URAKAWA; Masafumi
Patent Applications and Registrations
Patent applications and USPTO patent grants for URAKAWA; Masafumi.The latest application filed is for "recipe updating method".
- URAKAWA; Masafumi - Miyagi JP
- Urakawa; Masafumi - Kurokawa-gun JP
- Urakawa; Masafumi - Salem MA
- Urakawa; Masafumi - Nirasaki JP
- Urakawa; Masafumi - Nirasaki-shi JP
| Patent | Date |
|---|---|
| Recipe Updating Method App 20220137603 - URAKAWA; Masafumi | 2022-05-05 |
| Member and plasma processing apparatus Grant 11,037,763 - Sugawara , et al. June 15, 2 | 2021-06-15 |
| Plasma processing method and plasma processing apparatus Grant 10,707,053 - Urakawa , et al. | 2020-07-07 |
| Member And Plasma Processing Apparatus App 20180350567 - SUGAWARA; Yuki ; et al. | 2018-12-06 |
| Plasma Processing Method And Plasma Processing Apparatus App 20180096822 - Urakawa; Masafumi ; et al. | 2018-04-05 |
| Plasma processing method and plasma processing apparatus Grant 9,870,898 - Urakawa , et al. January 16, 2 | 2018-01-16 |
| Etching method and etching apparatus Grant 9,865,471 - Shimoda , et al. January 9, 2 | 2018-01-09 |
| Plasma processing method and plasma processing apparatus Grant 9,653,316 - Urakawa May 16, 2 | 2017-05-16 |
| Method of processing substrate and substrate processing apparatus Grant 9,530,657 - Urakawa , et al. December 27, 2 | 2016-12-27 |
| Etching Method And Etching Apparatus App 20160322230 - SHIMODA; Gaku ; et al. | 2016-11-03 |
| Plasma Processing Method And Plasma Processing Apparatus App 20160247666 - URAKAWA; Masafumi ; et al. | 2016-08-25 |
| Method of etching silicon oxide film Grant 9,257,301 - Ogasawara , et al. February 9, 2 | 2016-02-09 |
| Etching method and plasma processing apparatus Grant 9,224,616 - Urakawa December 29, 2 | 2015-12-29 |
| Etching Method And Plasma Processing Apparatus App 20150140828 - Urakawa; Masafumi | 2015-05-21 |
| Method Of Processing Substrate And Substrate Processing Apparatus App 20150132967 - URAKAWA; Masafumi ; et al. | 2015-05-14 |
| Method Of Etching Silicon Oxide Film App 20150056808 - OGASAWARA; Masahiro ; et al. | 2015-02-26 |
| Plasma Processing Method And Plasma Processing Apparatus App 20140235062 - URAKAWA; Masafumi | 2014-08-21 |
| Method and system for dry etching a hafnium containing material Grant 8,183,161 - Fernandez , et al. May 22, 2 | 2012-05-22 |
| Processing device, electrode, electrode plate, and processing method Grant 8,038,835 - Hayashi , et al. October 18, 2 | 2011-10-18 |
| Method and system for reducing line edge roughness during pattern etching Grant 7,846,645 - Urakawa December 7, 2 | 2010-12-07 |
| Processing Device, Electrode, Electrode Plate, And Processing Method App 20100230386 - HAYASHI; Kazuichi ; et al. | 2010-09-16 |
| Reduced contaminant gas injection system and method of using Grant 7,743,731 - Enomoto , et al. June 29, 2 | 2010-06-29 |
| Silicon carbide focus ring for plasma etching system App 20090151870 - URAKAWA; Masafumi ; et al. | 2009-06-18 |
| Method and system for reducing line edge roughness during pattern etching App 20090155731 - URAKAWA; Masafumi | 2009-06-18 |
| Method and system for dry etching a hafnium containing material App 20080064220 - Fernandez; Luis Isidro ; et al. | 2008-03-13 |
| Reduced contaminant gas injection system and method of using App 20070235136 - Enomoto; Takashi ; et al. | 2007-10-11 |
| Processing device, electrode, electrode plate, and processing method App 20050092435 - Hayashi, Kazuichi ; et al. | 2005-05-05 |
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