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KINETIC RESOLUTION REACTION OF A (1RS,2SR)-(2-HYDROXY-3,5,5-TRIMETHYL-3-CYCLOPENTENYL)METHYL CARBOXYLATE COMPOUND, A PROCESS FOR PREPARING OPTICALLY ACTIVE TRANS-alpha-NECRODYL ISOBUTYRATE, AND A PROCESS FOR PREPARING OPTICALLY ACTIVE gamma-NECRODYL ISOBUTYRATE
App 20220234983 - Watanabe; Tomohiro ; et al. | 2022-07-28 |
Compound, composition for forming organic film, substrate for manufacturing semiconductor apparatus, method for forming organic film, and patterning process
Grant 11,307,497 - Tachibana , et al. April 19, 2 | 2022-04-19 |
Resist Underlayer Film Material, Patterning Process, And Method For Forming Resist Underlayer Film
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Deposition Mask Package And Deposition Mask Packaging Method
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Composition for forming organic film, substrate for manufacturing semiconductor apparatus, method for forming organic film, patterning process, and polymer
Grant 11,181,821 - Kori , et al. November 23, 2 | 2021-11-23 |
Deposition mask package and deposition mask packaging method
Grant 11,148,397 - Ikenaga , et al. October 19, 2 | 2021-10-19 |
Method for producing polyalkylene glycol derivative having amino group at end
Grant 11,066,430 - Suka , et al. July 20, 2 | 2021-07-20 |
Compound and composition for forming organic film
Grant 11,022,882 - Tachibana , et al. June 1, 2 | 2021-06-01 |
Polymer and composition for forming organic film, substrate for manufacturing semiconductor apparatus, method for forming organic film, and patterning process
Grant 10,998,197 - Kori , et al. May 4, 2 | 2021-05-04 |
Method for purifying an amino acid-n-carboxy anhydride
Grant 10,975,042 - Suka , et al. April 13, 2 | 2021-04-13 |
Composition For Forming Silicon-containing Resist Underlayer Film And Patterning Process
App 20210088908 - KAI; Yusuke ; et al. | 2021-03-25 |
Composition For Forming Organic Film, Substrate For Manufacturing Semiconductor Device, Method For Forming Organic Film, Patterning Process, And Polymer
App 20210003920 - KORI; Daisuke ; et al. | 2021-01-07 |
Material For Forming Organic Film, Substrate For Manufacturing Semiconductor Apparatus, Method For Forming Organic Film, And Patterning Process
App 20200381247 - KORI; Daisuke ; et al. | 2020-12-03 |
Material For Forming Organic Film, Substrate For Manufacturing Semiconductor Device, Method For Forming Organic Film, Patterning Process, And Compound For Forming Organic Film
App 20200333709 - KORI; Daisuke ; et al. | 2020-10-22 |
Material For Forming Organic Film, Substrate For Manufacturing Semiconductor Device, Method For Forming Organic Film, Patterning Process, And Compound For Forming Organic Film
App 20200332062 - KORI; Daisuke ; et al. | 2020-10-22 |
Epoxy Compound, Resist Composition, And Pattern Forming Process
App 20200283400 - Sagehashi; Masayoshi ; et al. | 2020-09-10 |
Method For Producing Silicon Compound, And Silicon Compound
App 20200115400 - MITSUI; Ryo ; et al. | 2020-04-16 |
Resist underlayer film composition, patterning process, method for forming resist underlayer film, and compound for resist underlayer film composition
Grant 10,620,537 - Watanabe , et al. | 2020-04-14 |
Compound, method for manufacturing the compound, and composition for forming organic film
Grant 10,604,618 - Tachibana , et al. | 2020-03-31 |
Method for producing polyalkylene glycol derivative having amino group at end
Grant 10,550,136 - Suka , et al. Fe | 2020-02-04 |
Compound, Method For Manufacturing The Compound, And Composition For Forming Organic Film
App 20190390000 - TACHIBANA; Seiichiro ; et al. | 2019-12-26 |
Compound And Composition For Forming Organic Film
App 20190391493 - TACHIBANA; Seiichiro ; et al. | 2019-12-26 |
Method For Purifying An Amino Acid-n-carboxy Anhydride
App 20190359579 - SUKA; Yuki ; et al. | 2019-11-28 |
Method for producing polyalkylene glycol derivative having amino group at end, polymerization initiator for use in the same, and alcohol compound as raw material for the polymerization initiator
Grant 10,472,377 - Suka , et al. Nov | 2019-11-12 |
Method For Producing Polyalkylene Glycol Derivative Having Amino Group At End
App 20190322688 - Suka; Yuki ; et al. | 2019-10-24 |
Method For Producing Polyalkylene Glycol Derivative Having Amino Group At End
App 20190315777 - Suka; Yuki ; et al. | 2019-10-17 |
Compound for forming organic film, composition for forming organic film, method for forming organic film, and patterning process
Grant 10,444,628 - Kori , et al. Oc | 2019-10-15 |
Compound, Composition For Forming Organic Film, Substrate For Manufacturing Semiconductor Apparatus, Method For Forming Organic
App 20190300498 - TACHIBANA; Seiichiro ; et al. | 2019-10-03 |
Compound for forming organic film, composition for forming organic film, method for forming organic film, and patterning process
Grant 10,429,739 - Kori , et al. O | 2019-10-01 |
Resist underlayer film composition, patterning process, and method for forming resist underlayer film
Grant 10,416,563 - Satoh , et al. Sept | 2019-09-17 |
Method for producing polyalkylene glycol derivative having amino group at end
Grant 10,377,775 - Suka , et al. A | 2019-08-13 |
Deposition Mask Package And Deposition Mask Packaging Method
App 20190237349 - Ikenaga; Chikao ; et al. | 2019-08-01 |
Resist underlayer film composition, patterning process, and method for forming resist underlayer film
Grant 10,241,412 - Nagai , et al. | 2019-03-26 |
Composition For Forming Organic Film, Substrate For Manufacturing Semiconductor Apparatus, Method For Forming Organic Film, Patterning Process, And Polymer
App 20190064659 - KORI; Daisuke ; et al. | 2019-02-28 |
Composition For Forming Organic Film, Substrate For Manufacturing Semiconductor Apparatus, Method For Forming Organic Film, Patterning Process, And Polymer
App 20190067021 - KORI; Daisuke ; et al. | 2019-02-28 |
Method for reducing metal of sugar-alcohol compound and sugar-alcohol compound
Grant 10,131,603 - Nakahara , et al. November 20, 2 | 2018-11-20 |
