U.S. patent application number 09/820821 was filed with the patent office on 2001-09-06 for pattern reading apparatus.
This patent application is currently assigned to ASAHI KOGAKU KOGYO KABUSHIKI KAISHA. Invention is credited to Ando, Hiroaki, Ishikawa, Tuyoshi, Otsuka, Kenichiro.
Application Number | 20010019413 09/820821 |
Document ID | / |
Family ID | 27582053 |
Filed Date | 2001-09-06 |
United States Patent
Application |
20010019413 |
Kind Code |
A1 |
Ishikawa, Tuyoshi ; et
al. |
September 6, 2001 |
Pattern reading apparatus
Abstract
A pattern reading apparatus for reading a pattern from an
object. The pattern reading apparatus includes a minute-area light
source, an objective lens system, an imaging lens, and an imaging
element. The objective lens system causes an illumination light
beam from the light source to be incident on the object and
converges the light beam reflected from the object. The imaging
lens forms an image of the object using only a scattered component
of light which has been reflected from the object. The imaging
element is disposed at a position where the image of the pattern is
imaged for reading the pattern.
Inventors: |
Ishikawa, Tuyoshi; (Tokyo,
JP) ; Otsuka, Kenichiro; (Tokyo, JP) ; Ando,
Hiroaki; (Tokyo, JP) |
Correspondence
Address: |
GREENBLUM & BERNSTEIN, P.L.C.
1941 ROLAND CLARKE PLACE
RESTON
VA
20191
US
|
Assignee: |
ASAHI KOGAKU KOGYO KABUSHIKI
KAISHA
Tokyo
JP
|
Family ID: |
27582053 |
Appl. No.: |
09/820821 |
Filed: |
March 30, 2001 |
Related U.S. Patent Documents
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Application
Number |
Filing Date |
Patent Number |
|
|
09820821 |
Mar 30, 2001 |
|
|
|
08916408 |
Aug 22, 1997 |
|
|
|
Current U.S.
Class: |
356/445 |
Current CPC
Class: |
G02B 27/021 20130101;
G03F 7/70616 20130101 |
Class at
Publication: |
356/445 |
International
Class: |
G01N 021/55 |
Foreign Application Data
Date |
Code |
Application Number |
Aug 23, 1996 |
JP |
HEI 8-241112 |
Oct 25, 1996 |
JP |
HEI 8-301076 |
Dec 6, 1996 |
JP |
HEI 8-342775 |
Dec 6, 1996 |
JP |
HEI 8-342776 |
Dec 6, 1996 |
JP |
HEI 8-342777 |
Dec 6, 1996 |
JP |
HEI 8-342778 |
Mar 4, 1997 |
JP |
HEI 9-65333 |
Mar 4, 1997 |
JP |
HEI 9-65334 |
Mar 11, 1997 |
JP |
HEI 9-74497 |
May 8, 1997 |
JP |
HEI 9-134312 |
Jun 6, 1997 |
JP |
HEI 9-165422 |
Claims
What is claimed is:
1. A pattern reading apparatus for causing a light beam emitted
from a light source to be incident on an object surface having a
pattern formed thereon as an object to be read through an objective
lens, for converging the light beam reflected at the object surface
through the objective lens, and for reading the image of the
pattern by forming the image by an imaging lens, the pattern
reading apparatus comprising a tilt mechanism for supporting said
objective lens such that said objective lens is rotatable about a
rotation axis which is perpendicular to an optical axis of the
objective lens.
2. The pattern reading apparatus according to claim 1, said light
source comprising a minute-area light source.
3. The pattern reading apparatus according to claim 1, said light
source and said imaging lens being disposed on opposite sides of
the optical axis of said objective lens and said light source is
positioned such that the light beam is perpendicularly incident on
the object surface.
4. The pattern reading apparatus according to claim 1, wherein said
objective lens causes the light beam emitted from said light source
to be incident on the object surface as an approximately parallel
light beam.
5. The pattern reading apparatus according to claim 1, wherein the
rotation axis is perpendicular to a principal beam of the light
beam and perpendicular to the optical axis of said imaging
lens.
6. The pattern reading apparatus according to claim 1, wherein said
tilt mechanism permits said objective lens to be turned within the
range of .+-.45 degrees.
7. The pattern reading apparatus according to claim 1, wherein said
tilt mechanism includes a lens drive motor for driving said
objective lens.
8. The pattern reading apparatus according to claim 1, further
comprising a spatial filter having a shading region for shading a
portion of the light beam that forms the image of said light
source, the spatial filter being disposed in the optical path
between said objective lens and said imaging lens.
9. The pattern reading apparatus according to claim 8, wherein said
spatial filter is disposed nearer to said objective lens than a
paraxial image point of said light source formed through said
objective lens.
10. The pattern reading apparatus according to claim 1, further
comprising an imaging element disposed at the imaging position of
the pattern image for reading the pattern.
11. A pattern reading apparatus, comprising: a minute-area light
source; an objective lens for causing an illumination light beam
from said light source to be incident on an object surface having a
pattern formed thereon as an object to be read, and converging the
light beam reflected at the object surface; a spatial filter for
capturing the scattered reflected component which is contained in
the reflected light beam having passed through said objective lens;
an imaging lens for forming the image of the pattern from the
component having passed through said spatial filter; an imaging
element disposed at the imaging position of the pattern image for
reading the pattern; and a tilt mechanism for supporting said
objective lens so as to turn about a turning axis which is
perpendicular to an optical axis of said objective lens.
12. The pattern reading apparatus according to claim 11, wherein
said light source and said imaging lens are disposed on opposite
sides of the optical axis of said objective lens and said light
source is disposed at a position such that the illumination light
beam is perpendicularly incident on the object surface.
13. The pattern reading apparatus according to claim 12, wherein
the turning axis is perpendicular to a principal beam of the
illumination light beam and perpendicular to an optical axis of
said imaging lens.
14. The pattern reading apparatus according to claim 11, wherein
said spatial filter is disposed nearer to said objective lens than
a paraxial image point of said light source formed through said
objective lens.
15. A pattern reading apparatus for causing an illumination light
beam emitted from a minute-area light source to be incident on an
object surface having a pattern formed thereon as an object to be
read through a first lens, converging a light beam having the
information of the pattern by a second lens, causing the converged
light beam to be incident on an imaging lens, forming the image of
the pattern by the imaging lens and reading the thus formed image,
the pattern reading apparatus comprising a tilt mechanism for
supporting the second lens so as to turn about a turning axis which
is perpendicular to the optical axis of the second lens.
Description
[0001] This is a division of U.S. patent application Ser. No.
08/916,408, filed Aug. 22, 1997, the contents of which are
expressly incorporated by reference herein in its entirety.
BACKGROUND OF THE INVENTION
[0002] The present invention relates to a pattern reading apparatus
for reading a pattern formed on a surface of a silicon wafer or the
like, and more specifically, to a pattern reading apparatus for
reading a pattern formed on a reflective or transparent
surface.
[0003] In manufacturing semiconductor products, semiconductor
layers are applied to a semiconductor substrate, such as a silicon
wafer or the like, by vapor deposition and then design patterns are
formed by photo-lithography processes, etching processes, and the
like. In general, a serial number is applied to the silicon wafer
by laser etching so that the silicon wafer can be tracked during
the pattern forming processes based on the serial number.
Conventionally, the serial number on the silicon wafer is
discriminated by a worker visually examining the wafer.
[0004] However, since the silicon wafer is mirror finished, for a
worker to read the serial number, the wafer must be viewed
obliquely while holding it to the light, or by some similar method.
Further, since the quality of the pattern may deteriorate as the
silicon wafer is subjected to processes such as etching, vapor
deposition and the like, it is particularly difficult to
discriminate the serial number of the silicon wafer after a number
of such processes.
[0005] Conventionally, two types of pattern reading devices have
been known: a reflective-type reading device, and a
transmission-type reading device. The former is used for reading a
pattern formed on a reflective surface, and the latter is used for
reading a pattern formed on a transmission-type surface.
[0006] In an example of the reflective-type reading device, light
emitted by a light source is incident, through a lens, to a surface
on which the pattern is formed, and an image of the pattern is
formed by an imaging lens on a screen or the like. In this case, a
portion of the light incident to the lens is reflected on a surface
of the lens to create ghosting light, which reaches the screen and
reduces contrast of the image of the pattern. Further, the specular
reflection from the surface having the pattern formed thereon may
be incident on the screen making it more difficult to observe the
image of the pattern.
[0007] As an example of the transmission-type reading device, a
known device has a Fourier transformation lens, that is used for
reading a pattern formed on a light-transmission-type object by
subjecting the pattern to a predetermined filter processing. In
these optical systems, the light beam from a point light source
passes through a first lens and is incident on an object as a
parallel light beam. After passing through the object, the light
beam is converged by a second lens and caused to pass through a
spatial filter disposed at the back focal point of the second lens.
When an imaging lens, having the front focal point set to the
position of the filter, is disposed behind the filter, an object
image, which is affected by the function of the filter, is formed
at the back focal point of the imaging lens.
[0008] For example, to output an emphasized image of a pattern
formed on an object surface, a high-pass filter may be used as the
spatial filter to shade the paraxial rays which correspond to the
image of the point light source. Further, an imaging element may be
disposed at the imaging position to capture and process the image
for further processing or displaying on a display unit.
[0009] In the above conventional filtering optical system, however,
when an objective lens (first lens) has spherical aberration such
as, for example, a spherical single lens or when coma and curvature
of field arise because a light beam is obliquely incident on the
objective lens, there is a problem in that the light beam which
forms the image of a point light source does not converge to a
point but scatters over a larger area such that a large shading
region must be provided to properly execute filtering. Thus, a
quantity of light used to form the image is lowered.
[0010] In a pattern reading apparatus using the above conventional
filtering optical system, since the magnification of a pattern
image having been formed cannot be changed, the pattern image
cannot be optically enlarged or reduced. That is, since an object
surface is disposed to the focal point of an objective lens in the
conventional optical system, the light beam emitted from the
objective lens is made afocal. Thus, even if the imaging lens is
moved, magnification cannot be changed. To change the
magnification, the imaging lens must be composed of a group of a
plurality of lenses.
[0011] Further, a pattern reading apparatus using the above
conventional filtering optical system cannot be easily used when
the object to be read is intended to function as a prism (i.e., has
a wedge shape or the like) for deflecting a light beam. In this
case, the image of the point light source will not be shaded by a
spatial filter because the image will be formed at a position
outside of the axis. Thus, a component of light other than the
scattered reflected component will be incident on an imaging lens
and a desired filtered output image cannot be output. A similar
problem also may arise when a reflection surface is tilted at the
time a pattern is read by this type of apparatus.
SUMMARY OF THE INVENTION
[0012] A first object of the present invention is to provide a
pattern reading apparatus capable of forming a high-contrast image
of an indistinct pattern such as a serial number or the like formed
on a mirror surface such as a silicon wafer, and in particular,
capable of even reading a pattern which has deteriorated because of
processing such as etching, vapor evaporation, and the like.
[0013] A second object of the present invention is to provide a
pattern reading apparatus capable of reading a pattern image even
if a portion of an illumination light beam is reflected at the lens
surface of an objective lens or even if an object surface is
somewhat irregular.
[0014] A third object of the present invention is to provide a
pattern reading apparatus, which includes a filtering optical
system, capable of shading the light beam that forms the image of a
point light source without lowering the quantity of light of the
pattern image substantially, even if the image of the point light
source is expanded due to spherical aberration, coma, and curvature
of field of an objective lens.
[0015] A fourth object of the present invention is to provide a
pattern reading apparatus using a filtering optical system in which
the magnification of a pattern image may be changed using a simple
structure.
[0016] A fifth object of the present invention is to provide a
pattern reading apparatus, using a filtering optical system, with
which an image of a point light source and a shading region of a
spatial filter can be made to coincide, even if an object has a
function of a prism or even if a reflection type object has a
tilted reflection surface.
