| Patent | Date |
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Very high frequency (VHF) driven atmospheric plasma sources and point of use fertigation of irrigation water utilizing plasma production of nitrogen bearing species
Grant 9,475,710 - Shannon , et al. October 25, 2 | 2016-10-25 |
Very High Frequency (vhf) Driven Atmospheric Plasma Sources And Point Of Use Fertigation Of Irrigation Water Utilizing Plasma Production Of Nitrogen Bearing Species
App 20140262789 - Shannon; Steven C. ; et al. | 2014-09-18 |
Substrate Cleaning Chamber And Cleaning And Conditioning Methods
App 20130192629 - Mehta; Vineet ; et al. | 2013-08-01 |
Substrate cleaning chamber and cleaning and conditioning methods
Grant 8,435,379 - Mehta , et al. May 7, 2 | 2013-05-07 |
Plasma reactor with plasma load impedance tuning for engineered transients by synchronized modulation of a source power or bias power RF generator
Grant 8,357,264 - Shannon , et al. January 22, 2 | 2013-01-22 |
Plasma reactor with plasma load impedance tuning for engineered transients by synchronized modulation of an unmatched low power RF generator
Grant 8,337,661 - Shannon , et al. December 25, 2 | 2012-12-25 |
Method of plasma load impedance tuning for engineered transients by synchronized modulation of a source power or bias power RF generator
Grant 8,324,525 - Shannon , et al. December 4, 2 | 2012-12-04 |
Apparatus for multiple frequency power application
Grant 8,237,517 - Shannon , et al. August 7, 2 | 2012-08-07 |
Magnetic confinement of a plasma
Grant 8,092,605 - Shannon , et al. January 10, 2 | 2012-01-10 |
Plasma process uniformity across a wafer by controlling a variable frequency coupled to a harmonic resonator
Grant 8,080,479 - Collins , et al. December 20, 2 | 2011-12-20 |
Plasma process uniformity across a wafer by controlling RF phase between opposing electrodes
Grant 8,076,247 - Collins , et al. December 13, 2 | 2011-12-13 |
Apparatus For Multiple Frequency Power Application
App 20110291771 - Shannon; Steven C. ; et al. | 2011-12-01 |
Plasma reactor with high speed plasma load impedance tuning by modulation of different unmatched frequency sources
Grant 8,018,164 - Shannon , et al. September 13, 2 | 2011-09-13 |
Method of plasma load impedance tuning for engineered transients by synchronized modulation of an unmatched low power RF generator
Grant 8,002,945 - Shannon , et al. August 23, 2 | 2011-08-23 |
Apparatus for multiple frequency power application
Grant 7,994,872 - Shannon , et al. August 9, 2 | 2011-08-09 |
Plasma reactor with reduced electrical skew using electrical bypass elements
Grant 7,988,815 - Rauf , et al. August 2, 2 | 2011-08-02 |
Apparatus and method to confine plasma and reduce flow resistance in a plasma reactor
Grant 7,972,467 - Bera , et al. July 5, 2 | 2011-07-05 |
Method of processing a workpiece in a plasma reactor with variable height ground return path to control plasma ion density uniformity
Grant 7,968,469 - Collins , et al. June 28, 2 | 2011-06-28 |
Method of plasma load impedance tuning by modulation of an unmatched low power RF generator
Grant 7,967,944 - Shannon , et al. June 28, 2 | 2011-06-28 |
Plasma process uniformity across a wafer by apportioning ground return path impedances among plural VHF sources
Grant 7,884,025 - Collins , et al. February 8, 2 | 2011-02-08 |
Improving plasma process uniformity across a wafer by apportioning power among plural VHF sources
Grant 7,879,731 - Collins , et al. February 1, 2 | 2011-02-01 |
Dual frequency RF match
Grant 7,879,185 - Shannon , et al. February 1, 2 | 2011-02-01 |
Method for monitoring process drift using plasma characteristics
Grant 7,848,898 - Shannon , et al. December 7, 2 | 2010-12-07 |
Plasma control using dual cathode frequency mixing
Grant 7,838,430 - Shannon , et al. November 23, 2 | 2010-11-23 |
Time-based wafer de-chucking from an electrostatic chuck having separate RF BIAS and DC chucking electrodes
Grant 7,813,103 - Shannon , et al. October 12, 2 | 2010-10-12 |
Method for testing plasma reactor multi-frequency impedance match networks
Grant 7,812,278 - Shannon October 12, 2 | 2010-10-12 |
Method of plasma confinement for enhancing magnetic control of plasma radial distribution
