Yu; Shinn-Sheng

Patent Applications and Registrations

Patent applications and USPTO patent grants for Yu; Shinn-Sheng.The latest application filed is for "method of manufacturing a semiconductor device and apparatus for manufacturing the semiconductor device".

Company Profile

23.128.131

Yu; Shinn-Sheng - Hsinchu TW
Yu; Shinn-Sheng - Hsin-Chu TW
Yu; Shinn-Sheng - Hsinchu City TW
Yu; Shinn-Sheng - Taichung TW
Yu; Shinn-Sheng - Chang-Hua TW

*profile and listings may contain filings by different individuals or companies with the same name. Review application materials to confirm ownership/assignment.

Patent Activity

Patent	Date
Photolithography method and apparatus Grant 11,429,027 - Yu , et al. August 30, 2	2022-08-30
Method Of Manufacturing A Semiconductor Device And Apparatus For Manufacturing The Semiconductor Device App 20220260931 - YU; Shinn-Sheng ; et al.	2022-08-18
Vertex-based Opc For Opening Patterning App 20220229968 - YU; Shinn-Sheng	2022-07-21
Method of manufacturing a semiconductor device and apparatus for manufacturing the semiconductor device Grant 11,320,747 - Yu , et al. May 3, 2	2022-05-03
Vertex-based OPC for opening patterning Grant 11,295,056 - Yu April 5, 2	2022-04-05
Method to mitigate defect printability for ID pattern Grant 11,086,227 - Lu , et al. August 10, 2	2021-08-10
Vertex-based Opc For Opening Patterning App 20210240087 - YU; Shinn-Sheng	2021-08-05
Mask with multilayer structure and manufacturing method by using the same Grant 11,073,755 - Shih , et al. July 27, 2	2021-07-27
Lithography Method With Reduced Impacts of Mask Defects App 20210208505 - Yu; Shinn-Sheng ; et al.	2021-07-08
Extreme ultraviolet lithography system, device, and method for printing low pattern density features Grant 10,976,655 - Lu , et al. April 13, 2	2021-04-13
Method Of Manufacturing A Semiconductor Device And Apparatus For Manufacturing The Semiconductor Device App 20210096475 - YU; Shinn-Sheng ; et al.	2021-04-01
Lithography method with reduced impacts of mask defects Grant 10,955,746 - Yu , et al. March 23, 2	2021-03-23
Methods of making mask using transmission cross coefficient (TCC) matrix of lithography process optical system Grant 10,867,112 - Huang , et al. December 15, 2	2020-12-15
Method of manufacturing a semiconductor device and apparatus for manufacturing the semiconductor device Grant 10,866,525 - Yu , et al. December 15, 2	2020-12-15
Mask with Multilayer Structure and Manufacturing Method by Using the Same App 20200379335 - Shih; Chih-Tsung ; et al.	2020-12-03
Pellicle for EUV mask and fabrication thereof Grant 10,831,094 - Shih , et al. November 10, 2	2020-11-10
Extreme Ultraviolet Lithography System, Device, and Method for Printing Low Pattern Density Features App 20200319545 - Lu; Yen-Cheng ; et al.	2020-10-08
Method to Mitigate Defect Printability for ID Pattern App 20200310250 - Lu; Yen-Cheng ; et al.	2020-10-01
Mask with multilayer structure and manufacturing method by using the same Grant 10,747,097 - Shih , et al. A	2020-08-18
Extreme ultraviolet lithography system, device, and method for printing low pattern density features Grant 10,691,014 - Lu , et al.	2020-06-23
Method to mitigate defect printability for ID pattern Grant 10,684,552 - Lu , et al.	2020-06-16
Photolithography Method And Apparatus App 20200057375 - YU; Shinn-Sheng ; et al.	2020-02-20
Pellicle for EUV Mask and Fabrication Thereof App 20200050100 - Shih; Chih-Tsung ; et al.	2020-02-13
