loadpatents
Patent applications and USPTO patent grants for Washington; Lori D..The latest application filed is for "methods of manufacturing optoelectronic devices using different growth substrates".
Patent | Date |
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Methods for high growth rate deposition for forming different cells on a wafer Grant 11,393,683 - Washington , et al. July 19, 2 | 2022-07-19 |
Optoelectronic devices manufactured using different growth substrates Grant 11,075,313 - Jain , et al. July 27, 2 | 2021-07-27 |
Methods of manufacturing optoelectronic devices using different growth substrates Grant 10,873,001 - Jain , et al. December 22, 2 | 2020-12-22 |
Growth structure under a release layer for manufacturing of optoelectronic devices Grant 10,811,557 - Ritenour , et al. October 20, 2 | 2020-10-20 |
Methods for chemical vapor deposition (CVD) in a movable liner assembly Grant 10,718,051 - Higashi , et al. | 2020-07-21 |
Optoelectronic Devices Manufactured Using Different Growth Substrates App 20200119216 - JAIN; Nikhil ;   et al. | 2020-04-16 |
Methods Of Manufacturing Optoelectronic Devices Using Different Growth Substrates App 20200119222 - JAIN; Nikhil ;   et al. | 2020-04-16 |
Growth Structure Under A Release Layer For Manufacturing Of Optoelectronic Devices App 20180366609 - RITENOUR; Andrew J. ;   et al. | 2018-12-20 |
Movable Liner Assembly For A Deposition Zone In A Cvd Reactor App 20180251897 - HIGASHI; Gregg ;   et al. | 2018-09-06 |
Tiled showerhead for a semiconductor chemical vapor deposition reactor Grant 10,066,297 - Higashi , et al. September 4, 2 | 2018-09-04 |
Movable liner assembly for a deposition zone in a CVD reactor Grant 9,982,346 - Higashi , et al. May 29, 2 | 2018-05-29 |
Method of decontamination of process chamber after in-situ chamber clean Grant 9,932,670 - Su , et al. April 3, 2 | 2018-04-03 |
High Growth Rate Deposition For Group Iii/v Materials App 20180019117 - WASHINGTON; Lori D. ;   et al. | 2018-01-18 |
Method of high growth rate deposition for group III/V materials Grant 9,834,860 - Washington , et al. December 5, 2 | 2017-12-05 |
Multi-gas straight channel showerhead Grant 9,644,267 - Burrows , et al. May 9, 2 | 2017-05-09 |
Tiled Showerhead For A Semiconductor Chemical Vapor Deposition Reactor App 20160047042 - Higashi; Gregg ;   et al. | 2016-02-18 |
CVD reactor with gas flow virtual walls Grant 9,212,422 - Higashi , et al. December 15, 2 | 2015-12-15 |
Tiled showerhead for a semiconductor chemical vapor deposition reactor Grant 9,175,393 - Higashi , et al. November 3, 2 | 2015-11-03 |
Method Of Decontamination Of Process Chamber After In-situ Chamber Clean App 20140116470 - SU; Jie ;   et al. | 2014-05-01 |
Multi-gas Straight Channel Showerhead App 20140014745 - BURROWS; Brian H. ;   et al. | 2014-01-16 |
Multi-gas straight channel showerhead Grant 8,481,118 - Burrows , et al. July 9, 2 | 2013-07-09 |
Cvd Reactor With Gas Flow Virtual Walls App 20130052346 - Higashi; Gregg ;   et al. | 2013-02-28 |
Movable Liner Assembly For A Deposition Zone In A Cvd Reactor App 20130052371 - Higashi; Gregg ;   et al. | 2013-02-28 |
Multi-gas Straight Channel Showerhead App 20120024388 - Burrows; Brian H. ;   et al. | 2012-02-02 |
Closed Loop Mocvd Deposition Control App 20110308453 - Su; Jie ;   et al. | 2011-12-22 |
Multi-gas straight channel showerhead Grant 7,976,631 - Burrows , et al. July 12, 2 | 2011-07-12 |
Methods for forming a transistor Grant 7,968,413 - Nouri , et al. June 28, 2 | 2011-06-28 |
