loadpatents
name:-0.044327974319458
name:-0.030215978622437
name:-0.0049560070037842
Washington; Lori D. Patent Filings

Washington; Lori D.

Patent Applications and Registrations

Patent applications and USPTO patent grants for Washington; Lori D..The latest application filed is for "methods of manufacturing optoelectronic devices using different growth substrates".

Company Profile
4.29.37
  • Washington; Lori D. - Santa Clara CA
  • Washington; Lori D. - Union City CA
*profile and listings may contain filings by different individuals or companies with the same name. Review application materials to confirm ownership/assignment.
Patent Activity
PatentDate
Methods for high growth rate deposition for forming different cells on a wafer
Grant 11,393,683 - Washington , et al. July 19, 2
2022-07-19
Optoelectronic devices manufactured using different growth substrates
Grant 11,075,313 - Jain , et al. July 27, 2
2021-07-27
Methods of manufacturing optoelectronic devices using different growth substrates
Grant 10,873,001 - Jain , et al. December 22, 2
2020-12-22
Growth structure under a release layer for manufacturing of optoelectronic devices
Grant 10,811,557 - Ritenour , et al. October 20, 2
2020-10-20
Methods for chemical vapor deposition (CVD) in a movable liner assembly
Grant 10,718,051 - Higashi , et al.
2020-07-21
Optoelectronic Devices Manufactured Using Different Growth Substrates
App 20200119216 - JAIN; Nikhil ;   et al.
2020-04-16
Methods Of Manufacturing Optoelectronic Devices Using Different Growth Substrates
App 20200119222 - JAIN; Nikhil ;   et al.
2020-04-16
Growth Structure Under A Release Layer For Manufacturing Of Optoelectronic Devices
App 20180366609 - RITENOUR; Andrew J. ;   et al.
2018-12-20
Movable Liner Assembly For A Deposition Zone In A Cvd Reactor
App 20180251897 - HIGASHI; Gregg ;   et al.
2018-09-06
Tiled showerhead for a semiconductor chemical vapor deposition reactor
Grant 10,066,297 - Higashi , et al. September 4, 2
2018-09-04
Movable liner assembly for a deposition zone in a CVD reactor
Grant 9,982,346 - Higashi , et al. May 29, 2
2018-05-29
Method of decontamination of process chamber after in-situ chamber clean
Grant 9,932,670 - Su , et al. April 3, 2
2018-04-03
High Growth Rate Deposition For Group Iii/v Materials
App 20180019117 - WASHINGTON; Lori D. ;   et al.
2018-01-18
Method of high growth rate deposition for group III/V materials
Grant 9,834,860 - Washington , et al. December 5, 2
2017-12-05
Multi-gas straight channel showerhead
Grant 9,644,267 - Burrows , et al. May 9, 2
2017-05-09
Tiled Showerhead For A Semiconductor Chemical Vapor Deposition Reactor
App 20160047042 - Higashi; Gregg ;   et al.
2016-02-18
CVD reactor with gas flow virtual walls
Grant 9,212,422 - Higashi , et al. December 15, 2
2015-12-15
Tiled showerhead for a semiconductor chemical vapor deposition reactor
Grant 9,175,393 - Higashi , et al. November 3, 2
2015-11-03
Method Of Decontamination Of Process Chamber After In-situ Chamber Clean
App 20140116470 - SU; Jie ;   et al.
2014-05-01
Multi-gas Straight Channel Showerhead
App 20140014745 - BURROWS; Brian H. ;   et al.
2014-01-16
Multi-gas straight channel showerhead
Grant 8,481,118 - Burrows , et al. July 9, 2
2013-07-09
Cvd Reactor With Gas Flow Virtual Walls
App 20130052346 - Higashi; Gregg ;   et al.
2013-02-28
Movable Liner Assembly For A Deposition Zone In A Cvd Reactor
App 20130052371 - Higashi; Gregg ;   et al.
2013-02-28
Multi-gas Straight Channel Showerhead
App 20120024388 - Burrows; Brian H. ;   et al.
2012-02-02
Closed Loop Mocvd Deposition Control
App 20110308453 - Su; Jie ;   et al.
2011-12-22
