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Patent applications and USPTO patent grants for Sueoka, Kouji.The latest application filed is for "manufacturing method of high resistivity silicon single crystal".
Patent | Date |
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Manufacturing method of high resistivity silicon single crystal App 20050000410 - Takase, Nobumitsu ;   et al. | 2005-01-06 |
Silicon single crystal, silicon wafer, and epitaxial wafer. Grant 6,641,888 - Asayama , et al. November 4, 2 | 2003-11-04 |
Method of manufacturing silicon epitaxial wafer Grant 6,599,816 - Sueoka , et al. July 29, 2 | 2003-07-29 |
Silicon single crystal, silicon wafer, and epitaxial wafer App 20020142170 - Asayama, Eiichi ;   et al. | 2002-10-03 |
Silicon single crystal, silicon wafer, and epitaxial wafer App 20020142171 - Asayama, Eiichi ;   et al. | 2002-10-03 |
Method of manufacturing silicon epitaxial wafer App 20010021574 - Sueoka, Kouji ;   et al. | 2001-09-13 |
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