WU; Banqiu

Patent Applications and Registrations

Patent applications and USPTO patent grants for WU; Banqiu.The latest application filed is for "atomic oxygen and ozone cleaning device having a temperature control apparatus".

Company Profile

15.39.60

WU; Banqiu - San Jose CA
Wu; Banqiu - Sunnyvale CA
Wu; Banqiu - Tuscaloosa AL
Wu, Banqiu - Austin TX

*profile and listings may contain filings by different individuals or companies with the same name. Review application materials to confirm ownership/assignment.

Patent Activity

Patent	Date
Atomic Oxygen And Ozone Cleaning Device Having A Temperature Control Apparatus App 20220288259 - WU; Banqiu ; et al.	2022-09-15
Intelligent Processing Tools App 20220083034 - Wu; Banqiu	2022-03-17
Intelligent processing tools Grant 11,209,804 - Wu December 28, 2	2021-12-28
Method for removing photoresist from photomask substrate Grant 11,114,350 - Wu , et al. September 7, 2	2021-09-07
Portion of layer removal at substrate edge Grant 11,054,746 - Wu , et al. July 6, 2	2021-07-06
Adhesive Material Removal From Photomask In Ultraviolet Lithography Application App 20210185793 - WU; Banqiu ; et al.	2021-06-17
Method and apparatus for high throughput photomask curing Grant 10,962,889 - Wu , et al. March 30, 2	2021-03-30
Photomask pellicle glue residue removal Grant 10,933,624 - Wu , et al. March 2, 2	2021-03-02
Attachment feature removal from photomask in extreme ultraviolet lithography application Grant 10,928,724 - Wu , et al. February 23, 2	2021-02-23
Method For Removing Photoresist From Photomask Substrate App 20200328128 - WU; Banqiu ; et al.	2020-10-15
Photomask laser etch Grant 10,802,392 - Wu , et al. October 13, 2	2020-10-13
Photomask Pellicle Glue Residue Removal App 20200290339 - WU; Banqiu ; et al.	2020-09-17
Photomask pellicle glue residue removal Grant 10,710,358 - Wu , et al.	2020-07-14
Attachment Feature Removal From Photomask In Extreme Ultraviolet Lithography Application App 20200183268 - WU; Banqiu ; et al.	2020-06-11
Method And Apparatus For High Throughput Photomask Curing App 20200166834 - WU; Banqiu ; et al.	2020-05-28
Portion Of Layer Removal At Substrate Edge App 20200096860 - WU; Banqiu ; et al.	2020-03-26
Atomic Oxygen And Ozone Device For Cleaning And Surface Treatment App 20200098556 - WU; Banqiu ; et al.	2020-03-26
Photomask Laser Etch App 20200057362 - WU; Banqiu ; et al.	2020-02-20
Pellicle Adhesive Residue Removal System And Methods App 20200033740 - WU; Banqiu ; et al.	2020-01-30
Photomask Pellicle Glue Residue Removal App 20200009854 - WU; Banqiu ; et al.	2020-01-09
Methods for the continuous processing of substrates Grant 10,236,198 - Wu , et al.	2019-03-19
Methods for in-situ chamber clean in plasma etching processing chamber Grant 10,115,572 - Wu , et al. October 30, 2	2018-10-30
Methods and apparatus for controlling photoresist line width roughness with enhanced electron spin control Grant 9,911,582 - Wu , et al. March 6, 2	2018-03-06
Surface Treatment For Improvement Of Particle Performance App 20180040457 - WU; Banqiu	2018-02-08
Novel hands-free breast pumping system App 20180001001 - Wu; Mengju ; et al.	2018-01-04
Continuous Substrate Processing System App 20170365491 - Wu; Banqiu ; et al.	2017-12-21
Electrodes for etch Grant 9,754,765 - Wu , et al. September 5, 2	2017-09-05
Continuous substrate processing system Grant 9,748,125 - Wu , et al. August 29, 2	2017-08-29
Methods For In-situ Chamber Clean In Plasma Etching Processing Chamber App 20170213709 - WU; Banqiu ; et al.	2017-07-27
Cooling method for a 3D IC computer system Grant 9,480,187 - Wu , et al. October 25, 2	2016-10-25
Cost-effective cooling method for computer system App 20160286690 - Wu; Banqiu ; et al.	2016-09-29
Cooling Method for Computer System App 20160286688 - Wu; Banqiu ; et al.	2016-09-29
Cooling method for a 3D IC computer system App 20160286689 - Wu; Banqiu ; et al.	2016-09-29
3D IC Computer System App 20160286695 - Wu; Banqiu ; et al.	2016-09-29
3D IC computer system Grant 9,439,330 - Wu , et al. September 6, 2	2016-09-06
Cost-effective cooling method for computer system Grant 9,439,331 - Wu , et al. September 6, 2	2016-09-06
Intelligent Processing Tools App 20160132042 - WU; BANQIU	2016-05-12
Methods for reducing line width roughness and/or critical dimension nonuniformity in a patterned photoresist layer Grant 9,280,051 - Wu , et al. March 8, 2	2016-03-08
Methods And Apparatus For Controlling Photoresist Line Width Roughness With Enhanced Electron Spin Control App 20160064197 - WU; Banqiu ; et al.	2016-03-03
Apparatus and methods for fabricating a photomask substrate for EUV applications Grant 9,250,514 - Wu , et al. February 2, 2	2016-02-02
