110)-oriented single crystal silicon or a (111)-oriented single
crystal silicon can be used. Specifically, 50.about.1500 nm thick
silicon oxide is grown by wet or dry oxidation. Oxidation process
may be used with O.sub.2, N.sub.2 and/or H.sub.2 gases at
temperatures above 900.degree. C. On top of the silicon oxide
layers 50.about.300 nm thick, silicon nitride is deposited by LPCVD
(low pressure chemical vapor deposition), which uses DCS
(SiH.sub.2Cl.sub.2) and NH.sub.3 gases in a 600.about.850.degree.
C. temperature range. Next, a predetermined probe pattern is
defined on one side of the silicon substrate, using
photolithography, as shown in FIG. 6B. With a photoresist 14b as a
mask, silicon nitride 13b and silicon oxide layer 12b are etched in
sequence in accordance with the probe pattern. Here, the silicon
nitride layer 13b may be dry etched by using CF.sub.4, CHF.sub.3,
O.sub.2, He gases in the RIE or ICP systems while the silicon oxide
layer 12b may be etched either in BOE (buffered oxide etchant) wet
etchant or dry etch systems like as silicon nitride etching. After
the photoresist 14b is stripped, the remaining oxide and nitride
pattern is used as a mask for etching the silicon wafer 11. The
silicon wafer is vertically etched in depth of 20-300 .mu.m by
using anisotropic wet etchant like as KOH, TMAH, EDP solution or by
using deep silicon dry etching process that uses the loops of
etching by SF.sub.6 gas and side wall passivating by C.sub.4F.sub.8
gas. Vertical wet etching can be done on single crystal silicon
wafers which have (110)-orientation. If a (111)-oriented single
crystal silicon is used, a deep silicon dry etching can be used.
Next, the silicon wafer is turned over as shown in FIG.6C after the
silicon nitride 13b and silicon oxide 12 are removed by dry etch
and BOE. The silicon nitride 13 and silicon oxide 12, now on top,
undergo photolithographic and etching processes, as shown in FIGS.
6C-6D. After the photoresist 14 is stripped, the silicon nitride
layer 13 is patterned again and etched leaving except for selected
areas where sharpened ends of the probes would be formed, as shown
in FIG. 6E. When the photoresist 14 is removed, intermediate
structure of probes as shown in FIG. 6F is obtained.
[0034] Now, the preparation of a glass or ceramic substrate on
which the probes are bonded and the boding process itself will be
described. Metal 22 such as Al, Ti, Cu and Cr is deposited by
sputtering on a glass substrate 21 up to a thickness of 2 .mu.m.
The metal layer 22 is etched using a photoresist of predetermined
pattern 23 in order to expose selected areas of the glass substrate
21, as shown in FIG. 7A.
[0035] After photoresist 23 is stripped, the silicon wafer 11
prepared in the previous steps (See FIG. 6F) are bonded onto the
glass substrate 21 at those exposed areas by fusion bonding as
shown FIG. 7B. The boning is performed at 1-5 atmosphere and
300-600.degree. C. Alternatively, the silicon wafer 11 and glass
substrate 21 can be anodic-bonded at 200-500.degree. C. with
application of voltage of 100-2000 V and 1-100 mA.
[0036] The silicon wafer 11, now disposed on the glass substrate
21, is further etched, as shown in FIG. 7C, using the silicone
oxide 12 as a mask. The etching depth depends on a predetermined
cantilever design parameters such the base thickness, cantilever
length, silicon wafer thickness, and height of the sharpened ends.
Typically the silicon wafer 11 is etched up to 100.about.300 .mu.m
by KOH, TMAH, EPD wet etchant or vertical deep silicon etcher.
Then, as shown in FIG. 7D, the silicon oxide 12 is removed except
for where the sharpened ends would be formed. The top surface of
the silicon wafer 11 is further etched to a certain depth of
50.about.200 .mu.m for defining the sharpened ends as shown in FIG.
7E.
