XU; Chongying

Patent Applications and Registrations

Patent applications and USPTO patent grants for XU; Chongying.The latest application filed is for "modified film-forming resin containing acid inhibitor, preparation method therefor, and photoresist composition".

Company Profile

1.117.141

XU; Chongying - Ningbo CN
Xu; Chongying - New Milford CT
Xu; Chongying - Suzhou CN
XU; Chongying - Bear DE
Xu, Chongying - New Millford CT
Xu, Chongying - Milford CT

*profile and listings may contain filings by different individuals or companies with the same name. Review application materials to confirm ownership/assignment.

Patent Activity

Patent	Date
Modified Film-forming Resin Containing Acid Inhibitor, Preparation Method Therefor, And Photoresist Composition App 20220267492 - GU; Dagong ; et al.	2022-08-25
Diester Structure Monomer, Preparation Method Therefor, And Application Thereof App 20220234985 - YU; Shaoshan ; et al.	2022-07-28
Solid precursor-based delivery of fluid utilizing controlled solids morphology Grant 10,895,010 - Cleary , et al. January 19, 2	2021-01-19
Silane guanidinate derivatives useful for low temperature deposition of silicon-containing materials Grant 10,280,186 - Ma , et al.	2019-05-07
Precursors for silicon dioxide gap fill Grant 10,043,658 - Hunks , et al. August 7, 2	2018-08-07
Precursors For Silicon Dioxide Gap Fill App 20180130654 - Hunks; William ; et al.	2018-05-10
Aluminum Precursors For Thin-film Deposition, Preparation Method And Use Thereof App 20170327944 - DING; Yuqiang ; et al.	2017-11-16
Composition and method for low temperature chemical vapor deposition of silicon-containing films including silicon carbonitride and silicon oxycarbonitride films Grant 9,783,558 - Wang , et al. October 10, 2	2017-10-10
Solid Precursor-based Delivery Of Fluid Utilizing Controlled Solids Morphology App 20170037511 - Cleary; John M. ; et al.	2017-02-09
Precursor compositions for atomic layer deposition and chemical vapor deposition of titanate, lanthanate, and tantalate dielectric films Grant 9,534,285 - Xu , et al. January 3, 2	2017-01-03
Tellurium compounds useful for deposition of tellurium containing materials Grant 9,537,095 - Stender , et al. January 3, 2	2017-01-03
DOPING OF ZrO2 FOR DRAM APPLICATIONS App 20160343795 - Cissell; Julie ; et al.	2016-11-24
Precursors For Silicon Dioxide Gap Fill App 20160225615 - Hunks; William ; et al.	2016-08-04
Doping of ZrO.sub.2 for DRAM applications Grant 9,373,677 - Cissell , et al. June 21, 2	2016-06-21
Precursors for silicon dioxide gap fill Grant 9,337,054 - Hunks , et al. May 10, 2	2016-05-10
Cluster ion implantation of arsenic and phosphorus Grant 9,269,582 - Byl , et al. February 23, 2	2016-02-23
Antimony and germanium complexes useful for CVD/ALD of metal thin films Grant 9,219,232 - Hunks , et al. December 22, 2	2015-12-22
Composition And Method For Low Temperature Chemical Vapor Deposition Of Silicon-containing Films Including Silicon Carbonitride And Silicon Oxycarbonitride Films App 20150315215 - Wang; Ziyun ; et al.	2015-11-05
Composition and method for low temperature chemical vapor deposition of silicon-containing films including silicon carbonitride and silicon oxycarbonitride films Grant 9,102,693 - Wang , et al. August 11, 2	2015-08-11
Antimony compounds useful for deposition of antimony-containing materials Grant 9,034,688 - Chen , et al. May 19, 2	2015-05-19
Composition And Method For Low Temperature Chemical Vapor Deposition Of Silicon-containing Films Including Silicon Carbonitride And Silicon Oxycarbonitride Films App 20140329011 - Wang; Ziyun ; et al.	2014-11-06
Tellurium Compounds Useful For Deposition Of Tellurium Containing Materials App 20140329357 - Stender; Matthias ; et al.	2014-11-06
Solid Precursor-based Delivery Of Fluid Utilizing Controlled Solids Morphology App 20140329025 - Cleary; John M. ; et al.	2014-11-06
Low temperature deposition of phase change memory materials Grant 8,877,549 - Roeder , et al. November 4, 2	2014-11-04
Precursor Compositions For Atomic Layer Deposition And Chemical Vapor Deposition Of Titanate, Lanthanate, And Tantalate Dielectric Films App 20140295071 - Xu; Chongying ; et al.	2014-10-02
Solid precursor-based delivery of fluid utilizing controlled solids morphology Grant 8,821,640 - Cleary , et al. September 2, 2	2014-09-02
Composition and method for low temperature chemical vapor deposition of silicon-containing films including silicon carbonitride and silicon oxycarbonitride films Grant 8,802,882 - Wang , et al. August 12, 2	2014-08-12
