Yan; Chun

Patent Applications and Registrations

Patent applications and USPTO patent grants for Yan; Chun.The latest application filed is for "processing of workpieces using flourocarbon plasma".

Company Profile

18.44.52

Yan; Chun - San Jose CA
Yan; Chun - Hangzhou CN
Yan; Chun - Santa Clara CA

*profile and listings may contain filings by different individuals or companies with the same name. Review application materials to confirm ownership/assignment.

Patent Activity

Patent	Date
Silicon mandrel etch after native oxide punch-through Grant 11,387,115 - Yan , et al. July 12, 2	2022-07-12
Spacer etching process Grant 11,276,560 - Sung , et al. March 15, 2	2022-03-15
Spacer open process by dual plasma Grant 11,195,718 - Sung , et al. December 7, 2	2021-12-07
Processing of Workpieces Using Flourocarbon Plasma App 20210305071 - Wang; Shanyu ; et al.	2021-09-30
Ozone treatment for selective silicon nitride etch over silicon Grant 11,043,393 - Wang , et al. June 22, 2	2021-06-22
Spacer Etching Process App 20210066047 - Sung; Tsai Wen ; et al.	2021-03-04
Processing Of Workpieces Using Deposition Process And Etch Process App 20210020445 - Wang; Shanyu ; et al.	2021-01-21
Spacer Open Process By Dual Plasma App 20210005456 - Sung; Tsai Wen ; et al.	2021-01-07
Post Plasma Gas Injection In A Separation Grid App 20200243305 - Zeng; Weimin ; et al.	2020-07-30
Ozone Treatment for Selective Silicon Nitride Etch Over Silicon App 20200234969 - Wang; Shanyu ; et al.	2020-07-23
Silicon Mandrel Etch After Native Oxide Punch-through App 20200203182 - Yan; Chun ; et al.	2020-06-25
Integrated system and method for source/drain engineering Grant 10,504,717 - Yan , et al. Dec	2019-12-10
Method for removing native oxide and residue from a III-V group containing surface Grant 10,438,796 - Yan , et al. O	2019-10-08
Method for protecting cloud storage video data and system thereof Grant 10,395,048 - Zhou , et al. A	2019-08-27
UV radiation system and method for arsenic outgassing control in sub 7nm CMOS fabrication Grant 10,332,739 - Yan , et al.	2019-06-25
Degassing Chamber For Arsenic Related Processes App 20190169767 - BAO; Xinyu ; et al.	2019-06-06
Method And Apparatus For Wafer Outgassing Control App 20190172728 - BAO; Xinyu ; et al.	2019-06-06
Method of uniform channel formation Grant 10,243,063 - Yan , et al.	2019-03-26
Method for wafer outgassing control Grant 10,236,190 - Yan , et al.	2019-03-19
Self-aligned process for sub-10nm fin formation Grant 10,224,421 - Ye , et al.	2019-03-05
Method of epitaxial growth shape control for CMOS applications Grant 10,205,002 - Bao , et al. Feb	2019-02-12
Integrated System And Method For Source/drain Engineering App 20190035623 - YAN; Chun ; et al.	2019-01-31
Method For Conditioning A Processing Chamber For Steady Etching Rate Control App 20190013221 - YAN; Chun	2019-01-10
Method for conditioning a processing chamber for steady etching rate control Grant 10,177,017 - Yan J	2019-01-08
Methods and solutions for cleaning INGAAS (or III-V) substrates Grant 10,147,596 - Yan , et al. De	2018-12-04
Method and apparatus for wafer outgassing control Grant 10,115,607 - Bao , et al. October 30, 2	2018-10-30
Integrated system and method for source/drain engineering Grant 10,090,147 - Yan , et al. October 2, 2	2018-10-02
Self-aligned Process For Sub-10nm Fin Formation App 20180277649 - YE; Zhiyuan ; et al.	2018-09-27
Integrated method for wafer outgassing reduction Grant 10,043,667 - Yan , et al. August 7, 2	2018-08-07
Template Formation For Fully Relaxed Sige Growth App 20180211836 - YAN; Chun ; et al.	2018-07-26
Integrated System And Method For Source/drain Engineering App 20180174825 - YAN; Chun ; et al.	2018-06-21
Method of forming structures with V shaped bottom on silicon substrate Grant 10,002,759 - Bao , et al. June 19, 2	2018-06-19