Cvd Apparatus App 20110121503 - BURROWS; BRIAN H. ;   et al. | 2011-05-26 |
Method Of Decontamination Of Process Chamber After In-situ Chamber Clean App 20110117728 - Su; Jie ;   et al. | 2011-05-19 |
High Growth Rate Deposition For Group Iii/v Materials App 20110083601 - WASHINGTON; Lori D. ;   et al. | 2011-04-14 |
Methods for forming a transistor Grant 7,833,869 - Nouri , et al. November 16, 2 | 2010-11-16 |
Decontamination Of Mocvd Chamber Using Nh3 Purge After In-situ Cleaning App 20100273291 - Kryliouk; Olga ;   et al. | 2010-10-28 |
Method for measuring precursor amounts in bubbler sources Grant 7,781,016 - Stevens , et al. August 24, 2 | 2010-08-24 |
Pre-cleaning of substrates in epitaxy chambers Grant 7,651,948 - Kim , et al. January 26, 2 | 2010-01-26 |
Parasitic particle suppression in growth of III-V nitride films using MOCVD and HVPE Grant 7,585,769 - Bour , et al. September 8, 2 | 2009-09-08 |
Cvd Apparatus App 20090194024 - Burrows; Brian H. ;   et al. | 2009-08-06 |
Processing System For Fabricating Compound Nitride Semiconductor Devices App 20090194026 - BURROWS; BRIAN H. ;   et al. | 2009-08-06 |
Method For Depositing Group Iii/v Compounds App 20090149008 - Kryliouk; Olga ;   et al. | 2009-06-11 |
Showerhead Design With Precursor Source App 20090136652 - Washington; Lori D. ;   et al. | 2009-05-28 |
Multi-gas Straight Channel Showerhead App 20090098276 - BURROWS; Brian H. ;   et al. | 2009-04-16 |
Methods For Forming A Transistor App 20080299735 - NOURI; FARAN ;   et al. | 2008-12-04 |
Methods And Apparatus For Depositing A Group Iii-v Film Using A Hydride Vapor Phase Epitaxy Process App 20080289575 - Burrows; Brian H. ;   et al. | 2008-11-27 |
Cross Flow Apparatus And Method For Hydride Vapor Phase Deposition App 20080276860 - BURROWS; BRIAN H. ;   et al. | 2008-11-13 |
Methods For Forming A Transistor App 20080280413 - Nouri; Faran ;   et al. | 2008-11-13 |
Pre-cleaning of substrates in epitaxy chambers App 20080245767 - Kim; Yihwan ;   et al. | 2008-10-09 |
Methods for forming a transistor Grant 7,413,957 - Nouri , et al. August 19, 2 | 2008-08-19 |
Stress Measurement And Stress Balance In Films App 20080124817 - Bour; David ;   et al. | 2008-05-29 |
Stress measurement and stress balance in films Grant 7,374,960 - Bour , et al. May 20, 2 | 2008-05-20 |
Substrate Support Structure With Rapid Temperature Change App 20080092819 - Bour; David ;   et al. | 2008-04-24 |
Hotwall reactor and method for reducing particle formation in GaN MOCVD App 20080050889 - Bour; David ;   et al. | 2008-02-28 |
Method for measuring precursor amounts in bubbler sources App 20080050510 - Stevens; Ronald ;   et al. | 2008-02-28 |
Parasitic particle suppression in growth of III-V nitride films using MOCVD and HVPE App 20070259502 - Bour; David ;   et al. | 2007-11-08 |
Methods for forming a transistor App 20050287752 - Nouri, Faran ;   et al. | 2005-12-29 |
Method for CVD process control for enhancing device performance Grant 6,911,401 - Khandan , et al. June 28, 2 | 2005-06-28 |
Method for CVD process control for enhancing device performance App 20040133361 - Khandan, Shahab ;   et al. | 2004-07-08 |
Backside heating chamber for emissivity independent thermal processes Grant 6,455,814 - Samoilov , et al. September 24, 2 | 2002-09-24 |
Method for CVD process control for enhancing device performance App 20020039803 - Khandan, Shahab ;   et al. | 2002-04-04 |
Method for CVD process control for enhancing device performance Grant 6,342,453 - Khandan , et al. January 29, 2 | 2002-01-29 |
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