Method Of Manufacturing A Semiconductor Device And Apparatus For Manufacturing The Semiconductor Device App 20200041915 - YU; Shinn-Sheng ; et al.	2020-02-06
Mask Making Method App 20200004135 - HUANG; Hsu-Ting ; et al.	2020-01-02
Pellicle for EUV mask and fabrication thereof Grant 10,520,806 - Shih , et al. Dec	2019-12-31
EUV pellicle fabrication methods and structures thereof Grant 10,274,819 - Hsu , et al.	2019-04-30
Method for integrated circuit patterning Grant 10,276,372 - Shih , et al.	2019-04-30
Extreme Ultraviolet Lithography System, Device, and Method for Printing Low Pattern Density Features App 20190121228 - Lu; Yen-Cheng ; et al.	2019-04-25
Mask with Multilayer Structure and Manufacturing Method by Using the Same App 20190113835 - Shih; Chih-Tsung ; et al.	2019-04-18
Lithography Method with Reduced Impacts of Mask Defects App 20190033720 - Yu; Shinn-Sheng ; et al.	2019-01-31
Mask with multilayer structure and manufacturing method by using the same Grant 10,168,611 - Shih , et al. J	2019-01-01
Extreme ultraviolet lithography system, device, and method for printing low pattern density features Grant 10,162,257 - Lu , et al. Dec	2018-12-25
Pellicle For Euv Mask And Fabrication Thereof App 20180341174 - Shih; Chih-Tsung ; et al.	2018-11-29
Method to Mitigate Defect Printability for ID Pattern App 20180253008 - Lu; Yen-Cheng ; et al.	2018-09-06
Pellicle for EUV mask and fabrication thereof Grant 10,031,411 - Shih , et al. July 24, 2	2018-07-24
Extreme ultraviolet lithography process and mask Grant 10,007,174 - Shih , et al. June 26, 2	2018-06-26
Extreme Ultraviolet Lithography System, Device, And Method For Printing Low Pattern Density Features App 20180173089 - Lu; Yen-Cheng ; et al.	2018-06-21
Extreme ultraviolet lithography process and mask Grant 9,996,013 - Lu , et al. June 12, 2	2018-06-12
Method to mitigate defect printability for ID pattern Grant 9,964,850 - Lu , et al. May 8, 2	2018-05-08
Method providing for asymmetric pupil configuration for an extreme ultraviolet lithography process Grant 9,886,543 - Chung , et al. February 6, 2	2018-02-06
Lithography process Grant 9,869,939 - Yu , et al. January 16, 2	2018-01-16
Method for repairing a mask Grant 9,870,612 - Yu , et al. January 16, 2	2018-01-16
Collector in an extreme ultraviolet lithography system with optimal air curtain protection Grant 9,869,934 - Huang , et al. January 16, 2	2018-01-16
Method For Repairing A Mask App 20170352144 - YU; Shinn-Sheng ; et al.	2017-12-07
Mask With Multilayer Structure And Manufacturing Method By Using The Same App 20170343892 - Shih; Chih-Tsung ; et al.	2017-11-30
Extreme ultraviolet lithography process and mask Grant 9,829,785 - Lu , et al. November 28, 2	2017-11-28
Method for Integrated Circuit Patterning App 20170338103 - Shih; Chih-Tsung ; et al.	2017-11-23
EUV focus monitoring systems and methods Grant 9,823,585 - Shih , et al. November 21, 2	2017-11-21
Mask with multilayer structure and manufacturing method by using the same Grant 9,766,536 - Shih , et al. September 19, 2	2017-09-19
Extreme ultraviolet lithography process Grant 9,760,015 - Yu , et al. September 12, 2	2017-09-12
Via definition scheme Grant 9,748,133 - Lu , et al. August 29, 2	2017-08-29
Extreme ultraviolet lithography process and mask Grant 9,733,562 - Lu , et al. August 15, 2	2017-08-15
Method Providing For Asymmetric Pupil Configuration For An Extreme Ultraviolet Lithography Process App 20170228490 - Chung; Chia-Chun ; et al.	2017-08-10
Method of semiconductor integrated circuit fabrication Grant 9,728,408 - Lee , et al. August 8, 2	2017-08-08
