Shiobara; Eishi

Patent Applications and Registrations

Patent applications and USPTO patent grants for Shiobara; Eishi.The latest application filed is for "reflective mask".

Company Profile

2.39.47

Shiobara; Eishi - Kanagawa JP
Shiobara; Eishi - Yokohama Kanagawa JP
Shiobara; Eishi - Yokkaichi JP
Shiobara; Eishi - Mie-ken N/A JP
Shiobara; Eishi - Kanagawa-ken N/A JP
Shiobara; Eishi - Yokohama N/A JP
Shiobara; Eishi - Yokohama-shi JP
Shiobara; Eishi - Inagi JP
Shiobara; Eishi - Inagi-shi JP
Shiobara; Eishi - Tokyo JP

*profile and listings may contain filings by different individuals or companies with the same name. Review application materials to confirm ownership/assignment.

Patent Activity

Patent	Date
Reflective mask Grant 11,366,380 - Shiobara June 21, 2	2022-06-21
Particle measuring method and detection liquid Grant 11,112,344 - Tomita , et al. September 7, 2	2021-09-07
Reflective Mask App 20210072634 - SHIOBARA; Eishi	2021-03-11
Particle Measuring Method And Detection Liquid App 20200284714 - TOMITA; Hiroshi ; et al.	2020-09-10
Manufacturing apparatus of semiconductor device and management method of manufacturing apparatus of semiconductor device Grant 9,958,794 - Shiobara May 1, 2	2018-05-01
Semiconductor device and method of manufacturing the same Grant 9,891,524 - Shiobara February 13, 2	2018-02-13
Semiconductor Device And Method Of Manufacturing The Same App 20160216609 - SHIOBARA; Eishi	2016-07-28
Manufacturing Apparatus Of Semiconductor Device And Management Method Of Manufacturing Apparatus Of Semiconductor Device App 20160204040 - SHIOBARA; Eishi	2016-07-14
Method for forming pattern Grant 8,883,405 - Shiobara November 11, 2	2014-11-11
Pattern forming method Grant 8,753,803 - Kawamura , et al. June 17, 2	2014-06-17
Pattern formation method and method for manufacturing semiconductor device Grant 8,747,682 - Matsunaga , et al. June 10, 2	2014-06-10
Method For Forming Pattern App 20130164691 - SHIOBARA; Eishi	2013-06-27
Imprint method Grant 8,419,995 - Yoneda , et al. April 16, 2	2013-04-16
Method of manufacturing a semiconductor device Grant 8,329,385 - Shiobara , et al. December 11, 2	2012-12-11
Method of forming resist pattern Grant 8,198,005 - Shiobara , et al. June 12, 2	2012-06-12
Method of manufacturing semiconductor device Grant 8,187,797 - Shiobara , et al. May 29, 2	2012-05-29
Method of manufacturing a semiconductor device Grant 8,158,332 - Matsunaga , et al. April 17, 2	2012-04-17
Method for manufacturing semiconductor device Grant 8,097,398 - Kondoh , et al. January 17, 2	2012-01-17
Evaluation method for chemical solution, qualification method for chemical solution and method for manufacturing semiconductor device Grant 8,080,429 - Ito , et al. December 20, 2	2011-12-20
Semiconductor Device Manufacturing Method To Form Resist Pattern, And Substrate Processing Apparatus App 20110229826 - KAWAMURA; Daisuke ; et al.	2011-09-22
Method for treating substrate, method for conveying substrate, and apparatus for conveying substrate Grant 7,973,907 - Matsunaga , et al. July 5, 2	2011-07-05
Semiconductor device manufacturing method to form resist pattern Grant 7,968,272 - Kawamura , et al. June 28, 2	2011-06-28
Pattern Forming Method App 20110059406 - KAWAMURA; Yoshihisa ; et al.	2011-03-10
Pattern Formation Method And Method For Manufacturing Semiconductor Device App 20110034029 - MATSUNAGA; Kentaro ; et al.	2011-02-10
Pattern forming method Grant 7,851,139 - Shiobara , et al. December 14, 2	2010-12-14
Pattern Forming Method App 20100304568 - MIYOSHI; Seiro ; et al.	2010-12-02
