| Patent | Date |
|---|
Gas distribution plate with UV blocker at the center
Grant 11,448,977 - Ramaswamy , et al. September 20, 2 | 2022-09-20 |
Fast Gas Exchange Apparatus, System, And Method
App 20220262600 - XU; Ming ; et al. | 2022-08-18 |
Capacitive sensor housing for chamber condition monitoring
Grant 11,415,538 - Pan , et al. August 16, 2 | 2022-08-16 |
Conductive wafer lift pin o-ring gripper with resistor
Grant 11,387,135 - Cotlear , et al. July 12, 2 | 2022-07-12 |
Ring For Substrate Extreme Edge Protection
App 20220157574 - SCHWARZ; Benjamin ; et al. | 2022-05-19 |
Chamber lid with integrated heater
Grant 11,264,252 - Willwerth , et al. March 1, 2 | 2022-03-01 |
Substrate support pedestal
Grant D931,240 - Lee , et al. September 21, 2 | 2021-09-21 |
Capacitive Sensor For Chamber Condition Monitoring
App 20210280443 - Pan; Yaoling ; et al. | 2021-09-09 |
Capacitive Sensing Data Integration For Plasma Chamber Condition Monitoring
App 20210280400 - Pan; Yaoling ; et al. | 2021-09-09 |
Capacitive Sensor Housing For Chamber Condition Monitoring
App 20210278360 - Pan; Yaoling ; et al. | 2021-09-09 |
Capacitive Sensors And Capacitive Sensing Locations For Plasma Chamber Condition Monitoring
App 20210280399 - Pan; Yaoling ; et al. | 2021-09-09 |
Processing chamber with substrate edge enhancement processing
Grant 11,094,511 - Lee , et al. August 17, 2 | 2021-08-17 |
Low Contact Area Substrate Support For Etching Chamber
App 20210035851 - LEE; CHANGHUN ; et al. | 2021-02-04 |
Sensors And System For In-situ Edge Ring Erosion Monitor
App 20200335368 - PAN; Yaoling ; et al. | 2020-10-22 |
Electrostatic chuck with variable pixelated magnetic field
Grant 10,790,180 - Hsu , et al. September 29, 2 | 2020-09-29 |
Gas flow for condensation reduction with a substrate processing chuck
Grant 10,770,329 - Kim , et al. Sep | 2020-09-08 |
Apparatus and methods for reducing particles in semiconductor process chambers
Grant 10,770,269 - Nguyen , et al. Sep | 2020-09-08 |
Processing Chamber With Substrate Edge Enhancement Processing
App 20200152431 - LEE; Changhun ; et al. | 2020-05-14 |
Chamber Lid With Integrated Heater
App 20200118844 - WILLWERTH; Michael D. ; et al. | 2020-04-16 |
Electrostatic Chuck With Variable Pixelated Magnetic Field
App 20200013661 - Hsu; Chih-Hsun ; et al. | 2020-01-09 |
Cooling element for an electrostatic chuck assembly
Grant 10,490,435 - Willwerth , et al. Nov | 2019-11-26 |
Electrostatic chuck with variable pixelated magnetic field
Grant 10,460,968 - Hsu , et al. Oc | 2019-10-29 |
Resonant Process Monitor
App 20190287758 - PAN; Yaoling ; et al. | 2019-09-19 |
Cooling Element For An Electrostatic Chuck Assembly
App 20190244848 - Willwerth; Michael D. ; et al. | 2019-08-08 |
Enhanced plasma source for a plasma reactor
Grant 10,290,469 - Todorow , et al. | 2019-05-14 |
Substrate lift pin actuator
Grant 10,283,397 - Willwerth , et al. | 2019-05-07 |
Gas Flow For Condensation Reduction With A Substrate Processing Chuck
App 20190115240 - Kim; Hung Sang ; et al. | 2019-04-18 |
Substrate support assembly
Grant 10,257,887 - Matyushkin , et al. | 2019-04-09 |
Gas flow for condensation reduction with a substrate processing chuck
Grant 10,186,444 - Kim , et al. Ja | 2019-01-22 |
Shielded lid heater assembly
Grant 10,083,816 - Willwerth , et al. September 25, 2 | 2018-09-25 |
High temperature electrostatic chuck with real-time heat zone regulating capability
Grant 9,948,214 - Lubomirsky , et al. April 17, 2 | 2018-04-17 |
Substrate Support Assembly
App 20180103508 - MATYUSHKIN; ALEXANDER ; et al. | 2018-04-12 |
Substrate support assembly having rapid temperature control
Grant 9,883,549 - Matyushkin , et al. January 30, 2 | 2018-01-30 |
Apparatus And Methods For Reducing Particles In Semiconductor Process Chambers
App 20170345623 - NGUYEN; Andrew ; et al. | 2017-11-30 |
Apparatus and methods for reducing particles in semiconductor process chambers
Grant 9,761,416 - Nguyen , et al. September 12, 2 | 2017-09-12 |
Conductive Wafer Lift Pin O-ring Gripper With Resistor