[0017] According to an aspect of the present invention, there is
provided, a pattern reading apparatus including a minute-area light
source, an objective lens, an imaging lens, and an imaging element.
The objective lens causes the illumination light beam from the
light source to be incident on a reflection surface having a
pattern formed thereon as an object to be read and converges the
light beam reflected from the reflection surface. The imaging lens
is for imaging an image of the pattern by a scattered reflected
component, which has passed through the objective lens, of the
reflected light beam. The imaging element is disposed at a position
where the image of the pattern is imaged for reading the pattern.
The light source is optically conjugate with a center of curvature
of the surface of the object to be read through the objective
lens.
[0018] According to another aspect of the present invention, there
is provided, a pattern reading apparatus including illumination
means for illuminating a reflection surface having a pattern formed
thereon as an object to be read by a parallel light beam and
detection means for detecting an image by imaging a scattered
reflected component of illumination reflected from the reflection
surface.
[0019] According to yet another aspect of the present invention,
there is provided, a pattern reading apparatus, an objective lens,
a spatial filter, and an imaging lens. The imaging lens forms the
image of the pattern using the light beam that passes through the
spatial filter. The pattern reading apparatus includes a
minute-area light source for causing an illumination light beam to
be incident on an object surface having a pattern formed thereon as
an object to be read. The objective lens converges a light beam
carrying the information of the pattern. The spatial filter is
disposed at a position where a size of an image of the light source
formed by the objective lens is smaller than a size of the image at
a paraxial image point. The spatial filter has a shading region for
shading a portion of the light beam that forms an image of the
light source from the light beam.
[0020] According to yet another aspect of the present invention,
there is provided, a pattern reading apparatus including a
minute-area light source, an objective lens for converging a light
beam having the information of the pattern, a spatial filter, and
an imaging lens for forming the image of the pattern by the light
beam having passed through the spatial filter. The minute-area
light source causes an illumination light beam to be incident on an
object surface having a pattern formed thereon as an object to be
read. The spatial filter is disposed nearer to the objective lens
than the paraxial image point of the image of the light source. The
spatial filter also has a shading region for shading the light beam
for forming the image of the light source which is contained in the
light beam having passed through the objective lens.
[0021] According to yet another aspect of the present invention,
there is provided, a pattern reading apparatus including a
minute-area light source, an objective lens, a spatial filter, an
imaging lens, and an imaging element disposed at the imaging
position of the pattern image for reading the pattern. The
objective lens causes the illumination light beam from the
minute-area light source to be incident on an object surface having
a pattern formed thereon as an object to be read and converges the
light beam reflected at the object surface. The spatial filter is
disposed nearer to the objective lens than the paraxial image point
of the light source formed through the objective lens for capturing
the scattered reflected component which is contained in the
reflected light beam having passed through the objective lens. The
imaging lens forms an image of the pattern by the component having
passed through the spatial filter.
[0022] According to yet another aspect of the present invention,
there is provided, a pattern reading apparatus using a Fourier
conversion optical system composed of a first lens, an object
surface to be read, a second lens, a spatial filter, and an imaging
surface which are disposed along the traveling direction of the
light beam from a light source. The spatial filter is disposed
nearer to the second lens than the back focal point of the second
lens.
[0023] According to yet another aspect of the present invention,
there is provided, a pattern reading apparatus for causing a light
beam emitted from a light source to be incident on an object
surface. The object surface has a pattern formed thereon as an
object to be read through an objective lens. The pattern reading
apparatus is also for converging the light beam reflected at the
object surface through the objective lens as well as reading the
image of the pattern by forming the image by an imaging lens. Also
provided is a tilt mechanism for supporting the objective lens such
that the objective lens is rotatable about a rotation axis which is
perpendicular to the optical axis of the objective lens.
[0024] According to yet another aspect of the present invention,
there is provided, a pattern reading apparatus including a
minute-area light source, an objective lens, a spatial filter, an
imaging lens, an imaging element, and a tilt mechanism. The
objective lens causes the illumination light beam from the light
source to be incident on an object surface having a pattern formed
thereon as an object to be read and converges the light beam
reflected at the object surface. The spatial filter captures the
scattered reflected component which is contained in the reflected
light beam having passed through the objective lens. The imaging
lens images the image of the pattern by the component having passed
through the spatial filter. The imaging element is disposed at the
imaging position of the pattern image for reading the pattern. The
tilt mechanism supports the objective lens to allow turning about a
turning axis which is perpendicular to the optical axis of the
objective lens.
[0025] According to yet another aspect of the present invention,
there is provided, a pattern reading apparatus for causing the
illumination light beam emitted from a minute-area light source to
be incident on an object surface through a first lens. The object
surface has a pattern formed thereon as an object to be read. The
pattern reading apparatus has a second lens that converges a light
beam having the information of the pattern and causes the
converging light beam to be incident on an imaging lens. The
pattern reading apparatus is for forming the image of the pattern
by the imaging lens and reading the formed image. A tilt mechanism
is provided for supporting the second lens to allow turning about a
turning axis which is perpendicular to the optical axis of the
second lens.
[0026] According to yet another aspect of the present invention,
there is provided, a pattern reading apparatus for causing the
illumination light beam emitted from a minute-area light source to
be incident on an object surface. The object surface has a pattern
formed thereon as an object to be read. The pattern reading
apparatus has an objective lens for converging a light beam having
the pattern information. The pattern reading apparatus also causes
the converging light beam to be incident on an imaging lens, which
forms the image of the pattern, and reads the image. The objective
lens is disposed such that the light beam originating from a point
of the object surface and emitted from the objective lens is
changed to a non-parallel light beam. The imaging lens and an
imaging surface are made movable along the optical axis direction
of the imaging lens in order to change magnification.
[0027] According to yet another aspect of the present invention,
there is provided, a pattern reading apparatus including a
minute-area light source, an objective lens, a spatial filter, and
an imaging element. The objective lens causes the illumination
light beam from the light source to be incident on an object
surface, having a pattern formed thereon as an object to be read,
and converges the light beam reflected at the object surface. The
spatial filter is for capturing a scattered reflected component
which is contained in the reflected light beam having passed
through the objective lens. The imaging element is disposed at the
imaging position of the pattern image for reading the pattern. The
imaging lens and the imaging element are movable along the optical
axis direction of the imaging lens in order to change
magnification.
[0028] According to yet another aspect of the present invention,
there is provided, a pattern reading apparatus for causing the
illumination light beam emitted from a minute-area light source to
be incident on an object surface, having a pattern formed thereon
as an object to be read. The pattern reading apparatus also has an
objective lens that converges a light beam having the pattern
information and causes the converged light source to be incident on
an imaging lens. The imaging lens forms the image of the pattern.
The pattern reading apparatus is also for reading the image and
includes an adjustment mechanism for adjusting the position of the
light source in a plane which is perpendicular to the principal
beam of the illumination light beam.
[0029] According to yet another aspect of the present invention,
there is provided, a pattern reading apparatus for causing the
illumination light beam emitted from a minute-area light source to
be incident on an object surface having a pattern formed thereon as
an object to be read. An objective lens converges a light beam
having the pattern information. The light beams that pass through
the objective lens are incident on an imaging lens through a
spatial filter. The imaging lens forms the image of the pattern.
The image is also read. The spatial filter is a filter having a
shading region for shading paraxial rays. The apparatus includes an
adjustment mechanism for adjusting the relative positional
relationship between the position of the image of the light source
formed by the objective lens and the shading region of the spatial
filter in the plane which crosses the optical axis of the imaging
lens.
[0030] According to yet another aspect of the present invention,
there is provided, a pattern reading apparatus including a
minute-area light source disposed to cause an illumination light
beam to be obliquely incident on an approximately flat object
surface having a pattern formed thereon as an object to be read at
a predetermined incident angle. The pattern reading apparatus also
includes an objective lens for converging a light beam having the
information of the pattern, a spatial filter having a shading
region for shading the portion of the reflected light beam from the
object surface which has passed through the spatial filter and
forms the image of the light source, and an imaging element. The
imaging element is for reading the image of the pattern formed by
the light beam having passed through the spatial filter. The line
extending from the principal plane of a lens interposed between the
object surface and an imaging surface and having an imaging action,
the line extending from the imaging surface and the line extending
from the object surface cross each other on an approximately
straight line.
[0031] According to yet another aspect of the present invention,
there is provided, a pattern reading apparatus including a
minute-area light source for illuminating an object surface having
a pattern formed thereon as object to be read. The pattern reading
apparatus also includes an objective lens for converging a light
beam having the pattern information, a spatial filter and a shift
mechanism. The spatial filter has a shading region for shading the
light beam, which forms the image of the light source, of the light
beam having passed through the objective lens. The shift mechanism
is for supporting the objective lens so as to allow parallel
movement in a direction approximately perpendicular to the optical
axis of the objective lens. The image of the pattern formed by the
component having passed through the spatial filter is read.
[0032] According to yet another aspect of the present invention,
there is provided, a pattern reading apparatus including a
minute-area light source disposed such that an illumination light
beam is caused to be incident on an object surface having a pattern
formed thereon as a object to be read without passing through a
lens. The pattern reading apparatus also includes an objective lens
for converging a light beam having the pattern information, a
spatial filter, and an imaging element. The spatial filter has a
shading region for shading the portion, which forms the image of
the light source, of the light beam having passed through the
objective lens. The imaging element is for reading the image of the
pattern formed by the light beam having passed through the spatial
filter.
[0033] According to yet another aspect of the present invention,
there is provided, a pattern reading apparatus including an
objective lens disposed in confrontation with an object surface as
a reflection surface having a pattern formed thereon as an object
to be read. The pattern reading apparatus includes a minute-area
light source disposed at a position which is conjugate with the
center of curvature of the object surface through the objective
lens for illuminating the object surface through the objective
lens. The pattern reading apparatus also includes an imaging lens
and an imaging element. The imaging lens is disposed farther from
the object surface than the light source with the optical axis
thereof in coincidence with the objective lens. The imaging element
is for reading the image of the pattern which is reflected at the
object surface and formed through the objective lens and the
imaging lens.
BRIEF DESCRIPTION OF THE ACCOMPANYING DRAWINGS
[0034] FIG. 1 shows an optical system of a pattern reading
apparatus according to a first embodiment;
[0035] FIG. 2 is a plan view showing an example of a spatial
filter;
[0036] FIG. 3 is a plan view showing another example of a spatial
filter;
[0037] FIG. 4 shows a specific arrangement of an optical system
according to the first embodiment;
[0038] FIG. 5 shows a first modification of the first
embodiment;
[0039] FIG. 6 shows a second modification of the first
embodiment;
[0040] FIG. 7 shows a third modification of the first
embodiment;
[0041] FIG. 8 shows a fourth modification of the first
embodiment;
[0042] FIG. 9 shows a fifth modification of the first
embodiment;
[0043] FIG. 10(A) shows an optical system of a pattern reading
apparatus according to a second embodiment;
[0044] FIGS. 10(B) and 10(C) show a modification of the optical
system of FIG. 10(A) for making magnification adjustable;
[0045] FIGS. 11(A) and 11(B) show an optical system of a pattern
reading apparatus according to a third embodiment;
[0046] FIGS. 12(A) and 12(B) show an optical system of a pattern
reading apparatus according to a fourth embodiment;
[0047] FIGS. 13(A), 13(B), and 13(C) show an optical system of a
pattern reading apparatus according to a fifth embodiment;
[0048] FIG. 14 shows an optical system of a pattern reading
apparatus according to a sixth embodiment;
[0049] FIG. 15 shows the optical system of FIG. 14 in a developed
form;
[0050] FIG. 16 shows a specific arrangement of an optical system
according to the sixth embodiment;
[0051] FIGS. 17(A) through 17(H) are spot diagrams showing the size
of an image of a light source calculated based on the specific
arrangement of FIG. 16;
[0052] FIG. 18 is a front view of a specific mechanical arrangement
of a pattern reading apparatus including the optical system of FIG.