Resist Underlayer Film Composition, Patterning Process, And Method For Forming Resist Underlayer Film
App 20180284615 - NAGAI; Hiroko ; et al. | 2018-10-04 |
Resist Underlayer Film Composition, Patterning Process, And Method For Forming Resist Underlayer Film
App 20180284614 - SATOH; Hironori ; et al. | 2018-10-04 |
Compound for forming organic film, and organic film composition using the same, process for forming organic film, and patterning process
Grant 10,007,183 - Tachibana , et al. June 26, 2 | 2018-06-26 |
Compound for forming organic film, and organic film composition using the same, process for forming organic film, and patterning process
Grant 9,977,330 - Tachibana , et al. May 22, 2 | 2018-05-22 |
Silicon-containing polymer, silicon-containing compound, composition for forming a resist under layer film, and patterning process
Grant 9,971,245 - Ogihara , et al. May 15, 2 | 2018-05-15 |
Resist under layer film composition and patterning process
Grant 9,899,218 - Hatakeyama , et al. February 20, 2 | 2018-02-20 |
Resist Underlayer Film Composition, Patterning Process, Method For Forming Resist Underlayer Film, And Compound For Resist Underlayer Film Composition
App 20180011405 - WATANABE; Takeru ; et al. | 2018-01-11 |
Method For Reducing Metal Of Sugar-alcohol Compound And Sugar-alcohol Compound
App 20170369407 - NAKAHARA; Takayoshi ; et al. | 2017-12-28 |
Polymer for resist under layer film composition, resist under layer film composition, and patterning process
Grant 9,805,943 - Kikuchi , et al. October 31, 2 | 2017-10-31 |
Method For Producing Polyalkylene Glycol Derivative Having Amino Group At End, Polymerization Initiator For Use In The Same, And Alcohol Compound As Raw Material For The Polymerization Initiator
App 20170275305 - Suka; Yuki ; et al. | 2017-09-28 |
Method for producing polyalkylene glycol derivative having amino group at end, polymerization initiator for use in the same, and alcohol compound as raw material for the polymerization initiator
Grant 9,708,350 - Suka , et al. July 18, 2 | 2017-07-18 |
Compound For Forming Organic Film, Composition For Forming Organic Film, Method For Forming Organic Film, And Patterning Process
App 20170184968 - KORI; Daisuke ; et al. | 2017-06-29 |
Compound For Forming Organic Film, Composition For Forming Organic Film, Method For Forming Organic Film, And Patterning Process
App 20170183531 - KORI; Daisuke ; et al. | 2017-06-29 |
Fluorine-containing silicon compound, method for producing same, and method for producing fluorine-containing silicon resin
Grant 9,522,979 - Watanabe , et al. December 20, 2 | 2016-12-20 |
Resist Under Layer Film Composition And Patterning Process
App 20160358777 - HATAKEYAMA; Jun ; et al. | 2016-12-08 |
Quaternary ammonium salt compound, composition for forming a resist under layer film, and patterning process
Grant 9,490,144 - Ogihara , et al. November 8, 2 | 2016-11-08 |
Wet strip process for an antireflective coating layer
Grant 9,460,934 - Glodde , et al. October 4, 2 | 2016-10-04 |
Polymer For Resist Under Layer Film Composition, Resist Under Layer Film Composition, And Patterning Process
App 20160284559 - KIKUCHI; Rie ; et al. | 2016-09-29 |
Fluorine-containing Silicon Compound, Method For Producing Same, And Method For Producing Fluorine-containing Silicon Resin
App 20160229960 - WATANABE; Takeru ; et al. | 2016-08-11 |
Silicon-containing Polymer, Silicon-containing Compound, Composition For Forming A Resist Under Layer Film, And Patterning Process
App 20160229939 - OGIHARA; Tsutomu ; et al. | 2016-08-11 |
Organic film composition, method for forming organic film and patterning process using this, and heat-decomposable polymer
Grant 9,372,404 - Watanabe , et al. June 21, 2 | 2016-06-21 |
Method For Producing Polyalkylene Glycol Derivative Having Amino Group At End, Polymerization Initiator For Use In The Same, And Alcohol Compound As Raw Material For The Polymerization Initiator
App 20160159979 - Suka; Yuki ; et al. | 2016-06-09 |
Method For Producing Polyalkylene Glycol Derivative Having Amino Group At End
App 20160159831 - Suka; Yuki ; et al. | 2016-06-09 |
Method for producing polyalkylene glycol derivative with narrow molecular weight distribution, and acetal group-containing alcohol compound for use therein and alkali metal salt thereof
Grant 9,284,408 - Suka , et al. March 15, 2 | 2016-03-15 |
Compound for forming organic film, and organic film composition using the same, process for forming organic film, and patterning process
Grant 9,261,788 - Tachibana , et al. February 16, 2 | 2016-02-16 |
Compound For Forming Organic Film, And Organic Film Composition Using The Same, Process For Forming Organic Film, And Patterning Process
App 20160027653 - TACHIBANA; Seiichiro ; et al. | 2016-01-28 |
Compound For Forming Organic Film, And Organic Film Composition Using The Same, Process For Forming Organic Film, And Patterning Process
App 20160018735 - TACHIBANA; Seiichiro ; et al. | 2016-01-21 |
Quaternary Ammonium Salt Compound, Composition For Forming A Resist Under Layer Film, And Patterning Process
App 20150357204 - OGIHARA; Tsutomu ; et al. | 2015-12-10 |
Nitrogen-containing monomer, polymer, resist composition, and patterning process
Grant 9,207,534 - Sagehashi , et al. December 8, 2 | 2015-12-08 |
Method for producing polyalkylene glycol derivative having amino group at end, with narrow molecular weight distribution
Grant 9,187,404 - Harada , et al. November 17, 2 | 2015-11-17 |
Method For Producing Polyalkylene Glycol Derivative With Narrow Molecular Weight Distribution, And Acetal Group-containing Alcohol Compound For Use Therein And Alkali Metal Salt Thereof
App 20150197601 - Suka; Yuki ; et al. | 2015-07-16 |
Method For Producing Polyalkylene Glycol Derivative Having Amino Group At End, With Narrow Molecular Weight Distribution
App 20150197482 - Harada; Yuji ; et al. | 2015-07-16 |
Composition for resist underlayer film, process for forming resist underlayer film, patterning process, and fullerene derivative
Grant 9,076,738 - Watanabe , et al. July 7, 2 | 2015-07-07 |