App 20170221750 - COTLEAR; Roberto Cesar ; et al. | 2017-08-03 |
Substrate Lift Pin Actuator
App 20170032997 - WILLWERTH; Michael D. ; et al. | 2017-02-02 |
Etch Rate And Critical Dimension Uniformity By Selection Of Focus Ring Material
App 20170011891 - HAMMOND, IV; Edward P. ; et al. | 2017-01-12 |
Gas Flow For Condensation Reduction With A Substrate Processing Chuck
App 20160276197 - Kim; Hun Sang ; et al. | 2016-09-22 |
Apparatus for controlling the flow of a gas in a process chamber
Grant 9,443,753 - Palagashvili , et al. September 13, 2 | 2016-09-13 |
Shielded Lid Heater Assembly
App 20160254123 - WILLWERTH; Michael D. ; et al. | 2016-09-01 |
Shielded lid heater assembly
Grant 9,362,148 - Willwerth , et al. June 7, 2 | 2016-06-07 |
Substrate Support Assembly Having Rapid Temperature Control
App 20160135252 - MATYUSHKIN; Alexander ; et al. | 2016-05-12 |
Single Ring Design For High Yield, Substrate Extreme Edge Defect Reduction In Icp Plasma Processing Chamber
App 20160099162 - NG; Siu Tang ; et al. | 2016-04-07 |
Substrate processing with rapid temperature gradient control
Grant 9,275,887 - Matyushkin , et al. March 1, 2 | 2016-03-01 |
Electrostatic Chuck With Magnetic Cathode Liner For Critical Dimension (cd) Tuning
App 20150221481 - Willwerth; Michael D. ; et al. | 2015-08-06 |
Plasma reactor electrostatic chuck with cooled process ring and heated workpiece support surface
Grant 9,070,536 - Willwerth , et al. June 30, 2 | 2015-06-30 |
Electrostatic Chuck With Variable Pixelated Magnetic Field
App 20150155193 - Hsu; Chih-Hsun ; et al. | 2015-06-04 |
Enhanced Plasma Source For A Plasma Reactor
App 20140367046 - TODOROW; Valentin N. ; et al. | 2014-12-18 |
Method And Apparatus For Stable Plasma Processing
App 20140345803 - TODOROW; Valentin N. ; et al. | 2014-11-27 |
Chamber with uniform flow and plasma distribution
Grant 8,840,725 - Palagashvili , et al. September 23, 2 | 2014-09-23 |
Apparatus And Methods For Reducing Particles In Semiconductor Process Chambers
App 20140272211 - NGUYEN; Andrew ; et al. | 2014-09-18 |
Method and apparatus for stable plasma processing
Grant 8,801,896 - Todorow , et al. August 12, 2 | 2014-08-12 |
Low sloped edge ring for plasma processing chamber
Grant 8,771,423 - Lee , et al. July 8, 2 | 2014-07-08 |
Low force substrate lift
Grant 8,757,603 - Willwerth , et al. June 24, 2 | 2014-06-24 |
Deposition Shield For Plasma Enhanced Substrate Processing
App 20140151331 - TODOROW; VALENTIN N. ; et al. | 2014-06-05 |
Methods For High Temperature Etching A High-k Gate Structure
App 20130344701 - LIU; Wei ; et al. | 2013-12-26 |
High Temperature Electrostatic Chuck With Real-time Heat Zone Regulating Capability
App 20130284374 - LUBOMIRSKY; Dmitry ; et al. | 2013-10-31 |
Plasma Reactor Electrostatic Chuck With Cooled Process Ring And Heated Workpiece Support Surface
App 20130277339 - Willwerth; Michael D. ; et al. | 2013-10-24 |
Methods for high temperature etching a high-K material gate structure
Grant 8,501,626 - Liu , et al. August 6, 2 | 2013-08-06 |
Shielded Lid Heater Assembly
App 20130189848 - WILLWERTH; Michael D. ; et al. | 2013-07-25 |
Method And Apparatus For Stable Plasma Processing
App 20130118687 - TODOROW; VALENTIN N. ; et al. | 2013-05-16 |
Shielded lid heater assembly
Grant 8,419,893 - Willwerth , et al. April 16, 2 | 2013-04-16 |
Method of processing a workpiece in a plasma reactor with independent wafer edge process gas injection
Grant 8,383,002 - Katz , et al. February 26, 2 | 2013-02-26 |
Low Sloped Edge Ring For Plasma Processing Chamber
App 20130032478 - Lee; Changhun ; et al. | 2013-02-07 |
Method and apparatus for stable plasma processing
Grant 8,349,128 - Todorow , et al. January 8, 2 | 2013-01-08 |
Field enhanced inductively coupled plasma (Fe-ICP) reactor
Grant 8,299,391 - Todorow , et al. October 30, 2 | 2012-10-30 |
Low sloped edge ring for plasma processing chamber
Grant 8,287,650 - Lee , et al. October 16, 2 | 2012-10-16 |
Electrostatic chuck with reduced arcing
Grant 8,270,141 - Willwerth , et al. September 18, 2 | 2012-09-18 |