14;
[0053] FIG. 19 is a side view showing the apparatus of FIG. 18;
[0054] FIG. 20 illustrates the movement loci of an imaging lens and
an imaging element for adjusting magnification;
[0055] FIG. 21 illustrates an alternative arrangement for adjusting
a pinhole unit;
[0056] FIGS. 22(A) and 22(B) illustrate an alternative arrangement
for adjusting a spatial filter;
[0057] FIG. 23 shows the arrangement of FIG. 22 as mounted; FIG. 24
shows a modification of an optical system according to the sixth
embodiment;
[0058] FIGS. 25(A) and 25(B) show an optical system of a pattern
reading apparatus according to a seventh embodiment;
[0059] FIG. 26 shows an optical system of a pattern reading
apparatus according to an eighth embodiment;
[0060] FIG. 27 is a plan view showing the arrangement of a shift
mechanism for moving an objective lens;
[0061] FIG. 28 is a side view of the shift mechanism of FIG.
27;
[0062] FIG. 29 is a plan view showing an alternative arrangement of
the shift mechanism of FIG. 27;
[0063] FIG. 30(A) shows an optical system of a pattern reading
apparatus according to a ninth embodiment;
[0064] FIG. 30(B) shows a modification of the optical system of
FIG. 30(A);
[0065] FIG. 31 shows an optical system of a pattern reading
apparatus according to a tenth embodiment;
[0066] FIG. 32 shows a modification of the optical system of FIG.
31;
[0067] FIG. 33 shows an optical system of a pattern reading
apparatus according to an eleventh embodiment;
[0068] FIG. 34 shows a modification of the optical system of FIG.
33;
[0069] FIG. 35 shows an optical system of a pattern reading
apparatus according to a twelfth embodiment; and
[0070] FIG. 36 shows a modification of the optical system of FIG.
35.
DESCRIPTION OF THE PREFERRED EMBODIMENTS
[0071] Embodiments of a pattern reading apparatus according to the
present invention will be described below.
[0072] First Embodiment
[0073] FIG. 1 is a schematic view showing the arrangement of the
pattern reading apparatus according to a first embodiment. As shown
in FIG. 1, a silicon wafer OR has a reflective surface 1a on which
a pattern (in this case, a serial number) is formed by laser
etching. Further, the pattern reading apparatus includes an optical
system composed of an illumination unit 10, an objective lens 20
and a detection unit 30. The objective lens 20 is disposed so that
the optical axis Ax thereof is perpendicular to the reflective
surface 1a. The illumination unit 10 and the detection unit 30 are
disposed approximately symmetrically with respect to the optical
axis Ax on opposite sides thereof.
[0074] The illumination unit 10 includes a lamp 11 such as a
halogen lamp, or the like, and a pinhole plate 12 in which a
pinhole 12a is formed to permit a portion of the light beam emitted
from the light source to pass therethrough to form a minute-area
light source (the minute-area light source will also be referred to
as a point light source). A diffusion plate 13 is interposed
between the lamp 11 and the pinhole plate 12 to eliminate any
effect due to an image of a filament of the lamp 11.
[0075] The detection unit 30 includes a spatial filter 31, an
imaging lens 32, and an imaging element 33, such as a CCD image
sensor, or the like. In the embodiment shown in FIG. 1, the
detection unit 30 is disposed on a line extending in a direction in
which light from the minute-area light source will be specularly
reflected from the surface 1a.
[0076] The objective lens 20 is designed such that the minute-area
light source is conjugate with the center of curvature of an object
surface to be read. In this embodiment, since the surface 1a is
formed as a plane, the pinhole 12a is disposed at a front focal
point position (i.e., a position on a plane which is perpendicular
to the optical axis Ax of the objective lens 20, and which includes
a front focal point of the objective lens 20) of the objective lens
20. A light beam emitted from the minute-area light source becomes
a parallel light beam after passing through the objective lens 20
and obliquely illuminates the surface 1a of the silicon wafer OR.
The parallel light beam is scatteringly (diffusely) reflected at
edges of the pattern and specularly reflected at portions other
than the edges.
[0077] The reflected light beam passes through the objective lens
20 again, and becomes a converging light beam directed toward the
detection unit 30. The spatial filter 31 is disposed at a position
where it is conjugate with the minute-area light source through the
objective lens 20, that is, at a back focal point position of the
objective lens 20 in the optical path between the imaging lens 32
and the objective lens 20 (i.e., a position on a plane which is
perpendicular to the optical axis Ax of the objective lens 20, and
which includes a back focal point of the objective lens 20). As a
result, at the spatial filter 31, a specularly reflected component
of the light beam reflected from the surface 1a is converged to a
beam spot approximately the same size as the pinhole 12a. As shown
in FIGS. 2 and 3, the spatial filter 31 is provided with a shading
portion for shading the specularly reflected component.
Specifically, as shown in, for example, FIG. 2, the spatial filter
31 has a shading portion 31a for covering the central portion of
the pupil of the imaging lens 32 which corresponds to a range on
which the specularly reflected light beam is incident and the right
half of the pupil of the imaging lens 32. In another example, the
spatial filter 31 has, as shown in FIG. 3, a shading portion 31b
for covering only the central portion of the pupil of the imaging
lens 32 which corresponds to a range on which the specularly
reflected light beam is incident. In the above examples, the
spatial filter 31 may have a transparent glass plate as shown by
broken lines, and the shading portion 31a or 31b is formed by a
coating or the like.
[0078] The diffusely reflected component of the light beam
reflected at the surface 1a (see FIG. 1), which passes through the
spatial filter 31, is incident on the imaging lens 32. A power and
a position of the imaging lens 32 is designed such that the surface
1a of the silicon wafer OR and the imaging element 33 are conjugate
with respect to the imaging lens 32, and, thus, the image of the
pattern is formed on the imaging element 33 by the scatteringly
(diffusely) reflected component. The imaging element 33 converts
the formed image of the pattern into an electric signal and outputs
the signal to an image processing apparatus (not shown). The image
processing apparatus may display the image of the pattern on a
display screen based on the input image signal and/or analyze the
content of the pattern using a character recognition algorithm.
[0079] In the example in FIG. 1, since the detection unit 30 is
disposed on the line extending in the direction in which the
specularly reflected component is reflected from the surface 1a, if
the spatial filter 31 is not provided, the specularly reflected
component will be incident on the imaging lens 32. Since the
specularly reflected component does not include information of the
pattern and has a strong intensity, if the specularly reflected
component is captured by the imaging element 33, the Signal to
Noise (S/N) ratio of the information of the pattern is lowered and
it is difficult to detect the pattern. To cope with this problem,
the S/N ratio of the information of the pattern is improved by
removing the specularly reflected component using the spatial
filter 31 and permitting the imaging element 33 to capture only the
diffusely reflected component so that it is easy to recognize and
discriminate the pattern. Because the image formed on the imaging
element is mainly formed of a high frequency component of a spatial
frequency of the capture image, by suppressing the low frequency
component thereof, the edge portion of the captured image of the
pattern is actually emphasized.
[0080] The focal length of the imaging lens 32 is determined based
on a magnification determined in accordance with the length of the
pattern (i.e., the length of the serial number) and the size of the
imaging surface of the imaging element 33. Further, the focal
length of the objective lens 20 is determined based on the distance
between the surface 1a and the imaging lens 32, where the distance
between the surface 1a and the imaging lens 32 is set according to
the focal length of the imaging lens 32 and the magnification.
[0081] FIG. 4 illustrates a design example of the pattern reading
optical system of a first embodiment. In this example, the imaging
lens 32 has a focal length of 28 mm and the objective lens 20 has a
focal length of 250 mm. Further, the distance al from the optical
axis Ax of the objective lens 20 to the pinhole 12a is about 60 mm,
the distance b1 from the pinhole 12a to the surface 1a of the
silicon wafer OR is about 300 mm and the distance c1 from the
objective lens 20 to the surface 1a is about 50 mm. Assuming that
the length of the pattern is 2 cm, the image of the pattern is
about 1.96 mm long on the imaging element 33. Thus, the imaging
element 33 may be, for example, 1/2 inch in length.
[0082] FIGS. 5 to 7 show modifications of the optical system
according to the first embodiment. In the modifications, the
illumination unit 10, the imaging lens 32, and the imaging element
33 of the detection unit 30 are the same as those of the first
embodiment shown in FIG. 1.
[0083] In a first modification shown in FIG. 5, the imaging lens 32
is disposed in a position at which the specularly reflected
component will not be incident thereon. In this way, the spatial
filter 31 is not required. More particularly, in the example of
FIG. 5, the imaging lens 32 is disposed at a position which is
farther from the optical axis Ax of the objective lens 20 than in
FIG. 1. Accordingly, only the diffusely reflected component is
incident on the imaging lens 32, and an image of the pattern, in
which the edge portion is emphasized, is formed on the imaging
element 33 without the spatial filter 31.
[0084] In a second modification, shown in FIG. 6, the illumination
unit 10 is disposed on the optical axis Ax of the objective lens 20
such that an illumination light beam is incident on the surface 1a
of the silicon wafer OR at a right angle (i.e., along the optical
axis Ax). In this modification, a beam splitter 40 is disposed in
the optical path between the pinhole plate 12 and the objective
lens 20 to separate the optical path of the illumination light beam
emitted from the illumination unit 10 from the optical path of the
reflected light beam from the surface 1a.
[0085] The illumination light beam from the pinhole 12a passes
through the beam splitter 40 and the objective lens 20 to become a
parallel light beam (also parallel with the optical axis Ax) that
illuminates the surface 1a. The reflected light beam from the
surface 1a passes through the objective lens 20 again and becomes a
converging light beam, a part of which is reflected at the beam
splitter 40 toward the spatial filter 31. A position of the spatial
filter 31 is conjugate with the minute-area light source, similar
to the first embodiment, and shades the specularly reflected
component of the reflected light beam. The diffusely reflected
component passes through the spatial filter 31 and the imaging lens
32 to form an image of the pattern on the imaging element 33.
[0086] In a third modification, shown in FIG. 7, an objective lens
is composed of an illumination lens (a first lens) 21 through which
an illumination light beam passes and an objective lens (a second
lens) 22 through which the reflected light beam from the surface 1a
of the silicon wafer OR passes. These lenses 21, 22 are disposed
such that the optical axes A.times.1, A.times.2 thereof cross each
other at the surface 1a of the silicon wafer OR. The other
arrangement and operation of the third modification are the same as
those of the first embodiment. It should be noted that in the third
modification, the minute-area light source is located at a focal
point of the first lens 21, and the filter 31 is located at a focal
point of the second lens 22.
[0087] FIGS. 8 and 9 show further modifications of the first
embodiment. These modifications have substantially the same
structure as that of the second modification of FIG. 6. The
modification shown in FIG. 8 is used when an object to be read has
a convex spherical surface 1b and the modification shown in FIG. 9
is used when an object to be read has a concave spherical surface
1c.
[0088] In FIG. 8, an objective lens 20 makes a minute-area light
source provided by a pinhole 12a conjugate with the center of
curvature of the object surface 1b and causes an illumination light
beam to be incident on the object surface 1b as a converging light
beam that is substantially perpendicular to the object surface 1b.
The illumination light beam is diffusely reflected at edges of the
impressed pattern and specularly reflected at portions other than
the edges. These reflected components then become incident on the
objective lens 20 again. In particular, the specularly reflected
component passes through the objective lens 20 along the same
optical path as the illumination light beam.
[0089] In FIG. 9, an objective lens 23 makes a minute-area light
source provided by a pinhole 12a conjugate with the center of
curvature of the object surface 1c and causes an illumination light
beam to be incident on the object surface 1c as a diverging light
beam that is substantially perpendicular to the object surface 1c.
