SENDELBACH; MATTHEW
Patent Applications and Registrations
Patent applications and USPTO patent grants for SENDELBACH; MATTHEW.The latest application filed is for "tem-based metrology method and system".
- SENDELBACH; MATTHEW - FISHKILL NY
- Sendelbach; Matthew - Albany NY
- Sendelbach; Matthew - Wappingers Falls NY
| Patent | Date |
|---|---|
| Tem-based Metrology Method And System App 20220310356 - MACHAVARIANI; VLADIMIR ; et al. | 2022-09-29 |
| Metrology method and system Grant 11,450,541 - Machavariani , et al. September 20, 2 | 2022-09-20 |
| TEM-based metrology method and system Grant 11,309,162 - Machavariani , et al. April 19, 2 | 2022-04-19 |
| Process control of semiconductor fabrication based on spectra quality metrics Grant 11,300,948 - Kagalwala , et al. April 12, 2 | 2022-04-12 |
| Hybridization for characterization and metrology Grant 11,295,969 - Muthinti , et al. April 5, 2 | 2022-04-05 |
| Tem-based Metrology Method And System App 20210217581 - MACHAVARIANI; VLADIMIR ; et al. | 2021-07-15 |
| Method And System For Optical Characterization Of Patterned Samples App 20210116359 - SHAFIR; Dror ; et al. | 2021-04-22 |
| TEM-based metrology method and system Grant 10,916,404 - Machavariani , et al. February 9, 2 | 2021-02-09 |
| Process Control Of Semiconductor Fabrication Based On Spectra Quality Metrics App 20200409345 - KAGALWALA; TAHER ; et al. | 2020-12-31 |
| Method and system for optical characterization of patterned samples Grant 10,876,959 - Shafir , et al. December 29, 2 | 2020-12-29 |
| Metrology Method And System App 20200294829 - MACHAVARIANI; VLADIMIR ; et al. | 2020-09-17 |
| Process Control Of Semiconductor Fabrication Based On Linkage Between Different Fabrication Steps App 20200279783 - TIMONEY; PADRAIG ; et al. | 2020-09-03 |
| Measuring Complex Structures In Semiconductor Fabrication App 20200192987 - KAGALWALA; TAHER ; et al. | 2020-06-18 |
| Hybridization For Characterization And Metrology App 20200168489 - MUTHINTI; GANGADHARA RAJA ; et al. | 2020-05-28 |
| Measuring complex structures in semiconductor fabrication Grant 10,664,638 - Kagalwala , et al. | 2020-05-26 |
| Tem-based Metrology Method And System App 20190393016 - MACHAVARIANI; VLADIMIR ; et al. | 2019-12-26 |
| Scatterometry method and system Grant 10,302,414 - Wainreb , et al. | 2019-05-28 |
| Method and system for planning metrology measurements Grant 10,222,710 - Sendelbach , et al. | 2019-03-05 |
| Method and system for determining strain distribution in a sample Grant 10,209,206 - Barak , et al. Feb | 2019-02-19 |
| Method And System For Optical Characterization Of Patterned Samples App 20180328837 - SHAFIR; Dror ; et al. | 2018-11-15 |
| Method And System For Planning Metrology Measurements App 20160363872 - SENDELBACH; Matthew ; et al. | 2016-12-15 |
| Method And System For Determining Strain Distribution In A Sample App 20160139065 - BARAK; Gilad ; et al. | 2016-05-19 |
| Scatterometry Method And System App 20160076876 - WAINREB; Gilad ; et al. | 2016-03-17 |
| Method And System For Optical Characterization Of Patterned Samples App 20150316468 - SHAFIR; Dror ; et al. | 2015-11-05 |
| Planarization of a non-conformal device layer in semiconductor fabrication Grant 5,880,007 - Varian , et al. March 9, 1 | 1999-03-09 |
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