U.S. patent application number 09/789146 was filed with the patent office on 2001-06-28 for inductor with magnetic material layers.
Invention is credited to Ahn, Kie Y., Forbes, Leonard.
Application Number | 20010005034 09/789146 |
Document ID | / |
Family ID | 22919329 |
Filed Date | 2001-06-28 |
United States Patent
Application |
20010005034 |
Kind Code |
A1 |
Forbes, Leonard ; et
al. |
June 28, 2001 |
Inductor with magnetic material layers
Abstract
A spiral inductor fabricated above a semiconductor substrate
provides a large inductance while occupying only a small surface
area. Including a layer of magnetic material above and below the
inductor increases the inductance of the inductor. The magnetic
material also acts as barrier that confines electronic noise
generated in the spiral inductor to the area occupied by the spiral
inductor. Inductance in a pair of stacked spiral inductors is
increased by including a layer of magnetic material between the
stacked spiral inductors.
Inventors: |
Forbes, Leonard; (Corvallis,
OR) ; Ahn, Kie Y.; (Chappaqua, NY) |
Correspondence
Address: |
SCHWEGMAN, LUNDBERG, WOESSNER & KLUTH
P.O. BOX 2938
MINNEAPOLIS
MN
55402
US
|
Family ID: |
22919329 |
Appl. No.: |
09/789146 |
Filed: |
February 20, 2001 |
Related U.S. Patent Documents
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Application
Number |
Filing Date |
Patent Number |
|
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09789146 |
Feb 20, 2001 |
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09243584 |
Feb 3, 1999 |
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6191468 |
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Current U.S.
Class: |
257/531 ;
438/329 |
Current CPC
Class: |
H01L 2924/0002 20130101;
Y10T 29/4902 20150115; H01L 2924/00 20130101; Y10T 29/49155
20150115; Y10T 29/49069 20150115; H01F 17/0013 20130101; H01L
2924/3011 20130101; Y10T 29/4906 20150115; H01L 23/5227 20130101;
H01L 2924/0002 20130101; Y10T 29/49064 20150115 |
Class at
Publication: |
257/531 ;
438/329 |
International
Class: |
H01L 029/00; H01L
021/8222 |
Claims
What is claimed is:
1. An inductor comprising: a layer of magnetic material deposited
on a substrate; an insulating layer deposited on the magnetic
material layer; an inductor pattern deposited on the insulating
layer; a second insulating layer deposited on the inductor pattern;
and a second magnetic material layer deposited on the second
insulating layer.
2. The inductor of claim 1, wherein the substrate is a
semiconductor.
3. The inductor of claim 1, wherein the magnetic material is a
ferromagnetic.
4. The inductor of claim 1, wherein the insulating layer is silicon
dioxide.
5. The inductor of claim 1, wherein the inductor pattern is a
square spiral.
6. The inductor of claim 1, wherein the inductor pattern is a
high-conductivity material.
7. An inductor comprising: a layer of magnetic material deposited
on a substrate; an insulating layer deposited on the magnetic
material layer; an inductor pattern deposited on the insulating
layer and above the magnetic material layer; a second insulating
layer deposited on the inductor pattern; and a second magnetic
material layer deposited on the second insulating layer.
8. The inductor of claim 7, wherein the substrate is a
semiconductor.
9. The inductor of claim 7, wherein the magnetic material is a
ferromagnetic.
10. The inductor of claim 7, wherein the insulating layer is
silicon dioxide.
11. The inductor of claim 7, wherein the inductor pattern is a
square spiral.
12. The inductor of claim 7, wherein the inductor pattern is a
high-conductivity material.
13. An inductor comprising: a layer of magnetic material deposited
on a substrate; an insulating layer deposited on the magnetic
material layer; an inductor pattern deposited on the insulating
layer; a second insulating layer deposited on the inductor pattern;
and a second magnetic material layer deposited on the second
insulating layer and above the inductor pattern.
