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Dielectric Treatment Platform For Dielectric Film Deposition And Curing App 20100068897 - Liu; Junjun ;   et al. | 2010-03-18 |
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Control Of Implant Critical Dimensions Using An Sti Step Height Based Dose Offset App 20090170222 - Reid; Brian Douglas ;   et al. | 2009-07-02 |
Method And System For Predicting Process Performance Using Material Processing Tool And Sensor Data App 20090099991 - LAM; Hieu A. ;   et al. | 2009-04-16 |
Supervisory Etch Cd Control App 20080248412 - Stuber; John Douglas ;   et al. | 2008-10-09 |
Method and apparatus for using a pressure control system to monitor a plasma processing system Grant 7,430,496 - Yue , et al. September 30, 2 | 2008-09-30 |
Method and apparatus for detecting endpoint Grant 7,297,560 - Yue November 20, 2 | 2007-11-20 |
Method and apparatus for endpoint detection using partial least squares Grant 7,297,287 - Fatke , et al. November 20, 2 | 2007-11-20 |
Method of controlling trimming of a gate electrode structure App 20070111338 - Yue; Hongyu ;   et al. | 2007-05-17 |
Method for automatic configuration of processing system Grant 7,213,478 - Harada , et al. May 8, 2 | 2007-05-08 |
Method and system of discriminating substrate type Grant 7,211,196 - Lam , et al. May 1, 2 | 2007-05-01 |
Controlling a material processing tool and performance data Grant 7,167,766 - Lam , et al. January 23, 2 | 2007-01-23 |
Method and system for run-to-run control Grant 7,127,358 - Yue , et al. October 24, 2 | 2006-10-24 |
Method and apparatus for determining an etch property using an endpoint signal App 20060048891 - Yue; Hongyu ;   et al. | 2006-03-09 |
Method and apparatus for detecting endpoint App 20060037938 - Yue; Hongyu | 2006-02-23 |
Method and apparatus for using a pressure control system to monitor a plasma processing system App 20050283321 - Yue, Hongyu ;   et al. | 2005-12-22 |
Method and system for predicting process performance using material processing tool and sensor data App 20050252884 - Lam, Hieu A. ;   et al. | 2005-11-17 |
Controlling a material processing tool and performance data App 20050234574 - Lam, Hieu A. ;   et al. | 2005-10-20 |
Processing system and method for treating a substrate App 20050227494 - Higuchi, Fumihiko ;   et al. | 2005-10-13 |
Method and system for run-to-run control App 20050222781 - Yue, Hongyu ;   et al. | 2005-10-06 |
Method and system for adjusting a chemical oxide removal process using partial pressure App 20050218113 - Yue, Hongyu | 2005-10-06 |
Method and system for performing a chemical oxide removal process App 20050218114 - Yue, Hongyu ;   et al. | 2005-10-06 |
Method of controlling trimming of a gate electrode structure App 20050221513 - Yue, Hongyu ;   et al. | 2005-10-06 |
System and method for etching a mask App 20050221619 - Yue, Hongyu ;   et al. | 2005-10-06 |
Method and system of discriminating substrate type App 20050211669 - Lam, Hieu A. ;   et al. | 2005-09-29 |
Method of fault detection for material process system App 20050115824 - Donohue, John ;   et al. | 2005-06-02 |
Method of detecting, identifying and correcting process performance App 20050118812 - Donohue, John ;   et al. | 2005-06-02 |
System and method for etching a mask Grant 6,893,975 - Yue , et al. May 17, 2 | 2005-05-17 |
Method of trimming a gate electrode structure Grant 6,852,584 - Chen , et al. February 8, 2 | 2005-02-08 |
Method and apparatus for endpoint detection using partial least squares App 20050016947 - Fatke, David ;   et al. | 2005-01-27 |
Method for automatic configuration of processing system App 20050015176 - Harada, Satoshi ;   et al. | 2005-01-20 |
Process system health index and method of using the same App 20040259276 - Yue, Hongyu ;   et al. | 2004-12-23 |
Method and system of determining chamber seasoning condition by optical emission Grant 6,825,920 - Lam , et al. November 30, 2 | 2004-11-30 |
Method and system of determining chamber seasoning condition by optical emission App 20040008336 - Lam, Hieu A. ;   et al. | 2004-01-15 |
Method of data compression using principal components analysis Grant 6,675,137 - Toprac , et al. January 6, 2 | 2004-01-06 |
Method of determining etch endpoint using principal components analysis of optical emission spectra Grant 6,582,618 - Toprac , et al. June 24, 2 | 2003-06-24 |
Determining endpoint in etching processes using real-time principal components analysis of optical emission spectra Grant 6,564,114 - Toprac , et al. May 13, 2 | 2003-05-13 |
Determining endpoint in etching processes using principal components analysis of optical emission spectra with thresholding Grant 6,238,937 - Toprac , et al. May 29, 2 | 2001-05-29 |