Patterning process, resist composition, polymer, and polymerizable ester compound
Grant 9,057,949 - Watanabe , et al. June 16, 2 | 2015-06-16 |
Naphthalene derivative, resist bottom layer material, and patterning process
Grant 9,045,587 - Kinsho , et al. June 2, 2 | 2015-06-02 |
Method for producing molecule immobilizing substrate, and molecule immobilizing substrate
Grant 9,034,661 - Kusaki , et al. May 19, 2 | 2015-05-19 |
Patterning process and resist composition
Grant 9,029,064 - Hatakeyama , et al. May 12, 2 | 2015-05-12 |
Fluorinated monomer of cyclic acetal structure, polymer, resist protective coating composition, resist composition, and patterning process
Grant 8,933,251 - Watanabe , et al. January 13, 2 | 2015-01-13 |
Basic compound, chemically amplified resist composition, and patterning process
Grant 8,921,026 - Hatakeyama , et al. December 30, 2 | 2014-12-30 |
Naphthalene Derivative, Resist Bottom Layer Material, And Patterning Process
App 20140363768 - Kinsho; Takeshi ; et al. | 2014-12-11 |
Resist underlayer film composition and patterning process using the same
Grant 8,877,422 - Ogihara , et al. November 4, 2 | 2014-11-04 |
Resist underlayer film composition and patterning process using the same
Grant 8,853,031 - Ogihara , et al. October 7, 2 | 2014-10-07 |
Naphthalene derivative, resist bottom layer material, and patterning process
Grant 8,846,846 - Kinsho , et al. September 30, 2 | 2014-09-30 |
Wet Strip Process For An Antireflective Coating Layer
App 20140273501 - Glodde; Martin ; et al. | 2014-09-18 |
Resist underlayer film composition, process for forming resist underlayer film, patterning process and fullerene derivative
Grant 8,835,092 - Watanabe , et al. September 16, 2 | 2014-09-16 |
Fluoroalcohol, fluorinated monomer, polymer, resist composition and patterning process
Grant 8,835,094 - Hasegawa , et al. September 16, 2 | 2014-09-16 |
Biphenyl derivative, resist bottom layer material, bottom layer forming method, and patterning process
Grant 8,835,697 - Kori , et al. September 16, 2 | 2014-09-16 |
Chemically amplified resist composition and patterning process
Grant 8,828,641 - Hatakeyama , et al. September 9, 2 | 2014-09-09 |
Nitrogen-containing organic compound, chemically amplified positive resist composition, and patterning process
Grant 8,808,964 - Sagehashi , et al. August 19, 2 | 2014-08-19 |
Naphthalene derivative, resist bottom layer material, resist bottom layer forming method, and patterning process
Grant 8,795,955 - Kinsho , et al. August 5, 2 | 2014-08-05 |
Acid-labile ester monomer having spirocyclic structure, polymer, resist composition, and patterning process
Grant 8,791,288 - Kinsho , et al. July 29, 2 | 2014-07-29 |
Preparation of 2,2-bis (fluoroalkyl) oxirane and preparation of photoacid generator therefrom
Grant 8,686,166 - Sagehashi , et al. April 1, 2 | 2014-04-01 |
Resist pattern forming process
Grant 8,685,629 - Masunaga , et al. April 1, 2 | 2014-04-01 |
Resist underlayer film composition and patterning process using the same
Grant 8,663,898 - Ogihara , et al. March 4, 2 | 2014-03-04 |
Pattern forming process, chemically amplified positive resist composition, and resist-modifying composition
Grant 8,658,346 - Watanabe , et al. February 25, 2 | 2014-02-25 |
Chemically amplified resist composition and patterning process
Grant 8,628,908 - Watanabe , et al. January 14, 2 | 2014-01-14 |
Compound For Forming Organic Film, And Organic Film Composition Using The Same, Process For Forming Organic Film, And Patterning Process
App 20130337649 - TACHIBANA; Seiichiro ; et al. | 2013-12-19 |
Photoacid generator, resist composition, and patterning process
Grant 8,609,889 - Ohashi , et al. December 17, 2 | 2013-12-17 |
Resist underlayer film-forming composition, process for forming resist underlayer film and patterning process
Grant 8,603,732 - Ogihara , et al. December 10, 2 | 2013-12-10 |
Resist composition and patterning process
Grant 8,592,133 - Watanabe , et al. November 26, 2 | 2013-11-26 |
Resist underlayer film composition and patterning process using the same
Grant 8,592,956 - Ogihara , et al. November 26, 2 | 2013-11-26 |
Resist composition and patterning process
Grant 8,586,282 - Watanabe , et al. November 19, 2 | 2013-11-19 |
Organic Film Composition, Method For Forming Organic Film And Patterning Process Using This, And Heat-decomposable Polymer
App 20130302990 - WATANABE; Takeru ; et al. | 2013-11-14 |
Positive resist compositions and patterning process
Grant 8,541,158 - Kusaki , et al. September 24, 2 | 2013-09-24 |
Fluorinated Monomer Of Cyclic Acetal Structure, Polymer, Resist Protective Coating Composition, Resist Composition, And Patterning Process
App 20130231491 - WATANABE; Takeru ; et al. | 2013-09-05 |
Positive resist composition and patterning process
Grant 8,501,384 - Hatakeyama , et al. August 6, 2 | 2013-08-06 |
Patterning Process, Resist Composition, Polymer, And Polymerizable Ester Compound
App 20130157194 - Watanabe; Takeru ; et al. | 2013-06-20 |
Chemically Amplified Negative Resist Composition, Photo-curable Dry Film, Making Method, Pattern Forming Process, And Electric/electronic Part Protecting Film
App 20130149493 - Takemura; Katsuya ; et al. | 2013-06-13 |
Fluorinated monomer of cyclic acetal structure, polymer, resist protective coating composition, resist composition, and patterning process
Grant 8,431,323 - Watanabe , et al. April 30, 2 | 2013-04-30 |
Resist-modifying composition and pattern forming process
Grant 8,426,105 - Watanabe , et al. April 23, 2 | 2013-04-23 |
Chemically amplified positive resist composition, patterning process, and acid-decomposable keto ester compound
Grant 8,426,110 - Watanabe , et al. April 23, 2 | 2013-04-23 |
Polymer, resist composition, and patterning process
Grant 8,420,292 - Harada , et al. April 16, 2 | 2013-04-16 |
Pattern forming process and resist-modifying composition
Grant 8,367,310 - Watanabe , et al. February 5, 2 | 2013-02-05 |
Resist lower-layer composition containing thermal acid generator, resist lower layer film-formed substrate, and patterning process