14. The inductor of claim 13, wherein the substrate is a
semiconductor.
15. The inductor of claim 13, wherein the magnetic material is a
ferromagnetic.
16. The inductor of claim 13, wherein the insulating layer is
silicon dioxide.
17. The inductor of claim 13, wherein the inductor pattern is a
square spiral.
18. The inductor of claim 13, wherein the inductor pattern is a
high-conductivity material.
19. An inductor comprising: a layer of magnetic material deposited
on a silicon substrate; an insulating layer deposited on the
magnetic material layer; an inductor pattern deposited on the
insulating layer and above the magnetic material layer; a second
insulating layer deposited on the inductor pattern; and a second
magnetic material layer deposited on the second insulating layer
and above the inductor pattern.
20. The inductor of claim 19, wherein the substrate is a
semiconductor.
21. The inductor of claim 19, wherein the magnetic material is a
ferromagnetic.
22. The inductor of claim 19, wherein the insulating layer is
silicon dioxide.
23. The inductor of claim 19, herein the inductor pattern is a
square spiral.
24. The inductor of claim 19, herein the inductor pattern is a
high-conductivity material.
25. An integrated circuit comprising: an inductor comprising: a
layer of magnetic material deposited on a substrate; an insulating
layer deposited on the magnetic material layer; an inductor pattern
deposited on the insulating layer; a second insulating layer
deposited on the inductor pattern; and a second magnetic material
layer deposited on the second insulating layer; and an electronic
device coupled to the inductor.
26. The integrated circuit of claim 25, wherein the substrate is a
semiconductor.
27. The integrated circuit of claim 25, wherein the magnetic
material is a ferromagnetic.
28. The integrated circuit of claim 25, wherein the insulating
layer is silicon dioxide.
29. The integrated circuit of claim 25, wherein the inductor
pattern is a square spiral.
30. The integrated circuit of claim 25, wherein the inductor
pattern is a high-conductivity material.
31. An integrated circuit comprising: an inductor comprising: a
layer of magnetic material deposited on a substrate; an insulating
layer deposited on the magnetic material layer; an inductor pattern
deposited on the insulating layer and above the magnetic material
layer; a second insulating layer deposited on the inductor pattern;
and a second magnetic material layer deposited on the second
insulating layer; and an electronic device coupled to the
inductor.
32. The integrated circuit of claim 31, wherein the substrate is a
semiconductor.
33. The integrated circuit of claim 31, wherein the magnetic
material is a ferromagnetic.
34. The integrated circuit of claim 31, wherein the insulating
layer is silicon dioxide.
35. The integrated circuit of claim 31, wherein the inductor
pattern is a square spiral.
36. The integrated circuit of claim 31, wherein the inductor
pattern is a high-conductivity material.
37. An integrated circuit comprising: an inductor comprising: a
layer of magnetic material deposited on a substrate; an insulating
layer deposited on the magnetic material layer; an inductor pattern
deposited on the insulating layer; a second insulating layer
deposited on the inductor pattern; and a second magnetic material
layer deposited on the second insulating layer and above the
inductor pattern; and an electronic device coupled to the in
inductor.
38. The integrated circuit of claim 37, wherein the substrate is a
semiconductor.
39. The integrated circuit of claim 37, wherein the magnetic
material is a ferromagnetic.
40. The integrated circuit of claim 37, wherein the insulating
layer is silicon dioxide.
41. The integrated circuit of claim 37, wherein the inductor
pattern is a square spiral.
42. The integrated circuit of claim 37, wherein the inductor
pattern is a high-conductivity material.
43. An integrated circuit comprising: an inductor comprising: a
layer of magnetic material deposited on a silicon substrate; an
insulating layer deposited on the magnetic material layer; an
inductor pattern deposited on the insulating layer and above the
magnetic material layer; a second insulating layer deposited on the
inductor pattern; and a second magnetic material layer deposited on
the second insulating layer and above the inductor pattern; and an
electronic device coupled to the inductor.