Antimony And Germanium Complexes Useful For Cvd/ald Of Metal Thin Films App 20140220733 - Hunks; William ; et al.	2014-08-07
Tellurium compounds useful for deposition of tellurium containing materials Grant 8,796,068 - Stender , et al. August 5, 2	2014-08-05
Antimony Compounds Useful For Deposition Of Antimony-containing Materials App 20140206136 - Chen; Tianniu ; et al.	2014-07-24
Low Temperature Deposition Of Phase Change Memory Materials App 20140206134 - Roeder; Jeffrey F. ; et al.	2014-07-24
Precursor compositions for atomic layer deposition and chemical vapor deposition of titanate, lanthanate, and tantalate dielectric films Grant 8,784,936 - Xu , et al. July 22, 2	2014-07-22
Antimony and germanium complexes useful for CVD/ALD of metal thin films Grant 8,709,863 - Hunks , et al. April 29, 2	2014-04-29
Low temperature deposition of phase change memory materials Grant 8,679,894 - Roeder , et al. March 25, 2	2014-03-25
Antimony compounds useful for deposition of antimony-containing materials Grant 8,674,127 - Chen , et al. March 18, 2	2014-03-18
In situ generation of RuO4 for ALD of Ru and Ru related materials Grant 8,663,735 - Xu , et al. March 4, 2	2014-03-04
Cluster Ion Implantation Of Arsenic And Phosphorus App 20140011346 - Byl; Oleg ; et al.	2014-01-09
Method and composition for depositing ruthenium with assistive metal species Grant 8,574,675 - Lubguban, Jr. , et al. November 5, 2	2013-11-05
Tellurium Compounds Useful For Deposition Of Tellurium Containing Materials App 20130288462 - Stender; Matthias ; et al.	2013-10-31
Strontium And Barium Precursors For Use In Chemical Vapor Deposition, Atomic Layer Deposition And Rapid Vapor Deposition App 20130251918 - Cameron; Thomas M. ; et al.	2013-09-26
Monosilane or disilane derivatives and method for low temperature deposition of silicon-containing films using the same Grant 8,541,318 - Wang , et al. September 24, 2	2013-09-24
Precursor compositions for ALD/CVD of group II ruthenate thin films Grant 8,524,931 - Xu , et al. September 3, 2	2013-09-03
Strontium precursor for use in chemical vapor deposition, atomic layer deposition and rapid vapor deposition Grant 8,455,049 - Cameron , et al. June 4, 2	2013-06-04
DOPING OF ZrO2 FOR DRAM APPLICATIONS App 20130122722 - Cissell; Julie ; et al.	2013-05-16
Antimony And Germanium Complexes Useful For Cvd/ald Of Metal Thin Films App 20130029456 - Hunks; William ; et al.	2013-01-31
Low Temperature Deposition Of Phase Change Memory Materials App 20130005078 - Roeder; Jeffrey F. ; et al.	2013-01-03
Low temperature deposition of phase change memory materials Grant 8,288,198 - Roeder , et al. October 16, 2	2012-10-16
Antimony and germanium complexes useful for CVD/ALD of metal thin films Grant 8,268,665 - Hunks , et al. September 18, 2	2012-09-18
Monosilane or disilane derivatives and method for low temperature deposition of silicon-containing films using the same Grant 8,242,032 - Wang , et al. August 14, 2	2012-08-14
Chemical vapor deposition of high conductivity, adherent thin films of ruthenium Grant 8,241,704 - Hendrix , et al. August 14, 2	2012-08-14
Composition and method for low temperature deposition of silicon-containing films Grant 8,236,097 - Wang , et al. August 7, 2	2012-08-07
Zirconium, Hafnium And Titanium Precursors For Atomic Layer Deposition Of Corresponding Metal-containing Films App 20120196449 - Xu; Chongying ; et al.	2012-08-02
Composition And Method For Low Temperature Deposition Of Silicon-containing Films Such As Films Including Silicon, Silicon Nitride, Silicon Dioxide And/or Silicon-oxynitride App 20120178267 - Wang; Ziyun ; et al.	2012-07-12
Precursor compositions for atomic layer deposition and chemical vapor deposition of titanate, lanthanate, and tantalate dielectric films Grant 8,206,784 - Xu , et al. June 26, 2	2012-06-26
Monosilane Or Disilane Derivatives And Method For Low Temperature Deposition Of Silicon-containing Films Using The Same App 20120156894 - Wang; Ziyun ; et al.	2012-06-21
Precursor Compositions For Atomic Layer Deposition And Chemical Vapor Deposition Of Titanate, Lanthanate, And Tantalate Dielectric Films App 20120141675 - Xu; Chongying ; et al.	2012-06-07
DOPED ZrO2 CAPACITOR MATERIALS AND STRUCTURES App 20120127629 - Roeder; Jeffrey F. ; et al.	2012-05-24
Amorphous Ge/te Deposition Process App 20120108038 - Chen; Philip S.H. ; et al.	2012-05-03
Precursors for CVD/ALD of metal-containing films Grant 8,168,811 - Cameron , et al. May 1, 2	2012-05-01