Method to define multiple layer patterns with a single exposure by charged particle beam lithography Grant 9,726,983 - Lu , et al. August 8, 2	2017-08-08
EUV mask and manufacturing method by using the same Grant 9,709,884 - Shih , et al. July 18, 2	2017-07-18
Extreme ultraviolet lithography process and mask Grant 9,690,186 - Lu , et al. June 27, 2	2017-06-27
Photomask for forming multiple layer patterns with a single exposure Grant 9,685,367 - Lu , et al. June 20, 2	2017-06-20
Method of making an extreme ultraviolet pellicle Grant 9,664,999 - Shih , et al. May 30, 2	2017-05-30
Method of fabricating a semiconductor integrated circuit using a directed self-assembly block copolymer Grant 9,640,397 - Wu , et al. May 2, 2	2017-05-02
Photomask For Forming Multiple Layer Patterns With A Single Exposure App 20170110366 - LU; Yen-Cheng ; et al.	2017-04-20
Extreme ultraviolet lithography process and mask with reduced shadow effect and enhanced intensity Grant 9,618,837 - Lu , et al. April 11, 2	2017-04-11
Method of fabricating an integrated circuit with enhanced defect repairability Grant 9,612,531 - Lu , et al. April 4, 2	2017-04-04
Structure and method for reflective-type mask Grant 9,612,523 - Shih , et al. April 4, 2	2017-04-04
Extreme ultraviolet light (EUV) photomasks and fabrication methods thereof Grant 9,588,419 - Lu , et al. March 7, 2	2017-03-07
Extreme Ultraviolet Lithography Process And Mask With Reduced Shadow Effect And Enhanced Intensity App 20170052441 - LU; YEN-CHENG ; et al.	2017-02-23
Method and system for reducing pole imbalance by adjusting exposure intensity Grant 9,575,412 - Lu , et al. February 21, 2	2017-02-21
Method To Define Multiple Layer Patterns With A Single Exposure By Charged Particle Beam Lithography App 20170045827 - Lu; Yen-Cheng ; et al.	2017-02-16
Assist feature for a photolithographic process Grant 9,557,649 - Huang , et al. January 31, 2	2017-01-31
Extreme ultraviolet lithography mask and multilayer deposition method for fabricating same Grant 9,557,636 - Lu , et al. January 31, 2	2017-01-31
Mask With Multilayer Structure And Manufacturing Method By Using The Same App 20170017147 - Shih; Chih-Tsung ; et al.	2017-01-19
Extreme ultraviolet lithography process to print low pattern density features Grant 9,535,334 - Lu , et al. January 3, 2	2017-01-03
Photomask with three states for forming multiple layer patterns with a single exposure Grant 9,535,316 - Lu , et al. January 3, 2	2017-01-03
Extreme Ultraviolet Lithography Process App 20160377983 - YU; Shinn-Sheng ; et al.	2016-12-29
Extreme ultraviolet lithography process and mask Grant 9,529,249 - Shih , et al. December 27, 2	2016-12-27
Extreme ultraviolet lithography process and mask Grant 9,529,272 - Lu , et al. December 27, 2	2016-12-27
EUV mask with ITO absorber to suppress out of band radiation Grant 9,529,250 - Hsieh , et al. December 27, 2	2016-12-27
Method Of Making An Extreme Ultraviolet Pellicle App 20160363857 - Shih; Chih-Tsung ; et al.	2016-12-15
Via Definition Scheme App 20160329240 - Lu; Yen-Cheng ; et al.	2016-11-10
Extreme ultraviolet lithography process and mask with reduced shadow effect and enhanced intensity Grant 9,488,905 - Lu , et al. November 8, 2	2016-11-08
Extreme Ultraviolet Lithography Process And Mask App 20160306272 - Lu; Yen-Cheng ; et al.	2016-10-20
Collector in an Extreme Ultraviolet Lithography System with Optimal Air Curtain Protection App 20160306282 - Huang; Chia-Ching ; et al.	2016-10-20