[0037] After the desired shape of probes are formed integrally of
single crystal silicon as described above, the probes are plated
with a metal layer for adding mechanical strength particularly to
the cantilever portion of the probes and for providing electrical
conduit between the tips of probes to circuitry in the circuit
board. First, boron or phosphorus may be introduced into thus
formed silicon probes before metal plating, by using ion
implantation or thermal diffusion in order to enhance the
electrical conductivity. An exemplary process for covering the
probes with a metal layer will be explained in reference to FIGS.
8A-E in the following.
[0038] First, a thin layer of Ti and/or Cr is coated by sputtering
on the overall surface of the probes 11 and the glass substrate 21,
as shown in FIG. 8A, as an adhesion and seed layer for a subsequent
plating of a thicker conductive metal layer. The layer 31 of Ti
and/or Cr metal is 10-200 nm. The wiring pattern is formed by the
lift-off process on the metal layer 22 that was formed on the glass
substrate 21, as shown in FIG. 8B. If photolithography is used to
form a wiring pattern on the glass substrate, photoresist must be
spray coated because the spray coating allows a conformal coating
of a photoresist over a 3-dimensional structure. If spray coating
is used, sputtering and photolithography can form the metal wiring
31, and liftoff layer is not necessary. Next, a copper, platinum,
palladium, gold, tungsten, nickel, chrome, nickel chrome alloy or
other metal layer 41 of 1-20 micron thickness is coated on the
probes, using electro- or electroless-plating as shown in FIG. 8C.
This metal layer 41 reinforces the probes so that the cantilever
portion would not suffer fracture after repeated cases of elastic
bending and improves electrical conductivity, contact resistance,
usability, and wear resistance of the sharpened ends. Metal wiring
can be formed also on the opposite side of the substrate on which
the probe is installed, or in the substrate as imbedded layers.
[0039] In the case that two rows of probes are designed with the
sharpened ends face away from each other, the glass substrate 21 is
cut or slotted to provide paths 51 through which electrical wire is
passed connecting the probes to circuitry in a circuit board under
the glass substrate, as shown in FIG. 8D. The through holes 51 can
be formed by laser micro-machining, wire cutting, and/or dicing.
Typically UV laser, excimer laser, dicing saw, ultrasonic cutter
and/or EDM (electrochemical discharge machining) can be used to cut
the glass substrate.
[0040] Now completed probing blocks are firmly attached to a
circuit board 61, as shown in FIG. 8E using various epoxies as
adhesive. Various methods exist for electrically connecting the
circuit board and the wiring formed on the glass substrate. FIG. 4A
and FIG. 4B show two examples. FIG. 4B shows a method of forming a
hole through a substrate and filling conductive material in the
hole. FIG. 4A shows forming a wire bonding pad on the probe block
and bonding the pad to the circuit board. In FIG. 8E, wire 71 is
shown to connect the wire bonding pad of the glass substrate and
circuit board. After all these processes, the inventive micro probe
as shown in FIG. 1 is obtained.
[0041] According to the present invention, very uniformly and
precisely placed probes are installed on the plane substrate, hence
allowing accurate measurement of the electrical characteristics of
a plurality of semiconductor devices simultaneously.
[0042] Further, according to the present invention, the probes are
small and the size of each of the probes can be designed according
to its purpose, therefore the probe card having desired electrical
characteristics can be manufactured.
[0043] Another effect of the present invention is that the lifetime
of the probe card is long because the probe has excellent elastic
properties due to the base single crystal silicon, hence plastic
deformation hardly occurs.
[0044] Another advantage of present invention is the thickness of
the plated metal layer allows cleaning of the probe by grinding the
sharpened end portion on abrasive paper, which is customary
practice of conventional probe card cleaning. And also, micro
cantilever toughness, conductivity, and contact resistance can be
improved.
[0045] Although the present invention is described with respect to
particular embodiments thereof, it will be apparent to those
skilled in the art that various applications and modifications can
be readily made without departing from the scope of the
above-described features of the present invention. Therefore, the
present invention should not be interpreted to be limited to the
embodiments described above and is only restricted to the appended
claims.
* * * * *