Low Force Substrate Lift
App 20120097908 - WILLWERTH; MICHAEL D. ; et al. | 2012-04-26 |
Apparatus For Controlling The Flow Of A Gas In A Process Chamber
App 20120024479 - PALAGASHVILI; DAVID ; et al. | 2012-02-02 |
Gas flow equalizer plate suitable for use in a substrate process chamber
Grant 8,075,728 - Balakrishna , et al. December 13, 2 | 2011-12-13 |
Chamber With Uniform Flow And Plasma Distribution
App 20110162803 - PALAGASHVILI; DAVID ; et al. | 2011-07-07 |
Electrostatic Chuck With Reduced Arcing
App 20110157760 - WILLWERTH; MICHAEL D. ; et al. | 2011-06-30 |
Showerhead Assembly With Improved Impact Protection
App 20110120651 - ERENSTEIN; ALEX ; et al. | 2011-05-26 |
Method Of Processing A Workpiece In A Plasma Reactor With Independent Wafer Edge Process Gas Injection
App 20110068082 - Katz; Dan ; et al. | 2011-03-24 |
Method of processing a workpiece in a plasma reactor with independent wafer edge process gas injection
Grant 7,879,250 - Katz , et al. February 1, 2 | 2011-02-01 |
Cathode liner with wafer edge gas injection in a plasma reactor chamber
Grant 7,832,354 - Katz , et al. November 16, 2 | 2010-11-16 |
High AC current high RF power AC-RF decoupling filter for plasma reactor heated electrostatic chuck
Grant 7,777,152 - Todorov , et al. August 17, 2 | 2010-08-17 |
Extended Chamber Liner For Improved Mean Time Between Cleanings Of Process Chambers
App 20100108263 - NGUYEN; HOAN Hai ; et al. | 2010-05-06 |
Low Sloped Edge Ring For Plasma Processing Chamber
App 20100059181 - Lee; Changhun ; et al. | 2010-03-11 |
Field Enhanced Inductively Coupled Plasma (fe-icp) Reactor
App 20100025384 - TODOROW; VALENTIN N. ; et al. | 2010-02-04 |
Plasma Reactor Electrostatic Chuck Having A Coaxial Rf Feed And Multizone Ac Heater Power Transmission Through The Coaxial Feed
App 20090274590 - WILLWERTH; MICHAEL D. ; et al. | 2009-11-05 |
Method and apparatus for performing limited area spectral analysis
Grant 7,602,484 - Davis , et al. October 13, 2 | 2009-10-13 |
Shielded Lid Heater Assembly
App 20090236315 - Willwerth; Michael D. ; et al. | 2009-09-24 |
Multiple Port Gas Injection System Utilized In A Semiconductor Processing System
App 20090221149 - Hammond, IV; Edward P. ; et al. | 2009-09-03 |
Gas Flow Equalizer Plate Suitable For Use In A Substrate Process Chamber
App 20090218043 - Balakrishna; Ajit ; et al. | 2009-09-03 |
Etch Rate And Critical Dimension Uniformity By Selection Of Focus Ring Material
App 20090221150 - Hammond, IV; Edward P. ; et al. | 2009-09-03 |
Cathode liner with wafer edge gas injection in a plasma reactor chamber
App 20090056629 - Katz; Dan ; et al. | 2009-03-05 |
Method of processing a workpiece in a plasma reactor with independent wafer edge process gas injection
App 20090057269 - Katz; Dan ; et al. | 2009-03-05 |
Methods For High Temperature Etching A High-k Material Gate Structure
App 20090004870 - Liu; Wei ; et al. | 2009-01-01 |
Method And Apparatus For Performing Limited Area Spectral Analysis
App 20080074658 - Davis; Matthew F. ; et al. | 2008-03-27 |
Method and apparatus for performing limited area spectral analysis
Grant 7,330,244 - Davis , et al. February 12, 2 | 2008-02-12 |
Substrate Processing With Rapid Temperature Gradient Control
App 20080017104 - Matyushkin; Alexander ; et al. | 2008-01-24 |
High Ac Current High Rf Power Ac-rf Decoupling Filter For Plasma Reactor Heated Electrostatic Chuck
App 20070284344 - Todorov; Valentin N. ; et al. | 2007-12-13 |
Method And Apparatus For Performing Limited Area Spectral Analysis
App 20070153263 - Davis; Matthew F. ; et al. | 2007-07-05 |
Method and apparatus for performing limited area spectral analysis
Grant 7,158,221 - Davis , et al. January 2, 2 | 2007-01-02 |
Method and apparatus for stable plasma processing
App 20060000805 - Todorow; Valentin N. ; et al. | 2006-01-05 |
Method and apparatus for performing limited area spectral analysis
App 20050134834 - Davis, Matthew F. ; et al. | 2005-06-23 |
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