Grant 8,349,533 - Ohsawa , et al. January 8, 2 | 2013-01-08 |
Preparation Of 2,2-bis (fluoroalkyl) Oxirane And Preparation Of Photoacid Generator Therefrom
App 20130005997 - SAGEHASHI; Masayoshi ; et al. | 2013-01-03 |
Photoresist undercoat-forming material and patterning process
Grant 8,338,078 - Hatakeyama , et al. December 25, 2 | 2012-12-25 |
Resist-modifying composition and pattern forming process
Grant 8,329,384 - Watanabe , et al. December 11, 2 | 2012-12-11 |
Resist protective coating material and patterning process
Grant 8,323,872 - Hatakeyama , et al. December 4, 2 | 2012-12-04 |
Antireflective coating composition, antireflective coating, and patterning process
Grant 8,313,890 - Tachibana , et al. November 20, 2 | 2012-11-20 |
Resist Protective Film Material And Pattern Formation Method
App 20120249995 - Hatakeyama; Jun ; et al. | 2012-10-04 |
Biphenyl Derivative, Resist Bottom Layer Material, Bottom Layer Forming Method, And Patterning Process
App 20120252218 - Kori; Daisuke ; et al. | 2012-10-04 |
Deprotection method of protected polymer
Grant 8,273,830 - Masunaga , et al. September 25, 2 | 2012-09-25 |
Chemically Amplified Resist Composition And Patterning Process
App 20120225386 - Watanabe; Takeru ; et al. | 2012-09-06 |
Chemically Amplified Positive Resist Composition, Patterning Process, And Acid-decomposable Keto Ester Compound
App 20120196227 - WATANABE; Takeru ; et al. | 2012-08-02 |
Resist Pattern Forming Process
App 20120196211 - Masunaga; Keiichi ; et al. | 2012-08-02 |
Resist Composition And Patterning Process
App 20120183893 - WATANABE; Satoshi ; et al. | 2012-07-19 |
Resist Underlayer Film Composition And Patterning Process Using The Same
App 20120184103 - OGIHARA; Tsutomu ; et al. | 2012-07-19 |
Nitrogen-containing Monomer, Polymer, Resist Composition, And Patterning Process
App 20120183904 - Sagehashi; Masayoshi ; et al. | 2012-07-19 |
Patterning Process And Resist Composition
App 20120183903 - Hatakeyama; Jun ; et al. | 2012-07-19 |
Resist Composition And Patterning Process
App 20120183892 - WATANABE; Satoshi ; et al. | 2012-07-19 |
Polymer, polymer preparation method, resist composition and patterning process
Grant 8,216,766 - Watanabe , et al. July 10, 2 | 2012-07-10 |
Resist Underlayer Film Composition And Patterning Process Using The Same
App 20120171868 - OGIHARA; Tsutomu ; et al. | 2012-07-05 |
Basic Compound, Chemically Amplified Resist Composition, And Patterning Process
App 20120141938 - Hatakeyama; Jun ; et al. | 2012-06-07 |
Resist Underlayer Film Composition And Patterning Process Using The Same
App 20120142193 - OGIHARA; Tsutomu ; et al. | 2012-06-07 |
Resist Underlayer Film Composition And Patterning Process Using The Same
App 20120108071 - OGIHARA; Tsutomu ; et al. | 2012-05-03 |
Resist composition and patterning process
Grant 8,168,367 - Watanabe , et al. May 1, 2 | 2012-05-01 |
Fluoroalcohol, Fluorinated Monomer, Polymer, Resist Composition And Patterning Process
App 20120077121 - HASEGAWA; Koji ; et al. | 2012-03-29 |
Naphthalene Derivative, Resist Bottom Layer Material, And Patterning Process
App 20120064725 - Kinsho; Takeshi ; et al. | 2012-03-15 |
Polymerizable compound, polymer, positive resist composition, and patterning process using the same
Grant 8,129,086 - Hatakeyama , et al. March 6, 2 | 2012-03-06 |
Nitrogen-containing Organic Compound, Chemically Amplified Positive Resist Composition, And Patterning Process
App 20120052441 - SAGEHASHI; Masayoshi ; et al. | 2012-03-01 |
Composition For Resist Underlayer Film, Process For Forming Resist Underlayer Film, Patterning Process, And Fullerene Derivative
App 20120045900 - WATANABE; Takeru ; et al. | 2012-02-23 |
Photoacid generator, resist composition, and patterning process
Grant 8,114,570 - Ohsawa , et al. February 14, 2 | 2012-02-14 |
Photoacid generator, resist composition, and patterning process
Grant 8,114,571 - Ohashi , et al. February 14, 2 | 2012-02-14 |
Patterning process and pattern surface coating composition
Grant 8,105,760 - Hatakeyama , et al. January 31, 2 | 2012-01-31 |
Naphthalene Derivative, Resist Bottom Layer Material, Resist Bottom Layer Forming Method, And Patterning Process
App 20110311920 - Kinsho; Takeshi ; et al. | 2011-12-22 |
Resist Top Coat Composition And Patterning Process
App 20110305979 - HARADA; Yuji ; et al. | 2011-12-15 |
Positive resist composition and patterning process
Grant 8,062,828 - Ohsawa , et al. November 22, 2 | 2011-11-22 |
Carboxyl-containing lactone compound, polymer, resist composition, and patterning process
Grant 8,062,831 - Shinachi , et al. November 22, 2 | 2011-11-22 |
Hydroxyl-containing monomer, polymer, resist composition, and patterning process
Grant 8,053,165 - Kinsho , et al. November 8, 2 | 2011-11-08 |
Sulfonate salts and derivatives, photoacid generators, resist compositions, and patterning process
Grant 8,030,515 - Kobayashi , et al. October 4, 2 | 2011-10-04 |
Positive resist compositions and patterning process
Grant 8,021,822 - Ohsawa , et al. September 20, 2 | 2011-09-20 |
Positive resist compositions and patterning process
Grant 8,017,302 - Ohsawa , et al. September 13, 2 | 2011-09-13 |
Ester compounds and their preparation, polymers, resist compositions and patterning process
Grant 7,998,657 - Ohashi , et al. August 16, 2 | 2011-08-16 |
Resist Underlayer Film Composition, Process For Forming Resist Underlayer Film, Patterning Process And Fullerene Derivative
App 20110195362 - Watanabe; Takeru ; et al. | 2011-08-11 |
Positive resist compositions and patterning process
Grant 7,993,811 - Ohsawa , et al. August 9, 2 | 2011-08-09 |
Positive Resist Compositions And Patterning Process
App 20110183262 - Kusaki; Wataru ; et al. | 2011-07-28 |
Resist Underlayer Film-forming Composition, Process For Forming Resist Underlayer Film And Patterning Process
App 20110177459 - OGIHARA; Tsutomu ; et al. | 2011-07-21 |
Polymer, Resist Composition, And Patterning Process
App 20110177455 - HARADA; Yuji ; et al. | 2011-07-21 |
Fluorinated monomer, fluorinated polymer, resist composition and patterning process
