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name:-0.0015349388122559
name:-0.00046205520629883
Watase; Toshihiko Patent Filings

Watase; Toshihiko

Patent Applications and Registrations

Patent applications and USPTO patent grants for Watase; Toshihiko.The latest application filed is for "abrasive material having a structured surface".

Company Profile
0.1.2
  • Watase; Toshihiko - Tokyo JP
*profile and listings may contain filings by different individuals or companies with the same name. Review application materials to confirm ownership/assignment.
Patent Activity
PatentDate
Abrasive Material Having A Structured Surface
App 20170008143 - Minami; Hideki ;   et al.
2017-01-12
Abrasive pad for CMP
Grant 6,776,699 - Amano , et al. August 17, 2
2004-08-17
Abrasive pad for cmp
App 20040003895 - Amano, Takashi ;   et al.
2004-01-08

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