loadpatents
name:-0.065006017684937
name:-0.032593011856079
name:-0.0029609203338623
Wang; Ming-Fang Patent Filings

Wang; Ming-Fang

Patent Applications and Registrations

Patent applications and USPTO patent grants for Wang; Ming-Fang.The latest application filed is for "auxiliary fastening device for securing an ornamental cover to a wheel disk".

Company Profile
2.27.28
  • Wang; Ming-Fang - Tainan City TW
  • Wang; Ming-Fang - Tainan TW
  • Wang; Ming-Fang - Taichung N/A TW
  • Wang; Ming-Fang - Guanmiao Township TW
  • Wang; Ming-Fang - Tainan Hsien TW
  • Wang; Ming-Fang - Shengang Township Taichung County TW
*profile and listings may contain filings by different individuals or companies with the same name. Review application materials to confirm ownership/assignment.
Patent Activity
PatentDate
Auxiliary Fastening Device for Securing an Ornamental Cover to a Wheel Disk
App 20190030948 - Wang; Ming-Fang
2019-01-31
Wheel disk structure
Grant 10,005,316 - Wang June 26, 2
2018-06-26
Wheel Disk Structure
App 20180099524 - Wang; Ming-Fang
2018-04-12
Process to make high-K transistor dielectrics
Grant 8,785,272 - Yao , et al. July 22, 2
2014-07-22
Wheel Cover and Method for Making and Packaging It
App 20130234498 - Wang; Ming-Fang
2013-09-12
Dual gate dielectric scheme: SiON for high performance devices and high K for low power devices
Grant RE43,673 - Hou , et al. September 18, 2
2012-09-18
Process To Make High-k Transistor Dielectrics
App 20110318915 - Yao; Liang-Gi ;   et al.
2011-12-29
Process to make high-K transistor dielectrics
Grant 8,012,824 - Yao , et al. September 6, 2
2011-09-06
Process for integration of a high dielectric constant gate insulator layer in a CMOS device
Grant 7,393,766 - Wang , et al. July 1, 2
2008-07-01
Bead ornament structure
App 20080083248 - Wang; Ming-Fang ;   et al.
2008-04-10
Noble high-k device
Grant 7,351,994 - Yao , et al. April 1, 2
2008-04-01
Structure of wheel rim cover
Grant 7,314,255 - Wang January 1, 2
2008-01-01
High-K gate dielectric stack plasma treatment to adjust threshold voltage characteristics
Grant 7,303,996 - Wang , et al. December 4, 2
2007-12-04
Dual-gate structure and method of fabricating integrated circuits having dual-gate structures
Grant 7,271,450 - Ho , et al. September 18, 2
2007-09-18
Structure of wheel rim cover
App 20070096545 - Wang; Ming-Fang
2007-05-03
Process to make high-K transistor dielectrics
App 20060246698 - Yao; Liang-Gi ;   et al.
2006-11-02
Process to make high-k transistor dielectrics
Grant 7,087,480 - Yao , et al. August 8, 2
2006-08-08
Method and structure for forming high-k gates
Grant 7,071,066 - Wang , et al. July 4, 2
2006-07-04
Dual-gate structure and method of fabricating integrated circuits having dual-gate structures
App 20060091469 - Ho; Tuo-Hung ;   et al.
2006-05-04
System and method for integration of HfO.sub.2 and RTCVD poly-silicon
Grant 7,037,816 - Lin , et al. May 2, 2
2006-05-02
Dual-gate structure and method of fabricating integrated circuits having dual-gate structures
Grant 7,030,024 - Ho , et al. April 18, 2
2006-04-18
Structure of wheel rim cover
App 20060066145 - Wang; Ming-Fang
2006-03-30
Method of making an ultrathin silicon dioxide gate with improved dielectric properties using NH.sub.3 nitridation and post-deposition rapid thermal annealing
Grant 7,018,879 - Wang , et al. March 28, 2
2006-03-28