Composition and method for low temperature deposition of silicon-containing films such as films including silicon, silicon nitride, silicon dioxide and/or silicon-oxynitride Grant 8,153,833 - Wang , et al. April 10, 2	2012-04-10
Method And Composition For Depositing Ruthenium With Assistive Metal Species App 20120064719 - Lubguban, JR.; Jorge A. ; et al.	2012-03-15
Amorphous Ge/Te deposition process Grant 8,093,140 - Chen , et al. January 10, 2	2012-01-10
Super-dry reagent compositions for formation of ultra low k films Grant 8,053,375 - Xu , et al. November 8, 2	2011-11-08
Antimony And Germanium Complexes Useful For Cvd/ald Of Metal Thin Films App 20110263100 - Hunks; William ; et al.	2011-10-27
Chemical vapor deposition of high conductivity, adherent thin films of ruthenium Grant 8,034,407 - Hendrix , et al. October 11, 2	2011-10-11
Antimony and germanium complexes useful for CVD/ALD of metal thin films Grant 8,008,117 - Hunks , et al. August 30, 2	2011-08-30
Chemical Vapor Deposition Of High Conductivity, Adherent Thin Films Of Ruthenium App 20110195188 - Hendrix; Bryan C. ; et al.	2011-08-11
Composition And Method For Low Temperature Deposition Of Silicon-containing Films Such As Films Including Silicon, Silicon Nitride, Silicon Dioxide And/or Silicon-oxynitride App 20110183528 - Wang; Ziyun ; et al.	2011-07-28
Monosilane Or Disilane Derivatives And Method For Low Temperature Deposition Of Silicon-containing Films Using The Same App 20110165762 - Wang; Ziyun ; et al.	2011-07-07
Copper precursors for CVD/ALD/digital CVD of copper metal films Grant 7,964,746 - Chen , et al. June 21, 2	2011-06-21
Composition And Method For Low Temperature Deposition Of Silicon-containing Films App 20110136343 - Wang; Ziyun ; et al.	2011-06-09
Antimony Compounds Useful For Deposition Of Antimony-containing Materials App 20110111556 - Chen; Tianniu ; et al.	2011-05-12
Composition and method for low temperature deposition of silicon-containing films such as films including silicon, silicon nitride, silicon dioxide and/or silicon-oxynitride Grant 7,910,765 - Wang , et al. March 22, 2	2011-03-22
Metal Aminotroponiminates, Bis-oxazolinates And Guanidinates App 20110060165 - Cameron; Thomas M. ; et al.	2011-03-10
Composition and method for low temperature deposition of silicon-containing films Grant 7,887,883 - Wang , et al. February 15, 2	2011-02-15
Monosilane or disilane derivatives and method for low temperature deposition of silicon-containing films using the same Grant 7,863,203 - Wang , et al. January 4, 2	2011-01-04
Tantalum amido-complexes with chelate ligands useful for CVD and ALD of TaN and Ta.sub.20.sub.5 thin films Grant 7,858,816 - Chen , et al. December 28, 2	2010-12-28
Antimony And Germanium Complexes Useful For Cvd/ald Of Metal Thin Films App 20100317150 - Hunks; William ; et al.	2010-12-16
Composition And Method For Low Temperature Chemical Vapor Deposition Of Silicon-containing Films Including Silicon Carbonitride And Silicon Oxycarbonitride Films App 20100314590 - WANG; Ziyun ; et al.	2010-12-16
Tantalum amide complexes for depositing tantalum-containing films, and method of making same Grant 7,838,073 - Chen , et al. November 23, 2	2010-11-23
Antimony and germanium complexes useful for CVD/ALD of metal thin films Grant 7,838,329 - Hunks , et al. November 23, 2	2010-11-23
Strontium And Barium Precursors For Use In Chemical Vapor Deposition, Atomic Layer Deposition And Rapid Vapor Deposition App 20100291299 - Cameron; Thomas M. ; et al.	2010-11-18
Composition And Method For Low Temperature Deposition Of Silicon-containing Films Such As Films Including Silicon, Silicon Nitride, Silicon Dioxide And/or Silicon-oxynitride App 20100285663 - WANG; Ziyun ; et al.	2010-11-11
Novel Bismuth Precursors For Cvd/ald Of Thin Films App 20100279011 - Chen; Tianniu ; et al.	2010-11-04
Zirconium Precursors Useful In Atomic Layer Deposition Of Zirconium-containing Films App 20100270508 - Xu; Chongying ; et al.	2010-10-28
Solid Precursor-based Delivery Of Fluid Utilizing Controlled Solids Morphology App 20100255198 - Cleary; John M. ; et al.	2010-10-07
TANTALUM AMIDO-COMPLEXES WITH CHELATE LIGANDS USEFUL FOR CVD AND ALD OF TaN AND Ta205 THIN FILMS App 20100240918 - Chen; Tianniu ; et al.	2010-09-23
Composition And Method For Low Temperature Deposition Of Silicon-containing Films App 20100221914 - Wang; Ziyun ; et al.	2010-09-02
Composition and method for low temperature deposition of silicon-containing films such as films including silicon, silicon nitride, silicon dioxide and/or silicon-oxynitride Grant 7,786,320 - Wang , et al. August 31, 2	2010-08-31