EUV focus monitoring systems and methods App 20160291482 - Shih; Chih-Tsung ; et al.	2016-10-06
Extreme ultraviolet lithography process and mask Grant 9,448,491 - Lu , et al. September 20, 2	2016-09-20
Method of making an extreme ultraviolet pellicle Grant 9,442,368 - Shih , et al. September 13, 2	2016-09-13
Mask for extreme ultraviolet lithography and method of fabricating same Grant 9,442,365 - Lu , et al. September 13, 2	2016-09-13
Extreme ultraviolet lithography process and mask Grant 9,442,384 - Lu , et al. September 13, 2	2016-09-13
Extreme ultraviolet lithography process Grant 9,442,387 - Lu , et al. September 13, 2	2016-09-13
Method for integrated circuit patterning Grant 9,418,862 - Huang , et al. August 16, 2	2016-08-16
Lithography method and structure for resolution enhancement with a two-state mask Grant 9,417,534 - Lu , et al. August 16, 2	2016-08-16
Euv Pellicle Fabrication Methods And Structures Thereof App 20160231647 - Hsu; Pei-Cheng ; et al.	2016-08-11
Via definition scheme Grant 9,412,647 - Lu , et al. August 9, 2	2016-08-09
Extreme Ultraviolet Lithography Process and Mask App 20160223899 - SHIH; CHIH-TSUNG ; et al.	2016-08-04
Method to define multiple layer patterns with a single exposure by charged particle beam lithography Grant 9,405,195 - Lu , et al. August 2, 2	2016-08-02
Lithography Method and Structure for Resolution Enhancement with a Two-State Mask App 20160209757 - Lu; Yen-Cheng ; et al.	2016-07-21
Assist Feature for a Photolithographic Process App 20160195812 - HUANG; TAO-MIN ; et al.	2016-07-07
Extreme ultraviolet lithography process and mask Grant 9,377,696 - Lu , et al. June 28, 2	2016-06-28
Collector in an extreme ultraviolet lithography system with optimal air curtain protection Grant 9,377,693 - Huang , et al. June 28, 2	2016-06-28
Method of Semiconductor Integrated Circuit Fabrication App 20160172196 - LEE; Chung-Ju ; et al.	2016-06-16
Extreme Ultraviolet Lithography Process and Mask with Reduced Shadow Effect and Enhanced Intensity App 20160161839 - LU; YEN-CHENG ; et al.	2016-06-09
Extreme ultraviolet lithography process and mask Grant 9,354,507 - Shih , et al. May 31, 2	2016-05-31
Euv Mask And Manufacturing Method By Using The Same App 20160147138 - Shih; Chih-Tsung ; et al.	2016-05-26
Pellicle For Euv Mask And Fabrication Thereof App 20160147137 - Shih; Chih-Tsung ; et al.	2016-05-26
Euv Mask With Ito Absorber To Suppress Out Of Band Radiation App 20160124297 - Hsieh; Yi-Ling ; et al.	2016-05-05
Method Of Making An Extreme Ultraviolet Pellicle App 20160109798 - Shih; Chih-Tsung ; et al.	2016-04-21
Extreme ultraviolet lithography process and mask Grant 9,316,900 - Shih , et al. April 19, 2	2016-04-19
Extreme ultraviolet lithography process and mask Grant 9,304,390 - Lu , et al. April 5, 2	2016-04-05
Mask for use in lithography Grant 9,285,671 - Lu , et al. March 15, 2	2016-03-15
Assist feature for a photolithographic process Grant 9,285,673 - Huang , et al. March 15, 2	2016-03-15
Method of fabricating mask Grant 9,280,046 - Yen , et al. March 8, 2	2016-03-08
Method for Integrated Circuit Patterning App 20160064239 - Shih; Chih-Tsung ; et al.	2016-03-03
Method for Integrated Circuit Patterning App 20160064240 - Huang; Tsung-Min ; et al.	2016-03-03
Extreme Ultraviolet Lithography Process and Mask App 20160048071 - LU; YEN-CHENG ; et al.	2016-02-18
Extreme ultraviolet lithography process and mask with reduced shadow effect and enhanced intensity Grant 9,261,774 - Lu , et al. February 16, 2	2016-02-16
Method of making an extreme ultraviolet pellicle Grant 9,256,123 - Shih , et al. February 9, 2	2016-02-09
