Wang; Kuang-Chih

Patent Applications and Registrations

Patent applications and USPTO patent grants for Wang; Kuang-Chih.The latest application filed is for "air gap for tungsten/aluminum plug applications".

Company Profile

0.8.10

Wang; Kuang-Chih - Taichung TW
Wang; Kuang-Chih - Hsinchu Hsien TW
Wang; Kuang-Chih - Taichung Hsien TW

*profile and listings may contain filings by different individuals or companies with the same name. Review application materials to confirm ownership/assignment.

Patent Activity

Patent	Date
Air gap for dual damascene applications Grant 7,449,407 - Lur , et al. November 11, 2	2008-11-11
Air gap formation method for reducing undesired capacitive coupling between interconnects in an integrated circuit device Grant 7,253,095 - Lur , et al. August 7, 2	2007-08-07
Air Gap For Tungsten/aluminum Plug Applications App 20070076339 - Lur; Water ; et al.	2007-04-05
Air gap for tungsten/aluminum plug applications Grant 7,138,329 - Lur , et al. November 21, 2	2006-11-21
Mobile Phone With Monitoring Functions, Monitoring System And Monitoring Method Thereof App 20060240867 - Wang; Kuang-Chih ; et al.	2006-10-26
Wafer processing apparatus & methods for depositing cobalt silicide App 20060014388 - Lur; Water ; et al.	2006-01-19
Air gap formation method for reducing undesired capacitive coupling between interconnects in an integrated circuit device App 20050263896 - Lur, Water ; et al.	2005-12-01
Wafer processing apparatus and methods for depositing cobalt silicide Grant 6,943,110 - Lur , et al. September 13, 2	2005-09-13
Semiconductor device with cobalt silicide contacts App 20050179139 - Lur, Water ; et al.	2005-08-18
Semiconductor device with cobalt silicide contacts App 20050176248 - Lur, Water ; et al.	2005-08-11
Air gap structure and formation method for reducing undesired capacitive coupling between interconnects in an integrated circuit device Grant 6,917,109 - Lur , et al. July 12, 2	2005-07-12
Semiconductor device with cobalt silicide contacts and method of making the same Grant 6,878,627 - Lur , et al. April 12, 2	2005-04-12
Method and system for making cobalt silicide Grant 6,743,721 - Lur , et al. June 1, 2	2004-06-01
Air gap for dual damascene applications App 20040094821 - Lur, Water ; et al.	2004-05-20
Air gap for tungsten/aluminum plug applications App 20040097065 - Lur, Water ; et al.	2004-05-20
Air gap structure and formation method for reducing undesired capacitive coupling between interconnects in an integrated circuit device App 20040097013 - Lur, Water ; et al.	2004-05-20
Method and system for making cobalt silicide App 20030228745 - Lur, Water ; et al.	2003-12-11
Al-based contact formation process using Ti glue layer to prevent nodule-induced bridging Grant 5,604,155 - Wang February 18, 1	1997-02-18

uspto.report is an independent third-party trademark research tool that is not affiliated, endorsed, or sponsored by the United States Patent and Trademark Office (USPTO) or any other governmental organization. The information provided by uspto.report is based on publicly available data at the time of writing and is intended for informational purposes only.

While we strive to provide accurate and up-to-date information, we do not guarantee the accuracy, completeness, reliability, or suitability of the information displayed on this site. The use of this site is at your own risk. Any reliance you place on such information is therefore strictly at your own risk.

All official trademark data, including owner information, should be verified by visiting the official USPTO website at www.uspto.gov. This site is not intended to replace professional legal advice and should not be used as a substitute for consulting with a legal professional who is knowledgeable about trademark law.