44. The integrated circuit of claim 43, wherein the substrate is a
semiconductor.
45. The integrated circuit of claim 43, wherein the magnetic
material is a ferromagnetic.
46. The integrated circuit of claim 43, wherein the insulating
layer is silicon dioxide.
47. The integrated circuit of claim 43, wherein the inductor
pattern is a square spiral.
48. The integrated circuit of claim 43, wherein the inductor
pattern is a high-conductivity material.
49. An inductor comprising: a layer of magnetic material deposited
on a substrate; an insulating layer deposited on the magnetic
material layer; a plurality of sandwich structures vertically
stacked on the insulating layer, the structures comprising: an
inductor pattern; an insulating layer deposited on the inductor
pattern; a layer of magnetic material deposited on the insulating
layer; and an insulating layer deposited on the magnetic material
layer; and a conducting path through the structures such that each
inductor pattern is serially connected to the inductor pattern
above by the conducting path, and such that a current flowing in
the serially connected inductor patterns creates a reinforcing
magnetic field in the magnetic material between adjacent inductor
patterns.
50. The inductor of claim 49, wherein the substrate is a
semiconductor.
51. The inductor of claim 49, wherein the magnetic material is a
ferromagnetic.
52. The inductor of claim 49, wherein the insulating layer is
silicon dioxide.
53. The inductor of claim 49, wherein the inductor pattern is a
square spiral.
54. The inductor of claim 49, wherein the inductor pattern is a
high-conductivity material.
55. An inductor comprising: a layer of magnetic material deposited
on a substrate; an insulating layer deposited on the magnetic
material layer; a plurality of sandwich structures vertically
stacked on the insulating layer, the structures comprising: an
inductor pattern; an insulating layer deposited on the inductor
pattern; a layer of magnetic material deposited on the insulating
layer and above the inductor pattern; and an insulating layer
deposited on the magnetic material layer; and a conducting path
through the structures such that each inductor pattern is serially
connected to the inductor pattern above by the conducting path, and
such that a current flowing in the serially connected inductor
patterns creates a reinforcing magnetic field in the magnetic
material between adjacent inductor patterns.
56. The inductor of claim 55, wherein the substrate is a
semiconductor.
57. The inductor of claim 55, wherein the magnetic material is a
ferromagnetic.
58. The inductor of claim 55, wherein the insulating layer is
silicon dioxide.
59. The inductor of claim 55, wherein the inductor pattern is a
square spiral.
60. The inductor of claim 55, wherein the inductor pattern is a
high-conductivity material.
61. An inductor comprising: a layer of magnetic material deposited
on a substrate; an insulating layer deposited on the magnetic
material layer; a plurality of sandwich structures vertically
stacked on the insulating layer and above the magnetic material
layer, the structures comprising: an inductor pattern; an
insulating layer deposited on the inductor pattern; a layer of
magnetic material deposited on the insulating layer; and an
insulating layer deposited on the magnetic material layer; and a
conducting path through the structures such that each inductor
pattern is serially connected to the inductor pattern above by the
conducting path, and such that a current flowing in the serially
connected inductor patterns creates a reinforcing magnetic field in
the magnetic material between adjacent inductor patterns.
62. The inductor of claim 61, wherein the substrate is a
semiconductor.
63. The inductor of claim 61, wherein the magnetic material is a
ferromagnetic.
64. The inductor of claim 61, wherein the insulating layer is
silicon dioxide.
65. The inductor of claim 61, wherein the inductor pattern is a
square spiral.
66. The inductor of claim 61, wherein the inductor pattern is a
high-conductivity material.
67. An inductor comprising: a layer of magnetic material deposited
on a silicon substrate; an insulating layer deposited on the
magnetic material layer; and a plurality of sandwich structures
vertically stacked on the insulating layer and above the magnetic
material layer, the structures comprising: an inductor pattern; an
insulating layer deposited on the inductor pattern; a layer of
magnetic material deposited on the insulating layer and above the
inductor pattern; an insulating layer deposited on the magnetic
material layer; and a conducting path through the structures such
that each inductor pattern is serially connected to the inductor
pattern above by the conducting path, and such that a current
flowing in the serially connected inductor patterns creates a
reinforcing magnetic field in the magnetic material between
adjacent inductor patterns.