Tantalum Amide Complexes For Depositing Tantalum-containing Films, And Method Of Making Same App 20100215842 - CHEN; Tianniu ; et al.	2010-08-26
Composition and method for low temperature chemical vapor deposition of silicon-containing films including silicon carbonitride and silicon oxycarbonitride films Grant 7,781,605 - Wang , et al. August 24, 2	2010-08-24
Group Iv Complexes As Cvd And Ald Precursors For Forming Metal-containing Thin Films App 20100209610 - Cameron; Thomas M. ; et al.	2010-08-19
IN SITU GENERATION OF RuO4 FOR ALD OF Ru AND Ru RELATED MATERIALS App 20100209598 - Xu; Chongying ; et al.	2010-08-19
Tantalum amido-complexes with chelate ligands useful for CVD and ALD of TaN and Ta205 thin films Grant 7,750,173 - Chen , et al. July 6, 2	2010-07-06
Precursors For Silicon Dioxide Gap Fill App 20100164057 - Hunks; William ; et al.	2010-07-01
Copper (i) Compounds Useful As Deposition Precursors Of Copper Thin Films App 20100133689 - Xu; Chongying ; et al.	2010-06-03
Composition and method for low temperature deposition of silicon-containing films Grant 7,713,346 - Wang , et al. May 11, 2	2010-05-11
Zirconium, Hafnium, Titanium, And Silicon Precursors For Ald/cvd App 20100112211 - Xu; Chongying ; et al.	2010-05-06
Tantalum amide complexes for depositing tantalum-containing films, and method of making same Grant 7,709,384 - Chen , et al. May 4, 2	2010-05-04
Precursor Compositions For Ald/cvd Of Group Ii Ruthenate Thin Films App 20100095865 - Xu; Chongying ; et al.	2010-04-22
Composition And Method For Low Temperature Chemical Vapor Deposition Of Silicon-containing Films Including Silicon Carbonitride And Silicon Oxycarbonitride Films App 20100068894 - Wang; Ziyun ; et al.	2010-03-18
Precursor Compositions For Atomic Layer Deposition And Chemical Vapor Deposition Of Titanate, Lanthanate, And Tantalate Dielectric Films App 20100062150 - Xu; Chongying ; et al.	2010-03-11
Precursors For Cvd/ald Of Metal-containing Films App 20100018439 - Cameron; Thomas M. ; et al.	2010-01-28
Precursor compositions for atomic layer deposition and chemical vapor deposition of titanate, lanthanate, and tantalate dielectric films Grant 7,638,074 - Xu , et al. December 29, 2	2009-12-29
Antimony And Germanium Complexes Useful For Cvd/ald Of Metal Thin Films App 20090305458 - Hunks; William ; et al.	2009-12-10
Composition And Method For Low Temperature Deposition Of Silicon-containing Films Such As Films Including Silicon, Silicon Nitride, Silicon Dioxide And/or Silicon-oxynitride App 20090281344 - Wang; Ziyun ; et al.	2009-11-12
Bicyclic Guanidinates And Bridging Diamides As Cvd/ald Precursors App 20090275164 - Chen; Tianniu ; et al.	2009-11-05
Method of fabricating iridium-based materials and structures on substrates, and iridium source reagents therefor Grant 7,605,093 - Baum , et al. October 20, 2	2009-10-20
Composition and method for low temperature chemical vapor deposition of silicon-containing films including silicon carbonitride and silicon oxycarbonitride films Grant 7,601,860 - Wang , et al. October 13, 2	2009-10-13
Removal Of Particle Contamination On Patterned Silicon/silicon Dioxide Using Dense Fluid/chemical Formulations App 20090217940 - Korzenski; Michael B. ; et al.	2009-09-03
Tellurium Compounds Useful For Deposition Of Tellurium Containing Materials App 20090215225 - Stender; Matthias ; et al.	2009-08-27
Monosilane or disilane derivatives and method for low temperature deposition of silicon-containing films using the same Grant 7,579,496 - Wang , et al. August 25, 2	2009-08-25
Cobalt Precursors Useful For Forming Cobalt-containing Films On Substrates App 20090208637 - Chen; Tianniu ; et al.	2009-08-20
Dense Fluid Compositions For Removal Of Hardened Photoresist, Post-etch Residue And/or Bottom Anti-reflective Coating App 20090192065 - Korzenski; Michael B. ; et al.	2009-07-30
Copper (i) Amidinates And Guanidinates, Mixed Ligand Copper Complexes, And Compositions For Chemical Vapor Deposition, Atomic Layer Deposition, And Rapid Vapor Deposition Of Copper App 20090162550 - Chen; Tianniu ; et al.	2009-06-25
Low Temperature Deposition Of Phase Change Memory Materials App 20090124039 - Roeder; Jeffrey F. ; et al.	2009-05-14
Composition and method for low temperature deposition of silicon-containing films such as films including silicon nitride, silicon dioxide and/or silicon-oxynitride Grant 7,531,679 - Wang , et al. May 12, 2	2009-05-12
Copper (I) compounds useful as deposition precursors of copper thin films Grant 7,531,031 - Xu , et al. May 12, 2	2009-05-12
