Sewell; Harry

Patent Applications and Registrations

Patent applications and USPTO patent grants for Sewell; Harry.The latest application filed is for "lithographic apparatus, a dryer and a method of removing liquid from a surface".

Company Profile

3.78.71

Sewell; Harry - Ridgefield CT
Sewell; Harry - Ridgefild CT US
Sewell; Harry - Haviland CT
Sewell; Harry - Wilton CT
Sewell; Harry - Horsham EN

*profile and listings may contain filings by different individuals or companies with the same name. Review application materials to confirm ownership/assignment.

Patent Activity

Patent	Date
Lithographic apparatus, a dryer and a method of removing liquid from a surface Grant 10,649,349 - Leenders , et al.	2020-05-12
Lithographic Apparatus, A Dryer And A Method Of Removing Liquid From A Surface App 20190121247 - LEENDERS; Martinus Hendrikus Antonius ; et al.	2019-04-25
Lithographic apparatus, a dryer and a method of removing liquid from a surface Grant 10,185,231 - Leenders , et al. Ja	2019-01-22
Lithographic Apparatus, A Dryer And A Method Of Removing Liquid From A Surface App 20170227856 - LEENDERS; Martinus Hendrikus Antonius ; et al.	2017-08-10
Lithographic apparatus, a dryer and a method of removing liquid from a surface Grant 9,632,425 - Leenders , et al. April 25, 2	2017-04-25
Lithographic apparatus, fluid combining unit and device manufacturing method Grant 9,330,912 - Mulkens , et al. May 3, 2	2016-05-03
EUV mask inspection system Grant 9,046,754 - Sewell , et al. June 2, 2	2015-06-02
Mask inspection with fourier filtering and image compare Grant 9,041,903 - Nelson , et al. May 26, 2	2015-05-26
Alignment target contrast in a lithographic double patterning process Grant 8,980,724 - Sewell , et al. March 17, 2	2015-03-17
Tunable Wavelength Illumination System App 20140253891 - DEN BOEF; Arie Jeffrey ; et al.	2014-09-11
Systems and methods for insitu lens cleaning using ozone in immersion lithography Grant 8,817,226 - Sewell , et al. August 26, 2	2014-08-26
Alignment Target Contrast in a Lithographic Double Patterning Process App 20140192333 - SEWELL; Harry ; et al.	2014-07-10
Systems and methods for thermally-induced aberration correction in immersion lithography Grant 8,736,807 - Sewell , et al. May 27, 2	2014-05-27
Tunable wavelength illumination system Grant 8,730,476 - Den Boef , et al. May 20, 2	2014-05-20
Improving alignment target contrast in a lithographic double patterning process Grant 8,709,908 - Sewell , et al. April 29, 2	2014-04-29
Lithographic apparatus and device manufacturing method Grant 8,654,311 - Sewell , et al. February 18, 2	2014-02-18
Systems and methods for insitu lens cleaning in immersion lithography Grant 8,654,305 - Sewell , et al. February 18, 2	2014-02-18
Immersion lithographic apparatus with immersion fluid re-circulating system Grant 8,629,970 - Sewell , et al. January 14, 2	2014-01-14
Scanning EUV interference imaging for extremely high resolution patterning Grant 8,623,588 - Sewell January 7, 2	2014-01-07
Method and system for increasing alignment target contrast Grant 8,625,096 - Sewell , et al. January 7, 2	2014-01-07
Tunable Wavelength Illumination System App 20130258316 - DEN BOEF; Arie Jeffrey ; et al.	2013-10-03
Tunable wavelength illumination system Grant 8,508,736 - Den Boef , et al. August 13, 2	2013-08-13
System and method to increase surface tension and contact angle in immersion lithography Grant 8,456,611 - Sewell June 4, 2	2013-06-04
Re-flow and buffer system for immersion lithography Grant 8,451,422 - Sewell , et al. May 28, 2	2013-05-28
Apparatus and Method for Providing Resist Alignment Marks in a Double Patterning Lithographic Process App 20130017378 - Doytcheva; Maya Angelova ; et al.	2013-01-17
Lithographic method and apparatus Grant 8,339,571 - Sewell , et al. December 25, 2	2012-12-25
Apparatus and method for providing resist alignment marks in a double patterning lithographic process Grant 8,329,366 - Doytcheva , et al. December 11, 2	2012-12-11
Liquid immersion lithography system comprising a tilted showerhead relative to a substrate Grant 8,203,693 - Khmelichek , et al. June 19, 2	2012-06-19
Mask Inspection with Fourier Filtering and Image Compare App 20120075606 - Nelson; Michael L. ; et al.	2012-03-29
Lithographic Apparatus, Fluid Combining Unit And Device Manufacturing Method App 20120013866 - MULKENS; Johannes Catharinus Hubertus ; et al.	2012-01-19