The illumination light beam is diffusely reflected at edges of the
impressed pattern and specularly reflected at portions other than
the edges. The reflected components are then incident on the
objective lens 23 again. In particular, the specularly reflected
component passes through the objective lens 20 along the same
optical path as the illumination light beam.
[0090] Note, the minute-area light source may also be a light
emitting diode rather than the combination of the halogen lamp 11
and the pinhole plate 12 used in the above and following
embodiments and modifications. Because the light emitted by the
light emitting diode is concentrated at a central portion, the
light emitting diode may be suitably used as a minute-area light
source that is near to a point light source. Alternatively, a
combination of a lamp and an optical fiber may also be used to
realize the minute-area light source. That is, the lamp and an
incident end of the optical fiber may be located at a separated
position, and the other end of the optical fiber can be used as the
minute-area light source.
[0091] As described above, according to the first embodiment,
because an image is formed using only the diffusely reflected
component of the reflected light beam from an object (i.e., the
specularly reflected component is prevented from reaching the
imaging device), a pattern, such as a serial number, or the like,
formed on a reflective surface, such as a silicon wafer, can be
easily read. Therefore, the pattern can be easily and accurately
recognized by displaying the pattern or using character recognition
techniques to decode the pattern. In particular, even if a pattern
has deteriorated through processes such as etching, vapor
deposition, and the like, it can be easily read.
[0092] Second Embodiment
[0093] FIGS. 10(A), (B) and (C) show optical systems for a pattern
reading apparatus according to a second embodiment and
modifications thereof. The second embodiment is an example of a
filtering optical system for detecting a pattern contained in a
light-transmission-type object OT. A light beam emitted from a lamp
(not shown) passes through a pinhole plate 12 to form a minute-area
light source, and the light emitted from the minute-area light
source is incident on the object OT through an illumination lens
(first lens) 21. The light beam then passes through an objective
lens (second lens) 22, a spatial filter 31, and an imaging lens 32,
to form an image of the object OT on an imaging surface 33a.
[0094] The spatial filter 31 has a shading region at a center
thereof for shading the portion of the light beam from the
minute-area light source which has not been scattered by the object
OT. In the second embodiment, the spatial filter 31 is disposed
nearer to the objective lens 22 than a paraxial image point IM of
the minute-area light source. The spatial filter 31 is similar to
ones shown in FIG. 2 or FIG. 3.
[0095] In FIG. 10(A), the objective lens 22 is a Fourier
transformation lens. In this case, the minute-area light source is
located at the front focal point of the illumination lens 21 such
that the object OT is illuminated by a parallel light beam. In
addition, the object OT is located at the front focal point of the
objective lens 22 (the Fourier transformation lens). The back focal
point of the objective lens 22 coincides with the front focal point
of the imaging lens 32, and the imaging surface 33a is located at
the focal point of the imaging lens 32.
[0096] In the first embodiment, the spatial filter 31 is located at
the conjugate position of the minute-light source with respect to
the objective lens 20. In other words, in the first embodiment, the
spatial filter 31 is located at the paraxial image point IM of the
minute-area light source, that is, at the back focal point of the
objective lens 20. However, if the objective lens includes
aberrations such as spherical aberration, coma, or curvature of
field, the spread of the image of the minute-area light source is
not reduced to a minimum at exactly the paraxial image point
IM.
[0097] Thus, in the second embodiment, the spatial filter 31 is
disposed at a position where the image of the minute-area light
source is a minimum size after taking the effect caused by the
spherical aberration of the objective lens 22 and the effect
resulting from the coma and curvature of field caused by abaxial
rays into consideration. With this arrangement, the shading region
may be made smaller than a region which is located at the paraxial
image point IM.
[0098] Specifically, the spatial filter 31 is disposed at the
position which satisfies the condition that the distance L from the
final surface of the objective lens 22 to the spatial filter 31 is
0.60 of<L<0.95 of, wherein of is the focal length of of the
objective lens 22. Because the size of the image of the light
source at a point within the range of 0.60 of<L<0.95 fo is
smaller than the size at the paraxial image point IM (L=fo), the
shading region can be made smaller than that of the first
embodiment. Note, when the above arrangement is applied to an
actual optical system, it is preferable to determine a position
where the size of the image of the minute-area light source is
minimized by tracing light rays. The spatial filter 31 is then
placed at an appropriate position in accordance with the shape of
the image.
[0099] FIG. 10(B) shows a modification of the optical system in
FIG. 10(A) arranged to permit an adjustment of magnification. In
the arrangement shown in FIG. 10(A), since the light beam emitted
from a point on the object OT becomes a parallel light beam after
passing through the objective lens 22, as shown by a dotted line,
magnification cannot be changed by moving the imaging lens 32. In
order to allow magnification to be changed by moving the imaging
lens 32, the optical system in FIG. 10(B) is arranged such that a
distance X from the object OT to an objective lens 22 is set
shorter than the focal length of the objective lens 22. With this
arrangement, a light beam from a point on the object OT passes
through the objective lens 22 to be a non-parallel light beam, and
accordingly the magnification can be changed by moving an imaging
lens 32 and an imaging surface 33a.
[0100] In particular, it is preferable that the distance X
satisfies the condition 0<X <0.7 fo where the focal length of
the objective lens is fo. In this arrangement, because the paraxial
image point IM where the image of the light source is formed will
also be closer to the object OT, the spatial filter 31 can also be
located nearer to the object OT as compared with the optical system
of FIG. 10(A). With this arrangement, the movable range of the
imaging lens 32 is larger, providing a wider variable magnification
range.
[0101] As a further modification, in FIG. 10(C), the position of a
minute-area light source is located farther from an illumination
lens 21 than the front focal point of the illumination lens 21.
With this arrangement, since the illumination light beam emitted
from the illumination lens 21 is a converging light beam, the
position of the image of the minute-area light source formed
through an objective lens 22 is formed nearer to the object OT, so
that the movable range of the imaging lens 32 can be further
increased allowing an even wider variable magnification range.
[0102] According to the second embodiment and its modifications,
since the spatial filter 31 is disposed at the position where the
size of the image of the minute-area light source formed by the
objective lens is smallest, the area of the shading region of the
spatial filter may be made as small as possible, such that a bright
image of the emphasized image of the pattern can be formed.
Further, the magnification of the image formed on the imaging
device can be made variable.
[0103] Third Embodiment
[0104] FIGS. 11(A) and 11(B) show optical systems of the pattern
reading apparatus according to a third embodiment. The third
embodiment is an example of a filtering optical system for
detecting a pattern contained in a reflection type object to be
detected similar to the first embodiment.
[0105] In FIG. 11 (A), a light beam from a lamp (not shown) is
incident on a pinhole plate 12 to form a minute-area light source.
Light from the minute-area light source passes through an objective
lens 20 and is obliquely incident on a reflection type object OR.
The light beam reflected at the object OR is converged through the
objective lens 20, passes through an imaging lens 32, and forms a
pattern image of the object OR on an imaging surface 33a. In this
embodiment, the objective lens 20 is rotatable about a rotation
axis Rx that is perpendicular to a plane of incidence and
intersects the optical axis Ax of the objective lens 20.
[0106] A portion of the illumination light beam which is incident
on the objective lens 20 from the pinhole plate 12 is reflected by
the objective lens 20 and may be incident on the imaging lens 32 as
a ghosting light. If the ghosting light overlaps the pattern image,
the contrast of the image is reduced and accordingly it may be
difficult to read the pattern image. Thus, in this embodiment, the
direction in which the ghosting light is reflected is changed by
turning the objective lens 20. In particular, because the direction
of the ghosting light is very sensitive to the rotation of the
objective lens 20, but the direction of the transmitted light beam
is less sensitive to the rotation of the objective lens 20, it is
possible to change a position of the ghosting light without
substantially changing the position of the pattern image. In this
embodiment, the spatial filter is not used. By reducing the
ghosting light, the contrast of the pattern image can be improved
to make it easier for a user to recognize the pattern image.
[0107] FIG. 11(B) shows a modification of the third embodiment,
arranged such that a light beam from a pinhole plate 12 passes
through the objective lens 20 and is perpendicularly incident on
the object OR. A portion of the reflected light beam from the
object OR passes through the objective lens 20, is reflected at a
beam splitter 40, and is incident on the imaging lens 32. As in the
arrangement of FIG. 11(A), the objective lens 20 is rotatable about
the rotation axis Rx that is perpendicular to a plane of incidence
and intersects the optical axis Ax of the objective lens 20. As a
result, it is possible to adjust a position of ghosting light so
that the ghosting light does not overlap the pattern image on the
imaging surface 33a.
[0108] The optical system of the third embodiment may also include
a spatial filter similar to that of the first and second
embodiments.
[0109] In this case, the effect of turning the objective lens can
be used to control the position of the image of the minute-area
light source formed on the spatial filter in addition to
controlling the direction of the ghosting light.
[0110] According to the third embodiment, when the reflection on
the surface of the objective lens prevents observation, and when
the reflection surface of a reflection type object is tilted, a
desired filtered output image can be obtained. The filtered output
image can be obtained by changing the position where an image is
formed by turning the objective lens a predetermined angle about
the turning axis of the objective lens. The turning axis is
perpendicular to the optical axis thereof.
[0111] Fourth Embodiment
[0112] FIGS. 12(A) and 12(B) show an optical system included in a
pattern reading apparatus according to a fourth embodiment. This is
an example of a filtering optical system for detecting a pattern
contained in a light-transmission-type object, similar to the
second embodiment.
[0113] A light beam emitted from a lamp (not shown) passes through
a pinhole plate 12 to form a minute-area light source. The light
emitted from the minute-area light source passes through an
illumination lens 21, and is incident on a light-transmission-type
object OT. The light beam passes through the object OT, through an
objective lens 22, through a spatial filter 31, and forms an
emphasized image of the object OT on an imaging surface 33a. The
spatial filter 31 has a shading region at the center thereof for
shading the light beam which forms the image of the light source.
In this embodiment, as in the second embodiment, the spatial filter
31 is disposed nearer to the objective lens 22 than the paraxial
image point IM of the light source. As in the third embodiment, the
objective lens 22 is rotatable about a rotation axis Rx that is
perpendicular to the optical axis thereof as shown in FIG.
12(A).
[0114] FIG. 12(A) shows a case in which the surface of the object
OT is not homogeneous. In this case, the shape of the image of the
minute-area light source may be deformed and may not conform with
the shape of the pinhole. Thus, there is a possibility that the
image of the minute-area light source will not coincide with the
shading region of the spatial filter 31. By rotating the objective
lens 22, the shape of the image of the minute-area light source is
changed due to a change of coma and the objective lens 22 may be
rotated until the image of the minute-area light source coincides
with the shading region.
[0115] FIG. 12(B) shows a case in which the object OT is shaped and
functions as a prism. In this case, the light beam forming the
image of the minute-area light source is directed slightly upward
from the optical axis, and may not be shaded by the shading region
of the spatial filter 31. To cope with this problem, the objective
lens 22 is rotated a predetermined acute angle counterclockwise (as
shown in FIG. 12(B)) about the rotation axis Rx. The rotation of
the objective lens 22 adjusts the position of the image of the
minute-area light source, so that the light beam which forms the
image of the light source is appropriately shaded by the spatial
filter 31.
[0116] Fifth Embodiment
[0117] FIGS. 13(A), 13(B), and 13(C) show an optical system for a
pattern reading apparatus according to a fifth embodiment. This is
an example of a filtering optical system for detecting a pattern
contained in a light-transmission-type object, similar to the
second embodiment.
[0118] A light beam emitted from a lamp (not shown) passes through
a pinhole plate 12 to form a minute-area light source. The light
then passes through an illumination lens 21, and is incident on a
light-transmission-type object OT. The light beam passes through
the object OT, through an objective lens 22, through a spatial
filter 31, and forms an emphasized image of the object OT on an
imaging surface 33a. The spatial filter 31 has a shading region at
the center thereof for shading the portion of the light beam which
forms the image of the minute-area light source. In this
embodiment, the spatial filter 31 is disposed nearer to the
objective lens 22 than the paraxial imaging point IM of the
minute-area light source. In the fifth embodiment, the lamp (not
shown) and the pinhole plate 12 are movable in a plane
perpendicular to an optical axis as shown by an arrow A in FIG.