Method of semiconductor integrated circuit fabrication Grant 9,257,282 - Shih , et al. February 9, 2	2016-02-09
Method to Mitigate Defect Printability for ID Pattern App 20160033866 - Lu; Yen-Cheng ; et al.	2016-02-04
Metal and via definition scheme Grant 9,252,048 - Lu , et al. February 2, 2	2016-02-02
Extreme ultraviolet lithography process and mask Grant 9,244,366 - Lu , et al. January 26, 2	2016-01-26
Assist Feature for a Photolithographic Process App 20160011501 - HUANG; Tao-Min ; et al.	2016-01-14
Method for integrated circuit patterning Grant 9,229,326 - Lu , et al. January 5, 2	2016-01-05
Lithography and mask for resolution enhancement Grant 9,223,197 - Yu , et al. December 29, 2	2015-12-29
Reflective mask and method of making same Grant 9,213,232 - Hsu , et al. December 15, 2	2015-12-15
Extreme Ultraviolet Lithography Process and Mask App 20150346596 - Lu; Yen-Cheng ; et al.	2015-12-03
Method for mask fabrication and repair Grant 9,195,135 - Lu , et al. November 24, 2	2015-11-24
Extreme Ultraviolet Light (EUV) Photomasks and Fabrication Methods Thereof App 20150331307 - Lu; Yen-Cheng ; et al.	2015-11-19
Extreme ultraviolet lithography process and mask Grant 9,182,659 - Lu , et al. November 10, 2	2015-11-10
Method for integrated circuit patterning Grant 9,184,054 - Huang , et al. November 10, 2	2015-11-10
Method of Semiconductor Integrated Circuit Fabrication App 20150318173 - Shih; Chih-Tsung ; et al.	2015-11-05
Method Of Making An Extreme Ultraviolet Pellicle App 20150309405 - Shih; Chih-Tsung ; et al.	2015-10-29
Method for Integrated Circuit Patterning App 20150311075 - Huang; Tsung-Min ; et al.	2015-10-29
Method to Define Multiple Layer Patterns with a Single Exposure by Charged Particle Beam Lithography App 20150287596 - Lu; Yen-Cheng ; et al.	2015-10-08
Method and System for Reducing Pole Imbalance by Adjusting Exposure Intensity App 20150277234 - Lu; Yen-Cheng ; et al.	2015-10-01
Extreme ultraviolet lithography process and mask Grant 9,146,459 - Lu , et al. September 29, 2	2015-09-29
Lithography Process App 20150268565 - Yu; Shinn-Sheng ; et al.	2015-09-24
Method of Fabricating an Integrated Circuit with Enhanced Defect Repairability App 20150268561 - LU; YEN-CHENG ; et al.	2015-09-24
Collector in an Extreme Ultraviolet Lithography System with Optimal Air Curtain Protection App 20150261094 - Huang; Chia-Ching ; et al.	2015-09-17
Method for Integrated Circuit Patterning App 20150262836 - LU; YEN-CHENG ; et al.	2015-09-17
Method of Fabricating Semiconductor Integrated Circuit App 20150262815 - WU; CHIEH-HAN ; et al.	2015-09-17
Structure and Method for Reflective-Type Mask App 20150261082 - SHIH; CHIH-TSUNG ; et al.	2015-09-17
Extreme ultraviolet (EUV) mask and method of fabricating the EUV mask Grant 9,134,604 - Shih , et al. September 15, 2	2015-09-15
Extreme ultraviolet lithography process and mask Grant 9,122,166 - Lu , et al. September 1, 2	2015-09-01
Extreme ultraviolet lithography mask Grant 9,116,435 - Yu , et al. August 25, 2	2015-08-25
Extreme Ultraviolet Lithography Process And Mask App 20150227059 - LU; YEN-CHENG ; et al.	2015-08-13
Extreme ultraviolet light (EUV) photomasks and fabrication methods thereof Grant 9,091,947 - Lu , et al. July 28, 2	2015-07-28
Method to define multiple layer patterns with a single exposure by E-beam lithography Grant 9,081,312 - Lu , et al. July 14, 2	2015-07-14
Extreme ultraviolet (EUV) mask, method of fabricating the EUV mask and method of inspecting the EUV mask Grant 9,081,288 - Shih , et al. July 14, 2	2015-07-14