Grant 7,780,866 - Miller , et al. August 24, 2 | 2010-08-24 |
Methods and apparatus for controlling characteristics of a plasma
Grant 7,777,599 - Shannon , et al. August 17, 2 | 2010-08-17 |
Apparatus and method to confine plasma and reduce flow resistance in a plasma
Grant 7,754,997 - Bera , et al. July 13, 2 | 2010-07-13 |
Apparatus For Multiple Frequency Power Application
App 20100013572 - SHANNON; STEVEN C. ; et al. | 2010-01-21 |
Plasma Reactor With High Speed Plasma Impedance Tuning By Modulation Of Source Power Or Bias Power
App 20090297404 - SHANNON; STEVEN C. ; et al. | 2009-12-03 |
Plasma Reactor With Plasma Load Impedance Tuning For Engineered Transients By Synchronized Modulation Of An Unmatched Low Power Rf Generator
App 20090294061 - Shannon; Steven C. ; et al. | 2009-12-03 |
Plasma Reactor With Plasma Load Impedance Tuning For Engineered Transients By Synchronized Modulation Of A Source Power Or Bias Power Rf Generator
App 20090294062 - Shannon; Steven C. ; et al. | 2009-12-03 |
Method Of Plasma Load Impedance Tuning By Modulation Of A Source Power Or Bias Power Rf Generator
App 20090294275 - Shannon; Steven C. ; et al. | 2009-12-03 |
Method Of Plasma Load Impedance Tuning For Engineered Transients By Synchronized Modulation Of A Source Power Or Bias Power Rf Gererator
App 20090294414 - Shannon; Steven C. ; et al. | 2009-12-03 |
Plasma Reactor With High Speed Plasma Load Impedance Tuning By Modulation Of Different Unmatched Frequency Sources
App 20090295295 - Shannon; Steven C. ; et al. | 2009-12-03 |
Method Of Plasma Load Impedance Tuning By Modulation Of An Unmatched Low Power Rf Generator
App 20090295296 - Shannon; Steven C. ; et al. | 2009-12-03 |
Method Of Plasma Load Impedance Tuning For Engineered Transients By Synchronized Modulation Of An Unmatched Low Power Rf Generator
App 20090298287 - Shannon; Steven C. ; et al. | 2009-12-03 |
Method for determining plasma characteristics
Grant 7,620,511 - Shannon , et al. November 17, 2 | 2009-11-17 |
Apparatus and method to confine plasma and reduce flow resistance in a plasma reactor
Grant 7,585,384 - Bera , et al. September 8, 2 | 2009-09-08 |
Matching network characterization using variable impedance analysis
Grant 7,554,334 - Shannon , et al. June 30, 2 | 2009-06-30 |
Methods And Apparatus For Controlling Characteristics Of A Plasma
App 20090140828 - Shannon; Steven C. ; et al. | 2009-06-04 |
Method For Determining Plasma Characteristics
App 20090132189 - Shannon; Steven C. ; et al. | 2009-05-21 |
Method For Monitoring Process Drift Using Plasma Characteristics
App 20090130856 - Shannon; Steven C. ; et al. | 2009-05-21 |
Time-based wafer de-chucking from an electrostatic chuck having separate RF bias and DC chucking electrodes
App 20090097185 - Shannon; Steven C. ; et al. | 2009-04-16 |
Plasma generation and control using dual frequency RF signals
Grant 7,510,665 - Shannon , et al. March 31, 2 | 2009-03-31 |
Plasma Reactor With Reduced Electrical Skew Using Electrical Bypass Elements
App 20090025878 - Rauf; Shahid ; et al. | 2009-01-29 |
Plasma Reactor With Reduced Electrical Skew Using A Conductive Baffle
App 20090025879 - Rauf; Shahid ; et al. | 2009-01-29 |
Apparatus And Method To Confine Plasma And Reduce Flow Resistance In A Plasma Reactor
App 20080314522 - Bera; Kallol ; et al. | 2008-12-25 |
Substrate Cleaning Chamber And Cleaning And Conditioning Methods
App 20080276958 - Mehta; Vineet ; et al. | 2008-11-13 |
Method for determining plasma characteristics
Grant 7,440,859 - Shannon , et al. October 21, 2 | 2008-10-21 |
Plasma generation and control using a dual frequency RF source
Grant 7,431,857 - Shannon , et al. October 7, 2 | 2008-10-07 |
Plasma Reactor With Ion Distribution Uniformity Controller Employing Plural Vhf Sources
App 20080178803 - COLLINS; KENNETH S. ; et al. | 2008-07-31 |
Plasma Process Uniformity Across A Wafer By Apportioning Power Among Plural Vhf Sources
App 20080182416 - Collins; Kenneth S. ; et al. | 2008-07-31 |
Plasma Process Uniformity Across A Wafer By Apportioning Ground Return Path Impedances Among Plural Vhf Sources
App 20080182417 - Collins; Kenneth S. ; et al. | 2008-07-31 |
Plasma Process Uniformity Across A Wafer By Controlling A Variable Frequency Coupled To A Harmonic Resonator