13(A). Further, the spatial filter 31 is also movable in a plane
perpendicular to the optical axis as shown by an arrow B in FIG.
13(A).
[0119] In the optical system shown in FIG. 13(A), the pinhole plate
12 is located at the front focal point of the illumination lens 21
and the object OT is located at the front focal point of the
objective lens 22 (the Fourier transformation lens). The back focal
point of the objective lens 22 coincides with the front focal point
of the imaging lens 32 and the imaging surface 33a is located at
the focal point of the imaging lens 32.
[0120] FIGS. 13(B) and 13(C) show a case in which the object OT has
a prism shape. In this case, since the light beam from the object
OT is refracted upward (in the view of FIGS. 13(A), 13(B), and
13(C)), the portion of the light beam that forms the image of the
minute-area light source may not be shaded by the shading region of
the spatial filter 31. In this case, as shown in FIG. 13(B), the
light source and the pinhole plate 12 may be moved a predetermined
amount upward to adjust the position of the image of the
minute-area light source such that the portion of the light beam
which forms the image of the minute-area light source is shaded by
the spatial filter 31. In FIG. 13(B), a solid line indicates the
case that a pinhole is located on the optical axis and a
dot-dash-line indicates the case that the pinhole plate is moved
upward. Alternatively, as shown in FIG. 13(C), the spatial filter
31 may be moved a predetermined amount upward (in the view of FIG.
13(C)) in a plane perpendicular to the optical axis in order to
ensure that the position of the image of the minute-area light
source coincides with the shading region of the spatial filter
31.
[0121] According to the fifth embodiment, even if an object
functions as a prism, the image of the light source can be caused
to coincide with the shading region of the spatial filter by
adjusting the position of the light source or the position of the
spatial filter. The above-described principle can be applied to a
system using the reflection type object.
[0122] Sixth Embodiment
[0123] FIGS. 14 to 23 show a pattern reading apparatus according to
a sixth embodiment. The apparatus of the sixth embodiment is for a
reflection type object and provides all the features described in
the second to the fifth embodiments, that is:
[0124] (1) the spatial filter 31 is placed nearer to the objective
lens 20 than the paraxial image point IM;
[0125] (2) the magnification is adjustable;
[0126] (3) the objective lens 20 is rotatable about the axis Rx
which is perpendicular to a plane of incidence; and
[0127] (4) the lamp 11 and the pinhole plate 12 and/or the spatial
filter 31 are movable in a direction perpendicular to the optical
axis of the objective lens 20.
[0128] As shown in a schematic view in FIG. 14, the optical system
of the apparatus includes an illumination unit 10, an objective
lens 20, and a detection unit 30. The objective lens 20 is disposed
such that the optical axis Ax thereof is perpendicular to the
surface 1a of a silicon wafer OR (i.e., a reflection surface) in a
standard position. The illumination unit 10 and the detection unit
30 are disposed approximately symmetrically on opposite sides of
the optical axis Ax of the objective lens 20 in the standard
position.
[0129] The illumination unit 10 includes a lamp 11, a pinhole plate
12 formed with a pinhole 12a to form a minute-area light source,
and a diffusion plate 13 provided between the lamp 11 and the
pinhole plate 12. The detection unit 30 includes a spatial filter
31, an imaging lens 32, and an imaging element 33. In the example
of FIG. 14, the detection unit 30 is disposed on a line which
extends in a direction in which a specularly reflected component of
light from the minute-area light source is reflected from the
surface 1a.
[0130] The light beam emitted from the lamp 11 passes through the
pinhole 12a, through the objective lens 20, and is incident on the
surface 1a. The light beam is reflected at the surface 1a, passes
through the objective lens 20 again, and is incident on the spatial
filter 31. In this embodiment, the pinhole 12a (the minute-area
light source) is positioned at a front focal position of the
objective lens 20 (i.e., a position on a plane which is
perpendicular to the optical axis Ax of the objective lens 20, and
which includes a front focal point of the objective lens 20) such
that the light beam emitted from the objective lens 20 is a
parallel light beam and obliquely illuminates the surface 1a of the
silicon wafer OR. The illumination light beam is diffusely
reflected at an impressed pattern portion of the surface 1a and
specularly reflected at portions other than the above.
[0131] The light beam reflected at the surface 1a passes through
the objective lens 20 again, is transformed into a converging light
beam directed toward the detection unit 30 and reaches the spatial
filter 31. The spatial filter 31 is disposed nearer to the
objective lens 20 than the paraxial image position of the
minute-area light source.
[0132] The diffusely reflected component, which has passed through
the spatial filter 31, of the light beam reflected at the surface
1a is incident on the imaging lens 32. The imaging lens 32 forms
the emphasized image of the pattern impressed on the surface 1a on
the imaging element 33 by the diffusely reflected component. The
imaging element 33 converts the information of the emphasized image
of the pattern into an electric signal and outputs the signal to an
image processing apparatus (not shown).
[0133] The objective lens 20 is rotatable about a rotation axis Rx,
as shown by the arrow R in FIG. 14. In this embodiment, the
rotation axis Rx is parallel with a line where a plane, which is
perpendicular to the principal beam Ax1 of the illumination light
beam, crosses a plane which is perpendicular the optical axis Ax2
of the imaging lens 32 (i.e., the rotation axis Rx is perpendicular
to a plane of incidence and crosses the optical axis Ax). The
objective lens 20 is rotatable with a range of about .+-.45 degrees
from the standard position.
[0134] If a ghosting light, i.e., a reflection at the surface of
the objective lens 20, is incident on the imaging lens 32 and
overlaps the position of the pattern image on the imaging element
33, the objective lens 20 is rotated so that the ghosting light
does not overlap the pattern image.
[0135] When the distribution of the diffusely reflected light beam
is uneven on the surface 1a, there is a possibility that the shape
of the image of the light source is changed and displaced from the
shading region 3b of the spatial filter 31. In such a case, the
shape of the image of the light source can be changed by
controlling coma by turning the objective lens 20.
[0136] Further, the illumination unit 10 is adjustable in a
direction, shown by the arrow S1, in a plane perpendicular to the
optical axis Ax in order to adjust the position of the image of the
minute-area light source with respect to the shading region 31b of
the spatial filter 31. Still further, the spatial filter 31 is
adjustable in a direction, shown by the arrow S2, in a plane that
is perpendicular to the optical axis Ax2 of the imaging lens
32.
[0137] In this way, if the surface 1a is tilted, the position where
the image of the light source is formed can be adjusted to coincide
with the shading region 31b by adjusting the position of the
illumination unit 10 and/or the spatial filter 31.
[0138] Still further, the imaging lens 32 and the imaging element
33 are arranged such that they are movable along the optical axis
Ax2 of the imaging lens 32, shown by the arrow S3, to change
magnification. In addition, to permit the magnification to be
changed by the movement of the imaging lens 32, the distance
between the objective lens 20 and the surface 1a (object surface)
is set to satisfy the condition 0<X<0.7 fo, where fo is the
focal length of the objective lens 20. When this condition is
satisfied, since a light beam emitted from a point on the surface
1a a is not parallel after passing through the objective lens 20,
the magnification can be changed by moving the imaging lens 32
along the optical axis Ax2.
[0139] FIG. 15 shows an expanded optical path of the optical system
of FIG. 14. The light beam emitted from the pinhole plate 12, is
collimated to be a parallel light beam by the objective lens 20,
reflected at the surface 1a (passes therethrough in FIG. 15), is
incident on the objective lens 20 again, passes through the spatial
filter 31 as a converging light beam, passes through the imaging
lens 32, and forms an image of the pattern on the imaging element
33. The optical system in FIG. 14 is fundamentally equivalent to
the optical system of the second embodiment shown in FIG. 10(B)
except with respect to the incident direction of the light beam and
the transmission/reflection characteristics of the object. That is,
in the example in FIG. 14, the surface 1a is nearer to the
objective lens 20 than the focal point thereof and a light beam
from a point on the surface 1a is incident on the imaging lens 32
not as a parallel light beam but as divergent light.
[0140] FIG. 16 shows a design example when it is assumed that the
length of a pattern to be read is 2 cm and the size of the imaging
surface of an imaging element is 1/2 inch across a diagonal. In
this example, the imaging lens 32 has a focal length of 50 mm and
the objective lens 20 has a focal length fo of 220 mm. Further, a
distance b from the pinhole 12a to the surface 1a of the silicon
wafer OR is about 270 mm, a distance c from the objective lens 20
to the surface 1a is about 50 mm, and a distance L from a final
surface of the objective lens 20 to the spatial filter 31 is about
190 mm. Therefore, the condition 0.60 fo<L<0.95 fo, described
above, is approximately 130 mm<L<210 mm in this example.
Further, the condition 0<X<0.7 fo, also described above, is
0<X<154 mm.
[0141] FIGS. 17(A) through 17(H) are spot diagrams showing the
shape of the image of a minute-area light source calculated based
on the model shown in FIG. 16, that is, the distribution of the
light beam from the surface 1a which constitutes the specularly
reflected component, at various distances DF from the paraxial
image point of the minute-area light source. The distance DF is 0
at the paraxial image point and a minus sign represents a position
closer to the objective lens 20. In the example, since the size of
the image of the minute-area light source is minimized about 30 mm
or 40 mm closer to the objective lens from the paraxial image
point, the disposition of the spatial filter in this range permits
the specularly reflected component to be shaded by a small shading
region so that a maximum possible quantity of light can be used to
form a bright image of the pattern.
[0142] Next, a specific mechanical arrangement of an apparatus
including the optical system shown in FIG. 14 is described with
reference to FIGS. 18 and 19. Note, as shown in FIG. 18, a
coordinate system x, y, z is defined in which the x-axis is
parallel with the optical axis Ax of the objective lens 20 at the
standard position. Further, the principal beam Ax1 of an
illumination light beam and the optical axis Ax2 of an imaging lens
are contained in an x-z plane.
[0143] The pattern reading apparatus of the sixth embodiment
includes a base frame 100 on which a silicon wafer (i.e., an object
to be inspected) is placed at a reference position T, shown by a
dot-dash-line, and a movable frame 200 which is disposed on the
base frame 100, is supported by bearings 101 so as to slide in the
direction y with respect to the base frame 100.
[0144] The movable frame 200 is moved by a frame drive mechanism
210 (shown in FIG. 19). As shown in FIG. 19, the frame drive
mechanism 210 includes a ball screw 211 which is disposed to a
screw support portion 102, secured to the base frame 100 in such a
manner that the rotation of the ball screw 211 can be adjusted, and
a threading member 212 which is secured to the horizontal support
plate 201 (parallel with a y-z plane) of the movable frame 200. The
ball screw 211 includes an operation knob 211a on an outer side
thereof for operation by an inspector and a screw portion 211b
formed on an inner side, i.e., a portion projecting toward the
movable frame 200. The screw portion 211b of the ball screw 211 is
screwed into a screw hole provided in the threading member 212.
Thus, when the ball screw 211 is rotated, the movable frame 200
slides in the direction y.
[0145] The movable frame 200 is provided with a horizontal support
plate 201 and a tilt mechanism 220 is disposed to the horizontal
support plate 201 for rotatably supporting the objective lens 20. A
column 202 extends perpendicularly from the horizontal support
plate 201 and a vertical support plate 203 (parallel with the x-z
plane) is secured to the column 202. The vertical support plate 203
supports an optical fiber 11d and a pinhole plate 12 which
constitute a minute-area light source and an imaging unit 320. The
imaging unit 320 includes a lens barrel 32A housing the imaging
lens 32 and a CCD unit 33A housing the imaging element 33. Optical
path holes 100a, 201a, 221a are formed in the horizontal support
plate 201, the base frame 100, and the base plate 221,
respectively, such that the light beam from the lamp 11 may pass
through to the silicon wafer to allow the reflected light beam from
the silicon wafer to pass to the imaging unit 320.