Methods And Solutions For Cleaning Ingaas (or Iii-v) Substrates App 20180138032 - YAN; Chun ; et al.	2018-05-17
Integrated System And Method For Source/drain Engineering App 20180082836 - YAN; Chun ; et al.	2018-03-22
Method And Apparatus For Wafer Outgassing Control App 20180082874 - BAO; Xinyu ; et al.	2018-03-22
Uv Radiation System And Method For Arsenic Outgassing Control In Sub 7nm Cmos Fabrication App 20180082835 - YAN; Chun ; et al.	2018-03-22
Degassing Chamber For Arsenic Related Processes App 20180073162 - BAO; Xinyu ; et al.	2018-03-15
Integrated Method For Wafer Outgassing Reduction App 20180076031 - YAN; Chun ; et al.	2018-03-15
Method and solution for cleaning InGaAs (or III-V) substrates Grant 9,905,412 - Yan , et al. February 27, 2	2018-02-27
Method And System For Scheduling Video Analysis Tasks App 20180052711 - Zhou; Mingyao ; et al.	2018-02-22
Method Of Forming Structures With V Shaped Bottom On Silicon Substrate App 20180033621 - BAO; Xinyu ; et al.	2018-02-01
Method Of Uniform Channel Formation App 20180033873 - YAN; Chun ; et al.	2018-02-01
Method Of Epitaxial Growth Shape Control For Cmos Applications App 20180033872 - BAO; Xinyu ; et al.	2018-02-01
Gas Purge System And Method For Outgassing Control App 20180033659 - YAN; Chun ; et al.	2018-02-01
Method And Material For Cmos Contact And Barrier Layer App 20180019121 - BAO; Xinyu ; et al.	2018-01-18
Integrated process and structure to form III-V channel for sub-7nm CMOS devices Grant 9,865,706 - Bao , et al. January 9, 2	2018-01-09
System and method in indium-gallium-arsenide channel height control for sub 7nm FinFET Grant 9,852,903 - Yan , et al. December 26, 2	2017-12-26
Method For Wafer Outgassing Control App 20170352557 - YAN; Chun ; et al.	2017-12-07
Methods for removing contamination from surfaces in substrate processing systems Grant 9,805,914 - Yan , et al. October 31, 2	2017-10-31
Method For Removing Native Oxide And Residue From A Iii-v Group Containing Surface App 20170229303 - YAN; Chun ; et al.	2017-08-10
System And Method In Indium-gallium-arsenide Channel Height Control For Sub 7nm Finfet App 20170221706 - YAN; Chun ; et al.	2017-08-03
Methods And Solutions For Cleaning Ingaas (or Iii-v) Substrates App 20170162379 - YAN; Chun ; et al.	2017-06-08
Method for removing native oxide and residue from a III-V group containing surface Grant 9,653,291 - Yan , et al. May 16, 2	2017-05-16
Silicon-containing substrate cleaning procedure Grant 9,653,282 - Yan , et al. May 16, 2	2017-05-16
Integrated Process And Structure To Form Iii-v Channel For Sub-7nm Cmos Devices App 20170133224 - BAO; Xinyu ; et al.	2017-05-11
Sputter etch processing for heavy metal patterning in integrated circuits Grant 9,484,220 - Hoinkis , et al. November 1, 2	2016-11-01
Methods of surface interface engineering Grant 9,472,416 - He , et al. October 18, 2	2016-10-18
Method For Protecting Cloud Storage Video Data And System Thereof App 20160300071 - ZHOU; Bo ; et al.	2016-10-13
Methods For Removing Contamination From Surfaces In Substrate Processing Systems App 20160293384 - YAN; Chun ; et al.	2016-10-06
Method For Removing Native Oxide And Residue From A Iii-v Group Containing Surface App 20160141175 - YAN; Chun ; et al.	2016-05-19
Silicon-containing Substrate Cleaning Procedure App 20160035562 - YAN; Chun ; et al.	2016-02-04
Copper residue chamber clean Grant 9,114,438 - Hoinkis , et al. August 25, 2	2015-08-25
Methods Of Surface Interface Engineering App 20150111389 - HE; JIM ZHONGYI ; et al.	2015-04-23
Copper Residue Chamber Clean App 20140345645 - Hoinkis; Mark ; et al.	2014-11-27
Subtractive plasma etching of a blanket layer of metal or metal alloy Grant 8,871,107 - Fuller , et al. October 28, 2	2014-10-28
Sputter Etch Processing For Heavy Metal Patterning In Integrated Circuits App 20140264861 - HOINKIS; MARK D. ; et al.	2014-09-18
