Watabe; Yoshimi
Patent Applications and Registrations
Patent applications and USPTO patent grants for Watabe; Yoshimi.The latest application filed is for "plasma treatment system and cleaning method of the same".
- Watabe; Yoshimi - Yokohama JP
- Watabe; Yoshimi - Kanagawa JP
- Watabe; Yoshimi - Yokohama-shi JP
- Watabe; Yoshimi - Tokyo JP
- Watabe; Yoshimi - Kunitachi JP
- Watabe, Yoshimi - Kunitachi-shi JP
| Patent | Date |
|---|---|
| Plasma treatment system and cleaning method of the same Grant 8,002,947 - Numasawa , et al. August 23, 2 | 2011-08-23 |
| Cooling device for vacuum treatment device Grant 7,913,752 - Ueda , et al. March 29, 2 | 2011-03-29 |
| Plasma treatment system and cleaning method of the same Grant 7,530,359 - Numasawa , et al. May 12, 2 | 2009-05-12 |
| Plasma treatment system and cleaning method of the same App 20090095217 - Numasawa; Yoichiro ; et al. | 2009-04-16 |
| Semiconductor thin film forming system Grant 7,312,418 - Tanabe , et al. December 25, 2 | 2007-12-25 |
| Semiconductor Thin Film Forming System App 20070166945 - TANABE; Hiroshi ; et al. | 2007-07-19 |
| Semiconductor thin film forming system App 20050109743 - Tanabe, Hiroshi ; et al. | 2005-05-26 |
| Discharge apparatus, plasma processing method and solar cell App 20050067934 - Ueda, Masashi ; et al. | 2005-03-31 |
| S system for the formation of a silicon thin film and a semiconductor-insulating film interface Grant 6,861,614 - Tanabe , et al. March 1, 2 | 2005-03-01 |
| Plasma processing device and method of cleaning the same App 20040149386 - Numasawa, Yoichiro ; et al. | 2004-08-05 |
| Plasma processing system Grant 6,664,496 - Watabe , et al. December 16, 2 | 2003-12-16 |
| Thin film formation by inductively-coupled plasma CVD process Grant 6,503,816 - Ito , et al. January 7, 2 | 2003-01-07 |
| Plasma processing system App 20020144980 - Watabe, Yoshimi ; et al. | 2002-10-10 |
| Thin film forming method, thin film forming apparatus and solar cell App 20010031542 - Ito, Norikazu ; et al. | 2001-10-18 |
| Plasma CVD apparatus suitable for manufacturing solar cell and the like Grant 6,189,485 - Matsuda , et al. February 20, 2 | 2001-02-20 |
| Plasma CVD process for forming amorphous silicon thin film Grant 5,437,895 - Kodama , et al. August 1, 1 | 1995-08-01 |
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