Patent | Date |
---|
Integrated Thin Film Resistor And Memory Device App 20220208675 - GAN; Kah Wee ;   et al. | 2022-06-30 |
Thin film conductive material with conductive etch stop layer Grant 11,315,876 - Rao , et al. April 26, 2 | 2022-04-26 |
Via Structures Of Passive Semiconductor Devices App 20220093508 - RAO; XUESONG ;   et al. | 2022-03-24 |
Thin Film Conductive Material With Conductive Etch Stop Layer App 20210257300 - RAO; XUESONG ;   et al. | 2021-08-19 |
Methods for producing integrated circuits with magnets and a wet etchant for the same Grant 10,784,332 - Li , et al. Sept | 2020-09-22 |
Methods of forming integrated circuits with solutions to interlayer dielectric void formation between gate structures Grant 10,566,441 - Nong , et al. Feb | 2020-02-18 |
Methods For Producing Integrated Circuits With Magnets And A Wet Etchant For The Same App 20190296100 - Li; Liang ;   et al. | 2019-09-26 |
Method and device for reducing contamination for reliable bond pads Grant 10,410,854 - Mou , et al. Sept | 2019-09-10 |
Methods Of Forming Integrated Circuits With Solutions To Interlayer Dielectric Void Formation Between Gate Structures App 20190252515 - Nong; Hao ;   et al. | 2019-08-15 |
Method And Device For Reducing Contamination For Reliable Bond Pads App 20190206676 - MOU; Honghui ;   et al. | 2019-07-04 |
Methods for removal of hard mask Grant 10,115,625 - Li , et al. October 30, 2 | 2018-10-30 |
Methods For Removal Of Hard Mask App 20180190537 - LI; Liang ;   et al. | 2018-07-05 |
Integrated circuits having nickel silicide contacts and methods for fabricating the same Grant 9,548,371 - Huang , et al. January 17, 2 | 2017-01-17 |
Method for forming through silicon via with wafer backside protection Grant 9,230,886 - Leong , et al. January 5, 2 | 2016-01-05 |
Integrated Circuits Having Nickel Silicide Contacts And Methods For Fabricating The Same App 20150311221 - Huang; Jingyan ;   et al. | 2015-10-29 |
Method For Forming Through Silicon Via With Wafer Backside Protection App 20150137359 - LEONG; Lup San ;   et al. | 2015-05-21 |
Method for forming through silicon via with wafer backside protection Grant 8,940,637 - Leong , et al. January 27, 2 | 2015-01-27 |
Method and apparatus to reduce thermal variations within an integrated circuit die using thermal proximity correction Grant 8,860,142 - Poon , et al. October 14, 2 | 2014-10-14 |
High-K metal gate device Grant 8,853,796 - Teh , et al. October 7, 2 | 2014-10-07 |
Spacer profile engineering using films with continuously increased etch rate from inner to outer surface Grant 8,828,858 - Rao , et al. September 9, 2 | 2014-09-09 |
Method For Forming Through Silicon Via With Wafer Backside Protection App 20140008810 - Leong; Lup San ;   et al. | 2014-01-09 |
Spacer Profile Engineering Using Films With Continuously Increased Etch Rate From Inner To Outer Surface App 20130187202 - Rao; Xuesong ;   et al. | 2013-07-25 |
Step-like spacer profile Grant 8,492,236 - Rao , et al. July 23, 2 | 2013-07-23 |
Step-like Spacer Profile App 20130181259 - Rao; Xuesong ;   et al. | 2013-07-18 |
Method And Apparatus To Reduce Thermal Variations Within An Integrated Circuit Die Using Thermal Proximity Correction App 20130099321 - Poon; Debora Chyiu Hyia ;   et al. | 2013-04-25 |
High-k Metal Gate Device App 20120292719 - TEH; Young Way ;   et al. | 2012-11-22 |
Method and apparatus to reduce thermal variations within an integrated circuit die using thermal proximity correction Grant 8,293,544 - Poon , et al. October 23, 2 | 2012-10-23 |
Method and apparatus to reduce thermal variations within an integrated circuit die using thermal proximity correction App 20100019329 - Poon; Debora Chyiu Hyia ;   et al. | 2010-01-28 |
Semiconductor Device With Doped Transistor App 20080087958 - Verma; Purakh Raj ;   et al. | 2008-04-17 |
Semiconductor device and fabrication method Grant 7,326,609 - Verma , et al. February 5, 2 | 2008-02-05 |
Ultra-thin gate oxide through post decoupled plasma nitridation anneal Grant 7,176,094 - Zhong , et al. February 13, 2 | 2007-02-13 |
Semiconductor Device And Fabrication Method App 20060252188 - Verma; Purakh Raj ;   et al. | 2006-11-09 |
Ultra-thin gate oxide through post decoupled plasma nitridation anneal App 20030170956 - Zhong, Dong ;   et al. | 2003-09-11 |