Umezawa; Yoshihiro

Patent Applications and Registrations

Patent applications and USPTO patent grants for Umezawa; Yoshihiro.The latest application filed is for "plasma processing apparatus".

Company Profile

9.11.13

Umezawa; Yoshihiro - Miyagi JP
UMEZAWA; Yoshihiro - Kurokawa-gun JP
Umezawa; Yoshihiro - Ishikawa JP
Umezawa; Yoshihiro - Nomi-gun JP
Umezawa; Yoshihiro - Tokyo JP

*profile and listings may contain filings by different individuals or companies with the same name. Review application materials to confirm ownership/assignment.

Patent Activity

Patent	Date
Plasma processing apparatus Grant 11,348,768 - Hosaka , et al. May 31, 2	2022-05-31
Plasma Processing Apparatus App 20220005672 - SAITO; Takehisa ; et al.	2022-01-06
Plasma Processing Apparatus App 20210375597 - HOSAKA; Yuki ; et al.	2021-12-02
Plasma Processing Apparatus App 20210320009 - HOSAKA; Yuki ; et al.	2021-10-14
Plasma processing apparatus Grant 11,101,114 - Hosaka , et al. August 24, 2	2021-08-24
Gas supply mechanism and semiconductor manufacturing system Grant 10,950,467 - Hosaka , et al. March 16, 2	2021-03-16
Plasma Processing Apparatus, Plasma State Detection Method, And Plasma State Detection Program App 20210020418 - HAYASHI; Daisuke ; et al.	2021-01-21
Plasma Processing Apparatus App 20200266034 - HOSAKA; Yuki ; et al.	2020-08-20
Method of etching object to be processed Grant 10,685,816 - Umezawa , et al.	2020-06-16
Gas supply mechanism and semiconductor manufacturing system Grant 10,636,683 - Hosaka , et al.	2020-04-28
Gas supply mechanism and semiconductor manufacturing apparatus Grant 10,510,514 - Hosaka , et al. Dec	2019-12-17
Plasma Processing Apparatus App 20190131136 - HOSAKA; Yuki ; et al.	2019-05-02
Ion beam irradiation apparatus and substrate processing apparatus Grant 10,204,766 - Umezawa , et al. Feb	2019-02-12
Temperature control device for processing target object and method of selectively etching nitride film from multilayer film Grant 10,192,774 - Hosaka , et al. Ja	2019-01-29
Method Of Etching Object To Be Processed App 20180337025 - UMEZAWA; Yoshihiro ; et al.	2018-11-22
Ion Beam Irradiation Apparatus And Substrate Processing Apparatus App 20180108516 - UMEZAWA; Yoshihiro ; et al.	2018-04-19
Gas Supply Mechanism And Semiconductor Manufacturing System App 20170301568 - HOSAKA; Yuki ; et al.	2017-10-19
Gas Supply Mechanism And Semiconductor Manufacturing Appratus App 20170301518 - HOSAKA; Yuki ; et al.	2017-10-19
Temperature Control Device For Processing Target Object And Method Of Selectively Etching Nitride Film From Multilayer Film App 20170301579 - Hosaka; Yuki ; et al.	2017-10-19
Plasma Processing Apparatus App 20170092513 - HOSAKA; Yuki ; et al.	2017-03-30
Plasma Processing Apparatus App 20160260582 - HOSAKA; Yuki ; et al.	2016-09-08
Moisture-permeable, waterproof fabric and its production process Grant 5,753,568 - Shimano , et al. May 19, 1	1998-05-19
Moisture permeable, waterproof fabric and its production process Grant 5,626,950 - Shimano , et al. May 6, 1	1997-05-06
Electrical connectors for leadless circuit boards Grant 4,857,001 - Nakano , et al. August 15, 1	1989-08-15

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