ZHANG; Fuhong

Patent Applications and Registrations

Patent applications and USPTO patent grants for ZHANG; Fuhong.The latest application filed is for "substrate temperature non-uniformity reduction over target life using spacing compensation".

Company Profile

19.27.23

ZHANG; Fuhong - San Jose CA
ZHANG; Fuhong - Cupertino CA

*profile and listings may contain filings by different individuals or companies with the same name. Review application materials to confirm ownership/assignment.
Trademarks

Patent Activity

Patent	Date
Substrate Temperature Non-uniformity Reduction Over Target Life Using Spacing Compensation App 20220259720 - BANGALORE UMESH; Suhas ; et al.	2022-08-18
Physical vapor deposition (PVD) chamber with reduced arcing Grant 11,393,665 - Du , et al. July 19, 2	2022-07-19
Methods and apparatus to prevent interference between processing chambers Grant 11,335,577 - Zhang , et al. May 17, 2	2022-05-17
Methods and apparatus for processing a substrate Grant 11,315,771 - Xie , et al. April 26, 2	2022-04-26
Biasable flux optimizer / collimator for PVD sputter chamber Grant 11,309,169 - Riker , et al. April 19, 2	2022-04-19
Methods and apparatus for filling a feature disposed in a substrate Grant 11,289,329 - Li , et al. March 29, 2	2022-03-29
Target profile for a physical vapor deposition chamber target Grant D946,638 - Riker , et al. March 22, 2	2022-03-22
Methods And Apparatus For Intermixing Layer For Enhanced Metal Reflow App 20220084882 - ZHONG; Lanlan ; et al.	2022-03-17
Apparatus for enhancing flow uniformity in a process chamber Grant 11,270,898 - Ramalingam , et al. March 8, 2	2022-03-08
Methods And Apparatus For Processing A Substrate App 20220020578 - XIE; Xiangjin ; et al.	2022-01-20
Methods And Apparatus For Controlling Ion Fraction In Physical Vapor Deposition Processes App 20220020577 - WANG; Xiaodong ; et al.	2022-01-20
Methods and apparatus for semi-dynamic bottom up reflow Grant 11,222,816 - Zhong , et al. January 11, 2	2022-01-11
Methods And Apparatus For Semi-dynamic Bottom Up Reflow App 20210391214 - ZHONG; Lanlan ; et al.	2021-12-16
Methods and apparatus for controlling ion fraction in physical vapor deposition processes Grant 11,037,768 - Wang , et al. June 15, 2	2021-06-15
Method Of Depositing Layers App 20210118729 - PETHE; Shirish ; et al.	2021-04-22
Methods And Apparatus For Controlling Ion Fraction In Physical Vapor Deposition Processes App 20210071294 - WANG; Xiaodong ; et al.	2021-03-11
Biasable Flux Optimizer / Collimator For Pvd Sputter Chamber App 20200357617 - RIKER; Martin Lee ; et al.	2020-11-12
Methods And Apparatus For Filling A Feature Disposed In A Substrate App 20200350159 - LI; Rui ; et al.	2020-11-05
Biasable flux optimizer / collimator for PVD sputter chamber Grant 10,727,033 - Riker , et al.	2020-07-28
Apparatus For Enhancing Flow Uniformity In A Process Chamber App 20200090957 - Ramalingam; Jothilingam ; et al.	2020-03-19
Physical Vapor Deposition ( Pvd) Chamber With Reduced Arcing App 20200051795 - DU; CHAO ; et al.	2020-02-13
Methods And Apparatus To Prevent Interference Between Processing Chambers App 20200035527 - Zhang; Fuhong ; et al.	2020-01-30
Target profile for a physical vapor deposition chamber target Grant D869,409 - Riker , et al. Dec	2019-12-10
Target profile for a physical vapor deposition chamber target Grant D868,124 - Riker , et al. Nov	2019-11-26
Methods and apparatus to prevent interference between processing chambers Grant 10,438,828 - Zhang , et al. O	2019-10-08
Biasable Flux Optimizer / Collimator For Pvd Sputter Chamber App 20190279851 - RIKER; Martin Lee ; et al.	2019-09-12
Collimator for a physical vapor deposition chamber Grant D859,333 - Riker , et al. Sept	2019-09-10
Collimator for a physical vapor deposition chamber Grant D858,468 - Riker , et al. Sep	2019-09-03
Methods And Apparatus For Maintaining Low Non-uniformity Over Target Life App 20190259586 - JOHANSON; WILLIAM ; et al.	2019-08-22
Biasable flux optimizer / collimator for PVD sputter chamber Grant 10,347,474 - Riker , et al. July 9, 2	2019-07-09
Methods and apparatus for maintaining low non-uniformity over target life Grant 10,283,334 - Johanson , et al.	2019-05-07
Target profile for a physical vapor deposition chamber target Grant D837,755 - Riker , et al. J	2019-01-08
Target profile for a physical vapor deposition chamber target Grant D836,572 - Riker , et al. Dec	2018-12-25
Methods for igniting a plasma in a substrate processing chamber Grant 10,157,733 - Zhang , et al. Dec	2018-12-18
Target profile for a physical vapor deposition chamber target Grant D825,504 - Zhang , et al. August 14, 2	2018-08-14
Biasable Flux Optimizer / Collimator For Pvd Sputter Chamber App 20180218889 - RIKER; Martin Lee ; et al.	2018-08-02
Magnetron assembly for physical vapor deposition chamber Grant 9,991,101 - Johanson , et al. June 5, 2	2018-06-05
Biasable flux optimizer / collimator for PVD sputter chamber Grant 9,960,024 - Riker , et al. May 1, 2	2018-05-01
Methods and Apparatus to Prevent Interference Between Processing Chambers App 20180096871 - Zhang; Fuhong ; et al.	2018-04-05
Source magnet for improved resputtering uniformity in direct current (DC) physical vapor deposition (PVD) processes Grant 9,831,075 - Yoshidome , et al. November 28, 2	2017-11-28
Target profile for a physical vapor deposition chamber target Grant D801,942 - Riker , et al. November 7, 2	2017-11-07
Target profile for a physical vapor deposition chamber target Grant D797,067 - Zhang , et al. September 12, 2	2017-09-12
Methods And Apparatus For Controlling Ion Fraction In Physical Vapor Deposition Processes App 20170253959 - WANG; Xiaodong ; et al.	2017-09-07
Methods For Igniting A Plasma In A Substrate Processing Chamber App 20170221685 - ZHANG; Shouyin ; et al.	2017-08-03
Biasable Flux Optimizer / Collimator For Pvd Sputter Chamber App 20170117121 - RIKER; Martin Lee ; et al.	2017-04-27
Methods And Apparatus For Maintaining Low Non-uniformity Over Target Life App 20160056024 - JOHANSON; WILLIAM ; et al.	2016-02-25
Magnetron Assembly For Physical Vapor Deposition Chamber App 20160035547 - JOHANSON; WILLIAM ; et al.	2016-02-04
Source Magnet For Improved Resputtering Uniformity In Direct Current (dc) Physical Vapor Deposition (pvd) Processes App 20150075982 - YOSHIDOME; GOICHI ; et al.	2015-03-19
Sputter deposition and etching of metallization seed layer for overhang and sidewall improvement Grant 7,294,574 - Ding , et al. November 13, 2	2007-11-13
Sputter deposition and etching of metallization seed layer for overhang and sidewall improvement App 20060030151 - Ding; Peijun ; et al.	2006-02-09

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