Amorphous Ge/te Deposition Process App 20090112009 - Chen; Philip S.H. ; et al.	2009-04-30
Removal of MEMS sacrificial layers using supercritical fluid/chemical formulations Grant 7,517,809 - Korzenski , et al. April 14, 2	2009-04-14
Metal And Metalloid Silylamides, Ketimates, Tetraalkylguanidinates And Dianionic Guanidinates Useful For Cvd/ald Of Thin Films App 20090087561 - CHEN; Tianniu ; et al.	2009-04-02
Composition And Method For Low Temperature Deposition Of Silicon-containing Films App 20090084288 - Wang; Ziyun ; et al.	2009-04-02
Precursor Compositions For Atomic Layer Deposition And Chemical Vapor Deposition Of Titanate, Lanthanate, And Tantalate Dielectric Films App 20090074965 - Xu; Chongying ; et al.	2009-03-19
TANTALUM AMIDO-COMPLEXES WITH CHELATE LIGANDS USEFUL FOR CVD AND ALD OF TaN AND Ta205 THIN FILMS App 20090032952 - Chen; Tianniu ; et al.	2009-02-05
Supercritical fluid-based cleaning compositions and methods Grant 7,485,611 - Roeder , et al. February 3, 2	2009-02-03
Tantalum Amide Complexes For Depositing Tantalum-containing Films, And Method Of Making Same App 20090004858 - Chen; Tianniu ; et al.	2009-01-01
Porogen material Grant 7,456,488 - Xu , et al. November 25, 2	2008-11-25
Apparatus and Method for Supercritical Fluid Removal or Deposition Processes App 20080271991 - Korzenski; Michael B. ; et al.	2008-11-06
Composition and method for low temperature deposition of silicon-containing films Grant 7,446,217 - Wang , et al. November 4, 2	2008-11-04
Method for trace water analysis in cyclic siloxanes useful as precursors for low dielectric constant thin films Grant 7,439,318 - Borovik , et al. October 21, 2	2008-10-21
Delivery systems for efficient vaporization of precursor source material Grant 7,437,060 - Wang , et al. October 14, 2	2008-10-14
Copper Precursors For Cvd/ald/digital Cvd Of Copper Metal Films App 20080242880 - Chen; Tianniu ; et al.	2008-10-02
Copper (i) Compounds Useful As Deposition Precursors Of Copper Thin Films App 20080233276 - Xu; Chongying ; et al.	2008-09-25
Stabilized cyclosiloxanes for use as CVD precursors for low-dielectric constant thin films Grant 7,423,166 - Chen , et al. September 9, 2	2008-09-09
Monosilane Or Disilane Derivatives And Method For Low Temperature Deposition Of Silicon-containing Films Using The Same App 20080160174 - Wang; Ziyun ; et al.	2008-07-03
Tantalum amide complexes for depositing tantalum-containing films, and method of making same Grant 7,371,878 - Chen , et al. May 13, 2	2008-05-13
Copper (I) compounds useful as deposition precursors of copper thin films Grant 7,371,880 - Xu , et al. May 13, 2	2008-05-13
Supercritical Fluid-assisted Deposition Of Materials On Semiconductor Substrates App 20080064136 - Xu; Chongying ; et al.	2008-03-13
Porogen material Grant 7,342,295 - Xu , et al. March 11, 2	2008-03-11
Supercritical Fluid Cleaning Of Semiconductor Substrates App 20080058238 - Xu; Chongying ; et al.	2008-03-06
Ethyleneoxide-silane And Bridged Silane Precursors For Forming Low K Films App 20080048148 - Borovik; Alexander S. ; et al.	2008-02-28
Treatment of semiconductor substrates using long-chain organothiols or long-chain acetates Grant 7,326,673 - Xu , et al. February 5, 2	2008-02-05
Methods for forming thin copper films and structures formed thereby App 20070281476 - Lavoie; Adrien R. ; et al.	2007-12-06
Supercritical fluid-assisted deposition of materials on semiconductor substrates Grant 7,294,528 - Xu , et al. November 13, 2	2007-11-13
Chemical vapor deposition of high conductivity, adherent thin films of ruthenium Grant 7,285,308 - Hendrix , et al. October 23, 2	2007-10-23
Chemical Vapor Deposition Of High Conductivity, Adherent Thin Films Of Ruthenium App 20070218205 - Hendrix; Bryan C. ; et al.	2007-09-20
Copper (I) compounds useful as deposition precursors of copper thin films Grant 7,241,912 - Xu , et al. July 10, 2	2007-07-10
Method For Trace Water Analysis In Cyclic Siloxanes Useful As Precursors For Low Dielectric Constant Thin Films App 20070155931 - Borovik; Alexander S. ; et al.	2007-07-05
Supercritical Fluid-based Cleaning Compositions And Methods App 20070149429 - Roeder; Jeffrey F. ; et al.	2007-06-28
Method Of Fabricating Iridium-based Materials And Structures On Substrates, And Iridium Source Reagents Therefor App 20070134417 - Baum; Thomas H. ; et al.	2007-06-14
Method of fabricating iridium-based materials and structures on substrates Grant 7,226,640 - Baum , et al. June 5, 2	2007-06-05