Process for integration of a high dielectric constant gate insulator layer in a CMOS device
App 20050196927 - Wang, Ming-Fang ;   et al.
2005-09-08
Extensional hubcap docking structure
Grant 6,932,434 - Wang August 23, 2
2005-08-23
Extensional hubcap docking structure
App 20050173969 - Wang, Ming-Fang
2005-08-11
Rotating hubcap
App 20050168051 - Wang, Ming-Fang
2005-08-04
System and method for integration of HfO2 and RTCVD poly-silicon
App 20050164445 - Lin, Yu Min ;   et al.
2005-07-28
Noble high-k device
App 20050156255 - Yao, Liang-Gi ;   et al.
2005-07-21
Process for integration of a high dielectric constant gate insulator layer in a CMOS device
Grant 6,914,313 - Wang , et al. July 5, 2
2005-07-05
Dual gate dielectric scheme: SiON for high performance devices and high k for low power devices
Grant 6,890,811 - Hou , et al. May 10, 2
2005-05-10
High-K gate dielectric stack plasma treatment to adjust threshold voltage characteristics
App 20050074978 - Wang, Ming-Fang ;   et al.
2005-04-07
Method and structure for forming high-k gates
App 20050056900 - Wang, Ming-Fang ;   et al.
2005-03-17
Loose-leaf structure
Grant 6,834,416 - Wang , et al. December 28, 2
2004-12-28
Extensional hubcap docking structure
App 20040251733 - Wang, Ming-Fang
2004-12-16
Methods for improving within-wafer uniformity of gate oxide
Grant 6,780,788 - Chen , et al. August 24, 2
2004-08-24
Wheel cover fixture for different sized wheels
App 20040145236 - Wang, Ming-Fang
2004-07-29
Wheel cover for making a tire look thinner
App 20040145235 - Wang, Ming Fang
2004-07-29
Loose-leaf structure
App 20040143933 - Wang, Ming-Fang ;   et al.
2004-07-29
Automobile footrest latch structure and its latch member thereof
App 20040145146 - Wang, Ming Fang
2004-07-29
Wheel cover and its accessory ring assembly
App 20040145233 - Wang, Ming Fang
2004-07-29
Chemical vapor deposition (CVD) method employing wetting pre-treatment
Grant 6,764,927 - Yao , et al. July 20, 2
2004-07-20
Process for integration of a high dielectric constant gate insulator layer in a CMOS device
App 20040087075 - Wang, Ming-Fang ;   et al.
2004-05-06
Novel dual gate dielectric scheme: SiON for high performance devices and high k for low power devices
App 20040082125 - Hou, Tou-Hung ;   et al.
2004-04-29
Rope tie
Grant 6,712,569 - Wang , et al. March 30, 2
2004-03-30
Methods for improving within-wafer uniformity of gate oxide
App 20040058497 - Chen, Chi-Chun ;   et al.
2004-03-25
Dual gate dielectric scheme: SiON for high performance devices and high k for low power devices
Grant 6,706,581 - Hou , et al. March 16, 2
2004-03-16
Rotating wing structure of steel wheel
Grant 6,702,395 - Wang March 9, 2
2004-03-09
Wheel cover having rotating wing plate
Grant 6,702,396 - Wang March 9, 2
2004-03-09
Dual-gate structure and method of fabricating integrated circuits having dual-gate structures
App 20040038538 - Ho, Tuo-Hung ;   et al.
2004-02-26
Process for integration of a high dielectric constant gate insulator layer in a CMOS device
Grant 6,656,764 - Wang , et al. December 2, 2
2003-12-02
Method of making an ultrathin silicon dioxide gate with improved dielectric properties using NH3 nitridation and post-deposition rapid thermal annealing
App 20030181012 - Wang, Ming-Fang ;   et al.
2003-09-25
Methods to create high-k dielectric gate electrodes with backside cleaning
Grant 6,455,330 - Yao , et al. September 24, 2
2002-09-24

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