App 20080182418 - Collins; Kenneth S. ; et al. | 2008-07-31 |
Method Of Processing A Workpiece In A Plasma Reactor With Variable Height Ground Return Path To Control Plasma Ion Density Uniformity
App 20080179181 - COLLINS; KENNETH S. ; et al. | 2008-07-31 |
Plasma Reactor With Wide Process Window Employing Plural Vhf Sources
App 20080179011 - COLLINS; KENNETH S. ; et al. | 2008-07-31 |
Plasma Process Uniformity Across A Wafer By Controlling Rf Phase Between Opposing Electrodes
App 20080180028 - Collins; Kenneth S. ; et al. | 2008-07-31 |
Magnetic Confinement Of A Plasma
App 20080121345 - Shannon; Steven C. ; et al. | 2008-05-29 |
Method of feedback control of ESC voltage using wafer voltage measurement at the bias supply output
Grant 7,375,947 - Yang , et al. May 20, 2 | 2008-05-20 |
Method Of Plasma Confinement For Enhancing Magnetic Control Of Plasma Radial Distribution
App 20080110860 - Miller; Matthew L. ; et al. | 2008-05-15 |
Plasma Confinement Baffle And Flow Equalizer For Enhanced Magnetic Control Of Plasma Radial Distribution
App 20080110567 - Miller; Matthew L. ; et al. | 2008-05-15 |
Apparatus And Method To Confine Plasma And Reduce Flow Resistance In A Plasma Reactor
App 20080105660 - Bera; Kallol ; et al. | 2008-05-08 |
Matching Network Characterization Using Variable Impedance Analysis
App 20080087381 - SHANNON; STEVEN C. ; et al. | 2008-04-17 |
Dual bias frequency plasma reactor with feedback control of E.S.C. voltage using wafer voltage measurement at the bias supply output
Grant 7,359,177 - Yang , et al. April 15, 2 | 2008-04-15 |
Multi-frequency dynamic dummy load and method for testing plasma reactor multi-frequency impedance match networks
Grant 7,326,872 - Shannon February 5, 2 | 2008-02-05 |
Method For Determining Plasma Characteristics
App 20070294043 - SHANNON; STEVEN C. ; et al. | 2007-12-20 |
Method For Determining Plasma Characteristics
App 20070289359 - Shannon; Steven C. ; et al. | 2007-12-20 |
Method For Testing Plasma Reactor Multi-frequency Impedance Match Networks
App 20070257743 - SHANNON; STEVEN C. | 2007-11-08 |
Method for determining plasma characteristics
Grant 7,286,948 - Shannon , et al. October 23, 2 | 2007-10-23 |
Method Of Feedback Control Of Esc Voltage Using Wafer Voltage Measurement At The Bias Supply Output
App 20070127188 - Yang; Jang Gyoo ; et al. | 2007-06-07 |
Plasma Generation And Control Using A Dual Frequency Rf Source
App 20070006971 - Shannon; Steven C. ; et al. | 2007-01-11 |
Plasma Control Using Dual Cathode Frequency Mixing
App 20070000611 - Shannon; Steven C. ; et al. | 2007-01-04 |
Plasma generation and control using dual frequency RF signals
App 20060266735 - Shannon; Steven C. ; et al. | 2006-11-30 |
Dual bias frequency plasma reactor with feedback control of E.S.C. voltage using wafer voltage measurement at the bias supply output
App 20060256499 - Yang; Jang Gyoo ; et al. | 2006-11-16 |
Multi-frequency dynamic dummy load and method for testing plasma reactor multi-frequency impedance match networks
App 20050270118 - Shannon, Steven C. | 2005-12-08 |
Dual frequency RF match
App 20050133163 - Shannon, Steven C. ; et al. | 2005-06-23 |
Plasma control using dual cathode frequency mixing
App 20050090118 - Shannon, Steven C. ; et al. | 2005-04-28 |
Method and apparatus for routing harmonics in a plasma to ground within a plasma enhanced semiconductor wafer processing chamber
Grant 6,879,870 - Shannon , et al. April 12, 2 | 2005-04-12 |
Plasma generation and control using a dual frequency RF source
App 20050034816 - Shannon, Steven C. ; et al. | 2005-02-17 |
Apparatus and method to confine plasma and reduce flow resistance in a plasma reactor
App 20040206309 - Bera, Kallol ; et al. | 2004-10-21 |
Inductive antenna for a plasma reactor producing reduced fluorine dissociation
Grant 6,652,712 - Wang , et al. November 25, 2 | 2003-11-25 |
Method and apparatus for routing harmonics in a plasma to ground within a plasma enhanced semiconductor wafer processing chamber
App 20030192475 - Shannon, Steven C. ; et al. | 2003-10-16 |
Inductive antenna for a plasma reactor producing reduced fluorine dissociation
App 20030111181 - Wang, Shiang-Bau ; et al. | 2003-06-19 |
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