Photoresist treatment method by low bombardment plasma Grant 9,177,824 - Wu , et al. November 3, 2	2015-11-03
Methods and apparatus for controlling photoresist line width roughness Grant 9,039,910 - Wu , et al. May 26, 2	2015-05-26
Novel Electrodes For Etch App 20150090401 - Wu; Banqiu ; et al.	2015-04-02
Methods for controlling defects for extreme ultraviolet lithography (EUVL) photomask substrate Grant 8,962,224 - Wu , et al. February 24, 2	2015-02-24
Atomic layer deposition lithography Grant 8,932,802 - Wu , et al. January 13, 2	2015-01-13
Methods For Reducing Line Width Roughness And/or Critical Dimension Nonuniformity In A Patterned Photoresist Layer App 20140370709 - WU; BANQIU ; et al.	2014-12-18
Photoresist Treatment Method By Low Bombardment Plasma App 20140370708 - WU; BANQIU ; et al.	2014-12-18
Charged Beam Plasma Apparatus For Photomask Manufacture Applications App 20140356768 - WU; Banqiu ; et al.	2014-12-04
Contamination Prevention For Photomask In Extreme Ultraviolet Lithography Application App 20140253887 - WU; Banqiu ; et al.	2014-09-11
Apparatus And Methods For Fabricating A Photomask Substrate For Euv Applications App 20140255830 - WU; Banqiu ; et al.	2014-09-11
Methods and apparatus for performing multiple photoresist layer development and etching processes Grant 8,709,706 - Wu , et al. April 29, 2	2014-04-29
In-situ Deposited Mask Layer For Device Singulation By Laser Scribing And Plasma Etch App 20140065797 - Yalamanchili; Madhava Rao ; et al.	2014-03-06
Methods For Controlling Defects For Extreme Ultraviolet Lithography (euvl) Photomask Substrate App 20140045103 - Wu; Banqiu ; et al.	2014-02-13
In-situ deposited mask layer for device singulation by laser scribing and plasma etch Grant 8,598,016 - Yalamanchili , et al. December 3, 2	2013-12-03
Atomic Layer Deposition Lithography App 20130224665 - Wu; Banqiu ; et al.	2013-08-29
Multi-Chamber Substrate Processing System App 20130196078 - Yudovsky; Joseph ; et al.	2013-08-01
Rotary Substrate Processing System App 20130192761 - Yudovsky; Joseph ; et al.	2013-08-01
Continuous Substrate Processing System App 20130192524 - Wu; Banqiu ; et al.	2013-08-01
In-situ Deposited Mask Layer For Device Singulation By Laser Scribing And Plasma Etch App 20120322234 - YALAMANCHILI; Madhava Rao ; et al.	2012-12-20
Methods And Apparatus For Performing Multiple Photoresist Layer Development And Etching Processes App 20120322011 - Wu; Banqiu ; et al.	2012-12-20
Methods And Apparatus For Controlling Photoresist Line Width Roughness With Enhanced Electron Spin Control App 20120318773 - Wu; Banqiu ; et al.	2012-12-20
Methods And Apparatus For Controlling Photoresist Line Width Roughness App 20120103939 - Wu; Banqiu ; et al.	2012-05-03
Contamination prevention in extreme ultraviolet lithography Grant 8,084,757 - Wu , et al. December 27, 2	2011-12-27
Method and apparatus for mask pellicle adhesive residue cleaning Grant 8,002,899 - Wu , et al. August 23, 2	2011-08-23
Photomask having self-masking layer and methods of etching same Grant 7,771,894 - Wu August 10, 2	2010-08-10
Method of etching extreme ultraviolet light (EUV) photomasks Grant 7,771,895 - Wu , et al. August 10, 2	2010-08-10
Method And Appratus For Mask Pellicle Adhesive Residue Cleaning App 20100078039 - Wu; Banqiu ; et al.	2010-04-01
Backside Cleaning Of Substrate App 20100028813 - Wu; Banqiu ; et al.	2010-02-04
Contamination Prevention In Extreme Ultraviolet Lithography App 20090186282 - Wu; Banqiu ; et al.	2009-07-23
Electrostatic Surface Cleaning App 20090183322 - Wu; Banqiu ; et al.	2009-07-23
Production, refining and recycling of lightweight and reactive metals in ionic liquids Grant 7,347,920 - Wu , et al. March 25, 2	2008-03-25
Photomask Having Self-masking Layer And Methods Of Etching Same App 20080070127 - Wu; Banqiu	2008-03-20
Method Of Etching Extreme Ultraviolet Light (euv) Photomasks App 20080070128 - Wu; Banqiu ; et al.	2008-03-20
Production, refining and recycling of lightweight and reactive metals in ionic liquids Grant 6,881,321 - Wu , et al. April 19, 2	2005-04-19
Endpoint detection of plasma-assisted etch process App 20050042523 - Wu, Banqiu ; et al.	2005-02-24
Production, refining and recycling of lightweight and reactive metals in ionic liquids App 20040238352 - Wu, Banqiu ; et al.	2004-12-02
Ionic liquid temperature sensor Grant 6,749,336 - Wu , et al. June 15, 2	2004-06-15
Production, refining and recycling of lightweight and reactive metals in ionic liquids App 20020070122 - Wu, Banqiu ; et al.	2002-06-13

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