Lithographic apparatus and device manufacturing method Grant 8,089,609 - Sewell , et al. January 3, 2	2012-01-03
Enhancing the image contrast of a high resolution exposure tool Grant 8,054,449 - Sewell November 8, 2	2011-11-08
Systems And Methods For Thermally-induced Aberration Correction In Immersion Lithography App 20110261335 - Sewell; Harry ; et al.	2011-10-27
Lithographic apparatus with a fluid combining unit and related device manufacturing method Grant 8,045,135 - Mulkens , et al. October 25, 2	2011-10-25
Systems and methods for thermally-induced aberration correction in immersion lithography Grant 7,995,185 - Sewell , et al. August 9, 2	2011-08-09
Immersion Photolithography System And Method Using Inverted Wafer-projection Optics Interface App 20110122380 - SEWELL; Harry	2011-05-26
Tunable Wavelength Illumination System App 20110085726 - Den Boef; Arie Jeffrey ; et al.	2011-04-14
Method and System for Increasing Alignment Target Contrast App 20110075238 - SEWELL; Harry ; et al.	2011-03-31
Device manufacturing method and computer program product Grant 7,897,058 - Van Haren , et al. March 1, 2	2011-03-01
Immersion photolithography system and method using inverted wafer-projection optics interface Grant 7,898,643 - Sewell March 1, 2	2011-03-01
System and method for patterning both sides of a substrate utilizing imprint lithography Grant 7,882,780 - Sewell February 8, 2	2011-02-08
Apparatus and Method for Providing Resist Alignment Marks in a Double Patterning Lithographic Process App 20100323171 - DOYTCHEVA; Maya Angelova ; et al.	2010-12-23
Alignment Target Contrast in a Lithographic Double Patterning Process App 20100301458 - Sewell; Harry ; et al.	2010-12-02
Scanning EUV Interference Imaging for Extremely High Resolution Patterning App 20100284015 - Sewell; Harry	2010-11-11
System And Method To Increase Surface Tension And Contact Angle In Immersion Lithography App 20100271604 - SEWELL; Harry	2010-10-28
Fluid Handling Device, An Immersion Lithographic Apparatus And A Device Manufacturing Method App 20100214544 - Sewell; Harry ; et al.	2010-08-26
System and method to increase surface tension and contact angle in immersion lithography Grant 7,773,195 - Sewell August 10, 2	2010-08-10
Interferometric lithographic projection apparatus Grant 7,751,030 - Markoya , et al. July 6, 2	2010-07-06
EUV Mask Inspection App 20100165310 - SEWELL; Harry ; et al.	2010-07-01
EUV Mask Inspection System App 20100149505 - SEWELL; Harry ; et al.	2010-06-17
Lithographic apparatus and device manufacturing method utilizing a resettable or reversible contrast enhancing layer in a multiple exposure system Grant 7,736,825 - Sewell June 15, 2	2010-06-15
System and method for forming nanodisks used in imprint lithography and nanodisk and memory disk formed thereby Grant 7,701,668 - Sewell April 20, 2	2010-04-20
Lithographic apparatus and device manufacturing method Grant 7,684,014 - Sewell , et al. March 23, 2	2010-03-23
Liquid Immersion Lithography System Comprising a Tilted Showerhead Relative to a Substrate App 20100053574 - Khmelichek; Aleksandr ; et al.	2010-03-04
Full Wafer Width Scanning Using Steps and Scan System App 20100033698 - SEWELL; Harry	2010-02-11
Lithographic Apparatus And Device Manufacturing Method App 20090257044 - Sewell; Harry ; et al.	2009-10-15
Re-flow And Buffer System For Immersion Lithography App 20090213343 - Sewell; Harry ; et al.	2009-08-27
Immersion Lithography Apparatus App 20090190106 - SEWELL; Harry ; et al.	2009-07-30
Immersion Lithographic Apparatus With Immersion Fluid Re-circulating System App 20090185149 - SEWELL; Harry ; et al.	2009-07-23
Interferometric lithography system and method used to generate equal path lengths of interfering beams Grant 7,561,252 - Sewell , et al. July 14, 2	2009-07-14
Lithographic method and apparatus App 20090153826 - Sewell; Harry ; et al.	2009-06-18
Maskless optical writer Grant 7,548,301 - Sewell June 16, 2	2009-06-16
Systems and Methods for Insitu Lens Cleaning Using Ozone in Immersion Lithography App 20090109411 - Sewell; Harry ; et al.	2009-04-30
Lithographic apparatus and device manufacturing method App 20090109412 - Sewell; Harry ; et al.	2009-04-30
Adjustable resolution interferometric lithography system Grant 7,492,442 - Markoya , et al. February 17, 2	2009-02-17