68. The inductor of claim 67, wherein the substrate is a
semiconductor.
69. The inductor of claim 67, wherein the magnetic material is a
ferromagnetic.
70. The inductor of claim 67, wherein the insulating layer is
silicon dioxide.
71. The inductor of claim 67, wherein the inductor pattern is a
square spiral.
72. The inductor of claim 67, wherein the inductor pattern is a
high-conductivity material.
73. A method of fabricating an inductor comprising: selecting a
substrate; depositing a layer of magnetic material on the
substrate; depositing an insulating layer on the magnetic material
layer; depositing an inductor pattern on the insulating layer;
depositing a second insulating layer on the inductor pattern; and
depositing a second magnetic material layer on the second
insulating layer.
74. The method of claim 73, wherein the substrate is a
semiconductor.
75. The method of claim 73, wherein the magnetic material is a
ferromagnetic.
76. The method of claim 73, wherein the insulating layer is silicon
dioxide.
77. The method of claim 73, wherein the inductor pattern is a
square spiral.
78. The method of claim 73, wherein the inductor pattern is a
high-conductivity material.
79. A method of fabricating an inductor comprising: selecting a
substrate; depositing a layer of magnetic material on the
substrate; depositing an insulating layer on the magnetic material
layer; depositing an inductor pattern on the insulating layer and
above the magnetic material layer; depositing a second insulating
layer on the inductor pattern; and depositing a second magnetic
material layer on the second insulating layer.
80. The method of claim 79, wherein the substrate is a
semiconductor.
81. The method of claim 79, wherein the magnetic material is a
ferromagnetic.
82. The method of claim 79, wherein the insulating layer is silicon
dioxide.
83. The method of claim 79, wherein the inductor pattern is a
square spiral.
84. The method of claim 79, wherein the inductor pattern is a
high-conductivity material.
85. A method of fabricating an inductor comprising: selecting a
substrate; depositing a layer of magnetic material on the
substrate; depositing an insulating layer on the magnetic material
layer; depositing an inductor pattern on the insulating layer;
depositing a second insulating layer on the inductor pattern; and
depositing a second magnetic material layer on the second
insulating layer above the inductor pattern.
86. The method of claim 85, wherein the substrate is a
semiconductor.
87. The method of claim 85, wherein the magnetic material is a
ferromagnetic.
88. The method of claim 85, wherein the insulating layer is silicon
dioxide.
89. The method of claim 85, wherein the inductor pattern is a
square spiral.
90. The method of claim 85, wherein the inductor pattern is a
high-conductivity material.
91. A method of fabricating an inductor comprising: selecting a
silicon substrate; depositing a layer of magnetic material on the
substrate; depositing an insulating layer on the magnetic material
layer; depositing an inductor pattern on the insulating layer and
above the magnetic material layer; depositing a second insulating
layer on the inductor pattern; and depositing a second magnetic
material layer on the second insulating layer and above the
inductor pattern.
92. The method of claim 91, wherein the substrate is a
semiconductor.
93. The method of claim 91, wherein the magnetic material is a
ferromagnetic.
94. The method of claim 91, wherein the insulating layer is silicon
dioxide.
95. The method of claim 91, wherein the inductor pattern is a
square spiral.
96. The method of claim 91, wherein the inductor pattern is a
high-conductivity material.
