TAKAIWA; Hiroaki

Patent Applications and Registrations

Patent applications and USPTO patent grants for TAKAIWA; Hiroaki.The latest application filed is for "exposure apparatus and device manufacturing method".

Company Profile

1.43.47

TAKAIWA; Hiroaki - Kumagaya-shi JP
Takaiwa; Hiroaki - Kumagaya JP
Takaiwa; Hiroaki - Saitama-ken JP

*profile and listings may contain filings by different individuals or companies with the same name. Review application materials to confirm ownership/assignment.

Patent Activity

Patent	Date
Exposure Apparatus And Device Manufacturing Method App 20190094708 - TAKAIWA; Hiroaki ; et al.	2019-03-28
Exposure Apparatus, Exposure Method, Method For Producing Device, And Optical Part App 20180364581 - NAGASAKA; Hiroyuki ; et al.	2018-12-20
Exposure apparatus and device manufacturing method Grant 10,151,983 - Takaiwa , et al. Dec	2018-12-11
Liquid Recovery Apparatus, Exposure Apparatus, Exposure Method, And Device Manufacturing Method App 20180299789 - HARA; Hideaki ; et al.	2018-10-18
Substrate Holding Device, Exposure Apparatus, And Device Manufacturing Method App 20180292759 - Nagasaka; Hiroyuki ; et al.	2018-10-11
Exposure apparatus, exposure method, method for producing device, and optical part Grant 10,088,760 - Nagasaka , et al. October 2, 2	2018-10-02
Liquid recovery apparatus, exposure apparatus, exposure method, and device manufacturing method Grant 10,012,909 - Hara , et al. July 3, 2	2018-07-03
Exposure method, substrate stage, exposure apparatus, and device manufacturing method Grant 9,846,371 - Owa , et al. December 19, 2	2017-12-19
Exposure Method, Substrate Stage, Exposure Apparatus, And Device Manufacturing Method App 20170329234 - OWA; Soichi ; et al.	2017-11-16
Substrate Holding Device, Exposure Apparatus, And Device Manufacturing Method App 20160231653 - NAGASAKA; Hiroyuki ; et al.	2016-08-11
Substrate holding device, exposure apparatus, and device manufacturing method Grant 9,341,959 - Shibuta , et al. May 17, 2	2016-05-17
Exposure Apparatus with Component from which Liquid is Protected and/or Removed and Device Fabricating Method App 20160103397 - HARA; Hideaki ; et al.	2016-04-14
Exposure method, substrate stage, exposure apparatus, and device manufacturing method Grant 9,268,237 - Owa , et al. February 23, 2	2016-02-23
Exposure apparatus with component from which liquid is protected and/or removed and device fabricating method Grant 9,223,224 - Hara , et al. December 29, 2	2015-12-29
Exposure apparatus, exposure method, method for producing device, and optical part Grant 9,182,685 - Nagasaka , et al. November 10, 2	2015-11-10
Exposure Method, Substrate Stage, Exposure Apparatus, And Device Manufacturing Method App 20150301457 - OWA; Soichi ; et al.	2015-10-22
Exposure Apparatus, Exposure Method, Method For Producing Device, And Optical Part App 20150286151 - NAGASAKA; Hiroyuki ; et al.	2015-10-08
Exposure Apparatus And Device Manufacturing Method App 20150234293 - TAKAIWA; Hiroaki ; et al.	2015-08-20
Liquid Recovery Apparatus, Exposure Apparatus, Exposure Method, And Device Manufacturing Method App 20150234282 - HARA; Hideaki ; et al.	2015-08-20
Immersion exposure apparatus and method that detects liquid adhered to rear surface of substrate Grant 9,041,906 - Takaiwa , et al. May 26, 2	2015-05-26
Liquid recovery apparatus, exposure apparatus, exposure method, and device manufacturing method Grant 9,041,901 - Hara , et al. May 26, 2	2015-05-26
Exposure apparatus, exposure method, method for producing device, and optical part Grant 9,019,469 - Nagasaka , et al. April 28, 2	2015-04-28