Multi-gas straight channel showerhead
Grant 7,976,631 - Burrows , et al. July 12, 2
2011-07-12
Methods for forming a transistor
Grant 7,968,413 - Nouri , et al. June 28, 2
2011-06-28
Cvd Apparatus
App 20110121503 - BURROWS; BRIAN H. ;   et al.
2011-05-26
Method Of Decontamination Of Process Chamber After In-situ Chamber Clean
App 20110117728 - Su; Jie ;   et al.
2011-05-19
High Growth Rate Deposition For Group Iii/v Materials
App 20110083601 - WASHINGTON; Lori D. ;   et al.
2011-04-14
Methods for forming a transistor
Grant 7,833,869 - Nouri , et al. November 16, 2
2010-11-16
Decontamination Of Mocvd Chamber Using Nh3 Purge After In-situ Cleaning
App 20100273291 - Kryliouk; Olga ;   et al.
2010-10-28
Method for measuring precursor amounts in bubbler sources
Grant 7,781,016 - Stevens , et al. August 24, 2
2010-08-24
Pre-cleaning of substrates in epitaxy chambers
Grant 7,651,948 - Kim , et al. January 26, 2
2010-01-26
Parasitic particle suppression in growth of III-V nitride films using MOCVD and HVPE
Grant 7,585,769 - Bour , et al. September 8, 2
2009-09-08
Cvd Apparatus
App 20090194024 - Burrows; Brian H. ;   et al.
2009-08-06
Processing System For Fabricating Compound Nitride Semiconductor Devices
App 20090194026 - BURROWS; BRIAN H. ;   et al.
2009-08-06
Method For Depositing Group Iii/v Compounds
App 20090149008 - Kryliouk; Olga ;   et al.
2009-06-11
Showerhead Design With Precursor Source
App 20090136652 - Washington; Lori D. ;   et al.
2009-05-28
Multi-gas Straight Channel Showerhead
App 20090098276 - BURROWS; Brian H. ;   et al.
2009-04-16
Methods For Forming A Transistor
App 20080299735 - NOURI; FARAN ;   et al.
2008-12-04
Methods And Apparatus For Depositing A Group Iii-v Film Using A Hydride Vapor Phase Epitaxy Process
App 20080289575 - Burrows; Brian H. ;   et al.
2008-11-27
Cross Flow Apparatus And Method For Hydride Vapor Phase Deposition
App 20080276860 - BURROWS; BRIAN H. ;   et al.
2008-11-13
Methods For Forming A Transistor
App 20080280413 - Nouri; Faran ;   et al.
2008-11-13
Pre-cleaning of substrates in epitaxy chambers
App 20080245767 - Kim; Yihwan ;   et al.
2008-10-09
Methods for forming a transistor
Grant 7,413,957 - Nouri , et al. August 19, 2
2008-08-19
Stress Measurement And Stress Balance In Films
App 20080124817 - Bour; David ;   et al.
2008-05-29
Stress measurement and stress balance in films
Grant 7,374,960 - Bour , et al. May 20, 2
2008-05-20
Substrate Support Structure With Rapid Temperature Change
App 20080092819 - Bour; David ;   et al.
2008-04-24
Hotwall reactor and method for reducing particle formation in GaN MOCVD
App 20080050889 - Bour; David ;   et al.
2008-02-28
Method for measuring precursor amounts in bubbler sources
App 20080050510 - Stevens; Ronald ;   et al.
2008-02-28
Parasitic particle suppression in growth of III-V nitride films using MOCVD and HVPE
App 20070259502 - Bour; David ;   et al.
2007-11-08
Methods for forming a transistor
App 20050287752 - Nouri, Faran ;   et al.
2005-12-29
Method for CVD process control for enhancing device performance
Grant 6,911,401 - Khandan , et al. June 28, 2
2005-06-28
Method for CVD process control for enhancing device performance
App 20040133361 - Khandan, Shahab ;   et al.
2004-07-08
Backside heating chamber for emissivity independent thermal processes
Grant 6,455,814 - Samoilov , et al. September 24, 2
2002-09-24
Method for CVD process control for enhancing device performance
App 20020039803 - Khandan, Shahab ;   et al.
2002-04-04
Method for CVD process control for enhancing device performance
Grant 6,342,453 - Khandan , et al. January 29, 2
2002-01-29

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