97. A method of fabricating an inductor comprising: selecting a
substrate; depositing a layer of magnetic material on the
substrate; depositing an insulating layer on the magnetic material
layer; stacking a plurality of sandwich structures on the
insulating layer, the method of fabricating the structures
comprising: depositing an inductor pattern on the insulating layer;
depositing an insulating layer on the inductor pattern; depositing
a layer of magnetic material on the insulating layer; and
depositing an insulating layer on the magnetic material layer;
fabricating a conducting path through the structures; and
connecting each inductor pattern serially to the inductor pattern
above by the conducting path, such that a current flowing in the
serially connected inductor patterns creates a reinforcing magnetic
field in the magnetic material between adjacent inductor
patterns.
98. The method of claim 97, wherein the substrate is a
semiconductor.
99. The method of claim 97, wherein the magnetic material is a
ferromagnetic.
100. The method of claim 97, wherein the insulating layer is
silicon dioxide.
101. The method of claim 97, wherein the inductor pattern is a
square spiral.
102. The method of claim 97, wherein the inductor pattern is a
high-conductivity material.
103. A method of fabricating an inductor comprising: selecting a
substrate; depositing a layer of magnetic material on the
substrate; depositing an insulating layer on the magnetic material
layer; stacking a plurality of sandwich structures on the
insulating layer, the method of fabricating the structures
comprising: depositing an inductor pattern on the insulating layer
and above the magnetic material layer; depositing an insulating
layer on the inductor pattern; depositing a layer of magnetic
material on the insulating layer; and depositing an insulating
layer on the magnetic material layer; fabricating a conducting path
through the structures; and connecting each inductor pattern
serially to the inductor pattern above by the conducting path, such
that a current flowing in the serially connected inductor patterns
creates a reinforcing magnetic field in the magnetic material
between adjacent inductor patterns.
104. The method of claim 103, wherein the substrate is a
semiconductor.
105. The method of claim 103, wherein the magnetic material is a
ferromagnetic.
106. The method of claim 103, wherein the insulating layer is
silicon dioxide.
107. The method of claim 103, wherein the inductor pattern is a
square spiral.
108. The method of claim 103, wherein the inductor pattern is a
high-conductivity material.
109. A method of fabricating an inductor comprising: selecting a
substrate; depositing a layer of magnetic material on the
substrate; depositing an insulating layer on the magnetic material
layer; stacking a plurality of sandwich structures on the
insulating layer, the method of fabricating the structures
comprising: depositing an inductor pattern on the insulating layer;
depositing an insulating layer on the inductor pattern; depositing
a layer of magnetic material on the insulating layer and above the
inductor pattern; and depositing an insulating layer on the
magnetic material layer; fabricating a conducting path through the
structures; and connecting each inductor pattern serially to the
inductor pattern above by the conducting path, such that a current
flowing in the serially connected inductor patterns creates a
reinforcing magnetic field in the magnetic material between
adjacent inductor patterns.
110. The method of claim 109, wherein the substrate is a
semiconductor.
111. The method of claim 109, wherein the magnetic material is a
ferromagnetic.
112. The method of claim 109, wherein the insulating layer is
silicon dioxide.
113. The method of claim 109, wherein the inductor pattern is a
square spiral.
114. The method of claim 109, wherein the inductor pattern is a
high-conductivity material.
115. A method of fabricating an inductor comprising: selecting a
silicon substrate; depositing a layer of magnetic material on the
substrate; depositing an insulating layer on the magnetic material
layer; stacking a plurality of sandwich structures on the
insulating layer, the method of fabricating the structures
comprising: depositing an inductor pattern on the insulating layer
and above the magnetic material layer; depositing an insulating
layer on the inductor pattern; depositing a layer of magnetic
material on the insulating layer and above the inductor pattern;
and depositing an insulating layer on the magnetic material layer;
fabricating a conducting path through the structures; and
connecting each inductor pattern serially to the inductor pattern
above by the conducting path, such that a current flowing in the
serially connected inductor patterns creates a reinforcing magnetic
field in the magnetic material between adjacent inductor
patterns.
116. The method of claim 115, wherein the substrate is a
semiconductor.
117. The method of claim 115, wherein the magnetic material is a
ferromagnetic.