Supercritical carbon dioxide/chemical formulation for ashed and unashed aluminum post-etch residue removal Grant 7,223,352 - Korzenski , et al. May 29, 2	2007-05-29
Tantalum Amide Complexes For Depositing Tantalum-containing Films, And Method Of Making Same App 20070117385 - CHEN; TIANNIU ; et al.	2007-05-24
Copper (i) Compounds Useful As Deposition Precursors Of Copper Thin Films App 20070116876 - Xu; Chongying ; et al.	2007-05-24
Removal Of Mems Sacrificial Layers Using Supercritical Fluid/chemical Formulations App 20070111533 - Korzenski; Michael B. ; et al.	2007-05-17
Precursor compositions and processes for MOCVD of barrier materials in semiconductor manufacturing Grant 7,208,427 - Roeder , et al. April 24, 2	2007-04-24
Tantalum amide complexes for depositing tantalum-containing films, and method of making same Grant 7,198,815 - Chen , et al. April 3, 2	2007-04-03
Method for trace water analysis in cyclic siloxanes useful as precursors for low dielectric constant thin films Grant 7,189,571 - Borovik , et al. March 13, 2	2007-03-13
Copper (I) compounds useful as deposition precursors of copper thin films Grant 7,166,732 - Xu , et al. January 23, 2	2007-01-23
Removal of MEMS sacrificial layers using supercritical fluid/chemical formulations Grant 7,160,815 - Korzenski , et al. January 9, 2	2007-01-09
Method for removal of impurities in cyclic siloxanes useful as precursors for low dielectric constant thin films App 20060235182 - Xu; Chongying ; et al.	2006-10-19
Supercritical fluid-assisted deposition of materials on semiconductor substrates Grant 7,119,418 - Xu , et al. October 10, 2	2006-10-10
Compositions and methods for high-efficiency cleaning/polishing of semiconductor wafers Grant 7,119,052 - Korzenski , et al. October 10, 2	2006-10-10
Method for removal of impurities in cyclic siloxanes useful as precursors for low dielectric constant thin films Grant 7,108,771 - Xu , et al. September 19, 2	2006-09-19
Source reagent compositions for CVD formation of high dielectric constant and ferroelectric metal oxide thin films and method of using same Grant 7,094,284 - Baum , et al. August 22, 2	2006-08-22
Supercritical Fluid-assisted Deposition Of Materials On Semiconductor Substrates App 20060178006 - Xu; Chongying ; et al.	2006-08-10
Silicon source reagent compositions, and method of making and using same for microelectronic device structure Grant 7,084,080 - Borovik , et al. August 1, 2	2006-08-01
Silicon source reagent compositions, and method of making and using same for microelectronic device structure App 20060148271 - Borovik; Alexander S. ; et al.	2006-07-06
Ethyleneoxide-silane and bridged silane precursors for forming low k films App 20060134897 - Borovik; Alexander S. ; et al.	2006-06-22
Compositions and methods for high-efficiency cleaning of semiconductor wafers App 20060122085 - Korzenski; Michael B. ; et al.	2006-06-08
Source reagent compositions for CVD formation of high dielectric constant and ferroelectric metal oxide thin films and method of using same App 20060107871 - Baum; Thomas H. ; et al.	2006-05-25
Precursor compositions for forming tantalum-containing films, and tantalum-containing barrier films and copper-metallized semiconductor device structures App 20060102895 - Hendrix; Bryan C. ; et al.	2006-05-18
Silicon source reagent compositions, and method of making and using same for microelectronic device structure App 20060099831 - Borovik; Alexander S. ; et al.	2006-05-11
Supercritical fluid-assisted deposition of materials on semiconductor substrates Grant 7,030,168 - Xu , et al. April 18, 2	2006-04-18
Supercritical carbon dioxide/chemical formulation for ashed and unashed aluminum post-etch residue removal App 20060073998 - Korzenski; Michael B. ; et al.	2006-04-06
Ethyleneoxide-silane and bridged silane precursors for forming low k films Grant 7,022,864 - Borovik , et al. April 4, 2	2006-04-04
Compositions and methods for drying patterned wafers during manufacture of integrated circuitry products App 20060065294 - Xu; Chongying ; et al.	2006-03-30
Compositions and methods for drying patterned wafers during manufacture of integrated circuitry products Grant 7,011,716 - Xu , et al. March 14, 2	2006-03-14
Source reagent compositions for CVD formation of gate dielectric thin films using amide precursors and method of using same Grant 7,005,392 - Baum , et al. February 28, 2	2006-02-28
Supercritical carbon dioxide/chemical formulation for removal of photoresists App 20060040840 - Korzenski; Michael B. ; et al.	2006-02-23