Multiple exposures in extreme ultraviolet lithography Grant 9,075,313 - Yu , et al. July 7, 2	2015-07-07
Extreme Ultraviolet Lithography Process and Mask App 20150168845 - Lu; Yen-Cheng ; et al.	2015-06-18
Lithography process Grant 9,052,595 - Yu , et al. June 9, 2	2015-06-09
Structure and method for reflective-type mask Grant 9,046,781 - Shih , et al. June 2, 2	2015-06-02
Extreme Ultraviolet Lithography Process And Mask App 20150147686 - Lu; Yen-Cheng ; et al.	2015-05-28
Extreme Ultraviolet Lithography Process and Mask with Reduced Shadow Effect and Enhanced Intensity App 20150147687 - Lu; Yen-Cheng ; et al.	2015-05-28
Extreme Ultraviolet Lithography Process and Mask App 20150138524 - Shih; Chih-Tsung ; et al.	2015-05-21
Extreme ultraviolet lithography process and mask Grant 9,034,569 - Lu , et al. May 19, 2	2015-05-19
Extreme Ultraviolet Lithography Process to Print Low Pattern Density Features App 20150116685 - Lu; Yen-Cheng ; et al.	2015-04-30
Extreme Ultraviolet Lithography Process and Mask App 20150104734 - Shih; Chih-Tsung ; et al.	2015-04-16
Reflective Mask And Method Of Making Same App 20150104736 - HSU; Pei-Cheng ; et al.	2015-04-16
Extreme Ultraviolet Lithography Process and Mask App 20150098069 - Lu; Yen-Cheng ; et al.	2015-04-09
Extreme Ultraviolet Lithography Process And Mask App 20150085268 - LU; Yen-Cheng ; et al.	2015-03-26
Via Definition Scheme App 20150069622 - Lu; Yen-Cheng ; et al.	2015-03-12
Extreme Ultraviolet Lithography Process and Mask App 20150072271 - Lu; Yen-Cheng ; et al.	2015-03-12
Metal and Via Definition Scheme App 20150072519 - Lu; Yen-Cheng ; et al.	2015-03-12
Extreme Ultraviolet (Euv) Mask And Method Of Fabricating The Euv Mask App 20150064611 - Shih; Chih-Tsung ; et al.	2015-03-05
Extreme Ultraviolet (EUV) Mask, Method Of Fabricating The EUV Mask And Method Of Inspecting The EUV Mask App 20150037712 - Shih; Chih-Tsung ; et al.	2015-02-05
Extreme Ultraviolet Light (euv) Photomasks And Fabrication Methods Thereof App 20150024305 - Lu; Yen-Cheng ; et al.	2015-01-22
Extreme Ultraviolet Lithography Mask App 20150009482 - YU; SHINN-SHENG ; et al.	2015-01-08
Extreme Ultraviolet Lithography Mask and Multilayer Deposition Method for Fabricating Same App 20140377693 - Lu; Yen-Cheng ; et al.	2014-12-25
Method to Define Multiple Layer Patterns With a Single Exposure by E-Beam Lithography App 20140342272 - Lu; Yen-Cheng ; et al.	2014-11-20
Photomask With Three States For Forming Multiple Layer Patterns With A Single Exposure App 20140342564 - Lu; Yen-Cheng ; et al.	2014-11-20
Reflective mask and method of making same Grant 8,877,409 - Hsu , et al. November 4, 2	2014-11-04
Lithography Method and Structure for Resolution Enhancement with a Two-State Mask App 20140285789 - Lu; Yen-Cheng ; et al.	2014-09-25
Extreme ultraviolet lithography process and mask Grant 8,841,047 - Yu , et al. September 23, 2	2014-09-23
Extreme Ultraviolet Lithography Process and Mask App 20140272679 - Lu; Yen-Cheng ; et al.	2014-09-18
Extreme Ultraviolet Lithography Process and Mask App 20140272721 - LU; YEN-CHENG ; et al.	2014-09-18
Lithography Process App 20140272718 - Yu; Shinn-Sheng ; et al.	2014-09-18
Multiple Exposures in Extreme Ultraviolet Lithography App 20140272720 - Yu; Shinn-Sheng ; et al.	2014-09-18
Method For Mask Fabrication And Repair App 20140272680 - Lu; Yen-Cheng ; et al.	2014-09-18
Method Of Fabricating Mask App 20140272683 - Yen; Anthony ; et al.	2014-09-18
