loadpatents
name:-0.010402202606201
name:-0.0093629360198975
name:-0.00058794021606445
Tsay; Cherng-Shyan Patent Filings

Tsay; Cherng-Shyan

Patent Applications and Registrations

Patent applications and USPTO patent grants for Tsay; Cherng-Shyan.The latest application filed is for "method and apparatus for integrated circuit mask patterning".

Company Profile
1.12.12
  • Tsay; Cherng-Shyan - Toufen Township TW
  • Tsay; Cherng-Shyan - Miaoli N/A TW
  • Tsay; Cherng-Shyan - Toufen Township, Miaoli County N/A TW
  • Tsay; Cherng-Shyan - Toufen Town TW
  • Tsay; Cherng-Shyan - Hsinchu TW
  • Tsay; Cherng-Shyan - Hsinchu City TW
*profile and listings may contain filings by different individuals or companies with the same name. Review application materials to confirm ownership/assignment.
Patent Activity
PatentDate
Method and Apparatus for Integrated Circuit Mask Patterning
App 20210240907 - Huang; Chin-Min ;   et al.
2021-08-05
Method and apparatus for integrated circuit mask patterning
Grant 10,990,744 - Huang , et al. April 27, 2
2021-04-27
Method and Apparatus for Integrated Circuit Mask Patterning
App 20180137233 - Huang; Chin-Min ;   et al.
2018-05-17
Method and apparatus for integrated circuit mask patterning
Grant 9,870,443 - Huang , et al. January 16, 2
2018-01-16
Method and Apparatus for Integrated Circuit Mask Patterning
App 20160085906 - Huang; Chin-Min ;   et al.
2016-03-24
Photolithography scattering bar structure and method
Grant 9,213,233 - Chang , et al. December 15, 2
2015-12-15
Method of lithographic process evaluation
Grant 9,026,956 - Chang , et al. May 5, 2
2015-05-05
Method Of Lithographic Process Evaluation
App 20150106771 - Chang; Chia-Cheng ;   et al.
2015-04-16
Design Structure For Chip Extension
App 20150082265 - Huang; Chin-Min ;   et al.
2015-03-19
Structure for chip extension
Grant 8,972,912 - Huang , et al. March 3, 2
2015-03-03
OPC method with higher degree of freedom
Grant 8,972,909 - Chang , et al. March 3, 2
2015-03-03
Photolithogrpahy Scattering Bar Structure And Method
App 20150017571 - CHANG; Chia-Cheng ;   et al.
2015-01-15
Method of forming and using photolithography mask having a scattering bar structure
Grant 8,677,290 - Yen , et al. March 18, 2
2014-03-18
Method and apparatus for enhanced optical proximity correction
Grant 8,589,830 - Chang , et al. November 19, 2
2013-11-19
Method And Apparatus For Enhanced Optical Proximity Correction
App 20130239071 - Chang; Chia-Cheng ;   et al.
2013-09-12
Method Of Forming And Using Photolithography Mask Having A Scattering Bar Structure
App 20120040276 - Yen; Yung-Sung ;   et al.
2012-02-16
Photolithography mask having a scattering bar structure that includes transverse linear assist features
Grant 8,048,590 - Yen , et al. November 1, 2
2011-11-01
Regression system and methods for optical proximity correction modeling
Grant 7,778,805 - Huang , et al. August 17, 2
2010-08-17
Photolithography Scattering Bar Structure And Method
App 20090246648 - Yen; Yung-Sung ;   et al.
2009-10-01
Photolithography scattering bar structure and method
App 20070111109 - Yen; Yung-Sung ;   et al.
2007-05-17
Regression system and methods for optical proximity correction modeling
App 20070038417 - Huang; Wen Chun ;   et al.
2007-02-15

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