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name:-0.046572923660278
name:-0.20782804489136
name:-0.067921876907349
Sun; Sey-Shing Patent Filings

Sun; Sey-Shing

Patent Applications and Registrations

Patent applications and USPTO patent grants for Sun; Sey-Shing.The latest application filed is for "low voltage embedded memory having conductive oxide and electrode stacks".

Company Profile
0.37.26
  • Sun; Sey-Shing - Portland OR US
  • Sun, Sey-Shing - Beaverton OR
*profile and listings may contain filings by different individuals or companies with the same name. Review application materials to confirm ownership/assignment.
Patent Activity
PatentDate
Low voltage embedded memory having conductive oxide and electrode stacks
Grant 9,647,208 - Karpov , et al. May 9, 2
2017-05-09
Low Voltage Embedded Memory Having Conductive Oxide And Electrode Stacks
App 20160079523 - Karpov; Elijah V. ;   et al.
2016-03-17
Low voltage embedded memory having conductive oxide and electrode stacks
Grant 9,231,204 - Karpov , et al. January 5, 2
2016-01-05
Low Voltage Embedded Memory Having Conductive Oxide And Electrode Stacks
App 20140092666 - Karpov; Elijah V. ;   et al.
2014-04-03
Alternate Pad Structures/passivation Integration Schemes To Reduce Or Eliminate Imc Cracking In Post Wire Bonded Dies During Cu/low-k Beol Processing
App 20140030541 - Bhatt; Hemanshu ;   et al.
2014-01-30
Alternate pad structures/passivation inegration schemes to reduce or eliminate IMC cracking in post wire bonded dies during Cu/Low-K BEOL processing
Grant 8,552,560 - Bhatt , et al. October 8, 2
2013-10-08
Application of gate edge liner to maintain gate length CD in a replacement gate transistor flow
Grant 8,384,165 - Carter , et al. February 26, 2
2013-02-26
Reduction of macro level stresses in copper/low-K wafers
Grant 8,076,779 - Sun , et al. December 13, 2
2011-12-13
Bi-axial texturing of high-K dielectric films to reduce leakage currents
Grant 7,956,401 - Lo , et al. June 7, 2
2011-06-07
Self-aligned cell integration scheme
Grant 7,915,122 - Carter , et al. March 29, 2
2011-03-29
Bi-axial Texturing Of High-k Dielectric Films To Reduce Leakage Currents
App 20100022060 - LO; Wai ;   et al.
2010-01-28
Bi-axial texturing of high-K dielectric films to reduce leakage currents
Grant 7,619,272 - Lo , et al. November 17, 2
2009-11-17
Method for redirecting void diffusion away from vias in an integrated circuit design
Grant 7,582,566 - Allman , et al. September 1, 2
2009-09-01
Eliminate IMC cracking in post wirebonded dies: macro level stress reduction by modifying dielectric/metal film stack in be layers during Cu/Low-K processing
Grant 7,531,442 - Pallinti , et al. May 12, 2
2009-05-12
Application Of Gate Edge Liner To Maintain Gate Length Cd In A Replacement Gate Transistor Flow
App 20080308882 - Carter; Richard J. ;   et al.
2008-12-18
Method and apparatus for diverting void diffusion in integrated circuit conductors
Grant 7,436,040 - Allman , et al. October 14, 2
2008-10-14
Application of gate edge liner to maintain gate length CD in a replacement gate transistor flow
Grant 7,405,116 - Carter , et al. July 29, 2
2008-07-29
Nano structure electrode design
Grant 7,402,770 - Sun , et al. July 22, 2
2008-07-22
DAMASCENE REPLACEMENT METAL GATE PROCESS WITH CONTROLLED GATE PROFILE AND LENGTH USING Si1-xGex AS SACRIFICIAL MATERIAL
App 20080150090 - Lin; Hong ;   et al.
2008-06-26
Method For Redirecting Void Diffusion Away From Vias In An Integrated Circuit Design
App 20080132065 - Allman; Derryl D. J. ;   et al.
2008-06-05
Damascene replacement metal gate process with controlled gate profile and length using Si.sub.1-xGe.sub.x as sacrificial material
Grant 7,365,015 - Lin , et al. April 29, 2
2008-04-29
Method and apparatus for redirecting void diffusion away from vias in an integrated circuit design
Grant 7,361,965 - Allman , et al. April 22, 2
2008-04-22
Incorporating dopants to enhance the dielectric properties of metal silicates
Grant 7,312,127 - Lo , et al. December 25, 2
2007-12-25
Integrated barrier and seed layer for copper interconnect technology
Grant 7,300,869 - Sun , et al. November 27, 2
2007-11-27
Method and apparatus for diverting void diffusion in integrated circuit conductors
App 20070259518 - Allman; Derryl D.J. ;   et al.
2007-11-08
Method and apparatus for redirecting void diffusion away from vias in an integrated circuit design
