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Tsai; Yu-Hao Patent Filings

Tsai; Yu-Hao

Patent Applications and Registrations

Patent applications and USPTO patent grants for Tsai; Yu-Hao.The latest application filed is for "high-throughput dry etching of films containing silicon-oxygen components or silicon-nitrogen components by proton-mediated catalyst formation".

Company Profile
5.5.8
  • Tsai; Yu-Hao - Albany NY
*profile and listings may contain filings by different individuals or companies with the same name. Review application materials to confirm ownership/assignment.
Patent Activity
PatentDate
High-throughput Dry Etching Of Films Containing Silicon-oxygen Components Or Silicon-nitrogen Components By Proton-mediated Catalyst Formation
App 20220157615 - Zhang; Du ;   et al.
2022-05-19
Sidewall protection layer formation for substrate processing
Grant 11,232,954 - Tsai , et al. January 25, 2
2022-01-25
Atomic layer etch (ALE) of tungsten or other metal layers
Grant 11,189,499 - Tsai , et al. November 30, 2
2021-11-30
Selective plasma etching of silicon oxide relative to silicon nitride by gas pulsing
Grant 11,158,517 - Zhang , et al. October 26, 2
2021-10-26
Highly selective silicon oxide/silicon nitride etching by selective boron nitride or aluminum nitride deposition
Grant 11,152,217 - Tsai , et al. October 19, 2
2021-10-19
Sidewall Protection Layer formation for Substrate Processing
App 20210287908 - Tsai; Yu-Hao ;   et al.
2021-09-16
High-throughput Dry Etching Of Silicon Oxide And Silicon Nitride Materials By In-situ Autocatalyst Formation
App 20210233775 - Zhang; Du ;   et al.
2021-07-29
Methods Of Patterning Small Features
App 20210183656 - Lutker-Lee; Katie ;   et al.
2021-06-17
Independent control of etching and passivation gas components for highly selective silicon oxide/silicon nitride etching
Grant 11,024,508 - Zhang , et al. June 1, 2
2021-06-01
Highly Selective Silicon Oxide/silicon Nitride Etching By Selective Boron Nitride Or Aluminum Nitride Deposition
App 20200402808 - Tsai; Yu-Hao ;   et al.
2020-12-24
Independent Control Of Etching And Passivation Gas Components For Highly Selective Silicon Oxide/silicon Nitride Etching
App 20200321218 - Zhang; Du ;   et al.
2020-10-08
Atomic Layer Etch (ale) Of Tungsten Or Other Metal Layers
App 20200312673 - Tsai; Yu-Hao ;   et al.
2020-10-01
Selective Plasma Etching Of Silicon Oxide Relative To Silicon Nitride By Gas Pulsing
App 20200234968 - Zhang; Du ;   et al.
2020-07-23

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