Structure and Method for Reflective-Type Mask App 20140272678 - Shih; Chih-Tsung ; et al.	2014-09-18
Extreme Ultraviolet Lithography Process and Mask App 20140268086 - LU; YEN-CHENG ; et al.	2014-09-18
Extreme Ultraviolet Lithography Process and Mask App 20140268091 - LU; YEN-CHENG ; et al.	2014-09-18
Extreme Ultraviolet Lithography Process and Mask App 20140272682 - Shih; Chih-Tsung ; et al.	2014-09-18
Extreme Ultraviolet Lithography Process and Mask App 20140268092 - LU; YEN-CHENG ; et al.	2014-09-18
Mask for Extreme Ultraviolet Lithography and Method of Fabricating Same App 20140272686 - LU; YEN-CHENG ; et al.	2014-09-18
Lithography and Mask for Resolution Enhancement App 20140268087 - Yu; Shinn-Sheng ; et al.	2014-09-18
Extreme Ultraviolet Lithography Projection Optics System and Associated Methods App 20140253892 - Yu; Shinn-Sheng ; et al.	2014-09-11
Extreme ultraviolet lithography mask and multilayer deposition method for fabricating same Grant 8,828,625 - Lu , et al. September 9, 2	2014-09-09
Extreme Ultraviolet Lithography Process App 20140218713 - Lu; Yen-Cheng ; et al.	2014-08-07
Method to define multiple layer patterns using a single exposure Grant 8,791,024 - Lu , et al. July 29, 2	2014-07-29
Method for mask fabrication and repair Grant 8,785,084 - Lu , et al. July 22, 2	2014-07-22
Phase shift mask for extreme ultraviolet lithography and method of fabricating same Grant 8,765,330 - Shih , et al. July 1, 2	2014-07-01
Mask for Use in Lithography App 20140113222 - Lu; Yen-Cheng ; et al.	2014-04-24
Method For Mask Fabrication And Repair App 20140065521 - Lu; Yen-Cheng ; et al.	2014-03-06
Mask and method for forming the same Grant 8,663,878 - Yu , et al. March 4, 2	2014-03-04
Phase Shift Mask for Extreme Ultraviolet Lithography and Method of Fabricating Same App 20140038086 - Shih; Chih-Tsung ; et al.	2014-02-06
Extreme Ultraviolet Lithography Mask and Multilayer Deposition Method for Fabricating Same App 20140038090 - Lu; Yen-Cheng ; et al.	2014-02-06
Extreme ultraviolet lithography process and mask Grant 8,628,897 - Lu , et al. January 14, 2	2014-01-14
Mask And Method For Forming The Same App 20140011121 - Yu; Shinn-Sheng ; et al.	2014-01-09
Extreme Ultraviolet Lithography Process And Mask App 20140011120 - Lu; Yen-Cheng ; et al.	2014-01-09
Reflective Mask And Method Of Making Same App 20130280643 - Hsu; Pei-Cheng ; et al.	2013-10-24
Extreme Ultraviolet Lithography Process And Mask App 20130260288 - Yu; Shinn-Sheng ; et al.	2013-10-03
Mechanisms for patterning fine features Grant 8,492,054 - Yu , et al. July 23, 2	2013-07-23
Mechanisms For Patterning Fine Features App 20120244460 - YU; Shinn-Sheng ; et al.	2012-09-27
Method of fabrication of a semiconductor device having reduced pitch Grant 8,241,823 - Shieh , et al. August 14, 2	2012-08-14
Method Of Fabrication Of A Semiconductor Device Having Reduced Pitch App 20120021589 - Shieh; Ming-Feng ; et al.	2012-01-26
Integrated circuit layout design Grant 8,039,179 - Shieh , et al. October 18, 2	2011-10-18
System for improving critical dimension uniformity Grant 8,027,529 - Yu , et al. September 27, 2	2011-09-27
Method of pitch halving Grant 7,989,355 - Shieh , et al. August 2, 2	2011-08-02
Integrated Circuit Layout Design App 20110151359 - Shieh; Ming-Feng ; et al.	2011-06-23
Seal ring arrangements for immersion lithography systems Grant 7,924,401 - Lin , et al. April 12, 2	2011-04-12
Method and system for optimizing intra-field critical dimension uniformity using a sacrificial twin mask Grant 7,897,297 - Ke , et al. March 1, 2	2011-03-01