Substrate processing method, substrate processing apparatus, and manufacturing method of semiconductor device Grant 7,794,923 - Shiobara , et al. September 14, 2	2010-09-14
Substrate processing apparatus and method Grant 7,779,777 - Shiobara , et al. August 24, 2	2010-08-24
Method Of Manufacturing A Semiconductor Device App 20100183982 - MATSUNAGA; Kentaro ; et al.	2010-07-22
Evaluation Method For Chemical Solution, Qualification Method For Chemical Solution And Method For Manufacturing Semiconductor Device App 20100139421 - Ito; Shinichi ; et al.	2010-06-10
Method Of Manufacturing Semiconductor Device App 20100104984 - SHIOBARA; Eishi ; et al.	2010-04-29
Imprint Method App 20100078860 - Yoneda; Ikuo ; et al.	2010-04-01
Evaluation method for chemical solution, qualification method for chemical solution and method for manufacturing semiconductor device Grant 7,687,279 - Ito , et al. March 30, 2	2010-03-30
Resist pattern forming method and manufacturing method of semiconductor device Grant 7,687,227 - Shiobara , et al. March 30, 2	2010-03-30
Apparatus for processing substrate and method of processing the same Grant 7,662,546 - Kawano , et al. February 16, 2	2010-02-16
Pattern forming method and semiconductor device manufacturing method Grant 7,662,542 - Shiobara , et al. February 16, 2	2010-02-16
Method Of Manufacturing A Semiconductor Device App 20090305166 - SHIOBARA; Eishi ; et al.	2009-12-10
Method For Manufacturing Semiconductor Device App 20090305167 - KONDOH; Takehiro ; et al.	2009-12-10
Method Of Forming Resist Pattern App 20090305174 - SHIOBARA; Eishi ; et al.	2009-12-10
Substrate Processing Apparatus And Method App 20090226624 - Shiobara; Eishi ; et al.	2009-09-10
Method of manufacturing semiconductor device Grant 7,537,871 - Fukuhara , et al. May 26, 2	2009-05-26
Patterning Method App 20090123878 - MIYOSHI; Seiro ; et al.	2009-05-14
Pattern Forming Method App 20090117498 - Shiobara; Eishi ; et al.	2009-05-07
Method For Treating Substrate, Method For Conveying Substrate, And Apparatus For Conveying Substrate App 20090115978 - MATSUNAGA; Kentaro ; et al.	2009-05-07
Pattern forming method and method for manufacturing a semiconductor device Grant 7,527,918 - Kondoh , et al. May 5, 2	2009-05-05
Pattern formation method using fine pattern formation material for use in semiconductor fabrication step App 20080138746 - Kondoh; Takehiro ; et al.	2008-06-12
Method for evaluating sensitivity of photoresist, method for preparation of photoresist and manufacturing method of semiconductor device Grant 7,368,209 - Shiobara , et al. May 6, 2	2008-05-06
Waste liquid processing method in semiconductor manufacturing process and substrate processing apparatus App 20080073286 - Shiobara; Eishi	2008-03-27
Method of processing a substrate, heating apparatus, and method of forming a pattern App 20080064226 - Kawano; Kenji ; et al.	2008-03-13
Substrate processing method and semiconductor device manufacturing method carried out in a lithographic process App 20080003837 - Hayasaki; Kei ; et al.	2008-01-03
Substrate processing apparatus and method App 20070266936 - Shiobara; Eishi ; et al.	2007-11-22
Method of processing a substrate, heating apparatus, and method of forming a pattern Grant 7,294,586 - Kawano , et al. November 13, 2	2007-11-13
Substrate treatment method, substrate treatment apparatus, and semiconductor device manufacturing method App 20070199579 - Hayasaki; Kei ; et al.	2007-08-30
Substrate processing method, substrate processing apparatus, and manufacturing method of semiconductor device App 20070190462 - Shiobara; Eishi ; et al.	2007-08-16
Semiconductor device manufacturing method to form resist pattern, and substrate processing apparatus App 20070128554 - Kawamura; Daisuke ; et al.	2007-06-07