Grant 7,981,589 - Hasegawa , et al. July 19, 2 | 2011-07-19 |
Positive Resist Composition And Patterning Process
App 20110171580 - HATAKEYAMA; Jun ; et al. | 2011-07-14 |
Novel Sulfonate Salts And Derivatives, Photoacid Generators, Resist Compositions, And Patterning Process
App 20110160481 - KOBAYASHI; Katsuhiro ; et al. | 2011-06-30 |
Chemically Amplified Resist Composition And Patterning Process
App 20110129777 - Hatakeyama; Jun ; et al. | 2011-06-02 |
Sulfonate salts and derivatives, photoacid generators, resist compositions, and patterning process
Grant 7,928,262 - Kobayashi , et al. April 19, 2 | 2011-04-19 |
Deprotection Method Of Protected Polymer
App 20110086986 - Masunaga; Keiichi ; et al. | 2011-04-14 |
Sulfonate salts and derivatives, photoacid generators, resist compositions, and patterning process
Grant 7,919,226 - Ohsawa , et al. April 5, 2 | 2011-04-05 |
Ester compounds and their preparation, polymers, resist compositions and patterning process
Grant 7,902,385 - Ohashi , et al. March 8, 2 | 2011-03-08 |
Ester Compounds And Their Preparation, Polymers, Resist Compositions And Patterning Process
App 20110039204 - OHASHI; Masaki ; et al. | 2011-02-17 |
Pattern Forming Process, Chemically Amplified Positive Resist Composition, And Resist-modifying Composition
App 20110033799 - Watanabe; Takeru ; et al. | 2011-02-10 |
Fluoroalcohol preparation method, fluorinated monomer, polymer, resist composition and patterning process
Grant 7,868,199 - Hasegawa , et al. January 11, 2 | 2011-01-11 |
Photoacid Generator, Resist Composition, And Patterning Process
App 20110003247 - Ohashi; Masaki ; et al. | 2011-01-06 |
Acid-labile Ester Monomer Having Spirocyclic Structure, Polymer, Resist Composition, And Patterning Process
App 20100304295 - Kinsho; Takeshi ; et al. | 2010-12-02 |
Resist-modifying Composition And Pattern Forming Process
App 20100297554 - Watanabe; Takeru ; et al. | 2010-11-25 |
Resist-modifying Composition And Pattern Forming Process
App 20100297563 - Watanabe; Takeru ; et al. | 2010-11-25 |
Hydrogenated ring-opening metathesis polymer, resist composition and patterning process
Grant 7,807,331 - Kobayashi , et al. October 5, 2 | 2010-10-05 |
Method For Producing Molecule Immobilizing Substrate, And Molecule Immobilizing Substrate
App 20100233827 - KUSAKI; Wataru ; et al. | 2010-09-16 |
Pattern Forming Process And Resist-modifying Composition
App 20100209849 - Watanabe; Takeru ; et al. | 2010-08-19 |
Resist protective film composition and patterning process
Grant 7,759,047 - Hatakeyama , et al. July 20, 2 | 2010-07-20 |
Patterning Process And Resist Composition
App 20100159392 - Hatakeyama; Jun ; et al. | 2010-06-24 |
Antireflective Coating Composition, Antireflective Coating , And Patterning Process
App 20100151381 - TACHIBANA; Seiichiro ; et al. | 2010-06-17 |
Resist lower-layer composition containing thermal acid generator, resist lower layer film-formed substrate, and patterning process
App 20100119970 - Ohsawa; Youichi ; et al. | 2010-05-13 |
Fluorinated Monomer Of Cyclic Acetal Structure, Polymer, Resist Protective Coating Composition, Resist Composition, And Patterning Process
App 20100112482 - WATANABE; Takeru ; et al. | 2010-05-06 |
Photoresist Undercoat-forming Material And Patterning Process
App 20100104977 - Hatakeyama; Jun ; et al. | 2010-04-29 |
Patterning Process
App 20100086878 - Hatakeyama; Jun ; et al. | 2010-04-08 |
Polymerizable ester compounds, polymers, resist compositions and patterning process
Grant 7,687,222 - Watanabe , et al. March 30, 2 | 2010-03-30 |
Photoacid generator, resist composition, and patterning process
Grant 7,670,751 - Ohashi , et al. March 2, 2 | 2010-03-02 |
Polymer, resist composition and patterning process
Grant 7,666,571 - Watanabe , et al. February 23, 2 | 2010-02-23 |
Resist composition and patterning process
App 20100009299 - Watanabe; Satoshi ; et al. | 2010-01-14 |
Fluorinated cyclic structure-bearing silicon compounds and silicone resins, resist compositions using the same, and patterning process
Grant 7,638,256 - Kinsho , et al. December 29, 2 | 2009-12-29 |
Photoresist undercoat-forming material and patterning process
Grant 7,632,624 - Hatakeyama , et al. December 15, 2 | 2009-12-15 |
Nitrogen-containing organic compound, resist composition and patterning process
Grant 7,629,108 - Watanabe , et al. December 8, 2 | 2009-12-08 |
Polymerizable compound, polymer, positive resist composition, and patterning process using the same
App 20090297979 - Hatakeyama; Jun ; et al. | 2009-12-03 |
Resist composition and patterning process
Grant 7,622,242 - Hatakeyama , et al. November 24, 2 | 2009-11-24 |
Carboxyl-containing Lactone Compound, Polymer, Resist Composition, And Patterning Process
App 20090274984 - SHINACHI; Satoshi ; et al. | 2009-11-05 |
Novel Photoacid Generator, Resist Composition, And Patterning Process
App 20090274978 - OHASHI; Masaki ; et al. | 2009-11-05 |
Polymer, resist composition and patterning process
Grant 7,598,015 - Tachibana , et al. October 6, 2 | 2009-10-06 |
Polymer, Polymer Preparation Method, Resist Composition And Patterning Process
App 20090246686 - WATANABE; Takeru ; et al. | 2009-10-01 |
Hydroxyl-containing Monomer, Polymer, Resist Composition, And Patterning Process
App 20090239179 - Kinsho; Takeshi ; et al. | 2009-09-24 |
Polymerizable fluorinated compound, making method, polymer, resist composition and patterning process
Grant 7,592,407 - Harada , et al. September 22, 2 | 2009-09-22 |
Positive Resist Composition And Patterning Process
App 20090202943 - Ohsawa; Youichi ; et al. | 2009-08-13 |
Sulfonium salt having polymerizable anion, polymer, resist composition, and patterning process
Grant 7,569,326 - Ohsawa , et al. August 4, 2 | 2009-08-04 |
Sulfonate salts and derivatives, photoacid generators, resist compositions, and patterning process
Grant 7,569,324 - Kobayashi , et al. August 4, 2 | 2009-08-04 |
Positive Resist Compositions And Patterning Process
App 20090186296 - OHSAWA; Youichi ; et al. | 2009-07-23 |
Positive Resist Compositions And Patterning Process