Integrated circuit layout design Grant 7,862,962 - Shieh , et al. January 4, 2	2011-01-04
Method and system for optimizing sub-nanometer critical dimension using pitch offset Grant 7,777,884 - Ke , et al. August 17, 2	2010-08-17
Method Of Pitch Halving App 20100203734 - Shieh; Ming-Feng ; et al.	2010-08-12
System For Improving Critical Dimension Uniformity App 20100201961 - Yu; Shinn-Sheng ; et al.	2010-08-12
Integrated Circuit Layout Design App 20100183961 - Shieh; Ming-Feng ; et al.	2010-07-22
Method and system for improving critical dimension uniformity Grant 7,732,109 - Yu , et al. June 8, 2	2010-06-08
Method and system for improving accuracy of critical dimension metrology Grant 7,580,129 - Yu , et al. August 25, 2	2009-08-25
Seal Ring Arrangements for Immersion Lithography Systems App 20090180087 - Lin; Burn Jeng ; et al.	2009-07-16
Seal ring arrangements for immersion lithography systems Grant 7,517,639 - Lin , et al. April 14, 2	2009-04-14
Method And System For Improving Critical Dimension Uniformity App 20080248403 - Yu; Shinn-Sheng ; et al.	2008-10-09
Method and System for Optimizing Lithography Focus and/or Energy Using a Specially-Designed Optical Critical Dimension Pattern App 20080233487 - Huang; Jacky ; et al.	2008-09-25
Method and System for Improving Accuracy of Critical Dimension Metrology App 20080204730 - Yu; Shinn-Sheng ; et al.	2008-08-28
Method and System For Optimizing Sub-Nanometer Critical Dimension Using Pitch Offset App 20080174778 - Ke; Chih-Ming ; et al.	2008-07-24
Method and system for optimizing intra-field critical dimension uniformity using a sacrificial twin mask App 20070292771 - Ke; Chih-Ming ; et al.	2007-12-20
Method And System For Optimizing Intra-field Critical Dimension Uniformity Using A Sacrificial Twin Mask App 20070292774 - Ke; Chih-Ming ; et al.	2007-12-20
Approach to improve ellipsometer modeling accuracy for solving material optical constants N & K Grant 7,259,850 - Ke , et al. August 21, 2	2007-08-21
Seal ring arrangements for immersion lithography systems App 20070008508 - Lin; Burn Jeng ; et al.	2007-01-11
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Approach to improve ellipsometer modeling accuracy for solving material optical constants N & K App 20050151969 - Ke, Chih-Ming ; et al.	2005-07-14
Assist feature for random, isolated, semi-dense, and other non-dense contacts Grant 6,787,272 - Yu September 7, 2	2004-09-07
Photoresist reflow for enhanced process window for random, isolated, semi-dense, and other non-dense contacts Grant 6,784,005 - Lin , et al. August 31, 2	2004-08-31
Optical proximity correction common process window maximization over varying feature pitch Grant 6,749,972 - Yu June 15, 2	2004-06-15
Hole printing by packing and unpacking using alternating phase-shifting masks Grant 6,664,011 - Lin , et al. December 16, 2	2003-12-16
Assist feature for random, isolated, semi-dense, and other non-dense contacts App 20030165654 - Yu, Shinn-Sheng	2003-09-04
Photoresist reflow for enhanced process window for random, isolated, semi-dense, and other non-dense contacts App 20030157808 - Lin, Huan-Tai ; et al.	2003-08-21
Optical proximity correction common process window maximization over varying feature pitch App 20030134205 - Yu, Shinn-Sheng	2003-07-17
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Contact hole printing by packing and unpacking App 20030104319 - Lin, Burn J. ; et al.	2003-06-05
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