Stolz; Wolfgang

Patent Applications and Registrations

Patent applications and USPTO patent grants for Stolz; Wolfgang.The latest application filed is for "use of at least one binary group 15 element compound, a 13/15 semiconductor layer and binary group 15 element compounds".

Company Profile

1.7.8

Stolz; Wolfgang - Marburg DE
Stolz; Wolfgang - Leonberg N/A DE

*profile and listings may contain filings by different individuals or companies with the same name. Review application materials to confirm ownership/assignment.

Patent Activity

Patent	Date
Use of at least one binary group 15 element compound, a 13/15 semiconductor layer and binary group 15 element compounds Grant 10,269,562 - Von Haenisch , et al.	2019-04-23
Use Of At Least One Binary Group 15 Element Compound, A 13/15 Semiconductor Layer And Binary Group 15 Element Compounds App 20170243740 - VON HAENISCH; Carsten ; et al.	2017-08-24
Device and method for operating a vehicle Grant 9,610,942 - Poechmueller , et al. April 4, 2	2017-04-04
Device and Method for Operating a Vehicle App 20150019042 - Poechmueller; Werner ; et al.	2015-01-15
III/V-semiconductor Grant 8,421,055 - Kunert , et al. April 16, 2	2013-04-16
Tungsten and molybdenum compounds and their use for chemical vapour deposition (CVD) Grant 7,754,908 - Reuter , et al. July 13, 2	2010-07-13
Iii/v-semiconductor App 20100102293 - KUNERT; BERNARDETTE ; et al.	2010-04-29
Tantalum and niobium compounds and their use for chemical vapour deposition (CVD) Grant 7,442,407 - Reuter , et al. October 28, 2	2008-10-28
Tantalum And Niobium Compounds And Their Use For Chemical Vapour Deposition (cvd) App 20080038466 - Reuter; Knud ; et al.	2008-02-14
Optically Pumped Semiconductor Devices for the Generation of Radiation, Their Production as Well as Methods for the Strain Compensation in the Layer Successions used Within App 20070217457 - Stolz; Wolfgang ; et al.	2007-09-20
Tungsten and molybdenum compounds and thier use for chemical vapour deposition (CVD) App 20070160761 - Reuter; Knud ; et al.	2007-07-12
Tantalum and niobium compounds and their use for chemical vapour deposition (CVD) App 20070042213 - Reuter; Knud ; et al.	2007-02-22
III/V-semiconductor App 20070012908 - Kunert; Bernardette ; et al.	2007-01-18

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