Adjustable resolution interferometric lithography system Grant 7,474,385 - Markoya , et al. January 6, 2	2009-01-06
System and Method for Forming Nanodisks Used in Imprint Lithography and Nanodisk and Memory Disk Formed Thereby App 20080285428 - SEWELL; Harry	2008-11-20
Lithographic printing with polarized light Grant 7,445,883 - Baba-Ali , et al. November 4, 2	2008-11-04
Systems and methods for insitu lens cleaning in immersion lithography App 20080198343 - Sewell; Harry ; et al.	2008-08-21
Lithographic apparatus, a dryer and a method of removing liquid from a surface App 20080192214 - Leenders; Martinus Hendrikus Antonius ; et al.	2008-08-14
Method for making a computer hard drive platen using a nano-plate Grant 7,409,759 - Sewell August 12, 2	2008-08-12
Method and system for making a nano-plate for imprint lithography Grant 7,410,591 - Sewell August 12, 2	2008-08-12
System and method for forming nanodisks used in imprint lithography and nanodisk and memory disk formed thereby Grant 7,399,422 - Sewell July 15, 2	2008-07-15
System and method for patterning both sides of a substrate utilizing imprint lithography App 20080163769 - Sewell; Harry	2008-07-10
Systems and methods for thermally-induced aberration correction in immersion lithography App 20080137044 - Sewell; Harry ; et al.	2008-06-12
Lithographic apparatus and device manufacturing method App 20080129973 - McCafferty; Diane ; et al.	2008-06-05
Enhancing the image contrast of a high resolution exposure tool App 20080117399 - Sewell; Harry	2008-05-22
Lithographic apparatus and device manufacturing method App 20080117392 - Mulkens; Johannes Catharinus Hubertus ; et al.	2008-05-22
System and method for patterning both sides of a substrate utilizing imprint lithography Grant 7,363,854 - Sewell April 29, 2	2008-04-29
Patterned grid element polarizer Grant 7,304,719 - Albert , et al. December 4, 2	2007-12-04
Device manufacturing method and computer program product App 20070187358 - Van Haren; Richard Johannes Franciscus ; et al.	2007-08-16
Liquid immersion lithography system having a tilted showerhead relative to a substrate Grant 7,256,864 - Kate , et al. August 14, 2	2007-08-14
Liquid immersion lithography system with tilted liquid flow Grant 7,253,879 - Khmelichek , et al. August 7, 2	2007-08-07
Interferometric lithography system and method used to generate equal path lengths of interfering beams App 20070153250 - Sewell; Harry ; et al.	2007-07-05
System and method for forming nanodisks used in imprint lithography and nanodisk and memory disk formed thereby App 20070121375 - Sewell; Harry	2007-05-31
System and method to increase surface tension and contact angle in immersion lithography App 20070122561 - Sewell; Harry	2007-05-31
Method and System for Correction of Intrinsic Birefringence in UV Microlithography App 20070091440 - Sewell; Harry	2007-04-26
Beam-splitter optics design that maintains an unflipped (unmirrored) image for a catadioptric lithographic system Grant 7,199,862 - Sewell April 3, 2	2007-04-03
Adjustable Resolution Interferometric Lithography System App 20070070321 - Markoya; Louis ; et al.	2007-03-29
Liquid immersion lithography system with tilted liquid flow App 20070041002 - Khmelichek; Aleksandr ; et al.	2007-02-22
Method and system for correction of intrinsic birefringence in UV microlithography Grant 7,154,669 - Sewell December 26, 2	2006-12-26
Lithographic apparatus and device manufacturing method utilizing a resettable or reversible contrast enhancing layer in a multiple exposure system App 20060286482 - Sewell; Harry	2006-12-21
Lithographic printing with polarized light App 20060275708 - Baba-Ali; Nabila ; et al.	2006-12-07
Liquid immersion lithography system having a tilted showerhead relative to a substrate App 20060238721 - Kate; Nicolaas Ten ; et al.	2006-10-26
Liquid immersion lithography system with tilted liquid flow App 20060232753 - Khmelichek; Aleksandr ; et al.	2006-10-19
Apparatus and system for improving phase shift mask imaging performance and associated methods Grant 7,098,995 - Sewell August 29, 2	2006-08-29
Lithographic printing with polarized light Grant 7,090,964 - Baba-Ali , et al. August 15, 2	2006-08-15
Interferometric lithographic projection apparatus App 20060170896 - Markoya; Louis J. ; et al.	2006-08-03