Exposure method, substrate stage, exposure apparatus, and device manufacturing method Grant 9,019,467 - Owa , et al. April 28, 2	2015-04-28
Liquid recovery apparatus, exposure apparatus, exposure method, and device manufacturing method Grant 8,867,017 - Hara , et al. October 21, 2	2014-10-21
Liquid recovery apparatus, exposure apparatus, exposure method, and device manufacturing method Grant 8,854,599 - Hara , et al. October 7, 2	2014-10-07
Immersion exposure apparatus and method that detects residual liquid on substrate held by substrate table after exposure Grant 8,767,168 - Takaiwa , et al. July 1, 2	2014-07-01
Stage apparatus and exposure apparatus Grant 8,749,755 - Takaiwa June 10, 2	2014-06-10
Exposure apparatus, method for producing device, and method for controlling exposure apparatus Grant 8,749,757 - Magome , et al. June 10, 2	2014-06-10
Exposure Apparatus, Exposure Method, Method For Producing Device, And Optical Part App 20140022523 - NAGASAKA; Hiroyuki ; et al.	2014-01-23
Wafer Table Having Sensor For Immersion Lithography App 20130301016 - HAZELTON; Andrew J. ; et al.	2013-11-14
Wafer Table Having Sensor For Immersion Lithography App 20130301018 - HAZELTON; Andrew J. ; et al.	2013-11-14
Exposure Apparatus And Device Manufacturing Method App 20130293855 - TAKAIWA; Hiroaki ; et al.	2013-11-07
Wafer table having sensor for immersion lithography Grant 8,508,718 - Hazelton , et al. August 13, 2	2013-08-13
Immersion exposure apparatus and method that detects residual liquid on substrate held by substrate table on way from exposure position to unload position Grant 8,488,101 - Takaiwa , et al. July 16, 2	2013-07-16
Exposure Method, Substrate Stage, Exposure Apparatus, And Device Manufacturing Method App 20130141701 - OWA; Soichi ; et al.	2013-06-06
Exposure Method, Substrate Stage, Exposure Apparatus, And Device Manufacturing Method App 20130141703 - OWA; Soichi ; et al.	2013-06-06
Exposure Apparatus, Method For Producing Device, And Method For Controlling Exposure Apparatus App 20130135597 - MAGOME; Nobutaka ; et al.	2013-05-30
Liquid Recovery Apparatus, Exposure Apparatus, Exposure Method, And Device Manufacturing Method App 20130135596 - HARA; Hideaki ; et al.	2013-05-30
Exposure apparatus, method for producing device, and method for controlling exposure apparatus Grant 8,451,424 - Magome , et al. May 28, 2	2013-05-28
Exposure method, substrate stage, exposure apparatus, and device manufacturing method Grant 8,384,880 - Owa , et al. February 26, 2	2013-02-26
Exposure method, substrate stage, exposure apparatus, and device manufacturing method Grant 8,208,117 - Owa , et al. June 26, 2	2012-06-26
Substrate Holding Device, Exposure Apparatus, And Device Manufacturing Method App 20120094238 - NAGASAKA; Hiroyuki ; et al.	2012-04-19
Substrate holding device, exposure apparatus, and device manufacturing method Grant 8,102,512 - Shibuta , et al. January 24, 2	2012-01-24
Exposure apparatus, exposure method, method for producing device, and optical part Grant 8,054,447 - Nagasaka , et al. November 8, 2	2011-11-08
Exposure apparatus and device manufacturing method App 20110261331 - Takaiwa; Hiroaki ; et al.	2011-10-27
Exposure apparatus and device manufacturing method App 20110261345 - Takaiwa; Hiroaki ; et al.	2011-10-27
Exposure apparatus and method for producing device Grant 8,034,539 - Magome , et al. October 11, 2	2011-10-11
Stage apparatus and exposure apparatus App 20110228240 - Takaiwa; Hiroaki	2011-09-22
Immersion exposure apparatus and device manufacturing method with residual liquid detector Grant 7,990,517 - Takaiwa , et al. August 2, 2	2011-08-02
Immersion exposure apparatus and device manufacturing method with liquid detection apparatus Grant 7,990,516 - Takaiwa , et al. August 2, 2	2011-08-02
