loadpatents
name:-0.024301052093506
name:-0.017267942428589
name:-0.0039341449737549
Sprey; Hessel Patent Filings

Sprey; Hessel

Patent Applications and Registrations

Patent applications and USPTO patent grants for Sprey; Hessel.The latest application filed is for "substrate rack and a substrate processing system and method".

Company Profile
3.15.17
  • Sprey; Hessel - Kessel-Lo BE
  • Sprey; Hessel - Almere N/A NL
  • Sprey; Hessel - Leuven BE
*profile and listings may contain filings by different individuals or companies with the same name. Review application materials to confirm ownership/assignment.
Patent Activity
PatentDate
Substrate rack and a substrate processing system and method
Grant 11,088,002 - Pierreux , et al. August 10, 2
2021-08-10
Atomic layer deposition of antimony oxide films
Grant 10,699,899 - Matero , et al.
2020-06-30
Substrate Rack And A Substrate Processing System And Method
App 20190304821 - Pierreux; Dieter ;   et al.
2019-10-03
Atomic Layer Deposition Of Antimony Oxide Films
App 20190103266 - Matero; Raija H. ;   et al.
2019-04-04
Atomic layer deposition of antimony oxide films
Grant 10,056,249 - Matero , et al. August 21, 2
2018-08-21
Atomic Layer Deposition Of Antimony Oxide Films
App 20170140918 - Matero; Raija H. ;   et al.
2017-05-18
Cyclic aluminum nitride deposition in a batch reactor
Grant 9,552,979 - Knaepen , et al. January 24, 2
2017-01-24
Atomic layer deposition of antimony oxide films
Grant 9,514,934 - Matero , et al. December 6, 2
2016-12-06
Atomic Layer Deposition Of Antimony Oxide Films
App 20150249005 - MATERO; RAIJA H. ;   et al.
2015-09-03
Atomic layer deposition of antimony oxide films
Grant 9,006,112 - Matero , et al. April 14, 2
2015-04-14
Cyclic Aluminum Nitride Deposition In A Batch Reactor
App 20140357090 - Knaepen; Werner ;   et al.
2014-12-04
Method of CVD-depositing a film having a substantially uniform film thickness
Grant 8,652,573 - Stokhof , et al. February 18, 2
2014-02-18
Atomic Layer Deposition Of Antimony Oxide Films
App 20130095664 - Matero; Raija H. ;   et al.
2013-04-18
Method Of Cvd-depositing A Film Having A Substantially Uniform Film Thickness
App 20120015105 - Stokhof; Maarten ;   et al.
2012-01-19
Thin Films
App 20110256718 - Haukka; Suvi P. ;   et al.
2011-10-20
Thin films
Grant 7,981,791 - Haukka , et al. July 19, 2
2011-07-19
Liner materials and related processes for 3-D integration
Grant 7,884,016 - Sprey , et al. February 8, 2
2011-02-08
Liner Materials And Related Processes For 3-d Integration
App 20100200989 - Sprey; Hessel ;   et al.
2010-08-12
Cyclical Oxidation Process
App 20090269939 - Sprey; Hessel
2009-10-29
Thin Films
App 20090068832 - Haukka; Suvi P. ;   et al.
2009-03-12
Plasma pre-treating surfaces for atomic layer deposition
Grant 7,498,242 - Kumar , et al. March 3, 2
2009-03-03
Process Of Filling Deep Vias For 3-d Integration Of Substrates
App 20080242078 - Sprey; Hessel ;   et al.
2008-10-02
Thin films
Grant 7,419,903 - Haukka , et al. September 2, 2
2008-09-02
Plasma pre-treating surfaces for atomic layer deposition
App 20060216932 - Kumar; Devendra ;   et al.
2006-09-28
Thin films
App 20050181555 - Haukka, Suvi P. ;   et al.
2005-08-18
Method and installation for etching a substrate
Grant 6,884,317 - Sprey , et al. April 26, 2
2005-04-26
In situ reduction of copper oxide prior to silicon carbide deposition
Grant 6,878,628 - Sophie , et al. April 12, 2
2005-04-12
Sealing porous structures
Grant 6,759,325 - Raaijmakers , et al. July 6, 2
2004-07-06
Sealing porous structures
App 20030143839 - Raaijmakers, Ivo ;   et al.
2003-07-31
In situ reduction of copper oxide prior to silicon carbide deposition
App 20020098685 - Sophie, Auguste J.L. ;   et al.
2002-07-25
Method and installation for etching a substrate
App 20010015343 - Sprey, Hessel ;   et al.
2001-08-23

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