118. The method of claim 115, wherein the insulating layer is
silicon dioxide.
119. The method of claim 115, wherein the inductor pattern is a
square spiral.
120. The method of claim 115, wherein the inductor pattern is a
high-conductivity material.
Description
FIELD OF THE INVENTION
[0001] The present invention relates to inductors, and particularly
to inductors used in integrated circuits.
BACKGROUND OF THE INVENTION
[0002] The telecommunications and computer industries are driving
the demand for miniaturized analog and mixed signal circuits.
Inductors are a critical component in the traditional discrete
element circuits, such as impedence matching circuits, resonant
tank circuits, linear filters, and power circuits, used in these
industries. Since traditional inductors are bulky components,
successful integration of the traditional discrete element circuits
requires the development of miniaturized inductors.
[0003] One approach to miniaturizing an inductor is to use standard
integrated circuit building blocks, such as resistors, capacitors,
and active circuitry, such as operational amplifiers, to design an
active inductor that simulates the electrical properties of a
discrete inductor. Active inductors can be designed to have a high
inductance and a high Q factor, but inductors fabricated using
these designs consume a great deal of power and generate noise.
[0004] A second approach to miniaturizing an inductor is to
fabricate a solenoid type inductor with a core using conventional
integrated circuit manufacturing process technology. Unfortunately,
conventional integrated circuit process steps do not lend
themselves to precisely and inexpensively fabricating a helical
structure with a core. So, integrated circuit process technology is
only marginally compatible with manufacturing a solenoid type
inductor.
[0005] A third approach, sometimes used in the fabrication of
miniature inductors in gallium arsenide circuits, is to fabricate a
spiral type inductor using conventional integrated circuit
processes. Unfortunately, this approach has a high cost factor
associated with it when applied to fabricating inductors for use in
silicon integrated circuits. Silicon integrated circuits operate at
lower frequencies than gallium arsenide circuits, and generally
require inductors having a higher inductance than inductors used in
gallium arsenide circuits. The higher inductance is realized in a
spiral inductor occupying a large surface area on the silicon
substrate.
[0006] For these and other reasons there is a need for the present
invention.
SUMMARY OF THE INVENTION
[0007] In one embodiment of the invention, an inductor comprises
layers of material deposited on a silicon substrate. First, a layer
of magnetic material is deposited on the silicon substrate. Next,
an insulating layer is deposited on the magnetic material layer. An
inductor pattern is deposited on the insulating layer and above the
magnetic material layer. Finally, a second insulating layer is
deposited on the inductor pattern, and a second magnetic material
layer is deposited on the second insulating layer. The second
magnetic material layer is deposited above the inductor
pattern.
[0008] In an alternate embodiment, the inductor described above is
coupled to another electronic device in an integrated circuit.
[0009] In still another embodiment, a plurality of sandwich
structures are vertically stacked on an insulating layer that is
deposited on a layer of magnetic material. The layer of magnetic
material is deposited on a silicon substrate. The sandwich
structures include an inductor pattern, an insulating layer
deposited on the inductor pattern, a layer of magnetic material
deposited on the insulating layer and above the inductor pattern,
and an insulating layer deposited on the magnetic material layer.
The structures also include a conducting path through the
structures, such that each inductor pattern is serially connected
to the inductor pattern above by the conducting path. The current
flowing in the serially connected inductor patterns creates a
reinforcing magnetic field in the magnetic material between
adjacent inductor patterns.
[0010] In still another embodiment, a method of fabricating an
inductor comprises a series of steps. First, a silicon substrate is
selected, a layer of magnetic material is deposited on the
substrate, and an insulating layer is deposited on the magnetic
material layer. Next, a plurality of sandwich structures are
stacked on the insulating layer. The method of fabricating the
structures comprises the steps of depositing an inductor pattern on
the insulating layer and above the magnetic material layer,
depositing an insulating layer on the inductor pattern, depositing
a layer of magnetic material on the insulating layer and above the
inductor pattern, and depositing an insulating layer on the
magnetic material layer. Finally, a conducting path is fabricated
through the structures to connect each inductor pattern serially to
the inductor pattern above, such that a current flowing in the
serially connected inductor patterns creates a reinforcing magnetic
field in the magnetic material between adjacent inductor
patterns.