Method of manufacturing semiconductor device App 20070082295 - Fukuhara; Kazuya ; et al.	2007-04-12
Resist pattern forming method and manufacturing method of semiconductor device App 20070042297 - Shiobara; Eishi ; et al.	2007-02-22
Chemical solution qualification method, semiconductor device fabrication method, and liquid crystal display manufacturing method App 20070010028 - Kondoh; Takehiro ; et al.	2007-01-11
Pattern forming method and semiconductor device manufacturing method App 20060189147 - Shiobara; Eishi ; et al.	2006-08-24
Apparatus for processing substrate and method of processing the same App 20060102614 - Kawano; Kenji ; et al.	2006-05-18
Pattern forming method and method for manufacturing semiconductor device Grant 7,026,099 - Kato , et al. April 11, 2	2006-04-11
Method of processing a substrate, heating apparatus, and method of forming a pattern Grant 7,009,148 - Kawano , et al. March 7, 2	2006-03-07
Apparatus for processing substrate and method of processing the same Grant 7,005,249 - Kawano , et al. February 28, 2	2006-02-28
Apparatus for processing substrate and method of processing the same Grant 7,005,238 - Kawano , et al. February 28, 2	2006-02-28
Evaluation method for chemical solution, qualification method for chemical solution and method for manufacturing semiconductor device App 20050244979 - Ito, Shinichi ; et al.	2005-11-03
Apparatus for processing substrate and method of processing the same App 20050158670 - Kawano, Kenji ; et al.	2005-07-21
Pattern forming method and method for manufacturing a semiconductor device App 20050130068 - Kondoh, Takehiro ; et al.	2005-06-16
Method of processing a substrate, heating apparatus, and method of forming a pattern App 20050118535 - Kawano, Kenji ; et al.	2005-06-02
Apparatus for processing substrate and method of processing the same App 20050118536 - Kawano, Kenji ; et al.	2005-06-02
Apparatus for processing substrate and method of processing the same Grant 6,881,058 - Kawano , et al. April 19, 2	2005-04-19
Method for forming resist pattern and method for manufacturing semiconductor device App 20050069819 - Shiobara, Eishi	2005-03-31
Method for determining optical constant of antireflective layer, and method for forming resist pattern Grant 6,841,404 - Kawamura , et al. January 11, 2	2005-01-11
Method for evaluating sensitivity of photoresist, method for preparation of photoresist and manufacturing method semiconductor device App 20040265713 - Shiobara, Eishi ; et al.	2004-12-30
Method of processing a substrate, heating apparatus, and method of forming a pattern App 20040121617 - Kawano, Kenji ; et al.	2004-06-24
Pattern forming method and method for manufacturing semiconductor device App 20030215749 - Kato, Hirokazu ; et al.	2003-11-20
Manufacturing method of semiconductor device using mask pattern having high etching resistance Grant 6,576,562 - Ohuchi , et al. June 10, 2	2003-06-10
Method of forming a pattern Grant 6,569,595 - Sato , et al. May 27, 2	2003-05-27
Method for determining optical constant of antireflective layer, and method for forming resist pattern App 20030064534 - Kawamura, Daisuke ; et al.	2003-04-03
Apparatus for processing substrate and method of processing the same App 20020123011 - Kawano, Kenji ; et al.	2002-09-05
Manufacturing method of semiconductor device using mask pattern having high etching resistance App 20020119612 - Ohuchi, Junko ; et al.	2002-08-29
Method of forming a pattern App 20010034131 - Sato, Yasuhiko ; et al.	2001-10-25

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