App 20090186298 - OHSAWA; Youichi ; et al. | 2009-07-23 |
Positive Resist Compositions And Patterning Process
App 20090186297 - Ohsawa; Youichi ; et al. | 2009-07-23 |
Hydrogenated Ring-opening Metathesis Polymer, Resist Composition And Patterning Process
App 20090186307 - KOBAYASHI; Tomohiro ; et al. | 2009-07-23 |
Sulfonate salts and derivatives, photoacid generators, resist compositions, and patterning process
Grant 7,556,909 - Kobayashi , et al. July 7, 2 | 2009-07-07 |
Fluorinated monomer having cyclic structure, manufacturing method, polymer, photoresist composition and patterning process
Grant 7,531,289 - Kinsho , et al. May 12, 2 | 2009-05-12 |
Sulfonate salts and derivatives, photoacid generators, resist compositions, and patterning process
Grant 7,531,290 - Kobayashi , et al. May 12, 2 | 2009-05-12 |
Photoacid generators, resist compositions, and patterning process
Grant 7,527,912 - Ohsawa , et al. May 5, 2 | 2009-05-05 |
Thermal acid generator, resist undercoat material and patterning process
Grant 7,514,202 - Ohsawa , et al. April 7, 2 | 2009-04-07 |
Sulfonate salts and derivatives, photoacid generators, resist compositions, and patterning process
Grant 7,511,169 - Ohsawa , et al. March 31, 2 | 2009-03-31 |
Resist Composition And Patterning Process
App 20090081588 - Hatakeyama; Jun ; et al. | 2009-03-26 |
Novel Photoacid Generator, Resist Composition, And Patterning Process
App 20090061358 - OHASHI; Masaki ; et al. | 2009-03-05 |
Patterning Process And Pattern Surface Coating Composition
App 20090053657 - HATAKEYAMA; Jun ; et al. | 2009-02-26 |
Fluorinated Monomer, Fluorinated Polymer, Resist Composition And Patterning Process
App 20090035699 - HASEGAWA; Koji ; et al. | 2009-02-05 |
Fluorine-containing silicon compounds, silicone resins, resist compositions, and patterning process
Grant 7,485,408 - Kinsho , et al. February 3, 2 | 2009-02-03 |
Novel sulfonate salts and derivatives, photoacid generators, resist compositions, and patterning process
App 20080318160 - Ohsawa; Youichi ; et al. | 2008-12-25 |
Amine compound, chemically amplified resist composition and patterning process
Grant 7,468,236 - Watanabe , et al. December 23, 2 | 2008-12-23 |
Novel Sulfonate Salts And Derivatives, Photoacid Generators, Resist Compositions, And Patterning Process
App 20080124656 - KOBAYASHI; Katsuhiro ; et al. | 2008-05-29 |
Tertiary amine compounds having an ester structure and processes for preparing the same
Grant 7,378,548 - Watanabe , et al. May 27, 2 | 2008-05-27 |
Sulfonium salt having polymerizable anion, polymer, resist composition, and patterning process
App 20080102407 - Ohsawa; Youichi ; et al. | 2008-05-01 |
Nitrogen-containing organic compound, resist composition and patterning process
App 20080102405 - Watanabe; Takeru ; et al. | 2008-05-01 |
Novel photoacid generators, resist compositions, and patterning process
App 20080085469 - Ohsawa; Youichi ; et al. | 2008-04-10 |
Ester compounds and their preparation, polymers, resist compositions and patterning process
App 20080008965 - Ohashi; Masaki ; et al. | 2008-01-10 |
Polymerizable ester compounds, polymers, resist compositions and patterning process
App 20080008962 - Watanabe; Takeru ; et al. | 2008-01-10 |
Novel Sulfonate Salts And Derivatives, Photoacid Generators, Resist Compositions, And Patterning Process
App 20070298352 - KOBAYASHI; Katsuhiro ; et al. | 2007-12-27 |
Polymerizable fluorinated ester compounds and their preparing processes
Grant 7,312,288 - Kinsho , et al. December 25, 2 | 2007-12-25 |
Photoresist undercoat-forming material and patterning process
App 20070275325 - Hatakeyama; Jun ; et al. | 2007-11-29 |
Resist protective film composition and patterning process
App 20070275326 - Hatakeyama; Jun ; et al. | 2007-11-29 |
Thermal acid generator, resist undercoat material and patterning process
App 20070264596 - Ohsawa; Youichi ; et al. | 2007-11-15 |
Polymerizable Fluorinated Ester Compounds And Their Preparing Processes
App 20070249858 - Kinsho; Takeshi ; et al. | 2007-10-25 |
Polymerizable ester having sulfonamide structure, polymer, resist composition and patterning process
Grant 7,285,368 - Watanabe , et al. October 23, 2 | 2007-10-23 |
Resist composition and patterning process
App 20070231741 - Nishi; Tsunehiro ; et al. | 2007-10-04 |
Nitrogen-containing organic compound, resist composition and patterning process
Grant 7,276,324 - Watanabe , et al. October 2, 2 | 2007-10-02 |
Fluorine-containing silicon compounds, silicone resins, resist compositions, and patterning process
App 20070218402 - Kinsho; Takeshi ; et al. | 2007-09-20 |
Nitrogen-containing organic compound, chemically amplified resist composition and patterning process
Grant 7,261,995 - Watanabe , et al. August 28, 2 | 2007-08-28 |
Nitrogen-containing organic compound, resist composition and patterning process
Grant 7,252,925 - Watanabe , et al. August 7, 2 | 2007-08-07 |
Fluoroalcohol preparation method, fluorinated monomer, polymer, resist composition and patterning process
App 20070179309 - Hasegawa; Koji ; et al. | 2007-08-02 |
Resist Protective Film Material And Pattern Formation Method
App 20070122736 - Hatakeyama; Jun ; et al. | 2007-05-31 |
Polymer, resist composition and patterning process
App 20070099114 - Watanabe; Takeru ; et al. | 2007-05-03 |
Novel sulfonate salts and derivatives, photoacid generators, resist compositions, and patterning process
App 20070099113 - Kobayashi; Katsuhiro ; et al. | 2007-05-03 |
Novel sulfonate salts and derivatives, photoacid generators, resist compositions, and patterning process
App 20070099112 - Kobayashi; Katsuhiro ; et al. | 2007-05-03 |
Amine compound, chemically amplified resist composition and patterning process
App 20070087287 - Watanabe; Takeru ; et al. | 2007-04-19 |
Polymerizable fluorinated ester, manufacturing method, polymer, photoresist composition and patterning process
Grant 7,202,318 - Kinsho , et al. April 10, 2 | 2007-04-10 |
Polymerizable silicon-containing compound, manufacturing method, polymer, resist composition and patterning process
Grant 7,192,684 - Kinsho , et al. March 20, 2 | 2007-03-20 |