[0146] The tilt mechanism 220 includes the column 202, the base
plate 221, and a bearing unit 222 (see FIG. 19). The base plate 221
is disposed between the column 202 and the support member 204 (see
FIG. 18). The support member 204 extends from the horizontal
support plate 201 in parallel with the column 202. The bearing unit
222 extends below the base plate 221. The objective lens 20 is
accommodated in a lens frame 223 having a rotation shaft 223a
extending in the direction y. The lens frame 223 is rotatably
mounted to the bearing unit 222 through the turning shaft 223a.
Opposite ends of the turning shaft of the lens frame 223 project
from the bearing unit 222. A follower pulley 224 is secured to the
end of the turning shaft projecting toward the frame drive
mechanism 210 and a rotary plate 225 of an encoder is secured to
the other end thereof.
[0147] A lens drive motor 226 is mounted on the base plate 221 of
the tilt mechanism 220 and a timing belt 227 is stretched between a
drive pulley 226a secured to the rotary shaft of the motor 226 and
the follower pulley 224. The encoder is composed of the rotary
plate 225 mounted on a rotary shaft and a photo interrupter 228
composed of a light emitting element (not shown) and a light
receiving element (not shown) disposed across the rotary plate 225.
The rotary plate 225 has a slit (not shown) formed radially thereon
and is adjusted such that when the objective lens 20 is set at the
standard position, a light beam emitted from the light emitting
element of the photointerrupter 228 is detected by the light
receiving element through the slit. As described above, the
standard position of the objective lens 20 in this example is a
position where the optical axis Ax of the objective lens 20 is set
perpendicular to an ideal object surface (a flat surface).
[0148] The lamp 11 is composed of a halogen lamp 11a, an
infrared-ray cut filter 11b for reducing a heating component of the
converging light beam emitted from the halogen lamp 11a, a negative
lens 11c for making the converging light beam an approximately
parallel light beam, and an optical fiber 11d. A pinhole unit 120
includes the pinhole plate 12, a mounting plate portion 122 formed
perpendicularly to the pinhole plate 12, and a holding unit 121 for
holding the exit end of the optical fiber 11d. The pinhole unit 120
is mounted on the vertical support plate 203 by bolts 123, 123
through the mounting plate portion 122. Securing grooves 124, 124
formed in the mounting plate portion 122 extend in a plane which is
perpendicular to the axis Ax1 of the illumination light beam, so
that, by loosening the bolts 123, the unit 120 is easily movable in
a direction perpendicular to the axis Ax1, i.e., closer to the
imaging unit 320 or away from the imaging unit 320.
[0149] In this example, the optical fiber 11d is a commercially
available optical fiber having a diameter of about 5 mm. Thus, a
pinhole 12a is used reduce the light beam from the optical fiber
11d to a minute-area light source, however, if the optical fiber
11d has a diameter of 1 mm to 2 mm, the pinhole 12a is not
necessary. Further, if the density of the light beam emitted from
the end surface of the optical fiber 11d is uneven, it is
preferable to provide a diffusion plate (not shown) between the end
surface of the fiber 11d and the pinhole 12a.
[0150] The spatial filter 31 is secured to a filter holder 130
which is then secured to the vertical support plate 203. The
spatial filter 31 includes a shading region at the center thereof,
similar to that shown in FIG. 3. The spatial filter 31 is arranged
at a position which is nearer to the objective lens 20 than the
paraxial image point such that the size of the image of the light
source formed by the objective lens 20 is minimized.
[0151] The imaging unit 320 is also mounted on the vertical support
plate 203. The vertical support plate 203 is formed with a slot 205
in a direction parallel to the optical axis Ax2 of the imaging lens
32. The slot 205 includes a first wide step portion 205a formed on
the imaging unit 320 side to a depth approximately half a plate
thickness and a second narrow step portion 205b formed at the
center in the width direction of the first step portion 205a
passing through the vertical support plate 203 from the first step
portion 205a. The imaging unit 320 includes two mounting arms 322
formed thereto that are each inserted through a washer 323 provided
in the first step portion 205a of the slot 205 and then secured by
bolts 321 screwed into the ends of each of the arms 322 from the
opposite side of the vertical support plate 203. The washers 323
have a diameter smaller than the first step portion 205a and larger
than the second step portion 205b. With the above arrangement, the
imaging unit 320 is movable in the direction of the optical axis
Ax2 of the imaging lens 32. Further, the imaging lens 32 can also
be adjusted in the optical axis direction by a lens barrel
adjustment mechanism (not shown). Thus, in the embodiment, the
magnification can be changed by one or both of the above two
adjustments.
[0152] In the apparatus of the sixth embodiment, since the position
T is determined so that the silicon wafer is located closer to the
objective lens 20 than the focal point thereof, the reflected light
beam from a point on the surface of the silicon wafer is incident
on the imaging lens 32 as a divergent light beam. As a result,
according to the arrangement of the sixth embodiment, the
magnification can be changed by moving the imaging lens 32 in the
optical axis direction. However, when the imaging lens 32 is moved
to change the magnification, the focusing state of the pattern to
the imaging element 33 is also changed.
[0153] Thus, in the embodiment, to change the magnification while
maintaining the focusing state of the pattern, the positions of the
imaging lens 32 and the imaging element 33 are adjusted,
respectively, so that they move along the loci shown in FIG. 20. In
FIG. 20, the magnification gradually increases from the upper side
to the lower side and the positions of the imaging lens 32 and the
imaging element 33 are indicated for the case when the surface of
the silicon wafer (object surface) is not moved. That is, when the
imaging lens 32 and the imaging element 33 are located at positions
where an arbitrary horizontal straight line crosses the respective
locus lines, respectively, a pattern image which is formed on the
imaging element 33 is brought into focus at the related
magnification.
[0154] When a pattern is to be read, the silicon wafer is placed at
the reference position T shown by the dot-dash-line in FIGS. 18 and
19, in particular, for a pattern of characters, symbols, and the
like, the silicon wafer is positioned so that the lengthwise
direction of the pattern coincides with the direction y. After the
silicon wafer is positioned, the halogen lamp 11a is lit. The light
beam emitted from the optical fiber 11d passes through the pinhole
12a to form an illumination light beam that is obliquely incident
on the objective lens 20 and is transmitted to the silicon wafer
(object surface).
[0155] The illumination light beam is reflected at the surface of
the silicon wafer, passes through the objective lens 20 again, and
is directed toward the imaging unit 320. The portion of the
reflected light beam corresponding to the image of the light
source, that is, the specularly reflected light beam, is shaded by
the shading region 31b of the spatial filter 31, and other portions
of the reflected light beam, that is, the diffusely reflected light
beam, is incident on the imaging unit 320. An emphasized image of
the pattern is formed on the imaging element 33 by the imaging lens
32 and an image signal is read by driving the imaging element
33.
[0156] If ghosting light, which is caused by surface reflection at
the objective lens 20, overlaps the pattern image, the tilt of the
objective lens 20 is changed by controlling the lens drive motor
226.
[0157] Further, if the surface of the silicon wafer is not flat,
for example, if it has a prism shape, the pinhole unit 120 is moved
closer to or away from the imaging unit 320 in the plane
perpendicular to the principal beam Ax1 of the illumination light
beam so that the image of the light source is formed on the shading
region of the spatial filter 31.
[0158] Note, although the tilt of the silicon wafer itself may also
be adjusted to adjust the position of the image of the light
source, the apparatus according to the present embodiment is
arranged for adjusting the pinhole unit 120. In particular, the
provision of a tilting mechanism for adjusting each object to be
inspected such that the reflected direction of a light beam is
accurately controlled would require high sensitivity and a
complicated mechanism such that the apparatus would be more
expensive.
[0159] FIG. 21 shows an alternative arrangement for adjusting the
position of the pinhole unit 120.
[0160] In this arrangement, a rail member 125 is provided with a
guide groove 125a extending in the direction z and is secured to a
movable frame (not shown). A pinhole unit 120a, to which a pinhole
plate 12 and the exit end of an optical fiber 11d are secured, is
mounted so as to move in the direction z along the guide groove
125a. If this arrangement is combined with the arrangement of FIGS.
18 and 19, the pinhole unit 120a may be moved in a plane which is
perpendicular to the axis Ax1 of the illumination light beam
according to the arrangement shown in FIG. 18 or may be moved in a
plane perpendicular to the optical axis Ax of the objective lens 20
according to the arrangement shown in FIG. 21.
[0161] In a further alternative arrangement, the position of the
spatial filter 31 may be made adjustable for the purpose of
adjusting the relative positional relationship between the image of
the light source and the shading region 31b of the spatial filter
31. FIGS. 22(A), 22(B), and 23 show a mechanism for adjusting the
position of the spatial filter 31. FIG. 22(A) is a plan view of a
movable frame, FIG. 22(B) is a sectional view taken along the line
B - B of FIG. 22(A), and FIG. 23 is a plan view showing the movable
frame assembled to fixed rails.
[0162] As shown in FIGS. 22(A), 22(B), and 23, the rectangular
movable frame includes two rail members 131a, 131a, each having a
C-shaped cross section with the openings thereof facing inward,
disposed parallel to each other and separated by a predetermined
distance. Two beam members 132a, 132b are disposed between the rail
members 131a, 131a at positions near opposite ends thereof. The
spatial filter 31 is inserted into the C-shaped openings of the
rail members 131a, 131b and fixed by presser screws 133. Guide pins
134 are provided on the movable frame at four corners thereof and
are engaged with two guide grooves 136a, 136b formed on fixed rails
135a, 135b.
[0163] According to the arrangement of FIG. 23, the spatial filter
31 is movable in the direction Y with respect to the movable frame
and the movable frame is further movable in the direction Z by
sliding on the fixed rails 135a, 135b. Therefore, the position of
the spatial filter 31 can be adjusted in a Y - Z plane and the
position of the shading region 31b of the spatial filter 31 can be
adjusted so that the image of the light source is formed on the
shading region 31b.
[0164] FIG. 24 shows a modification of the optical system according
to the sixth embodiment. As shown in FIG. 24, the arrangement of
the illumination unit 10 and the imaging lens 32 and the imaging
element 33 of the detection unit 30 are the same as those shown in
FIG. 14. In the modification of FIG. 24, the illumination unit 10
is disposed at a position where an illumination light beam is
perpendicularly incident on the surface 1a of the silicon wafer OR.
That is, a pinhole plate 12 having a pinhole 12a for forming a
minute-area light source is disposed on the optical axis Ax of an
objective lens 20 which is perpendicular to the surface 1a. A beam
splitter 40 is disposed in the optical path between the pinhole
plate 12 and the objective lens 20 to separate the optical path of
the illumination light beam emitted from the illumination unit 10
from the optical path of the reflected light beam from the surface
1a.
[0165] The illumination light beam from the pinhole 12a passes
through the beam splitter 40 and the objective lens 20 to become a
parallel light beam (also parallel with the optical axis Ax) that
illuminates the surface 1a. The reflected light beam from the
surface 1a passes through the objective lens 20 again and becomes a
converging light beam, a portion of which is reflected at the beam
splitter 40 toward the spatial filter 31. The spatial filter 31 is
at a position nearer to the objective lens 20 than a position which
is conjugate with the minute-area light source and shades the
specularly reflected component of the reflected light beam from the
surface 1a. The diffusely reflected component passes through the
spatial filter 31 and the imaging lens 32 to form an image of the
pattern on the imaging element 33.
[0166] Seventh Embodiment
[0167] FIGS. 25(A), (B) show an optical system included in a
pattern reading apparatus according to a seventh embodiment. The
seventh embodiment is an example of a filtering optical system for
detecting a pattern contained in a light-transmission-type object
OT.
