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Imprint apparatus, method of operating the same, and method of manufacturing article Grant 11,036,149 - Matsuoka , et al. June 15, 2 | 2021-06-15 |
Imprint apparatus, method for manufacturing article, and exposure apparatus Grant 10,889,052 - Yonekawa , et al. January 12, 2 | 2021-01-12 |
Container, Processing Apparatus, Particle Removing Method, And Method Of Manufacturing Article App 20200176275 - Yonekawa; Masami | 2020-06-04 |
Lithography apparatus and method of manufacturing article Grant 10,444,646 - Yonekawa Oc | 2019-10-15 |
Lithography apparatus and article manufacturing method Grant 10,228,624 - Yonekawa | 2019-03-12 |
Lithography Apparatus And Method Of Manufacturing Article App 20190064682 - Yonekawa; Masami | 2019-02-28 |
Imprint Apparatus, Method Of Operating The Same, And Method Of Manufacturing Article App 20180356741 - Matsuoka; Yoichi ;   et al. | 2018-12-13 |
Imprint Apparatus, Method For Manufacturing Article, And Exposure Apparatus App 20170246792 - Yonekawa; Masami ;   et al. | 2017-08-31 |
Lithography Apparatus And Article Manufacturing Method App 20170235234 - Yonekawa; Masami | 2017-08-17 |
Reflective original, exposure method, and device manufacturing method Grant 9,213,231 - Yonekawa , et al. December 15, 2 | 2015-12-15 |
Reflective Original, Exposure Method, And Device Manufacturing Method App 20150017573 - Yonekawa; Masami ;   et al. | 2015-01-15 |
Trapping device that traps particles in vacuum atmosphere Grant 8,814,970 - Yonekawa August 26, 2 | 2014-08-26 |
Trapping Device That Traps Particles In Vacuum Atmosphere App 20110186082 - YONEKAWA; Masami | 2011-08-04 |
Exposure apparatus and original Grant 7,911,588 - Yonekawa , et al. March 22, 2 | 2011-03-22 |
Exposure Apparatus App 20100183987 - Yonekawa; Masami | 2010-07-22 |
Exposure apparatus having a processing chamber, a vacuum chamber and first and second load lock chambers Grant 7,670,754 - Edo , et al. March 2, 2 | 2010-03-02 |
Exposure Apparatus And Original App 20080246939 - Yonekawa; Masami ;   et al. | 2008-10-09 |
Apparatus and method for removing contaminant on original, method of manufacturing device, and original Grant 7,319,507 - Yonekawa , et al. January 15, 2 | 2008-01-15 |
Exposure Apparatus, Removal Method, And Device Manufacturing Method App 20070285635 - YONEKAWA; Masami | 2007-12-13 |
Exposure Apparatus And Device Manufacturing Method App 20070127004 - Yonekawa; Masami | 2007-06-07 |
Exposure apparatus and device manufacturing method Grant 7,193,682 - Yonekawa March 20, 2 | 2007-03-20 |
Apparatus and method for removing contaminant on original, method of manufacturing device, and original App 20060082743 - Yonekawa; Masami ;   et al. | 2006-04-20 |
Exposure apparatus and device manufacturing method App 20050183823 - Yonekawa, Masami | 2005-08-25 |
Processing system and exposure apparatus using the same App 20050121144 - Edo, Ryo ;   et al. | 2005-06-09 |
Exposure apparatus and its control method, stage apparatus, and device manufacturing method Grant 6,741,328 - Yonekawa , et al. May 25, 2 | 2004-05-25 |
Exposure apparatus and control method for correcting an exposure optical system on the basis of an estimated magnification variation Grant 6,433,351 - Yonekawa August 13, 2 | 2002-08-13 |
Exposure Apparatus And Control Method For Correcting An Exposure Optical System On The Basis Of An Estimated Magnification Variation App 20020053644 - YONEKAWA, MASAMI | 2002-05-09 |
Exposure apparatus and its control method, stage apparatus, and device manufacturing method App 20020044269 - Yonekawa, Masami ;   et al. | 2002-04-18 |
Projection exposure apparatus with an aberration compensation device of a projection lens Grant 5,184,176 - Unno , et al. February 2, 1 | 1993-02-02 |