Yang; Dengliang

Patent Applications and Registrations

Patent applications and USPTO patent grants for Yang; Dengliang.The latest application filed is for "high-quality seawater spirulina strain obtained by space-breeding and use thereof".

Company Profile

6.12.13

Yang; Dengliang - Guangzhou CN
Yang; Dengliang - Union City CA
Yang; Dengliang - Fremont CA
Yang; Dengliang - La Jolla CA

*profile and listings may contain filings by different individuals or companies with the same name. Review application materials to confirm ownership/assignment.

Patent Activity

Patent	Date
High-quality seawater Spirulina strain obtained by space-breeding and use thereof Grant 11,021,684 - Xiang , et al. June 1, 2	2021-06-01
Systems and methods for selectively etching film Grant 10,727,089 - Caron , et al.	2020-07-28
High-quality Seawater Spirulina Strain Obtained By Space-breeding And Use Thereof App 20200095538 - XIANG; Wenzhou ; et al.	2020-03-26
Ultrahigh Selective Polysilicon Etch With High Throughput App 20190221654 - Yang; Dengliang ; et al.	2019-07-18
Ultrahigh selective polysilicon etch with high throughput Grant 10,283,615 - Yang , et al.	2019-05-07
Systems and methods for detecting oxygen in-situ in a substrate area of a substrate processing system Grant 10,267,728 - Yang , et al.	2019-04-23
Systems and methods for ultrahigh selective nitride etch Grant 10,192,751 - Yang , et al. Ja	2019-01-29
System and method for increasing electron density levels in a plasma of a substrate processing system Grant 10,147,588 - Eason , et al. De	2018-12-04
Ultrahigh Selective Nitride Etch To Form Finfet Devices App 20180269070 - Eason; Kwame ; et al.	2018-09-20
Systems And Methods For Metastable Activated Radical Selective Strip And Etch Using Dual Plenum Showerhead App 20180174870 - Yang; Dengliang ; et al.	2018-06-21
Systems And Methods For Detecting Oxygen In-situ In A Substrate Area Of A Substrate Processing System App 20180088031 - Yang; Dengliang ; et al.	2018-03-29
Systems and methods for selectively etching tungsten in a downstream reactor Grant 9,837,286 - Yang , et al. December 5, 2	2017-12-05
Systems And Methods For Selectively Etching Film App 20170236731 - Caron; James Eugene ; et al.	2017-08-17
System And Method For Increasing Electron Density Levels In A Plasma Of A Substrate Processing System App 20170236694 - Eason; Kwame ; et al.	2017-08-17
Self-limited planarization of hardmask Grant 9,640,409 - Yang , et al. May 2, 2	2017-05-02
Systems And Methods For Ultrahigh Selective Nitride Etch App 20170110335 - Yang; Dengliang ; et al.	2017-04-20
Systems And Methods For Selectively Etching Tungsten In A Downstream Reactor App 20170069511 - Yang; Dengliang ; et al.	2017-03-09
Air gap spacer integration for improved fin device performance Grant 9,515,156 - Besser , et al. December 6, 2	2016-12-06
Air Gap Spacer Integration For Improved Fin Device Performance App 20160111515 - Besser; Paul Raymond ; et al.	2016-04-21
Ultrahigh Selective Polysilicon Etch With High Throughput App 20160064519 - Yang; Dengliang ; et al.	2016-03-03
Ultra-thin organic TFT chemical sensor, making thereof, and sensing method Grant 8,384,409 - Kummel , et al. February 26, 2	2013-02-26
Substrate device having a tuned work function and methods of forming thereof Grant 8,129,280 - Wang , et al. March 6, 2	2012-03-06
Substrate Device Having A Tuned Work Function And Methods Of Forming Thereof App 20110018073 - WANG; RONGJUN ; et al.	2011-01-27
Ultra-thin Organic Tft Chemical Sensor, Making Thereof, And Sensing Method App 20100176837 - Kummel; Andrew C. ; et al.	2010-07-15

uspto.report is an independent third-party trademark research tool that is not affiliated, endorsed, or sponsored by the United States Patent and Trademark Office (USPTO) or any other governmental organization. The information provided by uspto.report is based on publicly available data at the time of writing and is intended for informational purposes only.

While we strive to provide accurate and up-to-date information, we do not guarantee the accuracy, completeness, reliability, or suitability of the information displayed on this site. The use of this site is at your own risk. Any reliance you place on such information is therefore strictly at your own risk.

All official trademark data, including owner information, should be verified by visiting the official USPTO website at www.uspto.gov. This site is not intended to replace professional legal advice and should not be used as a substitute for consulting with a legal professional who is knowledgeable about trademark law.