Method and system for making a nano-plate for imprint lithography App 20060131270 - Sewell; Harry	2006-06-22
Method and system for making a computer hard drive platen using a nano-plate App 20060130317 - Sewell; Harry	2006-06-22
System and method for patterning both sides of a substrate utilizing imprint lithography App 20060131785 - Sewell; Harry	2006-06-22
Method and apparatus for imprint pattern replication App 20060130678 - Sewell; Harry	2006-06-22
Maskless optical writer App 20060119827 - Sewell; Harry	2006-06-08
Beam-splitter optics design that maintains an unflipped (unmirrored) image for a catadioptric lithographic system App 20060061748 - Sewell; Harry	2006-03-23
Maskless optical writer Grant 7,012,674 - Sewell March 14, 2	2006-03-14
Adjustable resolution interferometric lithography system App 20060044539 - Markoya; Louis ; et al.	2006-03-02
Immersion photolithography system and method using inverted wafer-projection optics interface Grant 6,980,277 - Sewell December 27, 2	2005-12-27
Catadioptric lithography system and method with reticle stage orthogonal to wafer stage Grant 6,977,716 - Sewell , et al. December 20, 2	2005-12-20
Beam-splitter optics design that maintains an unflipped (unmirrored) image for a catadioptric lithographic system Grant 6,972,830 - Sewell December 6, 2	2005-12-06
Use of multiple reticles in lithographic printing tools Grant 6,967,713 - McCullough , et al. November 22, 2	2005-11-22
Apparatus and system for improving phase shift mask imaging performance and associated methods Grant 6,967,712 - Sewell November 22, 2	2005-11-22
Immersion photolithography system and method using inverted wafer-projection optics interface App 20050254031 - Sewell, Harry	2005-11-17
Patterned grid element polarizer App 20050219696 - Albert, Michael M. ; et al.	2005-10-06
Apparatus and system for improving phase shift mask imaging performance and associated methods App 20050190355 - Sewell, Harry	2005-09-01
Maskless optical writer App 20050151953 - Sewell, Harry	2005-07-14
Use of multiple reticles in lithographic printing tools App 20050030514 - McCullough, Andrew W. ; et al.	2005-02-10
Immersion photolithography system and method using inverted wafer-projection optics interface App 20040263808 - Sewell, Harry	2004-12-30
Immersion photolithography system and method using inverted wafer-projection optics interface Grant 6,809,794 - Sewell October 26, 2	2004-10-26
Catadioptric lithography system and method with reticle stage orthogonal to wafer stage App 20040201830 - Sewell, Harry ; et al.	2004-10-14
Use of multiple reticles in lithographic printing tools Grant 6,800,408 - McCullough , et al. October 5, 2	2004-10-05
Lithographic printing with polarized light App 20040180294 - Baba-Ali, Nabila ; et al.	2004-09-16
Beam-splitter optics design that maintains an unflipped (unmirrored) image for a catadioptric lithographic system App 20040174617 - Sewell, Harry	2004-09-09
Catadioptric lithography system and method with reticle stage orthogonal to wafer stage Grant 6,757,110 - Sewell , et al. June 29, 2	2004-06-29
Beam-splitter optics design that maintains an unflipped (unmirrored) image for a catadioptric lithographic system Grant 6,731,374 - Sewell May 4, 2	2004-05-04
Use of multiple reticles in lithographic printing tools App 20040043311 - McCullough, Andrew W. ; et al.	2004-03-04
Method and system for correction of intrinsic birefringence in UV microlithography App 20040021943 - Sewell, Harry	2004-02-05
Catadioptric lithography system and method with reticle stage orthogonal to wafer stage App 20030223125 - Sewell, Harry ; et al.	2003-12-04
Apparatus and system for improving phase shift mask imaging performance and associated methods App 20030219096 - Sewell, Harry	2003-11-27
Use of multiple reticles in lithographic printing tools Grant 6,628,372 - McCullough , et al. September 30, 2	2003-09-30
Method and system for dual reticle image exposure Grant 6,611,316 - Sewell August 26, 2	2003-08-26
Method and system for dual reticle image exposure App 20020123012 - Sewell, Harry	2002-09-05
Use of multiple reticles in lithographic printing tools App 20020115004 - McCullough, Andrew W. ; et al.	2002-08-22
Pyroelectric detector comprising nucleating material wettable by aqueous solution of pyroelectric material Grant 4,053,806 - Turnbull , et al. October 11, 1	1977-10-11