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name:-0.021238088607788
name:-0.010830163955688
name:-0.012740135192871
Wang; Meng-Jun Patent Filings

Wang; Meng-Jun

Patent Applications and Registrations

Patent applications and USPTO patent grants for Wang; Meng-Jun.The latest application filed is for "semiconductor device and method for fabricating the same".

Company Profile
9.10.13
  • Wang; Meng-Jun - Taichung TW
  • Wang; Meng-Jun - Taichung City TW
  • Wang; Meng Jun - Qingshui Township TW
  • Wang; Meng Jun - Qingshui Township, Taichung County N/A TW
  • Wang; Meng-Jun - Taichung County TW
  • Wang; Meng-Jun - Cingshuei Township TW
*profile and listings may contain filings by different individuals or companies with the same name. Review application materials to confirm ownership/assignment.
Patent Activity
PatentDate
Semiconductor device and method for fabricating the same
Grant 11,283,007 - Kuo , et al. March 22, 2
2022-03-22
Semiconductor Device And Method For Fabricating The Same
App 20210028352 - Kuo; Chih-Wei ;   et al.
2021-01-28
Semiconductor Device And Method For Fabricating The Same
App 20200373479 - Kuo; Chih-Wei ;   et al.
2020-11-26
Semiconductor device and method for fabricating the same
Grant 10,847,709 - Kuo , et al. November 24, 2
2020-11-24
Magnetoresistive random access memory cell
Grant 10,727,397 - Wang , et al.
2020-07-28
Magnetoresistive Random Access Memory Cell
App 20200227625 - Wang; Hui-Lin ;   et al.
2020-07-16
Memory device including alignment mark trench
Grant 10,636,744 - Wang , et al.
2020-04-28
Memory Device
App 20200051922 - Wang; Meng-Jun ;   et al.
2020-02-13
Metal interconnect structure and method for fabricating the same
Grant 10,438,893 - Chen , et al. O
2019-10-08
Metal Interconnect Structure And Method For Fabricating The Same
App 20190096819 - Chen; Shih-Hsien ;   et al.
2019-03-28
End-cut first approach for critical dimension control
Grant 9,196,491 - Lin , et al. November 24, 2
2015-11-24
End-Cut First Approach For Critical Dimension Control
App 20140106479 - Lin; Li-Te S. ;   et al.
2014-04-17
End-cut first approach for critical dimension control
Grant 8,563,410 - Lin , et al. October 22, 2
2013-10-22
Patterning method using stacked structure
Grant 8,071,487 - Wang , et al. December 6, 2
2011-12-06
Stacked Structure
App 20110254142 - Wang; Meng-Jun ;   et al.
2011-10-20
End-cut First Approach For Critical Dimension Control
App 20110124134 - Lin; Li-Te S. ;   et al.
2011-05-26
Method of trimming a hard mask layer, method for fabricating a gate in a MOS transistor, and a stack for fabricating a gate in a MOS transistor
Grant 7,592,265 - Wang , et al. September 22, 2
2009-09-22
Method Of Trimming A Hard Mask Layer, Method For Fabricating A Gate In A Mos Transistor, And A Stack For Fabricating A Gate In A Mos Transistor
App 20090206403 - Wang; Meng-Jun ;   et al.
2009-08-20
Method Of Trimming A Hard Mask Layer, Method For Fabricating A Gate In A Mos Transistor, And A Stack For Fabricating A Gate In A Mos Transistor
App 20080164526 - Wang; Meng-Jun ;   et al.
2008-07-10
Patterning Method
App 20080102643 - Chen; Yi-Hsing ;   et al.
2008-05-01
Stacked Structure And Patterning Method Using The Same
App 20080045033 - Wang; Meng-Jun ;   et al.
2008-02-21
Dual damascene process
App 20070249165 - Huang; Chun-Jen ;   et al.
2007-10-25

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