Stage apparatus and exposure apparatus Grant 7,973,910 - Takaiwa July 5, 2	2011-07-05
Liquid recovery apparatus, exposure apparatus, exposure method, and device manufacturing method App 20110013161 - Hara; Hideaki ; et al.	2011-01-20
Liquid recovery apparatus, exposure apparatus, exposure method, and device manufacturing method Grant 7,847,916 - Hara , et al. December 7, 2	2010-12-07
Liquid recovery apparatus, exposure apparatus, exposure method, and device manufacturing method Grant 7,826,031 - Hara , et al. November 2, 2	2010-11-02
Exposure apparatus preventing gas from moving from exposure region to measurement region App 20100259737 - Takaiwa; Hiroaki	2010-10-14
Liquid recovery apparatus, exposure apparatus, exposure method, and device manufacturing method App 20090128793 - Hara; Hideaki ; et al.	2009-05-21
Wafer table for immersion lithography App 20090109418 - Hazelton; Andrew J. ; et al.	2009-04-30
Wafer table for immersion lithography Grant 7,486,380 - Hazelton , et al. February 3, 2	2009-02-03
Exposure method, substrate stage, exposure apparatus, and device manufacturing method App 20090015816 - Owa; Soichi ; et al.	2009-01-15
Exposure method, substrate stage, exposure apparatus, and device manufacturing method App 20090015808 - Owa; Soichi ; et al.	2009-01-15
Exposure Apparatus and Device Manufacturing Method App 20080151200 - Takaiwa; Hiroaki	2008-06-26
Stage apparatus and exposure apparatus App 20080117395 - Takaiwa; Hiroaki	2008-05-22
Magnetic Guide Apparatus, Stage Apparatus, Exposure Apparatus, and Device Manufacturing Method App 20080073982 - Ono; Kazuya ; et al.	2008-03-27
Wafer table for immersion lithography Grant 7,301,607 - Hazelton , et al. November 27, 2	2007-11-27
Substrate Holding Device, Exposure Apparatus, and Device Manufacturing Method App 20070269294 - Nagasaka; Hiroyuki ; et al.	2007-11-22
Exposure Apparatus, Exposure Method, Method for Producing Device, and Optical Part App 20070242242 - Nagasaka; Hiroyuki ; et al.	2007-10-18
Exposure apparatus and method for producing device App 20070171391 - Magome; Nobutaka ; et al.	2007-07-26
Exposure apparatus and device manufacturing method App 20070159609 - Takaiwa; Hiroaki ; et al.	2007-07-12
Exposure apparatus, exposure method, method for producing device, and optical part App 20070115450 - Nagasaka; Hiroyuki ; et al.	2007-05-24
Exposure apparatus and device manufacturing method App 20070109517 - Takaiwa; Hiroaki ; et al.	2007-05-17
Liquid recovery apparatus, exposure apparatus, exposure method, and device manufacturing method App 20070076183 - Hara; Hideaki ; et al.	2007-04-05
Wafer table for immersion lithography App 20070076182 - Hazelton; Andrew J. ; et al.	2007-04-05
Exposure method, substrate stage, exposure apparatus, and device manufacturing method App 20060227312 - Owa; Soichi ; et al.	2006-10-12
Exposure apparatus and device fabricating method App 20060139594 - Hara; Hideaki ; et al.	2006-06-29
Exposure method, substrate stage, exposure apparatus, and device manufacturing method App 20060139614 - Owa; Soichi ; et al.	2006-06-29
Exposure apparatus, method for producing device, and method for controlling exposure apparatus App 20060132737 - Magome; Nobutaka ; et al.	2006-06-22
Wafer table for immersion lithography App 20060103832 - Hazelton; Andrew J. ; et al.	2006-05-18
Liquid recovery apparatus, exposure apparatus, exposure method, and device manufacturing method App 20050243293 - Hara, Hideaki ; et al.	2005-11-03
Exposure apparatus and method for producing device App 20050225735 - Magome, Nobutaka ; et al.	2005-10-13

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