Patent applications and USPTO patent grants for Yuan; Ge.The latest application filed is for "atomic layer etch and selective deposition process for extreme ultraviolet lithography resist improvement".
Patent | Date |
---|---|
Atomic Layer Etch And Selective Deposition Process For Extreme Ultraviolet Lithography Resist Improvement App 20220216050 - Yu; Jengyi ;   et al. | 2022-07-07 |
Removing Metal Contamination From Surfaces Of A Processing Chamber App 20220037132 - YU; Jengyi ;   et al. | 2022-02-03 |
Method and device concerning III-nitride edge emitting laser diode of high confinement factor with lattice matched cladding layer Grant 10,554,017 - Han , et al. Fe | 2020-02-04 |
A Method And Device Concerning Iii-nitride Edge Emitting Laser Diode Of High Confinement Factor With Lattice Matched Cladding Layer App 20180152003 - Han; Jung ;   et al. | 2018-05-31 |
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