Resist composition and patterning process
Grant 7,179,581 - Watanabe , et al. February 20, 2 | 2007-02-20 |
Fluorinated cyclic structure-bearing silicon compounds and silicone resins, resist compositions using the same, and patterning process
App 20070009832 - Kinsho; Takeshi ; et al. | 2007-01-11 |
Resist protective coating material and patterning process
App 20070003867 - Hatakeyama; Jun ; et al. | 2007-01-04 |
Basic compound, resist composition and patterning process
Grant 7,141,352 - Watanabe , et al. November 28, 2 | 2006-11-28 |
Basic compound, resist composition and patterning process
Grant 7,141,351 - Watanabe , et al. November 28, 2 | 2006-11-28 |
Resist polymer, resist composition and patterning process
Grant 7,135,270 - Watanabe , et al. November 14, 2 | 2006-11-14 |
Ester compounds, polymers, resist compositions and patterning process
Grant 7,132,215 - Hasegawa , et al. November 7, 2 | 2006-11-07 |
Novel ester compounds, polymers, resist compositions and patterning process
App 20060234160 - Hasegawa; Koji ; et al. | 2006-10-19 |
Novel sulfonate salts and derivatives, photoacid generators, resist compositions, and patterning process
App 20060228648 - Ohsawa; Youichi ; et al. | 2006-10-12 |
Novel Tertiary Amine Compounds Having An Ester Structure And Processes For Preparing The Same
App 20060217570 - Watanabe; Takeru ; et al. | 2006-09-28 |
Tertiary amine compounds having an ester structure and processes for preparing same
Grant 7,084,303 - Watanabe , et al. August 1, 2 | 2006-08-01 |
Alicyclic methacrylate having oxygen substituent group on .alpha.-methyl
Grant 7,041,846 - Watanabe , et al. May 9, 2 | 2006-05-09 |
Fluorinated monomer having cyclic structure, manufacturing method, polymer, photoresist composition and patterning process
App 20060093960 - Kinsho; Takeshi ; et al. | 2006-05-04 |
Polymerizable fluorinated compound, making method, polymer, resist composition and patterning process
App 20060094817 - Harada; Yuji ; et al. | 2006-05-04 |
Tertiary (meth)acrylates having lactone structure, polymers, resist compositions and patterning process
Grant 7,037,995 - Watanabe , et al. May 2, 2 | 2006-05-02 |
Tertiary alcohol compounds having alicyclic structure
Grant 7,029,822 - Hasegawa , et al. April 18, 2 | 2006-04-18 |
Compound, fluorine-containing polymerizable cyclic olefin compound
Grant 7,012,161 - Watanabe , et al. March 14, 2 | 2006-03-14 |
Polymerizable fluorinated ester, manufacturing method, polymer, photoresist composition and patterning process
App 20060009602 - Kinsho; Takeshi ; et al. | 2006-01-12 |
Polymer, resist composition and patterning process
App 20050282082 - Tachibana, Seiichiro ; et al. | 2005-12-22 |
Novel tertiary (meth)acrylates having lactone structure, polymers, resist compositions and patterning process
App 20050250924 - Watanabe, Takeru ; et al. | 2005-11-10 |
Acetal compound, polymer, resist composition and patterning process
Grant 6,962,767 - Watanabe , et al. November 8, 2 | 2005-11-08 |
Nitrogen-containing organic compound, chemically amplified resist composition and patterning process
App 20050238993 - Watanabe, Takeru ; et al. | 2005-10-27 |
Resist composition
Grant 6,916,593 - Hatakeyama , et al. July 12, 2 | 2005-07-12 |
Novel epoxy compounds having an alicyclic structure, polymer compounds, resist materials, and patterning methods
App 20050142491 - Hasegawa, Koji ; et al. | 2005-06-30 |
Epoxy compound having alicyclic structure, polymer, resist composition and patterning process
Grant 6,899,990 - Hasegawa , et al. May 31, 2 | 2005-05-31 |
Nitrogen-containing organic compound, resist composition and patterning process
App 20050106500 - Watanabe, Takeru ; et al. | 2005-05-19 |
Nitrogen-containing organic compound, resist composition and patterning process
App 20050095533 - Watanabe, Takeru ; et al. | 2005-05-05 |
Novel compound, fluorine-containing polymerizable cyclic olefin compound
App 20050054883 - Watanabe, Takeru ; et al. | 2005-03-10 |
Resist polymer, resist composition and patterning process
App 20050031989 - Watanabe, Takeru ; et al. | 2005-02-10 |
Resist polymer, resist composition and patterning process
App 20050031988 - Watanabe, Takeru ; et al. | 2005-02-10 |
Basic compound, resist composition and patterning process
App 20050008968 - Watanabe, Takeru ; et al. | 2005-01-13 |
Polymerizable ester having sulfonamide structure, polymer, resist composition and patterning process
App 20050003303 - Watanabe, Takeru ; et al. | 2005-01-06 |
Novel tertiary alcohol compounds having alicyclic structure
App 20040254394 - Hasegawa, Koji ; et al. | 2004-12-16 |
Basic compound, resist composition and patterning process
App 20040234884 - Watanabe, Takeru ; et al. | 2004-11-25 |
Polymers, resist compositions and patterning process, novel tetrahydrofuran compounds and their preparation
Grant 6,794,111 - Nishi , et al. September 21, 2 | 2004-09-21 |
Alicyclic methacrylate having oxygen substituent group on alpha-methyl
App 20040176630 - Watanabe, Takeru ; et al. | 2004-09-09 |
Polymer, resist composition and patterning process
Grant 6,780,563 - Hasegawa , et al. August 24, 2 | 2004-08-24 |
Tertiary alcohol compounds having alicyclic structure
Grant 6,774,258 - Hasegawa , et al. August 10, 2 | 2004-08-10 |
Amine compounds, resist compositions and patterning process
Grant 6,749,988 - Hatakeyama , et al. June 15, 2 | 2004-06-15 |
(Meth)acrylates having lactone structure, polymers, photoresist compositions and patterning process
Grant 6,746,818 - Kinsho , et al. June 8, 2 | 2004-06-08 |
Resist composition
App 20040106063 - Hatakeyama, Jun ; et al. | 2004-06-03 |
Cyclic acetal compound, polymer, resist composition and patterning process
Grant 6,743,566 - Nakashima , et al. June 1, 2 | 2004-06-01 |
Amine compounds, resist compositions and patterning process
Grant 6,743,564 - Hatakeyama , et al. June 1, 2 | 2004-06-01 |
Novel ester compounds, polymers, resist compositions and patterning process
App 20040068124 - Hasegawa, Koji ; et al. | 2004-04-08 |
Polymerizable silicon-containing compound, manufacturing method, polymer, resist composition and patterning process