Removal of particle contamination on a patterned silicon/silicon dioxide using dense fluid/chemical formulations App 20060019850 - Korzenski; Michael B. ; et al.	2006-01-26
Supercritical carbon dioxide/chemical formulation for removal of photoresists Grant 6,989,358 - Korzenski , et al. January 24, 2	2006-01-24
Tantalum amide complexes for depositing tantalum-containing films, and method of making same App 20060013943 - Chen; Tianniu ; et al.	2006-01-19
Copper (I) compounds useful as deposition precursors of copper thin films App 20050283012 - Xu, Chongying ; et al.	2005-12-22
Copper (i) Compounds Useful As Deposition Precursors Of Copper Thin Films App 20050281952 - Xu, Chongying ; et al.	2005-12-22
Delivery systems for efficient vaporization of precursor source material App 20050263075 - Wang, Luping ; et al.	2005-12-01
Tantalum amide complexes for depositing tantalum-containing films, and method of making same Grant 6,960,675 - Chen , et al. November 1, 2	2005-11-01
Removal of particle contamination on patterned silicon/silicon dioxide using supercritical carbon dioxide/chemical formulations Grant 6,943,139 - Korzenski , et al. September 13, 2	2005-09-13
Chemical vapor deposition of high conductivity, adherent thin films of ruthenium App 20050186341 - Hendrix, Bryan C. ; et al.	2005-08-25
Supercritical fluid-assisted deposition of materials on semiconductor substrates App 20050181613 - Xu, Chongying ; et al.	2005-08-18
Porogen material App 20050161763 - Xu, Chongying ; et al.	2005-07-28
Delivery systems for efficient vaporization of precursor source material Grant 6,909,839 - Wang , et al. June 21, 2	2005-06-21
Removal of MEMS sacrificial layers using supercritical fluid/chemical formulations App 20050118813 - Korzenski, Michael B. ; et al.	2005-06-02
Monosilane or disilane derivatives and method for low temperature deposition of silicon-containing films using the same App 20050080285 - Wang, Ziyun ; et al.	2005-04-14
Tantalum amide complexes for depositing tantalum-containing films, and method of making same App 20050079290 - Chen, Tianniu ; et al.	2005-04-14
Composition and method for low temperature chemical vapor deposition of silicon-containing films including silicon carbonitride and silicon oxycarbonitride films App 20050080286 - Wang, Ziyun ; et al.	2005-04-14
Source reagent compositions for CVD formation of gate dielectric thin films using amide precursors and method of using same Grant 6,869,638 - Baum , et al. March 22, 2	2005-03-22
Precursor compositions and processes for MOCVD of barrier materials in semiconductor manufacturing App 20050042888 - Roeder, Jeffrey F. ; et al.	2005-02-24
Low dielectric constant thin films and chemical vapor deposition method of making same App 20050038276 - Laxman, Ravi K. ; et al.	2005-02-17
Delivery systems for efficient vaporization of precursor source material App 20050019026 - Wang, Luping ; et al.	2005-01-27
Ethyleneoxide-silane and bridged silane precursors for forming low k films App 20050013936 - Borovik, Alexander S. ; et al.	2005-01-20
Compositions and methods for high-efficiency cleaning/polishing of semiconductor wafers App 20040266635 - Korzenski, Michael B. ; et al.	2004-12-30
Chemical vapor deposition precursors for deposition of copper Grant 6,822,107 - Baum , et al. November 23, 2	2004-11-23
Supercritical Fluid-based Cleaning Compositions And Methods App 20040224865 - Roeder, Jeffrey F. ; et al.	2004-11-11
Compositions And Methods For Drying Patterned Wafers During Manufacture Of Integrated Circuitry Products App 20040216772 - Xu, Chongying ; et al.	2004-11-04
Br2SbCH3 a solid source ion implant and CVD precursor Grant 6,767,830 - Wang , et al. July 27, 2	2004-07-27
Composition and method for low temperature deposition of silicon-containing films App 20040138489 - Wang, Ziyun ; et al.	2004-07-15
Porogen material App 20040102006 - Xu, Chongying ; et al.	2004-05-27
Vapor delivery system for solid precursors and method of using same Grant 6,740,586 - Wang , et al. May 25, 2	2004-05-25
Composition and method for low temperature deposition of silicon-containing films such as films including silicon nitride, silicon dioxide and/or silicon-oxynitride App 20040096582 - Wang, Ziyun ; et al.	2004-05-20
Silicon reagents and low temperature CVD method of forming silicon-containing gate dielectric materials using same Grant 6,736,993 - Xu , et al. May 18, 2	2004-05-18
Treatment of supercritical fluid utilized in semiconductor manufacturing applications Grant 6,735,978 - Tom , et al. May 18, 2	2004-05-18