[0168] A light beam emitted from a light source (not shown) passes
through a pinhole plate 12 to form a minute-area light source and
is incident on the object OT through an illumination lens 21. The
light beam then passes through an objective lens 22, a spatial
filter 31, and an imaging lens 32, to form an image of the object
OT on an imaging surface 33a.
[0169] The spatial filter 31 has a shading region at the center
thereof for shading a portion of the light beam which forms the
image of the light source and is disposed nearer to the objective
lens 22 than the paraxial imaging surface IM of the light source.
According to the arrangement, the image of the pattern on the
object OT is formed on the image surface 33a only by the scattered
component of light from the object OT.
[0170] In the optical system shown in FIG. 25(A), the pinhole plate
12 is located at the front focal point of the illumination lens 21
and the object OT is illuminated by a parallel light beam. The
object OT is located at the front focal point of the objective lens
22 (the Fourier transformation lens). The back focal point of the
objective lens 22 coincides with the front focal point of the
imaging lens 32 and the imaging surface 33a is located at the focal
point of the imaging lens 32.
[0171] FIG. 25(B) shows the case that the object OT has a prism
shape, such that a light beam is deflected upward (in the view of
FIG. 25(B)), that is, the object OT is formed as a wedge which is
thinner at the lower edge (in the view of FIG. 25(B)). In this
case, if the objective lens 22 is left in the state shown in FIG.
25(A), the image of the light source deviates upward and the
portion of the light beam forming the image of the light source may
not be shaded by the shading region of the spatial filter 31. To
cope with this problem, as shown in FIG. 25(B), the objective lens
22 is arranged to be movable a predetermined distance in a
direction opposite to the direction in which the light beam is
refracted by the wedge, that is, to be moved downward in the view
of FIG. 25(B). The deviation of the image of the light source
caused by the prism shape of the object OT can be compensated for
by movement of the objective lens 22. As a result, the portion of
the light beam which forms the image of the light source can be
appropriately shaded by the spatial filter 31.
[0172] Specifically, in the example in FIG. 25(B), if it is assumed
that the object OT is thinner at the lower side, has an angle (the
apex of the prism) of 20 minutes, and a refractive index of 1.5 and
the objective lens 22 has a focal length of 200 mm, the deviation
of the image of the light source caused by the effect of the wedge
can be compensated by parallel movement of the objective lens 20 by
about 300 .mu.m in a direction which is opposite to the direction
in which the object OT is thinner (downward), that is, in the
direction in which the light beam is deflected by the wedge.
[0173] Eighth Embodiment
[0174] FIG. 26 to FIG. 28 show the arrangement of a pattern reading
apparatus according to an eighth embodiment. The eighth embodiment
is an example in which the principle of the parallel movement of
the objective lens in the seventh embodiment is applied to an
optical system for detecting a pattern contained in a
light-reflection-type object.
[0175] As shown in FIG. 26, the optical system of the apparatus is
composed of an illumination unit 10, an objective lens 20, and a
detection unit 30. The objective lens 20 is a bi-convex lens and is
disposed such that the optical axis Ax thereof is perpendicular to
the surface 1a of a silicon wafer OR (reflection surface). The
illumination unit 10 and the detection unit 30 are disposed
approximately symmetrically on opposite sides of the optical axis
Ax of the objective lens 20. As shown in FIG. 26, in this
embodiment, the optical axis Ax1 of the illumination unit 10 and
the optical axis Ax2 of the detection unit 30 cross the optical
axis Ax of the objective lens at the surface 1a. The objective lens
20 is supported by a shift mechanism 400 so as to be movable
perpendicular to the optical axis Ax of the objective lens 20 as
well as in parallel with a direction X which is parallel with a
plane containing the optical axes Ax1, Ax2 (which coincides with
the paper surface in FIG. 26). The amount of parallel movement M of
the objective lens 20 should approximately satisfy the following
condition:
[0176] D/2<M<D/2,
[0177] where D is the diameter of the objective lens 20.
[0178] The illumination unit 10 includes a lamp 11 such as a
halogen lamp, or the like, and a pinhole plate 12 in which a
pinhole 12a is formed to permit a portion of the light beam emitted
from the light source to pass therethrough to form a minute-area
light source. A diffusion plate 13 is interposed between the lamp
11 and the pinhole plate 12 to eliminate any effect due to an image
of a filament of the lamp 11.
[0179] The detection unit 30 includes a spatial filter 31, an
imaging lens 32, and an imaging element 33, such as a CCD image
sensor, or the like. In the embodiment shown in FIG. 26, the
detection unit 30 is disposed on a line extending in a direction in
which light from the light source will be specularly reflected from
the surface 1a.
[0180] A light beam emitted from the lamp 11 becomes a parallel
light beam after passing through the objective lens 20 and
obliquely illuminates the surface 1a of the silicon wafer OR. In
particular, the pinhole 12a is disposed at the front focal position
of the objective lens 20 (i.e., a position on a plane which is
perpendicular to the optical axis Ax of the objective lens 20, and
which includes a front focal point of the objective lens 20). The
parallel light beam is diffusely reflected at edges of the pattern
and specularly reflected at portions other than the edges.
[0181] The reflected light beam from the surface 1a passes through
the objective lens 20 again, and becomes a converging light beam
directed toward the detection unit 30. The spatial filter 31 is
disposed between the imaging lens 32 and the objective lens 20 at a
position nearer to the objective lens 20 than the image of the
light source formed by the objective lens 20. Thus, only the
diffusely reflected component that passes through the spatial
filter 31, is incident on the imaging lens 32, and the image of the
pattern impressed on the surface 1a is formed on the imaging
element 33 by the diffusely reflected component. The imaging
element 33 converts the image of the pattern into an electric
signal and outputs the signal to an image processing apparatus (not
shown).
[0182] The parallel movement of the objective lens 20 is effective
to prevent the effect of the ghosting light in the reflection-type
system, similar to the eighth embodiment, in addition to compensate
for the effect due to the wedge-shaped object as described for the
fifth embodiment.
[0183] In particular, when ghosting light, which is made by
reflection at the surface of the objective lens 20, is incident on
the imaging lens 32 and overlaps the position of the image pattern
on the imaging element 33, it is difficult to read the image
pattern because the contrast thereof is lowered. In such a case, by
adjusting the objective lens 20, by the parallel movement thereof,
so that the ghosting light does not overlap the image pattern, the
contrast is not lowered and the pattern can be correctly read.
Further, if the surface 1a is tilted, for example if the silicon
wafer OR has a wedge shape, the position where the image of the
light source is formed can be adjusted to coincide with the shading
region of the spatial filter 31 by parallel movement of the
objective lens 20.
[0184] When the objective lens is moved to lower the effect of the
ghosting light, at least the surface of the objective lens 20,
where the ghosting light is made, must be a curved surface. When
both the surfaces of the objective lens 20 are curved as in the
case of FIG. 26, both ghosting light caused by the surface
reflection arising at the lens surface on the side of the light
source and ghosting light due to the inner surface reflection
caused at the lens surface on the side of the silicon wafer OR can
be eliminated by the parallel movement of the objective lens
20.
[0185] FIG. 27 is a plan view showing the arrangement of the shift
mechanism 400 for parallel movement of the objective lens 20 and
FIG. 28 is a side view thereof. The objective lens 20 is supported
by a flat-plate-shaped lens holder 410. The lens holder 410 is
guided by a pair of guide rails 420, 421 and is movable in a
direction X. The guide rails 420, 421 are coupled with each other
by bridge members 430, 431 at ends thereof. Thus, a rectangular
frame is formed by the guide rails 420,421 and the bridge members
430, 431.
[0186] A pair of tension springs 440,441 are interposed between the
lens holder 410 and the bridge member 430 such that the lens holder
410 is drawn towards the bridge member 430. Further, a micrometer
head 450 is fixed to the center of the bridge member 430 and an end
of the micrometer head 450 abuts the lens holder 410 such that the
position of the lens holder 410, that is, the position of the
objective lens 20 may be adjusted by rotating the micrometer
head.
[0187] In particular, the micrometer head 450 may be rotated such
that the lens holder 410 moves downward in the view of FIG. 27
against the urging force of the springs 440, 441, or such that the
lens holder 410 moves upward in the view of FIG. 27 by being pulled
by the springs 440, 441. Thus, the objective lens 20 can be set to
an optimum position, that is, a position where the image of the
light source coincides with the shading portion of the spatial
filter 31 and ghosting light is not incident on the imaging element
33 by adjusting the micrometer head 450 while observing an image
formed on the imaging element 33.
[0188] If the silicon wafer OR also has a tilt or wedge shape in a
direction perpendicular to the paper surface of FIG. 26 (direction
Y), it is preferable to also adjust the objective lens 20 in the
direction Y. FIG. 29 is a plan view showing an alternative shift
mechanism by which the objective lens 20 may also be adjusted in
the direction Y, perpendicular to the optical axis Ax of the
objective lens 20 as well as perpendicular to the direction X. The
shift mechanism includes a Y-direction shift mechanism 500 and the
X-direction shift mechanism 400 shown in FIG. 27.
[0189] The Y-direction shift mechanism 500 includes a pair of guide
rails 520, 521 for guiding the X-direction shift mechanism 400 for
parallel movement and bridge members 530, 531 for coupling the
guide rails 520, 521 at the ends thereof to form a rectangular
frame. A pair of tension springs 540, 541 are interposed between
the bridge member 530 and the guide rail 421 of the x-direction
shift mechanism 400 such that the X-direction shift mechanism 400
is drawn towards the bridge member 530. Further, the bridge member
530 is provided with a micrometer head 550, an end of which is
abutted against the guide rail 421.
[0190] Similar to the above, the micrometer head 550 may be
adjusted such that the x-direction shift mechanism 400 is moved
against the urging force of the springs 540, 541 or such that the
x-direction shift mechanism 400 is moved by being pulled by the
springs 540, 541. Thus, according to the arrangement of FIG. 29, if
the silicon wafer OR has a tilt or wedge component in any
direction, the objective lens 20 can be set to a position where the
image of the light source coincides with the shading portion of the
spatial filter 31 and ghosting light is not incident on the imaging
element 33 by adjusting the objective lens 20 in the X - Y
direction.
[0191] Note that the amount of shift of the objective lens with
respect to the angle of the silicon wafer OR is different depending
upon a direction in which the angle is formed. For example, if the
silicon wafer OR is tilted 1 degree in the direction X, a light
beam is angularly changed only in the direction X and the amount of
change is about 2 degrees, whereas if the silicon wafer OR is
tilted 1 degree in the direction Y, the light beam is angularly
changed 1.4 degrees in the direction Y and angularly changed by a
small amount in the direction X. Therefore, when the silicon wafer
OR is tilted in the direction X, it suffices to shift the objective
lens 20 in only the direction X, however, when the silicon wafer OR
is tilted in the direction Y, the objective lens 20 should be
adjusted in both the directions X and Y.
[0192] Ninth Embodiment
[0193] FIG. 30(A) shows an optical system included in a pattern
reading apparatus according to a ninth embodiment. The ninth
embodiment is an example of a filtering optical system for
detecting a pattern contained in a light-transmission-type
object.
[0194] A light beam emitted from a light source (not shown) passes
through a pinhole plate 12 to form a minute-area light source and
is directly incident on the object OT without passing through a
lens. The light beam passes through the object OT, through an
objective lens 22, and through a spatial filter 31, to form an
image of the object OT on an imaging surface 33a. The spatial
filter 31 has a shading region at the center thereof for shading
the portion of the light beam which forms the image of the light
source, i.e., a portion of the light beam that is not scattered by
the object OT. The spatial filter 31 is disposed nearer to the
objective lens 22 than the paraxial image point IM of the light
source.