App 20040067436 - Kinsho, Takeshi ; et al. | 2004-04-08 |
Resist composition
Grant 6,673,511 - Hatakeyama , et al. January 6, 2 | 2004-01-06 |
Polymer, resist composition and patterning process
Grant 6,673,515 - Nishi , et al. January 6, 2 | 2004-01-06 |
Ester compounds, polymers, resist compositions and patterning process
Grant 6,670,498 - Nishi , et al. December 30, 2 | 2003-12-30 |
Resist composition and patterning process
Grant 6,667,145 - Nishi , et al. December 23, 2 | 2003-12-23 |
Polymer, resist composition and patterning process
Grant 6,660,448 - Tachibana , et al. December 9, 2 | 2003-12-09 |
Novel ester compounds polymers, resist compositions and patterning process
App 20030198891 - Hasegawa, Koji ; et al. | 2003-10-23 |
Acetal compound, polymer, resist composition and patterning response
App 20030153706 - Watanabe, Takeru ; et al. | 2003-08-14 |
Polymers, resist compositions and patterning process
Grant 6,566,038 - Nishi , et al. May 20, 2 | 2003-05-20 |
Novel ester compounds, polymers, resist compositions and patterning process
App 20030088115 - Nishi, Tsunehiro ; et al. | 2003-05-08 |
Novel epoxy compounds having an alicyclic structure, polymer compounds, resist materials, and patterning methods
App 20030050398 - Hasegawa, Koji ; et al. | 2003-03-13 |
Cyclic acetal compound, polymer, resist composition and patterning process
App 20030045731 - Nakashima, Mutsuo ; et al. | 2003-03-06 |
Polymer, resist composition and patterning process
Grant 6,524,765 - Nishi , et al. February 25, 2 | 2003-02-25 |
Novel epoxy compound having alicyclic structure, polymer, resist composition and patterning process
App 20030036603 - Hasegawa, Koji ; et al. | 2003-02-20 |
Lactone ring-containing (meth)acrylate and polymer thereof for photoresist composition
Grant 6,517,994 - Watanabe February 11, 2 | 2003-02-11 |
Novel (meth) acrylates having lactone structure, polymers, photoresist compositions and patterning process
App 20030008232 - Kinsho, Takeshi ; et al. | 2003-01-09 |
Polymers, resist compositions and patterning process, novel tetrahydrofuran compounds and their preparation
App 20020197559 - Nishi, Tsunehiro ; et al. | 2002-12-26 |
Novel tertiary amine compounds having an ester structure and processes for preparing same
App 20020193622 - Watanabe, Takeru ; et al. | 2002-12-19 |
Novel tetrahydrofuran compounds having alicyclic structure
App 20020183529 - Kinsho, Takeshi ; et al. | 2002-12-05 |
Lactone ring-containing (meth)acrylate and polymer thereof for photoresist composition
App 20020147291 - Watanabe, Takeru | 2002-10-10 |
Cyclic acetal compound, polymer, resist composition and patterning process
App 20020147290 - Nakashima, Mutsuo ; et al. | 2002-10-10 |
Acetal compound, polymer, resist composition and patterning response
App 20020132970 - Watanabe, Takeru ; et al. | 2002-09-19 |
Acid-decomposable ester compound suitable for use in resist material
Grant 6,448,420 - Kinsho , et al. September 10, 2 | 2002-09-10 |
Ester compounds, polymers, resist composition and patterning process
Grant 6,444,396 - Watanabe , et al. September 3, 2 | 2002-09-03 |
Amine compounds, resist compositions and patterning process
App 20020115018 - Hatakeyama, Jun ; et al. | 2002-08-22 |
Acid-decomposable Ester Compound Suitable For Use In Resist Material
App 20020115874 - Kinsho, Takeshi ; et al. | 2002-08-22 |
Amine compounds, resist compositions and patterning process
App 20020098443 - Hatakeyama, Jun ; et al. | 2002-07-25 |
Polymer, resist composition and patterning process
App 20020091215 - Tachibana, Seiichiro ; et al. | 2002-07-11 |
Novel tertiary alcohol compounds having an alicyclic structure
App 20020087033 - Hasegawa, Koji ; et al. | 2002-07-04 |
Novel tertiary alcohol compounds having alicyclic structure
App 20020072579 - Hasegawa, Koji ; et al. | 2002-06-13 |
Polymer, resist composition and patterning process
App 20020061463 - Nishi, Tsunehiro ; et al. | 2002-05-23 |
Polymer, resist composition and patterning process
App 20020061465 - Hasegawa, Koji ; et al. | 2002-05-23 |
Novel ester compounds having alicyclic and oxirane structures and method for preparing the same
App 20020035279 - Watanabe, Takeru ; et al. | 2002-03-21 |
Novel lactone compounds having alicyclic structure and their manufacturing method
App 20020019545 - Kinsho, Takeshi ; et al. | 2002-02-14 |
Novel lactone compounds having alicyclic structure and their manufacturing method
App 20020016477 - Kinsho, Takeshi ; et al. | 2002-02-07 |
Novel ester compounds, polymers, resist compositions and patterning process
App 20020007031 - Nishi, Tsunehiro ; et al. | 2002-01-17 |
Novel ester compounds, polymers, resist compositions and patterning process
App 20020004178 - Hasegawa, Koji ; et al. | 2002-01-10 |
Polymers, resist compositions and patterning process
App 20010051315 - Nishi, Tsunehiro ; et al. | 2001-12-13 |
Novel ester compounds having alicyclic structure and method for preparing same
App 20010051742 - Hasegawa, Koji ; et al. | 2001-12-13 |
Polymers, resist compositions and patterning process
App 20010051316 - Nishi, Tsunehiro ; et al. | 2001-12-13 |
Novel ester compounds having alicyclic structure and method for preparing same
App 20010051741 - Watanabe, Takeru ; et al. | 2001-12-13 |
Novel ester compounds, polymers, resist compositions and patterning process
App 20010044071 - Hasegawa, Koji ; et al. | 2001-11-22 |
Ester compounds, polymers, resist compositions and patterning process
Grant 6,312,867 - Kinsho , et al. November 6, 2 | 2001-11-06 |
Polymer, resist composition and patterning process
App 20010031424 - Nishi, Tsunehiro ; et al. | 2001-10-18 |
Polymer, resist composition and patterning process
App 20010026904 - Nishi, Tsunehiro ; et al. | 2001-10-04 |
Preparation of tris (trimethylsilyl) silylethyl esters
App 20010007909 - Kinsho, Takeshi ; et al. | 2001-07-12 |
Ester compounds, polymers, resist composition and patterning process
Grant 6,147,249 - Watanabe , et al. November 14, 2 | 2000-11-14 |
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