Supercritical carbon dioxide/chemical formulation for ashed and unashed aluminum post-etch residue removal App 20040087174 - Korzenski, Michael B. ; et al.	2004-05-06
Removal of particle contamination on patterned silicon/silicon dioxide using supercritical carbon dioxide/chemical formulations App 20040087456 - Korzenski, Michael B. ; et al.	2004-05-06
Supercritical carbon dioxide/chemical formulation for removal of photoresists App 20040087457 - Korzenski, Michael B. ; et al.	2004-05-06
Vapor Delivery System For Solid Precursors And Method Of Using Same App 20040083965 - Wang, Luping ; et al.	2004-05-06
Stabilized cyclosiloxanes for use as CVD precursors for low-dielectric constant thin films App 20040039219 - Chen, Tianniu ; et al.	2004-02-26
Br2SbCH3 a solid source ion implant and CVD precursor App 20040029367 - Wang, Ziyun ; et al.	2004-02-12
Supercritical fluid-assisted deposition of materials on semiconductor substrates App 20040023453 - Xu, Chongying ; et al.	2004-02-05
Pyrazolate copper complexes, and MOCVD of copper using same Grant 6,639,080 - Xu , et al. October 28, 2	2003-10-28
Source reagent composition for CVD formation of Zr/Hf doped gate dielectric and high dielectric constant metal oxide thin films and method of using same Grant 6,623,656 - Baum , et al. September 23, 2	2003-09-23
Indium source reagent composition, and use thereof for deposition of indium-containing films on subtrates and ion implantation of indium-doped shallow junction microelectronic structures Grant 6,602,549 - Baum , et al. August 5, 2	2003-08-05
Supercritical fluid-assisted deposition of materials on semiconductor substrates App 20030124785 - Xu, Chongying ; et al.	2003-07-03
Supercritical fluid cleaning of semiconductor substrates App 20030125225 - Xu, Chongying ; et al.	2003-07-03
Method for removal of impurities in cyclic siloxanes useful as precursors for low dielectric constant thin films App 20030116421 - Xu, Chongying ; et al.	2003-06-26
Low-K dielectric thin films and chemical vapor deposition method of making same App 20030064154 - Laxman, Ravi K. ; et al.	2003-04-03
Source reagent compositions for CVD formation of gate dielectric thin films using amide precursors and method of using same App 20020187644 - Baum, Thomas H. ; et al.	2002-12-12
Silicon source reagent compositions, and method of making and using same for microelectronic device structure App 20020180028 - Borovik, Alexander S. ; et al.	2002-12-05
Source reagent compositions for CVD formation of gate dielectric thin films using amide precursors and method of using same App 20020175393 - Baum, Thomas H. ; et al.	2002-11-28
Low dielectric constant thin films and chemical vapor deposition method of making same App 20020172766 - Laxman, Ravi K. ; et al.	2002-11-21
Source reagent composition for CVD formation of Zr/Hf doped gate dielectric and high dielectric constant metal oxide thin films and method of using same App 20020132048 - Baum, Thomas H. ; et al.	2002-09-19
Pyrazolate copper complexes, and MOCVD of copper using same Grant 6,440,202 - Xu , et al. August 27, 2	2002-08-27
Pyrazolate copper complexes, and MOCVD of copper using same App 20020091268 - Xu, Chongying ; et al.	2002-07-11
Pyrazolate copper complexes, and MOCVD of copper using same Grant 6,417,369 - Xu , et al. July 9, 2	2002-07-09
Method of fabricating iridium-based materials and structures on substrates, and iridium source reagents therefor App 20020062037 - Baum, Thomas H. ; et al.	2002-05-23
Pyrazolate copper complexes, and MOCVD of copper using same App 20020042518 - Xu, Chongying ; et al.	2002-04-11
Source reagent compositions for CVD formation of high dielectric constant and ferroelectric metal oxide thin films and method of using same App 20020015790 - Baum, Thomas H. ; et al.	2002-02-07
Copper source reagent compositions, and method of making and using same for microelectronic device structures Grant 6,337,148 - Xu , et al. January 8, 2	2002-01-08
Method and apparatus for forming low dielectric constant polymeric films Grant 6,331,211 - Xu , et al. December 18, 2	2001-12-18
Indium source reagent compositions, and use thereof for deposition of indium-containing films on substrates and ion implantation of indium-doped shallow junction microelectronic structures App 20010021785 - Baum, Thomas H. ; et al.	2001-09-13
Method and apparatus for forming low dielectric constant polymeric films Grant 6,123,993 - Xu , et al. September 26, 2	2000-09-26
Copper precursor composition and process for manufacture of microelectronic device structures Grant 6,102,993 - Bhandari , et al. August 15, 2	2000-08-15