Subtractive Plasma Etching Of A Blanket Layer Of Metal Or Metal Alloy App 20140273437 - Fuller; Nicholas C. M. ; et al.	2014-09-18
Methods for silicon electrode assembly etch rate and etch uniformity recovery Grant 7,442,114 - Huang , et al. October 28, 2	2008-10-28
Method and apparatus for providing uniform plasma in a magnetic field enhanced plasma reactor Grant 7,374,636 - Horioka , et al. May 20, 2	2008-05-20
Method for removal of metallic residue after plasma etching of a metal layer Grant 7,320,942 - Chen , et al. January 22, 2	2008-01-22
Method and apparatus for controlling the magnetic field intensity in a plasma enhanced semiconductor wafer processing chamber Grant 7,316,199 - Horioka , et al. January 8, 2	2008-01-08
Methods for silicon electrode assembly etch rate and etch uniformity recovery App 20060138081 - Huang; Tuochuan ; et al.	2006-06-29
Method for removing conductive residue Grant 6,933,239 - Ying , et al. August 23, 2	2005-08-23
Method for planarizing an interconnect structure App 20050079703 - Chen, Hui ; et al.	2005-04-14
Method for etching an organic anti-reflective coating (OARC) App 20050009342 - Chen, Hui ; et al.	2005-01-13
Method of fabricating a magneto-resistive random access memory (MRAM) device Grant 6,841,484 - Ying , et al. January 11, 2	2005-01-11
Method for removal of residue from a substrate App 20040237997 - Rui, Ying ; et al.	2004-12-02
Method for etching an aluminum layer using an amorphous carbon mask App 20040229470 - Rui, Ying ; et al.	2004-11-18
Method of fabricating a magneto-resistive random access memory (MRAM) device App 20040209476 - Ying, Chentsau ; et al.	2004-10-21
Method of etching metallic materials to form a tapered profile App 20040171272 - Jin, Guangxiang ; et al.	2004-09-02
Method for planarizing a copper interconnect structure Grant 6,784,107 - Chen , et al. August 31, 2	2004-08-31
Method for removing conductive residue App 20040137749 - Ying, Chentsau ; et al.	2004-07-15
Method for removal of metallic residue after plasma etching of a metal layer App 20030219912 - Chen, Xiaoyi ; et al.	2003-11-27
Methods for etching an organic anti-reflective coating Grant 6,649,532 - Chen , et al. November 18, 2	2003-11-18
Methods For Etching An Organic Anti-reflective Coating App 20030209520 - Chen, Hui ; et al.	2003-11-13
Method and apparatus for asymmetric gas distribution in a semiconductor wafer processing system Grant 6,620,289 - Yan , et al. September 16, 2	2003-09-16
Method and apparatus for controlling the magnetic field intensity in a plasma enhanced semiconductor wafer processing chamber App 20030085000 - Horioka, Keiji ; et al.	2003-05-08
Method for etching low k dielectrics Grant 6,547,977 - Yan , et al. April 15, 2	2003-04-15
Method for etching silicon oxynitride and dielectric antireflection coatings Grant 6,537,918 - Ionov , et al. March 25, 2	2003-03-25
Method and apparatus for providing uniform plasma in a magnetic field enhanced plasma reactor App 20030006008 - Horioka, Keiji ; et al.	2003-01-09
Method of etching dielectric layers using a removable hardmask Grant 6,458,516 - Ye , et al. October 1, 2	2002-10-01
Plasma assisted processing chamber with separate control of species density Grant 6,352,049 - Yin , et al. March 5, 2	2002-03-05
Method for etching silicon oxynitride and dielectric antireflection coatings App 20020016078 - Ionov, Pavel ; et al.	2002-02-07
Method of pattern etching a low K dielectric layer Grant 6,331,380 - Ye , et al. December 18, 2	2001-12-18
Method for etching silicon oxynitride and dielectric antireflection coatings Grant 6,291,356 - Ionov , et al. September 18, 2	2001-09-18
Method of etching patterned layers useful as masking during subsequent etching or for damascene structures Grant 6,080,529 - Ye , et al. June 27, 2	2000-06-27

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