[0195] In the optical systems for reading the pattern of the
light-transmission-type object in the above embodiments, an
illuminating lens is interposed between the pinhole plate 12 and
the object OT, an objective lens is interposed between the object
OT and the spatial filter, and an imaging lens is interposed
between the spatial filter and the imaging element. Thus, there are
three lenses. On the other hand, in the optical system shown in
FIG. 30(A), since the light beam is directly incident on the object
OT, only two lenses are required, such that the cost of the optical
system can be reduced.
[0196] The optical system in FIG. 30(B) shows a modification of the
ninth embodiment in which the imaging lens 32 of FIG. 30(A) is not
required. In this case, the objective lens 22 is provided with an
imaging power for forming the image of a pattern on the imaging
element 33. According to the arrangement shown in FIG. 30(B), only
one lens is included in the optical system, such that the cost of
the optical system can be further reduced from that of the
arrangement in FIG. 30(A).
[0197] Tenth Embodiment
[0198] FIG. 31 shows an arrangement of a pattern reading apparatus
according to a tenth embodiment. The tenth embodiment is an example
in which the principle of reducing the number of lenses of the
ninth embodiment is applied to an optical system for detecting a
pattern contained in a light-reflection-type object.
[0199] In an apparatus for reading a pattern on a
light-reflection-type object, a single objective lens can act as
both an illumination lens between a light source and an object and
an objective lens between the object and a spatial filter, however,
there are some problems. For example, when an incident light beam
is obliquely incident on an object surface, an objective lens with
a large diameter is required. Further, when the light beam is
perpendicularly incident on the object surface, a beam splitter is
necessary to separate a reflected light beam and the quantity of
light which reaches an imaging element is lowered to about half
that when the light beam is obliquely incident.
[0200] As shown in FIG. 31, the optical system of the apparatus
includes an illumination unit 10, an objective lens 23 and a
detection unit 30. The illumination unit 10 and the detection unit
30 are positioned symmetrically with respect to the normal of a
surface 1a so that when a light beam passing through the center of
a pinhole which coincides with the optical axis Ax1 of the
illumination unit 10 is specularly reflected, the light beam
coincides with the optical axis Ax2 of the detection unit 30.
[0201] The illumination unit 10 includes a lamp 11, a pinhole plate
12 with a pinhole 12a (a minute-area light source), and a diffusion
plate 13. The detection unit 30 includes a spatial filter 31, an
imaging lens 32, and an imaging element 33.
[0202] The light beam emitted from the light source is obliquely
incident on the surface 1a as a divergent light beam and
illuminates the surface 1a of a silicon wafer OR. The light beam is
diffusely reflected by an impressed pattern on the surface 1a and
specularly reflected at other portions. The reflected light beam
passes through the objective lens 23 as a converging light beam
directed toward the detection unit 30. The converging light beam
passes through the spatial filter 31 and an imaging lens 32 and an
image of the pattern on the surface 1a is formed on the imaging
element 33 by the diffusely reflected component. That is, the
spatial filter 31 shades the specularly reflected component.
[0203] FIG. 32 shows a modification of the tenth embodiment in
which the principle of the arrangement of FIG. 30(B) is applied to
an optical system for reading a light-reflection-type object. In
particular, the optical system shown in FIG. 32 does not include
the imaging lens 32 which is included in the optical system in FIG.
31. In this case, an objective lens 23 is designed to form the
image of the pattern on an imaging element 33. Otherwise, the
arrangement of the elements in this modification is the same as the
arrangement of the optical system in FIG. 31.
[0204] For this modification, an illumination light beam reaches
the surface 1a of the silicon wafer OR as a divergent light beam,
is reflected at the surface 1a, and is incident on the objective
lens 23. The objective lens 23 converges the reflected light beam
and images the pattern on the surface 1a of the imaging element 33.
The spatial filter 31 is disposed nearer to the objective lens 23
than an image of the light source formed by the objective lens 23
and shades the specularly reflected component of the reflected
light beam. Therefore, the image of the pattern is formed on the
imaging element 33 by the scatteringly reflected component of the
reflected light beam.
[0205] Eleventh Embodiment
[0206] FIG. 33 shows an optical system of a pattern reading
apparatus according to an eleventh embodiment. The optical system
includes an illumination unit 10, an objective lens 23, and a
detection unit 30. The illumination unit 10 and the detection unit
30 are disposed symmetrically with respect to a normal of a surface
1a so that when a light beam passing through the center of a
pinhole which coincides with the optical axis Ax1 of the
illumination unit 10 is specularly reflected, the light beam
coincides with the optical axis Ax2 of the detection unit 30.
[0207] The illumination unit 10 includes a lamp 11, a pinhole plate
12 with a pinhole 12a to form a minute-area light source, and a
diffusion plate 13. The illumination unit 10 is disposed such that
an illumination light beam is obliquely incident on an object
surface at a predetermined incident angle. The detection unit 30
includes a spatial filter 31, an imaging lens 32, and an imaging
element 33. The spatial filter 31 includes a shading region at the
center thereof and is disposed nearer to the objective lens than a
paraxial imaging point of the minute-area light source.
[0208] An illumination light beam emitted from the illumination
unit 10 is incident on the surface 1a obliquely as a divergent
light beam. At the surface 1a, the illumination light beam is
diffusely reflected at an impressed pattern on the surface 1a and
specularly reflected at portions other than the pattern. The
reflected light beam passes through the objective lens 23 and exits
as a converging light beam directed toward the detection unit 30.
At the spatial filter 31, the scattered reflected component passes
through but the specularly reflected component does not. The
scatterered reflected component passes through the imaging lens 32
to form an image of the pattern on the surface 1a on the imaging
element 33.
[0209] In this embodiment, the principal plane 32a of the imaging
lens 32, the surface 1a, and the imaging surface 33a of the imaging
element 33 are disposed such that imaginary lines extending
therefrom cross each other at an axis RL, as shown by the dashed
lines in FIG. 33, based on Scheimpflug's rule. Such a disposition
eliminates the effect of tilt of the image plane, which is
conjugate to the surface 1a, with respect to the image surface 33a.
As a result, even if a pattern has a width in a direction parallel
to a plane including both optical axes Ax1, Ax2, the pattern can be
brought into focus as a whole.
[0210] The imaging element 33 converts the image of the pattern
into an electric signal and inputs the signal to an image
processing apparatus (not shown). The image processing apparatus
displays the image of the pattern on a display screen or analyzes
the content of the pattern using a character recognition algorithm
or the like.
[0211] Note that, when the surface 1a is not parallel with the
image surface 33a, as in this embodiment, since a magnification
changes depending upon position in a direction parallel to the
plane including both the optical axes, a formed pattern is
distorted. If the distortion of the image of the pattern affects
reading, the distortion can be compensated for by image processing
such as an affine transformation or the like.
[0212] FIG. 34 shows a modification of the optical system of the
eleventh embodiment. The optical system in FIG. 34 does not include
the imaging lens 32 of FIG. 33 and an objective lens 23 is designed
to form an image of a pattern directly on an imaging element 33. In
particular, in this case, the principal plane 23a of the objective
lens 23, a surface 1a, and the image surface 33a of the imaging
element 33 are disposed such that imaginary lines extending
therefrom cross each other on an axis RL, as shown by the dashed
lines in FIG. 34, based on Scheimpflug's rule. Otherwise, the
arrangement is the same as that of the optical system of FIG.
33.
[0213] In this case, the illumination light beam emitted from the
illumination unit 10 is incident on the surface 1a of the silicon
wafer OR as a divergent light beam and is reflected at the surface
1a. The objective lens 23 converges the reflected light beam and
images the pattern on the surface 33a of the imaging element 33.
The spatial filter 31 is disposed nearer to the objective lens 23
than the paraxial imaging point of the minute-area light source and
shades the specularly reflected component. Thus, the diffusely
reflected light beam passes through the spatial filter 31 and forms
the image of the pattern on the imaging element 33.
[0214] According to the eleventh embodiment, an object surface can
be made conjugate with an imaging surface by disposing the lens
having the imaging function and the imaging surface according to
Scheimpflug's rule, such that an in-focus pattern image can be
obtained.
[0215] Twelfth Embodiment
[0216] FIG. 35 shows an optical system for a pattern reading
apparatus according to a twelfth embodiment. The optical system
includes a light emitting diode 10a, an objective lens 20, an
imaging lens 32, and an imaging element 33. The light emitting
diode 10a (light source) is disposed at a position which is
conjugate with a center of curvature of a surface 1a of a silicon
wafer OR through the objective lens 20. The imaging lens 32 is
disposed at a position which is farther from the silicon wafer OR
than the light emitting diode 10a. Further, optical axes Ax of the
objective lens 20 and the imaging lens 32 are coincident and
perpendicular to the surface 1a. Because the surface 1a is flat, in
the example shown in FIG. 35, the light emitting diode 10a is
positioned approximately at a focal point of the objective lens
20.
[0217] In the twelfth embodiment, the light beam emitted from the
light emitting diode 10a passes through the objective lens 20 and
illuminates the surface 1a of the silicon wafer OR as a parallel
light beam perpendicular to the surface 1a. The illumination light
beam is diffusely reflected at an impressed pattern on the surface
1a and specularly reflected at other portions. The specularly
reflected component is converged to the position of the light
emitting diode 10a as the reflected light beam passes through the
objective lens 20 and is shaded by the light emitting diode
10a.
[0218] The diffusely reflected component is not shaded by the light
emitting diode 10a and passes through the imaging lens 32 to form
an image of the pattern on the imaging element 33.
[0219] FIG. 36 shows a modification of the optical system according
to the twelfth embodiment. As shown in FIG. 36 a light source
includes a light emitting element, such as a semiconductor laser
11a, a light guide fiber 14, and a coupling lens 15. The
semiconductor laser 11a and the coupling lens 15 are disposed
outside of the optical path between the surface 1a and the imaging
element 33. The light guide fiber 14 extends from an entrance end
14a near the coupling lens 15 to an exit end 14b disposed at a
position which is conjugate with the center of curvature of the
surface 1a through the objective lens 20. Since, in FIG. 36, the
surface 1a is flat, the exit end 14b of the light guide fiber 14 is
disposed approximately at the focal point of the objective lens 20.
Otherwise, the arrangement of the optical system is the same as
that of FIG. 35.
[0220] With this modification, the laser beam emitted from the
semiconductor laser 11a is incident on the entrance end 14a of the
light guide fiber 14 through the coupling lens 15. Then, the laser
beam emitted from the exit end 14b of the light guide fiber 14
illuminates the surface 1a through the objective lens 20 as a
parallel light beam. Since the reflected light beam from the
surface 1a is converged when it passes through the objective lens
20 again, a specularly reflected component is shaded by the end of
the fiber and only a diffusely reflected component passes through
the imaging lens 32 to form an image of a pattern on the surface 1a
on the imaging element 33.
[0221] According to the twelfth embodiment, the size of the optical
system can be reduced as compared with an optical system in which
the light beam is obliquely incident. Further, the quantity of
light is larger than when a beam splitter is used. Still further,
the light source acts as a spatial filter for shading the
specularly reflected component of light from the object surface so
that a distinct image of the pattern can be formed by a diffusely
reflected component without the provision of an additional
filter.
[0222] The present disclosure relates to subject matter contained
in Japanese Patent Applications No. HEI 08-241112, filed on Aug.
23, 1996, No. HEI 08-301076, filed on Oct. 25, 1996, No. HEI
08-342775, filed on Dec. 6, 1996, No. HEI 08-342776, filed on Dec.
6, 1996, No. HEI 08-342777, filed on Dec. 6, 1996, No. HEI
08-342778, filed on Dec. 6, 1996, No. HEI 09-65333, filed on Mar.
4, 1997, No. HEI 09-74497, filed on Mar. 11, 1997, No. HEI
09-65334, filed on Mar. 4, 1997, No. HEI 09-134312, filed on May 8,
1997, and No. HEI 09-165422, filed on Jun. 6, 1997, which are
expressly incorporated herein by reference in their entirety.
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