App 20070155160 - Allman; Derryl D. J. ;   et al.
2007-07-05
Eliminate IMC cracking in post wirebonded dies: macro level stress reduction by modifying dielectric/metal film stack in be layers during Cu/Low-K processing
App 20070123024 - Pallinti; Jayanthi ;   et al.
2007-05-31
Alternate pad structures/passivation inegration schemes to reduce or eliminate IMC cracking in post wire bonded dies during Cu/Low-K BEOL processing
App 20070114667 - Bhatt; Hemanshu ;   et al.
2007-05-24
Reduction of macro level stresses in copper/Low-K wafers by altering aluminum pad/passivation stack to reduce or eliminate IMC cracking in post wire bonded dies
App 20070102812 - Sun; Sey-Shing ;   et al.
2007-05-10
Reduce or eliminate IMC cracking in post wire bonded dies by doping aluminum used in bond pads during Cu/Low-k BEOL processing
Grant 7,205,673 - Pallinti , et al. April 17, 2
2007-04-17
Method and structure for creating ultra low resistance damascene copper wiring
Grant 7,196,420 - Burke , et al. March 27, 2
2007-03-27
Method for fabricating planar semiconductor wafers
Grant 7,179,736 - Kwak , et al. February 20, 2
2007-02-20
Self-aligned cell integration scheme
App 20060281256 - Carter; Richard J. ;   et al.
2006-12-14
Nano structure electrode design
App 20060278902 - Sun; Sey-Shing ;   et al.
2006-12-14
Incorporating dopants to enhance the dielectric properties of metal silicates
App 20060166496 - Lo; Wai ;   et al.
2006-07-27
Incorporating dopants to enhance the dielectric properties of metal silicates
Grant 7,064,062 - Lo , et al. June 20, 2
2006-06-20
Bi-axial texturing of high-K dielectric films to reduce leakage currents
App 20060118919 - Lo; Wai ;   et al.
2006-06-08
Method for fabricating planar semiconductor wafers
App 20060084267 - Kwak; Byung-Sung Leo ;   et al.
2006-04-20
Integrated barrier and seed layer for copper interconnect technology
App 20060063375 - Sun; Sey-Shing ;   et al.
2006-03-23
Bimetallic oxide compositions for gate dielectrics
Grant 7,015,096 - Zubkov , et al. March 21, 2
2006-03-21
Application of gate edge liner to maintain gate length CD in a replacement gate transistor flow
App 20060035425 - Carter; Richard J. ;   et al.
2006-02-16
Method for creating barrier layers for copper diffusion
Grant 6,998,343 - Sun , et al. February 14, 2
2006-02-14
Damascene replacement metal gate process with controlled gate profile and length using Si1-xGex as sacrificial material
App 20060011994 - Lin; Hong ;   et al.
2006-01-19
Method and structure for creating ultra low resistance damascene copper wiring
Grant 6,987,059 - Burke , et al. January 17, 2
2006-01-17
Carbon nanotube memory cell for integrated circuit structure with removable side spacers to permit access to memory cell and process for forming such memory cell
Grant 6,955,937 - Burke , et al. October 18, 2
2005-10-18
Method for improved local planarity control during electropolishing
App 20050224358 - Kwak, Byung-Sung ;   et al.
2005-10-13
Incorporating dopants to enhance the dielectric properties of metal silicates
App 20050127458 - Lo, Wai ;   et al.
2005-06-16
Method of fabricating an alloy cap layer over CU wires to improve electromigration performance of CU interconnects
App 20040207093 - Sun, Sey-Shing ;   et al.
2004-10-21
Thin-film electroluminescent phosphor
App 20020043925 - Sun, Sey-Shing ;   et al.
2002-04-18
Electroluminescent phosphor thin films with increased brightness that includes an alkali halide
Grant 6,169,359 - Sun , et al. January 2, 2
2001-01-02
Alternating current thin film electroluminescent device having blue light emitting alkaline earth phosphor
Grant 6,043,602 - Sun , et al. March 28, 2
2000-03-28
Alternating current thin film electroluminescent device having blue light emitting alkaline earth phosphor
Grant 5,939,825 - Sun , et al. August 17, 1
1999-08-17
TFEL phosphor having metal overlayer
Grant 5,677,594 - Sun , et al. October 14, 1
1997-10-14
Oxygen-doped thiogallate phosphor
Grant 5,656,888 - Sun , et al. August 12, 1
1997-08-12
TFEL device with injection layer
Grant 5,581,150 - Rack , et al. December 3, 1
1996-12-03
Multi-source reactive deposition process for the preparation of blue light emitting phosphor layers for AC TFEL devices
Grant 5,505,986 - Velthaus , et al. April 9, 1
1996-04-09
AC TFEL device having blue light emitting thiogallate phosphor
Grant 5,309,070 - Sun , et al. May 3, 1
1994-05-03

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