BRIEF DESCRIPTION OF THE DRAWINGS
[0011] FIG. 1A is a cross-sectional view of one embodiment of a
square spiral inductor embedded in a solid state structure.
[0012] FIG. 1B is a top view of one embodiment of a square spiral
inductor pattern.
[0013] FIG. 2 is a cross-sectional view one embodiment of an
inductor coupled to another electronic device in an integrated
circuit.
[0014] FIG. 3A is a cross-sectional view of one embodiment of two
vertically stacked inductors.
[0015] FIG. 3B is a cross-sectional view of one embodiment of two
stacked and serially connected inductors showing the current in the
inductors and the resulting magnetic field lines.
DETAILED DESCRIPTION OF THE INVENTION
[0016] In the following detailed description, reference is made to
the accompanying drawings which form a part hereof, and in which is
shown by way of illustration specific embodiments in which the
invention may be practiced. These embodiments are described in
sufficient detail to enable those skilled in the art to practice
the invention, and it is to be understood that other embodiments
may be utilized and that structural, logical and electrical changes
may be made without departing from the spirit and scope of the
present invention. The following detailed description is,
therefore, not to be taken in a limiting sense, and the scope of
the present invention is defined by the appended claims.
[0017] Inductors intended for use in circuits fabricated on a
silicon substrate usually operate at lower frequencies and require
larger inductances than inductors intended for use in circuits
fabricated on a gallium arsenide substrate. As mentioned above, a
larger inductance is usually realized in silicon by having the
inductor occupy a larger surface area. According to one embodiment
of the present invention, rather than increasing the inductance by
increasing the surface area occupied by the inductor, a larger
inductance is achieved by adding a layer of magnetic material to
the inductor.
[0018] Referring to FIG. 1A, a cross-sectional view of one
embodiment of a square spiral inductor of the present invention is
shown. Inductor 100 is formed on substrate 110 and comprises
magnetic material layer 120, insulating layer 130, inductor pattern
140, second insulating layer 150, and second magnetic material
layer 160. Magnetic material layer 120 is deposited on substrate
110, insulating layer 130 is deposited on magnetic material layer
120, inductor pattern 140 is deposited on insulating layer 130,
second insulating layer 150 is deposited on inductor pattern 140,
and second magnetic material layer 160 is deposited on second
insulating layer 150.
[0019] Substrate 110, in one embodiment, is a semiconductor, and
even though the invention is not limited to a particular type of
semiconductor, silicon is the preferred semiconductor substrate
material.
[0020] Magnetic material layer 120, in one embodiment, is deposited
on the surface of substrate 110. The particular magnetic material
selected for use in a particular inductor design depends on the
inductance requirement. In one embodiment, in which a large
inductance in a small volume is desired, a high permeability
ferromagnetic material, such as pure iron or a NiFe alloy is
selected. An example of a high permeability NiFe alloy is an alloy
of 81% Ni and 19% Fe. Electrically conducting films, such as an
insulating magnetic oxide film, may also be suitable for use in the
present invention.
[0021] Insulating layer 130 is deposited on magnetic material layer
120. In one embodiment, insulating layer 130 is an inorganic
silicon oxide film. In an alternate embodiment, insulating layer
130 is silicon dioxide. In still another embodiment, which is
perhaps preferable in a low temperature processing environment,
insulating layer 130 is an organic insulator, such as parylene and
polyimide.
[0022] Inductor pattern 140 is deposited on insulating layer 130.
In one embodiment, inductor pattern 140 is a spiral. In an
alternate embodiment, inductor pattern 140 is a circular spiral. In
a second alternate embodiment, inductor pattern 140 is a polygonal
spiral, where the polygonal spiral may be in the shape of a
triangle, square, rectangle, octagon, or hexagon. A square spiral
inductor pattern, which is shown as inductor pattern 140 in FIG.
