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name:-0.028155088424683
name:-0.0029301643371582
name:-0.00079011917114258
Sueoka, Kouji Patent Filings

Sueoka, Kouji

Patent Applications and Registrations

Patent applications and USPTO patent grants for Sueoka, Kouji.The latest application filed is for "manufacturing method of high resistivity silicon single crystal".

Company Profile
0.2.4
  • Sueoka, Kouji - Tokyo JP
  • Sueoka; Kouji - Amagasaki JP
  • Sueoka; Kouji - Ashiya JP
  • Sueoka, Kouji - Amagasaki-shi JP
  • Sueoka, Kouji - Ashiya-shi JP
*profile and listings may contain filings by different individuals or companies with the same name. Review application materials to confirm ownership/assignment.
Patent Activity
PatentDate
Manufacturing method of high resistivity silicon single crystal
App 20050000410 - Takase, Nobumitsu ;   et al.
2005-01-06
Silicon single crystal, silicon wafer, and epitaxial wafer.
Grant 6,641,888 - Asayama , et al. November 4, 2
2003-11-04
Method of manufacturing silicon epitaxial wafer
Grant 6,599,816 - Sueoka , et al. July 29, 2
2003-07-29
Silicon single crystal, silicon wafer, and epitaxial wafer
App 20020142170 - Asayama, Eiichi ;   et al.
2002-10-03
Silicon single crystal, silicon wafer, and epitaxial wafer
App 20020142171 - Asayama, Eiichi ;   et al.
2002-10-03
Method of manufacturing silicon epitaxial wafer
App 20010021574 - Sueoka, Kouji ;   et al.
2001-09-13

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