1B, is preferred, since it is easy to manufacture. Inductor pattern
140 is fabricated from a high-conductivity material. In one
embodiment the high-conductivity material is gold. In an alternate
embodiment, the high-conductivity material is copper.
[0023] Referring to FIG. 1A, second insulating layer 150 is
deposited on inductor pattern 140, and is fabricated from the same
materials as insulating layer 130.
[0024] Second magnetic material layer 160 is deposited on second
insulating layer 150, and is fabricated from the same materials as
magnetic material layer 120. Second magnetic material layer 160 is
preferably located above inductor pattern 140, and second magnetic
material layer 160 does not intersect the plane of magnetic
material layer 160.
[0025] Locating magnetic material layer 160 above inductor pattern
140 allows the contribution of the magnetic material to the
inductance of the inductor to be precisely controlled during the
manufacturing process. The thickness of the layer of magnetic
material along with the magnetic properties of the material define
the contribution of the layer to the inductance of the inductor.
Once the properties of the material are established during the
preparation of the material, the thickness of the layer, which can
be precisely controlled in an integrated circuit manufacturing
process, defines the contribution of the layer of magnetic material
to the inductance.
[0026] In one embodiment, the inductor of the present invention is
connected to other electronic devices in an integrated circuit. The
inductor of the present invention is compatible with conventional
silicon manufacturing processes. Structures for coupling passive
devices, such as inductors, to other integrated circuit devices are
known in the art.
[0027] Referring to FIG. 2, inductor 200 is coupled to device 210.
The coupling is accomplished by providing conducting path 220 from
inductor pattern 230, through vias 240, to device 210.
[0028] Referring to FIG. 3A, one embodiment of inductor structure
300, which combines two inductors, is shown. Inductor structure 300
comprises base structure 305, sandwich structure 310, second
sandwich structure 315, and conducting path 320. Base structure 305
includes substrate 325, magnetic material layer 330, and insulating
layer 335. Sandwich structure 310 includes inductor pattern 340,
insulating layer 345, magnetic material layer 350, and insulating
layer 355. Second sandwich structure 315 is stacked on sandwich
structure 310. Second sandwich structure 315 includes inductor
pattern 360, insulating layer 365, magnetic material layer 370, and
insulating layer 375.
[0029] Conducting path 320 couples sandwich structure 310 to second
sandwich structure 315, and serially connects inductor pattern 340
to inductor pattern 360. A current flowing in the serially
connected inductor patterns creates a reinforcing magnetic field in
magnetic material layer 350. Magnetic material layers 330 and 370
are located below inductor pattern 340 and above inductor pattern
360, respectively. Magnetic material layers 330 and 370 confine the
magnetic flux and noise radiated by a current flowing in inductor
pattern 340 and inductor pattern 360 to the area bounded by the
outer surfaces of magnetic material layers 330 and 370. By stacking
sandwich structures, in one embodiment, a large inductance can be
created without increasing the surface area on a substrate occupied
by the inductor.
[0030] Referring to FIG. 3B, a diagram showing the currents and the
resulting reinforcing magnetic fields of the two inductor sandwich
of FIG. 3A is shown. Current 375 flows in inductor pattern 380, in
conducting path 385, and in inductor pattern 390. The resulting
magnetic field lines 395 are shown as reinforcing each other in
magnetic material 398, which corresponds to magnetic material layer
350 in FIG. 3A. Magnetic field lines 395 are confined by magnetic
material barrier layers 399.
[0031] It is to be recognized that the above description is
intended to be illustrative, and not restrictive. Many other
embodiments will be apparent to those of skill in the art upon
reviewing the above description. The scope of the invention should,
therefore, be determined with reference to the appended claims,
along with the full scope of equivalents to which such claims are
entitled.
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